Device for removing chromium residues on edge of mask

Abstract

The utility model discloses a device for removing residual chromium on the edge of a mask plate, which relates to the technical field of mask plates and comprises a device main body internally provided with an etching liquid storage tank and a deionized water storage tank; the two liquid medicine spraying devices are connected to the upper surface of the device body in a sliding mode, and pressing blocks are arranged at the tops of the liquid medicine spraying devices and used for preventing sprayed liquid medicine from immersing into the center of the mask plate; the mask plate body is fixed between the two liquid medicine spraying devices; the etching liquid spray head assembly is fixed at the top of the liquid medicine spraying device, is communicated with the etching liquid storage tank and is used for spraying etching liquid to the edge of the mask plate body; the deionized water spray head assembly is fixed at the top of the liquid medicine spraying device, is communicated with the deionized water storage tank and is used for spraying deionized water to the edge of the mask plate body; according to the device, manual operation is reduced, unnecessary scratches and the like caused by manual removal are avoided, the efficiency of removing the chromium residues on the edge of the mask is effectively improved, and the device has the advantages of being easy to operate, high in chromium residue removing efficiency and good in safety.

Description

Technical Field

[0001] This utility model relates to the field of photomask technology, and specifically to a device for removing chromium residue from the edges of a photomask. Background Technology

[0002] Photomasks are a crucial material in the microelectronics manufacturing process, primarily used for pattern transfer or calibration in the semiconductor or display industries. The substrate material for photomasks is typically soda ash glass or quartz glass. Raw material suppliers usually plate the pre-made glass substrate with chromium, which has excellent light-blocking properties. Photoresist is then spin-coated onto the chromium, and patterns are etched onto the photomask using a laser direct-write process. Ultraviolet light can pass through the chromium-free areas, but is blocked in the chromium-containing areas. Because upstream suppliers typically use spin-coating for photoresist application, if edge removal (EBR) is not performed, a small amount of chromium residue will appear at the edges of the downstream photomask. This situation mainly occurs when the edges of the photomask pattern are transparent, chromium-free areas. Because the photoresist is too thick at the edges, the exposure effect is poor, and the chromium at the edges cannot be completely removed. This can affect downstream exposure and result in lower product yields for end users.

[0003] To address the issue of chromium residue at the edges of photomasks, a common method involves using a cotton swab dipped in etching solution to wipe away the chromium residue, while protecting the central pattern (by covering the central pattern with a protective film to ensure it remains unaffected). However, this process is labor-intensive, time-consuming, and carries the risk of the etching solution seeping into the central pattern area and causing it to be etched away. Furthermore, the close proximity of the operator to the etching solution poses a safety hazard. Utility Model Content

[0004] This invention addresses the technical problems of low efficiency, low safety, and risk of etching loss of the main pattern when manually wiping away chromium residue at the edges of photomasks. The aim is to provide a device for removing chromium residue from the edges of photomasks, reducing manual operation, avoiding unnecessary scratches caused by manual cleaning, and effectively improving the efficiency of removing chromium residue from the edges of photomasks. It features simple operation, high chromium residue removal efficiency, and good safety.

[0005] This utility model is achieved through the following technical solution:

[0006] An apparatus for removing chromium residue from the edges of a photomask, comprising:

[0007] The main body of the device contains an etching solution storage tank and a deionized water storage tank.

[0008] Two liquid spraying devices are slidably connected to the upper surface of the main body of the device. The top of the liquid spraying device is provided with a pressure block to prevent the sprayed liquid from immersing into the center of the mask.

[0009] The mask version is fixed between two liquid spraying devices;

[0010] The etching solution nozzle assembly is fixed to the top of the chemical spraying device and connected to the etching solution storage tank for spraying etching solution onto the edge of the mask version.

[0011] The deionized water nozzle assembly is fixed to the top of the liquid spraying device and connected to the deionized water storage tank for spraying deionized water onto the edge of the mask version.

[0012] Furthermore, the liquid spraying device also includes a base, a telescopic structure, and a top crossbeam. The base is slidably connected to the upper surface of the device body, the lower end of the telescopic structure is connected to the base, and the top crossbeam is fixed to the upper end of the telescopic structure.

[0013] Furthermore, the pressure block, etching solution nozzle assembly, and deionized water nozzle assembly are all fixed to the lower surface of the top crossbeam.

[0014] Furthermore, the nozzle of the etching solution nozzle assembly is tilted.

[0015] Furthermore, a guide rail is installed on the upper surface of the main body of the device, and the liquid spraying device is slidably connected to the guide rail.

[0016] Furthermore, a support column is magnetically connected to the upper surface of the main body of the device, and the mask version is placed on top of the support column.

[0017] Furthermore, the etching solution nozzle assembly includes an etching solution nozzle and a spray pipe, wherein the etching solution nozzle is mounted on the spray pipe and the spray pipe is connected to the etching solution storage tank.

[0018] Furthermore, the etching solution storage tank is connected to the spray pipe via a solution pump and a delivery pipeline.

[0019] Furthermore, the deionized water nozzle assembly includes a deionized water nozzle and a second spray pipe. The deionized water nozzle is mounted on the second spray pipe, and the second spray pipe is connected to the deionized water storage tank.

[0020] Furthermore, the deionized water storage tank is connected to the spray pipe via the second medicine pump and the second delivery pipeline.

[0021] Compared with the prior art, this utility model has the following advantages and beneficial effects:

[0022] 1. The device of this utility model removes chromium residue from the edge of a photomask by spraying a chemical solution, reducing manual operation and avoiding unnecessary scratches caused by manual removal. It effectively improves the efficiency and safety of removing chromium residue from the edge of the photomask. Simultaneous operation on both sides further increases efficiency. By adjusting the distance between the two chemical spraying devices, the device can meet the chromium residue removal needs of photomasks of different sizes. The pressure block on the chemical spraying device can prevent the chemical solution from penetrating into the center of the photomask and fix the photomask in place.

[0023] 2. The present invention tilts the nozzle of the etching solution spray nozzle assembly. This design aims to spray the etching solution outward to prevent the liquid from seeping into the main pattern, while also improving the uniformity of the spray.

[0024] 3. This utility model provides an iron plate in the support column area on the upper surface of the device body, or uses iron as the material for the device body. In this way, the bottom of the support column is magnetic and can be directly magnetically fixed to the upper surface of the device body. The position of the support column can be adjusted to accommodate different mask sizes. The support column at the bottom makes the mask more stable. Attached Figure Description

[0025] The accompanying drawings, which are included to provide a further understanding of the embodiments of the present invention and form part of this application, do not constitute a limitation thereof. In the drawings:

[0026] Figure 1 This is a schematic diagram of the structure of this utility model;

[0027] Figure 2 This is a schematic diagram of the internal structure of the main body of the device;

[0028] Figure 3 A schematic diagram of the structure of a liquid spraying device;

[0029] Figure 4 This is a schematic diagram of the etching solution nozzle assembly and the deionized water nozzle assembly.

[0030] The attached diagram shows the markings and corresponding component names:

[0031] 1-Main body of the device, 2-Switch control device, 3-Drain hole, 4-Guide rail, 5-Medicine spraying device, 501-Base, 502-Telescopic structure, 503-Fasting bolt, 504-Top crossbeam, 505-Pressure block, 6-Mask version body, 7-Support column, 8-Etching solution nozzle assembly, 801-Etching solution nozzle, 802-Spray pipe one, 9-Deionized water nozzle assembly, 901-Deionized water nozzle, 902-Spray pipe two, 10-Etching solution storage tank, 11-Medicine pump one, 12-Transfer pipeline one, 13-Deionized water storage tank, 14-Medicine pump two, 15-Transfer pipeline two. Detailed Implementation

[0032] To make the objectives, technical solutions, and advantages of this utility model clearer, the present utility model will be further described in detail below with reference to the embodiments and accompanying drawings. The illustrative embodiments and descriptions of this utility model are only used to explain this utility model and are not intended to limit this utility model.

[0033] In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. However, it will be apparent to those skilled in the art that these specific details are not necessary to implement the present invention. In other embodiments, well-known structures, circuits, materials, or methods are not specifically described in order to avoid obscuring the present invention.

[0034] Throughout this specification, references to "an embodiment," "an example," or "an example" mean that a particular feature, structure, or characteristic described in connection with that embodiment or example is included in at least one embodiment of the present invention. Therefore, the phrases "an embodiment," "an example," "an example," or "an example" appearing in various places throughout the specification do not necessarily refer to the same embodiment or example. Furthermore, specific features, structures, or characteristics can be combined in one or more embodiments or examples in any suitable combination and / or sub-combination. Moreover, those skilled in the art will understand that the illustrations provided herein are for illustrative purposes and are not necessarily drawn to scale. The term "and / or" as used herein includes any and all combinations of one or more of the associated listed items.

[0035] In the description of this utility model, the indicated orientation or positional relationship is based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship that the product of this application is usually placed in when in use, or the orientation or positional relationship that is commonly understood by those skilled in the art. It is only for the convenience of describing this application and simplifying the description, and is not intended to indicate or imply that the device or component referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, it should not be construed as a limitation of this application.

[0036] Meanwhile, the terms "set up," "assemble," "connect," and "link" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0037] Example

[0038] This embodiment provides a device for removing chromium residue from the edges of a photomask, such as... Figures 1-4As shown, it includes:

[0039] The main body of the device 1 has an etching solution storage tank 10 and a deionized water storage tank 13 inside. The main body of the device 1 serves to support the entire structure. Its upper surface is a processing platform that is high around the edges and low in the middle. This type of platform can ensure that the solution will not flow out of the device.

[0040] Two liquid spraying devices 5 are slidably connected to the upper surface of the main body 1. A pressure block 505 is provided on the top of the liquid spraying device 5 to prevent the sprayed liquid from immersing into the center of the mask.

[0041] The mask version 6 is fixed between the two liquid spraying devices 5;

[0042] The etching solution nozzle assembly 8 is fixed on the top of the chemical spraying device 5 and is connected to the etching solution storage tank 10 for spraying etching solution onto the edge of the mask version body 6.

[0043] The deionized water nozzle assembly 9 is fixed to the top of the liquid spraying device 5 and is connected to the deionized water storage tank 13 for spraying deionized water onto the edge of the mask version body 6.

[0044] In use, the device of this invention first covers the area with the graphic in the center of the mask 6 with a protective film. Then, according to the size of the mask, the two chemical spraying devices 5 are moved on the main body 1 to adjust the distance between them. After adjustment, the mask 6 is placed between the two chemical spraying devices 5, aligning the etching solution nozzle assembly 8 and the deionized water nozzle assembly 9 with the edge of the mask 6. The pressure block 505 on the top of the chemical spraying device 5 is then pressed firmly against the mask 6, ensuring that the pressed position is outside the chromium residue. The pressure block 505 prevents the chemical solution from seeping into the center of the mask and fixes the mask. The function is as follows: Then, the chromium residue removal cleaning operation can be carried out. The etching solution is sprayed out by the switch control device 2 set on the surface of the main body 1. When spraying, the etching solution nozzle assembly 8 sprays the etching solution onto the edge of the mask version 6 to etch and remove the chromium residue on the edge. After a certain time (such as 5 seconds), the deionized water is sprayed out by the switch control device 2 to clean and dilute the residual etching solution. When the chromium residue in a part of the area is treated, the position of the mask version 6 is moved to treat the chromium residue in other areas. The sprayed waste liquid will flow into the interior of the main body 1 through the drain hole 3 opened on the upper surface of the main body 1 and finally be discharged.

[0045] This invention's device removes chromium residue from the edges of a photomask by spraying a chemical solution, reducing manual operation and avoiding unnecessary scratches caused by manual removal. It effectively improves the efficiency and safety of removing chromium residue from the edges of the photomask, and the simultaneous operation on both sides further enhances efficiency. By adjusting the distance between the two chemical spraying devices 5, the device can accommodate chromium residue removal operations for photomasks of different sizes. The pressure block 505 installed on the chemical spraying device 5 can prevent the chemical solution from penetrating into the center of the photomask and also fix the photomask in place.

[0046] In one or more specific embodiments of this utility model, the liquid spraying device 5 further includes a base 501, a telescopic structure 502, and a top crossbeam 504. The base 501 is slidably connected to the upper surface of the device body 1. The lower end of the telescopic structure 502 is connected to the base 501. The top crossbeam 504 is fixed to the upper end of the telescopic structure 502. The pressure block 505, the etching solution nozzle assembly 8, and the deionized water nozzle assembly 9 are all fixed to the lower surface of the top crossbeam 504. The telescopic structure 502 can be any structure with telescopic functionality available in the prior art, such as two nested connecting plates, which can be manually pulled up and down to change its height. After the pressure block 505 presses against the mask body 6, the telescopic structure 502 is fixed by tightening the fastening bolts 503, effectively preventing liquid from seeping into the center of the mask.

[0047] In one or more specific embodiments of this utility model, the nozzle of the etching solution nozzle assembly 8 is inclined. The angle between the nozzle of the etching solution nozzle assembly 8 and the vertical structure is approximately 30°. This design aims to both allow the etching solution to be sprayed outwards, thereby preventing liquid from seeping into the main pattern, and to improve the uniformity of spraying.

[0048] In one or more specific embodiments of this utility model, a guide rail 4 is mounted on the upper surface of the device body 1, and the liquid spraying device 5 is slidably connected to the guide rail 4. By setting the guide rail 4, the two liquid spraying devices 5 can be moved horizontally, thereby adjusting the distance between the two liquid spraying devices 5 and enabling the processing of photomasks of different sizes.

[0049] In one or more specific embodiments of this utility model, a support column 7 is magnetically connected to the upper surface of the device body 1, and the mask body 6 is placed on top of the support column 7. By setting an iron plate in the area of ​​the support column 7 on the upper surface of the device body 1, or by using iron as the material for the device body 1, the bottom of the support column 7 is magnetic, which can be directly magnetically fixed to the upper surface of the device body 1, and its placement can be arbitrarily adjusted to correspond to different mask sizes. The support column 7 at the bottom makes the mask more stable.

[0050] In one or more specific embodiments of this utility model, the etching solution nozzle assembly 8 includes an etching solution nozzle 801 and a spray pipe 802. The etching solution nozzle 801 is mounted on the spray pipe 802, and the spray pipe 802 is connected to the etching solution storage tank 10. Specifically, the etching solution storage tank 10 is connected to the spray pipe 802 via a chemical pump 11 and a delivery pipeline 12. The etching solution nozzle assembly 8 is mounted on the top crossbeam 504. During etching solution spraying, the chemical pump 11 draws etching solution stored in the etching solution storage tank 10 and sprays it at an angle onto the mask version 6.

[0051] The deionized water nozzle assembly 9 includes a deionized water nozzle 901 and a second spray pipe 902. The deionized water nozzle 901 is mounted on the second spray pipe 902, which is connected to a deionized water storage tank 13. Specifically, the deionized water storage tank 13 is connected to the second spray pipe 902 via a second chemical pump 14 and a second delivery pipeline 15. The deionized water nozzle assembly 9 is mounted on the top crossbeam 504. During deionized water spraying, the second chemical pump 14 draws deionized water stored in the deionized water storage tank 13 to vertically clean the mask version 6.

[0052] Finally, it should be noted that the above specific embodiments are only used to describe the purpose, technical solution, and beneficial effects of this utility model in detail. It should be understood that the above description is only a specific implementation of this utility model and is not intended to limit the protection scope of this utility model. Although this utility model has been described in detail with reference to the foregoing specific embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions or improvements can be made to some or all of the technical features. These modifications, equivalent substitutions, and improvements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this utility model, and they should all be covered within the scope of the claims and specification of this utility model.

Claims

1. An apparatus for removing chromium residue from the edges of a photomask, characterized in that, include: The main body of the device (1) is equipped with an etching solution storage tank (10) and a deionized water storage tank (13) inside; Two liquid spraying devices (5) are slidably connected to the upper surface of the main body (1). A pressure block (505) is provided on the top of the liquid spraying device (5) to prevent the sprayed liquid from immersing into the center of the mask. The mask version (6) is fixed between two liquid spraying devices (5); The etching solution nozzle assembly (8) is fixed on the top of the liquid spraying device (5) and connected to the etching solution storage tank (10) for spraying etching solution onto the edge of the mask version body (6). The deionized water nozzle assembly (9) is fixed on the top of the liquid spraying device (5) and connected to the deionized water storage tank (13) for spraying deionized water onto the edge of the mask version body (6).

2. The apparatus for removing chromium residue from the edge of a photomask according to claim 1, characterized in that, The liquid spraying device (5) also includes a base (501), a telescopic structure (502) and a top beam (504). The base (501) is slidably connected to the upper surface of the device body (1). The lower end of the telescopic structure (502) is connected to the base (501). The top beam (504) is fixed to the upper end of the telescopic structure (502).

3. The apparatus for removing chromium residue from the edge of a photomask according to claim 2, characterized in that, The pressure block (505), the etching solution nozzle assembly (8), and the deionized water nozzle assembly (9) are all fixed to the lower surface of the top crossbeam (504).

4. The apparatus for removing chromium residue from the edge of a photomask according to claim 1, characterized in that, The nozzle of the etching solution nozzle assembly (8) is tilted.

5. The apparatus for removing chromium residue from the edge of a photomask according to claim 1, characterized in that, The upper surface of the main body (1) of the device is equipped with a guide rail (4), and the liquid spraying device (5) is slidably connected to the guide rail (4).

6. The apparatus for removing chromium residue from the edge of a photomask according to claim 1, characterized in that, The upper surface of the main body (1) of the device is magnetically connected to a support column (7), and the mask version body (6) is placed on top of the support column (7).

7. The apparatus for removing chromium residue from the edge of a photomask according to claim 1, characterized in that, The etching solution nozzle assembly (8) includes an etching solution nozzle (801) and a spray pipe (802). The etching solution nozzle (801) is mounted on the spray pipe (802), and the spray pipe (802) is connected to the etching solution storage tank (10).

8. The apparatus for removing chromium residue from the edge of a photomask according to claim 7, characterized in that, The etching solution storage tank (10) is connected to the spray pipe (802) via a liquid pump (11) and a delivery pipeline (12).

9. The apparatus for removing chromium residue from the edge of a photomask according to claim 1, characterized in that, The deionized water nozzle assembly (9) includes a deionized water nozzle (901) and a second spray pipe (902). The deionized water nozzle (901) is installed on the second spray pipe (902), and the second spray pipe (902) is connected to the deionized water storage tank (13).

10. The apparatus for removing chromium residue from the edge of a photomask according to claim 9, characterized in that, The deionized water storage tank (13) is connected to the spray pipe (902) via the second medicine pump (14) and the second delivery pipeline (15).

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