Mechanical arm and in-situ cleanliness detection system for semiconductor equipment parts

Abstract

The utility model discloses a mechanical arm and a semiconductor equipment part cleanliness in-situ detection system, the mechanical arm is used for inductively coupled plasma mass spectrometry detection sampling, the mechanical arm extends along a first direction, one end of the mechanical arm is connected with a sample inlet of an inductively coupled plasma mass spectrometry device, and the other end of the mechanical arm is connected with a second direction. A sending end and a recycling end which extend in the second direction are arranged at the other end of the mechanical arm in a spaced mode, the sending end is provided with an extraction liquid feeding unit used for feeding extraction liquid to the to-be-detected surface, and the recycling end is provided with a recycling unit used for recycling the extraction liquid on the to-be-detected surface and can be communicated with the sample inlet. And the recovered extraction liquid is conveyed to the sample inlet for detection. According to the utility model, the cleanliness in-situ detection of semiconductor equipment parts is realized, and the accuracy of the detection result is improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to semiconductor equipment technical field especially relates to a mechanical arm and semiconductor equipment part's cleanliness in situ detection system. BACKGROUND

[0002] At present, the semiconductor equipment such as epitaxy, etching, thin film deposition etc. require higher and higher cleanliness in cavity. For example, the quartz upper cover (Quartz Lid) in epitaxy equipment, pure nickel (Ni) shower head, silicon carbide thimble and tray etc. have strict requirement on metal ion pollution. Generally, these components need to be tested separately after cleaning. The existing cleanliness characterization test mode is as follows: the cleaned parts are packaged and transported, and then transferred twice to measure the surface cleanliness of the parts by inductively coupled plasma mass spectrometer, liquid particle counter (LPC) and other instruments. The above mode has the defect that the cleaned parts may be contaminated again during the secondary transfer, which affects the test results. Therefore, it is urgent to develop an integrated system of cleaning and measurement analysis to efficiently realize the cleaning and in situ detection of the parts. SUMMARY

[0003] The utility model discloses a kind of mechanical arm and semiconductor equipment part's cleanliness in situ detection system, realize the cleanliness in situ detection of semiconductor equipment part, improve detection result accuracy.

[0004] To achieve the above object, the utility model realizes by the following technical scheme:

[0005] A mechanical arm is used for inductively coupled plasma mass spectrometry sampling, the mechanical arm extends along a first direction, one end of the mechanical arm is connected with a sample inlet of an inductively coupled plasma mass spectrometer, the other end of the mechanical arm is spaced apart from a sending end and a recovery end extending along a second direction, the sending end is provided with an extraction liquid delivery unit for delivering extraction liquid to a surface to be measured, the recovery end is provided with a recovery unit for recovering the extraction liquid on the surface to be measured, and the recovery end is in communication with the sample inlet to transmit the recovered extraction liquid to the sample inlet for detection.

[0006] Optionally, the second direction is not parallel to the first direction.

[0007] Optionally, the mechanical arm has a driving unit to drive the sending end and / or recovery end to move along the first direction.

[0008] Optionally, the sending end includes a containing tube, the containing tube is internally provided with a containing groove to contain the extraction liquid, and an end of the containing tube is provided with a shower head to spray the extraction liquid on the surface to be measured.

[0009] Optionally, the sending end comprises: the accommodating groove comprises two independent sub-grooves, one of which is used for accommodating the release of acidic liquid, and the other of which is used for accommodating the release of deionized water.

[0010] Optionally, each of the sub-grooves is provided with a liquid outlet; a valve is arranged at the liquid outlet, and is used for controlling the liquid outlet amount of each of the sub-grooves.

[0011] Optionally, the sending end further comprises: a premixing cavity, which is located between the accommodating groove and the spray head, and is used for premixing the acidic liquid and the deionized water released by the sub-grooves to form the extraction liquid.

[0012] Optionally, the sending end further comprises: a first moving device, which is used for adjusting the spacing between the accommodating pipe body and the recovery end.

[0013] Optionally, a protection pipe is arranged outside the recovery end, a capillary tube is arranged inside the protection pipe, the capillary tube is used for sucking the extraction liquid on the surface to be measured, a vacuum tube is arranged in the mechanical arm and is in communication with the sample inlet, and the capillary tube is in communication with the vacuum tube through a vacuum valve.

[0014] Optionally, a porous absorption part is arranged at the suction port end of the capillary tube, and is used for sucking the extraction liquid on the surface to be measured.

[0015] Optionally, the porous absorption part is a polyurethane sponge.

[0016] Optionally, the recovery end further comprises a second moving device, which is used for adjusting the distance between the suction port end of the capillary tube and the surface to be measured.

[0017] In another aspect, the utility model also provides a kind of cleanliness in situ detection system of semiconductor equipment parts, comprising: processing cavity;Supporting table, located the inside bottom of the processing cavity, for carrying semiconductor equipment parts;Respectively with the processing cavity integrated setting cleaning module, mechanical arm as described above, and the inductance coupling plasma mass spectrometry device connected with the processing cavity by mechanical arm;The cleaning module comprises: laser cleaning module and carbon dioxide supercritical cleaning module;The laser cleaning module and the carbon dioxide supercritical cleaning module are used to clean the part to be cleaned according to the requirement of part cleaning;Mechanical arm is used to run to the part to be detected above after cleaning process ends, and the part to be detected is sent and recovered extraction liquid;The extraction liquid is transmitted to the inductance coupling plasma mass spectrometry device for analysis.

[0018] Optionally, it further comprises: a rotating table, which is arranged below the supporting table and is used to drive the supporting table to rotate.

[0019] Optionally, the cleaning module further comprises a plasma cleaning module, a supercritical fluid cleaning module or an ultrasonic cleaning module.

[0020] Optionally, the mechanical arm is located at one side of the processing cavity, the carbon dioxide supercritical cleaning module is located at the other side of the processing cavity, and the laser cleaning module is located at the top of the processing cavity.

[0021] The semiconductor equipment part cleanliness in-situ detection system provided by the utility model has at least the following technical effects:

[0022] The utility model discloses a mechanical arm with a vacuumable thin pipe built-in, which realizes the delivery and recovery of extraction liquid on the surface to be measured, and transmits the recovered extraction liquid to the sample inlet of the corresponding detection equipment for detection.

[0023] The first moving device adjusts the distance between the containing pipe body and the recovery end, thereby solving the problem of low detection result accuracy caused by the close distance between the two, and the extraction liquid sprayed from the sending end directly splashing to the recovery end and being recovered.

[0024] The porous absorption part can help to quickly recover the extraction liquid and improve the detection efficiency.

[0025] The second moving device adjusts the distance between the suction end of the capillary tube and the surface to be measured, thereby preventing the suction end from interfering with the surface to be measured and avoiding damage to the measured part or the suction end.

[0026] The semiconductor equipment part cleanliness in-situ detection system provided by the utility model integrates the cleaning module and the detection device, realizes the in-situ detection of the cleanliness of the semiconductor equipment part, and improves the detection result accuracy. BRIEF DESCRIPTION OF DRAWINGS

[0027] Figure 1 The structure diagram of the mechanical arm provided by an embodiment of the utility model is shown in the figure.

[0028] Figure 2 The structure diagram of the semiconductor equipment part cleanliness in-situ detection system provided by an embodiment of the utility model is shown in the figure. DETAILED DESCRIPTION

[0029] The utility model discloses a kind of mechanical arm and the cleanliness in situ detection system of semiconductor equipment parts further detailedly described below in combination with drawings and specific embodiments.The advantages and features of the utility model will be clearer according to the following description.It should be noted that the drawings are very simplified and all use non-precise scale, only to facilitate, clearly assist the purpose of explaining the embodiment of the utility model.For the purpose, features and advantages of the utility model can be more obvious and easy to understand, please refer to the drawings.It is known that the structure, proportion, size etc.

[0030] As Figure 1 Shown, the embodiment provides a kind of mechanical arm 100, for inductively coupled plasma mass spectrometry sampling, the mechanical arm 100 extends along first direction AA', one end (such as Figure 1 Shown left end) of the mechanical arm 100 is connected with the sample inlet of inductively coupled plasma mass spectrometry device (can refer to Figure 2 Mark 212), another end (such as Figure 1 Shown right end) of the mechanical arm 100 is spaced apart and is provided with sending end 102 and recovery end 103 extending along second direction BB', the sending end 102 is provided with extraction liquid delivery unit (can refer to Figure 1 Mark 120-124), for sending extraction liquid to the surface to be measured, the recovery end 103 is provided with recovery unit (can refer to Figure 1 Mark 110-113), for recovering extraction liquid on the surface to be measured, the recovery end 103 can be communicated with the sample inlet, to transmit the extraction liquid recovered to the sample inlet and detect.

[0031] The embodiment realizes sending / recovery extraction liquid to the surface to be measured by built-in vacuumable thin tube, and the extraction liquid recovered is transmitted to the sample inlet of corresponding detection equipment and detected.Furthermore, it can be directly sampled on the surface to be measured by moving mechanical arm without moving the part to be detected, solve the problem that secondary pollution may exist in the process of secondary transfer of the component after cleaning, thereby affecting detection result, improve detection result accuracy.

[0032] In the embodiment, the second direction BB' is not parallel to the first direction AA'. Preferably, as Figure 1The first direction AA' and the second direction BB' are perpendicular in the implemented example, thereby facilitating accurate control of the movement of the sending end 102 and the recovery end 103 to perform the delivery and recovery of the extraction liquid on the corresponding surface to be measured.

[0033] In the embodiment, the mechanical arm 100 has a driving unit (not shown in the figure) to drive the sending end 102 and / or the recovery end 103 to move along the first direction AA'. It can be understood that for the driving unit, as long as it is a component that can drive the mechanical arm 100 to be able to extend or retract along the first direction AA', the utility model is not limited thereto.

[0034] In the embodiment, please continue to refer to Figure 1 The sending end 102 includes a containing tube 120, and the containing tube 120 is internally provided with a containing groove (which can be referred to as reference numeral 121) to contain the extraction liquid. The end of the containing tube 120 is provided with a spray head 124 to spray the extraction liquid on the surface to be measured. The spray head 124 can be a spray head structure with multiple micro through holes to uniformly spray the extraction liquid on the surface to be measured. Figure 1

[0035] In the embodiment, please continue to refer to Figure 1 The containing groove of the sending end 102 includes two independent sub-grooves 121, one of which is used to contain the release of acidic liquid, and the other is used to contain the release of deionized water.

[0036] In the embodiment, please continue to refer to Figure 1 Each of the sub-grooves 121 is provided with a liquid outlet; the liquid outlet is provided with a valve 122 to control the liquid outlet amount of each of the sub-grooves 121.

[0037] In the embodiment, please continue to refer to Figure 1 The sending end 102 further includes a premixing cavity 123 between the containing groove and the spray head 124 to premix the acidic liquid and the deionized water released by the sub-grooves 121 to form the extraction liquid.

[0038] In the embodiment, the extraction liquid is an acidic extraction liquid, such as nitric acid or hydrofluoric acid.

[0039] In the embodiment, please continue to refer to Figure 1 ​As shown, the sending end 102 further comprises a first moving device (not shown in the figure) for adjusting the distance W between the containing tube 120 and the recovery end 103. Thus, the first moving device is arranged to adjust the distance between the containing tube 120 and the recovery end 103, thereby solving the problem that the extract liquid sprayed from the sending end directly splashes to the recovery end and is recovered, reducing the accuracy of the detection result.

[0040] In the embodiment, please continue to refer to Figure 1 As shown, the recovery end 103 is provided with a protection tube 113 outside, and a capillary tube 111 is arranged inside the protection tube 113, which is used to suck the extract liquid on the surface to be detected. The mechanical arm 100 is provided with a vacuum tube 110 communicating with the sample inlet, and the capillary tube 111 communicates with the vacuum tube 110 through a vacuum valve 112.

[0041] In the embodiment or some other embodiments, the suction end of the capillary tube 111 is provided with a porous absorption part for sucking the extract liquid on the surface to be detected. The arrangement of the porous absorption part can help to quickly recover the extract liquid and improve the detection efficiency.

[0042] In the embodiment or some other embodiments, the porous absorption part is a polyurethane sponge.

[0043] In the embodiment, please continue to refer to Figure 1 As shown, the recovery end 103 further comprises a second moving device (not shown in the figure) for adjusting the distance between the suction end of the capillary tube 111 and the surface to be detected. That is, the capillary tube 111 reciprocally moves along the vertical direction HH' to adjust the distance between the suction end of the capillary tube 111 and the surface to be detected, thereby preventing the suction end from interfering with the surface to be detected and avoiding damaging the part to be detected or the suction port.

[0044] Please continue to refer to Figure 2 As shown, the mechanical arm 100 comprises a main arm 101 extending along a first direction AA', and the sending end 102 and the recovery end 103 are arranged on the main arm 101. The vacuum tube 110 and the vacuum valve 112 of the recovery end 103 can be arranged in the main arm 101.

[0045] In the embodiment, the materials of the sending end 102 and the recovery end 103 are polypropylene, PEEK (polyether ether ketone) or Teflon. They are used to prevent corrosion by acidic extract liquid or avoid introducing metal particles and other pollutants to the surface to be detected, which helps to further improve the detection accuracy.

[0046] On the other hand, as Figure 2As shown, the utility model also provides a kind of cleanliness in situ detection system of semiconductor equipment parts, comprising: processing cavity 200;Supporting table 201, inside bottom of the processing cavity 200 is located, for carrying semiconductor equipment parts;Respectively with the cleaning module (can refer to Figure 2 Indicated in reference numerals 210 and 211), mechanical arm 100 as described above, and the inductively coupled plasma mass spectrometry device 212 connected with the processing cavity 200 by mechanical arm 100 are integrally arranged with the processing cavity 200;The cleaning module includes: laser cleaning module 211 and carbon dioxide supercritical cleaning module 210;The laser cleaning module 211 and the carbon dioxide supercritical cleaning module 210 are used to clean the parts according to the needs of cleaning the parts to be cleaned;Mechanical arm 100 is used to run above the part to be detected after the cleaning process is finished, and the extraction liquid is delivered and recovered to the part to be detected;The extraction liquid is transmitted to the inductively coupled plasma mass spectrometry device 212 for analysis.

[0047] The utility model provides a kind of cleanliness in situ detection system of semiconductor equipment parts, realize the integration of cleaning module and detection device, realize the in situ detection of the cleanliness of semiconductor equipment parts, improve the accuracy of detection result.

[0048] In the embodiment, please continue to refer to Figure 2 As shown, the system further includes: rotary table 202, which is arranged below the supporting table 201, for driving the supporting table 201 to rotate. In this way, each part of the parts can be cleaned, improving the cleaning degree of the parts.

[0049] In the embodiment, the materials of the rotary table 202 and the supporting table 201 are Teflon, PEEK or PVDF (polyvinylidene fluoride).

[0050] In the embodiment, the cleaning module further includes: plasma cleaning module ( Figure 2 not shown in the embodiment), supercritical fluid cleaning module ( Figure 2 not shown in the embodiment) or ultrasonic cleaning module ( Figure 2 not shown in the embodiment). It can be understood that the cleaning modules are all mature products, and their specific structures and application processes are not described here.

[0051] In the embodiment, please continue to refer to ​ As shown, the mechanical arm 100 is located on one side of the processing cavity 200; The carbon dioxide supercritical cleaning module 210 is located on the other side of the processing cavity 200; The laser cleaning module 211 is located on the top of the processing cavity 200. In this way, the cleaning of the parts and the sampling by the extraction liquid can be facilitated.

[0052] In conclusion, the mechanical arm 100 can not only sample the parts after cleaning through the extraction liquid, but also sample the parts before cleaning through the extraction liquid, realize the comparative analysis of the part surface (especially the metal ion pollutants on the part surface) before and after cleaning, and quickly evaluate the cleaning effect.

[0053] It should be noted that in this document, the terms "comprise", "comprising", or any other variant thereof are intended to cover non-exclusive inclusions, so that processes, methods, articles or devices that include a series of elements not only include those elements, but also include other elements not explicitly listed, or include elements inherent to such processes, methods, articles or devices. Without more limitations, the element defined by the statement "comprises a" does not exclude the presence of other identical elements in the process, method, article or device that includes the element.

[0054] In the description of the utility model, it should be understood that the orientation or positional relationship indicated by the terms "center", "height", "thickness", "upper", "lower", "vertical", "horizontal", "top", "bottom", "inner", "outer", "axial", "radial", "circumferential" and the like is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the utility model and simplifying the description, and does not indicate or imply that the indicated device or element must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the utility model. In the description of the utility model, unless otherwise specified, the meaning of "a plurality of" is two or more.

[0055] In the description of the utility model, unless otherwise specified and limited, the terms "mounting", "connection", "connection", "fixing" should be understood broadly, for example, it can be fixedly connected, or it can be detachably connected, or it can be integrated; it can be mechanically connected, or it can be electrically connected; it can be directly connected, or it can be indirectly connected through an intermediate medium; it can be the communication between two elements or the interaction relationship between two elements. For ordinary skilled in the art, the specific meaning of the above terms in the utility model can be understood according to the specific circumstances.

[0056] In the utility model, unless another definite provision and limitation, first feature is "on" or "under" second feature can include that first and second features are in direct contact, also can include that first and second features are not in direct contact but contact through other feature between them.

[0057] Although the content of the utility model has been introduced in detail through the above preferred embodiment, it should be recognized that the above description should not be considered as the limitation of the utility model. After the above content is read by the person skilled in the art, various modifications and substitutions of the utility model will be obvious. Therefore, the protection scope of the utility model should be limited by the attached claim.

Claims

1. A robotic arm for inductively coupled plasma mass spectrometry (ICP-MS) detection and sampling, wherein the robotic arm extends along a first direction, and one end of the robotic arm is connected to the sample inlet of an ICP-MS device, characterized in that, The other end of the robotic arm is provided with a transmitting end and a receiving end extending along the second direction at a distance. The transmitting end is equipped with an extractant delivery unit for delivering extractant to the surface to be tested. The recovery end is equipped with a recovery unit for recovering the extract from the surface to be tested. The recovery end can be connected to the injection port to transfer the recovered extract to the injection port for detection.

2. The robotic arm as described in claim 1, characterized in that, The second direction is not parallel to the first direction.

3. The robotic arm as described in claim 1, characterized in that, The robotic arm has a drive unit to drive the sending end and / or the receiving end to move along the first direction.

4. The robotic arm as described in claim 1, characterized in that, The transmitting end includes a receiving tube, the receiving tube having a receiving groove inside to receive the extract; the end of the receiving tube is provided with a spray head for spraying the extract onto the surface to be tested.

5. The robotic arm as described in claim 4, characterized in that, The transmitting end includes: the receiving tank includes two independent sub-tanks, one sub-tank for receiving the released acidic liquid and the other sub-tank for receiving the released deionized water.

6. The robotic arm as described in claim 5, characterized in that, Each of the sub-tanks is provided with a liquid outlet; a valve is provided at the liquid outlet to control the liquid output of each of the sub-tanks.

7. The robotic arm as described in claim 5, characterized in that, The sending end further includes a premixing chamber located between the receiving tank and the spray head, used to premix the acidic liquid released from the sub-tank and the deionized water to form the extract.

8. The robotic arm as described in claim 4, characterized in that, The transmitting end further includes: a first moving device for adjusting the distance between the receiving tube and the receiving end.

9. The robotic arm as described in claim 1, characterized in that, A protective tube is provided on the outside of the recycling end. The protective tube is equipped with a capillary tube, which is used to draw up the extract from the surface to be tested. The robotic arm is equipped with a vacuum tube that communicates with the sample inlet. The capillary tube is connected to the vacuum tube via a vacuum valve.

10. The robotic arm as described in claim 9, characterized in that, The capillary has a porous absorption section at its suction port end, which is used to absorb the extract from the surface to be tested.

11. The robotic arm as described in claim 10, characterized in that, The porous absorbent part is a polyurethane sponge.

12. The robotic arm as described in claim 9, characterized in that, The recovery end also includes a second moving device for adjusting the distance between the suction port end of the capillary and the surface to be tested.

13. A cleanliness in-situ detection system for semiconductor equipment components, characterized in that, include: Processing cavity; A support platform, located at the bottom of the processing cavity, is used to support semiconductor device components; The cleaning module, the robotic arm as described in any one of claims 1 to 12, and the inductively coupled plasma mass spectrometry device connected to the processing cavity via the robotic arm are respectively integrated with the processing cavity; The cleaning module includes: a laser cleaning module and a supercritical carbon dioxide cleaning module; The laser cleaning module and the supercritical carbon dioxide cleaning module are used to clean the parts to be cleaned according to the cleaning requirements of the parts. The robotic arm is used to move above the part to be inspected after the cleaning process is completed, deliver and collect the extract to the part to be inspected; the extract is then transferred to the inductively coupled plasma mass spectrometry device for analysis.

14. The in-situ cleanliness detection system for semiconductor device components as described in claim 13, characterized in that, Also includes: A rotary table is disposed below the support platform and is used to drive the support platform to rotate.

15. The in-situ cleanliness detection system for semiconductor device components as described in claim 13, characterized in that, The cleaning module also includes: a plasma cleaning module, a supercritical fluid cleaning module, or an ultrasonic cleaning module.

16. The in-situ cleanliness detection system for semiconductor device components as described in claim 13, characterized in that, The robotic arm is located on one side of the processing chamber; the supercritical carbon dioxide cleaning module is located on the other side of the processing chamber; and the laser cleaning module is located on top of the processing chamber.

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