Gallium nitride substrate moving mechanism

Abstract

The utility model relates to the technical field of semiconductor crystal growth, and particularly discloses a gallium nitride substrate moving mechanism. The gallium nitride substrate moving mechanism comprises a lower moving platform, an end face flange and a speed reducer B are erected on the lower moving platform, and the gallium nitride substrate moving mechanism is characterized in that a lead screw which is in a walking track shape is installed on the lower moving platform, and one end of the lead screw is connected with a servo motor A; a flange supporting seat for erecting an end face flange and a speed reducer supporting seat for erecting a speed reducer B are installed on the lead screw, one side of the end face flange is in dynamic sealing connection with a rotating shaft, the other side of the end face flange is fixedly connected with a graphite substrate rod, the rotating shaft is connected with the speed reducer B through a coupler, and the speed reducer B is installed on an output shaft of a rotating servo motor B. The graphite substrate rod of the gallium nitride crystal equipment can move and rotate through the matching action of the horizontal moving mechanism and the rotating mechanism, the moving and rotating are realized by adopting an end face dynamic sealing mode, and the graphite substrate rod moving mechanism is simple in structure, convenient to maintain, high in production precision and long in service life.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of semiconductor crystal growth, especially relates to a gallium nitride substrate moving mechanism. BACKGROUND

[0002] Gallium nitride is the core material of the third generation semiconductor, and is an excellent material for manufacturing light emitting diodes, laser diodes and high-temperature, high-frequency and high-power electronic devices. There are many methods for growing GaN substrates, such as high-temperature and high-pressure method, sublimation method, Na molten crystallization method and cyanide vapor phase epitaxy method.

[0003] With the development of science and technology, industrial GaN substrates gradually develop towards large size and multiple pieces, and therefore the requirements for the growth process of crystal materials and the growth equipment in the GaN substrate production process are higher and higher (such as the uniformity of airflow, the stability of multiple HVPE equipment, etc.), one of the key technologies being the stability, precision and reliability of the transmission mechanism.

[0004] The gallium nitride substrate moving mechanism in the prior art has a relatively simple structure and cannot meet the production and use requirements. SUMMARY

[0005] The utility model discloses in order to make up the deficiency of prior art, provide a gallium nitride substrate moving mechanism with good structural stability, high production precision and long service life.

[0006] The utility model discloses a gallium nitride substrate moving mechanism, including the lower moving platform, the end face flange and the speed reducer B are respectively set up in the lower moving platform, its characterized in that: the lower moving platform is installed with the lead screw that presents the walking track, and the lead screw one end is connected servo motor A.

[0007] The utility model discloses a gallium nitride substrate moving mechanism, including the lower moving platform, the end face flange and the speed reducer B are respectively set up in the lower moving platform, its characterized in that: the lower moving platform is installed with the lead screw that presents the walking track, and the lead screw one end is connected servo motor A.

[0008] The utility model discloses the lower moving platform as the basic component of substrate excitation, and it provides larger torque through servo motor A, makes the end face flange on the lower moving platform and the same direction movement of rotary servo motor B, realizes the overall horizontal movement of substrate, the connection of rotary servo motor B and end face flange realizes the horizontal movement and rotary movement of graphite substrate rod on the end face flange.

[0009] The utility model discloses a gallium nitride substrate moving mechanism, including the lower moving platform, the end face flange and the speed reducer B are respectively set up in the lower moving platform, its characterized in that: the lower moving platform is installed with the lead screw that presents the walking track, and the lead screw one end is connected servo motor A.

[0010] The lower moving platform comprises a platform frame, support seats A and fixed seats corresponding in position are arranged at both ends of the platform frame, the lead screws are arranged on the support seats A and the fixed seats respectively, a servo motor A is arranged at one end of the fixed seat on the lower moving platform, a speed reducer A is arranged on an output shaft of the servo motor A and the output shaft penetrates through the fixed seat to connect the lead screw, and the rotation of the lead screw is realized through the power output of the servo motor A and the speed reducer, thereby providing power for horizontal movement.

[0011] Further preferably, the flange support seat and the speed reducer support seat are arranged on the upper end face of the platform frame and are connected with the lead screw through the lead screw nuts at the bottom, so that the flange support seat and the speed reducer support seat are driven by the lead screw nuts.

[0012] Still further preferably, the lead screw is a same-direction double-segment lead screw, and the double-segment lead screw is connected with the flange support seat and the speed reducer support seat through the lead screw nuts respectively, so that the position of the end face flange and the speed reducer can be adjusted randomly, and the application is more flexible.

[0013] The water-cooled jacket flange is arranged on one side of the rotating shaft of the end face flange, four grooves are arranged in the water-cooled jacket flange, and the rubber rings in the grooves are sequentially a rotary sealing ring, a reciprocating sealing ring, a rotary sealing ring and a reciprocating sealing ring from inside to outside, so that the end face flange is cooled by water when the temperature is too high, and the permanent deformation of the rubber rings caused by high temperature is effectively prevented, thereby preventing sealing failure.

[0014] The end face flange is movably arranged on the flange support seat, so that the end face flange can be flexibly rotated on the support seat without wear; and the gallium nitride substrate is arranged at the end of the graphite substrate rod and rotates with the graphite substrate rod to realize uniform and stable growth of the crystal material.

[0015] The horizontal moving mechanism and the self-rotation mechanism are combined to realize the movement and self-rotation of the graphite substrate rod of the gallium nitride crystal equipment, the end face dynamic sealing mode is adopted to realize the movement and self-rotation, the structure is simple, the maintenance is convenient, the production precision is high, the service life is long, and the requirement of the crystal growth process is met. BRIEF DESCRIPTION OF DRAWINGS

[0016] The utility model will be further described in connection with the drawings.

[0017] Figure 1 It is the structural schematic diagram of the utility model;

[0018] Figure 2 It is the structural schematic diagram of the end face flange.

[0019] In the figure, 1 is a lower moving platform, 2 is an end face flange, 3 is a speed reducer B, 4 is a screw rod, 5 is a servo motor A, 6 is a flange support seat, 7 is a speed reducer support seat, 8 is a rotating shaft, 9 is a graphite substrate rod, 10 is a shaft coupling, 11 is a rotating servo motor B, 12 is a support seat A, 13 is a fixed seat, 14 is a speed reducer A, 15 is a gallium nitride substrate, 16 is a water-cooled jacket flange, 17 is a rotating sealing ring, and 18 is a reciprocating sealing ring. DETAILED DESCRIPTION

[0020] In order to make the above-mentioned purposes, features and advantages of the present application more obvious and easy to understand, the specific embodiments of the present application will be described in detail below with reference to the drawings. In the following description, many specific details are set forth in order to provide a thorough understanding of the present application. However, the present application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without departing from the spirit of the present application, so the present application is not limited by the specific embodiments disclosed below.

[0021] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which the present application belongs. The terminology used in the specification of the present application herein is only for the purpose of describing specific embodiments and is not intended to limit the present application. The term "and / or" used herein includes any and all combinations of one or more related listed items.

[0022] The present application will be described in detail below with reference to the drawings: the embodiment includes a lower moving platform 1, an end face flange 2 and a speed reducer B 3 respectively arranged on the lower moving platform 1, the lower moving platform 1 is provided with a screw rod 4 in the form of a walking track, one end of the screw rod 4 is connected with a servo motor A 5; the screw rod 4 is provided with a flange support seat 6 arranged on the end face flange 2 and a speed reducer support seat 7 arranged on the speed reducer B 3, one side of the end face flange 2 is connected with a rotating shaft 8 through dynamic sealing, the other side is fixedly connected with a graphite substrate rod 9, the rotating shaft 8 is connected with the speed reducer B 3 through a shaft coupling 10, and the speed reducer B 3 is installed on the output shaft of a rotating servo motor B 11.

[0023] As shown in the accompanying drawings Figure 1As shown, the lower moving platform 1 comprises a platform frame, support seats A12 and fixed seats 13 are arranged at both ends of the platform frame, the lead screws 4 are arranged on the support seats A12 and the fixed seats 13 respectively, a servo motor A5 is arranged on one end of the fixed seat 13 of the lower moving platform 1, a speed reducer A14 is arranged on the output shaft of the servo motor A5 and the output shaft penetrates through the fixed seat 13 and is connected with the lead screw 4; the flange support seat 6 and the speed reducer support seat 7 are located on the upper end surface of the platform frame and are connected with the lead screw 4 through the bottom lead screw nuts respectively; the lead screw 4 is a same-direction double-section lead screw, the double-section lead screw is connected with the flange support seat 4 and the speed reducer support seat 7 through the lead screw nuts respectively; the end face flange 2 is movably arranged on the flange support seat 6 and the graphite substrate rod 9 is provided with a gallium nitride substrate 15 at the end.

[0024] The working principle of the utility model is as follows:

[0025] The servo motor A rotates to drive the speed reducer A to rotate, so that a larger torque output is provided, the lead screw nut on the lead screw 4 walks, so that the end face flange 2 and the speed reducer B 3 are driven to move synchronously and in the same direction; the movement of the lower moving platform 1 enables the graphite substrate rod 9 to move horizontally and also enables the rotating shaft 8 to advance or retreat, so that the gallium nitride substrate 15 reaches the ideal processing position.

[0026] The horizontal movement and rotation of the graphite substrate rod 9 are realized by the joint action between the end face flange 2, the rotating shaft 8, the flange support seat 6, the speed reducer support seat 7 and the lower moving platform 1. After the end face flange 2 is in place, it is translated as required (i.e. according to the processing position of the gallium nitride substrate 15), and continues to move forward or stops, when it is required to advance, the lower moving platform 1 continues to rotate the lead screw 4 to make the end face flange 2 and the speed reducer B 3 advance; after reaching the position, the rotating servo motor B 11 starts to work, drives the rotating shaft 8 through the speed reducer B 3 and the shaft coupling 10, and the rotating shaft 8 rotates through the dynamic sealing connection with the end face flange 2, so that the gallium nitride substrate 15 rotates with the graphite substrate rod 9.

[0027] As shown in the accompanying drawings, Figure 2 The side of the end face flange 2 connected with the rotating shaft 8 of the utility model is a water-cooling jacket flange 16, four grooves are formed in the water-cooling jacket flange 16, and the rubber rings in the grooves are sequentially rotating sealing rings 17, reciprocating sealing rings 18, rotating sealing rings 17 and reciprocating sealing rings 18 from inside to outside. The end face flange 2 is connected with the cavity of the water-cooling jacket flange 16, when the temperature is too high, the rubber rings are cooled through the water-cooling jacket flange 16, so that permanent deformation of the rubber rings caused by high temperature is prevented, and sealing failure is avoided.

[0028] Compared with the bellows and magnetic fluid sealing mode, the dynamic sealing connection form is not limited by the length of the bellows, and the distance of the substrate movement is limited, the dynamic sealing device has simple installation structure, is easy to maintain, has low operation cost, long service life and no many restrictions in use.

[0029] In addition, the moving mechanism has good overall structural stability, high production precision and long service life compared with the transmission stretching movement.

[0030] Finally, it should be noted that: the above embodiments are only used to illustrate the technical solutions of the utility model, and not to limit them; although the utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that: the technical solutions recorded in the foregoing embodiments can still be modified, or part or all of the technical features can be replaced; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the scope of the technical solutions of the embodiments of the utility model, and they should be covered in the scope of the claims and the description of the utility model.

Claims

1. A gallium nitride substrate moving mechanism, comprising a lower moving platform (1), an end face flange (2) and a reducer B (3) respectively erected on the lower moving platform (1), characterized in that: The lower moving platform (1) is provided with a screw rod (4) in the form of a walking track, one end of the screw rod (4) is connected with a servo motor A (5); the screw rod (4) is provided with a flange support seat (6) for supporting an end face flange (2) and a reducer support seat (7) for supporting a reducer B (3), one side of the end face flange (2) is connected with a rotating shaft (8) through dynamic sealing, the other side is fixedly connected with a graphite substrate rod (9), the rotating shaft (8) is connected with the reducer B (3) through a coupling (10), and the reducer B (3) is installed on an output shaft of a rotary servo motor B (11).

2. The gallium nitride substrate transfer mechanism of claim 1, wherein: The lower moving platform (1) comprises a platform frame, the platform frame is provided with a support seat A (12) and a fixed seat (13) at both ends, the screw rod (4) is arranged on the support seat A (12) and the fixed seat (13) at both ends, the servo motor A (5) is installed on one end of the fixed seat (13) of the lower moving platform (1), the reducer A (14) is installed on an output shaft of the servo motor A (5) and the output shaft penetrates through the fixed seat (13) and is connected with the screw rod (4).

3. The gallium nitride substrate transfer mechanism of claim 2, wherein: The flange support seat (6) and the reducer support seat (7) are located on the upper end surface of the platform frame and are connected with the screw rod (4) through screw rod nuts at the bottom.

4. The gallium nitride substrate transfer mechanism of claim 3, wherein: The screw rod (4) is a same-direction double-section screw rod, the double-section screw rod is connected with the flange support seat (6) and the reducer support seat (7) through screw rod nuts.

5. The gallium nitride substrate transfer mechanism of claim 1, wherein: The end face flange (2) is provided with a water-cooling jacket flange (16) on one side connected with the rotating shaft (8), four grooves are formed in the water-cooling jacket flange (16), and the rubber rings in the grooves are sequentially a rotating sealing ring (17), a reciprocating sealing ring (18), a rotating sealing ring (17) and a reciprocating sealing ring (18) from inside to outside.

6. The gallium nitride substrate transfer mechanism as recited in claim 1 or 2, wherein: The end face flange (2) is movably arranged on the flange support seat (6), and the graphite substrate rod (9) is provided with a gallium nitride substrate (15) at the end.

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