Optical film

Abstract

The utility model discloses an optical film which comprises a base material layer and an optical combined film layer arranged on one side of the base material layer. The optical combined film layer comprises an optical matching layer and a barrier film layer, and the optical matching layer is located between the base material layer and the optical module layer; the barrier film layer is formed by sequentially overlapping at least two laminated film units; each laminated film unit comprises a first optical film layer and a second optical film layer, and the refractive index of the first optical film layer is greater than that of the second optical film layer; the average reflectivity of the optical film in the visible light band is smaller than 1%, the average transmittance is larger than 94%, and the weighted average reflectivity in the near-infrared band is larger than 30%. The optical film provided by the utility model has anti-reflection and anti-reflection effects in a visible light wave band, has a strong reflection effect in a near-infrared region, and has lower reflectivity in far-infrared waves, so that the self-radiation heat dissipation of equipment is hardly influenced.

Description

TECHNICAL FIELD

[0001] The utility model belongs to optical heat insulation film technical field, concretely relates to an optical film. BACKGROUND

[0002] With the rapid development of electronic information technology, optical electronic display equipment has been widely used in daily life, and becomes an indispensable part in people's work, entertainment and communication. However, in daily use, especially in summer high temperature environment, such equipment (such as smart phones, tablet computers, etc.) is prone to rapid temperature rise. This is mainly due to the external near-infrared solar radiation, which causes the surface temperature of the equipment to rise, and the heat generated by the continuous operation of the equipment cannot be dissipated in time through heat radiation, which leads to overheating. The overheating of the equipment will reduce its operating performance and seriously affect the normal use experience of the user. Therefore, how to effectively manage the temperature control of the equipment and maintain the system stability has become an important issue in the current electronic equipment design and user experience optimization.

[0003] At present, the optical film designed to improve the heat insulation performance is usually deposited on the glass or other transparent substrate in the form of single layer, double layer or even multi-layer silver film to achieve high infrared reflectivity. Through this way, the transmission of near-infrared solar radiation can be effectively blocked, thereby inhibiting the temperature rise of the equipment caused by solar radiation.

[0004] However, in the display equipment with silver-coated reflective layer, although this structure can reduce the influence of infrared solar radiation on the equipment to a certain extent, it has about 10% absorption in the visible light band, and its high reflectivity in the visible light region also easily causes discomfort when the human eye watches. In addition, the silver film also has high reflectivity in the far-infrared band. SUMMARY

[0005] The utility model aims at providing an optical film, which has antireflection effect in the visible light band and strong reflection effect in the near-infrared region, so that the temperature rise time of electronic components under outdoor sunlight is greatly prolonged, and the far-infrared reflectivity is low, which hardly affects the self-radiation heat dissipation of the equipment.

[0006] In order to achieve the above purpose, the technical scheme provided by a specific embodiment of the utility model is as follows:

[0007] An optical film, comprising a substrate layer and an optical combination film layer arranged on one side of the substrate layer;

[0008] The optical combination film layer comprises an optical matching layer and a barrier film layer, and the optical matching layer is located between the substrate layer and the barrier film layer;

[0009] The barrier film layer is formed by at least two stacked film units.

[0010] each of the stack film units comprises a first optical film layer and a second optical film layer, the first optical film layer has a refractive index greater than that of the second optical film layer;

[0011] the optical film has an average reflectivity less than 1% and an average transmittance greater than 94% in a visible light wavelength range of 400nm to 700nm;

[0012] the optical film has a weighted average reflectivity greater than 30% in a near-infrared wavelength range of 760nm to 1800nm.

[0013] In one or more embodiments of the present application, the thickness of the first optical film layer in each of the stack film units is 87nm-147nm; the thickness of the second optical film layer in the stack film unit farthest from the optical matching layer is 70nm-100nm, and the thickness of the second optical film layer in the remaining stack film units is 145nm-205nm.

[0014] In one or more embodiments of the present application, the refractive index of the first optical film layer is 1.9-2.4; and / or, the refractive index of the second optical film layer is 1.34-1.52.

[0015] In one or more embodiments of the present application, the first optical film layer is any one of a niobium oxide plating layer, a titanium oxide plating layer, a mixed plating layer of titanium oxide and niobium oxide, a zinc aluminum oxide plating layer, an indium tin oxide plating layer, a tin oxide plating layer, and a tungsten oxide plating layer; and / or, the second optical film layer is any one of a silicon oxide plating layer, a magnesium fluoride plating layer, a mixed plating layer of aluminum and silicon dioxide, and a mixed plating layer of silicon nitride and silicon oxide.

[0016] In one or more embodiments of the present application, the refractive index of the optical matching layer is 1.6-1.8.

[0017] In one or more embodiments of the present application, the optical matching layer is an aluminum oxide plating layer; and / or, the thickness of the optical matching layer is 50nm-100nm.

[0018] In one or more embodiments of the present application, the optical matching layer comprises a first optical matching layer and a second optical matching layer, the first optical matching layer is located between the substrate layer and the second optical matching layer, and the refractive index of the second optical matching layer is less than that of the first optical matching layer.

[0019] In one or more embodiments of the present application, the refractive index of the first optical matching layer is 1.9-2.4; and / or, the refractive index of the second optical matching layer is 1.34-1.52.

[0020] In one or more embodiments of the present application, the first optical matching layer is any one of a niobium oxide plating layer, a titanium oxide plating layer, and a zinc-aluminum oxide plating layer; and / or, the second optical matching layer is any one of a silicon oxide plating layer, a magnesium fluoride layer, and a lithium fluoride plating layer.

[0021] In one or more embodiments of the present application, the first optical matching layer has a thickness of 8nm-18nm; and / or, the second optical matching layer has a thickness of 24nm-44nm.

[0022] In one or more embodiments of the present application, a bonding layer is further provided between the substrate layer and the optical combination film layer, the bonding layer being any one of a silicon plating layer, a titanium oxide plating layer, and a silicon nitride plating layer, and the bonding layer having a thickness less than or equal to 2nm.

[0023] In one or more embodiments of the present application, the optical combination film layer is provided with an anti-fouling layer on a side away from the substrate layer, and the anti-fouling layer has a thickness of 3nm-20nm.

[0024] In one or more embodiments of the present application, the substrate layer is any one of a PET layer, a TAC layer, a PMMA layer, a PC layer, a COP layer, a CPI layer, and glass, and the substrate layer has a thickness of 23μm-3mm.

[0025] Compared with the prior art, the present application has the following beneficial effects:

[0026] The optical film in the present application adopts the combination of the optical matching layer and the barrier film layer, and the barrier film layer adopts the technical scheme of at least 2 groups of stacked film units composed of the first optical film layer with high refractive index and the second optical film layer with low refractive index, so that the weighted average reflectivity in the near-infrared wave band is above 30% to effectively block infrared rays; at the same time, the present application also has good antireflection and anti-reflection effects in the visible light wave band. BRIEF DESCRIPTION OF DRAWINGS

[0027] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the following will briefly introduce the drawings needed to be used in the embodiment or prior art description, and obviously, the drawings in the following description are only some embodiments described in the present application, and for those skilled in the art, other drawings can also be obtained according to these drawings without creative labor.

[0028] Figure 1 It is an embodiment of the present application that the structure of the optical film is shown in the schematic view;

[0029] Figure 2It is a structural schematic view of an optical matching layer in the optical film in an embodiment of the utility model;

[0030] Figure 3 It is a structural schematic view of a barrier film layer in the optical film in an embodiment of the utility model;

[0031] Figure 4 It is a structural schematic view of an optical matching layer in the optical film in an embodiment of the utility model;

[0032] Figure 5 It is a structural schematic view of an optical matching layer in the optical film in an embodiment of the utility model;

[0033] Figure 6 It is a structural schematic view of an optical matching layer in the optical film in an embodiment of the utility model;

[0034] Figure 7 It is a schematic view of the optical film in an embodiment of the utility model being pasted on an optical display carrier;

[0035] Figures 8-17 It is a curve graph of the optical film in embodiment 1-7 and comparative example 1-3 of the utility model in visible light and near infrared reflection;

[0036] Figure 18 It is a contrast graph of the optical film in embodiment 3 and comparative example 4 of the utility model in far infrared reflection.

[0037] Main figure mark explanation:

[0038] 1, base material layer;2, adhesive layer;3, optical matching layer;31, first optical matching layer;32, second optical matching layer;4, barrier film layer;40, laminated film unit;401, first optical film layer;402, second optical film layer;5, anti-fouling layer;6, optical adhesive layer;8, optical display carrier;9, optical combination film layer. Specific implementation

[0039] In order to make the person in the technical field better understand the technical scheme in the present disclosure, the technical scheme in the present disclosure embodiment will be clearly and completely described below in conjunction with the drawings in the present disclosure embodiment, obviously, the described embodiment is only a part of the present disclosure embodiment, rather than all the embodiments. Based on the embodiments in the present disclosure, all other embodiments obtained by the person skilled in the art without creative labor should belong to the scope of the present disclosure.

[0040] The utility model provides a kind of optical film, such as Figures 1-3As shown, the optical film includes a substrate layer 1 and an optical combination film layer 9 arranged on one side of the substrate layer 1, the optical combination film layer 9 includes an optical matching layer 3 and a barrier film layer 4, the optical matching layer 3 is located between the substrate layer 1 and the barrier film layer 4, and the barrier film layer 4 is formed by sequentially stacking at least one stacked film unit 40, each stacked film unit 40 includes a first optical film layer 401 and a second optical film layer 402, and the refractive index of the first optical film layer 401 is greater than the refractive index of the second optical film layer 402.

[0041] Specifically, the first optical film layer and the second optical film layer are stacked and arranged, and the number of stacked groups n≥2 of the first optical film layer and the second optical film layer is controlled, which can reduce the reflection of the optical film and achieve the effect of reducing reflection, and different numbers of stacked film units are used according to different requirements of reducing reflection and heat insulation. The optical matching layer is used to optically match and transition between the stacked film unit and the substrate layer, further reducing the reflection of the optical film in the visible light waveband, and achieving the purpose of reducing reflection and increasing transmission. The optical matching layer and the stacked film unit can be formed by processes such as magnetron sputtering and evaporation coating.

[0042] Through the above arrangement, the average reflectivity of the optical film in the visible light waveband of 400 nm to 700 nm is less than 1%, the average transmittance is greater than 94%, the weighted average reflectivity in the near-infrared waveband of 760 nm to 1800 nm is greater than 30%, and the reflectivity of the optical film in the far-infrared waveband of 8000 nm to 10000 nm is less than 20%, which is helpful for heat dissipation.

[0043] Further, the refractive index of the optical matching layer 3 is 1.6-1.8, the optical matching layer is an aluminum oxide coating layer, and the thickness is 50 nm-100 nm, which can be specifically 50 nm, 60 nm, 70 nm, 80 nm, 90 nm, or 100 nm.

[0044] Further, as shown in the figure, Figure 4 The optical matching layer 3 includes a first optical matching layer 31 and a second optical matching layer 32, the first optical matching layer 31 is located between the substrate layer 1 and the second optical matching layer 32, and the refractive index of the second optical matching layer 32 is less than that of the first optical matching layer 31.

[0045] Specifically, the refractive index of the first optical matching layer is 1.9-2.4, and the refractive index of the second optical matching layer is 1.34-1.52. The first optical matching layer is any one of a niobium oxide coating layer, a titanium oxide coating layer, and a zinc aluminum oxide coating layer, and the thickness is 8 nm-18 nm, which can be specifically 8 nm, 10 nm, 13 nm, 15 nm, or 18 nm. The second optical matching layer is any one of a silicon oxide coating layer, a magnesium fluoride layer, and a lithium fluoride coating layer, and the thickness is 24 nm-44 nm, which can be specifically 24 nm, 30 nm, 33 nm, 35 nm, 38 nm, 40 nm, or 44 nm.

[0046] Furthermore, the first optical film layer can be any one of the following: niobium oxide coating, titanium oxide coating, a mixed coating of titanium oxide and niobium oxide, zinc-aluminum oxide coating, indium tin oxide coating, tin oxide coating, or tungsten oxide coating. Depending on the actual needs, for display devices without touch requirements, zinc-aluminum oxide coating, indium tin oxide coating, tin oxide coating, or tungsten oxide coating can be selected as the first optical film layer with conductive properties. For display devices with touch requirements, niobium oxide coating, titanium oxide coating, or a mixed coating of titanium oxide and niobium oxide can be selected. This is because zinc-aluminum oxide coating, indium tin oxide coating, tin oxide coating, and tungsten oxide coating have high conductivity, which can affect the touch function and also cause electromagnetic shielding to a certain extent. However, selecting niobium oxide coating, titanium oxide coating, or a mixed coating of titanium oxide and niobium oxide can reduce the possibility of the touch function being affected.

[0047] The thickness of the first optical film layer is 87nm-147nm, specifically 87nm, 90nm, 95nm, 100nm, 105nm, 110nm, 115nm, 120nm, 125nm, 130nm, and 147nm. The refractive index of the first optical film layer is 1.9-2.4.

[0048] Furthermore, the refractive index of the second optical film layer is 1.34-1.52. The second optical film layer is any one of the following: silicon oxide coating, magnesium fluoride coating, a mixed coating of aluminum and silicon dioxide, or a mixed coating of silicon nitride and silicon oxide. In the optical film, the thickness of the second optical film layer in the outermost stacked film unit furthest from the optical matching layer is 70nm-100nm, specifically 70nm, 80nm, 85nm, 90nm, 95nm, or 100nm. The thickness of the remaining second optical film layers is 145nm-205nm, specifically 145nm, 150nm, 160nm, 170nm, 180nm, or 205nm. By adjusting the thickness of the outermost second optical film layer and the thicknesses of the remaining second optical film layers, the stacked film unit can better reduce reflection.

[0049] Furthermore, such as Figure 5 As shown, an adhesive layer 2 is further provided between the substrate layer 1 and the optical matching layer 3. The adhesive layer is any one of a silicon coating, a titanium oxide coating, or a silicon nitride coating, which can enhance the adhesion between the optical matching layer and the substrate layer. The thickness of the adhesive layer is less than or equal to 2 nm, specifically 0.5 nm, 1 nm, 1.5 nm, or 2 nm.

[0050] Furthermore, such as Figure 6As shown, the laminated film unit 40 is provided with an anti-fouling layer 5, i.e. an anti-fingerprint layer (AF layer), which can be formed by vacuum evaporation or spraying of a fluorine-containing compound, mainly to make the film material have an anti-fingerprint effect during use. Whether to add the AF layer is selected according to actual application requirements. The thickness of the AF layer is 3 nm-20 nm, and can be specifically 3 nm, 5 nm, 10 nm, 15 nm or 20 nm.

[0051] Further, the substrate layer is any one of a PET (polyethylene terephthalate) layer, a TAC (triacetyl cellulose) layer, a PMMA (polymethyl methacrylate) layer, a PC (polycarbonate) layer, a COP (cyclic olefin polymer) layer, a CPI (transparent polyimide) layer and glass. The above materials are transparent materials with high light transmittance, which can ensure that the film material has high light transmittance. The thickness of the substrate layer is 23 μm-3 mm, and can be specifically 23 μm, 0.5 mm, 1 mm, 2 mm or 3 mm.

[0052] Further, when the substrate layer material is a PET, TAC, PMMA, PC, COP or CPI flexible material, as shown, an optical adhesive layer 6 can be arranged on the side of the substrate layer 1 away from the optical combination film layer 9. The optical film is attached to the optical display carrier 8 or the vehicle window through the optical adhesive layer 6. If the substrate layer is glass, the optical film can be used as a vehicle window glass as a whole. Figure 7

[0053] Specifically, the optical display carrier is an optical component such as a TFT (thin film transistor) screen, an OLED (organic light-emitting diode) screen, an external screen and a camera. The optical adhesive layer is formed of conventional OCA optical adhesive or silicone, and the film material can be attached to the TFT, OLED or other screens or the optical components such as the external screen and the camera. In order to facilitate storage and transportation of the optical film, a protective layer can be arranged on the optical adhesive layer, and the protective layer can be a conventional release film. When the optical film is applied to the optical display carrier, the outermost layer of the optical film is preferably provided with an AF layer to increase the anti-fingerprint effect.

[0054] The utility model will be further described in detail in combination with specific embodiments.

[0055] Embodiment 1

[0056] The optical film in the embodiment includes a substrate layer, a bonding layer, a first optical matching layer, a second optical matching layer and a laminated film unit arranged in sequence.

[0057] The substrate is glass with a thickness of 0.5 mm; the bonding layer is silicon with a thickness of 0.2 nm; the first optical matching layer is niobium oxide with a thickness of 12 nm; and the second optical matching layer is silicon oxide with a thickness of 35 nm.​

[0058] The first optical film layer adopts niobium oxide, the second optical film layer adopts silicon oxide, and the laminated film unit is provided with two layers, that is, the number n of layers of the first optical film layer and the second optical film layer is 2. From the substrate layer to the laminated film unit, the thicknesses of the two first optical film layers are 114 nm and 106 nm in sequence, and the thicknesses of the two second optical film layers are 171 nm and 83 nm in sequence.

[0059] Embodiment 2

[0060] The optical film structure in the embodiment includes a substrate layer, a bonding layer, a first optical matching layer, a second optical matching layer and a laminated film unit which are sequentially stacked, and the laminated film unit includes a first optical film layer and a second optical film layer.

[0061] The substrate adopts glass with a thickness of 0.5 mm; the bonding layer adopts silicon with a thickness of 0.2 nm; the first optical matching layer adopts niobium oxide with a thickness of 12 nm; and the second optical matching layer adopts silicon oxide with a thickness of 35 nm.

[0062] The first optical film layer adopts niobium oxide, the second optical film layer adopts silicon oxide, and the laminated film unit is provided with three layers, that is, the number n of layers of the first optical film layer and the second optical film layer is 3. From the substrate layer to the laminated film unit, the thicknesses of the three first optical film layers are 115 nm, 107 nm and 101 nm in sequence, and the thicknesses of the three second optical film layers are 172 nm, 164 nm and 82 nm in sequence.

[0063] Embodiment 3

[0064] The optical film structure in the embodiment includes a substrate layer, a bonding layer, a first optical matching layer, a second optical matching layer and a laminated film unit which are sequentially stacked, and the laminated film unit includes a first optical film layer and a second optical film layer.

[0065] The substrate adopts glass with a thickness of 0.5 mm; the bonding layer adopts silicon with a thickness of 0.2 nm; the first optical matching layer adopts niobium oxide with a thickness of 12 nm; and the second optical matching layer adopts silicon oxide with a thickness of 35 nm.

[0066] The first optical film layer adopts niobium oxide, the second optical film layer adopts silicon oxide, and the laminated film unit is provided with four layers, that is, the number n of layers of the first optical film layer and the second optical film layer is 4. From the substrate layer to the laminated film unit, the thicknesses of the four first optical film layers are 114 nm, 104 nm, 101 nm and 102 nm in sequence, and the thicknesses of the four second optical film layers are 168 nm, 163 nm, 164 nm and 82 nm in sequence.

[0067] Embodiment 4

[0068] The optical film in the embodiment includes a substrate layer, a first optical matching layer, a second optical matching layer and a laminated film unit arranged in sequence.

[0069] The substrate is glass with a thickness of 0.5 mm; the first optical matching layer is niobium oxide with a thickness of 12 nm; and the second optical matching layer is silicon oxide with a thickness of 35 nm.

[0070] The first optical film layer is niobium oxide, the second optical film layer is silicon oxide, and the laminated film unit is provided with two layers, i.e., the number n of the layers of the first optical film layer and the second optical film layer is 2. From the substrate layer to the laminated film unit, the thicknesses of the two first optical film layers are 114 nm and 106 nm in sequence, and the thicknesses of the two second optical film layers are 171 nm and 83 nm in sequence.

[0071] Embodiment 5

[0072] The optical film in the embodiment includes a substrate layer, a bonding layer, an optical matching layer and a laminated film unit arranged in sequence, and the laminated film unit includes a first optical film layer and a second optical film layer.

[0073] The substrate is glass with a thickness of 0.5 mm; the bonding layer is silicon with a thickness of 0.2 nm; and the optical matching layer is aluminum oxide with a thickness of 50 nm.

[0074] The first optical film layer is niobium oxide, the second optical film layer is silicon oxide, and the laminated film unit is provided with two layers, i.e., the number n of the layers of the first optical film layer and the second optical film layer is 2. From the substrate layer to the laminated film unit, the thicknesses of the two first optical film layers are 114 nm and 106 nm in sequence, and the thicknesses of the two second optical film layers are 171 nm and 83 nm in sequence.

[0075] Embodiment 6

[0076] The optical film in the embodiment includes a substrate layer, a bonding layer, an optical matching layer and a laminated film unit arranged in sequence, and the laminated film unit includes a first optical film layer and a second optical film layer.

[0077] The substrate is glass with a thickness of 0.5 mm; the bonding layer is silicon with a thickness of 0.2 nm; and the optical matching layer is aluminum oxide with a thickness of 74 nm.

[0078] The first optical film layer is niobium oxide, the second optical film layer is silicon oxide, and the laminated film unit is provided with two layers, i.e., the number n of the layers of the first optical film layer and the second optical film layer is 2. From the substrate layer to the laminated film unit, the thicknesses of the two first optical film layers are 114 nm and 106 nm in sequence, and the thicknesses of the two second optical film layers are 171 nm and 83 nm in sequence.

[0079] Example 7

[0080] The optical film in this example includes a substrate layer, a bonding layer, an optical matching layer, and a stacked film unit arranged in sequence, and the stacked film unit includes a first optical film layer and a second optical film layer.

[0081] The substrate is glass with a thickness of 0.5 mm; the bonding layer is silicon with a thickness of 0.2 nm; and the optical matching layer is aluminum oxide with a thickness of 100 nm.

[0082] The first optical film layer is niobium oxide, the second optical film layer is silicon oxide, and the stacked film unit is provided with two layers, i.e., the number of layers n of the first optical film layer and the second optical film layer is 2. From the substrate layer to the stacked film unit, the thicknesses of the two first optical film layers are 114 nm and 106 nm in sequence, and the thicknesses of the two second optical film layers are 171 nm and 83 nm in sequence.

[0083] Comparative Example 1

[0084] The optical film in this example differs from that in Example 1 in that the first optical matching layer and the second optical matching layer are deleted, and the details are as follows:

[0085] The optical film structure in this example includes a substrate layer, a bonding layer, and a stacked film unit arranged in sequence, and the stacked film unit includes a first optical film layer and a second optical film layer.

[0086] The substrate is glass with a thickness of 0.5 mm; and the bonding layer is silicon with a thickness of 0.2 nm.

[0087] The first optical film layer is niobium oxide, the second optical film layer is silicon oxide, and the stacked film unit is provided with two layers, i.e., the number of layers n of the first optical film layer and the second optical film layer is 2. From the substrate layer to the stacked film unit, the thicknesses of the two first optical film layers are 114 nm and 106 nm in sequence, and the thicknesses of the two second optical film layers are 171 nm and 83 nm in sequence.

[0088] Comparative Example 2

[0089] The optical film in this example differs from that in Example 1 in that the stacked film unit is provided with one layer, i.e., the number of layers n of the first optical film layer and the second optical film layer is 1, and the details are as follows:

[0090] The optical film structure in this example includes a substrate layer, a bonding layer, a first optical matching layer, a second optical matching layer, and a stacked film unit arranged in sequence, and the stacked film unit includes a first optical film layer and a second optical film layer, with the first optical film layer located between the optical matching layer and the second optical film layer.

[0091] The substrate is glass with a thickness of 0.5 mm; the bonding layer is silicon with a thickness of 0.2 nm; the first optical matching layer is niobium oxide with a thickness of 12 nm; the second optical matching layer is silicon oxide with a thickness of 35 nm; the first optical film layer is niobium oxide with a thickness of 114 nm; and the second optical film layer is silicon oxide with a thickness of 171 nm.

[0092] Comparative Example 3

[0093] The present comparative example differs from Example 1 only in that the thicknesses of the two second optical film layers are 171 nm, 171 nm in order from the substrate layer to the laminated film unit.

[0094] Comparative Example 4

[0095] The optical film in the present comparative example is prepared as follows:

[0096] Glass is used as the substrate with a thickness of 0.5 mm, and 10 nm of silicon nitride, 5 nm of silver, 10 nm of tin oxide, 5 nm of silver, and 10 nm of silicon nitride are magnetron sputtered on the surface of the substrate in order, which is a commonly used double-silver LOW-E glass structure.

[0097] The optical films in each of the examples and comparative examples are tested, and the test results are shown in Table 1 and Figures 8-18 The infrared barrier test method is: using a spectrophotometer (LAMBDA 750S) to measure the visible light reflectance in the range of 400-700 nm and the infrared reflectance in the range of 760-1800 nm; the adhesion is tested by dry hundred-grid knife, and 4B is qualified, and 5B is determined to be excellent, and the test method is GB / T 9286-2021.

[0098] Table 1: Performance test results of optical films

[0099]

[0100] From Figures 8-17 It can be seen from Table 1 that the average reflectance of the optical films in Examples 1-7 and Comparative Examples 1-4 in the visible light band (400-700 nm) sensitive to the human eye is 0.50%, 0.39%, 0.44%, 0.51%, 0.85%, 0.78%, 0.94%, and 2.23%, 10.99%, 9.82%, 10.99%, respectively. It can be seen that the reflectance of the optical film in the present application is very low and less than 1%, and the transmittance is greater than 94%, which has a good antireflection and antireflection effect.

[0101] The average reflectance of the examples 1-7 and the comparative examples 1-4 in the near-infrared band (760-1800nm) is 33.20%, 35.58%, 41.34%, 33.04%, 33.37%, 33.26%, 33.14% and 33.49%, 9.10%, 27.36%, 58.43% respectively. The solar-like spectrum energy is mainly distributed in the ultraviolet (UV), visible light (Vis) and near-infrared (NIR) three bands, and the energy ratio is approximately: ultraviolet about 5%, visible light about 43%, near-infrared about 52%, referring to the standard table of solar spectrum irradiance: ASTM G173-03. According to the energy intensity distribution at different wavelengths, the weighted average reflectance of the examples 1-7 and the comparative examples 1-4 in the near-infrared band (760-1800nm) is 33.91%, 46.23%, 54.54%, 33.78%, 34.84%, 34.96%, 35.15% and 37.46%, 6.89%, 28.72%, 51.23% respectively.

[0102] The average reflectance of the example 1 and the comparative example 1 in the visible light band (400-700nm) is 0.50%, 2.23% respectively, and the average reflectance in the near-infrared band (760-1800nm) is 33.20%, 33.49% respectively. The optical matching layer can mainly significantly reduce the reflection of the thin film in the visible light band and does not affect the reflection in the near-infrared band.

[0103] As can be seen from the comparative example 1 and the comparative example 2, when the number of stacked layers of the stacked film unit is less than 2 and the thickness of the second optical film on the outermost side exceeds the range, the average reflectance in the visible light band is high, and the average reflectance in the near-infrared band is only 9.1%, and the weighted average reflectance is only 6.89%, and the infrared blocking effect is poor.

[0104] As can be seen from the comparative example 1 and the comparative example 3, when the thickness of the second optical film on the outermost side does not meet the requirements under the premise that the number of stacked layers of the stacked film unit meets the requirements, the antireflection and anti-reflection effect in the visible light band is reduced, and the average reflectance in the near-infrared band is also reduced.

[0105] As can be seen from the examples 1-7 and the comparative example 4, the optimized optical film has the same reflection performance in the infrared band compared with the double-silver LOW-E, but the structure has extremely low reflection and high transmission in the visible light band. On the basis of this process structure, different number of stacked layers and stacked thickness can be adjusted according to different heat insulation performance requirements.

[0106] In the process of using the optical display electronic device, the self-heating temperature is between 20℃-90℃, which corresponds to the thermodynamic temperature T=293.15K and T=363.15K respectively. According to the formula of Wien displacement law: λmax =b / T, where λ max λ is the peak wavelength (in meters), b is the Wien displacement constant, b ≈ 2898 μm·K, and T is the thermodynamic temperature of the object (in K). The corresponding thermal radiation wavelength range is approximately 8000nm-10000nm.

[0107] Depend on Figure 18 It can be seen that, under the condition that the weighted reflectance in the visible and near-infrared range is similar, in the 8000nm-10000nm band, the average reflectance of Example 3 is 15.04%, and the average reflectance of the silver film in Comparative Example 4 is 88.24%.

[0108] It is evident that the optical film in this invention has little impact on the heat dissipation of the electronic components through self-radiation. Most of the infrared radiation emitted by the components will be emitted through the optical film and dissipate into the atmosphere and outer space.

[0109] It will be apparent to those skilled in the art that this disclosure is not limited to the details of the exemplary embodiments described above, and that this disclosure can be implemented in other specific forms without departing from its spirit or essential characteristics. Therefore, the embodiments should be considered in all respects as exemplary and non-limiting, and the scope of this disclosure is defined by the appended claims rather than the foregoing description. Thus, all variations falling within the meaning and scope of equivalents of the claims are intended to be included within this disclosure. No reference numerals in the claims should be construed as limiting the scope of the claims.

[0110] Furthermore, it should be understood that although this specification describes embodiments, not every embodiment contains only one independent technical solution. This narrative style is merely for clarity. Those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

Claims

1. An optical film characterized by, The optical combination film layer comprises an optical matching layer and a barrier film layer, and the optical matching layer is located between the substrate layer and the barrier film layer. The barrier film layer is formed by at least two stacked film units. Each of the stacked film units comprises a first optical film layer and a second optical film layer, and the refractive index of the first optical film layer is greater than that of the second optical film layer. The average reflectivity of the optical film in the visible light wavelength range of 400 nm to 700 nm is less than 1%, and the average transmittance is greater than 94%. The weighted average reflectivity of the optical film in the near-infrared wavelength range of 760 nm to 1800 nm is greater than 30%. The thickness of the first optical film layer in each of the stacked film units is 87 nm to 147 nm.

2. The optical film of claim 1, wherein, The thickness of the second optical film layer in the outermost stacked film unit away from the optical matching layer is 70 nm to 100 nm, and the thickness of the second optical film layer in the remaining stacked film units is 145 nm to 205 nm. The refractive index of the first optical film layer is 1.9 to 2.4; and / or 3. The optical film according to claim 1 or 2, characterized by, The refractive index of the second optical film layer is 1.34 to 1.

52. The first optical film layer is any one of a niobium oxide plating layer, a titanium oxide plating layer, a mixed plating layer of titanium oxide and niobium oxide, a zinc aluminum oxide plating layer, an indium tin oxide plating layer, a tin oxide plating layer, and a tungsten oxide plating layer; and / or 4. The optical film of claim 3, wherein, The second optical film layer is any one of a silicon oxide plating layer, a magnesium fluoride plating layer, a mixed plating layer of aluminum and silicon dioxide, and a mixed plating layer of silicon nitride and silicon oxide. The refractive index of the optical matching layer is 1.6 to 1.

8.

5. The optical film of claim 1, wherein, The optical matching layer is an aluminum oxide plating layer; and / or 6. The optical film of claim 5, wherein, The thickness of the optical matching layer is 50 nm to 100 nm. The optical matching layer comprises a first optical matching layer and a second optical matching layer, the first optical matching layer is located between the substrate layer and the second optical matching layer, and the refractive index of the second optical matching layer is less than that of the first optical matching layer.

7. The optical film of claim 1, wherein, The refractive index of the first optical matching layer is 1.9 to 2.4; and / or 8. The optical film of claim 7, wherein, The refractive index of the second optical matching layer is 1.34 to 1.

52. The first optical matching layer is any one of a niobium oxide plating layer, a titanium oxide plating layer, and a zinc aluminum oxide plating layer; and / or 9. The optical film of claim 8, wherein, The second optical matching layer is any one of a silicon oxide plating layer, a magnesium fluoride layer, and a lithium fluoride plating layer. The thickness of the first optical matching layer is 8 nm to 18 nm; and / or 10. The optical film of claim 8, wherein, The thickness of the second optical matching layer is 24 nm to 44 nm. A bonding layer is further provided between the substrate layer and the optical combination film layer, the bonding layer is any one of a silicon plating layer, a titanium oxide plating layer, and a silicon nitride plating layer, and the thickness of the bonding layer is less than or equal to 2 nm.

11. The optical film of claim 1, wherein, A stain-proof layer is provided on the side of the optical combination film layer away from the substrate layer, and the thickness of the stain-proof layer is 3 nm to 20 nm.

12. The optical film of claim 1, wherein, The substrate layer is any one of a PET layer, a TAC layer, a PMMA layer, a PC layer, a COP layer, a CPI layer, and glass, and the thickness of the substrate layer is 23 μm to 3 mm.

13. The optical film of claim 1, wherein, ​

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