Substrate cleaning device with recyclable cleaning liquid

Abstract

The utility model belongs to the technical field of substrate cleaning, and particularly relates to a substrate cleaning device with recyclable cleaning fluid, which comprises a cleaning tank and a processing tank. After the substrate is cleaned by ultrasonic waves, a dispersion system is formed in the cleaning tank, and the dispersion system directionally circulates and circulates in the cleaning tank and the processing tank. The substrate cleaning device further comprises a separation carrier which is arranged on a circulation path of the dispersion system and used for screening the dispersion system. The purging device comprises a purging gas generator and is used for generating purging gas; the purging gas pipe is connected with the purging gas generator, and a plurality of groups of purging openings are formed in the pipe wall of the purging gas pipe and are used for spraying purging gas; and the separation carrier is arranged in the purging range of the purging device. According to the utility model, the separation carrier is arranged for purifying the cleaning liquid, so that the cleaning liquid is recycled; and meanwhile, the purging device can clean the separation carrier, so that the stable filtering efficiency is maintained, and the circulating purification process of the cleaning liquid can be continuously carried out.

Description

Technical Field

[0001] This utility model belongs to the field of substrate cleaning technology, specifically relating to a substrate cleaning device with recyclable cleaning fluid. Background Technology

[0002] The photocurrent generated within a solar cell is primarily guided to the outside of the cell by metal grid lines on the substrate surface. When fabricating these metal grid lines, a patterned mask is first prepared on the substrate surface as a protective layer. Then, the substrate with the patterned mask is electroplated, and the areas not covered by the mask form a metal plating layer in the shape of grid lines after electroplating. Finally, the patterned mask is removed through a cleaning process. The patterned mask remains on the substrate surface as an adhering substance. The mask material is typically an insulating substance such as paraffin wax, paraffin-like substances, or polymers. It has low density and is insoluble in common cleaning agents such as water and methanol. Therefore, the cleaning process requires the assistance of heating and ultrasound to improve the cleaning effect. Ultrasound causes the adhering substance to detach and disperse in the cleaning agent. However, because the density of the adhering substance is less than that of the cleaning agent, the adhering substance that detaches first will remain suspended in the cleaning agent, causing the latter to quickly become turbid. This prevents the adhering substance that detaches later from effectively dispersing, thus affecting the cleaning effect. Current technology requires maintaining the cleanliness of the cleaning agent and ensuring a continuous flow to ensure cleaning quality, which consumes a large amount of cleaning agent. Utility Model Content

[0003] In view of this, the present invention proposes a device capable of recycling cleaning agents. This device combines ultrasonic cleaning with filtrate purification to achieve the recycling of the cleaning agent. Simultaneously, the device should possess efficient and stable purification effects, maintaining the circulation rate of the cleaning solution within the device.

[0004] This utility model is achieved through the following technical solution:

[0005] A substrate cleaning apparatus with recyclable cleaning fluid includes a cleaning tank and a processing tank. The cleaning tank contains a space for holding the cleaning fluid and an ultrasonic cleaning device. After the substrate is cleaned by ultrasonic waves, a dispersion system is formed in the cleaning tank. The dispersion system flows directionally and circulates in the cleaning tank and the processing tank. The substrate cleaning apparatus further includes:

[0006] A separation carrier is placed in the flow path of the dispersion system and sieved.

[0007] The purging device includes a purging gas generator for generating purging gas; it also includes a purging gas pipe connected to the purging gas generator, the purging gas pipe being disposed in the flow path of the dispersion system; the purging gas pipe has multiple sets of purging ports on its wall for injecting the purging gas.

[0008] The separation carrier is positioned within the purging range of the purging device.

[0009] This invention features a basic cleaning fluid circulation function and filters the dispersed phase and purifies the cleaning fluid by setting a separation carrier in the flow path, thus achieving the recycling of the cleaning fluid. The purging device can spray airflow to promptly clean the separation carrier, preventing its filtration capacity from becoming saturated and maintaining the filtration efficiency of the separation carrier.

[0010] Preferably, the substrate cleaning device further includes a circulation pump for driving the dispersion system to circulate in a specified direction along its flow path; the flow path of the dispersion system further includes a wastewater pipe and a clean water pipe connecting the cleaning tank and the treatment tank; in the treatment tank, the access height of the wastewater pipe is lower than the access height of the clean water pipe.

[0011] Preferably, the separating carrier is a filter screen, which is disposed between the inlet of the sewage pipe and the inlet of the clean liquid pipe; the separating carrier divides the treatment tank into two areas, the side where the sewage pipe is located is the sewage area, and the side where the clean liquid pipe is located is the clean liquid area.

[0012] Preferably, the substrate cleaning device includes a collection device, which includes a negative pressure pipe disposed inside the processing tank; the negative pressure pipe is disposed in the waste liquid area, and multiple sets of negative pressure ports are opened on the side wall of the negative pressure pipe near the separation carrier, and the gas flow direction at the negative pressure ports is from the outside to the inside.

[0013] Preferably, the purging device is located in the clean liquid area, and a gas flow path is formed between the purging pipe and the negative pressure pipe, which passes vertically through the separation carrier.

[0014] This invention further improves the self-cleaning function of the treatment tank. After a period of purification, the filtration capacity of the separation carrier reaches its limit; this invention is equipped with a collection device to clean the separation carrier. The adhering substances removed by the purging device are collected and transferred to the outside of the treatment tank. This structure enables the treatment tank to have a self-cleaning function, ensuring that the cleaning fluid circulation and purification process can be carried out efficiently and sustainably.

[0015] Preferably, the negative pressure port has a conical shape that expands outward and contracts inward.

[0016] Preferably, the negative pressure pipe is connected to a suction pipe outside the treatment tank, and the suction pipe is connected to a negative pressure generator; a fluid channel is formed in the collection device that flows in from the negative pressure port and passes through the negative pressure pipe and the suction pipe.

[0017] Preferably, a shut-off valve capable of blocking liquid is provided at the connection between the negative pressure pipe and the suction pipe.

[0018] Preferably, a filter barrel is installed in the middle section of the suction pipe, and the airflow from the negative pressure pipe is filtered by the filter barrel before reaching the negative pressure generator.

[0019] Preferably, the circulating pump is connected to the clean liquid pipeline. When connected to the clean liquid pipeline, the pump body is less prone to clogging, reducing the need for device maintenance and enabling the substrate cleaning device to operate efficiently for extended periods.

[0020] When the density of the sparingly soluble deposits is less than that of the cleaning solution, the resulting contaminated liquid is a heterogeneous dispersion system with unstable dispersion, and the deposits tend to concentrate on the surface of the contaminated liquid. Based on this distribution characteristic, this invention designs the flow direction and vertical position of the dispersion system within the treatment tank. The liquid in the cleaning tank is separated into an upper clean liquid zone and a lower contaminated liquid zone by a separation carrier. As the contaminated liquid accumulates in the treatment tank, the liquid level naturally rises and is sieved by the dispersion carrier. The dispersed phase is retained, and the dispersion medium enters the clean liquid zone. The clean liquid zone is connected to a clean liquid pipeline, allowing the clean liquid to flow back to the cleaning tank. To address the issue of saturation of the separation carrier, this invention incorporates purge air pipes and negative pressure pipes on both sides of the separation carrier. High-speed gas purging is used to clean the dispersed phase retained by the separation carrier. The high-speed gas purging direction is from the clean liquid zone to the contaminated liquid zone, preventing secondary contamination of the clean liquid. The purged dispersed phase is immediately transferred out of the cleaning tank by the negative pressure pipe, making the cleaning process fast and efficient. Attached Figure Description

[0021] Figure 1 This is a schematic diagram of the overall design of this utility model;

[0022] Figure 2 This is a schematic diagram of the internal structure of the treatment tank;

[0023] Figure 3 Schematic diagram of the purge air pipe and negative pressure pipeline;

[0024] Figure 4 This is a schematic diagram of the gas flow path during the self-cleaning process of the treatment tank.

[0025] Legend:

[0026] 1. Cleaning tank; 1.1. Sewage pipe; 1.2. Clean liquid pipe; 1.3. Circulation pump.

[0027] 2. Processing tank; 2.1. Separation carrier;

[0028] 3. Purge device; 3.1. Purge air pipe; 3.11. Purge port; 3.2. Purge air generator;

[0029] 4. Collection device; 4.1. Negative pressure pipeline; 4.11. Negative pressure port; 4.2. Shut-off valve; 4.3. Suction pipeline; 4.4. Filter barrel; 4.5. Negative pressure generator. Detailed Implementation

[0030] The present invention will be further described below with reference to the accompanying drawings and specific embodiments. Those skilled in the art will be able to implement the present invention based on these descriptions. Furthermore, the embodiments of the present invention described below are generally only a part of the embodiments of the present invention, and not all of the embodiments. Therefore, all other embodiments obtained by those skilled in the art based on the embodiments of the present invention without inventive effort should fall within the scope of protection of the present invention.

[0031] Please see Figure 1 The cleaning fluid circulation function of this invention is mainly achieved through the following structure. The cleaning tank 1 contains a space for the cleaning fluid and an ultrasonic cleaning device to remove deposits from the substrate surface. After cleaning, a heterogeneous dispersion system is formed in the cleaning tank 1, with the deposits as the dispersed phase and the cleaning fluid as the dispersion medium. The treatment tank 2 mainly purifies the dispersion system. The cleaning tank 1 and the treatment tank 2 are connected by a wastewater pipe 1.1 and a clean water pipe 1.2, forming a closed circulation loop for the dispersion system. A circulation pump 1.3, used to drive the flow of the dispersion system within the loop, is connected to the clean water pipe 1.2. The pump body is less prone to clogging, reducing the need for device maintenance. During the purification process of the dispersion system, wastewater flows into the treatment tank 2 through the wastewater pipe 1.1, and clean water flows into the cleaning tank 1 through the clean water pipe 1.2. For ease of description, this flow direction is referred to as forward. Correspondingly, when the treatment tank 2 performs self-cleaning, a small amount of wastewater needs to flow back from the wastewater pipe 1.1 to the treatment tank 2; this flow direction is referred to as reverse.

[0032] Please see Figure 2 The cleaning fluid purification function of this utility model is mainly achieved through the following structure. The treatment tank 2 is equipped with a separation carrier 2.1 inside. In a preferred embodiment, the separation carrier 2.1 is a horizontally placed planar structure. The inlet of the clean liquid pipe 1.2 is located above the separation carrier 2.1, and the inlet of the dirty liquid pipe 1.1 is located below the separation carrier 2.1. The dispersion system flows in from the dirty liquid pipe 1.1 and then flows out from the clean liquid pipe 1.2, forming a bottom-in, top-out flow path, and needs to pass through the separation carrier 2.1. During the flow through the separation carrier 2.1, the separation carrier 2.1 sieves the dispersion system. The dispersed phase is retained on the lower surface of the separation carrier 2.1, while the dispersion medium can pass through the separation carrier 2.1. Thus, a clean liquid zone is formed at the top of the separation carrier 2.1, and a dirty liquid zone is formed at the bottom.

[0033] Please see Figure 2 , Figure 3 The self-cleaning function of the treatment tank of this utility model is mainly achieved by the following structure. A purge air pipe 3.1 is provided in the clean liquid area above the separation carrier 2.1. The purge air pipe 3.1 is coiled on a plane, and the coiled plane is parallel to the separation carrier 2.1. A purge port 3.11 is opened on the pipe wall of the purge air pipe 3.1, and its position is directly facing the separation carrier 2.1 below. A negative pressure pipe 4.1 is provided in the dirty liquid area below the separation carrier 2.1. The negative pressure pipe is also coiled on a plane, and the coiled plane is parallel to the separation carrier 2.1. A negative pressure port 4.11 is opened on the pipe wall of the negative pressure pipe 4.1. The negative pressure port 4.11 is a cone shape that expands outward and contracts inward, and it is directly facing the separation carrier 2.1 above. When the self-cleaning function of the treatment tank is activated, the purge port sprays high-speed purge gas downward towards the separation carrier 2.1 to remove the adhering substances trapped on the surface of the separation carrier 2.1, restoring the adhering substances to a dispersed state. The horn-shaped negative pressure port 4.11 draws external airflow containing dispersed deposits into the negative pressure pipe 4.1, and continues to transport it to the outside of the treatment tank along the direction of airflow. In a preferred embodiment, a vertical gas flow path is formed between the purge air pipe 3.1 and the negative pressure pipe 4.1, passing through the separation carrier 2.1, which can quickly and efficiently remove deposits from the surface of the separation carrier 2.1.

[0034] Figure 4 The gas flow path during the self-cleaning process of the treatment tank is further described, mainly including two modules: a purging device and a collection device. The purging device includes a purging gas generator 3.2 located outside the treatment tank 2 and a purging gas pipe 3.1 inside the treatment tank 2, which are connected. The purging gas flows from the purging gas generator 3.2 to the purging gas pipe 3.1, and then is ejected from the purging port to the external environment. The collection device includes a negative pressure generator 4.5, a filter barrel 4.4, and a suction pipe 4.3 located outside the treatment tank 2, and a negative pressure pipe 4.1 inside the treatment tank 2. One end of the suction pipe 4.3 is connected to the negative pressure generator 4.5, and the other end is connected to the negative pressure pipe 4.1. After the negative pressure generator 4.5 is activated, an airflow is formed within the device, flowing from the negative pressure port 4.11 into the negative pressure pipe 4.1, and then into the suction pipe 4.3. Since the negative pressure pipe 4.1 is located in the sewage area, during the cleaning process, the sewage will submerge the negative pressure pipe 4.1 and enter it through the negative pressure port 4.11. Therefore, a shut-off valve 4.2 is installed at the connection between the negative pressure pipe 4.1 and the suction pipe 4.3. During the cleaning process, the shut-off valve remains closed, allowing a small amount of sewage to remain in the negative pressure pipe 4.1 and preventing it from immediately flowing into the suction pipe 4.3. When the treatment tank self-cleans, the shut-off valve opens, and the sewage remaining in the negative pressure pipe 4.1 is sucked into the suction pipe 4.3. A filter tank is installed in the middle section of the suction pipe 4.3 to collect the sewage and airflow containing deposits transported from the negative pressure pipe 4.1.

[0035] Taking paraffin residue and deionized water as an example, the working process of this utility model is described. When cleaning the substrate, the substrate with paraffin residue on its surface is first placed in cleaning tank 1 and treated with ultrasound. The paraffin particles detach and enter the deionized water. Since paraffin and water are immiscible, a heterogeneous dispersion system, namely paraffin-water suspension, is formed in cleaning tank 1 with paraffin particles as the dispersed phase and deionized water as the dispersion medium. The circulation pump is started to make the dispersion system circulate in the forward direction. The paraffin-water suspension flows out of cleaning tank 1 and enters treatment tank 2 through sewage pipe 1.1. The liquid level in treatment tank 2 slowly rises, gradually submerging the separation carrier 2.1. During the rise of the liquid level, the paraffin particles are trapped by the separation carrier 2.1. The liquid above the separation carrier 2.1 is deionized water with deparaffin removed. The deionized water flows back into cleaning tank 1 through clean liquid pipe 1.2. After the dispersion system has been circulating for a period of time, the surface of the separation carrier 2.1 tends to be saturated, and the trapping capacity reaches its limit, requiring cleaning. At this point, the circulation pump 1.3 is restarted, causing the circulation to reverse. Part of the wastewater in treatment tank 2 flows back to cleaning tank 1 via wastewater pipe 1.1, lowering the liquid level in treatment tank 2 to below negative pressure pipe 4.1. The shut-off valve 4.2 is opened, and the negative pressure generator 4.5 is started. The negative pressure generator 4.5 is a vacuum extraction device. First, the paraffin-water suspension remaining in negative pressure pipe 4.1 is drawn into the filter tank, then a high-speed airflow is formed from negative pressure pipe 4.1 to suction pipe 4.3. This high-speed airflow has relatively low pressure, creating a pressure difference between the inner and outer areas of the negative pressure port 4.11, forming an airflow from the outside in. The purge gas generator 3.2 is activated, and purge gas flows into the purge gas pipe 3.1 and is ejected from the purge port 3.11 facing the separation carrier 2.1, blowing the paraffin particles trapped on the separation carrier 2.1 towards the negative pressure pipe 4.1; a high-speed airflow is formed between the purge gas pipe 3.1 and the negative pressure pipe 4.1, flowing downwards through the separation carrier 2.1. The paraffin particles are carried by the high-speed airflow and enter the negative pressure pipe 4.1 through the funnel-shaped negative pressure port 4.11. Driven by the negative pressure generator 4.5, they pass through the shut-off valve 4.2 and enter the suction pipe 4.3. The paraffin particles reach the filter tank 4.4 along the suction pipe 4.3 and are collected in the filter tank 4.4. After the carrier is cleaned, the circulation pump 1.3 is restarted to drive the dispersion system in the forward direction, allowing the next batch of paraffin-water suspension to flow into the treatment tank 2.

Claims

1. A substrate cleaning device with recyclable cleaning fluid, comprising a cleaning tank (1) and a processing tank (2), wherein the cleaning tank (1) is provided with a space for holding the cleaning fluid and an ultrasonic cleaning device; After ultrasonic cleaning of the substrate, a dispersion system is formed in the cleaning tank (1). The dispersion system circulates and flows in the cleaning tank (1) and the treatment tank (2). The characteristic feature is that... The substrate cleaning device further includes: A separation carrier (2.1) is placed in the flow path of the dispersion system and sieved; The purging device (3) includes a purging gas generator (3.2) for generating purging gas; it also includes a purging gas pipe (3.1) connected to the purging gas generator (3.2), the purging gas pipe (3.1) being disposed on the flow path of the dispersion system; the purging gas pipe (3.1) has multiple sets of purging ports (3.11) on its wall for injecting the purging gas; The separation carrier (2.1) is located within the purging gas injection range of the purging device (3).

2. The substrate cleaning apparatus according to claim 1, characterized in that, The substrate cleaning device further includes a circulation pump (1.3) for driving the dispersion system to circulate in a specified direction along its flow path; the flow path of the dispersion system includes a waste liquid pipe (1.1) and a clean liquid pipe (1.2) connecting the cleaning tank (1) and the treatment tank (2); in the treatment tank (2), the access height of the waste liquid pipe (1.1) is lower than the access height of the clean liquid pipe (1.2).

3. The substrate cleaning apparatus according to claim 2, characterized in that, The separation carrier (2.1) is located between the access position of the sewage pipe (1.1) and the access position of the clean liquid pipe (1.2); the separation carrier (2.1) divides the treatment tank (2) into two areas, the side where the sewage pipe (1.1) is located is the sewage area, and the side where the clean liquid pipe (1.2) is located is the clean liquid area.

4. The substrate cleaning apparatus according to claim 3, characterized in that, The substrate cleaning device includes a collection device (4), which includes a negative pressure pipe (4.1) disposed inside the processing tank (2). The negative pressure pipe (4.1) is disposed in the waste liquid area. Multiple sets of negative pressure ports (4.11) are opened on the side wall of the negative pressure pipe (4.1) near the separation carrier (2.1). The gas flow direction at the negative pressure ports (4.11) is from the outside to the inside.

5. The substrate cleaning apparatus according to claim 4, characterized in that, The purging device (3) is installed in the clean liquid area, and a vertical gas flow path is formed between the purging air pipe (3.1) and the negative pressure pipe (4.1) through the separation carrier (2.1).

6. The substrate cleaning apparatus according to claim 4, characterized in that, The negative pressure port (4.11) has a cone shape that expands outward and contracts inward.

7. The substrate cleaning apparatus according to claim 4, characterized in that, The negative pressure pipe (4.1) is connected to the suction pipe (4.3) outside the treatment tank (2), and the suction pipe (4.3) is connected to the negative pressure generator (4.5); a fluid channel is formed in the collection device (4) from the negative pressure port (4.11) and then through the negative pressure pipe (4.1) and the suction pipe (4.3).

8. The substrate cleaning apparatus according to claim 7, characterized in that, A shut-off valve (4.2) capable of blocking liquid is provided at the connection between the negative pressure pipe (4.1) and the suction pipe (4.3).

9. The substrate cleaning apparatus according to claim 7, characterized in that, A filter barrel (4.4) is installed in the middle section of the suction pipe (4.3). The airflow from the negative pressure pipe (4.1) is filtered by the filter barrel (4.4) and then reaches the negative pressure generator (4.5).

10. The substrate cleaning apparatus according to claim 2, characterized in that, The circulating pump (1.3) is connected to the clean liquid pipeline (1.2).

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