Preparation system for photosensitive dry film

Abstract

The utility model discloses a preparation system for a photosensitive dry film, which comprises a first feeding roll for correspondingly conveying a PET (Polyethylene Terephthalate) base film, a coating machine for coating one side surface of the PET base film to form a photosensitive layer is arranged at the downstream of the first feeding roll, and a drying oven for baking and drying the PET base film coated with the photosensitive layer is arranged at the downstream of the coating machine; a film pressing roller for covering a protective film on the outer side of the dried photosensitive layer is arranged at the downstream of the drying oven, and a material receiving roller is arranged at the downstream of the film pressing roller. The preparation system can efficiently and continuously prepare the photosensitive dry film. According to the photosensitive dry film prepared by the utility model, a composite design thought of multifunctional components is adopted, the problems of insufficient mobility, degradability and resolution of the photosensitive dry film are systematically solved, and excellent comprehensive performance can be obtained.

Description

TECHNICAL FIELD

[0001] The utility model relates to a kind of preparation systems for photosensitive dry film. BACKGROUND

[0002] Photosensitive dry film is widely used in electronic, printed circuit board (PCB) manufacturing and other fields. Photosensitive dry film plays a key role in PCB manufacturing. Through the irradiation of ultraviolet light, a stable adherend is generated to tightly adhere to the surface of the copper plate, effectively blocking electroplating, etching and hole masking, and accurately transferring the PCB design pattern to the actual product.

[0003] The existing photosensitive dry film generally has the problems of insufficient resolution, performance degradation caused by photoinitiator migration or degradation, and insufficient mechanical properties and chemical resistance of the photosensitive layer. For example, the photoinitiator in the photosensitive layer generally has the problems of uneven distribution or excessive particle size, which can cause light scattering in the photosensitive layer, reducing the clarity of the exposure pattern. In addition, the absorption efficiency of photoinitiators to ultraviolet light is limited, and the utilization of light energy is insufficient, which can also affect the exposure effect. Photoinitiators are small molecular compounds, which are prone to migrate from the photosensitive layer matrix, especially under high temperature or long-term storage conditions. Photoinitiators can decompose or deteriorate when exposed to light and oxygen, forming inactive by-products. Photosensitive dry film needs to undergo multiple chemical treatments such as development and etching during processing. If the photosensitive layer has insufficient solvent resistance or mechanical strength, it is prone to damage, warping and other problems.

[0004] The existing photosensitive dry film usually focuses on the improvement of a single performance, such as photoinitiating efficiency or mechanical properties, but lacks a systematic approach to the composite design of multifunctional components, and cannot simultaneously solve the problems of migration, degradation and resolution.

[0005] In addition, the existing technology also lacks a special system for preparing photosensitive dry film, which cannot efficiently and continuously prepare photosensitive dry film. SUMMARY

[0006] The technical problem to be solved by the utility model is to provide a preparation system for photosensitive dry film to reduce or avoid the problems mentioned above.

[0007] To solve the above technical problems, the utility model provides a preparation system for photosensitive dry film, which comprises: a first feeding roll corresponding to the conveying of PET base film, a coating machine is arranged downstream of the first feeding roll to form a photosensitive layer on one side surface of the PET base film, an oven is arranged downstream of the coating machine to bake and dry the PET base film coated with the photosensitive layer, a film pressing roller is arranged downstream of the oven to cover a protective film on the outer side of the dried photosensitive layer, and a receiving roller is arranged downstream of the film pressing roller.

[0008] Preferably, the preparation system further comprises a second feeding roll for corresponding delivery of a protective film to the calender roller pair.

[0009] Preferably, the preparation system further comprises a coating tank for corresponding delivery of a coating liquid to the coating machine.

[0010] Preferably, the preparation system further comprises a stirred tank for corresponding preparation of the coating liquid, an outlet of the stirred tank being connected to an inlet of a vacuum defoaming device, an outlet of the vacuum defoaming device being provided with a filter device, and an outlet of the filter device being connected to an inlet of the coating tank.

[0011] The photosensitive dry film prepared by the present application adopts a composite design idea of multiple functions, and systematically solves the problems of migration, degradation and insufficient resolution of the photosensitive dry film, and can obtain excellent comprehensive performance. In addition, the present application also proposes a special system for preparing the above-mentioned photosensitive dry film, which can efficiently and continuously prepare the photosensitive dry film. BRIEF DESCRIPTION OF DRAWINGS

[0012] The following drawings are only intended to illustrate and explain the present application, and do not limit the scope of the present application.

[0013] Figure 1 The structure of the photosensitive dry film according to one embodiment of the present application is shown.

[0014] Figure 2 The structure of the preparation system for the photosensitive dry film according to one embodiment of the present application is shown. DETAILED DESCRIPTION

[0015] In order to have a clearer understanding of the technical features, objects and effects of the present application, the specific embodiments of the present application will be described with reference to the drawings. In the drawings, the same components are denoted by the same reference numerals.

[0016] As shown in Figure 1 The present application proposes a photosensitive dry film, which is composed of a PET base film 1 as a bearing layer, a photosensitive layer 2 in the middle, and a protective film 3 covering the outer side of the photosensitive layer 2. The PET base film 1 mainly plays a supporting and protective role in the preparation and use of the photosensitive dry film, ensuring the integrity and flatness of the dry film. The PET base film 1 usually selects a transparent film as the base material layer, ensuring that its light transmittance is high and the haze is low. The protective film 3 covers the photosensitive layer 2 to protect the photosensitive layer 2 from pollution and mechanical damage, and is usually made of polyethylene (PE).

[0017] In one specific embodiment, the thickness of the PET base film 1 is 25-100 μm, preferably 50-75 μm; the thickness of the photosensitive layer 2 is 5-30 μm, preferably 10-15 μm; and the thickness of the protective film 3 is 20-50 μm, preferably 30-40 μm. If the thickness of each film layer of the photosensitive dry film is too thin, there may be problems of insufficient mechanical strength, poor protection effect, adhesion, etc., and if the thickness is too thick, there may be problems of inconvenience in operation, resolution reduction, and cost increase.

[0018] In use, the photosensitive dry film is first removed of the protective film 3, and then the photosensitive layer 2 is attached to the surface of the copper metal layer of the PCB board, and then subsequent process steps such as exposure, development, etching, etc. are performed to complete the transfer of the circuit pattern. The use of the photosensitive dry film is not described in detail herein, as it is known in the art.

[0019] The most core component of the photosensitive dry film is the photosensitive layer. To solve the problem that the existing photosensitive dry film cannot simultaneously solve the problems of migration, degradation and resolution, the present application proposes an improved photosensitive layer composition. In one specific embodiment, the photosensitive layer 2 of the present application is prepared from the following raw materials by weight: epoxy acrylate resin 40-50 parts by weight, nano-particle composite photoinitiator 5-8 parts by weight, trimethylolpropane triacrylate (TMPTA) 10-15 parts by weight, nano-silica 3-5 parts by weight, benzotriazole ultraviolet absorber 1-2 parts by weight, fluorinated polyether 0.5-1 parts by weight, and dimethylformamide (DMF) 20-30 parts by weight. The nano-particle composite photoinitiator is a photoinitiator composed of nano-titanium dioxide and 1-phenyl-1,2-propanedione (BDK). The composite design of TiO2 and BDK can utilize

[0020] the surface catalysis of TiO2 and the enhanced light absorption performance to fix the photoinitiator molecules, reduce their migration or evaporation, and significantly improve the light curing efficiency and material stability.

[0021] Specifically, the epoxy acrylate resin can be EBA-600 produced by Mitsubishi Chemical, which has a viscosity of 2000 mPa·s (25°C), high crosslinking density, good chemical resistance and weather resistance. Trimethylolpropane triacrylate (TMPTA) can be a TMPTA product with a viscosity of 300 mPa·s (25°C) produced by BASF. Nano-silica can be nano-silica with a particle size of 15-30 nm produced by Shin-Etsu Chemical, Japan. Benzotriazole ultraviolet absorber can be, for example, UV-360 from Lanxess, Germany. Fluorinated polyether can be FPA-1200 from Dow Chemical. Dimethylformamide (DMF) as a solvent can be a conventional industrial-grade

[0022] DMF.

[0023] In one embodiment, the nanoparticle composite photoinitiator of the present application is prepared from 8-12 parts by weight of nano-titanium dioxide (TiO2), 6-10 parts by weight of photoinitiator BDK (1-phenyl-1,2-propanedione), 1-2 parts by weight of gamma-methacryloxypropyltrimethoxysilane (KH570), and 70-90 parts by weight of isopropyl alcohol (IPA).

[0024] Specifically, the nano-titanium dioxide can be selected from 10-15 nm specifications of TiO2 produced by Japan Ishihara or DuPont. The 1-phenyl-1,2-propanedione can be selected from the BDK photoinitiator product produced by Sigma-Aldrich, which has good ultraviolet absorption characteristics at 365 nm. The KH570 can be selected from KBM-520 produced by Shin-Etsu Chemical, GENIOSIL GF31 produced by Wacker Chemie, or Z-6030 produced by Dow Corning, etc.

[0025] In another embodiment, the nanoparticle composite photoinitiator of the present application can be prepared by the following steps.

[0026] For example, first take 70-90 parts by weight of isopropyl alcohol (IPA) and add it to a clean reaction vessel, and start low-speed stirring (300 rpm). Under stirring, gradually add 8-12 parts by weight of nano-TiO2, avoiding excessive one-time feeding. Use an ultrasonic disperser to treat for 30 minutes, with a frequency setting of 40 kHz, to ensure uniform dispersion of nano-TiO2 without obvious agglomeration.

[0027] Then, add 1-2 parts by weight of KH570 dropwise to the dispersion liquid in the reaction vessel, stir for about 5 minutes after each drop to ensure uniform distribution. Heat the system to 40℃ and continue stirring for 1 hour. This step helps to improve the binding capacity of nano-TiO2 and photoinitiator, and enhances the stability of the composite material.

[0028] After that, gradually add 6-10 parts by weight of BDK to the modified TiO2 dispersion liquid, and control the addition rate to avoid excessive local concentration. Continue stirring for 1 hour to ensure uniform adsorption of BDK to the surface of TiO2.

[0029] Then, transfer the entire system to a sealed reaction vessel and maintain 40℃ stirring for 2 hours to allow

[0030] BDK and modified TiO2 form stable physical and chemical bonds. The stirring speed is 150-200 rpm.

[0031] Afterwards, the reaction completed system is transferred to a centrifuge for standing for 30-60 minutes, and then the solid product is separated by centrifugation (5000 rpm, 10 minutes). The separated solid product is washed with anhydrous ethanol for 3 times to remove unreacted KH570 and free BDK. The washed solid is placed in a vacuum drying oven for drying at 40-50°C for 12 hours to obtain a dry powder. After drying, the product is sieved through a 100 mesh sieve to remove large particle agglomerates to obtain a uniform TiO2@BDK powder. The powder is sealed and stored in a light-proof dry container for standby use.

[0032] Further, in one specific embodiment, the photosensitive dry film of the present application can be prepared by the following process.

[0033] For example, a coating liquid for the photosensitive layer 2 can be prepared first, and the steps are as follows.

[0034] 40-50 parts by weight of epoxy acrylate resin is added to a stirring kettle, and 10-15 parts by weight of trimethylolpropane triacrylate (TMPTA) is slowly added to the stirring kettle at room temperature, and stirring is maintained to uniformly mix the system. 20-30 parts by weight of dimethylformamide (DMF) is continuously added to the stirring kettle while stirring to facilitate the dispersion of subsequent components. Then 3-5 parts by weight of nano-silicon dioxide is slowly added to the stirring kettle to avoid the accumulation of particles at one time. High-speed stirring (speed 3000-5000 rpm) is maintained for 30 minutes to ensure uniform distribution of particles.

[0035] While maintaining high-speed stirring at 3000-5000 rpm, 5-8 parts by weight of TiO2@BDK nanoparticle composite photoinitiator is added to the stirring kettle, and the temperature is maintained at 25-30°C, and stirring is continued for 30 minutes to ensure complete dispersion and combination with the main system. 1-2 parts by weight of a benzotriazole ultraviolet absorber is added to the stirring kettle, and low-speed stirring (500-1000 rpm) is maintained for 10 minutes to prevent local over-concentration leading to uneven dispersion. While maintaining low-speed stirring, 0.5-1 parts by weight of fluorinated polyether is slowly added dropwise, and stirring is continued for 10 minutes to ensure uniform distribution.

[0036] The mixed system is transferred from the stirring kettle to a vacuum degassing device, and maintained at -0.08 MPa for 30 minutes to remove residual bubbles in the system. The mixed system is filtered using a 5-10 μm filter to obtain a coating liquid for the photosensitive layer 2. Micron-sized particles or impurities that may be present are removed by filtration to ensure optical uniformity of the subsequent film formation. The filtered coating liquid is transferred to a coating tank for standby use.

[0037] In the preparation process of the coating liquid, the nano-SiO2 needs to be added and dispersed before the photo initiator TiO2@BDK to avoid affecting the uniformity of the latter. The temperature should be strictly controlled during preparation (not more than 80°C) to avoid initiating the photopolymerization reaction of the system.

[0038] After the coating liquid is prepared, it can be further used to prepare the photosensitive dry film.

[0039] For example, the coating liquid is uniformly coated on the PET base film 1 using a coating machine, and the coating thickness is controlled to be 10-15 μm. Then the coated PET base film 1 is placed in an oven and dried at 60-80°C for 5 minutes to remove the residual solvent in the system. Finally, a protective film 3 is attached to the dried photosensitive layer to complete the preparation of the photosensitive dry film.

[0040] Corresponding to the above preparation process, the utility model also proposes a preparation system for preparing the above-mentioned photosensitive dry film, as shown in Figure 2

[0041] Referring to Figure 2 , the preparation system of the utility model comprises: a first feeding roll 100 corresponding to the conveying PET base film 1, a coating machine 200 is arranged downstream of the first feeding roll 100 to form a photosensitive layer 2 on one side surface of the PET base film 1, an oven 300 is arranged downstream of the coating machine 200 to bake and dry the PET base film 1 coated with the photosensitive layer 2, a film pressing roller 400 is arranged downstream of the oven 300 to cover the protective film 3 on the outer side of the dried photosensitive layer 2, and a material receiving roller 500 is arranged downstream of the film pressing roller 400.

[0042] Further, the preparation system of the utility model can further comprise a second feeding roll 401 corresponding to the film pressing roller 400 to convey the protective film 3, as shown in the figure.

[0043] Further, the preparation system of the utility model can further comprise a coating tank 201 corresponding to the coating machine 200 to convey the coating liquid, which is used to continuously supply the coating liquid to the coating machine 200 through the coating tank 201 to obtain the effect of continuous production with high quality, as shown in the figure.

[0044] Further, the preparation system of the utility model can further comprise a stirred tank 202 corresponding to the preparation of the coating liquid, the outlet of the stirred tank 202 is connected to the inlet of a vacuum defoaming device 203, the outlet of the vacuum defoaming device 203 is provided with a filtering device 204, and the outlet of the filtering device 204 is connected to the inlet of the coating tank 201. The stirring device, heating device, etc. can be fixedly arranged in the stirred tank 202. The filtering device 204 is provided with a filter screen with a pore size of 5-10 μm for filtering and removing possible micron-sized particles or impurities.

[0045] ​The photosensitive dry film prepared by the preparation system can be tested for performance according to the following standards.

[0046] Resolution test: exposure and development on a standard photolithography equipment, using a scanning electron microscope (SEM) to measure the minimum line width and pitch that the photosensitive dry film can clearly distinguish.

[0047] Photosensitive response efficiency (photo-initiation rate) test: test the initial exposure time of the photosensitive dry film by an exposure meter, measure the ultraviolet light intensity (365nm), to determine the response efficiency of the photo-initiator, test standard ISO 10640 (photo-initiator performance test).

[0048] Peeling strength test: adhere the photosensitive dry film to the PCB copper foil, after exposure and development, use a peeling instrument to test the adhesion of the dry film to the substrate, measure the standard ASTM D3330 (peeling strength test).

[0049] Chemical resistance test: immerse the developed photosensitive dry film sample in commonly used chemical reagents (such as alkaline developer, etching solution), observe the changes in appearance and performance, test standard ISO 2812 (coating chemical resistance test).

[0050] Mechanical property test: use a tensile testing machine to determine the maximum tensile strength and elongation at break of the dry film. Test standard ASTM D882 (thin film tensile property test).

[0051] Light transmittance test: use an ultraviolet-visible spectrophotometer to determine the transmittance of the dry film in the ultraviolet range (365nm). Test standard ISO 9050 (optical transmittance test).

[0052] Thermal stability test: use a thermal mechanical analyzer (TMA) to determine the glass transition temperature (Tg) and thermal decomposition temperature (Td) of the photosensitive dry film. Test standard ASTM E831 (thermal mechanical analysis).

[0053] The photosensitive dry films of the three examples are shown in the following weight parts, and the performance parameters of each example are tested.

[0054] Component Example 1 Example 2 Example 3 Epoxy acrylate resin 40 45 50 Nanoparticle composite photoinitiator 5 6.5 8 Trimethylolpropane triacrylate (TMPTA) 10 12.5 15 Nanosilica 3 4 5 Benzotriazole-based ultraviolet absorber 1 1.5 2 Fluorinated polyether 0.5 0.75 1 Dimethylformamide (DMF) 30 25 20

[0055] The performance parameters of the three examples are as follows.

[0056] Performance index Example 1 Example 2 Example 3 Resolution (pm) ≤1.5 ≤1.0 ≤0.8 Photosensitive response efficiency (sec) 3.2 2.5 2.0 Peeling strength (N / cm) 1.3 1.5 1.8 Chemical resistance Surface integrity, no change Surface integrity, no change Surface integrity, no change Tensile strength (MPa) 55 65 75 Elongation at break (%) 15 20 25 Light transmittance (%) 12 8 5 Glass transition temperature (Tg) 72℃ 80℃ 88℃ Thermal decomposition temperature (Td, 5% weight loss) 185℃ 190℃ 200℃

[0057] The fine line processing capability of the photosensitive dry film prepared by the preparation method can be improved from 3 microns to microns, and the photosensitive dry film is suitable for higher precision electronic circuits. After development, the residue of the peeling process of the photosensitive layer is reduced by more than 80%, and the amount of developing solution is reduced by 20%. The photosensitive layer is tested in an acid-base solution (pH 2-12) and a high-humidity high-temperature environment (85 DEG C, 85 RH) for 7 days, and the film layer has no degradation phenomenon. The process of the photosensitive dry film of the utility model has strong adaptability, the service life is prolonged by more than 2 years, and a high cost-effective solution is provided for high-end microelectronic processing.

[0058] The following comparative example schemes are designed and provided for comparison.

[0059]

[0060] Among them, comparative examples 1-3 are adjustments based on example 1, by reducing main components or key components (photoinitiator, ultraviolet absorber), comparing resolution, photosensitive response efficiency and chemical stability. Comparative examples 4-6 are adjustments based on example 2, by adjusting the ratio of film forming material and crosslinking agent, or replacing specific functional additives (such as fluorinated polyether and nanosilica), comparing mechanical properties and peeling performance. Comparative examples 7-9 are adjustments based on example 3, by reducing crosslinking agent and photoinitiator or replacing solvent, comparing resolution, photosensitive response efficiency and mechanical strength.

[0061] The following are the performance parameters of comparative examples 1-9.

[0062]

[0063]

[0064] Through examples 1-3 and comparative examples 1-9, it can be analyzed that in the photosensitive layer of the utility model, epoxy acrylate resin as the main film forming material can provide mechanical strength, flexibility and film forming property. For example, in comparative example 1, the proportion of epoxy acrylate resin is reduced, and the tensile strength and elongation at break are significantly reduced, indicating that it is the core of the structure and mechanical properties of the photosensitive dry film. In comparative example 4, the ratio of resin and crosslinking agent is adjusted, and the thermal stability and mechanical properties are unbalanced, indicating the importance of reasonable ratio to performance optimization.

[0065] The nanoparticle composite photoinitiator (TiO2@BDK) can improve the photoinitiation efficiency, enhance the resolution, and reduce the migration by surface modification of the nanoparticles. For example, in Comparative Example 2, the nanoparticle composite photoinitiator was removed and only the ordinary photoinitiator was used, the photosensitive response efficiency decreased, and the resolution significantly deteriorated, indicating that the composite photoinitiator significantly improves the performance of photolithography through the uniform dispersion and synergistic effect of the nanoparticles. In Comparative Example 8, the proportion of the photoinitiator was reduced, further confirming the decisive influence of the content of the photoinitiator on the photosensitive performance.

[0066] Trimethylolpropane triacrylate (TMPTA) as a multifunctional crosslinking agent can enhance the photopolymerization degree and mechanical properties. For example, in Comparative Example 7, the proportion of TMPTA was reduced, the resolution and mechanical strength decreased, indicating that insufficient crosslinking agent led to incomplete photopolymerization. In Comparative Example 4, adjusting the proportion of the crosslinking agent increased the strength, but sacrificed the flexibility, verifying that accurate control of the amount of crosslinking agent is the key to achieving a balanced performance.

[0067] Nanosilica can enhance the mechanical properties and chemical resistance of the dry film, reduce light scattering, and improve resolution. For example, in Comparative Example 6, the tensile strength and chemical resistance decreased significantly when the nanosilica was removed, indicating that the addition of inorganic nanofillers plays an irreplaceable role in enhancing the performance of the dry film. Nanosilica can improve the stability of the overall performance by forming a uniformly dispersed microstructure.

[0068] Benzotriazole ultraviolet absorbers can protect the photosensitive layer, reduce the degradation of the film by ultraviolet light, and improve long-term stability. For example, in Comparative Example 3, the chemical resistance and thermal stability decreased, and the photosensitive layer showed signs of degradation when the ultraviolet absorber was removed, indicating the important role of the absorber in improving the anti-aging performance.

[0069] Fluorinated polyether can provide excellent release performance, prevent the photosensitive layer from adhering to the substrate, and optimize the surface lubricity. For example, in Comparative Example 5, the release strength decreased and the lubricity deteriorated when ordinary silicone oil was used instead of fluorinated polyether, proving that fluorinated polyether has better interface adjustment effect.

[0070] Dimethylformamide (DMF) as a solvent can ensure the uniform dispersibility and stability of the formulation. For example, in Comparative Example 9, PMA was used to replace DMF, and the resolution and photosensitive response efficiency slightly decreased, indicating that DMF has more advantages in solubility and uniformity of coating.

[0071] Overall, the photosensitive dry film has the following advantages: (1) high resolution and photosensitive response efficiency. The composite nanoparticle photoinitiator and the optimized crosslinking agent ratio make the dry film resolution reach ≤0.8 μm, the photosensitive response efficiency is significantly improved, and it is suitable for high-precision photolithography application. (2) Excellent chemical resistance and thermal stability. The synergistic effect of nanosilica and ultraviolet absorber enhances the chemical resistance, and the dry film still performs well in high temperature and corrosive environment, and has good long-term stability. (3) Anti-migration and environmental protection. The combination of nanoparticles and photoinitiators reduces migration, while low solvent volatility design reduces environmental pollution, meeting modern environmental protection requirements. (4) Surface lubricity and peeling performance optimization. Fluorinated polyether provides excellent peeling performance, making the dry film more operable during use, while preventing substrate adhesion problems. (5) Systematic composite design. In view of the defects of the prior art, the utility model adopts the composite design idea of multifunctional components, and systematically solves the problems of migration, degradation and resolution of the photosensitive dry film. Each component realizes excellent comprehensive performance through synergistic optimization.

[0072] Those skilled in the art should understand that although the utility model is described in the manner of multiple embodiments, not every embodiment contains only one independent technical solution. The description is only for the sake of clarity, those skilled in the art should understand the specification as a whole, and the technical solutions involved in each embodiment should be understood as the way of combining different embodiments to understand the protection scope of the utility model.

[0073] The above is only a specific embodiment of the utility model, and is not used to limit the scope of the utility model. Any equivalent changes, modifications and combinations made by those skilled in the art without departing from the concept and principles of the utility model shall fall within the scope of protection of the utility model.

Claims

1. A preparation system for photosensitive dry film, which is composed of a PET base film (1), an intermediate photosensitive layer (2) and a protective film (3) covering the outer side of the photosensitive layer (2), the thickness of the PET base film (1) is 25-100 μm; the thickness of the photosensitive layer (2) is 5-30 μm; the thickness of the protective film (3) is 20-50 μm; characterized in that, The preparation system comprises a first feeding roll (100) corresponding to the conveying of the PET base film (1), a coating machine (200) downstream of the first feeding roll (100) for coating a photosensitive layer (2) on one side surface of the PET base film (1), an oven (300) downstream of the coating machine (200) for baking and drying the PET base film (1) coated with the photosensitive layer (2), a film pressing roller (400) downstream of the oven (300) for covering the outer side of the dried photosensitive layer (2) with a protective film (3), and a receiving roller (500) downstream of the film pressing roller (400).

2. The preparation system of claim 1, wherein, Further comprising a second feeding roll (401) corresponding to the conveying of the protective film (3) to the film pressing roller (400).

3. The preparation system of claim 1, wherein, Further comprising a coating tank (201) corresponding to the conveying of a coating liquid to the coating machine (200).

4. The preparation system of claim 3, wherein, Further comprising a stirred tank (202) corresponding to the preparation of the coating liquid, an outlet of the stirred tank (202) being connected to an inlet of a vacuum defoaming device (203), an outlet of the vacuum defoaming device (203) being provided with a filtering device (204), and an outlet of the filtering device (204) being connected to an inlet of the coating tank (201). Further comprising a stirred tank (202) corresponding to the preparation of the coating liquid, an outlet of the stirred tank (202) being connected to an inlet of a vacuum defoaming device (203), an outlet of the vacuum defoaming device (203) being provided with a filtering device (204), and an outlet of the filtering device (204) being connected to an inlet of the coating tank (201).

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