Thermocouple clamping device of gallium diffusion equipment

Abstract

The utility model discloses a thermocouple clamping device of gallium diffusion equipment, and aims to provide the thermocouple clamping device of the gallium diffusion equipment, which is convenient for a heating lead and a compensating lead to be normally connected into a furnace body, and is characterized by comprising a cylinder body, a plurality of thermocouple flanges are arranged on the cylinder body, and a thermocouple water cooling ring is wrapped outside the thermocouple flanges. A thermocouple water-cooling ring is arranged on the cylinder body, a detection device is arranged on the thermocouple water-cooling ring, the detection device comprises a right-angle thermocouple which is located on the outer wall of the thermocouple water-cooling ring and penetrates into the cylinder body, a flange joint is further wrapped on the thermocouple, and a polytetrafluoroethylene sleeve is further arranged between the flange joint and the thermocouple.

Description

TECHNICAL FIELD

[0001] The utility model relates to the field of semiconductor production equipment, concretely relates to a gallium diffusion equipment thermocouple clamping device. BACKGROUND

[0002] Diffusion is a process where a substance migrates from a region of high concentration to a region of low concentration. In semiconductor gallium diffusion processes, gallium atoms or ions penetrate into a silicon substrate through the diffusion process. This process generally follows Fick's Law, which states that the diffusion flux is proportional to the concentration gradient. The diffusion source of gallium can be gaseous (such as gallium trichloride) or solid (such as gallium metal). In a diffusion furnace, heating causes the gallium source to evaporate into gas, which is transported to the silicon substrate through the atmosphere of the diffusion furnace. Atmosphere control (usually using nitrogen or hydrogen) can prevent oxidation and contamination of gallium, while maintaining the stability of the diffusion process. The diffusion process is carried out at high temperature, usually between 800°C and 1100°C. Temperature has a significant impact on diffusion rate: the higher the temperature, the faster the diffusion rate. Diffusion time is also important, as it determines the depth and concentration distribution of gallium in the silicon substrate. The diffusion process is a function of temperature and time, and usually needs to be optimized between the two, the semiconductor material after gallium doping will show different electrical properties, such as improving electron mobility or changing the conductivity type of the semiconductor (such as from n-type to p-type). These performance changes are achieved by adjusting the concentration of gallium and diffusion conditions. Overall, the gallium diffusion process realizes the adjustment and optimization of the electrical properties of semiconductor materials by precisely controlling the doping source, temperature, time, and post-processing steps. The current commonly used process is to seal the gallium source and the substrate into a vacuum quartz cavity, and heat the vacuum quartz cavity to about 1100°C to complete the process.

[0003] At present, a gallium diffusion equipment and process for high-voltage protection device manufacturing is disclosed in Chinese patent CN114709150A, which includes a high-temperature dispersion furnace and a closing door. The front of the high-temperature dispersion furnace is installed with a closing door, and the right side of the front of the high-temperature dispersion furnace is installed with two groups of mounting discs. The right side of the high-temperature dispersion furnace is installed with a control panel. The inside of the high-temperature dispersion furnace is embedded with a protective frame, and the inside of the protective frame is installed with an adjusting crystal boat. The inside of the high-temperature dispersion furnace is installed with a cooling air duct, the inside of the cooling air duct is embedded with a water cooling pipe, and the back of the protective frame is installed with a reaction tank.

[0004] Although this gallium diffusion equipment and process used in the manufacture of high-voltage protection devices can quickly lower the internal temperature by installing cooling air ducts and indirectly reducing the temperature of the heating layer to prevent a shortened lifespan of the electric heating layer, there is a possibility that the vacuum quartz cavity may crack during the heating process as the temperature rises. Therefore, the entire furnace body needs to be evacuated at low pressure. The conduction of thermocouples requires the extension of compensating wires, but the traditional method will destroy the vacuum degree of the furnace body and may also lead to inaccurate measurements. Summary of the Invention

[0005] One objective of this invention is to provide a thermocouple clamping device for gallium diffusion equipment, which has the advantages of ensuring that the heating leads and compensation wires of the furnace body are properly connected to the furnace body while maintaining the furnace body in a vacuum environment to achieve balance.

[0006] The above-mentioned technical objective of this utility model is achieved through the following technical solution:

[0007] A thermocouple clamping device for gallium diffusion equipment includes a cylindrical body with a plurality of thermocouple flanges. Each thermocouple flange is surrounded by a thermocouple water-cooling ring. A detection device is provided on the thermocouple water-cooling ring. The detection device includes a right-angled thermocouple located on the outer wall of the thermocouple water-cooling ring and extending into the cylindrical body. The right-angled thermocouple is also surrounded by a flange joint. A PTFE sleeve is provided between the flange joint and the right-angled thermocouple.

[0008] Further features: The flange joint is also fitted with a joint nut at the top, and the joint nut contains a rubber gasket that wraps around the right-angled thermocouple. The joint nut is also fitted with a PTFE gasket.

[0009] Further configuration: The thermocouple water-cooling ring is also equipped with a water-cooling pipe connected to it.

[0010] Further configuration: The water-cooling pipe is located at both ends of the thermocouple water-cooling ring.

[0011] Further feature: The top of the water-cooling pipe is also equipped with a compression fitting right-angle connector.

[0012] In summary, this utility model has the following beneficial effects: Because the entire furnace body needs to be vacuumed, it is necessary to ensure that the heating leads and compensating wires of the furnace body are properly connected to the furnace body while maintaining the furnace body in a vacuum environment to achieve balance. Therefore, this application aims to install the furnace body main wires and thermocouples as conveniently as possible while ensuring the vacuum level. Furthermore, the wires between the furnace body and the vacuum tank use bare wires with insulating porcelain sleeves. At the vacuum tank exit, the compensating wires are welded into a section of quartz rod and sealed with the flange joint. Attached Figure Description

[0013] The present invention will be further described below with reference to the accompanying drawings.

[0014] Figure 1 This is a schematic diagram of the overall structure of the thermocouple clamping device for gallium diffusion equipment;

[0015] Figure 2 This is a schematic diagram of the cross-sectional structure of the thermocouple clamping device in a gallium diffusion equipment;

[0016] Figure 3 This is a schematic diagram of the enlarged structure at point A, shown by the thermocouple clamping device of the gallium diffusion equipment.

[0017] In the diagram, 1 is the cylinder; 2 is the thermocouple flange; 3 is the thermocouple water-cooling ring; 4 is the detection device; 41 is the right-angle thermocouple; 42 is the flange joint; 43 is the PTFE sleeve; 5 is the joint nut; 6 is the rubber gasket; 7 is the PTFE gasket; 8 is the water-cooling pipe; and 9 is the compression fitting right-angle joint. Detailed Implementation

[0018] The specific embodiments of this utility model will be further described below with reference to the accompanying drawings. The technical solution adopted by this utility model is: a thermocouple clamping device for gallium diffusion equipment, such as... Figure 1 , Figure 2 and Figure 3 As shown, the device includes a cylindrical body 1, on which several thermocouple flanges 2 are provided. The thermocouple flanges 2 are wrapped with thermocouple water-cooling rings 3. The thermocouple water-cooling rings 3 are provided with detection devices 4. The detection devices 4 include right-angle thermocouples 41 located on the outer wall of the thermocouple water-cooling rings 3 and penetrating into the cylindrical body 1. The right-angle thermocouples 41 are also wrapped with flange joints 42. A PTFE sleeve 43 is provided between the flange joints 42 and the right-angle thermocouples 41. A joint nut 5 is also fitted on the top of the flange joints 42. A rubber gasket 6 is provided inside the joint nut 5 to wrap the top of the right-angle thermocouples 41. At the same time, a PTFE gasket 7 is also provided on the joint nut 5. A water-cooling pipe 8 is also provided on the thermocouple water-cooling rings 3 and connected to it. The water-cooling pipe 8 is located at the upper and lower ends of the thermocouple water-cooling rings 3. At the same time, a compression right-angle joint 9 is provided at the top of the water-cooling pipe 8.

[0019] Its main working principle is as follows: The gallium source and substrate are sealed in a vacuum quartz cavity, which is then heated to approximately 1100°C. The furnace body is sealed inside a larger stainless steel tank. A large wire is connected to the furnace body through the vacuum electrode lead, providing heating power. Because the entire furnace body needs to be evacuated, it is necessary to ensure that the heating lead and compensation wire of the furnace body are properly connected to the furnace body while maintaining the furnace body in a vacuum environment. This balance is achieved. At the same time, it is necessary to install SPIKE thermocouples as much as possible while ensuring the vacuum level. Therefore, when the right-angle thermocouple 41 is inserted into the furnace body, a PTFE sleeve 43 is wrapped around the top of the right-angle thermocouple 41. This effectively ensures that the right-angle thermocouple 41 and the flange joint 42 are sealed during assembly, reducing the possibility of vacuum reduction. The bottom of the right-angle thermocouple 41 is directly inserted into the furnace body, allowing direct detection of the temperature inside the furnace body 1, avoiding serious threats to the process.

[0020] The above are merely preferred embodiments of this utility model and are not intended to limit the utility model in any way. Any simple modifications, equivalent changes, and alterations made to the above embodiments based on the technical essence of this utility model shall fall within the scope of the utility model's technical solution.

Claims

1. A thermocouple clamping device for gallium diffusion equipment, comprising a cylindrical body (1), characterized in that: The cylinder (1) is provided with several thermocouple flanges (2), and the thermocouple flanges (2) are wrapped with thermocouple water cooling rings (3). The thermocouple water cooling rings (3) are provided with detection devices (4). The detection devices (4) include right-angle thermocouples (41) located on the outer wall of the thermocouple water cooling rings (3) and extending into the cylinder (1). The right-angle thermocouples (41) are also wrapped with flange joints (42). A PTFE sleeve (43) is provided between the flange joints (42) and the right-angle thermocouples (41).

2. The thermocouple clamping device for gallium diffusion equipment according to claim 1, characterized in that: The flange joint (42) is also fitted with a joint nut (5) at the top. The joint nut (5) contains a rubber gasket (6) that wraps around the right-angle thermocouple (41). The joint nut (5) is also fitted with a PTFE gasket (7).

3. The thermocouple clamping device for gallium diffusion equipment according to claim 2, characterized in that: The thermocouple water-cooling ring (3) is also provided with a water-cooling pipe (8) connected to it.

4. The thermocouple clamping device for gallium diffusion equipment according to claim 3, characterized in that: The water-cooled pipe (8) is located at the upper and lower ends of the thermocouple water-cooled ring (3).

5. The thermocouple clamping device for gallium diffusion equipment according to claim 4, characterized in that: The top end of the water-cooled pipe (8) is also provided with a compression right-angle connector (9).

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