Position calibration jig

Abstract

A position calibration jig is used for calibrating the position of a wafer in a wafer boat, and the position calibration jig comprises a light source sheet which is circular, and at least three first light sources are concentrically arranged on the peripheral edge of the first surface of the light source sheet; the first light blocking piece is in a circular shape; wherein the position calibration jig is configured as follows: when the light source sheet is arranged at a first position in the wafer boat, the first light blocking sheet is arranged at a second position in the wafer boat, and at least one wafer is arranged in a wafer boat area between the light source sheet and the first light blocking sheet; the first light source is used for emitting calibration light rays to a preset position in the direction of the first light blocking piece and leaving light spots on the first light blocking piece when the emitted calibration light rays are not blocked by the wafer. Compared with manual naked eye calibration, the calibration error can be greatly reduced.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of semiconductor technology, in particular to a position calibration jig. BACKGROUND

[0002] In the manufacturing process of semiconductor chips, furnace tubes and crystal boats located in the furnace tubes are indispensable equipment, which can be used for deposition, diffusion, oxidation and annealing processes on wafers.

[0003] In the semiconductor process using the furnace tube and the crystal boat, the position of the wafer in the crystal boat needs to be calibrated.

[0004] In the related art, manual visual inspection is used for position calibration, which has a large error. CONTENT OF THE UTILITY MODEL

[0005] A series of simplified concepts are introduced in the utility model content part, which will be further described in detail in the specific embodiment part. The utility model content part of the present application does not mean to try to limit the key features and necessary technical features of the claimed technical solution, nor does it mean to try to determine the protection scope of the claimed technical solution.

[0006] In view of the existing problems, the present application provides a position calibration jig for calibrating the position of a wafer in a crystal boat, comprising:

[0007] A light source sheet, which is circular, and at least three first light sources are concentrically arranged on the outer peripheral edge of the first surface thereof;

[0008] A first light blocking sheet, which is circular;

[0009] Wherein, the position calibration jig is configured to:

[0010] When the light source sheet is arranged at a first position in the crystal boat, the first light blocking sheet is arranged at a second position in the crystal boat, and at least one wafer is arranged in the crystal boat region between the light source sheet and the first light blocking sheet;

[0011] The first light source is used to emit calibration light in the direction where the first light blocking sheet is located, and a light spot is left on the first light blocking sheet when the emitted calibration light is not blocked by the wafer.

[0012] Exemplarily, the position calibration jig further comprises:

[0013] At least three second light sources are concentrically arranged on the outer peripheral edge of the second surface of the light source sheet;

[0014] A second light blocking sheet, which is circular;

[0015] The position calibration jig is configured to:

[0016] When the light source sheet is arranged at a first position in the boat, the second light blocking sheet is arranged at a third position in the boat, and at least one wafer is arranged in the area of the boat between the light source sheet and the second light blocking sheet;

[0017] The second light source is configured to emit calibration light in the direction of the second light blocking sheet, and leave a light spot on the second light blocking sheet when the emitted calibration light is not blocked by the wafer.

[0018] The position calibration jig is further configured to calibrate the position of the boat in the furnace tube, and the position calibration jig further comprises:

[0019] A third light source arranged at the center of the first surface of the light source sheet;

[0020] The center of the first light blocking sheet is provided with a through hole allowing the calibration light emitted by the third light source to pass through;

[0021] An acceptance plate, which is circular in shape;

[0022] The position calibration jig is configured to:

[0023] When the light source sheet is arranged at a fourth position in the boat, the first light blocking sheet is arranged at a fifth position in the boat, and the acceptance plate is arranged at the mouth of the furnace tube, the fourth position, the fifth position, and the mouth of the furnace tube are arranged in sequence;

[0024] The third light source is configured to emit calibration light to the through hole, and leave a light spot on the acceptance plate after the emitted calibration light passes through the through hole, and when the light spot is located at the center of the acceptance plate, it indicates that the center of the boat is on the same axis as the center of the furnace tube.

[0025] The light sources are evenly distributed on the outer peripheral edge of the light source sheet.

[0026] The first light source and the second light source are bidirectional coaxial light sources.

[0027] The diameter of the circle determined by the at least three light sources arranged concentrically is greater than the diameter of the wafer.

[0028] The size of the light blocking sheet is greater than the size of the wafer.

[0029] The outer peripheral edge of the light source sheet is provided with at least three mounting holes for accommodating part of the light sources, and the light sources are movably arranged in the mounting holes.

[0030] Exemplarily, a horizontal ruler is arranged on the light source, and a counterweight is arranged on the bottom of the light source.

[0031] Exemplarily, the light source comprises an infrared laser.

[0032] Compared with manual naked eye calibration, the position calibration jig according to the embodiments of the present application can greatly reduce calibration error, so that the calibrated wafer is in a proper position in the boat. BRIEF DESCRIPTION OF DRAWINGS

[0033] The following drawings for the present application are hereby incorporated as part of the present application for the purpose of understanding the present application. The drawings in the present application and the description thereof serve to explain the principles of the present application.

[0034] Figure 1 A schematic diagram of calibrating the position of a wafer in a boat by using a position calibration jig according to one embodiment of the present application is shown.

[0035] Figure 2 A schematic diagram of calibrating the position of a wafer in a boat by using a position calibration jig according to another embodiment of the present application is shown.

[0036] Figure 3 A schematic diagram of calibrating the position of a wafer in a boat by using a position calibration jig according to another embodiment of the present application is shown.

[0037] Figure 4 A structural schematic diagram of a light source sheet according to one embodiment of the present application is shown.

[0038] Figure 5 A structural schematic diagram of a bidirectional coaxial light source and a horizontal ruler and a counterweight arranged on the bidirectional coaxial light source according to one embodiment of the present application is shown.

[0039] Figure 6 A structural schematic diagram of a light source sheet according to another embodiment of the present application is shown.

[0040] Figure 7 A schematic diagram of calibrating the position of a boat in a furnace tube by using a position calibration jig according to one embodiment of the present application is shown. DETAILED DESCRIPTION

[0041] In the following description, a large number of specific details are given to provide a more thorough understanding of the present application. However, it is apparent to those skilled in the art that the present application can be implemented without one or more of these details. In other instances, some well-known technical features are not described in order to avoid obscuring the present application.

[0042] It is to be understood that the application can assume various alternative embodiments, and that no limitation of the scope of the present application is intended by the description or illustration of the embodiments. Further, each of the embodiments can be used alone or in combination with one another. Regardless of the particular combination of embodiments, the application is intended to cover and embrace all suitable processes, systems, compositions, and articles of manufacture. In the drawings, the size and relative sizes of layers and regions can be exaggerated for clarity. Like reference numerals can represent like elements throughout the drawings.

[0043] It will be understood that when an element or layer is referred to as being "on" or "connected to" another element or layer, it can be directly on or connected to the other element or layer or intervening elements or layers can be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements or layers present. It will also be understood that, when a term is used in the singular, it can also be used in the plural, and vice versa, as is clear to those skilled in the art. It will be further understood that the terms "comprises" and / or "comprising," or "includes" and / or "including" when used in this specification, specify the presence of stated features, regions, integers, steps, operations, elements, and / or components, but do not preclude the presence or addition of one or more other features, regions, integers, steps, operations, elements, components, and / or groups thereof.

[0044] Spatially relative terms, such as "beneath", "below", "lower", "under", "above", "upper" and the like, can be used herein for ease of description to describe one element or feature's relationship to another element(s) or feature(s) as illustrated in the figures. It will be understood that the spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. For example, if the device in the figures is turned over, elements described as "below" or "beneath" other elements or features would then be oriented "above" or "over" the other elements or features. Thus, the exemplary term "below" can encompass both an orientation of above and below. The device can be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.

[0045] The terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the scope of this application. When used herein, the singular forms “a,” “an,” and “the” are also intended to include the plural forms unless the context clearly indicates otherwise. It should also be understood that the terms “comprising” and / or “including,” when used in this specification, identify the presence of the stated features, integers, steps, operations, elements, and / or components, but do not exclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and / or groups. When used herein, the term “and / or” includes any and all combinations of the associated listed items.

[0046] In semiconductor processes using furnace tubes and wafer boats, it is necessary to calibrate the position of the wafer within the wafer boat or the position of the wafer boat within the furnace tube to ensure that the wafer in the wafer boat or the wafer boat in the furnace tube is in the correct position. For example, for wafers in a wafer boat, it is necessary to ensure that the wafer is centered within the wafer boat to avoid scratches and particle defects caused by the wafer rubbing against the wafer boat; similarly, for wafer boats in a furnace tube, it is necessary to ensure that the wafer boat is centered within the furnace tube.

[0047] In related technologies, relying on manual visual calibration of the wafer's position within the wafer boat or the wafer boat's position within the furnace tube results in significant errors.

[0048] To fully understand this application, detailed steps and structures will be presented in the following description to illustrate the technical solutions proposed in this application. Preferred embodiments of this application are described in detail below; however, in addition to these detailed descriptions, this application may have other implementation methods.

[0049] The following is for reference. Figures 1-7 This application describes a position calibration fixture according to one embodiment. The position calibration fixture is used to calibrate the position of a wafer 120 in a boat 110. The position calibration fixture includes: a light source sheet 210, which is circular, with at least three first light sources 231 concentrically arranged on the outer peripheral edge of its first surface; and a first light-blocking sheet 221, which is also circular. The position calibration fixture is configured such that when the light source sheet 210 is positioned at a first position within the boat 110, the first light-blocking sheet 221 is positioned at a second position within the boat 110, and at least one wafer 120 is disposed within the area of ​​the boat 110 between the light source sheet 210 and the first light-blocking sheet 221; the first light sources 231 emit calibration light in the direction of the first light-blocking sheet 221, and leave a light spot on the first light-blocking sheet 221 when the emitted calibration light is not blocked by the wafer 120.

[0050] In the calibration process, first, the light source sheet 210 is placed in a first position in the boat 110, the first light blocking sheet 221 is installed in a second position in the boat 110, and one or more wafers 120 are placed in the region of the boat between the light source sheet 210 and the first light blocking sheet 221.

[0051] Then, at least three first light sources 231 are turned on, and each of the at least three first light sources 231 emits a beam of calibration light in the direction of the first light blocking sheet 221. As shown in FIG. 2B, if each of the emitted beams of calibration light is not blocked by the wafers 120, each of the beams of calibration light forms a spot on the first light blocking sheet 221, which means that the wafers 120 are in a proper position in the boat 110. Conversely, as shown in FIG. 2C, if one of the beams of calibration light is blocked by the wafers 120, and the blocked beam of calibration light fails to form a spot on the first light blocking sheet 221, it indicates that the wafers 120 are not in a proper position in the boat 110. In this case, the position of the wafers 120 can be adjusted (for example, the position of the wafers 120 can be adjusted in the direction indicated by the arrow in the figure) until each of the beams of calibration light is not blocked by the wafers 120 and successfully forms a spot on the first light blocking sheet 221, thereby ensuring that the wafers 120 are in a proper position in the boat 110. Figure 1 Figure 2

[0052] It should be noted that the at least three first light sources 231 are arranged concentrically on the outer peripheral edge of the first surface of the light source sheet 210 because the wafers placed in the region of the boat between the light source sheet 210 and the first light blocking sheet 221 are circular, and at least three points are needed to determine a circle. Therefore, the position of the wafers in the boat is determined by the at least three spots formed by the at least three beams of calibration light emitted by the three first light sources 231 on the first light blocking sheet 221, so as to ensure that the calibrated wafers 120 are in a proper position in the boat 110.

[0053] In this embodiment, the position of the wafers 120 in the boat 110 is calibrated by the position calibration jig, which greatly reduces the calibration error compared with manual visual calibration, so that the calibrated wafers 120 are in a proper position in the boat 110, thereby reducing the scratches and particle defects caused by the scratches between the wafers 120 and the boat 110 due to the position deviation of the wafers 120. In addition, for processes such as film deposition, the wafers 120 can obtain uniform airflow and temperature in the boat 110, so that the film deposited on the surface of the wafers 120 has better uniformity. Furthermore, the work burden of personnel in maintenance can be effectively reduced.

[0054] ​​It should be noted that the position calibration jig in the embodiment can calibrate the position of the wafer 120 in the boat 110 at any suitable stage of the process flow, such as a maintenance stage of the boat 110, a wafer loading stage for actual production, etc., without limitation. In addition, attention should be paid to avoid contamination of the boat and wafer by the position calibration jig.

[0055] In some embodiments, the wafer 120 placed in the region of the boat 110 between the light source sheet 210 and the first light blocking sheet 221 during the calibration process can be a calibration wafer specially used for position calibration, or can be a wafer used for actual production, without limitation.

[0056] It should be noted that when the wafer 120 is in a suitable position in the boat 110, to ensure that the at least three beams of calibration light emitted by the at least three first light sources 231 concentrically arranged on the outer peripheral edge of the first surface of the light source sheet 210 can normally pass through the wafer 120, and then form at least three light spots on the first light blocking sheet 221, the specific arrangement position of the first light sources 231 on the light source sheet 210 can be limited. For example, the diameter of the circle determined by the at least three first light sources 231 arranged concentrically is greater than the diameter of the wafer 120, so as to limit the specific arrangement position of the first light sources 231 on the light source sheet 210.

[0057] Further, the size of the light source sheet 210 should be greater than the size of the wafer 120 placed between the light source sheet 210 and the first light blocking sheet 221, so that the projection of the light source sheet 210 is greater than the projection of the wafer 120 along the central axis direction of the boat 110, and the first light sources 231 are arranged on the light source sheet 210 outside the projection of the wafer 120.

[0058] For example, the size of the light source sheet 210 can be set according to the actual size of the boat 110, such as the size of the light source sheet 210 can match the size of the 6-inch, 8-inch, 12-inch, etc. boat 110.

[0059] In one example, the size of the first light blocking sheet 221 is greater than the size of the wafer 120 placed between the light source sheet 210 and the first light blocking sheet 221, so that the projection of the first light blocking sheet 221 is greater than the projection of the wafer 120 along the central axis direction of the boat 110, so that when the wafer 120 is in a suitable position in the boat 110, the calibration light normally passing through the wafer 120 can form a light spot on the first light blocking sheet 221.

[0060] For example, the size of the first light blocking sheet 221 can be set according to the actual size of the boat 110, such as the size of the first light blocking sheet 221 can match the size of the 6-inch, 8-inch, 12-inch, etc. boat 110.

[0061] In one example, the at least three first light sources 231 concentrically arranged on the outer peripheral edge of the first surface of the light source sheet 210 can be uniformly distributed on the outer peripheral edge of the light source sheet 210, or can not be uniformly distributed, which is not limited. When the at least three first light sources 231 are uniformly distributed, when the wafer 120 is in a proper position in the crystal boat 110, a plurality of light spots uniformly distributed in accordance with the at least three first light sources 231 can be left on the first light blocking sheet 221 in the calibration process; when the at least three first light sources 231 are not uniformly distributed, when the wafer 120 is in a proper position in the crystal boat 110, a plurality of light spots not uniformly distributed in accordance with the at least three first light sources 231 can be left on the first light blocking sheet 221 in the calibration process.

[0062] Exemplarily, as shown in Figure 4 and Figure 6 , the edge of the light source sheet 210 is provided with three first light sources 231, the three first light sources 231 are uniformly distributed, the distance between the first light source 231 and the center of the light source sheet 210 is 100.2mm±0.2mm, and the included angle between the center line of the adjacent two first light sources 231 and the light source sheet 210 is 120°.

[0063] In one example, the light source sheet 210 is arranged at a first position in the crystal boat 110, and the first light blocking sheet 221 is arranged at a second position in the crystal boat 110, wherein, in the height direction, the first position can be a middle height position of the crystal boat 110 or any other suitable height position, and the second position can be any suitable height position above or below the first position, which is not limited; in the horizontal direction, the center of the light source sheet 210 can be located on the center axis of the crystal boat 110 or not, and the center of the first light blocking sheet 221 can be located on the center axis of the crystal boat 110 or not, which is not limited.

[0064] Taking the case that the light source sheet 210 is arranged at the bottom of the crystal boat 110 and the first light blocking sheet 221 is arranged at the top of the crystal boat 110 as an example, the at least three first light sources 231 concentrically arranged on the outer peripheral edge of the first surface of the light source sheet 210 can emit calibration light to the first light blocking sheet 221, so as to calibrate the positions of all wafers 120 between the bottom and the top of the crystal boat 110.

[0065] For example, when the center of the light source sheet 210 and the center of the first light blocking sheet 221 are both located on the central axis of the boat 110, the position calibration can ensure that the wafer 120 is in the center of the boat 110, i.e., the center of the wafer 120 is located on the central axis of the boat 110, so that the wafer 120 will not be scratched by the boat 110 to generate scratches and particle defects. In addition, for film deposition and other processes, the wafer 120 can obtain uniform airflow and temperature in the boat 110, so that the film deposited on the surface of the wafer 120 has better uniformity.

[0066] It should be noted that the position calibration jig in the above can only calibrate the position of the wafer 220 in the wafer boat area between the light source sheet 210 and the first light blocking sheet 221. When the light source sheet 210 is not arranged at the bottom of the boat 210 and the first light blocking sheet 221 is not arranged at the top of the boat 210, the position calibration jig cannot calibrate the position of all wafers 110 in the boat 210.

[0067] Therefore, in some other embodiments, as shown in Figure 3 and Figure 4 , the position calibration jig further comprises: at least three second light sources 232 arranged concentrically on the outer peripheral edge of the second surface of the light source sheet 210; and a second light blocking sheet 222, which is circular. The position calibration jig is configured to: when the light source sheet 210 is arranged at a first position in the boat 110, the second light blocking sheet 222 is arranged at a third position in the boat 110, and at least one wafer 120 is arranged in the wafer boat area between the light source sheet 210 and the second light blocking sheet 222; the second light source 232 is used to emit calibration light in the direction where the second light blocking sheet 222 is located, and leave a light spot on the second light blocking sheet 222 when the emitted calibration light is not blocked by the wafer 120.

[0068] Similarly, when the wafer 120 arranged in the wafer boat area between the light source sheet 210 and the second light blocking sheet 222 is in a proper position, the calibration light emitted by the at least three second light sources 232 will not be blocked by the wafer 120, and each beam of calibration light can form a light spot on the second light blocking sheet 222. Conversely, if the calibration light emitted by one of the second light sources 232 is blocked by the wafer 120, and the blocked calibration light cannot form a light spot on the second light blocking sheet 222, it indicates that the wafer 120 is not in a proper position in the boat 110. Therefore, the position of the wafer 120 can be adjusted (for example, the position of the wafer 120 can be adjusted in the direction indicated by the arrow in Figure 2 , until each beam of calibration light is not blocked by the wafer 120 and can successfully leave a light spot on the second light blocking sheet 222, so as to ensure that the wafer 120 is in a proper position in the boat 110.

[0069] In this embodiment, the second light source 232 is arranged on the second surface of the light source sheet 210, and the second light blocking sheet 222 is arranged, so that the position calibration area in the wafer boat 110 can be expanded.

[0070] It should be noted that when the wafer 120 is in a proper position in the wafer boat 110, at least three calibration light beams emitted by the at least three second light sources 232 arranged concentrically on the outer peripheral edge of the second surface of the light source sheet 210 can normally pass through the wafer 120, and then form at least three light spots on the second light blocking sheet 222, so that the specific arrangement position of the second light source 232 on the light source sheet 210 can be limited. For example, the diameter of the circle determined by the at least three second light sources 232 arranged concentrically is greater than the diameter of the wafer 120, so as to limit the specific arrangement position of the second light source 232 on the light source sheet 210.

[0071] Further, the size of the light source sheet 210 should be greater than the size of the wafer 120 placed between the light source sheet 210 and the second light blocking sheet 222, so that the projection of the light source sheet 210 along the central axis of the wafer boat 110 is greater than the projection of the wafer 120, and the second light source 232 is arranged on the light source sheet 210 outside the projection of the wafer 120.

[0072] For example, the size of the light source sheet 210 can be set according to the actual size of the wafer boat 110, for example, the size of the light source sheet 210 can match the size of the wafer boat 110 of 6 inches, 8 inches, 12 inches, etc.

[0073] In one example, the size of the second light blocking sheet 222 is greater than the size of the wafer 120 placed between the light source sheet 210 and the second light blocking sheet 222, so that the projection of the second light blocking sheet 222 along the central axis of the wafer boat 110 is greater than the projection of the wafer 120, so that when the wafer 120 is in a proper position in the wafer boat 110, the calibration light beam normally passing through the wafer 110 can form a light spot on the second light blocking sheet 222.

[0074] For example, the size of the second light blocking sheet 222 can be set according to the actual size of the wafer boat, for example, the size of the second light blocking sheet 222 can match the size of the wafer boat 110 of 6 inches, 8 inches, 12 inches, etc.

[0075] In one example, the at least three second light sources 232 concentrically arranged on the outer peripheral edge of the first surface of the light source sheet 210 can be uniformly distributed on the outer peripheral edge of the light source sheet 210, or can not be uniformly distributed, which is not limited. When the at least three second light sources 232 are uniformly distributed, when the wafer 120 is in a proper position in the crystal boat 110, a plurality of light spots uniformly distributed with the at least three second light sources 232 can be left on the second light blocking sheet 222 in the calibration process; when the at least three second light sources 232 are not uniformly distributed, when the wafer 120 is in a proper position in the crystal boat 110, a plurality of light spots not uniformly distributed with the at least three second light sources 232 can be left on the second light blocking sheet 222 in the calibration process.

[0076] Exemplarily, as shown in Figure 4 and Figure 6 , the edge of the light source sheet 210 is provided with three second light sources 232, the three second light sources 232 are uniformly distributed, the distance between the second light source 232 and the center of the light source sheet 210 is 100.2mm±0.2mm, and the included angle between the center line of the adjacent two second light sources 232 and the light source sheet 210 is 120°.

[0077] In one example, the light source sheet 210 is arranged at a first position in the crystal boat 110, and the second light blocking sheet 222 is arranged at a third position in the crystal boat 110. In the height direction, the first position can be a middle height position of the crystal boat 110 or any other suitable height position, and the third position can be any suitable height position above or below the first position, which is not limited. In the horizontal direction, the center of the light source sheet 210 can be located on the center axis of the crystal boat 110 or not, and the center of the second light blocking sheet 222 can be located on the center axis of the crystal boat 110 or not, which is not limited.

[0078] Taking the example that the light source sheet 210 is arranged in the middle of the crystal boat 110, the first light blocking sheet 221 is arranged at the top of the crystal boat 110, and the second light blocking sheet 222 is arranged at the bottom of the crystal boat 110, the at least three first light sources 231 concentrically arranged on the outer peripheral edge of the first surface of the light source sheet 210 can emit calibration light to the first light blocking sheet 221, and at the same time, the at least three second light sources 232 concentrically arranged on the outer peripheral edge of the second surface of the light source sheet 210 can emit calibration light to the second light blocking sheet 222, so as to calibrate the positions of all wafers 110 between the bottom and the top of the crystal boat 110.

[0079] Taking the center of the light source sheet 210 and the center of the second light-blocking sheet 222 as both located on the central axis of the crystal boat 110, after calibration, it can be ensured that the wafer 120 is in the center of the crystal boat 110, that is, the center of the wafer 120 is located on the central axis of the crystal boat 110, so that the wafer 120 will not scratch or have particle defects due to friction with the crystal boat 110. In addition, for processes such as film deposition, it can ensure that the wafer 120 obtains uniform airflow and temperature in the crystal boat 110, thereby making the film deposited on the surface of the wafer 120 have better uniformity.

[0080] In some embodiments, the first light source 231 and / or the second light source 232 can be disposed on the light source sheet 210 in any suitable manner. For example, at least three mounting holes are provided at the outer peripheral edge of the light source sheet 210 for accommodating portions of the first light source 231 and / or the second light source 232, and the first light source 231 and / or the second light source 232 are movably disposed in the mounting holes.

[0081] Taking the example of having at least three mounting holes at the outer periphery of the light source sheet 210 for accommodating the first light source 231, one first light source 231 can be movably disposed in each mounting hole. By movably disposing the first light source 231 in the mounting hole, the first light source 231 can be adjusted to be in a vertical state, so as to ensure that the calibration light emitted by the first light source 231 during the calibration process is emitted in the vertical direction, avoiding calibration errors caused by an angle between the calibration light and the vertical direction.

[0082] Taking an example where at least three mounting holes for accommodating a second light source 232 are provided at the outer peripheral edge of the light source sheet 210, a second light source 232 can be movably disposed in each mounting hole. By movably disposing the second light source 232 in the mounting hole, the second light source 232 can be adjusted to be in a vertical state, so as to ensure that the calibration light emitted by the second light source 232 is emitted in a vertical direction during the calibration process, and to avoid calibration errors caused by an angle between the calibration light and the vertical direction.

[0083] The first light source 231 and the second light source 232 can each be a unidirectional light source, and correspondingly, the first light source 231 and the second light source 232 are disposed in different mounting holes. Alternatively, the first light source 231 and the second light source 232 can be a bidirectional coaxial light source, and the first light source 231 and the second light source 232 on the bidirectional coaxial light source are disposed in the same mounting hole.

[0084] In one example, such as Figure 5 As shown, a level 240 is provided on the first light source 231 and / or the second light source 232, and a counterweight 250 is provided at the bottom of the first light source 231 and / or the second light source 232.

[0085] The level 240 can be used to indicate the horizontal plane where the first light source 231 and / or the second light source 232 are located. By determining whether the first light source 231 and / or the second light source 232 are perpendicular to the horizontal plane, it can be confirmed whether the first light source 231 and / or the second light source 232 are in a vertical state.

[0086] The weight 250 at the bottom of the first light source 231 and / or the second light source 232 can naturally keep the first light source 231 and / or the second light source 232 in a vertical position, thereby preventing the first light source 231 and / or the second light source 232 from deviating from the vertical direction. This ensures that the calibration light emitted by the first light source 231 and / or the second light source 232 is emitted in the vertical direction, avoiding calibration errors caused by an angle between the calibration light and the vertical direction.

[0087] In some embodiments, the first light source 231 and / or the second light source 232 may be an infrared laser or any other suitable light source. Accordingly, the calibration light emitted by the first light source 231 and / or the second light source 232 may be an infrared laser or other suitable type of light, without limitation.

[0088] In other embodiments, such as Figure 6 and Figure 7 As shown, the position calibration fixture is also used to calibrate the position of the crystal boat 110 in the furnace tube 130. The position calibration fixture also includes: a third light source 233 located at the center of the first surface of the light source plate 210; a through hole 260 provided at the center of the first light-blocking plate 221 to allow the calibration light emitted by the third light source 233 to pass through; and a receiving plate 280, which is circular. The position calibration fixture is configured such that when the light source plate 210 is located at the fourth position in the crystal boat 110, the first light-blocking plate 221 is located at the fifth position in the crystal boat, and the receiving plate 280 is located at the furnace tube opening, the fourth position, the fifth position, and the furnace tube opening are arranged sequentially; the third light source 233 is used to emit calibration light into the through hole 260, and after the emitted calibration light passes through the through hole 260, it leaves a light spot on the receiving plate 280. When the light spot is located at the center of the receiving plate 280, it indicates that the center of the crystal boat 110 and the center of the furnace tube 130 are on the same axis.

[0089] During the calibration process, the light source sheet 210 is first placed in the fourth position inside the crystal boat 110, the first light-blocking sheet 221 is installed in the fifth position inside the crystal boat 110, and the receiving plate 280 is placed at the furnace tube opening, with the fourth position, the fifth position, and the furnace tube opening arranged in sequence.

[0090] Then the third light source 233 is turned on, and the third light source 233 emits calibration light to the through hole 260 on the first light blocking sheet 221. If the calibration light emitted by the third light source 233 passes through the through hole 260 and forms a light spot on the receiving plate 280, when the light spot is located at the center of the receiving plate 280, it indicates that the center of the crystal boat 110 is on the same axis as the center of the furnace tube 130, which means that the crystal boat 110 is in the proper position in the furnace tube 130; otherwise, if the calibration light emitted by the third light source 233 cannot pass through the through hole 260, or the light spot formed by the calibration light passing through the through hole 260 on the receiving plate 280 is not located at the center of the receiving plate 280, it indicates that the position of the crystal boat 110 in the furnace tube 130 is not proper, so the position of the crystal boat 110 can be adjusted until the calibration light passes through the through hole 260 to form a light spot on the receiving plate 280 and the light spot is located at the center of the receiving plate 280, so as to ensure that the crystal boat 110 is in the proper position in the furnace tube 130.

[0091] In this embodiment, the position of the crystal boat 110 in the furnace tube 130 is calibrated by the position calibration jig, which can greatly reduce the calibration error compared with manual visual calibration, so that the calibrated crystal boat 110 is in the proper position in the furnace tube 130. Moreover, the work burden of personnel in maintenance can be effectively reduced.

[0092] It should be noted that the position calibration jig of the present embodiment can calibrate the position of the crystal boat 110 in the furnace tube 130 at any suitable stage of the process flow, such as the maintenance stage of the crystal boat 110 and the furnace tube 130, the wafer 120 loading stage for actual production, etc., which is not limited. In addition, attention should be paid to avoid pollution of the crystal boat 110 and the furnace tube 130 by the position calibration jig.

[0093] Of course, the present application does not exclude the technical solution of setting a light source at the center of the second surface of the light source sheet 210, setting a through hole allowing the calibration light emitted by the light source to pass through at the center of the second light blocking sheet 222, and then calibrating the position of the crystal boat 110 in the furnace tube 130, which can refer to the description in the above, and will not be repeated here.

[0094] In one example, when the light source sheet 210 is arranged at a fourth position in the crystal boat 110, the first light blocking sheet 221 with the through hole 260 allowing the calibration light emitted by the third light source 233 to pass through is arranged at a fifth position in the crystal boat, wherein in the height direction, the fourth position can be any suitable height position of the crystal boat 110, and the fifth position can be any suitable height position above or below the fourth position, which is not limited; in the horizontal direction, the center of the light source sheet 210 can be located on the central axis of the crystal boat 110 or not, and the center of the first light blocking sheet 221 can be located on the central axis of the crystal boat 110 or not, which is not limited.

[0095] Taking the example that the center of the light source sheet 210 and the center of the first light blocking sheet 221 are both located on the central axis of the crystal boat 110, it can be ensured after calibration that the crystal boat 110 is located at the central position of the furnace tube 130, i.e., the center of the crystal boat 110 is located on the central axis of the furnace tube 130.

[0096] In one example, the third light source 233 can be arranged at the center of the light source sheet 210 by any suitable method. For example, the center of the light source sheet 210 is provided with a mounting hole for accommodating the third light source 233, and the third light source 233 is movably arranged in the mounting hole.

[0097] By movably arranging the third light source 233 in the mounting hole, the third light source 233 can be adjusted to be in a vertical state to ensure that the calibration light emitted by the third light source 233 exits along the vertical direction during calibration, avoiding calibration errors caused by the existence of an angle between the calibration light and the vertical direction.

[0098] In one example, the third light source 233 is provided with a level 240, and the bottom of the third light source 233 is provided with a counterweight 250.

[0099] The level 240 can be used to indicate the horizontal plane on which the third light source 233 is located, and whether the third light source 233 is in a vertical state can be confirmed by judging whether the third light source 233 is perpendicular to the horizontal plane.

[0100] The gravity of the counterweight 250 arranged at the bottom of the third light source 233 can naturally drive the third light source 233 to be in a vertical state, thereby avoiding the third light source 233 deviating from the vertical direction, to ensure that the calibration light emitted by the third light source 233 exits along the vertical direction, avoiding calibration errors caused by the existence of an angle between the calibration light and the vertical direction.

[0101] In some embodiments, the third light source 233 can be an infrared laser or any other suitable light source, and accordingly, the calibration light emitted by the third light source 233 can be infrared laser light or any other suitable type of light, without limitation.

[0102] In some embodiments, the third light source 233 can be an infrared laser or any other suitable light source, and accordingly, the calibration light emitted by the third light source 233 can be infrared laser light or any other suitable type of light, without limitation.

[0103] In summary, the position calibration jig according to the embodiments of the present application can greatly reduce the calibration error compared to manual naked-eye calibration, so that the calibrated wafer is in a suitable position in the boat or the calibrated boat is in a suitable position in the furnace tube.

[0104] Although example embodiments have been described herein with reference to the accompanying drawings, it is to be understood that the example embodiments are only exemplary and are not intended to limit the scope of the present application. Those of ordinary skill in the art can make various changes and modifications without departing from the scope and spirit of the present application. All such changes and modifications are intended to be included within the scope of the present application as claimed in the appended claims.

[0105] Similarly, it is to be understood that, for the sake of brevity, the descriptions of the example embodiments of the present application herein are sometimes made in terms of individual components, figures, or descriptions of the application. However, the application is not intended to be limited to the specific embodiments described and shown, as such can include all specific embodiments falling within the scope of the application as well as their equivalent arrangements. Accordingly, no limitation is intended to the components or the embodiments of the application illustrated in the drawings or described above. Indeed, any and all combinations of claimed features can fall within the scope of the application. Accordingly, the claims are to be understood not as being limited to the specific embodiments described herein but are intended to include all features which are within the scope and spirit of the application as defined in the following claims.

[0106] Furthermore, those of ordinary skill in the art will recognize that, although some of the examples presented herein include particular features, not all of such features are required to practice one or more aspects of the application as claimed in the disclosure below. Accordingly, it is not intended that the application be limited to the specific examples disclosed herein but rather that such examples be considered as exemplary measures having been developed in accordance with the principles of the application and, accordingly, that numerous modifications can be made to the provided examples and certain features can be used, alone, in combination, and / or to replacement of other features, with the claim scope being understood to include all such modifications and features within its scope and with such claim scope being understood to soundly cover all existing and future technologies that fall within the scope of the claim set forth below.

[0107] It should be noted that the foregoing examples have been provided merely for the purpose of explanation and are in no way to be construed as limiting of the present application. While the application has been described with reference to preferred embodiments and illustrations, the person of ordinary skill in the art will be able to design alternative embodiments without departing from the scope of the appended claims. In the claims, any reference signs placed between parentheses shall not be construed as limiting the claim. The use of the words "first", "second", and "third", etc. does not imply any order. These words are to be interpreted as names.

Claims

1. A position calibration jig, characterized by, A position calibration jig for calibrating the position of a wafer in a wafer boat, the position calibration jig comprising: a light source sheet, the light source sheet being circular and having at least three first light sources arranged concentrically on the outer peripheral edge of the first surface thereof; a first light blocking sheet, the first light blocking sheet being circular; wherein the position calibration jig is configured such that: when the light source sheet is arranged at a first position in the wafer boat, the first light blocking sheet is arranged at a second position in the wafer boat, and at least one wafer is arranged in the wafer boat between the light source sheet and the first light blocking sheet; the first light sources are configured to emit calibration light in the direction of the first light blocking sheet, and to leave a light spot on the first light blocking sheet when the emitted calibration light is not blocked by the wafer.

2. The position calibration jig of claim 1, wherein, The position calibration jig further comprises: at least three second light sources arranged concentrically on the outer peripheral edge of the second surface of the light source sheet; a second light blocking sheet, the second light blocking sheet being circular; wherein the position calibration jig is configured such that: when the light source sheet is arranged at a first position in the wafer boat, the second light blocking sheet is arranged at a third position in the wafer boat, and at least one wafer is arranged in the wafer boat between the light source sheet and the second light blocking sheet; the second light sources are configured to emit calibration light in the direction of the second light blocking sheet, and to leave a light spot on the second light blocking sheet when the emitted calibration light is not blocked by the wafer.

3. The position calibration fixture of claim 1, wherein The position calibration jig is further used for calibrating the position of a wafer boat in a furnace tube, the position calibration jig further comprising: a third light source arranged at the center of the first surface of the light source sheet; a through hole arranged at the center of the first light blocking sheet, the through hole allowing the calibration light emitted by the third light source to pass through; a receiving plate, the receiving plate being circular; wherein the position calibration jig is configured such that: when the light source sheet is arranged at a fourth position in the wafer boat, the first light blocking sheet is arranged at a fifth position in the wafer boat, and the receiving plate is arranged at the mouth of the furnace tube, the fourth position, the fifth position, and the mouth of the furnace tube being arranged in sequence; the third light source is configured to emit calibration light to the through hole, and to leave a light spot on the receiving plate after the emitted calibration light passes through the through hole, the light spot being located at the center of the receiving plate indicating that the center of the wafer boat is on the same axis as the center of the furnace tube.

4. The position calibration jig of claim 1 or 2, wherein The light sources are uniformly distributed on the outer peripheral edge of the light source sheet.

5. The position calibration fixture of claim 2, wherein, The first light sources and the second light sources are bidirectional coaxial light sources.

6. The position calibration jig of claim 1 or 2, wherein The diameter of the circle defined by the at least three light sources arranged concentrically is greater than the diameter of the wafer. The size of the light blocking sheet is greater than the size of the wafer.

7. The position calibration jig of claim 1 or 2, wherein The outer peripheral edge of the light source sheet is provided with at least three mounting holes for accommodating part of the light sources, the light sources being movably arranged in the mounting holes.

8. The position calibration fixture of claim 7, wherein, A spirit level is arranged on the light source, and a counterweight is arranged at the bottom of the light source.

9. The position calibration jig according to any one of claims 1 to 3, wherein The light source comprises an infrared laser.

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