Magnetron sputtering cathode device and magnetron sputtering coating machine

Abstract

The utility model relates to the field of magnetron sputtering processing, and discloses a magnetron sputtering cathode device and a magnetron sputtering coater, the magnetron sputtering cathode device comprises a sputtering baffle plate, a target material assembly and a magnetic bar assembly, the target material assembly comprises a cylindrical target material, the peripheral surface of the cylindrical target material is arranged opposite to the sputtering baffle plate, and the magnetic bar assembly is arranged on the sputtering baffle plate. The target material assembly can rotate in the circumferential direction of the cylindrical target material relative to the sputtering baffle, the magnetic rod assembly comprises a magnetic rod coaxially arranged in the cylindrical target material, and the magnetic rod assembly can rotate in the circumferential direction of the magnetic rod relative to the cylindrical target material. The magnetron sputtering cathode device disclosed by the utility model can omit a target washing step in an operation process, so that the working efficiency of coating is greatly improved.

Description

Technical Field

[0001] This utility model belongs to the field of magnetron sputtering processing, specifically, it relates to a magnetron sputtering cathode device and a magnetron sputtering coating machine. Background Technology

[0002] Magnetron sputtering coating is a coating technology that uses the coating material as the target cathode, and uses argon ions to bombard the target material to generate cathode sputtering, which sputters the target material atoms onto the workpiece to form a deposition layer.

[0003] In existing technologies, magnetron sputtering coating machines typically include a vacuum chamber, a cylindrical target, a magnetic rod, and a mounting plate. The cylindrical target, magnetic rod, and mounting plate are all housed in the vacuum chamber, with the cylindrical target and mounting plate facing each other. The magnetic rod is placed inside the cylindrical target and has a working surface for generating a magnetic field for sputtering. During the sputtering process, the working surface of the magnetic rod faces the mounting plate, and the cylindrical target rotates continuously. The magnetic field generated by the working surface of the magnetic rod causes cathode sputtering to occur on the part of the cylindrical target facing the mounting plate, sputtering target atoms onto the workpiece on the mounting plate. When changing workpieces on the mounting plate, the magnetron sputtering coating machine needs to be stopped to prevent the cylindrical target from continuing to sputter and affecting the internal environment of the vacuum chamber. However, when the magnetron sputtering coating machine is stopped for a long time, the temperature of the cylindrical target will drop, and an oxide layer or dirt will appear on its surface. Therefore, the cylindrical target needs to be cleaned before coating. Specifically, a blind plate is installed on the mounting plate, and the magnetron sputtering coating machine is started to rotate the cylindrical target for a period of time, thereby raising the temperature of the cylindrical target to a suitable operating temperature and removing the oxide layer or dirt from its surface. In other words, each time a workpiece is changed, a considerable amount of time is wasted on target cleaning, resulting in low coating efficiency. Utility Model Content

[0004] In view of the above-mentioned deficiencies or defects in the existing technology, this utility model provides a magnetron sputtering cathode device and a magnetron sputtering coating machine, aiming to solve the technical problem of low working efficiency of existing magnetron sputtering coating.

[0005] To achieve the above objectives, this utility model provides a magnetron sputtering cathode device, the magnetron sputtering cathode device comprising:

[0006] Splash baffle;

[0007] The target assembly includes a cylindrical target, which is disposed opposite to the sputtering baffle;

[0008] A magnetic rod assembly includes a magnetic rod coaxially disposed within the cylindrical target material;

[0009] A rotation drive assembly drives the target assembly and the magnetic rod assembly.

[0010] Optionally, the rotary drive assembly includes a bidirectional rotary drive member and a unidirectional transmission mechanism. The target assembly and the magnetic rod assembly are connected through the unidirectional transmission mechanism, and the bidirectional rotary drive member drives the target assembly.

[0011] Optionally, the unidirectional transmission mechanism includes a pawl and a toothed structure that is connected to the pawl in a transmission manner. One of the pawl and the toothed structure is disposed on the target material assembly, and the other is disposed on the magnetic rod assembly.

[0012] Optionally, the target assembly further includes a target base, on which the cylindrical target is mounted; the magnetic rod assembly further includes a magnetic rod base, on which the magnetic rod is mounted.

[0013] One of the pawl and the toothed structure is disposed on the target base, and the other is disposed on the magnetic rod base.

[0014] Optionally, the magnetic rod base penetrates the target base, one end of the cylindrical target and one end of the magnetic rod are respectively fixedly installed on the target base and the magnetic rod base, the pawl is installed on the target base, and the toothed structure is formed on the magnetic rod or the magnetic rod base.

[0015] Optionally, the toothed structure includes a plurality of toothed grooves arranged sequentially along the circumference of the magnetic rod, and the pawl is hinged to the target base and one end is elastically engaged in the toothed structure.

[0016] Optionally, the rotation drive assembly includes a target rotation drive and a magnetic rod rotation drive, wherein the target rotation drive is driven to the target assembly, and the magnetic rod rotation drive is driven to the magnetic rod assembly.

[0017] Optionally, the target assembly further includes a target base, and the magnetic rod assembly further includes a magnetic rod base, the magnetic rod base penetrating the target base, one end of the cylindrical target and one end of the magnetic rod being fixedly mounted on the target base and the magnetic rod base respectively, the target rotation drive being driven to the target base, and the magnetic rod rotation drive being driven to the magnetic rod base.

[0018] Optionally, the sputtering baffle has a roughened layer covering the side facing the cylindrical target.

[0019] This utility model also provides a magnetron sputtering coating machine, which includes the above-mentioned magnetron sputtering cathode device and a coating machine housing. The sputtering baffle is blocked at the inlet and outlet of the coating machine housing, and the target assembly and the magnetic rod assembly are located on the side of the sputtering baffle facing the interior of the coating machine.

[0020] Through the above technical solution, in the magnetron sputtering cathode device of this utility model, the magnetic rod assembly can be rotated relative to the cylindrical target by driving the magnetic rod assembly to rotate through the rotary drive component. A sputtering baffle is also provided directly opposite the cylindrical target. With this configuration, during the sputtering process, the working surface of the magnetic rod faces the workpiece on the mounting plate, allowing the cylindrical target to sputter and coat the workpiece. When changing the workpiece after coating, it is not necessary to stop sputtering the cylindrical target; only the rotation drive component needs to drive the magnetic rod assembly to rotate, causing the magnetic rod to rotate within the cylindrical target to the desired position. The working surface faces the sputtering baffle, which blocks the atomic sputtering of the cylindrical target. In this way, the cylindrical target can continue sputtering and remain in good working condition without affecting the internal environment of the vacuum chamber. After the workpiece to be coated is replaced, the magnetic rod assembly is driven by the rotation drive assembly so that the working surface of the magnetic rod is aligned with the workpiece on the hanging plate again. In other words, the magnetron sputtering cathode device of this invention can omit the target washing step during operation, which greatly improves the coating efficiency.

[0021] Other features and advantages of this invention will be described in detail in the following detailed embodiments section. Attached Figure Description

[0022] The accompanying drawings are provided to further illustrate the present invention and form part of the specification. They are used together with the following detailed description to explain the present invention, but do not constitute a limitation thereof. In the drawings:

[0023] Figure 1 This is a schematic diagram of the structure of a magnetron sputtering cathode device in one embodiment of the present invention;

[0024] Figure 2 for Figure 1 Cross-sectional view of the magnetron sputtering cathode device in the image;

[0025] Figure 3 for Figure 2 A partial cross-sectional view of the magnetron sputtering cathode device in the image;

[0026] Figure 4 for Figure 1 A partial structural schematic diagram of the magnetron sputtering cathode device in the image;

[0027] Figure 5 This is a schematic diagram of the structure of a magnetron sputtering cathode device in another embodiment of the present invention;

[0028] Figure 6 for Figure 5 Cross-sectional view of the magnetron sputtering cathode device in the image;

[0029] Figure 7 for Figure 6 A partial cross-sectional view of the magnetron sputtering cathode device.

[0030] Explanation of reference numerals in the attached figures:

[0031] 1. Splash baffle

[0032] 2 cylindrical target

[0033] 3 magnetic rods

[0034] 4. Claws

[0035] 5. Target base

[0036] 6. Magnetic rod base

[0037] 7. Magnetic rod rotation drive component

[0038] 8. Target rotation drive component

[0039] 9. Bidirectional rotary drive component

[0040] 10. Toothed structure Detailed Implementation

[0041] The specific embodiments of this utility model will be described in detail below with reference to the accompanying drawings. It should be understood that the specific embodiments described herein are for illustration and explanation only and are not intended to limit the scope of this utility model.

[0042] It should be noted that, unless otherwise specified, the embodiments and features described in these embodiments of the present invention can be combined with each other.

[0043] In this utility model, unless otherwise stated, directional terms such as "center," "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," and "outer" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing the embodiments of this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the embodiments of this utility model. The directional terms "inner" and "outer" refer to the inside and outside of the outline of each component itself.

[0044] The present invention will now be described in detail with reference to the accompanying drawings and embodiments.

[0045] This invention first provides a magnetron sputtering cathode device.

[0046] In one embodiment, reference is made to the appendix. Figure 1 To be continued Figure 7 As shown, the magnetron sputtering cathode device includes:

[0047] Splash baffle 1;

[0048] The target assembly includes a cylindrical target 2, which is positioned opposite to the sputtering baffle 1.

[0049] The magnetic rod assembly includes a magnetic rod 3 coaxially disposed within the cylindrical target 2;

[0050] A rotary drive assembly drives the target assembly and the magnetic rod assembly.

[0051] In the magnetron sputtering cathode apparatus of this embodiment, the magnetic rod assembly is rotated by a rotary drive component, causing the magnetic rod 3 to rotate relative to the cylindrical target 2. A sputtering baffle 1 is provided directly opposite the outer circumferential surface of the cylindrical target 2. With this configuration, during the sputtering process, the working surface of the magnetic rod 3 faces the workpiece on the mounting plate, allowing the cylindrical target 2 to sputter and deposit the workpiece. When replacing the workpiece after deposition, it is not necessary to stop sputtering on the cylindrical target 2; simply rotating the magnetic rod assembly via the rotary drive component allows the magnetic rod 3 to rotate within the cylindrical target 2 to the working surface. The cylindrical target 2 is directly facing the sputtering baffle 1, which blocks the atomic sputtering of the cylindrical target 2. With this design, the cylindrical target 2 can continue sputtering operation and maintain a good working condition while avoiding the impact of sputtering of the cylindrical target 2 on the internal environment of the vacuum chamber. After the workpiece to be coated is replaced, the magnetic rod assembly is driven by the rotation drive assembly so that the working surface of the magnetic rod 3 is aligned with the workpiece to be coated on the hanging plate again. In other words, the target washing step can be omitted in the operation of the magnetron sputtering cathode device in this embodiment, which greatly improves the working efficiency of coating.

[0052] In one embodiment, reference is made to the appendix. Figure 1 To be continued Figure 4 As shown, the rotary drive assembly includes a bidirectional rotary drive component 9 and a unidirectional transmission mechanism. The target assembly and the magnetic rod assembly are connected through the unidirectional transmission mechanism, and the bidirectional rotary drive component 9 drives the connected target assembly.

[0053] In other words, in this embodiment, the bidirectional rotary drive 9 drives the target assembly to rotate, and the magnetic rod assembly can be driven to rotate unidirectionally through the unidirectional transmission mechanism. In practical applications, the unidirectional transmission mechanism can be set to drive the magnetic rod assembly to rotate when the target assembly rotates in the opposite direction under the drive of the bidirectional rotary drive 9. During the coating process, the target assembly rotates in the forward direction, and the magnetic rod assembly does not rotate. After the coating is completed, the target assembly is rotated in the reverse direction to drive the magnetic rod assembly to rotate to the position where the working surface of the magnetic rod 3 is directly opposite the sputtering baffle 1. Then, the target assembly is rotated in the forward direction again to maintain the sputtering operation. After the coated workpiece is replaced, the target assembly can be rotated in the reverse direction to drive the magnetic rod assembly back to the position where the working surface of the magnetic rod 3 is directly opposite the coated workpiece on the hanging plate to perform the coating operation.

[0054] In one embodiment, reference is made to the appendix. Figure 1 To be continued Figure 4 As shown, the unidirectional transmission mechanism includes a pawl 4 and a toothed structure 10 that is connected to the pawl 4 in a transmission manner. One of the pawl 4 and the toothed structure 10 is disposed on the target assembly, and the other is disposed on the magnetic rod assembly.

[0055] This configuration enables unidirectional transmission between the target assembly and the magnetic rod assembly through the unidirectional locking action of the pawl 4 and the toothed structure 10. Specifically, when the target assembly rotates in the opposite direction, the pawl 4 locks with the magnetic rod assembly to drive the magnetic rod assembly to rotate. When the target assembly rotates in the forward direction, the pawl 4 releases the lock from the magnetic rod assembly, allowing the target assembly to rotate relative to the magnetic rod assembly.

[0056] In one embodiment, the target assembly further includes a target base 5, on which a cylindrical target 2 is mounted; the magnetic rod assembly further includes a magnetic rod base 6, on which a magnetic rod 3 is mounted; one of the pawl 4 and the toothed structure 10 is disposed on the target base 5, and the other is disposed on the magnetic rod base 6.

[0057] Specifically, the bidirectional rotary drive 9 can be a bidirectional motor and can be driven to connect with the target base 5 via a belt drive assembly, so as to drive the target assembly to rotate by driving the target base 5 to rotate.

[0058] Furthermore, the magnetic rod base 6 penetrates the target base 5, one end of the cylindrical target 2 and the magnetic rod 3 are fixedly installed on the target base 5 and the magnetic rod base 6 respectively, the pawl 4 is installed on the target base 5, and the toothed structure 10 is formed on the magnetic rod 3 or the magnetic rod base 6.

[0059] Specifically, the toothed structure 10 includes a plurality of toothed grooves arranged sequentially along the circumference of the magnetic rod 3, and the pawl 4 is hinged to the target base and one end is elastically engaged in the toothed structure 10.

[0060] Understandably, by having one end of the pawl 4 elastically engage with the toothed structure 10 on the magnetic rod base 6 or the magnetic rod 3, the pawl 4 locks or unlocks with the magnetic rod assembly when the target assembly rotates in the forward or reverse direction.

[0061] Specifically, the toothed structure 10 can be formed on the outer peripheral surface of the magnetic rod base 6 or the magnetic rod 3. The unidirectional transmission mechanism also includes two limiting blocks and an elastic element. The pawl 4 is hinged to the target base 5. The two limiting blocks are arranged sequentially and spaced apart along the circumference of the cylindrical target 2 on the target base 5 and on opposite sides of the end of the pawl 4 away from the magnetic rod base 6. The elastic element connects either limiting block and the pawl 4. With this arrangement, under the limiting action of the two limiting blocks and the elastic force of the elastic element, the pawl 4 can elastically abut against the outer peripheral surface of the magnetic rod base 6. When the target assembly rotates in the reverse direction, one end of the pawl 4 can engage in the slot for locking. When the target assembly rotates in the forward direction, one end of the pawl 4 can disengage from the slot to release the lock. In practical applications, the elastic element can be a spring.

[0062] Of course, in other embodiments, the one-way transmission mechanism can also be in other structural forms. For example, the one-way transmission mechanism can be a one-way bearing, which is directly nested between the magnetic rod 3 and the cylindrical target 2. For another example, the one-way transmission mechanism can include two connectors and a driving component. The two connectors are respectively connected to the magnetic rod 3 and the cylindrical target 2 or respectively connected to the magnetic rod base 6 and the target base 5. When the target assembly rotates in the reverse direction, the driving component drives the two connectors to be fixedly connected. When the target assembly rotates in the forward direction, the driving component drives the two connectors to be disconnected. The driving component can be an electric or pneumatic driving component, and the connection method of the two connectors can be magnetic connection, plug-in connection, etc.

[0063] In one embodiment, reference is made to the appendix. Figure 5 and attached Figure 6 As shown, the rotation drive assembly includes a target rotation drive 8 and a magnetic rod rotation drive 7. The target rotation drive 8 drives and connects to the target assembly, and the magnetic rod rotation drive 7 drives and connects to the magnetic rod assembly.

[0064] In this embodiment, the magnetic rod assembly is directly driven to rotate by the magnetic rod rotation drive 7. That is, the orientation of the working surface of the magnetic rod 41 can be adjusted by driving the magnetic rod assembly to rotate through the magnetic rod rotation drive 7, which can adjust the position of the magnetic rod 3 more quickly and accurately.

[0065] In one embodiment, reference is made to the appendix. Figure 5 To be continued Figure 7 As shown, the target assembly also includes a target base 5, and the magnetic rod assembly also includes a magnetic rod base 6. The magnetic rod base 6 penetrates the target base 5. One end of the cylindrical target 2 and the magnetic rod 3 are respectively fixedly installed on the target base 5 and the magnetic rod base 6. The target rotation drive 8 drives the target base 5, and the magnetic rod rotation drive 7 drives the magnetic rod base 6.

[0066] Specifically, the magnetic rod rotation drive 7 can be a bidirectional motor and can be connected to the magnetic rod base 6 via a belt drive assembly to drive the magnetic rod assembly to rotate by rotating the magnetic rod base 6.

[0067] In one embodiment, one end of the cylindrical target 2 is detachably fixed to the target base 5.

[0068] In this embodiment, the cylindrical target 2 is detachably installed, which facilitates the disassembly, assembly, and replacement of the cylindrical target 2.

[0069] Specifically, one end of the cylindrical target 2 can be fitted onto the target base 5 using a clamp. This arrangement ensures that one end of the cylindrical target 2 is fixedly fitted onto the target base 5, and the connection is secured by a clamp, effectively improving the convenience of installation and connection.

[0070] In one embodiment, the magnetic rod 3 is detachably fixed to one end of the magnetic rod base 6.

[0071] In this embodiment, the magnetic rod 3 is detachably installed, which facilitates the disassembly and replacement of the magnetic rod 3.

[0072] Specifically, one end of the magnetic rod 3 is provided with a connector, and the magnetic rod base 6 is a long tubular structure. The connector at one end of the magnetic rod 3 is inserted into one end of the magnetic rod base 6 and connected by a pin. This design effectively improves the convenience of installation and connection.

[0073] In one embodiment, the side of the sputtering baffle 1 facing the cylindrical target 2 is covered with a roughened layer. This configuration allows the sputtering baffle 1 to accommodate more sputtered atoms, thereby increasing the lifespan of the sputtering baffle 1.

[0074] To improve the compactness of the structure, in some embodiments, reference is made to the appendix. Figure 1 To be continued Figure 6 As shown, the magnetron sputtering cathode device also includes a fixed bracket, on which a sputtering baffle 1 is formed. The target base 5 and the magnetic rod base 6 are rotatably mounted on the fixed bracket via bearings. The magnetic rod rotation drive 7 and the target rotation drive 8 can also be mounted on the fixed bracket.

[0075] This utility model also proposes a magnetron sputtering coating machine, which includes the above-mentioned magnetron sputtering cathode device and a coating machine housing. A sputtering baffle 1 is installed at the inlet and outlet of the coating machine housing, and the target assembly and the magnetic rod assembly are located on the side of the sputtering baffle 1 facing the inside of the coating machine.

[0076] Clearly, the magnetron sputtering coating machine also possesses the beneficial effects of the aforementioned magnetron sputtering cathode device.

[0077] In the description of this utility model, it should be understood that the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this utility model, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0078] In this utility model, unless otherwise explicitly specified and limited, the terms "installation," "connection," "joining," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection, an electrical connection, or a connection that allows communication between them; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components, unless otherwise explicitly limited. Those skilled in the art can understand the specific meaning of the above terms in this utility model according to the specific circumstances.

[0079] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of the present invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples. Moreover, without contradiction, those skilled in the art can combine and integrate the different embodiments or examples described in this specification, as well as the features of different embodiments or examples.

[0080] Although embodiments of the present invention have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention. Those skilled in the art can make changes, modifications, substitutions and variations to the above embodiments within the scope of the present invention.

Claims

1. A magnetron sputtering cathode apparatus, characterized in that, The magnetron sputtering cathode device includes: Sputter baffle (1); The target assembly includes a cylindrical target (2) which is disposed opposite to the sputtering baffle (1); The magnetic rod assembly includes a magnetic rod (3) coaxially disposed within the cylindrical target (2); A rotation drive assembly drives the target assembly and the magnetic rod assembly.

2. The magnetron sputtering cathode apparatus according to claim 1, characterized in that, The rotary drive assembly includes a bidirectional rotary drive (9) and a unidirectional transmission mechanism. The target assembly and the magnetic rod assembly are connected through the unidirectional transmission mechanism. The bidirectional rotary drive (9) drives the target assembly.

3. The magnetron sputtering cathode apparatus according to claim 2, characterized in that, The unidirectional transmission mechanism includes a pawl (4) and a toothed structure (10) that is connected to the pawl (4) in a transmission manner. One of the pawl (4) and the toothed structure (10) is disposed on the target material assembly, and the other is disposed on the magnetic rod assembly.

4. The magnetron sputtering cathode apparatus according to claim 3, characterized in that, The target assembly further includes a target base (5), the cylindrical target (2) is mounted on the target base (5), and the magnetic rod assembly further includes a magnetic rod base (6), the magnetic rod (3) is mounted on the magnetic rod base (6); One of the pawl (4) and the toothed structure (10) is disposed on the target base (5), and the other is disposed on the magnetic rod base (6).

5. The magnetron sputtering cathode apparatus according to claim 4, characterized in that, The magnetic rod base (6) penetrates the target base (5), one end of the cylindrical target (2) and the magnetic rod (3) are fixedly installed on the target base (5) and the magnetic rod base (6) respectively, the pawl (4) is installed on the target base (5), and the toothed structure (10) is formed on the magnetic rod (3) or the magnetic rod base (6).

6. The magnetron sputtering cathode apparatus according to claim 4, characterized in that, The toothed structure (10) includes a plurality of toothed grooves arranged sequentially along the circumference of the magnetic rod (3), and the pawl (4) is hinged to the target base and one end is elastically engaged in the toothed structure (10).

7. The magnetron sputtering cathode apparatus according to claim 1, characterized in that, The rotation drive assembly includes a target rotation drive (8) and a magnetic rod rotation drive (7). The target rotation drive (8) drives and connects to the target assembly, and the magnetic rod rotation drive (7) drives and connects to the magnetic rod assembly.

8. The magnetron sputtering cathode apparatus according to claim 7, characterized in that, The target assembly further includes a target base (5), and the magnetic rod assembly further includes a magnetic rod base (6). The magnetic rod base (6) penetrates the target base (5). One end of the cylindrical target (2) and the magnetic rod (3) are respectively fixedly installed on the target base (5) and the magnetic rod base (6). The target rotation drive (8) drives and connects to the target base (5), and the magnetic rod rotation drive (7) drives and connects to the magnetic rod base (6).

9. The magnetron sputtering cathode apparatus according to any one of claims 1-8, characterized in that, The sputtering baffle (1) has a roughened layer on the side facing the cylindrical target (2).

10. A magnetron sputtering coating machine, characterized in that, The magnetron sputtering coating machine includes a magnetron sputtering cathode device according to any one of claims 1 to 9 and a coating machine housing, wherein the sputtering baffle (1) is disposed at the inlet and outlet of the coating machine housing, and the target assembly and the magnetic rod assembly are located on the side of the sputtering baffle (1) facing the interior of the coating machine.

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