Multidirectional adjusting type wafer cleaning mechanical arm

Abstract

The utility model discloses a multidirectional adjusting type wafer cleaning mechanical arm, relates to the technical field of wafers, and aims to solve the problems that the cleaning position is fixed, some positions cannot be cleaned and the practicability is low due to the fact that an existing wafer cleaning structure is too single and lacks a multidirectional adjusting structure. A motor is fixedly connected to the outer side of the fixing seat, a lead screw and a limiting rod are arranged in the fixing seat, a moving table is arranged on the outer side of the limiting rod, a carrying plate is fixedly connected to the outer side of the moving table, and a multi-stage electric telescopic rod is fixedly connected to the outer side of the carrying plate. The telescopic end of the multi-stage electric telescopic rod is fixedly connected with a supporting piece. And the effect of convenient use is achieved.

Description

TECHNICAL FIELD

[0001] The utility model relates to wafer technical field especially is related to a multi -directional adjustment formula wafer cleaning mechanical arm. BACKGROUND

[0002] Wafer is the short name of semiconductor crystal wafer, is usually cylindrical semiconductor crystal thin slice, is used in integrated circuit process as the substrate of carrier, the main purpose of wafer cleaning is to remove the pollutants on the wafer surface and inside, to ensure the purity and performance of wafer, wafer will contact various organic matter, particle and metal in the manufacturing process, these pollutants will affect the performance and yield of wafer.

[0003] The prior art in the above has the following defects: the existing wafer cleaning structure is too single, lacks a multi -directional adjustment structure, causes the fixed position of cleaning, some positions are not cleaned, and the practicality is relatively low. UTILITY MODEL CONTENT

[0004] The utility model discloses a multi -directional adjustment formula wafer cleaning mechanical arm.

[0005] To achieve the above object, the utility model provides the following technical scheme:

[0006] A multi -directional adjustment formula wafer cleaning mechanical arm, including the fixed seat, the outside fixed connection of fixed seat has motor, the inside of fixed seat is provided with lead screw and limit rod, the outside of limit rod is provided with moving platform, the outside fixed connection of moving platform has the carrier board, the outside fixed connection of carrier board has multistage electric telescopic handle, and the telescopic end fixed connection of multistage electric telescopic handle has support piece.

[0007] By adopting the above technical scheme, the structure of longitudinal movement is increased at the bottom, moves using the transmission structure of motor and lead screw, can drive the longitudinal movement of cleaning part, is convenient for cleaning.

[0008] Further, the outside of the fixed seat is provided with a control panel, the outside of the support piece is fixedly connected with a connecting plate, and the connecting plate and the support piece are fixedly connected with a reinforcing rib.

[0009] By adopting the above technical scheme, the strength between structures is improved, and movement is facilitated.

[0010] Further, the outside of the connecting plate is fixedly connected with an electric sliding rail, the outside of the electric sliding rail is provided with an electric sliding block, the outside of the electric sliding block is fixedly connected with a connecting block, the outside of the connecting block is fixedly connected with a clamping block, the inside of the clamping block is provided with a cleaning nozzle, and the outside of the cleaning nozzle is fixedly connected with a connector.

[0011] By adopting the technical scheme, the electric sliding rail and the electric sliding block are added, the cleaning structure can be driven to move horizontally, and the cleaning structure can be used in cooperation with other moving structures.

[0012] Further, the limiting rods are symmetrically arranged in two, the one end of the lead screw is rotatably connected with the fixed base through a bearing, the other end of the lead screw is fixedly connected with the output end of the motor, the moving table is threadedly connected with the lead screw, and the moving table is slidably connected with the limiting rods.

[0013] By adopting the technical scheme, the lead screw and the motor are cooperated, the moving table can be driven to move, and the limiting rods can improve the stability of the structure movement.

[0014] Further, the electric sliding rail and the electric sliding block are slidably connected, the clamping blocks and the cleaning spray heads are symmetrically arranged in two respectively, the cleaning spray heads are inserted into the clamping blocks and are in interference fit connection with the clamping blocks.

[0015] By adopting the technical scheme, the cleaning spray heads are inserted and installed, can be replaced at any time, and are convenient to operate and use.

[0016] To sum up, the beneficial technical effects of the utility model are as follows:

[0017] The motor, the lead screw, the multi-stage electric telescopic rod, the electric sliding rail and the electric sliding block are adopted, the transmission of the motor and the lead screw can drive the cleaning structure to move longitudinally, the electric sliding rail and the electric sliding block can drive the cleaning structure to move horizontally, the multi-stage electric telescopic rod can realize lifting movement, and the cleaning structure can move in multiple directions, so that different positions can be adjusted, the cleaning operation is facilitated, and the effect of convenient use is achieved. BRIEF DESCRIPTION OF DRAWINGS

[0018] Figure 1 The utility model discloses a whole structure schematic diagram Figure 1 ;

[0019] Figure 2 The utility model discloses a whole structure schematic diagram Figure 2 ;

[0020] Figure 3 It is whole structure schematic diagram of the utility model connecting plate.

[0021] In the drawing, 1, fixed base, 2, motor, 3, lead screw, 4, limiting rod, 5, moving table, 6, carrier plate, 7, multi-stage electric telescopic rod, 8, support, 9, control panel, 10, connecting plate, 11, reinforcing rib, 12, electric sliding rail, 13, electric sliding block, 14, connecting block, 15, clamping block, 16, cleaning spray head, 17, joint. DETAILED DESCRIPTION

[0022] The utility model will be further explained in detail below in combination with the drawings.

[0023] Referring to Figures 1-3 A multi-directional adjustment type wafer cleaning mechanical arm, including fixed base 1, the outside of fixed base 1 is fixedly connected with motor 2, the inside of fixed base 1 is provided with lead screw 3 and limit rod 4, the outside of limit rod 4 is provided with moving table 5, the outside of moving table 5 is fixedly connected with carrier plate 6, the outside of carrier plate 6 is fixedly connected with multistage electric telescopic rod 7, the telescopic end of multistage electric telescopic rod 7 is fixedly connected with support 8, the outside of fixed base 1 is provided with control panel 9, the outside of support 8 is fixedly connected with connecting plate 10, connecting plate 10 and support 8 are fixedly connected with reinforcing rib 11 between, the outside of connecting plate 10 is fixedly connected with electric sliding rail 12, the outside of electric sliding rail 12 is provided with electric sliding block 13, the outside of electric sliding block 13 is fixedly connected with connecting block 14, the outside of connecting block 14 is fixedly connected with clamping block 15, the inside of clamping block 15 is provided with cleaning spray head 16, the outside of cleaning spray head 16 is fixedly connected with connector 17, increase the structure of longitudinal movement at the bottom, move using through the transmission structure of motor 2 and lead screw 3, can drive cleaning part to move longitudinally, it is convenient to clean, by increasing electric sliding rail 12 and electric sliding block 13, cleaning structure can be driven to move horizontally, can be used in cooperation with other movement structures, control panel 9 is electrically connected with motor 2, multistage electric telescopic rod 7, electric sliding rail 12 and electric sliding block 13.

[0024] As Figures 1-3 Shown, limit rod 4 is symmetrically provided with two, one end of lead screw 3 is rotatably connected between fixed base 1, the other end of lead screw 3 is fixedly connected with the output end of motor 2, moving table 5 and lead screw 3 are threadedly connected, moving table 5 and limit rod 4 are slidably connected, electric sliding rail 12 and electric sliding block 13 are slidably connected, clamping block 15 and cleaning spray head 16 are symmetrically provided with two respectively, cleaning spray head 16 is inserted in the inside of clamping block 15, and is connected with clamping block 15 by interference fit.

[0025] The implementation principle of the embodiment is that: in use, cleaning spray head 16 can be installed into the inside of clamping block 15, then adjusted according to the position to be cleaned, motor 2 can be controlled to rotate lead screw 3, moving table 5 outside lead screw 3 can be moved, multistage electric telescopic rod 7 can be moved longitudinally, multistage electric telescopic rod 7 can be operated to ascend and descend, electric sliding rail 12 and electric sliding block 13 can be moved horizontally, multi-directional movement adjustment can clean wafers at different positions, so that the cleaning range is larger and the cleaning efficiency is improved.

[0026] The embodiments of the present embodiment are the preferred embodiments of the present utility model, not limited to the protection scope of the present utility model, so: all equivalent changes made according to the structure, shape and principle of the present utility model should be covered in the protection scope of the present utility model.

Claims

1. A multi-orientation adjustable wafer cleaning robot arm, comprising a fixed base (1), characterized in that: The outer side of the fixed seat (1) is fixedly connected with a motor (2), the inside of the fixed seat (1) is provided with a lead screw (3) and a limiting rod (4), the outer side of the limiting rod (4) is provided with a moving table (5), the outer side of the moving table (5) is fixedly connected with a carrier plate (6), the outer side of the carrier plate (6) is fixedly connected with a multi-stage electric telescopic rod (7), the telescopic end of the multi-stage electric telescopic rod (7) is fixedly connected with a support (8). ​ 2. The multi-azimuth adjustable wafer cleaning robot arm of claim 1, wherein: The outer side of the fixed seat (1) is provided with a control panel (9), the outer side of the support (8) is fixedly connected with a connecting plate (10), the connecting plate (10) and the support (8) are fixedly connected with a reinforcing rib (11).

3. The multi-azimuth adjustable wafer cleaning robot arm of claim 2, wherein: The outer side of the connecting plate (10) is fixedly connected with an electric sliding rail (12), the outer side of the electric sliding rail (12) is provided with an electric sliding block (13), the outer side of the electric sliding block (13) is fixedly connected with a connecting block (14), the outer side of the connecting block (14) is fixedly connected with a clamping block (15), the inside of the clamping block (15) is provided with a cleaning nozzle (16), the outer side of the cleaning nozzle (16) is fixedly connected with a connector (17).

4. The multi-azimuth adjustable wafer cleaning robot arm of claim 1, wherein: The limiting rod (4) is symmetrically provided with two, one end of the lead screw (3) is rotatably connected with the fixed seat (1) through a bearing, the other end of the lead screw (3) is fixedly connected with the output end of the motor (2), the moving table (5) and the lead screw (3) are threadedly connected, and the moving table (5) and the limiting rod (4) are slidably connected.

5. The multi-azimuth adjustable wafer cleaning robot arm of claim 3, wherein: The electric sliding rail (12) and the electric sliding block (13) are slidably connected, the clamping block (15) and the cleaning nozzle (16) are respectively symmetrically provided with two, the cleaning nozzle (16) is inserted into the inside of the clamping block (15) and is connected with the clamping block (15) in an interference fit.

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