Exposure head assembly of exposure machine

Abstract

The utility model discloses an exposure head component of an exposure machine, which is characterized in that a photoetching frame is slidably mounted on an exposure mounting platform, an exposure head is vertically adjustably mounted on the photoetching frame, an adjusting bottom plate is fixedly mounted on the photoetching frame, an X sliding seat is slidably mounted on the adjusting bottom plate along the X direction, and the X sliding seat is driven by an X driving device to slide; a Y sliding seat is installed on the X sliding seat in the Y direction in an extending and sliding mode, a connecting frame is installed on the Y sliding seat, the Y sliding seat is driven by a Y driving device to slide, a Z sliding seat is installed on the connecting frame in the Z direction in an extending and sliding mode, the Z sliding seat is driven by a Z driving device to slide, an alignment camera and a lighting structure which slide along with the Z sliding seat are installed on the Z sliding seat, and a vertical adjusting device is arranged on the Y sliding seat. The photoetching frame is driven by a linear power device to slide; according to the assembly, the exposure head can be adjusted to vertically align to a wafer, the position of the alignment camera can be changed, the shooting range is expanded, the alignment camera can vertically shoot accurately, and the exposure accuracy is improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to exposure head assembly of exposure machine technical field especially relates to a kind of exposure head assembly of exposure machine. BACKGROUND

[0002] In the field of exposure machine, not only the mark on the mask plate needs to be captured before alignment movement, but also the mark on the wafer under the mask plate needs to be captured through the mask plate. Whether the clear and accurate image can be captured has a great influence on whether the subsequent alignment can be completed and whether the expected alignment accuracy can be achieved, to ensure the accuracy of lithography. In actual production, the imaging effect of wafer in the image system is inconsistent due to different process treatments, which leads to the situation that the mark on the wafer cannot be found or misjudgment occurs in automatic alignment. The traditional equipment only uses a single light source to capture images when aligning, which has great limitations. When the wafer surface is coated with glass powder or has acid spots, it will seriously affect the automatic alignment. At the same time, the wafer on the wafer turntable also needs to be aligned when the exposure head is exposed. The exposure head can only move straight and cannot be adjusted horizontally, so it cannot accurately expose the wafer perpendicular to the wafer turntable.

[0003] Patent No. 202210460940.3 discloses a lighting system suitable for proximity contact type automatic exposure machine. The CCD camera is fixedly installed through the L-shaped connecting plate, then the coaxial illuminating lamp and the ring-shaped illuminating lamp for photographing are installed below, and the ring-shaped illuminating lamp can be adjusted in height. However, since the CCD camera is fixedly installed and cannot be moved, the range of the camera cannot be adjusted, and the flexibility is poor. Moreover, the CCD camera cannot be adjusted horizontally on the L-shaped connecting plate, and it cannot be ensured that the camera is perpendicular to the wafer every time. SUMMARY

[0004] The technical problem to be solved by the utility model is to provide an exposure head assembly of exposure machine, which can adjust the vertical alignment of the exposure head with the wafer, change the position of the alignment camera, expand the shooting range, make the alignment camera shoot vertically and accurately, and improve the accuracy of exposure.

[0005] The utility model discloses a technical scheme for solving the above technical problems: a kind of exposure head subassembly of exposure machine, including exposure installation platform, light etching frame is slidably installed on the exposure installation platform, exposure head is vertically adjusted and installed on the light etching frame by exposure adjusting device, adjusting base plate is fixedly installed on the light etching frame, X slide base is slidably installed on the adjusting base plate along X direction, the X slide base is driven to slide by X drive device, Y slide base is slidably installed on the X slide base along Y direction, connecting frame is installed on the Y slide base, the Y slide base is driven to slide by Y drive device, Z slide base is slidably installed on the connecting frame along Z direction, the Z slide base is driven to slide by Z drive device, alignment camera and illumination structure that slide with the Z slide base are installed on the Z slide base, vertical adjusting device that exposure alignment camera and illumination structure are vertically downward is equipped on the Y slide base;The light etching frame is driven to slide by linear power device.

[0006] As a preferred scheme, exposure support frame is connected and installed on the exposure head, the exposure adjusting device includes exposure adjusting seat, the exposure adjusting seat is evenly provided at three corners of exposure support frame respectively, the exposure adjusting seat is lifted and adjusted and installed on the light etching frame, and the exposure adjusting seat is fixedly connected with exposure support frame.

[0007] As a preferred scheme, threaded shaft is connected below the exposure adjusting seat, adjusting turntable is installed on the threaded shaft in cooperation with screw thread, the adjusting turntable is rotatably installed on the light etching frame, and adjusting slot is arranged on the adjusting turntable and is rotated with adjusting tool.

[0008] As a preferred scheme, the Z slide base includes Z slide rail and Z slider, the Z slide rail is fixedly installed on the connecting frame, the upper Z slider and the lower Z slider are respectively installed on the Z slide rail, the upper connecting plate connected with alignment camera is installed on the upper Z slider, the lower connecting plate connected with illumination structure is installed on the lower Z slider, and the Z drive device includes Z drive handle installed on the upper Z slider and the lower Z slider respectively, and the upper Z slider and the lower Z slider are driven to reciprocate on the Z slide rail by Z drive handle driving transmission mechanism.

[0009] As a preferred scheme, auxiliary slide base that slides mutually is further arranged between the upper connecting plate and the lower connecting plate.

[0010] As a preferred scheme, the vertical adjusting device includes X manual angle positioner of X direction deflection and Y manual angle positioner of Y direction deflection, which are stacked and installed on the Y slide base.

[0011] As a preferred scheme, the Y slide comprises a Y slide rail and a Y slide block, a plurality of Y slide blocks are slidingly installed on the Y slide rail, a corresponding X manual angle positioner and a Y manual angle positioner are installed on each Y slide block, the connecting frame is fixedly installed on the X manual angle positioner or the Y manual angle positioner, and the Y driving device is the same as the Z driving device.

[0012] As a preferred scheme, the X slide comprises an X lead screw which is rotationally installed on the adjusting bottom plate and extends along the X direction, an X slide block is slidingly installed on the X lead screw, the X lead screw and the X slide block form a lead screw nut structure, the X driving device is an X driving handle which manually drives the X lead screw to rotate, an X supporting plate is fixedly installed on the X slide block, and the Y slide rail is fixedly installed on the X supporting plate.

[0013] As a preferred scheme, the adjusting bottom plate is further provided with an X guide column which assists the X slide block to slide.

[0014] As a preferred scheme, the Y slide block, the upper Z slide block and the lower Z slide block are all provided with proximity switches.

[0015] After the above technical scheme is adopted, the effect of the utility model is that: the exposure head assembly of the exposure machine comprises an exposure mounting platform, a photoetching frame is slidingly installed on the exposure mounting platform, an exposure head is vertically adjusted and installed on the photoetching frame through an exposure adjusting device, an adjusting bottom plate is fixedly installed on the photoetching frame, an X slide is slidingly installed on the adjusting bottom plate along the X direction, the X slide is driven to slide through an X driving device, a Y slide is slidingly installed on the X slide along the Y direction, a connecting frame is installed on the Y slide, the Y slide is driven to slide through a Y driving device, a Z slide is slidingly installed on the connecting frame along the Z direction, the Z slide is driven to slide through a Z driving device, a position camera and an illumination structure which slide with the Z slide are installed on the Z slide, and a vertical adjusting device which adjusts the position camera and the illumination structure to vertically downward is arranged on the Y slide; the photoetching frame is driven to slide through a linear power device; first, the position of the X slide in the X direction is adjusted through the X driving device, then the position of the Y slide in the Y direction is adjusted through the Y driving device, then the position of the Z slide in the Z direction is adjusted through the Z driving device, so that the position camera and the illumination structure can be moved to an accurate shooting position, the shooting angle of the position camera and the illumination structure is adjusted through the vertical adjusting device, the verticality of the shooting is ensured, the accurate exposure position is effectively obtained, then the photoetching frame is driven to slide above the wafer turntable through the linear power device, the exposure head is helped to complete the vertical orientation through the exposure adjusting device, and the exposure head is ensured to be consistent with the wafer mark; the exposure head can be adjusted to be vertically aligned with the wafer, the position of the position camera can be changed, the shooting range is expanded, the position camera can be vertically and accurately shot, and the accuracy of exposure is improved.

[0016] And because the exposure head is connected to the exposure support frame, the exposure adjusting device includes exposure adjusting seats that are evenly provided at three corners of the exposure support frame, the exposure adjusting seats are installed on the photoetching frame through lifting adjustment, and the exposure adjusting seats are fixedly connected to the exposure support frame; the exposure support frame can be horizontally adjusted by lifting the exposure adjusting seats, the vertical orientation of the exposure head is changed, the flexibility of the exposure head is improved, and exposure accuracy is ensured.

[0017] And because the exposure adjusting seat is connected to a threaded shaft, an adjusting turntable is threadedly and movably installed on the threaded shaft, the adjusting turntable is rotatably installed on the photoetching frame, and the adjusting turntable is provided with an adjusting slot that is rotatably connected to an adjusting tool; the exposure adjusting seat is lifted by rotating the adjusting turntable through the adjusting tool, the structure is simple, the operation is convenient, the threaded connection can form self-locking, and the adjustment is stable and reliable.

[0018] And because the Z slide includes a Z slide rail and a Z slide block, the Z slide rail is fixedly installed on the connecting frame, the Z slide rail is provided with an upper Z slide block and a lower Z slide block, the upper Z slide block is provided with an upper connecting plate that is connected to the alignment camera, the lower Z slide block is provided with a lower connecting plate that is connected to the lighting structure, the Z driving device includes Z driving handles that are respectively installed on the upper Z slide block and the lower Z slide block, and the upper Z slide block and the lower Z slide block are driven to reciprocally slide on the Z slide rail through the Z driving handles; the alignment camera and the lighting structure can be respectively adjusted by respectively driving the upper Z slide block and the lower Z slide block, and different shooting and lighting ranges are adapted.

[0019] And because the upper connecting plate and the lower connecting plate are further provided with auxiliary slide blocks that slide relative to each other; the upper Z slide block and the lower Z slide block can be constrained relative to each other and do not affect the sliding, and the sliding accuracy is improved.

[0020] And because the vertical adjusting device includes an X manual angle table that is stacked on the Y slide and is used for X direction deviation and a Y manual angle table that is used for Y direction deviation; the shooting angles of the alignment camera and the lighting structure that are installed on the upper connecting plate and the lower connecting plate can be conveniently adjusted as a whole, the wafer turntable is ensured to be vertically shot, and the alignment is accurate and reliable.

[0021] And because the Y slide includes a Y slide rail and a Y slide block, a plurality of Y slide blocks are slidably installed on the Y slide rail, the Y slide blocks are respectively provided with corresponding X manual angle tables and Y manual angle tables, the connecting frame is fixedly installed on the X manual angle table or the Y manual angle table, and the Y driving device is the same as the Z driving device; the plurality of Y slide blocks are respectively provided with corresponding alignment cameras and lighting structures, and the shooting range is thus expanded and the use effect is improved.

[0022] And since the X slide comprises a X lead screw rotatably mounted on the adjusting base plate and extending along the X direction, the X slide block is slidably mounted on the X lead screw, the X lead screw and the X slide block form a lead screw nut structure, the X drive device is an X drive handle manually driving the X lead screw to rotate, the X support plate is fixedly mounted on the X slide block, and the Y slide rail is fixedly mounted on the X support plate.

[0023] And since the adjusting base plate is further provided with an X guide column assisting the X slide block to slide, the X slide block can slide stably along the X direction.

[0024] And since the Y slide block, the upper Z slide block and the lower Z slide block are all provided with proximity switches, the moving range is limited, the slide blocks can move accurately, and the use of the slide blocks will not affect each other. BRIEF DESCRIPTION OF DRAWINGS

[0025] The utility model will be further explained in connection with the drawings and examples.

[0026] Figure 1 It is a perspective view of the utility model embodiment;

[0027] Figure 2 It is a structural schematic view of the light etching frame mounting and adjusting device of the utility model embodiment;

[0028] Figure 3 It is a structural schematic view of the X slide, the Y slide and the Z slide of the utility model embodiment;

[0029] Figure 4 It is a structural schematic view of the X slide and the Y slide of the utility model embodiment;

[0030] Figure 5 It is a structural schematic view of the Z slide of the utility model embodiment;

[0031] Figure 6 It is a lateral view of the Z slide of the utility model embodiment;

[0032] Figure 7 It is Figure 1 A partial enlarged view of A;

[0033] In the drawing: 1, exposure installation platform; 2, linear motor; 3, linear slide; 4, exposure support frame; 5, exposure adjusting seat; 6, threaded shaft; 7, adjusting turntable; 8, adjusting clamping groove; 9, photoetching frame; 10, adjusting bottom plate; 11, alignment camera; 12, illumination structure; 13, Z slide rail; 14, connecting frame; 15, upper Z slide block; 16, lower Z slide block; 17, upper connecting plate; 18, lower connecting plate; 19, Z drive handle; 20, auxiliary guide rail; 21, auxiliary slide block; 22, X manual angle position table; 23, Y manual angle position table; 24, Y slide rail; 25, Y slide block; 26, Y drive handle; 27, X lead screw; 28, X slide block; 29, X drive handle; 30, X support plate; 31, X guide column; 32, proximity switch. DETAILED DESCRIPTION

[0034] The utility model will be described in further detail below through specific embodiments.

[0035] As Figures 1 to 7 shown, an exposure head assembly of an exposure machine comprises an exposure installation platform 1, a photoetching frame 9 is slidingly installed on the exposure installation platform 1, an exposure head is vertically adjusted and installed on the photoetching frame 9 through exposure adjusting devices, an adjusting bottom plate 10 is fixedly installed on the photoetching frame 9, an X slide is slidingly installed on the adjusting bottom plate 10 along an X direction, the X slide is driven to slide through X drive devices, a Y slide is slidingly installed on the X slide along a Y direction, a connecting frame 14 is installed on the Y slide, the Y slide is driven to slide through Y drive devices, the connecting frame 14 is provided with a Z slide slidingly installed along a Z direction, the Z slide is driven to slide through Z drive devices, an alignment camera 11 and an illumination structure 12 sliding with the Z slide are installed on the Z slide, the Y slide is provided with vertical adjusting devices vertically downward for adjusting the alignment camera 11 and the illumination structure 12; the photoetching frame 9 is driven to slide through linear power devices.

[0036] In the embodiment, the exposure head is moved by driving the photoetching frame 9 to slide through linear power devices, so that the position of the exposure head and the alignment camera 11 can be switched, and accurate positioning is ensured through the alignment camera 11 first, so that the exposure is accurate, the linear power devices comprise a linear motor 2, the photoetching frame 9 is slidingly installed on the exposure installation platform 1 through a linear slide 3, the linear motor 2 is fixedly installed on the exposure installation platform 1, the linear motor 2 drives the photoetching frame 9 to complete linear movement along the X direction along the linear slide 3, and the photoetching frame 9 is provided with the linear slide 3 on both sides, so as to ensure the stability of sliding.

[0037] As Figure 2 and Figure 7As shown, the exposure head is connected and mounted with an exposure support frame 4, the exposure adjusting device includes exposure adjusting seats 5, the exposure adjusting seats 5 are evenly provided at three corners of the exposure support frame 4 respectively, the exposure adjusting seats 5 are lifting adjusting mounted on the photoetching frame 9, the exposure adjusting seats 5 are fixedly connected with the exposure support frame 4; the exposure support frame 4 surrounds the exposure head, then the exposure support frame 4 is supported by the exposure adjusting seats 5 so as to lift along with the lifting of the exposure adjusting seats 5, so as to change the vertical direction of the exposure head, improve the flexibility of the exposure head, and ensure the exposure accuracy.

[0038] Further, the exposure adjusting seats 5 are connected with threaded shafts 6 below, the threaded shafts 6 are fitted and mounted with adjusting turntables 7, the adjusting turntables 7 are rotatingly mounted on the photoetching frame 9, the adjusting turntables 7 are provided with adjusting clamping grooves 8 which rotate with the adjusting tools; the exposure adjusting seats 5 are lifted by rotating the adjusting turntables 7 with the adjusting tools, the structure is simple, the operation is convenient, the threaded fitting can form self-locking, and the adjustment is stable and reliable; three exposure adjusting seats 5 are provided around the exposure support frame 4, so as to ensure that the horizontal direction of the exposure support frame 4 can be adjusted, and the vertical direction of the exposure head is ensured.

[0039] As shown in Figure 5 and Figure 6 The Z slide includes Z slide rails 13 and Z slide blocks, the Z slide rails 13 are fixedly mounted on the connecting frame 14, the Z slide rails 13 are respectively mounted with upper Z slide blocks 15 and lower Z slide blocks 16, the upper Z slide blocks 15 are mounted with upper connecting plates 17 which are connected with the alignment cameras 11, the lower Z slide blocks 16 are mounted with lower connecting plates 18 which are connected with the lighting structures 12, the Z driving devices include Z driving handles 19 which are respectively mounted on the upper Z slide blocks 15 and the lower Z slide blocks 16, the upper Z slide blocks 15 and the lower Z slide blocks 16 slide on the Z slide rails 13 by the driving transmission mechanism of the Z driving handles 19; the transmission mechanism is a helical gear transmission mechanism, so that the corresponding upper Z slide blocks 15 and lower Z slide blocks 16 can be individually slid by twisting the Z driving handles 19, different distances can be formed between the alignment cameras 11 and the lighting structures 12, the use effect is improved, and different shooting and lighting ranges are adapted.

[0040] Further, auxiliary slides which slide with each other are further provided between the upper connecting plates 17 and the lower connecting plates 18; the auxiliary slides include auxiliary guide rails 20 and auxiliary slide blocks 21, the auxiliary guide rails 20 are fixedly mounted on the upper connecting plates 17, the auxiliary slide blocks 21 are fixedly mounted on the lower connecting plates 18, since the alignment cameras 11 and the lighting structures 12 can be moved respectively, the upper Z slide blocks 15 and the lower Z slide blocks 16 can be mutually constrained and do not affect the sliding when they slide respectively, the sliding accuracy is improved and is more stable.

[0041] As shown in Figure 3 and Figure 4As shown, the vertical adjustment device includes X manual angle position table 22 and Y manual angle position table 23 which are installed on Y slide seat in X direction and Y direction respectively; since the alignment camera 11 and the lighting structure 12 are connected on the X manual angle position table 22 through the connecting frame 14, the swing of the alignment camera 11 and the lighting structure 12 can be controlled as a whole, which ensures the vertical wafer turntable shooting and the accurate and reliable alignment; the manual angle position table is the existing structure in the market, thus not described in detail.

[0042] In the embodiment, the Y slide seat includes Y slide rail 24 and Y slide block 25, a plurality of Y slide blocks 25 are installed on the Y slide rail 24, the corresponding X manual angle position table 22 and Y manual angle position table 23 are installed on each Y slide block 25, the connecting frame 14 is fixedly installed on the X manual angle position table 22 or Y manual angle position table 23, and the Y driving device is the same as the Z driving device; two Y slide blocks 25 are arranged on the Y slide rail 24, so that there are two pairs of alignment camera 11 and lighting structure 12, which expands the shooting range and improves the use effect, and the Y driving handle 26 is also arranged on the Y slide block 25, which makes the Y slide block 25 effectively slide through the helical gear transmission mechanism.

[0043] Further, the X slide seat includes X lead screw 27 which is rotatably installed on the adjusting bottom plate 10 and extends along the X direction, the X lead screw 27 is slidably installed with X slide block 28, the X lead screw 27 and the X slide block 28 form a lead screw nut structure, the X driving device is X driving handle 29 which manually drives the X lead screw 27 to rotate, the X support plate 30 is fixedly installed on the X slide block 28, and the Y slide rail 24 is fixedly installed on the X support plate 30; the rotation of the driving handle makes the X lead screw 27 rotate and thus the X slide block 28 slides, which is simple in structure and low in use cost; the X support plate 30 can expand the support range and improve the stability of the support.

[0044] In the embodiment, the adjusting bottom plate 10 is also provided with X guide column 31 which assists the X slide block 28 to slide; in the sliding process of the X slide block 28, the X guide column 31 can help the X slide block 28 to move stably, so that the X support plate 30 is stably supported.

[0045] The Y slide block 25, the upper Z slide block 15 and the lower Z slide block 16 are all provided with proximity switch 32; since the Y slide block 25 is provided with two, in order to prevent contact during use, the movement range of the Y slide block 25 can be effectively limited through the limit switch, and the cooperation of the alignment camera 11 can be ensured, at the same time, the movement range of the upper Z slide block 15 and the lower Z slide block 16 during the movement of the alignment camera 11 and the lighting structure 12 is avoided, and contact during use is avoided; the proximity switch 32 is the existing structure in the market, thus not described in detail.

[0046] The working principle of the embodiment is as follows: firstly, the linear motor 2 drives the photoetch frame 9 to move linearly, so that the alignment camera 11 is above the frame, the X support plate 30 can move the Y slide rail 24 along the X direction by rotating the X driving handle 29 to rotate the X slide block 28 to move along the X lead screw 27, adjusting the position of the alignment camera 11 and the illumination structure 12 in the X direction, then the Y slide block 25 moves along the Y direction by rotating the Y driving handle 26, adjusting the position of the alignment camera 11 and the illumination structure 12 in the Y direction, then the upper slide block and the lower Z slide block 16 move along the Z direction by rotating the Z driving handle 19, adjusting the distance between the alignment camera 11 and the illumination structure 12 and the wafer turntable, meanwhile, the X manual angle stage 22 and the Y manual angle stage 23 control the shooting and illumination angle of the alignment camera 11 and the illumination structure 12, completing the shooting alignment, then the photoetch frame 9 moves linearly to make the exposure head return to above the wafer turntable, the exposure adjusting seat 5 is driven to rise by rotating the adjusting tool to rotate the turntable 7, so that the exposure adjusting seat 5 is driven to rise by the threaded shaft 6, adjusting the level of the exposure support frame 4, so that the exposure head is perpendicular to the wafer turntable for exposure.

[0047] The above-described embodiments are only the description of the preferred embodiments of the present application, and are not intended to limit the scope of the present application, and various modifications and improvements of the technical solutions of the present application made without departing from the design spirit of the present application shall fall within the protection scope of the present application defined by the claims.

Claims

1. An exposure head assembly of an exposure machine, comprising an exposure mounting platform, wherein a photolithography frame is slidingly mounted on the exposure mounting platform, characterized in that: An exposure head is mounted on the photolithography frame for vertical adjustment through an exposure adjustment device, an adjustment base plate is fixedly mounted on the photolithography frame, an X slide is mounted on the adjustment base plate for sliding along the X direction, the X slide is driven to slide by an X drive device, a Y slide is mounted on the X slide for sliding along the Y direction, a connecting frame is mounted on the Y slide, the Y slide is driven to slide by the Y drive device, a Z slide is mounted on the connecting frame for sliding along the Z direction, the Z slide is driven to slide by the Z drive device, an alignment camera and an illumination structure that slide following the Z slide are mounted on the Z slide, a vertical adjustment device for adjusting the alignment camera and the illumination structure to face vertically downward is provided on the Y slide; the photolithography frame is driven to slide by a linear power device.

2. An exposure head assembly for an exposure apparatus as defined in claim 1, characterized by: The exposure head is connected to an exposure support frame, and the exposure adjustment device includes an exposure adjustment seat, which is evenly arranged at three corners of the exposure support frame. The exposure adjustment seat is installed on the photolithography frame for lifting adjustment, and the exposure adjustment seat is fixedly connected to the exposure support frame.

3. An exposure head assembly for an exposure apparatus as defined in Claim 2, wherein: A threaded shaft is connected to the bottom of the exposure adjustment seat, and an adjustment dial is installed on the threaded shaft in a matching thread. The adjustment dial is rotatably mounted on the photolithography frame, and an adjustment slot is provided on the adjustment dial for rotating in conjunction with the adjustment tool.

4. An exposure head assembly for an exposure apparatus as defined in Claim 3, wherein: The Z slide includes a Z slide rail and a Z slider. The Z slide rail is fixedly mounted on a connecting frame. An upper Z slider and a lower Z slider are respectively mounted on the Z slide rail. An upper connecting plate connected to an alignment camera is mounted on the upper Z slider. A lower connecting plate connected to an illumination structure is mounted on the lower Z slider. The Z drive device includes a Z drive handle respectively mounted on the upper Z slider and the lower Z slider. The upper Z slider and the lower Z slider drive a transmission mechanism to slide back and forth on the Z slide rail through the Z drive handle.

5. An exposure head assembly for an exposure apparatus as defined in Claim 4, wherein: An auxiliary sliding seat that slides mutually is also provided between the upper connecting plate and the lower connecting plate.

6. An exposure head assembly for an exposure apparatus as defined in Claim 5, wherein: The vertical adjustment device comprises an X-direction manual angle table and a Y-direction manual angle table which are stacked and mounted on a Y slide.

7. An exposure head assembly for an exposure apparatus as defined in Claim 6, wherein: The Y slide includes a Y slide rail and a Y slider. A plurality of Y sliders are slidably mounted on the Y slide rail. The Y sliders are each mounted with a corresponding X manual angle table and Y manual angle table. The connecting frame is fixedly mounted on the X manual angle table or the Y manual angle table. The Y drive device is the same as the Z drive device.

8. An exposure head assembly for an exposure apparatus as defined in Claim 7, wherein: The X slide includes an X lead screw rotatably mounted on the adjustment base plate and extending along the X direction, an X slider is slidably mounted on the X lead screw, and the X lead screw and the X slider form a lead screw nut structure. The X drive device is an X drive handle that manually drives the X lead screw to rotate, an X support plate is fixedly mounted on the X slider, and the Y slide rail is fixedly mounted on the X support plate.

9. An exposure head assembly for an exposure machine as claimed in claim 8, characterized in that: The adjusting base plate is also provided with an X guide column for assisting the sliding of the X slider.

10. An exposure head assembly for an exposure apparatus as defined in Claim 9, wherein: The Y slider, the upper Z slider and the lower Z slider are all provided with proximity switches.

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