Antibacterial glass with anaerobic environment

Abstract

The utility model discloses antibacterial glass with an anaerobic environment, which comprises a glass substrate layer, a middle layer and an antibacterial layer which are sequentially stacked, the middle layer is a magnetron sputtering middle layer or a pulse laser deposition middle layer, the antibacterial layer is a magnetron sputtering antibacterial layer or a pulse laser deposition antibacterial layer, and the middle layer is a magnetron sputtering antibacterial layer or a pulse laser deposition antibacterial layer. And the middle layer and the antibacterial layer form a heterojunction thin film. The composite material has very high antibacterial performance in both aerobic and anaerobic environments, is simple in process preparation, and is suitable for industrial application.

Description

Technical Field

[0001] This utility model relates to the field of antibacterial glass technology, and in particular to an antibacterial glass that also provides an anaerobic environment. Background Technology

[0002] Antibacterial glass is a product with broad application prospects, including medical, public transportation, home appliances, food storage, and electronic products. Antibacterial glass can inhibit bacterial growth, improve environmental hygiene, and enhance quality of life.

[0003] Currently, there are various types of antibacterial glass. Most antibacterial glasses cannot inhibit bacteria in anaerobic environments. Some antibacterial glasses have complex manufacturing processes, short service life, and high production costs. Utility Model Content

[0004] The present invention aims to solve at least one of the technical problems existing in the prior art. Therefore, one objective of the present invention is to provide an antibacterial glass that combines anaerobic and anaerobic environments, exhibiting high antibacterial properties in both aerobic and anaerobic environments, with a simple manufacturing process and suitable for industrial application.

[0005] According to an embodiment of the present invention, an antibacterial glass with an anaerobic environment includes a glass substrate layer, an intermediate layer and an antibacterial layer stacked sequentially, wherein the intermediate layer is a magnetron sputtering intermediate layer or a pulsed laser deposition intermediate layer, and the antibacterial layer is a magnetron sputtering antibacterial layer or a pulsed laser deposition antibacterial layer, and the intermediate layer and the antibacterial layer form a heterojunction thin film.

[0006] The antibacterial glass with anaerobic environment according to the embodiments of this utility model has the following advantages: Since the intermediate layer of the antibacterial glass is a magnetron sputtering intermediate layer or a pulsed laser deposition intermediate layer, and the antibacterial layer is a magnetron sputtering antibacterial layer or a pulsed laser deposition antibacterial layer, and the intermediate layer and the antibacterial layer form a heterojunction film, under oxygen-free conditions, the heterojunction properties oxidize water into antibacterial active groups (hydroxyl radicals) under light irradiation. These antibacterial active groups (hydroxyl radicals) can efficiently kill bacteria, thus achieving effective antibacterial action under anaerobic conditions. Under aerobic conditions, the antibacterial layer oxidizes with oxygen, achieving aerobic sterilization. Furthermore, the preparation process of the intermediate layer and the antibacterial layer is simple, the production cost is low, the interlayer bonding is strong, the adhesion is firm, and it is not easy to fall off. The surface of the antibacterial layer is smooth and has strong hydrophilic properties. Therefore, the antibacterial glass with anaerobic environment according to the embodiments of this utility model is suitable for industrial applications.

[0007] In some embodiments, the intermediate layer is a zinc oxide thin film layer, which is a magnetron sputtered zinc oxide thin film layer or a pulsed laser deposited zinc oxide thin film layer; the antibacterial layer is a titanium oxide thin film layer, which is a magnetron sputtered titanium oxide thin film layer or a pulsed laser deposited titanium oxide thin film layer.

[0008] In some embodiments, the titanium oxide thin film layer is an anatase titanium oxide thin film layer.

[0009] In some embodiments, the thickness of the zinc oxide thin film layer is 50-100 nm.

[0010] In some embodiments, the thickness of the zinc oxide thin film layer is 80-90 nm.

[0011] In some embodiments, the thickness of the titanium oxide thin film layer is 50-100 nm.

[0012] In some embodiments, the thickness of the titanium oxide thin film layer is 80-90 nm.

[0013] In some embodiments, the thickness of the zinc oxide thin film layer is uniform, and the thickness of the titanium oxide thin film layer is uniform.

[0014] In some embodiments, the thickness of the zinc oxide thin film layer and the thickness of the titanium oxide thin film layer are the same or different.

[0015] In some embodiments, the glass substrate layer is ordinary glass or quartz glass.

[0016] Additional aspects and advantages of the present application will be apparent from the description in the specification that follows, and from the novel features described and claimed herein. BRIEF DESCRIPTION OF DRAWINGS

[0017] The above and / or additional aspects and advantages of the present application will become apparent and be readily appreciated from the following description, including the accompanying drawings, wherein:

[0018] Figure 1 A schematic diagram of the anaerobic environment-resistant antibacterial glass of the present application;

[0019] Figure 2 A scanning electron microscope image of the cross section of the anaerobic environment-resistant antibacterial glass of the present application;

[0020] Figure 3 A schematic diagram of the surface wettability test results of the conventional quartz glass;

[0021] Figure 4 A schematic diagram of the surface wettability test results of the anaerobic environment-resistant antibacterial glass of the present application;

[0022] Figure 5 A schematic diagram of the antibacterial test results of the conventional quartz glass;

[0023] Figure 6 A schematic diagram of the antibacterial test results of the anaerobic environment-resistant antibacterial glass of the present application;

[0024] Figure 7 The anaerobic environment and antibacterial glass according to the embodiment of the present application is shown in the anaerobic antibacterial mechanism diagram.

[0025] Reference signs:

[0026] Glass substrate layer 1; intermediate layer 2; antibacterial layer 3. DETAILED DESCRIPTION

[0027] The embodiments of the present application are described in detail below, and examples of the embodiments are shown in the drawings, wherein the same or similar reference signs represent the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the drawings are exemplary and are only used to explain the present application, and cannot be understood as a limitation of the present application.

[0028] The anaerobic environment and antibacterial glass according to the embodiment of the present application is shown in the anaerobic antibacterial mechanism diagram. Figures 1 to 7 The anaerobic environment and antibacterial glass according to the embodiment of the present application is shown in the anaerobic antibacterial mechanism diagram.

[0029] As shown in Figure 1 , Figure 2 and Figure 7 , the anaerobic environment and antibacterial glass according to the embodiment of the present application comprises a glass substrate layer 1, an intermediate layer 2 and an antibacterial layer 3 which are stacked in sequence.

[0030] The intermediate layer 2 is a magnetron sputtering intermediate layer or a pulsed laser deposition intermediate layer. The magnetron sputtering intermediate layer herein can be understood as an intermediate layer 2 directly deposited on one side surface of the glass substrate layer 1 by using a target material of the same material as the intermediate layer 2 and a magnetron sputtering technology, for example, a magnetron sputtering zinc oxide film layer is directly deposited on one side surface of the glass substrate layer 1 by using a zinc oxide target material and a magnetron sputtering technology, that is, a magnetron sputtering intermediate layer. The magnetron sputtering intermediate layer has a simple preparation process, a short preparation time, a low production cost, a strong bonding force with the glass substrate layer 1, a firm adhesion and is not easy to fall off. The pulsed laser deposition intermediate layer herein can be understood as an intermediate layer 2 directly deposited on one side surface of the glass substrate layer 1 by using a target material of the same material as the intermediate layer 2 and a pulsed laser deposition technology, for example, a pulsed laser deposition zinc oxide film layer is directly deposited on one side surface of the glass substrate layer 1 by using a zinc oxide target material and a pulsed laser deposition technology, that is, a pulsed laser deposition intermediate layer. The pulsed laser deposition intermediate layer has a simple preparation process, a low production cost, a strong bonding force with the glass substrate layer 1, a firm adhesion and is not easy to fall off. The pulsed laser deposition intermediate layer needs a longer preparation time than the magnetron sputtering intermediate layer at the same thickness, that is, the deposition speed of the pulsed laser deposition intermediate layer is slower than that of the magnetron sputtering intermediate layer.

[0031] The antibacterial layer 3 is a magnetron sputtering antibacterial layer or a pulsed laser deposition antibacterial layer. The magnetron sputtering antibacterial layer herein can be understood as an antibacterial layer 3 directly deposited on the surface of the intermediate layer 2 by using a target material of the same material as the antibacterial layer 3 by a magnetron sputtering technology, for example, a titanium oxide target material is used to directly deposit a magnetron sputtering titanium oxide film layer on the surface of the intermediate layer 2 by a magnetron sputtering technology, that is, a magnetron sputtering antibacterial layer. The magnetron sputtering antibacterial layer has a simple preparation process, a short preparation time, a low production cost, a strong bonding force with the intermediate layer 2, and is not easy to fall off. The surface of the prepared magnetron sputtering antibacterial layer is smooth and uniform, and has strong hydrophilic properties. The pulsed laser deposition antibacterial layer herein can be understood as an antibacterial layer 3 directly deposited on the surface of the intermediate layer 2 by using a target material of the same material as the antibacterial layer 3 by a pulsed laser deposition technology, for example, a titanium oxide target material is used to directly deposit a pulsed laser deposition titanium oxide film layer on the surface of the intermediate layer 2 by a pulsed laser deposition technology, that is, a pulsed laser deposition antibacterial layer. The pulsed laser deposition antibacterial layer has a simple preparation process, a low production cost, a strong bonding force with the glass substrate layer 1, and is not easy to fall off. The surface of the prepared laser pulse deposition antibacterial layer 3 is smooth and uniform, and has strong hydrophilic properties. The preparation time of the pulsed laser deposition antibacterial layer is longer than that of the magnetron sputtering antibacterial layer under the same thickness, that is, the deposition speed of the pulsed laser deposition antibacterial layer is slower than that of the magnetron sputtering antibacterial layer.

[0032] The intermediate layer 2 and the antibacterial layer 3 form a heterojunction film. As shown in Figure 7 The working principle of the heterojunction film is as follows: in an anaerobic environment, the antibacterial layer 3 is irradiated, the electrons of the antibacterial layer 3 jump to produce holes, and the electrons of the intermediate layer 2 also jump to produce holes. The electrons of the antibacterial layer 3 transfer to the intermediate layer 2, and the holes of the intermediate layer 2 transfer to the antibacterial layer 3. The holes of the antibacterial layer 3 increase, and these holes on the antibacterial layer 3 oxidize water into antibacterial active groups of hydroxyl radicals. The antibacterial active groups of hydroxyl radicals can kill bacteria efficiently, thereby realizing effective antibacterial effect in an anaerobic environment. The electrons of the intermediate layer 2 can be reduced by external energy. The antibacterial layer 3 oxidizes oxygen in an aerobic environment to achieve aerobic sterilization.

[0033] The antibacterial glass with anaerobic environment has the following advantages: the intermediate layer 2 of the antibacterial glass is a magnetron sputtering intermediate layer or a pulsed laser deposition intermediate layer, the antibacterial layer 3 is a magnetron sputtering antibacterial layer or a pulsed laser deposition antibacterial layer, and the intermediate layer 2 and the antibacterial layer 3 form a heterojunction film, which can oxidize water into antibacterial active group hydroxyl radicals under light in the absence of oxygen, and the antibacterial active group hydroxyl radicals can effectively kill bacteria, thereby realizing effective antibacterial effect in an anaerobic environment; when in the presence of oxygen, the antibacterial layer 3 is oxidized with oxygen, and aerobic sterilization is realized. In addition, the intermediate layer 2 and the antibacterial layer 3 have simple preparation process, low production cost, strong interlayer bonding force, firm adhesion, are not easy to fall off, the surface of the antibacterial layer 3 is smooth, and have strong hydrophilic property. Therefore, the antibacterial glass with anaerobic environment is suitable for industrial application.

[0034] In some embodiments, the intermediate layer 2 is a zinc oxide film layer, and the zinc oxide film layer is a magnetron sputtering zinc oxide film layer or a pulsed laser deposition zinc oxide film layer; the antibacterial layer 3 is a titanium oxide film layer, and the titanium oxide film layer is a magnetron sputtering titanium oxide film layer or a pulsed laser deposition titanium oxide film layer.

[0035] Specifically, the magnetron sputtering zinc oxide film layer belongs to the above-mentioned magnetron sputtering intermediate layer, which can be understood as that a zinc oxide target material is directly deposited on one side surface of the glass substrate layer 1 by a magnetron sputtering technology to form the magnetron sputtering zinc oxide film layer, the magnetron sputtering zinc oxide film layer has simple preparation process, short preparation time, low production cost, strong bonding force with the glass substrate layer 1, firm adhesion and is not easy to fall off; the pulsed laser deposition zinc oxide film layer belongs to the above-mentioned pulsed laser deposition intermediate film layer, which can be understood as that a zinc oxide target material is directly deposited on one side surface of the glass substrate layer 1 by a pulsed laser deposition technology to form the pulsed laser deposition zinc oxide film layer, the pulsed laser deposition zinc oxide film layer has simple preparation process, low production cost, strong bonding force with the glass substrate layer 1, firm adhesion and is not easy to fall off. The pulsed laser deposition zinc oxide film layer needs a longer preparation time than the magnetron sputtering zinc oxide film layer under the same thickness.

[0036] The magnetron sputtered titanium dioxide thin film layer belongs to the aforementioned magnetron sputtered antibacterial layer. It can be understood as directly depositing a magnetron sputtered titanium dioxide thin film layer on the surface of a zinc oxide thin film layer using a titanium dioxide target and magnetron sputtering technology. The magnetron sputtered titanium dioxide thin film layer has a simple preparation process, short preparation time, low production cost, and strong adhesion to the zinc oxide thin film layer, making it difficult to detach. The pulsed laser deposited titanium dioxide thin film layer belongs to the aforementioned pulsed laser deposited antibacterial layer. It can be understood as directly depositing a pulsed laser deposited titanium dioxide thin film layer on the surface of a zinc oxide thin film layer using a titanium dioxide target and pulsed laser deposition technology. The pulsed laser deposited titanium dioxide thin film layer has a simple preparation process, low production cost, and strong adhesion to the zinc oxide thin film layer, making it difficult to detach. However, the pulsed laser deposited titanium dioxide thin film layer requires a longer preparation time than the magnetron sputtered titanium dioxide thin film layer for the same thickness.

[0037] like Figure 7 As shown, the zinc oxide and titanium oxide thin film layers form a heterojunction film. In an anaerobic environment, the antibacterial glass of this embodiment, which also provides an anaerobic environment, is exposed to light. Electrons in the titanium oxide thin film layer transition to generate holes, and electrons in the zinc oxide thin film layer also transition to generate holes. Electrons from the titanium oxide thin film layer transfer to the zinc oxide thin film layer, and holes from the zinc oxide thin film layer transfer to the titanium oxide thin film layer, increasing the number of holes on the titanium oxide thin film layer. These holes oxidize water into antibacterial active groups, hydroxyl radicals. These antibacterial active groups, hydroxyl radicals, can efficiently kill bacteria, thus achieving effective antibacterial properties under anaerobic conditions. Meanwhile, electrons in the zinc oxide thin film layer can undergo a reduction reaction with external energy. In an aerobic environment, the titanium oxide thin film layer reacts with oxygen to achieve aerobic sterilization.

[0038] The following describes the steps involved in preparing the antibacterial glass with an anaerobic environment according to an embodiment of this utility model using radio frequency magnetron sputtering technology:

[0039] S1: Preparation of Intermediate Layer 2: Radio frequency magnetron sputtering was employed, using a zinc oxide target. The distance between the zinc oxide target and the glass substrate 1 was 20-60 mm. The temperature was 100-500 ℃, the sputtering power was 30-80 W, the gas pressure was 0.5-5 Pa, the argon flow rate was 10-50 sccm, the oxygen flow rate was 5-50 sccm, and the sputtering time was 10-50 min. Appropriate distance, temperature, sputtering power, and gas pressure ensured a uniform and dense zinc oxide film with few defects. A suitable oxygen-argon ratio improved the crystallinity of the zinc oxide film and reduced internal defects. A suitable sputtering time allowed for precise control of the zinc oxide film thickness.

[0040] S2: Preparation of the antibacterial layer 3: After step S1, a radio frequency magnetron sputtering is used, the target material is a titanium oxide target material, the distance between the titanium oxide target material and the glass substrate with the intermediate layer 2 is 20-60 mm, the temperature is 100-500 ℃, the sputtering power is 30-80 W, the gas pressure is 0.5-5 Pa, the argon flow is 10-50 sccm, the oxygen flow is 5-50 sccm, and the sputtering time is 5-12 h. Among them, the appropriate distance, temperature, sputtering power and gas pressure can make the grown titanium oxide film layer uniform and dense, with few defects, the appropriate ratio of oxygen and argon can improve the crystallization performance of the titanium oxide film layer and reduce the internal defects of the titanium oxide film layer, and the appropriate sputtering time can accurately control the thickness of the titanium oxide film layer.

[0041] S3: After step S2 is completed, the glass after step S2 is subjected to heat treatment in air: the heat treatment temperature is 400-600 ℃, and the heat treatment time is 1-3 h. The following gives an example of an antibacterial glass with an anaerobic environment. The temperature range and heat treatment time range can make the film crystallize well and can convert the titanium oxide into anatase titanium oxide crystals. The purpose of this step S3 heat treatment is to convert the film from amorphous to crystalline, which is beneficial to the antibacterial performance.

[0042] The following gives a specific example of a process prepared using radio frequency magnetron sputtering technology: the glass substrate uses a quartz glass substrate, a zinc oxide target material with a diameter of 2 inches is placed at a distance of 55 mm from the quartz glass substrate; the magnetron sputtering chamber is vacuumed to 1x10 -3 Pa, then the quartz glass substrate temperature is heated to 200 ℃, then argon and oxygen are introduced, the flow rates are 30 sccm and 10 sccm respectively, the magnetron sputtering chamber pressure is adjusted to 1 Pa, then the radio frequency power is turned on, the power is adjusted to 40 W, and the zinc oxide film layer is sputtered, the sputtering time is 15 min. Then replace the titanium oxide target material, the titanium oxide target material has a diameter of 2 inches, the distance between the titanium oxide target material and the quartz glass substrate with the zinc oxide film layer is 55 mm, the quartz glass substrate with the zinc oxide film layer is heated to 200 ℃, the flow rates of argon and oxygen are 30 sccm and 10 sccm respectively, the magnetron sputtering chamber pressure is 1 Pa, the power is adjusted to 40 W, and the sputtering time of the titanium oxide film layer is 10 h. Then the above quartz glass with the titanium oxide film layer and the zinc oxide film layer is moved to a tube furnace for heat treatment in air, heated for 2 h at a temperature of 500 ℃.

[0043] In some embodiments, the titanium oxide film layer is an anatase titanium oxide film layer. The anatase titanium oxide film layer has good antibacterial effect.

[0044] In some embodiments, the thickness of the zinc oxide film layer is 50-100 nm. Considering that too thick will affect the bonding force of the zinc oxide film layer and the glass substrate, and the time and economic cost, the zinc oxide film layer and the titanium oxide film layer form a heterojunction film, and a suitable thickness can fully play the role of the heterojunction, therefore, the thickness of the zinc oxide film layer is selected in the range of 50-100 nm.

[0045] In some embodiments, the thickness of the zinc oxide film layer is 80-90 nm. Considering that too thick will affect the bonding force of the zinc oxide film layer and the glass substrate, and the time and economic cost, the zinc oxide film layer and the titanium oxide film layer form a heterojunction film, and a suitable thickness can fully play the role of the heterojunction, therefore, the thickness of the zinc oxide film layer is preferably selected in the range of 80-90 nm.

[0046] In some embodiments, the thickness of the titanium oxide film layer is 50-100 nm. Considering that too thick will affect the bonding force of the titanium oxide film layer and the zinc oxide film layer, and the time and economic cost, the zinc oxide film layer and the titanium oxide film layer form a heterojunction film, and a suitable thickness can fully play the role of the heterojunction, therefore, the thickness of the titanium oxide film layer is selected in the range of 50-100 nm.

[0047] In some embodiments, the thickness of the titanium oxide film layer is 80-90 nm. Considering that too thick will affect the bonding force of the titanium oxide film layer and the zinc oxide film layer, and the time and economic cost, the zinc oxide film layer and the titanium oxide film layer form a heterojunction film, and a suitable thickness can fully play the role of the heterojunction, therefore, the thickness of the titanium oxide film layer is preferably selected in the range of 80-90 nm.

[0048] In some embodiments, the thickness of the zinc oxide film layer is uniform, that is, the thickness of the zinc oxide film layer is uniform; the thickness of the titanium oxide film layer is uniform, that is, the thickness of the titanium oxide film layer is uniform. Thus, the antibacterial glass with an anaerobic environment of the embodiment has good antibacterial effect.

[0049] In some embodiments, the thickness of the zinc oxide film layer and the thickness of the titanium oxide film layer are the same or different. Thus, the selection can be made according to actual needs.

[0050] In some embodiments, the glass substrate layer 1 is ordinary glass or quartz glass, which can be selected according to actual needs.

[0051] Some experimental results of the antibacterial glass with an anaerobic environment according to the embodiments of the present application are given below.

[0052] Figure 2The scanning electron microscope image of the section of the antibacterial glass with anaerobic environment of an embodiment of the utility model has middle layer 2 for zinc oxide film layer, the thickness of middle layer 2 is 90nm, antibacterial layer 3 is titanium oxide film layer, the thickness of antibacterial layer 3 is 90nm, and the thickness of middle layer 2 and antibacterial layer 3 is uniform, and the consistency is good. Figure 3 For the surface wettability test of conventional quartz glass, Figure 4 For the surface wettability test of the antibacterial glass with anaerobic environment of the embodiment of the utility model, Figure 3 And Figure 4 It can be known that the contact angle of conventional quartz glass is 44.43 °, and the contact angle of the antibacterial glass with anaerobic environment of the embodiment of the utility model is only 36.70 °, which shows that the antibacterial glass with anaerobic environment of the embodiment of the utility model has better wettability. Figure 5 And Figure 6 The antibacterial test result schematic diagram of conventional quartz glass and the antibacterial glass with anaerobic environment of the embodiment of the utility model is shown respectively, the antibacterial rate of conventional quartz glass is 67.40 %, the antibacterial rate of the antibacterial glass with anaerobic environment of the embodiment of the utility model is 99.82 %, which shows that the antibacterial glass with anaerobic environment of the embodiment of the utility model has extremely strong antibacterial performance.

[0053] In conclusion, the antibacterial glass with anaerobic environment of the embodiment of the utility model comprises glass substrate layer 1, middle layer 2 and antibacterial layer 3 which are stacked in sequence, the middle layer 2 of the antibacterial glass is a magnetron sputtering middle layer or a pulse laser deposition middle layer, the antibacterial layer 3 is a magnetron sputtering antibacterial layer or a pulse laser deposition antibacterial layer, and the middle layer 2 and the antibacterial layer 3 form a heterojunction film, under the condition of no oxygen, the heterojunction performance is used to oxidize water into antibacterial active group hydroxyl radicals under illumination, the antibacterial active group hydroxyl radicals can kill bacteria efficiently, so as to realize effective antibacterial under anaerobic environment, under the condition of oxygen, the antibacterial layer 3 is oxidized with oxygen, and oxygenic sterilization is realized. In addition, the preparation process of the middle layer 2 and the antibacterial layer 3 is simple, the production cost is low, the interlayer bonding force is strong, the adhesion is firm, the antibacterial layer 3 is not easy to fall off, the surface of the antibacterial layer 3 is smooth, and the hydrophilic performance is strong. Therefore, the antibacterial glass with anaerobic environment of the embodiment of the utility model is suitable for industrial application.

[0054] In the description of the present specification, the description of the terms "one embodiment", "some embodiments", "exemplary embodiment", "example", "specific example" or "some examples" means that the specific features, structures, materials or characteristics described in connection with the embodiment or example are included in at least one embodiment or example of the utility model. In the present specification, the exemplary description of the above terms does not necessarily mean the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in a suitable manner.

[0055] Although the embodiments of the present application have been shown and described, it should be understood by those skilled in the art that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principles and spirit of the present application, and the scope of the present application is defined by the claims and their equivalents.

Claims

1. An antibacterial glass having an anaerobic environment, characterized by, The glass substrate layer, the intermediate layer and the antibacterial layer are sequentially stacked, wherein the intermediate layer is a magnetron sputtering intermediate layer or a pulsed laser deposition intermediate layer, the antibacterial layer is a magnetron sputtering antibacterial layer or a pulsed laser deposition antibacterial layer, and the intermediate layer and the antibacterial layer form a heterojunction film.

2. The anti-bacterial glass with an anaerobic environment according to claim 1, wherein, The intermediate layer is a zinc oxide film layer, and the zinc oxide film layer is a magnetron sputtering zinc oxide film layer or a pulsed laser deposition zinc oxide film layer; the antibacterial layer is a titanium oxide film layer, and the titanium oxide film layer is a magnetron sputtering titanium oxide film layer or a pulsed laser deposition titanium oxide film layer.

3. The anti-bacterial glass with an anaerobic environment according to claim 2, characterized in that, The titanium oxide film layer is an anatase titanium oxide film layer.

4. The antibacterial glass with an anaerobic environment according to claim 2 or 3, characterized in that, The thickness of the zinc oxide film layer is 50-100 nm.

5. The anti-bacterial glass with anaerobic environment according to claim 4, wherein, The thickness of the zinc oxide film layer is 80-90 nm.

6. The antimicrobial glass with an anaerobic environment according to claim 2 or 3, wherein The thickness of the titanium oxide film layer is 50-100 nm.

7. The antimicrobial glass with an anaerobic environment according to claim 6, wherein, The thickness of the titanium oxide film layer is 80-90 nm.

8. The antimicrobial glass with an anaerobic environment according to claim 2 or 3, wherein The thickness of the zinc oxide film layer is uniform, and the thickness of the titanium oxide film layer is uniform.

9. The antimicrobial glass with an anaerobic environment according to claim 2 or 3, wherein The thickness of the zinc oxide film layer and the thickness of the titanium oxide film layer are the same or different.

10. The antimicrobial glass with an anaerobic environment according to any one of claims 1 to 3, wherein The glass substrate layer is ordinary glass or quartz glass.

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