Vacuumizing system

Abstract

The utility model relates to a vacuum-pumping system, and relates to the technical field of semiconductor preparation, in the vacuum-pumping system, the nominal diameter of a second valve on a second pipeline is smaller than the nominal diameter of a first valve on a first pipeline, and when the pressure in a working cavity needs to be adjusted, a first vacuum pump is in a working state; due to the fact that the first valve and the second valve can control the vacuumizing flow, the first valve controls vacuumizing within a large flow range, the second valve controls vacuumizing within a small flow range, and the specifications of the two valves for controlling the flow are different, the pressure regulation and control range in the working cavity is widened. In addition, the pressure in the working cavity is controlled through small flow of the second pipeline and the second valve, the pressure fluctuation range in the working cavity is smaller and more accurate compared with the pressure fluctuation range controlled through the first pipeline and the second valve, and the pressure stability in the working cavity can be further improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of semiconductor preparation, in particular to a vacuum pumping system. BACKGROUND

[0002] In the technical field of semiconductor preparation, the thin film process and etching process generally use a vacuum pumping system.

[0003] The working cavity in the vacuum pumping system is the working cavity of the semiconductor preparation process, and the cavity pressure in the working cavity is an important parameter affecting the yield of semiconductor process preparation. If the pressure fluctuation range in the working cavity is large during vacuum pumping, the yield of the prepared semiconductor wafer will be severely reduced or even scrapped, and as the feature size decreases, the stability of the cavity pressure is also required to be higher and higher. CONTENT OF THE UTILITY MODEL

[0004] Therefore, it is necessary to provide a vacuum pumping system for improving the pressure stability in the working cavity.

[0005] In order to achieve the above purpose, the utility model provides a vacuum pumping system, which comprises:

[0006] a working cavity, a first pipeline, a first valve, a second pipeline, a second valve and a first vacuum pump;

[0007] The working cavity is connected with the first end of the first pipeline and the first end of the second pipeline respectively;

[0008] The first end of the first vacuum pump is connected with the second end of the first pipeline and the second end of the second pipeline respectively, and the first vacuum pump is used for pumping the working cavity through the first pipeline and / or the second pipeline;

[0009] The first valve is located on the first pipeline and is used for adjusting the vacuum pumping flow of the first pipeline;

[0010] The second valve is located on the second pipeline and is used for adjusting the vacuum pumping flow of the second pipeline;

[0011] The nominal diameter of the second valve is smaller than the nominal diameter of the first valve.

[0012] In one of the embodiments, the vacuum pumping system further comprises:

[0013] a first detection device and a second detection device, which are connected with the working cavity respectively and are used for detecting the cavity pressure in the working cavity during the working process;

[0014] The detection range of the second detection device is greater than the detection range of the first detection device.

[0015] In one of the embodiments, the vacuum system further comprises:

[0016] A third detection device and a fourth detection device are respectively connected to the working cavity, for detecting the cavity pressure of the working cavity.

[0017] The detection range of the fourth detection device is greater than the detection range of the third detection device, which is greater than the detection range of the second detection device.

[0018] In one of the embodiments, the vacuum system further comprises:

[0019] A third valve is located between the first detection device and the working cavity, for opening or closing the first detection device.

[0020] A fourth valve is located between the second detection device and the working cavity, for opening or closing the second detection device.

[0021] A fifth valve is located between the third detection device and the working cavity, for opening or closing the third detection device.

[0022] In one of the embodiments, when the pressure in the working cavity is in a first preset pressure range, the first valve serves as a first preset valve, which has a first preset angle.

[0023] Or when the pressure in the working cavity is in a second preset pressure range, the second valve serves as a second preset valve, which has a second preset angle.

[0024] In one of the embodiments, the vacuum system further comprises:

[0025] A sixth valve is located on the first pipeline, for opening or closing the first pipeline.

[0026] A seventh valve is located on the second pipeline, for opening or closing the second pipeline.

[0027] In one of the embodiments, the vacuum system further comprises:

[0028] a second vacuum pump, a first end of the second vacuum pump being connected to the first end of the first vacuum pump through a third pipeline, a second end of the second vacuum pump being connected to the second end of the first pipeline and the second end of the second pipeline respectively, the second vacuum pump being used to vacuumize the working cavity through the first pipeline and / or the second pipeline, the first vacuum pump being further used to start the second vacuum pump;

[0029] an eighth valve being located on the third pipeline and being used to open or close the third pipeline.

[0030] In one of the embodiments, the vacuumizing system further comprises:

[0031] a fifth detecting device being located between the eighth valve and the second vacuum pump and being used to detect the pressure of the third pipeline.

[0032] In one of the embodiments, the vacuumizing system further comprises:

[0033] a fourth pipeline, a first end of the fourth pipeline being connected to the third pipeline between the eighth valve and the first vacuum pump, a second end of the fourth pipeline being connected to the first pipeline between the working cavity and the first valve, the first vacuum pump being further used to pre-vacuumize the working cavity through the fourth pipeline;

[0034] a ninth valve being located on the fourth pipeline and being used to open or close the fourth pipeline.

[0035] In one of the embodiments, the vacuumizing system further comprises:

[0036] a gas supply device being connected to the working cavity and being used to supply working gas into the working cavity.

[0037] Compared with the prior art, the above technical solution has the following advantages:

[0038] The nominal diameter of the second valve on the second pipeline is smaller than the nominal diameter of the first valve on the first pipeline, that is, the cross-sectional area of the second pipeline is smaller than the cross-sectional area of the first pipeline, and the vacuum flow controlled by the second valve is also smaller than the vacuum flow controlled by the first valve. When the pressure in the working cavity needs to be adjusted, the first vacuum pump is in a working state. Since the first valve and the second valve can both control the vacuum flow, the first valve controls the large-flow-range vacuum, and the second valve controls the small-flow-range vacuum, the two valves control the flow in different specifications, thereby improving the range of pressure adjustment in the working cavity. In addition, the second pipeline and the second valve are used to control the pressure in the working cavity in a small flow, and the pressure fluctuation range in the working cavity is smaller and more accurate than that controlled by the first pipeline and the second valve, which can further improve the pressure stability in the working cavity. BRIEF DESCRIPTION OF DRAWINGS

[0039] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the drawings needed to be used in the embodiments or the prior art description will be briefly introduced. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative labor.

[0040] Figure 1 A structural schematic diagram of a vacuum system is provided for the embodiments of the present application;

[0041] Figure 2 A structural schematic diagram of another vacuum system is provided for the embodiments of the present application;

[0042] Figure 3 A structural schematic diagram of another vacuum system is provided for the embodiments of the present application;

[0043] Figure 4 A structural schematic diagram of another vacuum system is provided for the embodiments of the present application;

[0044] Figure 5 A structural schematic diagram of another vacuum system is provided for the embodiments of the present application;

[0045] Figure 6 A structural schematic diagram of another vacuum system is provided for the embodiments of the present application;

[0046] Figure 7 A flowchart of a vacuum system for obtaining vacuum is provided for the embodiments of the present application;

[0047] Figure 8 A flowchart of a vacuum system for adjusting the pressure of a working cavity is provided for the embodiments of the present application.

[0048] Explanation of reference numerals: 01 - working chamber, 02 - first pipeline, 03 - first valve, 04 - second pipeline, 05 - second valve, 06 - first vacuum pump, 07 - first detection device, 08 - second detection device, 09 - third detection device, 10 - fourth detection device, 11 - third valve, 12 - fourth valve, 13 - fifth valve, 14 - sixth valve, 15 - seventh valve, 16 - second vacuum pump, 17 - third pipeline, 18 - eighth valve, 19 - fifth detection device, 20 - fourth pipeline, 21 - ninth valve, 22 - gas supply device. DETAILED DESCRIPTION

[0049] For the purpose of promoting an understanding of the present application, the present application will now be described in greater detail with reference to the relevant drawings. The embodiments of the present application are illustrated in the drawings. However, the present application can be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete. It is therefore evident that the application can be altered in many different aspects, all without departing from the scope of the present application.

[0050] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used in the description of the application herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the application.

[0051] It should be understood that when a layer is referred to as being "on" or "adjacent" or "connected to" another layer, it can be directly on, adjacent to, or connected to the other layer, or intervening layers can be present. Conversely, when an element is referred to as being "directly on," "directly adjacent to," or "directly connected to" another layer, there are no intervening layers present.

[0052] As used herein, the singular forms "a", "an" and "the" include plural referents unless the context clearly dictates otherwise. It should also be understood that the term "comprising" or "having" etc., specifies the presence of stated features, integers, steps, operations, components, parts, or combinations thereof, but does not preclude the presence or addition of one or more other features, integers, steps, operations, components, parts, or combinations thereof.

[0053] Based on the content in the background art, in the conventional vacuum pumping system, the swing valve for controlling the pressure in the working chamber has a large nominal diameter and a wide swing angle. When the pressure in the working chamber is controlled, the pressure in the working chamber may fluctuate greatly due to the large swing angle of the swing valve. In addition, since the range of the conventional pressure gauge is large, the pressure in the working chamber cannot be accurately measured, resulting in inaccurate control of the pressure in the working chamber.

[0054] Based on this, the application provides an evacuation system. In the evacuation system, the nominal diameter of the second valve on the second pipeline is smaller than the nominal diameter of the first valve on the first pipeline, that is, the cross-sectional area of the second pipeline is smaller than the cross-sectional area of the first pipeline, and the evacuation flow controlled by the second valve is also smaller than the evacuation flow controlled by the first valve. When the pressure in the working cavity needs to be adjusted, the first vacuum pump is in a working state. Since the first valve and the second valve can both control the evacuation flow, the first valve controls the evacuation flow in a large flow range, and the second valve controls the evacuation flow in a small flow range, thereby improving the pressure control range of the working cavity. In addition, the second pipeline and the second valve are used to control the pressure in the working cavity in a small flow range, and the pressure fluctuation range in the working cavity is smaller and more accurate than that controlled by the first pipeline and the second valve, which can further improve the pressure stability in the working cavity.

[0055] In addition, the plurality of detection devices in the application have different measurement ranges, which can more accurately measure the pressure in the working cavity, thereby further making the pressure control more accurate and improving the pressure stability in the working cavity.

[0056] In order to make the above-mentioned purposes, features and advantages of the application more obvious and easy to understand, the application will be further described in detail below with reference to the drawings and specific embodiments.

[0057] Please refer to Figure 1 , Figure 1 A structure diagram of an evacuation system is provided for the embodiment of the application, which comprises:

[0058] The working cavity 01, the first pipeline 02, the first valve 03, the second pipeline 04, the second valve 05 and the first vacuum pump 06.

[0059] The working cavity 01 is connected with the first end of the first pipeline 02 and the first end of the second pipeline 04 respectively.

[0060] The first end of the first vacuum pump 06 is connected with the second end of the first pipeline 02 and the second end of the second pipeline 04 respectively, and the first vacuum pump 06 is used to evacuate the working cavity 01 through the first pipeline 02 and / or the second pipeline 04.

[0061] The first valve 03 is located on the first pipeline 02 and is used to adjust the evacuation flow of the first pipeline 02.

[0062] The second valve 05 is located on the second pipeline 04 and is used to adjust the evacuation flow of the second pipeline 04.

[0063] The nominal diameter of the second valve 05 is smaller than the nominal diameter of the first valve 03.

[0064] Specifically, in one embodiment, the working chamber 01 may be an etching chamber. When etching a wafer, the working chamber 01 must first be vacuumed.

[0065] The first vacuum pump 06 is connected to the working chamber 01 via the first pipe 02 and the second pipe 04. The working chamber 01 can change the pressure state in the working chamber 01 through either or both of the two pipes, that is, achieve vacuum. In one embodiment, the first vacuum pump 06 can be a dry pump.

[0066] A first valve 03, which can be a swing valve, is installed on the first pipeline 02. A second valve 05, which can be a swing valve, is installed on the second pipeline 04. The nominal diameter of the first valve 03 is smaller than that of the second valve 05. In other words, the cross-sectional area of ​​the first pipeline 02 is larger than that of the second pipeline 04. For example, the first valve 03 can be DN300, and the second valve 05 can be DN100, but these are not specifically limited.

[0067] The swing angle of the first valve 03 is greater than that of the second valve 05. During vacuuming, appropriate pipelines can be selected to control the vacuuming rate and flow rate, thereby ensuring stability within the working chamber 01. For example, when high-flow vacuuming is required, the first pipeline 02 and the first valve 03 are used; when low-flow vacuuming is required, the second pipeline 04 and the second valve 05 can be used. The first and second pipelines 02 and 04 can also operate simultaneously to maintain stability within the working chamber 01. Depending on the process gas flow rate and pressure, the working chamber 01 pressure can be controlled independently or jointly. Using swing valves of different specifications allows for a wider pressure control range.

[0068] In this embodiment, when the pressure within working chamber 01 needs to be adjusted, first vacuum pump 06 is in operation. Since both first valve 03 and second valve 05 can control the vacuum flow rate, with first valve 03 controlling vacuuming within a large flow range and second valve 05 controlling vacuuming within a small flow range, this increases the pressure control range within working chamber 01. Furthermore, by using second pipeline 04 and second valve 05 to control the pressure within working chamber 01 at a low flow rate, the pressure fluctuation range within working chamber 01 is smaller and more precise than that achieved by controlling the pressure with first pipeline 02 and second valve 05, further improving the pressure stability within working chamber 01.

[0069] Optional, reference Figure 2 , Figure 2 A schematic structural diagram of another vacuum system is provided for an embodiment of the present application. In another embodiment of the present application, the vacuum system further includes:

[0070] The first detection device 07 and the second detection device 08 are respectively connected with the working cavity 01, and are used for detecting the cavity pressure in the working process of the working cavity 01.

[0071] The detection range of the second detection device 08 is greater than the detection range of the first detection device 07.

[0072] Specifically, the first detection device 07 and the second detection device 08 can both be capacitive pressure gauges. The first detection device 07 and the second detection device 08 are used for detecting the cavity pressure of the working cavity 01 in the working process.

[0073] The conventional working cavity 01 is provided with one process pressure gauge. When the pressure change range in the working cavity 01 is small, the large-range pressure gauge cannot detect the small change, so that the pressure regulation cannot be accurately performed. In the embodiment, one large-range pressure gauge and one small-range pressure gauge are simultaneously provided. At this time, since the detection range of the pressure in the working cavity 01 is refined, the detection accuracy in the working cavity 01 in the working process can be improved. For example, the detection range of the first detection device 07 can be 0mt-100mt, and the detection range of the second detection device 08 can be 0mt-500mt; or the detection range of the first detection device 07 can be 0mt-50mt, and the detection range of the second detection device 08 can be 0mt-100mt. The range is not limited specifically, and the range can be determined according to the structure or process characteristics of the working cavity 01. According to the process pressure requirement, the detection device with the corresponding range is selected, so that the measurement value is more accurate, and the process selection range is more extensive.

[0074] The detection range of the first detection device 07 is less than the detection range of the second detection device 08. When the pressure change in the working cavity 01 is small, the first detection device 07 can more accurately obtain the pressure change value. At this time, the pressure regulation can be performed by using the second valve 05 with a small swing angle, so that the pressure regulation becomes more accurate, and the stability of the pressure in the working cavity 01 is improved. It should be noted that at this time, since two pressure gauges with different detection ranges are provided, two valves with different nominal diameters are also provided. The vacuum pumping system is controllable at small pressure and large flow, and is also controllable at large pressure and small flow. The pressure in the working cavity 01 is more stable, the uniformity of the wafer feature size in the working cavity 01 is obviously improved, the wafer yield is improved, and the wafer scrap rate is reduced.

[0075] Optionally, referring to Figure 3 , Figure 3 Another structure schematic diagram of the vacuum pumping system is provided in the embodiment of the application. In another embodiment of the application, the vacuum pumping system further comprises:

[0076] The third detection device 09 and the fourth detection device 10 are respectively connected with the working cavity 01, and are used for detecting the cavity pressure of the working cavity 01.

[0077] The detection range of the fourth detection device 10 is greater than the detection range of the third detection device 09, and the detection range of the third detection device 09 is greater than the detection range of the second detection device 08.

[0078] Specifically, the detection range of the fourth detection device 10 can be 0 Torr-760 Torr, and the detection range of the third detection device 09 can be 0 Torr-10 Torr or 0 Torr-20 Torr. It should be noted that the detection range of the third detection device 09 is greater than the detection range of the second detection device 08, and the detection of the pressure of the working cavity 01 by the four detection devices also increases the detection range.

[0079] The detection range of the fourth detection device 10 is greater than the detection range of the third detection device 09, the third detection device 09 is used for monitoring the pressure in the working cavity 01 in real time, including the front-stage pressure and the rear-stage pressure, to provide intuitive pressure information for the operator; and the fourth detection device 10 can provide more pressure measurement points and a wider measurement range, which is helpful for the operator to comprehensively understand the pressure condition in the working cavity 01, for example, if the detection value of the fourth detection device 10 is less than 750 Torr, the working cavity 01 is not allowed to be opened. At the same time, connecting two pressure gauges, the operator can compare their measurement results in real time, so as to more accurately judge the pressure state in the working cavity 01. The accuracy and reliability of the measurement are improved.

[0080] Optionally, referring to Figure 3 In another embodiment of the present application, the vacuum pumping system further comprises:

[0081] The third valve 11 is located between the first detection device 07 and the working cavity 01, and is used for opening or closing the first detection device 07.

[0082] The fourth valve 12 is located between the second detection device 08 and the working cavity 01, and is used for opening or closing the second detection device 08.

[0083] The fifth valve 13 is located between the third detection device 09 and the working cavity 01, and is used for opening or closing the third detection device 09.

[0084] Specifically, when pressure detection is performed, a third valve 11 can be arranged between the first detection device 07 and the working cavity 01, a fourth valve 12 can be arranged between the second detection device 08 and the working cavity 01, and a fifth valve 13 can be arranged between the third detection device 09 and the working cavity 01. By arranging separate valves, each detection device can be calibrated and adjusted individually when needed, thereby improving the accuracy of the overall measurement system. In addition, when a certain detection device needs to be maintained or replaced, only the corresponding valve needs to be closed, without the need to stop the operation or affect the operation of the entire system. The operator can also flexibly select which detection device to use for monitoring according to actual needs, thereby improving the flexibility, convenience and accuracy of operation.

[0085] Optionally, referring to Figure 4 , Figure 4 a structure diagram of another vacuum pumping system is provided for the embodiment of the present application; in another embodiment of the present application, the vacuum pumping system further comprises:

[0086] A sixth valve 14 is arranged on the first pipeline 02 and used for opening or closing the first pipeline 02.

[0087] A seventh valve 15 is arranged on the second pipeline 04 and used for opening or closing the second pipeline 04.

[0088] Specifically, a sixth valve 14 can be arranged between the first valve 03 on the first pipeline 02 and the working cavity 01, and a seventh valve 15 can be arranged between the second valve 05 on the second pipeline 04 and the working cavity 01. The sixth valve 14 and the seventh valve 15 are both on-off valves and used for opening or closing the passage.

[0089] The sixth valve 14 arranged on the first pipeline 02 and the seventh valve 15 arranged on the second pipeline 04 can to some extent play a role in protecting the safety of the vacuum pumping system. When abnormal conditions occur in the system, such as excessively high pressure or abnormal temperature, the sixth valve 14 and the seventh valve 15 can quickly cut off the fluid source to prevent the accident from expanding and protect the equipment from being damaged. In addition, when one of the first pipeline or the second pipeline is not used, the passage can be closed to block the variable and reduce the control error.

[0090] Optionally, referring to Figure 5 , Figure 5 a structure diagram of another vacuum pumping system is provided for the embodiment of the present application; in another embodiment of the present application, the vacuum pumping system further comprises:

[0091] The second vacuum pump 16 and the third pipeline 17, the first end of the second vacuum pump 16 is connected with the first end of the first vacuum pump 06 through the third pipeline 17, the second end of the second vacuum pump 16 is connected with the second end of the first pipeline 02 and the second end of the second pipeline 04 respectively, the second vacuum pump 16 is used for vacuumizing the working cavity through the first pipeline 02 and / or the second pipeline 04, and the first vacuum pump 06 is also used for starting the second vacuum pump 16.

[0092] The eighth valve 18 is located on the third pipeline 17 and is used for opening or closing the third pipeline 17.

[0093] Specifically, the second vacuum pump 16 can be a molecular pump or a cold pump, the vacuumizing speed of the second vacuum pump 16 is greater than that of the first vacuum pump 06, and the second vacuum pump 16 is arranged to improve the vacuumizing speed of the vacuumizing system.

[0094] The second vacuum pump 16 is connected with the working cavity 01 through the first pipeline 02 and the second pipeline 04, the working cavity 01 can change the pressure state in the working cavity 01 through any one of the two pipelines or through both of the two pipelines, that is, vacuumizing is realized.

[0095] The second vacuum pump 16 is connected with the first vacuum pump 06 through the third pipeline 17, when the second vacuum pump 16 is a molecular pump, the starting of the second vacuum pump 16 needs to reach a specific vacuum environment, and the dry pump is started in an atmospheric state to obtain a low-vacuum environment. Therefore, the first vacuum pump 06 is arranged in the front stage of the second vacuum pump 16 to ensure the starting of the second vacuum pump 16.

[0096] The eighth valve 18 is arranged on the third pipeline 17 between the second vacuum pump 16 and the first vacuum pump 06, and the eighth valve 18 can be an on-off valve. When the second vacuum pump 16 is started, in order to prevent backflow, the second vacuum pump 16 and the first vacuum pump 06 need to be turned off to ensure that the second vacuum pump 16 is used to extract the gas in the working cavity 01 and improve the gas extraction efficiency.

[0097] Optionally, referring to Figure 5 In another embodiment of the present application, the vacuumizing system further comprises:

[0098] The fifth detection device 19 is located between the eighth valve 18 and the second vacuum pump 16 and is used for detecting the pressure of the third pipeline 17.

[0099] Specifically, the eighth valve 18 and the second vacuum pump 16 are further provided with a fifth detection device 19, which can be a pressure gauge, and the eighth valve 18 can be a switch valve. When the pre-vacuum of the working cavity 01 is needed, the eighth valve 18 can be closed to prevent backflow by cutting off the connection between the first vacuum pump 06 and the second vacuum pump 16. The fifth detection device 19 can detect the pressure in the third pipeline 17 to ensure that the second vacuum pump 16 will not be damaged, for example, when the detection value of the fifth detection device 19 is less than 0.5 torr, the second vacuum pump 16 will be slowed down and not allowed to be opened. This helps to reduce unnecessary energy consumption and prolong the service life of the equipment.

[0100] Optionally, referring to Figure 5 In another embodiment of the present application, the vacuum pumping system further comprises:

[0101] The fourth pipeline 20 is connected between the third pipeline 17 between the eighth valve 18 and the first vacuum pump 06 and the first pipeline 02 between the working cavity 01 and the first valve 03, and the first vacuum pump 06 is further configured to pre-vacuum the working cavity 01 through the fourth pipeline 20.

[0102] The ninth valve 21 is arranged on the fourth pipeline 20 and configured to open or close the fourth pipeline 20.

[0103] Specifically, the fourth pipeline 20 is connected between the first vacuum pump 06 and the working cavity 01. Since the second vacuum pump 16 cannot directly pump the atmosphere, otherwise it will be damaged, the working cavity 01 needs to be pre-vacuumed to ensure that the vacuum degree in the working cavity 01 can start the second vacuum pump 16. At this time, the ninth valve 21 is arranged on the fourth pipeline 20, which can be a switch valve. After the working cavity 01 is pre-vacuumed, the fourth pipeline 20 can be closed to prevent backflow and cause loss of vacuum.

[0104] Optionally, referring to Figure 6 , Figure 6 Another structure diagram of the vacuum pumping system is provided in the embodiment of the present application. In another embodiment of the present application, the vacuum pumping system further comprises:

[0105] The gas supply device 22 is connected to the working cavity 01 and configured to supply working gas to the working cavity 01.

[0106] Specifically, in the semiconductor preparation process, specific gases need to be introduced into the working cavity 01, which can be reactants, dopants, and other working gases. The gas supply device 22 can accurately control the flow and pressure of these gases to ensure the smooth progress of the process.

[0107] Optionally, in another embodiment of the present application, when the pressure in the working cavity 01 is in the first preset pressure range, the first valve 03 is a first preset valve, and the first preset valve has a first preset angle.

[0108] Or when the pressure in the working cavity 01 is in the second preset pressure range, the second valve 05 is a second preset valve, and the second preset valve has a second preset angle.

[0109] Specifically, when the working cavity 01 is being processed, the vacuum system needs to be maintained to maintain the stability of the pressure in the working cavity 01 because the working gas needs to be continuously introduced. After the first working gas is introduced into the working cavity 01, the working cavity 01 is in a state of the first preset pressure range. In order to maintain the pressure in the cavity, the first valve 03 can be opened to a preset angle. At this time, the first valve 03 is a first preset valve to maintain the stability of the introduced working gas and the gas flow rate of the first pipeline.

[0110] At this time, if the detection device detects that the pressure in the working cavity 01 needs to be adjusted, the second valve 05 can be adjusted to adjust the pressure. Because the nominal diameter of the second valve 05 is smaller, and the deflection angle is also smaller, the pressure in the working cavity 01 can be more accurately adjusted.

[0111] Or similarly, when the second working gas is introduced into the working cavity 01, the working cavity 01 is in a state of the second preset pressure range. In order to maintain the pressure in the cavity, the second valve 05 can be opened to a preset angle. At this time, the second valve 05 is a second preset valve to maintain the stability of the introduced working gas and the gas flow rate of the second pipeline.

[0112] At this time, if the detection device detects that the pressure in the working cavity 01 needs to be adjusted, the first valve 03 can be adjusted to adjust the pressure.

[0113] In this embodiment, one of the first valve 03 or the second valve 05 is in a constant state, that is, in a preset state. Adjusting the other one can realize pressure adjustment, which realizes controllability in small pressure and large flow, and controllability in large pressure and small flow. The pressure in the working cavity 01 is more stable, which obviously improves the uniformity of the wafer feature size in the working cavity 01, improves the wafer yield, and reduces the wafer scrap rate.

[0114] Based on the above-described vacuum system, the present application also provides a way of obtaining vacuum by using the vacuum system, which is described with reference to Figure 7 , Figure 7 A flowchart of a vacuum system for obtaining vacuum is provided for the embodiment of the present application.

[0115] Step S101: open the first vacuum pump 06 and the eighth valve 18 to vacuumize the third pipeline 17.

[0116] Step S102: determine whether the pressure in the third pipeline 17 is less than 0.5 Torr, if yes, execute step S103.

[0117] In this step, the fifth detection device 19 is used to detect the vacuum degree in the third pipeline 17, i.e. to detect the pressure state, and determine whether the pressure in the third pipeline 17 is less than 0.5 Torr according to the detected value.

[0118] Step S103: start the second vacuum pump 16, determine whether the second vacuum pump 16 reaches the preset rotating speed, if yes, close the eighth valve 18 and open the ninth valve 21.

[0119] In this step, after starting the second vacuum pump 16, the second vacuum pump 16 needs to reach the preset rotating speed, if not, the eighth valve 18 needs to be closed and the ninth valve 21 needs to be opened after the second vacuum pump 16 reaches the preset rotating speed, and the first vacuum pump 06 is used to pre-vacuumize the working cavity 01.

[0120] Step S104: determine whether the pressure in the working cavity 01 is less than 10 Torr, if yes, execute step S105.

[0121] In this step, the fourth detection device 10 is used to detect the pressure state in the working cavity 01, and determine whether the pressure in the working cavity 01 is less than 10 Torr according to the detected value.

[0122] Step S105: open the fifth valve 13, determine whether the pressure in the working cavity 01 is less than 200mt, if yes, execute step S106.

[0123] In this step, the fifth valve 13 is opened to open the third detection device 09, then the pressure in the working cavity 01 is detected in real time according to the third detection device 09, and determine whether the pressure in the working cavity 01 is less than 200mt according to the detected value.

[0124] Step S106: close the ninth valve 21 and open the eighth valve 18.

[0125] In this step, the ninth valve 21 is closed to prevent backflow, and the first vacuum pump 06 is used to vacuumize the second vacuum pump 16 to ensure that the second vacuum pump 16 will not be damaged.

[0126] Step S107: open the first valve 03 and the sixth valve 14, and / or open the second valve 05 and the seventh valve 15, and open the fourth valve 12 to vacuumize the working cavity 01.

[0127] In this step, the second detection device 08 is used to detect the pressure in the working cavity 01 during the vacuumizing process until the pressure reaches the required vacuum degree. It should be noted that in this way of obtaining the vacuum degree, the first pipeline 02 and the second pipeline 04 can be simultaneously extracted, so that the vacuumizing speed can be faster.

[0128] After obtaining the vacuum degree, the present application also provides a way of using the vacuumizing system to regulate the pressure in the working cavity 01, referring to Figure 8 , Figure 8 A flowchart of the process of regulating the pressure in the working cavity by the vacuumizing system is provided for the embodiment of the present application.

[0129] Step S201: Open the fourth valve 12, and use the second detection device 08 to detect the pressure in the working cavity 01.

[0130] Step S202: Open the sixth valve 14 and the eighth valve 18, adjust the angle of the first valve 03 to the first preset angle, and use the gas supply device 22 to supply working gas into the working cavity 01.

[0131] In this step, based on the requirement that the pressure in the working cavity 01 should be in the first preset pressure range, the angle of the first valve 03 is set to the first preset angle in the process menu, so as to ensure that the first valve 03 is the first preset valve at this time.

[0132] Step S203: Determine whether the pressure in the working cavity 01 is stable, if yes, execute step S204.

[0133] In this step, the value detected by the second detection device 08 is used to determine whether the pressure in the working cavity 01 is stable, i.e., whether it reaches the first preset pressure range, if not, wait for the flow rate and the pressure to be stable until the stable state is reached.

[0134] Step S204: Determine whether the first detection device 07 is needed to detect the pressure in the working cavity 01, if yes, execute step S205; if not, execute step S206.

[0135] In this step, the determination process can be made by human judgment or automatically by setting the process menu.

[0136] Step S205: Close the fourth valve 12, open the third valve 11, and use the first detection device 07 to detect the pressure in the working cavity 01.

[0137] Step S206: Determine whether the second valve 05 is used to control the pressure in the working cavity 01, if yes, execute step S207; if not, execute step S208.

[0138] In this step, the judgment process can be made by human judgment or by setting a process menu to automatically judge.

[0139] Step S207: Keep the first valve 03 at the first preset angle, open the seventh valve 15, adjust the second valve 05 to control the pressure in the working chamber 01 until the process is completed.

[0140] Step S208: Adjust the angle of the first valve 03 to control the pressure in the working chamber 01 until the process is completed.

[0141] In this embodiment, the pressure in the working chamber 01 can be accurately judged by the detection device, so as to determine whether to use the first valve 03 or the second valve 05 to control the pressure in the working chamber 01, and the control range is expanded, and at the same time, the nominal diameter of the second valve 05 is small, and the adjustment is more accurate.

[0142] In the description of this specification, the description of the terms "some embodiments", "another embodiment" and the like means that the specific features, structures, materials or characteristics described in conjunction with the embodiments or examples are contained in at least one embodiment or example of the utility model. In this specification, the illustrative description of the above terms does not necessarily refer to the same embodiment or example.

[0143] The technical features of the above-described embodiments can be combined arbitrarily, and in order to make the description simple, all possible combinations of the technical features of the above-described embodiments are not described, however, as long as the combination of the technical features does not exist contradictory, it should be considered as the scope of the present application.

[0144] The above-described embodiments only express several implementation manners of the present application, the description is more specific and detailed, but it should not be understood as a limitation on the patent application scope. It should be pointed out that for ordinary skilled in the art, without departing from the concept of the present application, a number of modifications and improvements can be made, which are all within the protection scope of the present application. Therefore, the patent protection scope of the present application should be subject to the appended claims.

Claims

1. A vacuum pumping system, characterized in that, The vacuum pumping system comprises: a working cavity, a first pipeline, a first valve, a second pipeline, a second valve and a first vacuum pump; the working cavity is connected with a first end of the first pipeline and a first end of the second pipeline respectively; a first end of the first vacuum pump is connected with a second end of the first pipeline and a second end of the second pipeline respectively, and the first vacuum pump is used for vacuumizing the working cavity through the first pipeline and / or the second pipeline; the first valve is located on the first pipeline and used for adjusting the vacuumizing flow of the first pipeline; the second valve is located on the second pipeline and used for adjusting the vacuumizing flow of the second pipeline; a nominal diameter of the second valve is smaller than a nominal diameter of the first valve.

2. The evacuation system of claim 1, wherein, The vacuum pumping system further comprises: a first detection device and a second detection device, which are connected with the working cavity respectively and used for detecting the cavity pressure in the working process in the working cavity; a detection range of the second detection device is greater than a detection range of the first detection device.

3. The evacuation system of claim 2, wherein, The vacuum pumping system further comprises: a third detection device and a fourth detection device, which are connected with the working cavity respectively and used for detecting the cavity pressure of the working cavity; a detection range of the fourth detection device is greater than a detection range of the third detection device, which is greater than a detection range of the second detection device.

4. The evacuation system of claim 3, wherein, The vacuum pumping system further comprises: a third valve located between the first detection device and the working cavity and used for opening or closing the first detection device; a fourth valve located between the second detection device and the working cavity and used for opening or closing the second detection device; a fifth valve located between the third detection device and the working cavity and used for opening or closing the third detection device.

5. The evacuation system of claim 1, wherein, When the pressure in the working cavity is a first preset pressure range, the first valve serves as a first preset valve, and the first preset valve has a first preset angle; or when the pressure in the working cavity is a second preset pressure range, the second valve serves as a second preset valve, and the second preset valve has a second preset angle.

6. The evacuation system of claim 1, wherein, The vacuum pumping system further comprises: a sixth valve located on the first pipeline and used for opening or closing the first pipeline; a seventh valve located on the second pipeline and used for opening or closing the second pipeline.

7. The evacuation system of claim 1, wherein, The vacuum pumping system further comprises: a second vacuum pump and a third pipeline, a first end of the second vacuum pump is connected with a first end of the first vacuum pump through the third pipeline, a second end of the second vacuum pump is connected with a second end of the first pipeline and a second end of the second pipeline respectively, the second vacuum pump is used for vacuumizing the working cavity through the first pipeline and / or the second pipeline, and the first vacuum pump is also used for starting the second vacuum pump; an eighth valve located on the third pipeline and used for opening or closing the third pipeline.

8. The evacuation system of claim 7, wherein, The vacuum pumping system further comprises: a fifth detection device located between the eighth valve and the second vacuum pump and used for detecting the pressure of the third pipeline.

9. The vacuum system of claim 7, wherein, The vacuum system also includes: a fourth pipeline, wherein a first end of the fourth pipeline is connected to the third pipeline between the eighth valve and the first vacuum pump, a second end of the fourth pipeline is connected to the first pipeline between the working chamber and the first valve, and the first vacuum pump is further configured to pre-vacuum the working chamber through the fourth pipeline; A ninth valve is located on the fourth pipeline and is used to open or close the fourth pipeline.

10. The vacuum system of claim 1, wherein, The vacuum system also includes: A gas supply device is connected to the working chamber and is used to supply working gas to the working chamber.

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