Deposition apparatus

Abstract

A deposition apparatus according to an embodiment of the present disclosure may include: a nozzle including a nozzle hole for releasing a deposition substance; the crucible is used for accommodating the deposition substance; a first inner plate disposed inside the crucible and including a first inner plate hole and a second inner plate hole; and a second inner plate disposed on the first inner plate, at least a portion of the second inner plate overlapping the first inner plate hole and the second inner plate hole in a plan view.

Description

TECHNICAL FIELD

[0001] The disclosure relates to an inner plate and a deposition apparatus including the same. BACKGROUND

[0002] With the development of information technology, the importance of display apparatuses, which are a medium for connecting users and information, is being highlighted. In correspondence thereto, the use of display apparatuses such as liquid crystal display devices, organic light emitting display devices, and the like is increasing.

[0003] In a process of manufacturing a display apparatus, a layer can be formed in a manner that a deposition material is deposited on an object substrate using a deposition apparatus. When the deposition material generates an excessive (or sharp) state change (for example, vaporization or sublimation), a problem that film formation of the deposition material cannot be properly performed can occur. SUMMARY

[0004] An aspect of the disclosure provides an inner plate that can improve deposition quality of a deposition material and is easy to clean and assemble, and a deposition apparatus including the same.

[0005] A deposition apparatus of an embodiment of the disclosure can include a nozzle including a nozzle hole for discharging a deposition material, a crucible for accommodating the deposition material, a first inner plate disposed inside the crucible and including a first inner plate hole and a second inner plate hole, and a second inner plate disposed on the first inner plate, at least a portion of the second inner plate overlapping the first inner plate hole and the second inner plate hole when viewed in plan view.

[0006] According to an embodiment, the first inner plate can have a plate shape extending in a first direction and a second direction, the first inner plate hole and the second inner plate hole being inclined with respect to a third direction that is a direction perpendicular to the first direction and the second direction.

[0007] According to an embodiment, the first inner plate hole and the second inner plate hole can be inclined more to an outer side of the deposition apparatus as they proceed in the third direction.

[0008] According to an embodiment, the second inner plate can include a first portion overlapping the first inner plate hole when viewed in plan view, a second portion overlapping the second inner plate hole when viewed in plan view, and a third portion disposed between the first portion and the second portion.

[0009] According to an embodiment, the first portion and the second portion can extend in a first direction and not overlap the nozzle hole when viewed in plan view.

[0010] According to an embodiment, the first portion and the second portion can have a plate structure.

[0011] According to an embodiment, the first portion and the second portion can be spaced apart from the first inner plate, and at least one face of the third portion can be in contact with the first inner plate.

[0012] According to an embodiment, the first inner plate and the second inner plate can each include at least one of stainless steel, titanium, aluminum, and carbide.

[0013] A deposition apparatus of an embodiment of the disclosure can include a nozzle including a nozzle hole for discharging a deposition material; a crucible for accommodating the deposition material; a first inner plate disposed inside the crucible and including a first inner plate hole and a second inner plate hole; and a second inner plate disposed on the first inner plate and overlapping the nozzle hole when viewed in plan view.

[0014] According to an embodiment, the first inner plate can have a plate structure extending in a first direction and a second direction, and the first inner plate hole and the second inner plate hole can be inclined with respect to a third direction that is perpendicular to the first direction and the second direction.

[0015] According to an embodiment, the first inner plate hole and the second inner plate hole can be inclined more toward an outside of the deposition apparatus as they proceed in the third direction.

[0016] According to an embodiment, the first inner plate can further include a coupling hole, and the second inner plate can include a first portion of which at least a portion is introduced into the coupling hole, and a second portion disposed on the first portion.

[0017] According to an embodiment, the coupling hole and the at least a portion of the first portion can be subjected to tapping processing.

[0018] According to an embodiment, the second portion can have a circular or elliptical shape when viewed in plan view.

[0019] According to an embodiment, the first inner plate and the second inner plate can each include at least one of stainless steel, titanium, aluminum, and carbide.

[0020] According to an embodiment, the first inner plate and the second inner plate can be configured to be detachable with respect to the deposition apparatus, and the nozzle can be a plurality of nozzles adjacent to each other in a first direction.

[0021] The inner plate of the embodiment of the disclosure can include a first inner plate including a first inner plate hole and a second inner plate hole, and a second inner plate disposed on the first inner plate, the first inner plate having a plate shape extending in a first direction and a second direction, the first inner plate hole and the second inner plate hole being inclined toward a sidewall of the first inner plate as they advance in a third direction, the third direction being a direction perpendicular to the first direction and the second direction.

[0022] According to an embodiment, the second inner plate can include a first portion overlapping the first inner plate hole when viewed in plan, a second portion overlapping the second inner plate hole when viewed in plan, and a third portion disposed between the first portion and the second portion, the first portion and the second portion being spaced apart from the first inner plate, at least one face of the third portion being in contact with the first inner plate.

[0023] According to an embodiment, the first inner plate can further include a coupling hole, and the second inner plate can include a first portion of which at least a portion is introduced into the coupling hole, and a second portion disposed on the first portion, the coupling hole and the at least a portion of the first portion being subjected to tapping processing, the second portion having a circular or elliptical shape when viewed in plan.

[0024] According to an embodiment, the first inner plate and the second inner plate can each include at least one of stainless steel, titanium, aluminum, and carbide.

[0025] According to an embodiment of the disclosure, an inner plate that can improve deposition quality of a deposition material and is easy to clean and assemble, and a deposition apparatus including the same can be provided. BRIEF DESCRIPTION OF DRAWINGS

[0026] Figure 1 is a schematic perspective view of a deposition apparatus of an embodiment of the disclosure.

[0027] Figure 2 is a schematic perspective view of a deposition apparatus of an embodiment. Figure 1 is a schematic cross-sectional view of the deposition apparatus of taken along line I-I' of

[0028] Figure 3 is a schematic perspective cross-sectional view of a deposition apparatus of an embodiment.

[0029] Figure 4 is a diagram schematically representing a movement path of a deposition material in a deposition apparatus of an embodiment.

[0030] Figure 5 is a schematic cross-sectional view of the deposition apparatus of taken along line I-I' of Figure 1 another embodiment.

[0031] Figure 6is a view schematically showing a moving path of a deposition material in a deposition apparatus of another embodiment. DETAILED DESCRIPTION

[0032] The present disclosure can be modified in various ways, and can have various modes, and a specific embodiment is schematically shown in the drawings and is described in detail herein. However, it should be understood that this is not intended to limit the present disclosure to a specific disclosed mode, but to include all modifications, equivalents, and alternatives included within the scope of the idea and technology of the present disclosure.

[0033] The terms first, second, and the like can be used to describe various structural elements, but the structural elements cannot be limited by the terms. The terms are used only for the purpose of distinguishing one structural element from other structural elements. For example, a first structural element can be named a second structural element, and similarly a second structural element can be named a first structural element without departing from the scope of the present disclosure. With respect to expressions in the singular, the expressions in the singular include expressions in the plural if the context does not clearly indicate a different meaning.

[0034] In the present disclosure, it should be understood that the terms "comprise" or "have" and the like are used to designate the presence of characteristics, numbers, steps, operations, structural elements, components, or combinations thereof described in the specification, and are not used to preclude the presence or addition of one or more other characteristics, numbers, steps, operations, structural elements, components, or combinations thereof. In addition, when a part such as a layer, a film, a region, or a plate is said to be "on" another part, this includes not only a case where the part is "directly" on the other part, but also a case where another part is interposed therebetween. In addition, in the present specification, when a part such as a layer, a film, a region, or a plate is said to be "formed on" another part, the direction of formation is not limited to only an upper direction, but includes a case where it is formed in a lateral or lower direction. In contrast, when a part such as a layer, a film, a region, or a plate is said to be "under" another part, this includes not only a case where the part is "directly" under the other part, but also a case where another part is interposed therebetween.

[0035] The present disclosure relates to an inner plate and a deposition apparatus including the same. Hereinafter, an inner plate of an embodiment and a deposition apparatus including the same will be described with reference to the accompanying drawings.

[0036] Figure 1 is a schematic perspective view of a deposition apparatus of an embodiment of the present disclosure.

[0037] The deposition apparatus 100 can include a housing 110 and a deposition source 120.

[0038] The housing 110 can be configured to accommodate the deposition source 120.

[0039] The deposition source 120 can be configured to release the stored deposition material. The deposition source 120 can include nozzles 122 configured to release the deposition material. For example, the deposition source 120 can include a plurality of nozzles 122. The plurality of nozzles 122 can be arranged adjacent to each other in a direction (e.g., the first direction DR1 or the second direction DR2). The nozzles 122 can include nozzle holes 122_H through which the deposition material can be diffused by being released in a third direction DR3. The third direction DR3 can be a direction different from the first direction DR1. For example, the third direction DR3 can be a direction perpendicular to the first direction DR1 and the second direction DR2.

[0040] The plurality of nozzles 122 can be arranged adjacent to each other in the first direction DR1. The plurality of nozzles 122 can be arranged in such a manner that the intervals between the nozzles 122 are the same, but are not limited thereto. For example, the intervals between the nozzles 122 can be different according to the deposition material, the thickness of the deposition film formed using the deposition material, the shape of the object substrate, and / or the size of the object substrate, etc.

[0041] Figure 1 The plurality of nozzles 122 can be arranged adjacent to each other in the first direction DR1. The plurality of nozzles 122 can be arranged in such a manner that the intervals between the nozzles 122 are the same, but are not limited thereto. For example, the intervals between the nozzles 122 can be different according to the deposition material, the thickness of the deposition film formed using the deposition material, the shape of the object substrate, and / or the size of the object substrate, etc.

[0042] The housing 110 can include a lower housing 112 and an upper housing 114.

[0043] The lower housing 112 can accommodate the deposition source 120. The lower housing 112 can configure the side and / or the back of the deposition apparatus 100. At least a portion of the deposition source 120 (e.g., at least a portion of the nozzles 122) can be exposed on the lower housing 112.

[0044] The upper housing 114 can be disposed on the lower housing 112. The upper housing 114 can cover at least a portion of the area on the lower housing 112. The upper housing 114 can perform a function of preventing heat generated inside the lower housing 112 from being released to the outside (i.e., a heat insulation function).

[0045] The upper housing 114 can expose at least a portion of the deposition source 120. The upper housing 114 can include a free space for exposing the nozzles 122. Referring to Figure 1 The free space can include a form extending long in the first direction DR1 so as to completely expose the plurality of nozzles 122. According to an embodiment, an opening can be provided in an area corresponding to the nozzles 122, and the remaining area can be covered by a heat insulation plate.

[0046] Hereinafter, a deposition apparatus 100 according to an embodiment will be described with reference to the accompanying drawings. Figures 2 to 4 Figures 2 to 4 ​The deposition apparatus 100 shown can be the deposition apparatus 100 of the first embodiment.

[0047] Figure 2 is a schematic cross-sectional view of the deposition apparatus of one embodiment. Figure 1 is a schematic cross-sectional view of the deposition apparatus of one embodiment taken along line I-I'. Figure 3 is a schematic perspective cross-sectional view of the deposition apparatus of one embodiment. Figure 4 is a diagram schematically representing a moving path of a deposition material in the deposition apparatus of one embodiment. Figure 3 and Figure 4 is a close-up view of a portion of the deposition apparatus 100. Figure 2 is a close-up view of a portion of the deposition apparatus 100.

[0048] Referring to Figure 2 In the cross-sectional view, a partial cross-sectional view of the nozzle 122, the lower housing 112, and the upper housing 114 is illustrated.

[0049] The lower housing 112 can include a crucible 210, a heating member 220, an inner plate 230, a cover 250, a frame 260, and the like. Although not illustrated in this drawing, according to an embodiment, the upper housing 114 can include a heat insulating plate and an angle limiting plate, and the like.

[0050] The crucible 210 can be configured to accommodate a deposition material DM. An inner space IS can be defined inside the crucible 210, and the deposition material DM can be accommodated in the inner space IS. The crucible 210 can be connected with the nozzle 122, and the deposition material DM can be vaporized inside the crucible 210 and released through the nozzle 122.

[0051] The heating member 220 can be located in a side direction (e.g., a second direction DR2) of the crucible 210. The heating member 220 can extend in a direction (e.g., a first direction DR1). The heating member 220 can provide heat, and the heat provided by the heating member 220 can increase the temperature of the crucible 210 (e.g., the temperature of the inner space IS of the crucible 210). The heating member 220 can form a thin film on an object substrate by evaporating the deposition material DM accommodated in the crucible 210.

[0052] As an example, the heating member 220 can include a plurality of heating plates. According to an embodiment, the heating member 220 can include a heating coil. According to an embodiment, the heating member 220 can be arranged to extend not only in a direction (e.g., the first direction DR1) but also in another direction (e.g., the second direction DR2 which is perpendicular to the first direction DR1). According to an embodiment, the heating member 220 can have a form divided in a third direction DR3 which is perpendicular to the first direction DR1. According to an embodiment, the heating member 220 can be integrally formed in the third direction DR3.

[0053] The inner plate 230 can be disposed inside the crucible 210. The inner plate 230 can divide the inner space IS of the crucible 210 into two or more. The deposition material DM can be accommodated in one of the inner spaces IS (e.g., the first inner space IS1) divided by the inner plate 230.

[0054] The inner plate 230 can be configured to be divided into two or more. The inner plate 230 can include a first inner plate 232 and a second inner plate 234. The first inner plate 232 can divide the inner space IS into a first inner space IS1 and a second inner space IS2. The deposition material DM can be accommodated in the first inner space IS1.

[0055] The first inner plate 232 can be disposed inside the crucible 210 above the deposition material DM. The first inner plate 232 can increase the internal pressure of the crucible 210 (i.e., the gas pressure of the first inner space IS1).

[0056] The first inner plate 232 can include a plurality of through-holes and be provided as a plate shape extending in the first direction DR1 and the second direction DR2. The first inner plate 232 can have a plate structure having a long side extending in the first direction DR1 and a short side extending in the second direction DR2. For example, the first inner plate 232 can be provided as a plate structure including first inner plate holes 232_H1 and second inner plate holes 232_H2 formed through the first inner plate 232.

[0057] The first inner plate holes 232_H1 and the second inner plate holes 232_H2 can be formed to be inclined with respect to a direction (e.g., a third direction DR3). For example, the first inner plate holes 232_H1 and the second inner plate holes 232_H2 can be inclined in a manner that the farther they proceed in the third direction DR3, the more they are directed (or further approach) to the outside of the crucible 210. For example, the first inner plate holes 232_H1 and the second inner plate holes 232_H2 can be inclined in a manner that the farther they proceed in the third direction DR3, the more they are directed (or further approach) to the sidewall of the crucible 210. For example, the first inner plate holes 232_H1 and the second inner plate holes 232_H2 can be inclined in a manner that the farther they proceed in the third direction DR3, the more they are directed (or further approach) to the sidewall of the first inner plate 232.

[0058] The first inner plate 232 includes the first inner plate holes 232_H1 and the second inner plate holes 232_H2, thereby the deposition quality of the deposition material DM heated in the crucible 210 can be improved. For example, the first inner plate 232 can lengthen the moving path of the deposition material DM released, and can prevent the deposition material DM from being immediately (or directly) discharged to the nozzle 122 with excessive (or abrupt) state change (e.g., gasification or sublimation).

[0059] The first inner plate 232 can include at least one of stainless steel, titanium, aluminum, and carbide, and can not be fused at a high temperature.

[0060] The second inner plate 234 can be disposed on the first inner plate 232 inside the crucible 210. The second inner plate 234 can include a first portion 234_1, a second portion 234_2, and a third portion 234_3.

[0061] The first portion 234_1 can overlap the first inner plate hole 232_H1 when viewed in plan view. The second portion 234_2 can be disposed to overlap the second inner plate hole 232_H2 when viewed in plan view. The first portion 234_1 and the second portion 234_2 can extend in the same direction as the direction in which the first inner plate 232 extends. For example, the first portion 234_1 and the second portion 234_2 can have a plate-like structure extending in the first direction DR1.

[0062] The first portion 234_1 and the second portion 234_2 can not overlap the nozzle hole 122_H when viewed in plan view. At least one face of each of the first portion 234_1 and the second portion 234_2 can be in contact with the inner wall of the crucible 210. The first portion 234_1 and the second portion 234_2 can be physically spaced apart from the first inner plate 232. For example, the first portion 234_1 and the second portion 234_2 can not be in contact with the first inner plate 232, but can be spaced apart by a distance L.

[0063] The third portion 234_3 can be disposed between the first portion 234_1 and the second portion 234_2. Referring to Figure 3 , the third portion 234_3 can connect the first portion 234_1 and the second portion 234_2. The third portion 234_3 can be connected to the first portion 234_1 and the second portion 234_2, and can support the first portion 234_1 and the second portion 234_2. At least one face (e.g., a lower face) of the third portion 234_3 can be in contact with the first inner plate 232.

[0064] The second inner plate 234 can lengthen a movement path in which the deposition material DM heated and evaporated in the crucible 210 is discharged. Referring to Figure 4 , the deposition material DM discharged through the first inner plate hole 232_H1 and the second inner plate hole 232_H2 can move along the first path D1. The deposition material DM discharged through the first inner plate hole 232_H1 and the second inner plate hole 232_H2 can be reflected by the first portion 234_1 and the second portion 234_2, and the deposition material DM reflected by the first portion 234_1 and the second portion 234_2 can be reflected by the first inner plate 232 and toward the nozzle 122. Thus, it is possible to effectively prevent the deposition material (e.g., the deposition material DM in which a rapid state change occurs) that can cause a defect in the object substrate from being immediately (or directly) discharged toward the nozzle 122.

[0065] The second inner plate 234 can include at least one of stainless steel, titanium, aluminum, and carbide, and can not be fused at a high temperature.

[0066] The inner plate 230 can be configured to be detachable with respect to the deposition apparatus 100. For example, the first inner plate 232 and the second inner plate 234 can be detachable with respect to the deposition apparatus 100, respectively. Thereby, cleaning and assembly of the first inner plate 232 and the second inner plate 234 can be easily performed, and a distance L of the first portion 234_1 and the second portion 234_2 from the first inner plate 232 can be easily adjusted according to an assembly position of the second inner plate 234.

[0067] The cover 250 can be coupled to an upper side of the crucible 210. The cover 250 can extend in the same direction as a direction in which the crucible 210 extends (for example, the first direction DR1). The cover 250 can have a plate shape (for example, a flat plate shape). As an example, the cover 250 can be formed of the same material as that of the crucible 210, but is not limited thereto. Although the cover 250 is illustrated in a state of being separated from the crucible 210, according to an embodiment, the cover 250 can be integrally formed with the crucible 210. According to an embodiment, the cover 250 can be omitted.

[0068] The nozzle 122 can protrude in an upper side direction (for example, the third direction DR3) of the cover 250. The nozzle 122 can have a tube shape including a nozzle hole 122_H so as to be capable of discharging the deposition material DM.

[0069] The frame 260 can accommodate the crucible 210 and the heating member 220. For example, the frame 260 can be formed in a box shape having an upper side opened. The frame 260 can be coupled with the upper housing 114. The frame 260 can perform a function of protecting a structure accommodated in an inside thereof from the outside. The frame 260 can be formed of a heat insulation material, and can prevent heat of the inside from being leaked to the outside. A cooling pipe for providing a cooling water flow path can be disposed in the inside of the frame 260.

[0070] Hereinafter, a deposition apparatus 100' of another embodiment will be described with reference to Figure 5 and Figure 6 . Figure 5 and Figure 6 The deposition apparatus 100' illustrated in FIGS. 10A and 10B can be a deposition apparatus 100' of a second embodiment.

[0071] Figure 5 is a schematic cross-sectional view taken along line I-I' of a deposition apparatus of another embodiment. Figure 1 Figure 6 is a diagram schematically representing a movement path of a deposition material in a deposition apparatus of another embodiment. Figure 6 ​​

[0072] Referring to Figure 5 At least a portion of the inner plate 230' of the deposition apparatus 100' of the second embodiment can have a different structure from at least a portion of the inner plate 230 of the deposition apparatus 100 of the first embodiment. For example, the second inner plate 234' of the deposition apparatus 100' of the second embodiment can have a different structure from the second inner plate 234 of the deposition apparatus 100 of the first embodiment. Hereinafter, a description of the contents repeated from the foregoing will be omitted.

[0073] According to an embodiment, the first inner plate 232 can further include a coupling hole 232_FH. At least a portion of the second inner plate 234' can be disposed on the first inner plate 232, and a remaining portion of the second inner plate 234' can be disposed within the coupling hole 232_FH. The remaining portion of the second inner plate 234' can be in contact with the first inner plate 232.

[0074] The second inner plate 234' can include a first portion 234_1' and a second portion 234_2'. The first portion 234_1' can be disposed below the second portion 234_2' and can support the second portion 234_2'. At least a portion of the first portion 234_1' can be introduced into the coupling hole 232_FH of the first inner plate 232. At least a portion of the first portion 234_1' and the coupling hole 232_FH can be subjected to tapping processing. For example, a thread can be formed on at least a portion of the first portion 234_1' and the coupling hole 232_FH, and at least a portion of the first portion 234_1' is threadedly coupled with the coupling hole 232_FH, so that the second inner plate 234' can be fixed to the first inner plate 232. A remaining portion of the first portion 234_1' other than at least a portion thereof can be disposed on the first inner plate 232.

[0075] The second portion 234_2' can be disposed on the first portion 234_1'. The second portion 234_2' can be disposed to overlap the nozzle hole 122_H when viewed in plan view. The second portion 234_2' can prevent the deposition material DM in an excessive (or abrupt) state of change (e.g., gasification or sublimation) from being immediately (or directly) discharged to the nozzle 122 by being disposed to overlap the nozzle hole 122_H when viewed in plan view.

[0076] The second portion 234_2' can be physically spaced apart from the first inner plate 232. For example, the second portion 234_2' can not be in contact with the first inner plate 232 but can be spaced apart by a distance L.

[0077] The second portion 234_2' can be provided as a plate-shaped structure having a circular or elliptical shape when viewed in plan view. However, the present disclosure is not limited thereto, and the second portion 234_2' can also be provided as a plate-shaped structure having a polygonal shape when viewed in plan view.

[0078] The second inner plate 234' can lengthen a movement path in which the deposition material DM heated and evaporated in the crucible 210 is discharged. Referring to FIG. 2B, the deposition material DM discharged through the first inner plate hole 232_H1 and the second inner plate hole 232_H2 can move along a second path D2. The deposition material DM discharged through the first inner plate hole 232_H1 and the second inner plate hole 232_H2 can contact a sidewall of the crucible 210 and be reflected, and the deposition material DM reflected by the sidewall of the crucible 210 can be reflected by the first inner plate 232 and toward the second portion 234_2' of the second inner plate 234'. The deposition material DM toward the second portion 234_2' can be reflected by the second portion 234_2' and then can be discharged toward the nozzle 122. Thus, it is possible to effectively prevent the deposition material DM that generates a sharp state change from being immediately (or directly) discharged toward the nozzle 122. Figure 6

[0079] The first inner plate 232 and the second inner plate 234' of the second embodiment can also include at least one of stainless steel, titanium, aluminum, and carbide, and can not be fused at a high temperature.

[0080] The inner plate 230' of the second embodiment can also be configured to be detachable with respect to the deposition apparatus 100'. For example, the first inner plate 232 and the second inner plate 234' can be detachable with respect to the deposition apparatus 100', respectively. Thus, it is possible to easily perform cleaning and assembly of the first inner plate 232 and the second inner plate 234', and to easily adjust the distance L at which the second portion 234_2' is spaced apart from the first inner plate 232 according to an assembly position of the second inner plate 234'.

[0081] The deposition apparatus 100, 100' of the embodiments of the disclosure can effectively prevent the deposition material DM that generates a sharp state change from being immediately (or directly) discharged toward the nozzle 122 without excessively increasing a process temperature. If the second inner plate 234, 234' is disposed, it is possible to reduce a mass flux of the deposition material DM experimentally compared to a case in which the second inner plate 234, 234' is not disposed. Accordingly, in order to increase the reduced mass flux, it is possible to increase the process temperature. When the process temperature is excessively increased, there is a risk of damage to the object substrate or the like.

[0082] The deposition apparatus 100, 100' of the embodiments of the disclosure can perform a deposition process while increasing a process temperature by a range of 10℃ or less compared to a case in which the second inner plate 234, 234' is not disposed. Thus, it is possible to prevent the object substrate or the like on which a film of the deposition material is formed from being damaged.

[0083] ​As described above, the preferred embodiments according to the present disclosure are described with reference to, but it should be understood that those skilled in the art or those having ordinary knowledge in the art can modify and change the present disclosure in various ways without departing from the scope of the idea and technical field of the present disclosure recited in the claims.

[0084] Therefore, the technical scope of the present disclosure should not be limited by the contents recited in the detailed description of the specification, but should be defined by the claims.

Claims

1. A deposition apparatus characterized by comprising: comprising: a nozzle including a nozzle hole for discharging a deposition material; a crucible for accommodating the deposition material; a first inner plate disposed inside the crucible and including a first inner plate hole and a second inner plate hole; and a second inner plate disposed on the first inner plate, at least a portion of the second inner plate overlaps the first inner plate hole and the second inner plate hole when viewed in plan view.

2. The deposition apparatus according to claim 1, wherein the first inner plate has a plate shape extending in a first direction and a second direction, the first inner plate hole and the second inner plate hole are inclined toward an outside of the deposition apparatus with respect to a third direction as they progress further in the third direction, the third direction is a direction perpendicular to the first direction and the second direction.

3. The deposition apparatus according to claim 1, wherein the second inner plate includes: a first portion overlapping the first inner plate hole when viewed in plan view; a second portion overlapping the second inner plate hole when viewed in plan view; and a third portion disposed between the first portion and the second portion.

4. The deposition apparatus according to claim 3, wherein the first portion and the second portion extend in a first direction and do not overlap the nozzle hole when viewed in plan view, the first portion and the second portion have a plate shape.

5. The deposition apparatus according to claim 3, wherein the first portion and the second portion are separated from the first inner plate, at least one face of the third portion is in contact with the first inner plate, the first inner plate and the second inner plate each include at least one of stainless steel, titanium, aluminum, and carbide. comprising:

6. A deposition apparatus characterized by comprising: a nozzle including a nozzle hole for discharging a deposition material; a crucible for accommodating the deposition material; a first inner plate disposed inside the crucible and including a first inner plate hole and a second inner plate hole; and a second inner plate disposed on the first inner plate, the second inner plate overlaps the nozzle hole when viewed in plan view.

7. The deposition apparatus according to claim 6, wherein the first inner plate has a plate shape extending in a first direction and a second direction, the first inner plate hole and the second inner plate hole are inclined toward an outside of the deposition apparatus with respect to a third direction as they progress further in the third direction, the third direction is a direction perpendicular to the first direction and the second direction.

8. The deposition apparatus according to claim 6, wherein the first inner plate further includes a coupling hole, the second inner plate includes: a first portion, at least a portion of which is introduced into the coupling hole; and a second portion disposed on the first portion.

9. The deposition apparatus according to claim 8, wherein the coupling hole and the at least a portion of the first portion are subjected to tapping processing, the second portion has a circular or elliptical shape when viewed in plan view.

10. The deposition apparatus according to claim 8, wherein the first inner plate and the second inner plate each include at least one of stainless steel, titanium, aluminum, and carbide, ​ ​ The first inner plate and the second inner plate are configured to be detachable with respect to the deposition device, The nozzles are a plurality of, The nozzles are a plurality of and are arranged adjacent to each other in a first direction.

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