Tray Mask structure and assembly of physical vapor deposition equipment

Abstract

The utility model relates to a Tray Mask structure and a Tray Mask assembly of physical vapor deposition equipment. The Tray Mask structure comprises a main body and edge strips, the edge strip is arranged on the outer side of the main body, and a plurality of avoiding structures are arranged on the edge strip; the position of the avoiding structure corresponds to the position of an external interference structure, and the avoiding structure and the external interference structure are matched in a concave-convex mode. The avoiding structure is arranged on the edge strip, so that when the Tray moves to the leftmost end or the rightmost end, the avoiding structure can be matched with the external interference structure in a concave-convex mode, the external interference structure enters the avoiding structure, collision between the edge strip and the external interference structure can be avoided, and the film forming quality is ensured.

Description

TECHNICAL FIELD

[0001] The utility model belongs to physical vapor deposition equipment technical field, concretely relates to a kind of physical vapor deposition equipment's Tray Mask structure and assembly. BACKGROUND

[0002] Physical vapor deposition equipment is formed plasma (Plasma) by additional electric field dissociation process gas, Plasma is bombarded target material under the action of built-in magnetic field and electric field, and target material atom is deposited on glass substrate, to form thin film.

[0003] In deposition process, glass substrate is carried to vacuum chamber for film formation by glass clamp (Tray), to prevent excess atomic contamination chamber and Tray body, with protective plate (Mask) attached to the surface to be protected, to play long time use effect.

[0004] However, Tray is in moving state in film formation process, and existing Tray exists occasional interference between Tray Mask and chamber water-cooled plate cover during moving, to cause quality to exist partial aggregation, to affect rework rate (Rework). UTILITY MODEL CONTENT

[0005] To solve the above problems existing in prior art, the utility model provides a kind of physical vapor deposition equipment's Tray Mask structure and assembly.The technical problems to be solved by the utility model are realized by the following technical schemes:

[0006] A kind of physical vapor deposition equipment's Tray Mask structure, comprising: main body and edge strip;

[0007] The edge strip is arranged on the outside of the main body, and a plurality of avoiding structures are formed on the edge strip;

[0008] The position of the avoiding structure corresponds to the position of the external interference structure, and the avoiding structure and the external interference structure are concave-convex matched.

[0009] In an implementable manner, the avoiding structure is rectangular groove.

[0010] In an implementable manner, the main body and the edge strip are both frame body, the inside of the main body is used to connect Tray;The outside of the main body is connected with the edge strip.

[0011] In an implementable manner, the avoiding structure is formed on two side edges of the edge strip along the first direction.

[0012] In an implementable manner, the shape of the avoiding structure is same with the shape of external interference structure.

[0013] In an implementable manner, the depth of the avoiding structure is 2mm.

[0014] In an implementable manner, the number of the avoiding structures is 4.

[0015] The second aspect of the utility model provides a Tray assembly of physical vapor deposition equipment, including Tray and the Tray Mask structure of physical vapor deposition equipment of the utility model first aspect provides;

[0016] The Tray is arranged on the inner side of the Tray Mask structure of the physical vapor deposition equipment.

[0017] Compared with the prior art, the utility model has the beneficial effects of:

[0018] The Tray Mask structure of physical vapor deposition equipment provided by the utility model opens the avoiding structure on the edge strip, so that when the Tray moves to the leftmost end or the rightmost end, the avoiding structure can be matched with the external interference structure concave-convex, the external interference structure enters the avoiding structure, the edge strip and the external interference structure can be avoided from colliding, and the film forming quality is ensured. BRIEF DESCRIPTION OF DRAWINGS

[0019] Figure 1 It is the structural schematic diagram of the Tray Mask structure in the prior art;

[0020] Figure 2 It is the structural schematic diagram of the water-cooled plate in the prior art;

[0021] Figure 3 It is the schematic diagram when the mask of Tray Mask and chamber water-cooled plate interferes;

[0022] Figure 4 It is the structural schematic diagram of the Tray Mask structure of physical vapor deposition equipment in the utility model embodiment;

[0023] Figure 5 It is the schematic diagram when the mask of Tray assembly and chamber water-cooled plate of physical vapor deposition equipment in the utility model embodiment contacts.

[0024] Reference signs:

[0025] 1: main body;2: edge strip;21: avoiding structure;3: Tray;4: water-cooled plate;5: mask;51: mask waistband. DETAILED DESCRIPTION

[0026] The utility model will be described further in detail in combination with specific embodiment, but the implementation mode of the utility model is not limited to this.

[0027] Referring to Figures 1-3 In the prior art, the plurality of masks 5 of the water-cooled plate 4 are connected through mask waistbands 51, and the mask waistbands 51 are partially protruding relative to the surface of the mask 5. When the tray 3 is moved to the leftmost end or the rightmost end, the edge strip 2 of the TrayMask structure interferes with the mask waistband 51, affecting the film forming quality.

[0028] Referring to Figure 4 , Figure 4 is a structural schematic diagram of a Tray Mask structure of a physical vapor deposition device in the embodiment of the utility model. The first aspect of the embodiment provides a Tray Mask structure of a physical vapor deposition device, which comprises a main body 1 and an edge strip 2. The edge strip 2 is arranged on the outer side of the main body 1, and a plurality of avoiding structures 21 are formed on the edge strip 2. The positions of the avoiding structures 21 correspond to the positions of the external interference structures, and the avoiding structures 21 and the external interference structures are in concave-convex cooperation.

[0029] Specifically, the avoiding structures 21 correspond to the external interference structures one by one, that is, one avoiding structure 21 is arranged at the position of each external interference structure, and the size of the avoiding structure 21 is greater than the size of the external interference structure, so that the avoiding structure 21 can completely accommodate the external interference structure. The Tray Mask structure provided in the embodiment can make the avoiding structure 21 and the external interference structure in concave-convex cooperation when the tray 3 is moved to the leftmost end or the rightmost end, the external interference structure enters the avoiding structure 21, and the collision between the edge strip 2 and the external interference structure can be avoided, so that the film forming quality is ensured.

[0030] In the embodiment, the main body 1 and the edge strip 2 are both frame bodies, the inner side of the main body 1 is used for connecting the tray, and the outer side of the main body 1 is connected with the edge strip 2. The avoiding structures 21 are formed on the two side edges of the edge strip 2 along the first direction. The shape of the avoiding structure 21 is the same as that of the external interference structure.

[0031] Specifically, when the shape of the external interference structure is an arc-shaped protrusion, the shape of the corresponding avoiding structure 21 is an arc-shaped groove; when the shape of the external interference structure is a polygonal protrusion, the shape of the corresponding avoiding structure 21 is a polygonal groove. The shape, size and position of the avoiding structure 21 correspond to the corresponding external interference structure one by one. For example, one external interference structure is a polygonal protrusion, and another external interference structure is an arc-shaped protrusion, then two avoiding structures 21 are formed on the edge strip 2 corresponding to the positions of the external interference structures, one avoiding structure 21 corresponds to the external interference structure of the polygonal protrusion, and the other avoiding structure 21 corresponds to the external interference structure of the arc-shaped protrusion.

[0032] In one possible implementation, the external interference structure is the mask waistband 51. When the side edges of the edge strip 2 are in contact with the side edges of the mask 5, the mask waistband 51 on the side edge of the mask 5 is inserted into the avoidance structure 21 one by one.

[0033] In another possible implementation, the external interference structure is the mask waistband 51. The mask waistband 51 is in the shape of a rectangular protrusion. The number of mask waistbands 51 on the left and right side edges of the mask 5 is four. Therefore, in this embodiment, the avoidance structure 21 is a rectangular groove. The depth of the avoidance structure 21 is 2 mm. The number of avoidance structures 21 is four. The four avoidance structures 21 are arranged at the 1 / 4 and 3 / 4 positions of the left and right side edges of the edge strip 2, i.e., the four avoidance structures 21 are arranged at the positions of the four mask waistbands 51.

[0034] Please refer to Figure 5 , Figure 5 is a schematic view of the mask contact with the Tray assembly and the chamber water-cooled plate of the physical vapor deposition equipment in the embodiment of the utility model. The second aspect of the embodiment provides a Tray assembly of a physical vapor deposition equipment, which comprises a Tray 3 and the Tray Mask structure of the physical vapor deposition equipment provided in the first aspect of the embodiment. The Tray 3 is arranged on the inner side of the Tray Mask structure of the physical vapor deposition equipment. The Tray 3 is arranged on the inner side of the main body 1.

[0035] The Tray Mask structure of the physical vapor deposition equipment provided in the embodiment can avoid the collision between the edge strip 2 and the external interference structure by opening the avoidance structure 21 on the edge strip 2, so that the avoidance structure 21 can be matched with the external interference structure when the Tray 3 moves to the leftmost end or the rightmost end, and the external interference structure enters the avoidance structure 21, thereby ensuring the film forming quality.

[0036] The above is a further detailed description of the utility model in combination with specific preferred embodiments, and the specific implementation of the utility model cannot be limited to these descriptions. For ordinary skilled persons in the technical field to which the utility model belongs, without departing from the concept of the utility model, a number of simple deductions or substitutions can be made, which should be regarded as falling within the protection scope of the utility model.

Claims

1. A Tray Mask structure of a physical vapor deposition apparatus, characterized by, The utility model relates to a physical vapor deposition equipment's Tray Mask structure, including: Main body (1) and edge bar (2); The edge bar (2) is arranged at the outside of main body (1), and a plurality of avoiding structures (21) are formed on the edge bar (2); The position of avoiding structure (21) corresponds with the position of external interference structure, and the avoiding structure (21) and external interference structure are concave-convex matched.

2. A Tray Mask structure for a physical vapor deposition apparatus according to claim 1, wherein The avoiding structure (21) is rectangular groove.

3. The Tray Mask structure of a physical vapor deposition apparatus according to claim 1, wherein, The main body (1) and the edge bar (2) are frame body, and the inside of main body (1) is used to connect Tray;The outside of main body (1) is connected with the edge bar (2).

4. The Tray Mask structure of a physical vapor deposition apparatus according to claim 1, wherein, The avoiding structure (21) is formed on the two side edges of the edge bar (2) along the first direction.

5. The Tray Mask structure of a physical vapor deposition apparatus according to claim 1, wherein, The shape of avoiding structure (21) is same with the shape of external interference structure.

6. The Tray Mask structure of claim 2, wherein, The depth of avoiding structure (21) is 2mm.

7. The Tray Mask structure of a physical vapor deposition apparatus according to claim 1, wherein, The number of avoiding structure (21) is 4.

8. A Tray assembly of a physical vapor deposition apparatus, characterized by, The utility model relates to a physical vapor deposition equipment's Tray Mask structure, including: The Tray (3) is arranged at the inside of the Tray Mask structure of physical vapor deposition equipment.

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