Photomask transferring device with downward photomask pattern surface

Abstract

The utility model discloses a photomask transferring device with a downward photomask pattern surface. The photomask transferring device comprises a base; an X-direction mobile station; a Y-direction mobile station; the clamping jaw group is provided with two clamping units; the pushing positioning group is provided with a fixed unit and a pushing unit; a lifting rotary table; the bearing table is provided with four bearing frames; wherein the up-and-down moving position of the bearing table comprises a bearing position, a clamping position and a bottom position, when the bearing table is located at the clamping position, the two clamping units can clamp or release the photomask located on the bearing table, and the pushing unit can push or does not push the photomask.

Description

TECHNICAL FIELD

[0001] The utility model relates to the transfer technology of photomask, especially a photomask transfer device with the pattern surface of photomask facing down. BACKGROUND

[0002] When the photomask is detected, the photomask needs to be moved on the machine table. In the I609235 invention patent of Taiwan, a photomask detection device and method are disclosed. In this case, the photomask transfer technology is disclosed as a moving platform in a first direction and a rotating platform in a second direction, and a carrying platform carrying the photomask. Therefore, this case only discloses the movement of the photomask between the first direction and the second direction perpendicular to the first direction, which is equivalent to the movement of the X direction and the Y direction, but does not disclose the specific technical content of the movement in other directions.

[0003] In addition, the pattern surface of the photomask in the aforementioned case is facing up during detection. This approach has its drawbacks. The side of the photomask with the pattern is mostly provided with a protective film, but some are directly exposed without a protective film. The key is that the pattern itself cannot be contaminated by falling dust. The protective film is also a very expensive component, and it is also necessary to avoid contamination by falling dust. However, even in a clean room, it is difficult to avoid falling dust. The upward pattern surface or protective film is likely to encounter the problem of falling dust contamination during detection. As a result, there is a need for cleaning and subsequent drying, or there may be interference during detection or defects in the detection results.

[0004] As can be seen from the above, how to make the photomask move with its pattern surface facing down, and how to make the structure different from or even better than the aforementioned technology, has become the problem to be solved in this case. UTILITY MODEL CONTENT

[0005] The main purpose of the utility model is to provide a photomask transfer device with the pattern surface of the photomask facing down, which can move the photomask with its pattern surface facing down.

[0006] The main purpose of the utility model is to provide a photomask transfer device with the pattern surface of the photomask facing down, which can move the photomask with its pattern surface facing down.

[0007] In order to achieve the above object, the utility model provides a mask pattern face down mask transfer device, include: a pedestal, an X direction moving platform is located in the pedestal, is driven and moves in the X direction of the pedestal, a Y direction moving platform is located in the X direction moving platform, is driven and moves in the Y direction of the X direction moving platform, a jaw group has two opposite clamping units and is located in the Y direction moving platform, two clamping units can clamp two opposite edges of a rectangular mask, so as to clamp the mask, a push positioning group has a stationary unit and a push unit and is located in the Y direction moving platform, the push unit has a push block to push the mask to be positioned against the stationary unit, a lifting rotary table is located in the pedestal, is driven and moves in the Z direction of the pedestal, and a receiving table is located in the lifting rotary table, moves up and down or rotates horizontally along with the lifting rotary table in the Z direction, the receiving table has four receiving frames, the receiving table can place the mask, the mask has a pattern face down, the four receiving frames receive and abut against the four edges of the bottom of the mask respectively, wherein the receiving table has a receiving position, a clamping position and a bottom position in the position of moving up and down, when the receiving table is located at the receiving position, the four receiving frames are higher than the two clamping units, when the receiving table is located at the clamping position, the mask is located between the two clamping units, the two clamping units can clamp or release the mask on the receiving table, and the push unit can push or not push the mask, when the receiving table is located at the bottom position, the four receiving frames are lower than the two clamping units.

[0008] Wherein, each clamping unit has a clamping driver and two clamping jaws, the clamping driver drives the two clamping jaws to advance or retreat towards the other clamping unit, and the two clamping jaws of one clamping unit face the two clamping jaws of the other clamping unit.

[0009] Wherein, the two clamping jaws of each clamping unit do not interfere with the receiving frames of the receiving table.

[0010] Wherein, when the receiving table is located at the clamping position, the two clamping jaws of each clamping unit are located on both sides of a receiving frame.

[0011] Wherein, each clamping jaw has an upper clamping piece and a lower clamping piece, the upper clamping piece and the lower clamping piece are opposite to each other, and an opening gradually opening outward is formed between the upper clamping piece and the lower clamping piece.

[0012] Wherein, the receiving table has a lower clamping position in the position of moving up and down, each clamping unit has two lower clamping jaws, the two lower clamping jaws are lower than the two clamping jaws, and the two lower clamping jaws of one clamping unit face the two lower clamping jaws of the other clamping unit, when the receiving table is located at the lower clamping position, the two clamping units can clamp or release the mask on the receiving table.

[0013] The two low-level clamping jaws on each clamping unit are not overlapped with the two clamping jaws above them in the up-down relationship, and the receiving platform is located at the low-level clamping position, and the two low-level clamping jaws of each clamping unit are located on both sides of the receiving frame.

[0014] The pushing unit has a pushing driver to drive the pushing block to push against the mask.

[0015] The receiving platform has an inclined wall relative to the receiving frame, and the inclined wall receives and abuts against an edge of the bottom of the mask.

[0016] Therefore, the mask can be moved and carried with the pattern facing downward. In addition, the mask with the pattern facing downward can be moved and carried in a structure different from the prior art.

[0017] The utility model will be described in detail below in combination with the drawings and specific embodiments, but not as the limitation of the utility model. BRIEF DESCRIPTION OF DRAWINGS

[0018] Figure 1 It is a perspective view of the first preferred embodiment of the utility model.

[0019] Figure 2 It is a partially cutaway perspective view of the first preferred embodiment of the utility model.

[0020] Figure 3 It is another partially cutaway perspective view of the first preferred embodiment of the utility model, showing a view angle of about 90 degrees different from Figure 2

[0021] Figure 4 It is still another partially cutaway perspective view of the first preferred embodiment of the utility model, showing a view angle from bottom to top.

[0022] Figure 5 It is a part element configuration view of the first preferred embodiment of the utility model, showing the relationship between the clamping jaw group and the pushing positioning group.

[0023] Figure 6 It is a part element combination view of the first preferred embodiment of the utility model, showing the Z-direction moving platform and the receiving platform.

[0024] Figure 7 It is another part element configuration view of the first preferred embodiment of the utility model, showing the relationship between the receiving platform, the clamping jaw group and the pushing positioning group.

[0025] Figure 8 It is a motion view of the first preferred embodiment of the utility model.

[0026] Figure 9 ​For another action figure of the first preferred embodiment of the utility model.

[0027] Figure 10 For another action figure of the first preferred embodiment of the utility model.

[0028] Figure 11 For another action figure of the first preferred embodiment of the utility model.

[0029] Figure 12 For another action figure of the first preferred embodiment of the utility model.

[0030] Figure 13 For another action figure of the first preferred embodiment of the utility model.

[0031] Figure 14 For another action figure of the first preferred embodiment of the utility model.

[0032] Figure 15 For another action figure of the first preferred embodiment of the utility model.

[0033] Figure 16 For part element configuration figure of the second preferred embodiment of the utility model.

[0034] Among them, the sign:

[0035] 10: mask pattern surface downward mask transfer device

[0036] 11: base

[0037] 21: X direction moving platform

[0038] 31: Y direction moving platform

[0039] 41: jaw group

[0040] 42: clamping unit

[0041] 43: clamping driver

[0042] 44: jaw

[0043] 441: upper jaw

[0044] 442: lower jaw

[0045] 443: opening

[0046] 46: low layer jaw

[0047] 51: push positioning group

[0048] 52: immovable unit

[0049] 56: push unit

[0050] 57: Push Block

[0051] 58: Drive the driver

[0052] 61: Lifting and Rotating Platform

[0053] 71: Receiving Platform

[0054] 72: Support frame

[0055] 721: Inclined Wall

[0056] 91: Light Mask

[0057] P1: Receiving position

[0058] P2: Clamping position

[0059] P3: Lower layer clamping position

[0060] P4: Bottom Position

[0061] 10': Photomask transfer device with the pattern face down

[0062] 71': Receiving Platform Detailed Implementation

[0063] To illustrate the technical features of this utility model in detail, the following preferred embodiments are described below with reference to the accompanying drawings, wherein:

[0064] like Figures 1 to 7 As shown, this utility model describes a photomask transfer device 10 with the photomask pattern facing downwards, using a first preferred embodiment. It mainly consists of a base 11, an X-axis moving stage 21, a Y-axis moving stage 31, a gripper assembly 41, a push and positioning assembly 51, a lifting and rotating stage 61, and a receiving platform 71, wherein:

[0065] The X-axis moving stage 21 is located on the base 11 and is driven to move in the X direction of the base 11. In practice, existing linear guides or ball screws can be used in conjunction with a drive motor, but since this is not the focus of this case, it will not be described in detail.

[0066] The Y-axis moving stage 31 is disposed on the X-axis moving stage 21 and is driven to move in the Y direction of the X-axis moving stage 21. In actual embodiments, the components used in the Y-axis moving stage 31 are similar to those in the X-axis moving stage 21, and are not the focus of this case, so they will not be described in detail.

[0067] The gripper assembly 41 has two opposing gripping units 42 disposed on the Y-axis moving stage 31. The two gripping units 42 are used to grip a rectangular photomask 91 (shown in the figure). Figure 10The two opposite edges of the reticle 91 are clamped by the clamping units 42. In the first embodiment, each clamping unit 42 has a clamping driver 43 and two clamping jaws 44. The clamping driver 43 drives the two clamping jaws 44 to move forward or backward relative to the other clamping unit 42. The two clamping jaws 44 of one clamping unit 42 face the two clamping jaws 44 of the other clamping unit 42. In addition, each clamping jaw 44 has an upper clamping piece 441 and a lower clamping piece 442. The upper clamping piece 441 and the lower clamping piece 442 are opposite to each other. An opening 443 is formed between the upper clamping piece 441 and the lower clamping piece 442.

[0068] In addition, the clamping jaw group 41 also has two lower clamping jaws 46. The two lower clamping jaws 46 are lower than the two clamping jaws 44. The two lower clamping jaws 46 of one clamping unit 42 face the two lower clamping jaws 46 of the other clamping unit 42. Each lower clamping jaw 46 has the same structure as each clamping jaw 44. The two lower clamping jaws 46 of each clamping unit 42 are not overlapped with the two clamping jaws 44 above them in the vertical direction. This arrangement allows each clamping jaw 44 or each lower clamping jaw 46 to adjust the horizontal relationship independently and conveniently.

[0069] The pushing positioning group 51 has a stationary unit 52 and a pushing unit 56 arranged on the Y-direction moving table 31. The pushing unit 56 has a pushing block 57 for pushing the reticle 91 to be positioned against the stationary unit 52. In the first embodiment, the pushing unit 56 has a pushing driver 58 for driving the pushing block 57 to push against the reticle 91. The stationary unit 52 is a fixed protrusion.

[0070] The lifting and rotating table 61 is arranged on the base 11 and is driven to move in the Z-direction of the base 11. In actual embodiments, the components used by the lifting and rotating table 61 can also use linear slides or servo motors or other known components, which are not described in detail. The X-direction and the Y-direction refer to two directions perpendicular to the horizontal plane, and the Z-direction refers to the direction perpendicular to the horizontal plane.

[0071] The receiving platform 71 is provided on the lifting and rotating platform 61 and moves up and down in the Z direction or rotates horizontally. The receiving platform 71 has four receiving frames 72. The receiving platform 71 is used to place the mask 91 with a pattern surface (not shown) facing downward. The two receiving frames 72 have a slanted wall 721 facing the bottom of the mask 91. The slanted wall 721 is used to contact the mask 91 with a slanted surface to reduce the contact area. In the first embodiment, the two clamping jaws 44 of each clamping unit 42 do not interfere with the receiving frames 72 of the receiving platform 71. In addition, the pattern surface of the mask 91 is generally protected by a protective film. However, in some embodiments, the pattern surface is not provided with a protective film.

[0072] The receiving platform 71 has a receiving position P1, a clamping position P2, a lower clamping position P3, and a bottom position P4. When the receiving platform 71 is at the receiving position P1, the four receiving frames 72 are higher than the two clamping units 42. When the receiving platform 71 is at the clamping position P2, the mask 91 is located between the two clamping units 42. The two clamping units 42 can clamp or release the mask 91 on the receiving platform 71. The pushing unit 56 can push or not push the mask 91. The two clamping jaws 44 of each clamping unit 42 are located on both sides of a receiving frame 72. When the receiving platform 71 is at the bottom position P4, the four receiving frames 72 are lower than the two clamping units 42. When the receiving platform 71 is at the lower clamping position P3, the two clamping units 42 can clamp or release the mask 91 on the receiving platform 71. In addition, when the receiving platform 71 is at the lower clamping position P3, the two lower clamping jaws 46 of each clamping unit 42 are located on both sides of a receiving frame 72.

[0073] The structure of the first embodiment is described above. The operation state of the first embodiment is described below.

[0074] As shown in Figure 8 When there is no mask 91 to be carried, the receiving platform 71 is at the bottom position P4.

[0075] As shown in Figure 9 When a mask 91 needs to be carried, the receiving platform 71 is first moved to the receiving position P1. At this time, the four receiving frames 72 are higher than the two clamping units 42. Then, as shown in Figure 10As shown, a robotic arm (not shown) places a photomask 91 on the receiving platform 71 with the patterned side (not shown) facing down. At this time, the inclined walls 721 of the two receiving frames 72 receive and abut against the four sides of the bottom of the photomask 91. If the photomask 91 needs to be rotated to a certain angle, the receiving platform 71 can rotate the photomask 91 horizontally, for example, by 90 degrees or 270 degrees.

[0076] like Figure 11 As shown, the receiving platform 71 is moved down to the clamping position P2. For example... Figure 12 As shown, the pushing unit 56 drives the pushing block 57 to push the photomask 91 against the stationary unit 52, thus completing the positioning. Then, as... Figure 13 As shown, the clamping driver 43 of the two clamping units 42 drives the two clamping jaws 44 to move towards each other, thereby causing the opening 443 between the upper clamping piece 441 and the lower clamping piece 442 of each clamping jaw 44 to be contained within the edge of the photomask 91, so that the upper clamping piece 441 and the lower clamping piece 442 clamp the photomask 91. At this time, the photomask 91 is clamped and fixed on all four sides, presenting a stable clamping state.

[0077] like Figure 14 As shown, if the photomask 91 needs to be detected at a lower position, it can be placed at the lower clamping position P3 instead of clamping at the clamping position P2. In this case, the pushing unit 56 drives the pushing block 57 to push the photomask 91 against the stationary unit 52 to complete the positioning (shown in...). Figure 12 Each clamping unit 42 has two low-level grippers 46 that can approach and clamp or release the photomask 91. The low-level clamping position P3 allows the photomask 91 to be clamped at different heights for detection, which is convenient for detection devices (not shown in the figure) with different viewing distances or focal lengths.

[0078] like Figure 15 As shown, when the photomask 91 is clamped, the receiving stage 71 no longer serves to support the photomask 91, and therefore the receiving stage 71 can be moved down to the bottom position P4. At this time, the photomask 91 is clamped without being interfered with by the receiving stage 71, and the X-axis moving stage 21 and the Y-axis moving stage 31 can be controlled to move the photomask 91 to the corresponding detection position.

[0079] When the inspection is completed and the photomask 91 is to be removed, the above operations can be reversed to release the photomask 91 by the two clamping units 42, and then the receiving platform 71 is moved to the receiving position P1, and the photomask 91 is removed by the robotic arm (not shown in the figure).

[0080] As known from the above, the technology disclosed in the first embodiment can fix the mask 91 by its side through the pushing positioning group 51 and the clamping jaw group 41, and can perform the transfer without supporting or contacting the pattern surface at the bottom of the mask 91, that is, the first embodiment does not need to set any element that blocks the detection at the bottom of the mask 91, and still can achieve the effect of transferring the mask 91 with the pattern surface downward, thereby avoiding the pollution caused by the dust falling from above. In addition, the structure of the first embodiment is different from the prior art, and has the effects of simple operation and stable clamping.

[0081] As shown in Figure 16 , the utility model discloses a kind of mask pattern surface downward mask transfer device 10', it is mainly similar to the first embodiment disclosed above, different from the first embodiment disclosed above is as follows:

[0082] The position of the receiving table 71' moving up and down is less than the low layer clamping position P3 in the first embodiment disclosed above, and less than the two low layer clamping jaws 46 in the first embodiment disclosed above.

[0083] Such structure makes the height available for the mask 91 (shown in Figure 10 ) detection is only the clamping position P2 (shown in Figure 11 ) in the first embodiment disclosed above, and still be covered by the patent range of the utility model under the premise of meeting the needs of user.

[0084] The rest of the structure of the second embodiment disclosed above and the effect achieved are similar to the first embodiment disclosed above, and will not be described again.

[0085] The above is only the content explained by the embodiment of the utility model, which cannot limit the scope of claims of the utility model, and any simple change or equivalent implementation according to the scope of claims of the utility model and the content of patent specification should be covered by the scope of claims of the utility model.

[0086] Of course, the utility model can also have other various embodiments, and those skilled in the art can make various corresponding changes and modifications according to the utility model without departing from the spirit and essence of the utility model, but these corresponding changes and modifications should all belong to the protection scope of the claims of the utility model.

Claims

1. A reticle pattern face-down reticle transfer device, characterized by, The utility model relates to a substrate holder, comprising: a base; an X-direction moving table arranged on the base and driven to move in the X-direction of the base; a Y-direction moving table arranged on the X-direction moving table and driven to move in the Y-direction of the X-direction moving table; a gripper set having two facing holding units arranged on the Y-direction moving table, the two holding units being capable of holding two opposite edges of a rectangular photomask, so as to hold the photomask; a pushing positioning set having a stationary unit and a pushing unit arranged on the Y-direction moving table, the pushing unit having a pushing block to push the photomask to be positioned against the stationary unit; a lifting rotary table arranged on the base and driven to move in the Z-direction of the base; and a receiving table arranged on the lifting rotary table and moving up and down in the Z-direction or horizontally rotating with the lifting rotary table, the receiving table having four receiving frames, the receiving table being capable of placing the photomask, the surface of the photomask having a pattern surface and facing downward, the four receiving frames receiving and abutting against four edges of the bottom of the photomask respectively; wherein the receiving table has a receiving position, a holding position and a bottom position in the position of moving up and down, when the receiving table is in the receiving position, the four receiving frames are higher than the two holding units; when the receiving table is in the holding position, the photomask is located between the two holding units, the two holding units being capable of holding or releasing the photomask on the receiving table, and the pushing unit being capable of pushing or not pushing the photomask; when the receiving table is in the bottom position, the four receiving frames are lower than the two holding units.

2. The reticle pattern-down reticle transfer device of claim 1, wherein: Each holding unit has a holding driver and two grippers, the holding driver driving the two grippers to advance or retreat towards the other holding unit, and the two grippers of one holding unit facing the two grippers of the other holding unit.

3. The reticle pattern face-down reticle transfer device of claim 2, wherein: The two grippers of each holding unit do not interfere with each receiving frame of the receiving table.

4. The reticle pattern face-down reticle transfer device of claim 3, wherein: When the receiving table is in the holding position, the two grippers of each holding unit are located on both sides of one receiving frame.

5. The reticle pattern face-down reticle transfer device of claim 2, wherein: Each gripper has an upper clamping piece and a lower clamping piece, the upper clamping piece and the lower clamping piece being opposite to each other in the up-down direction, and an opening gradually widening outward being formed between the upper clamping piece and the lower clamping piece.

6. The reticle pattern face-down reticle transfer device of claim 2, wherein: The receiving table further has a lower holding position in the position of moving up and down, each holding unit further has two lower grippers, the two lower grippers being lower than the two grippers, and the two lower grippers of one holding unit facing the two lower grippers of the other holding unit, the two holding units being capable of holding or releasing the photomask on the receiving table when the receiving table is in the lower holding position.

7. The reticle pattern-down reticle transfer device of claim 6, wherein: The two lower grippers on each holding unit do not overlap the two grippers above them in the up-down relationship, and the two lower grippers of each holding unit are located on both sides of one receiving frame when the receiving table is in the lower holding position.

8. The reticle pattern face-down reticle transfer device of claim 1, wherein: The pushing unit has a pushing driver driving the pushing block to push against the photomask.

9. The reticle pattern face-down reticle transfer device of claim 1, wherein: The receiving table has an inclined wall opposite to the two receiving frames, and the inclined wall receives and abuts against one edge of the bottom of the photomask.

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