Sliding measuring gauge for depth of target material etching runway
By designing a sliding measurement gauge for the etching runway depth of the target material, and using a positioning disk and a sliding flatness measuring instrument, the problems of low measurement accuracy or high cost in the existing technology are solved, and efficient and low-cost etching runway depth measurement is achieved.
Patent Information
- Application Number
- CN202422983787.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-04
- Publication Date
- 2025-11-04
- Estimated Expiration
- 2034-12-04
AI Technical Summary
In existing technologies, methods for measuring the depth of target etching runways suffer from either low measurement accuracy or high cost, making it difficult to find a balance between cost and accuracy.
A sliding measurement gauge for the etching runway depth of a target material was designed, including a positioning plate, a support, and a sliding flatness measuring instrument. The target material is fixed by the positioning plate, and the etching runway depth is quickly measured by the sliding flatness measuring instrument. The measurement accuracy and efficiency are improved by combining the lifting support and the translation structure.
This approach significantly improves the accuracy and efficiency of target etching runway depth measurement while reducing equipment costs, ensuring the accuracy of measurement results.
Smart Images
Figure CN223512729U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of semiconductor technology, specifically to a sliding measurement gauge for the etching runway depth of a target material. Background Technology
[0002] Etching raceways (also known as etching streaks or etching marks) are a common phenomenon in physical vapor deposition (PVD) processes, especially in sputtering deposition. This phenomenon results in noticeable stripes or raceway-like wear marks on the target surface.
[0003] After the target material is scrapped, the depth of the etched runway needs to be measured. By measuring the etched runway depth of the scrapped target material, the effectiveness of process improvement measures can be verified, such as new target material, optimized magnetic field design, improved gas nozzle, or whether there is abnormal wear on the target material.
[0004] Currently, there are two main methods for measuring the depth of etched runways: one is through measuring scales or instruments (such as flatness measuring instruments), and the other is through optical equipment, which involves photographing the surface of the target material and then performing image processing to obtain information such as the depth of the etched runway.
[0005] The former method requires simpler equipment and has lower measurement costs, but correspondingly, its measurement accuracy is lower and the measurement time is relatively longer. For example, when using a ruler, each etched track needs to be measured individually, which is relatively inefficient. When using a flatness measuring instrument, since the instrument is fixed to a base, the target material needs to be placed on the base, and the depth of the etched track needs to be measured by moving the target. However, because the target is circular, it is inconvenient to limit its movement, and the target is prone to displacement or rotation during movement, which may lead to deviations in the measurement results. The latter method, although having high measurement accuracy and fast processing speed, has higher equipment costs and is difficult to promote and use. Utility Model Content
[0006] This invention provides a sliding measurement gauge for the etching depth of a target material runway, in order to solve the technical problems in the prior art.
[0007] To solve the above problems, the sliding measurement gauge for the etching runway depth of the target material provided by this utility model adopts the following technical solution:
[0008] Including the base;
[0009] A positioning disk for positioning the target material is mounted on the upper surface of the base.
[0010] Two supports are set on both sides of the positioning plate, and the arrangement direction of the two supports is defined as left and right.
[0011] A measuring structure for measuring the depth of the etching track of the target material is located above the positioning disk. The measuring structure includes a load-bearing plate fixedly connected to the bracket, and a flatness measuring instrument that can slide in the left and right direction is provided on the load-bearing plate.
[0012] As a further improvement, a horizontally arranged guide rod is fixedly installed on the front side of the load-bearing plate, and a mounting base is slidably mounted on the guide rod, with the flatness measuring instrument fixedly installed in the mounting base.
[0013] As a further improvement, a translation structure for driving the flatness measuring instrument to slide is installed on the rear side of the load-bearing plate. The load-bearing plate has a sliding groove arranged in the horizontal direction. A connecting block is fixedly installed on the rear side of the mounting base. The connecting block passes through the sliding groove and connects with the translation structure.
[0014] As a further improvement, the translation structure includes a driving wheel and a driven wheel rotatably mounted on the left and right sides of the load-bearing plate. The driving wheel is connected to a motor fixedly mounted on the load-bearing plate. A synchronous belt is wound between the driving wheel and the driven wheel. The connecting block is fixedly connected to the synchronous belt.
[0015] As a further improvement, the bracket is a lifting bracket.
[0016] As a further improvement, a raised plate is fixedly installed at the bottom of the positioning plate, and notches are opened on both the front and rear sides of the positioning plate, with positioning blocks that can slide in the front and rear directions inside the notches.
[0017] As a further improvement, the positioning block is fixedly connected to the raised plate by a spring telescopic rod, and the positioning plate has a buckle structure on both the front and rear sides for limiting the positioning block.
[0018] As a further improvement, the buckle structure includes a connecting plate, and the base has a cavity for accommodating the connecting plate. The height of the cavity is greater than the thickness of the connecting plate, so that the connecting plate can slide up and down in the cavity. A return spring is fixedly installed at the bottom of the connecting plate, and a return block and a locking block are fixedly installed on the upper surface of the connecting plate, respectively. The return block and the locking block extend through the base to the upper surface of the base. The locking block is located between the return block and the positioning plate, and the bottom of the positioning block has a locking groove that cooperates with the locking block.
[0019] As a further improvement, a pressure block for pressing the target material is also fixedly connected to the inner side of the positioning block.
[0020] As a further improvement, a damping rod is also fixedly installed between the positioning block and the raised plate.
[0021] The beneficial effects of the above-mentioned technical solution of this utility model are as follows:
[0022] 1. This utility model provides a flatness measuring instrument that can slide left and right above the positioning plate. During measurement, the positioning plate positions and fixes the target material, and the depth of the etching track on the target material can be quickly measured by sliding the flatness measuring instrument.
[0023] 2. By setting sliding positioning blocks on the front and rear sides of the positioning plate, the positioning blocks are slid to separate the target material from the positioning plate before it is placed. This creates notches on the front and rear sides of the positioning plate, making it easier to place the target material. In addition, a shim plate is also provided inside the positioning plate to facilitate the removal of the target material.
[0024] 3. The inner side of the positioning block is equipped with a pressure block to press and fix the target material, preventing the target material from rotating inside the positioning plate and ensuring the accuracy of the measurement results. Attached Figure Description
[0025] The above and other objects, features, and advantages of the present invention will become readily understood by reading the following detailed description of exemplary embodiments with reference to the accompanying drawings. In the drawings, several embodiments of the present invention are shown by way of example and not limitation, and like or corresponding reference numerals denote like or corresponding parts, wherein:
[0026] Figure 1 This is a three-dimensional schematic diagram of the sliding measurement gauge for the etching runway depth of the target material according to this utility model;
[0027] Figure 2 This is a schematic diagram of the base of the sliding measuring gauge for measuring the depth of the target material etching runway according to this utility model.
[0028] Figure 3 This is a reference diagram showing the usage status of the sliding measurement gauge for measuring the etching depth of the target material runway according to this utility model.
[0029] Explanation of reference numerals in the attached figures:
[0030] 1. Base; 2. Positioning plate; 21. Elevating plate; 22. Positioning block; 23. Pressure block; 24. Slot; 25. Spring telescopic rod; 3. Buckle structure; 31. Locking block; 32. Reset block; 33. Connecting plate; 34. Reset spring; 4. Bracket; 5. Measuring structure; 51. Load-bearing plate; 52. Guide rod; 53. Slide groove; 54. Mounting base; 55. Flatness measuring instrument; 6. Target material. Detailed Implementation
[0031] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Those skilled in the art should understand that the embodiments described below are only some, not all, of the embodiments disclosed. All other embodiments obtained by those skilled in the art based on the embodiments of the present utility model without creative effort are within the scope of protection of the present utility model.
[0032] In the existing technology, when measuring the depth of the etching track of the target material using a ruler or instrument flatness measuring instrument, the cost is lower, but the measurement accuracy is lower and the measurement time is relatively longer. Although optical instruments have high measurement accuracy and fast processing speed, the equipment cost is high and it is difficult to promote their use.
[0033] To address the aforementioned issues, this invention provides a positioning plate on the base for positioning and fixing the target material. Above the positioning plate is a flatness measuring instrument that can slide in the left and right direction. During measurement, the flatness measuring instrument slides from one side of the target material to the other side to measure the depth of each etched track on the target material. This design has a relatively lower manufacturing cost and significantly improves both measurement speed and accuracy.
[0034] The positioning plate has sliding positioning blocks on both the front and rear sides. Before placing the target, sliding the positioning block engages the locking block, creating notches on both sides of the positioning plate. These notches facilitate manual placement of the target. After placement, pressing the reset block lowers the locking block, separating it from the positioning block. A spring-loaded telescopic rod pulls the positioning block back to its original position. Simultaneously, the damping rod prevents excessive sliding speed. After reset, the inner pressure block of the positioning block presses firmly against the target, preventing rotation. After measurement, the positioning block is pulled back to engage the locking block (this state is maintained until the next target is measured; repeat the above steps). The raised plate facilitates manual removal of the target.
[0035] After introducing the basic principles of this utility model, various non-limiting embodiments of this utility model are described in detail below. Any quantity of elements in the accompanying drawings is for illustrative purposes only and not for limitation, and any naming is for distinction only and has no limiting meaning.
[0036] The principles and spirit of this utility model will be explained in detail below with reference to several representative embodiments.
[0037] Example 1 of the sliding measurement gauge for the etching runway depth of the target material provided by this utility model:
[0038] like Figures 1-3 As shown, it includes a base 1, a positioning plate 2 fixedly installed on the upper surface of the base 1, brackets 4 on both sides of the positioning plate 2, and a measuring structure 5 installed on the brackets 4.
[0039] The positioning disk 2 is used to position the target material 6. The positioning disk 2 is circular and has a circular groove for positioning the target material 6. The positioning disk 2 has notches on both the front and rear sides. The notches are equipped with positioning blocks 22 that can slide in the front and rear direction. When placing the target material 6, the positioning disk 2 is separated from the positioning blocks 22, and the notches can facilitate manual placement of the target material 6.
[0040] A shim plate 21 is fixedly installed at the bottom of the positioning plate 2. The shim plate 21 is used to raise the target material 6 to a certain height to prevent the target material 6 from directly contacting the base 1, thereby making it easier to remove the target material 6.
[0041] The positioning block 22 is fixedly connected to the raised plate 21 via the spring telescopic rod 25. The positioning plate 2 has a buckle structure 3 on both the front and rear sides for limiting the positioning block 22, so that after the positioning block 22 is released from the limit, the spring telescopic rod 25 drives the positioning block 22 to reset. In addition, in order to prevent the positioning block 22 from retracting too quickly, damping rods (not shown in the figure) are also provided on the left and right sides of the spring telescopic rod 25 to reduce the retraction speed of the positioning block 22.
[0042] like Figure 2 As shown, in this embodiment, the buckle structure 3 includes a connecting plate 33. The base 1 has a cavity inside for accommodating the connecting plate 33. The height of the cavity is greater than the thickness of the connecting plate 33, so that the connecting plate 33 can slide up and down inside the cavity. A reset spring 34 is fixedly installed at the bottom of the connecting plate 33. A reset block 32 and a locking block 31 are fixedly installed on the upper surface of the connecting plate 33. The reset block 32 and the locking block 31 extend through the base 1 to the upper surface of the base 1. The locking block 31 is located between the reset block 32 and the positioning plate 2. The bottom of the positioning block 22 has a slot 24 that cooperates with the locking block 31.
[0043] In addition, a pressure block 23 for pressing the target material 6 is fixedly connected to the inner side of the positioning block 22. The lower surface of the pressure block 23 includes an inclined section and a flat section. The inclined section is located on the side close to the center of the positioning disk 2, which facilitates clamping the target material 6.
[0044] Two supports 4 are respectively set on the left and right sides of the positioning plate 2. The supports 4 are lifting supports 4. In this embodiment, the lifting supports 4 are manual lifting supports 4, which include a sleeve and a sliding rod slidably assembled in the sleeve. The side of the sleeve is threaded with a locking bolt for tightening the sliding rod. In other embodiments, an electric lifting support 4 can also be used to adjust the height of the measuring structure 5.
[0045] The measuring structure 5 is used to measure the depth of the etching track of the target material 6. The measuring structure 5 is located above the positioning disk 2. The measuring structure 5 includes a load-bearing plate 51 fixedly connected to the bracket 4. A flatness measuring instrument 55 that can slide in the left and right direction is provided on the load-bearing plate 51.
[0046] A horizontally arranged guide rod 52 is fixedly installed on the front side of the load-bearing plate 51. A mounting base 54 is slidably mounted on the guide rod 52, and a flatness measuring instrument 55 is fixedly installed in the mounting base 54.
[0047] A translation structure for driving the flatness measuring instrument 55 to slide is installed on the rear side of the load-bearing plate 51. The load-bearing plate 51 has a horizontally oriented groove 53. A connecting block is fixedly installed on the rear side of the mounting base 54. The connecting block passes through the groove 53 and connects with the translation structure.
[0048] In this embodiment, the translation structure includes a driving wheel and a driven wheel rotatably mounted on the left and right sides of the load-bearing plate 51. The driving wheel is connected to a motor fixedly mounted on the load-bearing plate 51. A synchronous belt is wound between the driving wheel and the driven wheel, and the connecting block is fixedly connected to the synchronous belt.
[0049] Example 2 of the sliding measurement gauge for the etching runway depth of the target material provided by this utility model:
[0050] Its main difference from Example 1 is:
[0051] In Example 1, the translation structure includes a driving wheel and a driven wheel that are rotatably mounted on the left and right sides of the load-bearing plate. The driving wheel is connected to a motor that is fixedly mounted on the load-bearing plate. A synchronous belt is wound between the driving wheel and the driven wheel. The connecting block is fixedly connected to the synchronous belt.
[0052] In this embodiment, the translation structure is a lead screw and nut structure.
[0053] Example 3 of the sliding measurement gauge for the etching runway depth of the target material provided by this utility model:
[0054] Its main difference from Example 1 is:
[0055] In this embodiment, the base is also provided with two slide rails arranged in the front-back direction. The two slide rails are located on the left and right sides of the positioning plate, respectively. Sliders are slidably assembled in the slide rails. Bolts for limiting the position are threaded on the sliders. Two lifting brackets are fixedly connected to the two sliders, so that the position of the measuring structure can be adjusted in the front-back direction.
[0056] While this specification has shown and described numerous embodiments of the present invention, it will be apparent to those skilled in the art that such embodiments are provided by way of example only. Many modifications, alterations, and alternatives will occur to those skilled in the art without departing from the spirit and intent of the present invention. It should be understood that various alternatives to the embodiments of the present invention described herein may be employed in the practice of the present invention. The appended claims are intended to define the scope of protection of the present invention and therefore cover the modular compositions, equivalents, or alternatives within the scope of these claims.
Claims
1. A sliding gauge for measuring the depth of a target etching runway, characterized in that, include: Base (1); Positioning disk (2) is used to position the target material (6), and the positioning disk (2) is mounted on the upper surface of the base (1); Two supports (4) are respectively set on both sides of the positioning plate (2), and the arrangement direction of the two supports (4) is defined as the left and right direction; The measuring structure (5) is used to measure the depth of the etching track of the target material (6). The measuring structure (5) is located above the positioning disk (2). The measuring structure (5) includes a load-bearing plate (51) fixedly connected to the bracket (4). A flatness measuring instrument (55) that can slide in the left and right direction is provided on the load-bearing plate (51).
2. The sliding measurement gauge for the etching runway depth of the target material according to claim 1, characterized in that: A horizontally arranged guide rod (52) is fixedly installed on the front side of the load-bearing plate (51), and a mounting base (54) is slidably mounted on the guide rod (52). The flatness measuring instrument (55) is fixedly installed in the mounting base (54).
3. The sliding measurement gauge for the etching runway depth of the target material according to claim 2, characterized in that: The load-bearing plate (51) is equipped with a translation structure for driving the flatness measuring instrument (55) to slide. The load-bearing plate (51) has a sliding groove (53) arranged in the horizontal direction. The mounting base (54) is fixedly installed with a connecting block, which passes through the sliding groove (53) and connects to the translation structure.
4. The sliding measurement gauge for the etching runway depth of the target material according to claim 3, characterized in that: The translation structure includes a driving wheel and a driven wheel that are rotatably mounted on the left and right sides of the load-bearing plate (51). The driving wheel is connected to a motor that is fixedly mounted on the load-bearing plate (51). A synchronous belt is wound between the driving wheel and the driven wheel. The connecting block is fixedly connected to the synchronous belt.
5. The sliding measurement gauge for the etching runway depth of the target material according to claim 1, characterized in that: The bracket (4) is a lifting bracket (4).
6. The sliding measurement gauge for the etching runway depth of the target material according to claim 1, characterized in that: The bottom of the positioning plate (2) is fixedly installed with a pad plate (21). The positioning plate (2) has notches on both the front and rear sides, and a positioning block (22) that can slide in the front and rear direction is provided in the notches.
7. The sliding measurement gauge for the etching runway depth of the target material according to claim 6, characterized in that: The positioning block (22) is fixedly connected to the pad plate (21) by a spring telescopic rod (25), and the positioning disk (2) is provided with a buckle structure (3) on both the front and rear sides for limiting the positioning block (22).
8. The sliding measurement gauge for the etching runway depth of the target material according to claim 7, characterized in that: The buckle structure (3) includes a connecting plate (33). The base (1) has a cavity for accommodating the connecting plate (33). The height of the cavity is greater than the thickness of the connecting plate (33), so that the connecting plate (33) can slide up and down in the cavity. A reset spring (34) is fixedly installed at the bottom of the connecting plate (33). A reset block (32) and a locking block (31) are fixedly installed on the upper surface of the connecting plate (33). The reset block (32) and the locking block (31) extend through the base (1) to the upper surface of the base (1). The locking block (31) is located between the reset block (32) and the positioning plate (2). The bottom of the positioning block (22) has a slot (24) that cooperates with the locking block (31).
9. The sliding measurement gauge for the etching runway depth of the target material according to claim 8, characterized in that: The inner side of the positioning block (22) is also fixedly connected to a pressure block (23) for pressing the target material (6).
10. The sliding measurement gauge for the etching runway depth of the target material according to any one of claims 7-9, characterized in that: A damping rod is also fixedly installed between the positioning block (22) and the pad plate (21).