Optical film and optical module

Abstract

The utility model discloses an optical film and an optical assembly. The optical film comprises a base material layer and an optical combined film layer arranged on one side of the base material layer. The optical combined film layer comprises a substrate optical matching layer, a barrier film group layer and a medium optical matching layer which are sequentially laminated on the base material layer; the substrate optical matching layer and the medium optical matching layer are symmetrically arranged along the barrier film group layer; the barrier film group layer is formed by sequentially overlapping N first optical film layers and N-1 second optical film layers, the first optical film layers are arranged on the two outermost sides of the barrier film group layer, the refractive index of the first optical film layers is larger than that of the second optical film layers, and N is larger than or equal to 2. The optical film provided by the utility model has higher transmittance in a visible light wave band, has a strong reflection effect on near-infrared solar radiation, and the weighted reflectivity of near-infrared light is 29%-64%, so that the temperature rise time of electronic components under outdoor sunlight irradiation can be greatly prolonged, and the use experience is improved.

Description

TECHNICAL FIELD

[0001] The utility model belongs to optical heat insulation film technical field, concretely relates to an optical film and optical assembly. BACKGROUND

[0002] With the rapid development of electronic information technology, optical electronic display equipment has been widely used in daily life, and becomes an indispensable part in people's work, entertainment and communication. However, in daily use, especially in summer high temperature environment, such equipment (such as smart phones, tablet computers, etc.) is prone to rapid temperature rise. This is mainly due to the external near-infrared solar radiation, which causes the surface temperature of the equipment to rise, and the heat generated by the continuous operation of the equipment cannot be dissipated in time through heat radiation, which together causes overheating. The overheating of the equipment will reduce its operating performance, and seriously affect the normal use experience of the user. Therefore, how to effectively manage the temperature control of the equipment and maintain the system stability has become an important issue in the current electronic equipment design and user experience optimization.

[0003] At present, the optical film designed to improve the heat insulation performance is usually deposited on the glass or other transparent substrate in the form of single layer, double layer or even multi-layer silver film to achieve high infrared reflectivity. Through this way, the transmission of near-infrared solar radiation can be effectively blocked, thereby inhibiting the temperature rise of the equipment caused by solar radiation.

[0004] However, in the display equipment with silver-coated reflective layer, although this structure can reduce the influence of infrared solar radiation on the equipment to a certain extent, it has about 10% absorption in the visible light band, and its high reflectivity in the visible light region also easily causes discomfort when the human eye watches. SUMMARY

[0005] The utility model aims at providing an optical film and optical assembly, which has strong reflection in the near-infrared region, greatly prolongs the temperature rise time of electronic components under outdoor sunlight, and has low reflectivity in the far-infrared wave, hardly affecting the self-radiation heat dissipation of the equipment.

[0006] In order to achieve the above purpose, the technical scheme provided by a specific embodiment of the utility model is as follows:

[0007] In the first aspect, the utility model provides an optical film, which comprises a substrate layer and an optical combination film layer arranged on one side of the substrate layer.

[0008] The optical combination film layer comprises a base optical matching layer, a barrier film group layer and a dielectric optical matching layer which are sequentially stacked on the substrate layer.

[0009] The base optical matching layer and the dielectric optical matching layer are symmetrically arranged along the barrier film group layer.

[0010] The barrier film group layer is composed of N first optical film layers and N-1 second optical film layers stacked in sequence, the outermost two sides of the barrier film group layer are first optical film layers, the refractive index of the first optical film layer is greater than the refractive index of the second optical film layer, and N is greater than or equal to 2.

[0011] The optical film has a weighted average reflectivity greater than 28% in a near-infrared waveband of 760nm to 1800nm.

[0012] In one or more embodiments of the present application, the refractive index of the first optical film layer is 1.9-2.4, and the thickness is 87nm-147nm.

[0013] The refractive index of the second optical film layer is 1.34-1.52, and the thickness is 145nm-205nm.

[0014] In one or more embodiments of the present application, the first optical film layer is any one of a niobium oxide plating layer, a titanium oxide plating layer, a mixed plating layer of titanium oxide and niobium oxide, a zinc aluminum oxide plating layer, an indium tin oxide plating layer, a tin oxide plating layer, and a tungsten oxide plating layer; and / or,

[0015] The second optical film layer is any one of a silicon oxide plating layer, a magnesium fluoride plating layer, a mixed plating layer of aluminum and silicon dioxide, and a mixed plating layer of silicon nitride and silicon oxide.

[0016] In one or more embodiments of the present application, the refractive index of the substrate optical matching layer and the refractive index of the medium optical matching layer are both 1.6-1.8.

[0017] In one or more embodiments of the present application, the substrate optical matching layer and the medium optical matching layer are both aluminum oxide plating layers; and / or,

[0018] The thickness of the substrate optical matching layer and the thickness of the medium optical matching layer are both 50nm-100nm.

[0019] In one or more embodiments of the present application, the substrate optical matching layer includes a first substrate optical matching layer and a second substrate optical matching layer, the medium optical matching layer includes a first medium optical matching layer and a second medium optical matching layer, the second substrate optical matching layer and the second medium optical matching layer are arranged close to the barrier film group layer, the refractive index of the first substrate optical matching layer is greater than the refractive index of the second substrate optical matching layer, and the refractive index of the first medium optical matching layer is greater than the refractive index of the second medium optical matching layer.

[0020] In one or more embodiments of the present application, the refractive index of the first base optical matching layer and the refractive index of the first medium optical matching layer are both 1.9-2.4; and / or,

[0021] The refractive index of the second base optical matching layer and the refractive index of the second medium optical matching layer are 1.34-1.52.

[0022] In one or more embodiments of the present application, the first base optical matching layer and the first medium optical matching layer are any one of niobium oxide plating layer, titanium oxide plating layer, zinc aluminum oxide plating layer; and / or,

[0023] The second base optical matching layer and the second medium optical matching layer are any one of silicon oxide plating layer, magnesium fluoride layer, lithium fluoride plating layer.

[0024] In one or more embodiments of the present application, the thickness of the first base optical matching layer and the thickness of the first medium optical matching layer are both 8nm-18nm; and / or,

[0025] The thickness of the second base optical matching layer and the thickness of the second medium optical matching layer are both 24nm-44nm.

[0026] In one or more embodiments of the present application, a bonding layer is further provided between the substrate layer and the optical combination film layer, the bonding layer is any one of silicon plating layer, titanium oxide plating layer, silicon nitride plating layer, and the thickness of the bonding layer is less than or equal to 2nm.

[0027] In one or more embodiments of the present application, a hardening layer is provided on the side of the substrate layer away from the optical combination film layer, and the thickness of the hardening layer is 2μm-15μm.

[0028] In one or more embodiments of the present application, the substrate layer is any one of PET layer, TAC layer, PMMA layer, PC layer, COP layer, CPI layer, and glass, and the thickness of the substrate layer is 23μm-3mm.

[0029] In a second aspect, the present application provides an optical assembly, comprising an optical carrier and the optical film as described in the first aspect, and the optical combination film layer of the optical film is provided with an optical adhesive layer on the side away from the substrate layer, and the optical film is attached to the optical carrier through the optical adhesive layer.

[0030] In one or more embodiments of the present application, the optical carrier is optical glass or an optical display assembly.

[0031] Compared with the prior art, the optical film has high transmittance in the visible light band (400nm-700nm), has strong reflection effect on near-infrared solar radiation, and has a weighted average reflectivity of 29%-64% in the near-infrared band (760nm-1800nm), so that when the electronic components are used, the temperature rise time under outdoor sunlight can be greatly prolonged, and the use experience is improved. Moreover, the optical film has low reflectivity in the far-infrared band, and almost does not affect the self-radiation heat dissipation of the equipment.

[0032] The optical film of the utility model can be internally attached to TFT (thin film transistor), OLED (organic light emitting diode) screen or external screen, camera and other optical components, and can reduce the abrasion or peeling of the plating layer during use. ACCURACY

[0033] In order to more clearly illustrate the technical scheme in the embodiments of the utility model or the prior art, the drawings needed to be used in the embodiment or the prior art description will be briefly introduced below, and obviously, the drawings in the following description are only some embodiments in the utility model, and for those skilled in the art, other drawings can be obtained according to these drawings without creating labor.

[0034] Figure 1 It is the structural schematic diagram of optical film in an embodiment of the utility model;

[0035] Figure 2 It is the structural schematic diagram of optical film in an embodiment of the utility model;

[0036] Figure 3 It is the structural schematic diagram of optical film in an embodiment of the utility model;

[0037] Figure 4 It is the structural schematic diagram of optical film in an embodiment of the utility model;

[0038] Figure 5 It is the structural schematic diagram of optical film in an embodiment of the utility model;

[0039] Figure 6 It is the schematic diagram of optical film internally attached to optical carrier in an embodiment of the utility model;

[0040] Figure 7 It is the structural schematic diagram of optical film in an embodiment of the utility model;

[0041] Figures 8-20Fig. 1 is a curve diagram of the reflection of the optical film in Embodiment 1 of the present application at visible light and near infrared;

[0042] Figure 21 Fig. 2 is a comparative diagram of the reflection of the optical film in Embodiment 3 of the present application at far infrared.

[0043] Main figure mark explanation:

[0044] 1, substrate layer; 10, optical combination film layer; 2, adhesive layer; 3, base optical matching layer; 31, first base optical matching layer; 32, second base optical matching layer; 4, barrier film group layer; 41, first optical film layer; 42, second optical film layer; 5, medium optical matching layer; 51, first medium optical matching layer; 52, second medium optical matching layer; 6, hardening layer; 7, optical adhesive layer; 8, protective layer; 9, optical carrier. DETAILED DESCRIPTION

[0045] In order to make the person skilled in the art better understand the technical scheme in the present disclosure, the technical scheme in the present disclosure will be described clearly and completely in the following with reference to the drawings in the present disclosure. Obviously, the described embodiments are only part of the embodiments of the present disclosure, not all. Based on the embodiments in the present disclosure, all other embodiments obtained by the person skilled in the art without creative labor should belong to the protection scope of the present disclosure.

[0046] The present application provides an optical film, as shown in Figures 1-2 The present application provides an optical film, as shown in

[0047] Specifically, in the embodiment, the first optical film layer (high refractive index) and the second optical film layer (low refractive index) with different refractive indexes are stacked, and the number of layers of the first optical film layer and the second optical film layer is controlled, so that the film can effectively ensure excellent reflectivity in the near-infrared wave band. Specifically, different numbers of layers of the first optical film layer and the second optical film layer can be used according to different heat insulation requirements. Through the above arrangement, the weighted average reflectivity of the optical film in the near-infrared wave band of 760 nm to 1800 nm is greater than 28%. At the same time, the reflectivity of the optical film in the far-infrared wave band of 8000 nm to 10000 nm is less than 20%, and when applied to a liquid crystal display device, the optical film can ensure good heat dissipation effect inside the display device.

[0048] Further, in the embodiment, the substrate layer is made of a transparent material with high light transmittance, and PET (polyethylene terephthalate), TAC (triacetyl cellulose), PMMA (polymethyl methacrylate), PC (polycarbonate), COP (cyclic olefin polymer), CPI (transparent polyimide), and glass can be selected as the transparent material. The thickness of the substrate layer is 23 μm to 3 mm, and 23 μm, 0.5 mm, 1 mm, 2 mm, and 3 mm can be selected.

[0049] Further, in the embodiment, the base optical matching layer 3 and the medium optical matching layer 5 are mainly matched with the barrier film group layer 4 to ensure that the entire optical film has good transmittance in the visible light wave band, and can also reduce the reflectivity of the film material in the visible light wave band.

[0050] As a preferred embodiment, the base optical matching layer 3 and the medium optical matching layer 5 can each be a single-layer film structure formed of a medium refractive index material, and the refractive index range is 1.6-1.8. More specifically, the base optical matching layer 3 and the medium optical matching layer 5 are both aluminum oxide plating layers.

[0051] Further, the thickness of the base optical matching layer 3 and the thickness of the medium optical matching layer 5 are both 50 nm to 100 nm, and can be 50 nm, 60 nm, 70 nm, 80 nm, 90 nm, and 100 nm.

[0052] As another preferred embodiment, the base optical matching layer 3 and the medium optical matching layer 5 are both double-layer film structures formed by stacking different refractive index materials. Specifically, as shown in FIG. 2, the base optical matching layer 3 is a double-layer film structure formed by stacking a first base optical matching layer 31 and a second base optical matching layer 32, and the medium optical matching layer 5 is a double-layer film structure formed by stacking a first medium optical matching layer 51 and a second medium optical matching layer 52. Figure 3As shown, the base optical matching layer 3 includes a first base optical matching layer 31 and a second base optical matching layer 32, and the medium optical matching layer 5 includes a first medium optical matching layer 51 and a second medium optical matching layer 52, wherein the second base optical matching layer 32 is located between the first base optical matching layer 31 and the barrier film group layer 4, and the second medium optical matching layer 52 is located between the first medium optical matching layer 51 and the barrier film group layer 4, that is, the second base optical matching layer 32 and the second medium optical matching layer 52 are arranged close to the barrier film group layer 4, so that the first base optical matching layer 31, the second base optical matching layer 32, the first medium optical matching layer 51 and the second medium optical matching layer 52 in the base optical matching layer 3 and the medium optical matching layer 5 constitute a structure symmetrically arranged along the barrier film group layer 4. Wherein, the base optical matching layer 3 and the medium optical matching layer 5 are symmetrically arranged, which means that the base optical matching layer 3 and the medium optical matching layer 5 are symmetrically arranged in position along the barrier film group layer 4. As for the thickness of the base optical matching layer 3 and the thickness of the medium optical matching layer 5, they can be set to be the same or different thicknesses with slight difference according to actual needs.

[0053] Preferably, the refractive index of the first base optical matching layer 31 is greater than the refractive index of the second base optical matching layer 32.

[0054] Preferably, the refractive index of the first base optical matching layer 31 is 1.9-2.4, and the refractive index of the second base optical matching layer 32 is 1.34-1.52. Further preferably, the first base optical matching layer 31 is any one of a niobium oxide plating layer, a titanium oxide plating layer, and a zinc aluminum oxide plating layer, and has a thickness of 8nm-18nm, specifically 8nm, 10nm, 13nm, 15nm, or 18nm. The second base optical matching layer 32 is any one of a silicon oxide plating layer, a magnesium fluoride layer, and a lithium fluoride plating layer, and has a thickness of 24nm-44nm, specifically 24nm, 30nm, 33nm, 35nm, 38nm, 40nm, or 44nm. It should be noted that the refractive index, specific type selection, and thickness selection of the first medium optical matching layer 51 in the medium optical matching layer 5 meet the above description of the first base optical matching layer 31, and the refractive index, specific type selection, and thickness selection of the second medium optical matching layer 52 meet the above description of the second base optical matching layer 32.

[0055] In the embodiment, the barrier film group layer 4 is composed of N first optical film layers 41 and N-1 second optical film layers 42 stacked in sequence, wherein the refractive index of the first optical film layer 41 is 1.9-2.4, and the thickness is 87-147 nm, and specifically can be 87 nm, 90 nm, 95 nm, 100 nm, 105 nm, 110 nm, 115 nm, 120 nm, 125 nm, 130 nm, 147 nm. The refractive index of the second optical film layer 42 is 1.34-1.52, and the thickness is 145-205 nm, and specifically can be 145 nm, 150 nm, 160 nm, 170 nm, 180 nm, 205 nm. By adjusting the thickness, the barrier film group layer can better reduce reflection.

[0056] Further preferably, the first optical film layer 41 is any one of a niobium oxide plating layer, a titanium oxide plating layer, a mixed plating layer of titanium oxide and niobium oxide, a zinc aluminum oxide plating layer, an indium tin oxide plating layer, a tin oxide plating layer, and a tungsten oxide plating layer. According to actual needs, in order to reduce the influence of the plating layer with conductive properties on the touch function of the display device, for display devices without touch requirements, the first optical film layer with conductive properties can be selected from the zinc aluminum oxide plating layer, the indium tin oxide plating layer, the tin oxide plating layer, and the tungsten oxide plating layer. The second optical film layer 42 is any one of a silicon oxide plating layer, a magnesium fluoride plating layer, a lithium fluoride plating layer, a mixed plating layer of aluminum and silicon dioxide, and a mixed plating layer of silicon nitride and silicon oxide.

[0057] As a preferred embodiment, as shown in Figure 4 , an adhesive layer 2 is further provided between the substrate layer 1 and the optical combination film layer 10. The adhesive layer 2 is any one of a silicon plating layer, a titanium oxide plating layer, and a silicon nitride plating layer, which can enhance the adhesion between the substrate layer 1 and the base optical matching layer 3. The thickness of the adhesive layer 2 is less than or equal to 2 nm, and specifically can be 0.5 nm, 1 nm, 1.5 nm, 2 nm.

[0058] Further, as shown in Figure 5 , a hardening layer 6 is provided on the side of the substrate layer 1 away from the optical combination film layer 10. The hardening layer 6 is formed by coating a hardening resin, and the hardening resin can specifically be selected from the SY-5228 of Shinkuu Chemical. The hardening layer 6 can improve the mechanical properties of the film material. In addition, when the substrate is glass, the hardening layer 6 can be omitted. The thickness of the hardening layer 6 is 2-15 μm, and specifically can be 2 μm, 5 μm, 7 μm, 10 μm, 12 μm, 15 μm.

[0059] Further, when the material of the substrate layer 1 is PET, TAC, PMMA, PC, COP, or CPI flexible material, as shown in Figure 6As shown, the optical adhesive layer 7 can be arranged on the side of the optical combination film layer 10 away from the substrate layer 1, and the optical film is attached to the optical carrier 9 through the optical adhesive layer 7. The optical carrier 9 is an optical glass or an optical display component, and the optical display component is a screen such as TFT, OLED, etc., or an external screen, an optical component such as a camera, etc. If the substrate layer is glass, the optical film can be used as a whole as a vehicle window glass.

[0060] As shown, in order to facilitate storage and transportation of the optical film, a protective layer 8 is arranged on the side of the optical adhesive layer 7 away from the substrate layer 1, and the protective layer 8 can adopt a conventional release film. Figure 7

[0061] The utility model will be further described in detail in combination with specific embodiments.

[0062] Embodiment 1

[0063] The optical film in the embodiment comprises a substrate layer, a bonding layer, a base optical matching layer, a barrier film group layer and a medium optical matching layer arranged in sequence, the base optical matching layer comprises a first base optical matching layer and a second base optical matching layer, the medium optical matching layer comprises a first medium optical matching layer and a second medium optical matching layer, and the second base optical matching layer and the second medium optical matching layer are arranged close to the barrier film group layer.

[0064] The substrate is glass with a thickness of 0.5 mm; the bonding layer is silicon with a thickness of 0.2 nm; the first base optical matching layer and the first medium optical matching layer are niobium oxide with a thickness of 13 nm; and the second base optical matching layer and the second medium optical matching layer are silicon oxide with a thickness of 37 nm.

[0065] The barrier film group layer is composed of two first optical film layers and one second optical film layer arranged in sequence, that is, in the direction away from the substrate layer, the first layer in the barrier film group layer is the first optical film layer, the second layer is the second optical film layer, and the third layer is the first optical film layer; the first optical film layer is niobium oxide, and the second optical film layer is silicon oxide.

[0066] In the direction away from the substrate layer, the thicknesses of the two first optical film layers are 117 nm and 117 nm in sequence, and the thickness of the second optical film layer is 179 nm.

[0067] Embodiment 2

[0068] The optical film in the embodiment comprises a substrate layer, a bonding layer, a base optical matching layer, a barrier film group layer and a medium optical matching layer arranged in sequence, the base optical matching layer comprises a first base optical matching layer and a second base optical matching layer, the medium optical matching layer comprises a first medium optical matching layer and a second medium optical matching layer, and the second base optical matching layer and the second medium optical matching layer are arranged close to the barrier film group layer.​

[0069] The substrate is glass with a thickness of 0.5 mm; the bonding layer is silicon with a thickness of 0.2 nm; the first base optical matching layer and the first medium optical matching layer are niobium oxide with a thickness of 13 nm; the second base optical matching layer and the second medium optical matching layer are silicon oxide with a thickness of 34 nm.

[0070] The barrier film group layer is composed of 3 first optical film layers and 2 second optical film layers stacked in sequence, that is, in the direction away from the substrate layer of the barrier film group layer, the first layer in the barrier film group layer is the first optical film layer, the second layer is the second optical film layer, the third layer is the first optical film layer, the fourth layer is the second optical film layer, and the fifth layer is the first optical film layer. The first optical film layer is niobium oxide, and the second optical film layer is silicon oxide.

[0071] In the direction away from the substrate layer of the barrier film group layer, the thicknesses of the three first optical film layers are 117 nm, 110 nm, and 117 nm in sequence, and the thicknesses of the two second optical film layers are 175 nm and 175 nm in sequence.

[0072] Embodiment 3

[0073] The optical film in this embodiment comprises a substrate layer, a bonding layer, a base optical matching layer, a barrier film group layer, and a medium optical matching layer stacked in sequence, the base optical matching layer comprises a first base optical matching layer and a second base optical matching layer, the medium optical matching layer comprises a first medium optical matching layer and a second medium optical matching layer, and the second base optical matching layer and the second medium optical matching layer are arranged close to the barrier film group layer.

[0074] The substrate is glass with a thickness of 0.5 mm; the bonding layer is silicon with a thickness of 0.2 nm; the first base optical matching layer and the first medium optical matching layer are niobium oxide with a thickness of 13 nm; the second base optical matching layer and the second medium optical matching layer are silicon oxide with a thickness of 35 nm.

[0075] The barrier film group layer is composed of 4 first optical film layers and 3 second optical film layers stacked in sequence, that is, in the direction away from the substrate layer of the barrier film group layer, the first layer in the barrier film group layer is the first optical film layer, the second layer is the second optical film layer, the third layer is the first optical film layer, the fourth layer is the second optical film layer, the fifth layer is the first optical film layer, the sixth layer is the second optical film layer, and the seventh layer is the first optical film layer. The first optical film layer is niobium oxide, and the second optical film layer is silicon oxide.

[0076] In the direction away from the substrate layer of the barrier film group layer, the thicknesses of the four first optical film layers are 116 nm, 102 nm, 102 nm, and 116 nm in sequence, and the thicknesses of the three second optical film layers are 171 nm, 164 nm, and 171 nm in sequence.

[0077] Example 4

[0078] The optical film in this example includes a substrate layer, a bonding layer, a base optical matching layer, a barrier film group layer, and a medium optical matching layer arranged in sequence, the base optical matching layer includes a first base optical matching layer and a second base optical matching layer, the medium optical matching layer includes a first medium optical matching layer and a second medium optical matching layer, and the second base optical matching layer and the second medium optical matching layer are arranged close to the barrier film group layer.

[0079] The substrate is glass with a thickness of 0.5 mm, and the bonding layer is silicon with a thickness of 0.2 nm. The first base optical matching layer in the base optical matching layer is niobium oxide with a thickness of 15 nm, and the second base optical matching layer is silicon oxide with a thickness of 33 nm. The first medium optical matching layer in the medium optical matching layer is niobium oxide with a thickness of 12 nm, and the second medium optical matching layer is silicon oxide with a thickness of 36 nm.

[0080] The barrier film group layer is composed of five first optical film layers and four second optical film layers arranged in sequence, i.e. in the direction away from the substrate layer of the barrier film group layer, the odd layers, i.e. the first layer, the third layer, the fifth layer, the seventh layer, and the ninth layer, are first optical film layers, and the even layers, i.e. the second layer, the fourth layer, the sixth layer, and the eighth layer, are second optical film layers, the first optical film layers are niobium oxide, and the second optical film layers are silicon oxide.

[0081] In the direction away from the substrate layer of the barrier film group layer, the thicknesses of the five first optical film layers are 117 nm, 100 nm, 96 nm, 100 nm, and 113 nm in sequence, and the thicknesses of the four second optical film layers are 169 nm, 159 nm, 156 nm, and 163 nm in sequence.

[0082] Example 5

[0083] The optical film in this example includes a substrate layer, a bonding layer, a base optical matching layer, a barrier film group layer, and a medium optical matching layer arranged in sequence, the base optical matching layer includes a first base optical matching layer and a second base optical matching layer, the medium optical matching layer includes a first medium optical matching layer and a second medium optical matching layer, and the second base optical matching layer and the second medium optical matching layer are arranged close to the barrier film group layer.

[0084] The substrate is glass with a thickness of 0.5 mm; the bonding layer is silicon with a thickness of 0.2 nm. The first base optical matching layer in the base optical matching layer is niobium oxide with a thickness of 14 nm; the second base optical matching layer is silicon oxide with a thickness of 33 nm. The first medium optical matching layer in the medium optical matching layer is niobium oxide with a thickness of 12 nm; the second medium optical matching layer is silicon oxide with a thickness of 33 nm.

[0085] The barrier film group layer is composed of 6 first optical film layers and 5 second optical film layers stacked in turn, that is, in the direction away from the substrate layer of the barrier film group layer, the odd layers, i.e. the 1st layer, the 3rd layer, the 5th layer, the 7th layer, the 9th layer, the 11th layer, are first optical film layers, and the even layers, i.e. the 2nd layer, the 4th layer, the 6th layer, the 8th layer, the 10th layer, are second optical film layers, the first optical film layer is niobium oxide, and the second optical film layer is silicon oxide.

[0086] In the direction away from the substrate layer of the barrier film group layer, the thicknesses of the six first optical film layers are 115 nm, 102 nm, 94 nm, 94 nm, 100 nm, and 111 nm in turn, and the thicknesses of the five second optical film layers are 169 nm, 157 nm, 154 nm, 152 nm, and 164 nm in turn.

[0087] Embodiment 6

[0088] The optical film in this embodiment comprises a substrate layer, a base optical matching layer, a barrier film group layer, and a medium optical matching layer stacked in turn, the base optical matching layer comprises a first base optical matching layer and a second base optical matching layer, the medium optical matching layer comprises a first medium optical matching layer and a second medium optical matching layer, and the second base optical matching layer and the second medium optical matching layer are arranged close to the barrier film group layer.

[0089] The substrate is glass with a thickness of 0.5 mm; the first base optical matching layer and the first medium optical matching layer are niobium oxide with a thickness of 13 nm; the second base optical matching layer and the second medium optical matching layer are silicon oxide with a thickness of 37 nm.

[0090] The barrier film group layer is composed of 2 first optical film layers and 1 second optical film layer stacked in turn, that is, in the direction away from the substrate layer of the barrier film group layer, the 1st layer is a first optical film layer, the 2nd layer is a second optical film layer, and the 3rd layer is a first optical film layer, the first optical film layer is niobium oxide, and the second optical film layer is silicon oxide.

[0091] In the direction away from the substrate layer of the barrier film group layer, the thicknesses of the two first optical film layers are 117 nm and 117 nm in turn, and the thickness of the second optical film layer is 179 nm.

[0092] Example 7

[0093] The optical film in this example comprises a substrate layer, a bonding layer, a base optical matching layer, a barrier film group layer, and a medium optical matching layer arranged in sequence. The base optical matching layer and the medium optical matching layer are symmetrically arranged along the barrier film group layer.

[0094] The substrate is glass with a thickness of 0.5 mm; the bonding layer is silicon with a thickness of 0.2 nm; the optical matching layer is aluminum oxide with a thickness of 50 nm; and the medium optical matching layer is aluminum oxide with a thickness of 50 nm.

[0095] The barrier film group layer is provided with three layers, i.e., the number n of layers of the barrier film group layer is 3. In the direction away from the substrate layer of the barrier film group layer, the first layer of the barrier film group layer is a first optical film layer, the second layer of the barrier film group layer is a second optical film layer, and the third layer of the barrier film group layer is a first optical film layer. The first optical film layer is niobium oxide, and the second optical film layer is silicon oxide.

[0096] In the direction away from the substrate layer of the barrier film group layer, the thicknesses of the two first optical film layers are 117 nm and 117 nm in sequence, and the thickness of the second optical film layer is 179 nm.

[0097] Example 8

[0098] The optical film in this example comprises a substrate layer, a bonding layer, a base optical matching layer, a barrier film group layer, and a medium optical matching layer arranged in sequence. The base optical matching layer and the medium optical matching layer are symmetrically arranged along the barrier film group layer.

[0099] The substrate is glass with a thickness of 0.5 mm; the bonding layer is silicon with a thickness of 0.2 nm; the optical matching layer is aluminum oxide with a thickness of 74 nm; and the medium optical matching layer is aluminum oxide with a thickness of 74 nm.

[0100] The barrier film group layer is provided with three layers, i.e., the number n of layers of the barrier film group layer is 3. In the direction away from the substrate layer of the barrier film group layer, the first layer of the barrier film group layer is a first optical film layer, the second layer of the barrier film group layer is a second optical film layer, and the third layer of the barrier film group layer is a first optical film layer. The first optical film layer is niobium oxide, and the second optical film layer is silicon oxide.

[0101] In the direction away from the substrate layer of the barrier film group layer, the thicknesses of the two first optical film layers are 117 nm and 117 nm in sequence, and the thickness of the second optical film layer is 179 nm.

[0102] Example 9

[0103] The optical film in the embodiment comprises a substrate layer, a bonding layer, a base optical matching layer, a barrier film group layer and a medium optical matching layer which are sequentially and layerwisely arranged, and the base optical matching layer and the medium optical matching layer are symmetrically arranged along the barrier film group layer.

[0104] The substrate is glass with a thickness of 0.5 mm; the bonding layer is silicon with a thickness of 0.2 nm; the optical matching layer is aluminum oxide with a thickness of 100 nm; and the medium optical matching layer is aluminum oxide with a thickness of 100 nm.

[0105] The barrier film group layer is provided with three layers, i.e. the number n of the layers of the barrier film group layer is 3. In the direction away from the substrate layer, the first layer of the barrier film group layer is a first optical film layer, the second layer of the barrier film group layer is a second optical film layer, and the third layer of the barrier film group layer is a first optical film layer. The first optical film layer is niobium oxide, and the second optical film layer is silicon oxide.

[0106] In the direction away from the substrate layer, the thicknesses of the two first optical film layers are 117 nm and 117 nm in sequence, and the thickness of the second optical film layer is 179 nm.

[0107] Comparative Example 1

[0108] The present comparative example is different from the embodiment 1 in that the base optical matching layer is removed.

[0109] Comparative Example 2

[0110] The present comparative example is different from the embodiment 1 in that the medium optical matching layer is removed.

[0111] Comparative Example 3

[0112] The optical film in the present comparative example comprises a substrate layer, a bonding layer, a base optical matching layer, a barrier film group layer and a medium optical matching layer which are sequentially and layerwisely arranged. The base optical matching layer comprises a first base optical matching layer and a second base optical matching layer, the medium optical matching layer comprises a first medium optical matching layer and a second medium optical matching layer, the second base optical matching layer and the second medium optical matching layer are arranged close to the barrier film group layer, and the barrier film group layer comprises a first optical film layer and a second optical film layer.

[0113] The substrate is glass with a thickness of 0.5 mm; the bonding layer is silicon with a thickness of 0.2 nm; the first base optical matching layer is niobium oxide with a thickness of 13 nm; the second base optical matching layer is silicon oxide with a thickness of 34 nm; the first medium optical matching layer is niobium oxide with a thickness of 13 nm; and the second medium optical matching layer is silicon oxide with a thickness of 34 nm.

[0114] The barrier film group layer is composed of two first optical film layers and two second optical film layers stacked in sequence, that is, in the direction away from the substrate layer, the first layer in the barrier film group layer is the first optical film layer, the second layer is the second optical film layer, the third layer is the first optical film layer, and the fourth layer is the second optical film layer. The first optical film layer uses niobium oxide, and the second optical film layer uses silicon oxide.

[0115] In the direction away from the substrate layer, the thicknesses of the two first optical film layers are 117 nm and 117 nm in sequence, and the thicknesses of the two second optical film layers are 175 nm and 175 nm in sequence.

[0116] Comparative Example 4

[0117] The preparation of the optical film in the present comparative example is as follows:

[0118] The substrate uses glass with a thickness of 0.5 mm, and 10 nm of silicon nitride, 5 nm of silver, 10 nm of tin oxide, 5 nm of silver, and 10 nm of silicon nitride are magnetron sputtered on the surface in sequence, which is a commonly used double-silver LOW-E glass structure.

[0119] The optical films in each example and each comparative example are tested, and the test results are shown in Table 1. Figures 8-21 and Table 1. Among them, the infrared reflectivity test: using a spectrophotometer (LAMBDA 750S) to measure the visible light transmittance in the range of 400-700 nm and the infrared reflectivity in the range of 760-1800 nm; the adhesion test: using a dry hundred grid knife according to the test method GB / T 9286-2021, test 4B is qualified, and 5B is judged as excellent.

[0120]

[0121] The average transmittance of the visible light band of the technical scheme of the present application in Examples 1-9 is all above 91%, meeting the demand of the optical film; and the weighted average reflectivity of the near-infrared band is all above 28%, among which Example 5 can reach 64.28%, indicating that the present application has good near-infrared barrier effect, and the given far-infrared band reflectivity data shows that the average reflectivity is lower than 20%, indicating that the present application also has a lower reflectivity in the far-infrared band, which corresponds to the temperature range of the internal heat of electronic components in actual application, ensuring good heat dissipation effect.

[0122] Comparing Comparative Example 1 and Example 6, the adhesive layer 2 is added, which has a promoting effect on the adhesion of the film layer.

[0123] As can be seen from the comparative example and Comparative Examples 1 and 2, the substrate optical matching layer and the medium optical matching layer have a great improvement on the average transmittance of the visible light band.

[0124] Comparing Examples 1-9 and Comparative Example 3, it can be seen that the barrier film assembly of this invention adopts an odd-numbered layer structure composed of a first optical film and a second optical film stacked sequentially. Compared with an even-numbered layer structure, this structure can ensure good transmittance in the visible light band.

[0125] Comparing Examples 1-9 and Comparative Example 4, it can be seen that the optimized structure of this invention has comparable or even better reflective performance in the infrared band compared to double silver LOW-E, but in the visible light band, the structure of this invention has lower reflectivity and higher transmittance.

[0126] Based on this process structure, the number and thickness of different barrier film layers can be adjusted according to different thermal insulation performance requirements.

[0127] During the use of optical display electronic devices, their typical heat dissipation temperature is between 20℃ and 90℃, corresponding to thermodynamic temperatures T=293.15K and T=363.15K respectively. According to Wien's displacement law formula: λ max =b / T, where λ max λ is the peak wavelength (unit: meters), b is the Wien displacement constant, b ≈ 2898 μm·K, and T is the thermodynamic temperature of the object (unit: K), which corresponds to a thermal radiation wavelength range of approximately 8000nm-10000nm.

[0128] When the weighted reflectance in the visible and near-infrared regions of Example 3 and Comparative Example 4 are similar, in the range of 8000nm-10000nm, the average reflectance of the laminated heat insulation film of Example 3 is 18.78%, and the average reflectance of the silver-plated film of Comparative Example 4 is 88.24%.

[0129] Depend on Figure 21 It can be seen that the optical film in this invention has little effect on the heat dissipation of the electronic components through self-radiation. Most of the infrared radiation emitted by the components will be emitted through the optical film and dissipate into the atmosphere and outer space.

[0130] It will be apparent to those skilled in the art that this disclosure is not limited to the details of the exemplary embodiments described above, and that this disclosure can be implemented in other specific forms without departing from its spirit or essential characteristics. Therefore, the embodiments should be considered in all respects as exemplary and non-limiting, and the scope of this disclosure is defined by the appended claims rather than the foregoing description. Thus, all variations falling within the meaning and scope of equivalents of the claims are intended to be included within this disclosure. No reference numerals in the claims should be construed as limiting the scope of the claims.

[0131] Furthermore, it should be understood that although the specification is described in terms of embodiments, not every embodiment includes every feature described. The specification can include implicit combinations of explicitly mentioned features and / or explicit combinations of implicitely mentioned features. Each embodiment depends on the explicit combinations of features and / or the implicit combinations of features made specifically within that embodiment, and each such embodiment can be combined with every other such embodiment to create further embodiments.

Claims

1. An optical film, characterized in that, It includes a substrate layer and an optical composite film layer disposed on one side of the substrate layer; The optical composite film layer includes a substrate optical matching layer, a barrier film layer and a dielectric optical matching layer sequentially stacked on the substrate layer; The substrate optical matching layer and the dielectric optical matching layer are symmetrically arranged along the barrier film assembly; The barrier film assembly is composed of N first optical film layers and N-1 second optical film layers stacked sequentially. The outermost two sides of the barrier film assembly are both first optical film layers. The refractive index of the first optical film layer is greater than that of the second optical film layer, and N≥2. The optical film has a weighted average reflectance of more than 28% in the near-infrared band of wavelength 760nm~1800nm.

2. The optical film according to claim 1, characterized in that, The first optical film has a refractive index of 1.9-2.4 and a thickness of 87nm-147nm; The refractive index of the second optical film is 1.34-1.52, and the thickness is 145nm-205nm.

3. The optical film according to claim 2, characterized in that, The first optical film layer is any one of the following: niobium oxide coating, titanium oxide coating, a mixed coating of titanium oxide and niobium oxide, zinc aluminum oxide coating, indium tin oxide coating, tin oxide coating, and tungsten oxide coating; and / or, The second optical film layer is any one of the following: silicon oxide coating, magnesium fluoride coating, a mixed coating of aluminum and silicon dioxide, or a mixed coating of silicon nitride and silicon oxide.

4. The optical film according to claim 1, characterized in that, The refractive index of both the substrate optical matching layer and the dielectric optical matching layer is 1.6-1.

8.

5. The optical film according to claim 4, characterized in that, Both the substrate optical matching layer and the dielectric optical matching layer are aluminum oxide coatings; and / or, The thickness of both the substrate optical matching layer and the dielectric optical matching layer is 50nm-100nm.

6. The optical film according to claim 1, characterized in that, The substrate optical matching layer includes a first substrate optical matching layer and a second substrate optical matching layer, and the dielectric optical matching layer includes a first dielectric optical matching layer and a second dielectric optical matching layer. The second substrate optical matching layer and the second dielectric optical matching layer are both disposed adjacent to the barrier film layer. The refractive index of the first substrate optical matching layer is greater than the refractive index of the second substrate optical matching layer, and the refractive index of the first dielectric optical matching layer is greater than the refractive index of the second dielectric optical matching layer.

7. The optical film according to claim 6, characterized in that, The refractive index of both the first substrate optical matching layer and the first dielectric optical matching layer is 1.9-2.4; and / or, The refractive index of the second substrate optical matching layer and the refractive index of the second medium optical matching layer are 1.34-1.

52.

8. The optical film according to claim 7, characterized in that, Both the first substrate optical matching layer and the first dielectric optical matching layer are any one of niobium oxide coating, titanium oxide coating, and zinc-aluminum oxide coating; and / or, Both the second substrate optical matching layer and the second dielectric optical matching layer are any one of silicon oxide coating, magnesium fluoride layer, and lithium fluoride coating.

9. The optical film according to claim 6, characterized in that, The thickness of both the first substrate optical matching layer and the first dielectric optical matching layer is 8nm-18nm; and / or, The thickness of the second substrate optical matching layer and the thickness of the second dielectric optical matching layer are both 24nm-44nm.

10. The optical film according to claim 1, characterized in that, An adhesive layer is further provided between the substrate layer and the optical composite film layer. The adhesive layer is any one of a silicon coating, a titanium oxide coating, or a silicon nitride coating, and the thickness of the adhesive layer is less than or equal to 2 nm.

11. The optical film according to claim 1, characterized in that, The substrate layer has a hardening layer on the side opposite to the optical composite film layer, and the thickness of the hardening layer is 2μm-15μm.

12. The optical film according to claim 1, characterized in that, The substrate layer is any one of PET layer, TAC layer, PMMA layer, PC layer, COP layer, CPI layer, and glass, and the thickness of the substrate layer is 23μm-3mm.

13. An optical component, characterized in that, The optical film includes an optical carrier and an optical film as described in any one of claims 1-9, wherein an optical adhesive layer is provided on the side of the optical composite film layer opposite to the substrate layer, and the optical film is bonded to the optical carrier through the optical adhesive layer.

14. The optical component according to claim 13, characterized in that, The optical carrier is optical glass or an optical display component.

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