Circulating cleaning tank for semiconductor

Abstract

The utility model relates to the technical field of semiconductor cleaning, in particular to a circulating cleaning tank for semiconductors, which comprises a cleaning operation table, a laminate is fixedly connected inside the cleaning operation table, an annular cleaning tank is fixedly connected to the top of the cleaning operation table, and a water pumping pipe is fixedly connected to the bottom of the annular cleaning tank. A wall scraping assembly and a cleaning assembly are arranged in the water pumping pipe, and in the step, a cleaning agent circulating purification structure is formed by arranging the cleaning operation table, the layer plate, the annular cleaning tank, the water pumping pipe, the filter cartridge, the water pump, the water outlet pipe, the wall scraping assembly, the cleaning assembly and the stirring assembly, so that the function of filtering and purifying the cleaning agent in the annular cleaning tank is achieved; the problem that the inner diameter of the water pumping pipe is reduced due to the fact that dust or foreign matter adheres to the inner side wall of the water pumping pipe is solved, the permeability of the water pumping pipe is improved, the smoothness of circulating flowing of the cleaning agent is improved, and the situation that the circulating speed of the cleaning agent is reduced due to blockage of the water pumping pipe is reduced.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of semiconductor cleaning, particularly to a circulating cleaning tank for semiconductor. BACKGROUND

[0002] Semiconductor is a kind of material with the conductivity between conductor and insulator, which can be made into electronic components according to its special electrical properties.

[0003] During the manufacturing process of semiconductor, impurities or other residues may adhere to the surface of semiconductor, which needs to be cleaned. The common physical cleaning methods include ultrasonic cleaning, spray cleaning and ion beam cleaning, etc. Through the cleaning method, the impurities adhering to the surface of semiconductor can be removed. The use of circulating cleaning agent can improve the efficiency of semiconductor cleaning.

[0004] In the existing semiconductor cleaning technology, when using the cleaning agent circulation method to clean the semiconductor, the inner wall of the suction pipe may adhere to impurities or foreign matter after long-term work, which reduces the flow rate and thus reduces the cleaning speed of the cleaning agent circulation, affecting the cleaning effect. Therefore, we propose a circulating cleaning tank for semiconductor. UTILITY MODEL CONTENTS

[0005] To solve the above problems, the utility model provides a circulating cleaning tank for semiconductor, which has the advantages of improving the permeability of the suction pipe, improving the smoothness of the cleaning agent circulation, reducing the suction pipe blockage and reducing the cleaning agent circulation speed, etc.

[0006] The technical scheme of the utility model is as follows: a cleaning operation table is internally fixedly connected with a layer plate; the top of the cleaning operation table is fixedly connected with a ring-shaped cleaning tank; the bottom of the ring-shaped cleaning tank is fixedly connected with a suction pipe; the suction pipe is internally provided with a wall scraping assembly and a cleaning assembly; the end of the suction pipe away from the ring-shaped cleaning tank is fixedly connected with a filter cartridge; the bottom of the filter cartridge is fixedly connected to the top of the layer plate; the top of the layer plate away from the filter cartridge is fixedly connected with a water pump; the water pump is communicated with the filter cartridge through a pipeline; the output end of the water pump is fixedly connected with a water outlet pipe; the end of the water outlet pipe away from the water pump is fixedly connected to the middle of the ring-shaped cleaning tank; the ring-shaped cleaning tank is internally provided with a supporting assembly; and the ring-shaped cleaning tank is internally provided with a stirring assembly.

[0007] The step is characterized in that the cleaning operation table, the layer plate, the annular cleaning tank, the suction pipe, the filter cartridge, the water pump, the water outlet pipe, the wall scraping assembly, the cleaning assembly and the stirring assembly are arranged to form a cleaning agent circulating purification structure, so that the cleaning agent in the annular cleaning tank is filtered and purified, dust or foreign matter adhered to the inner wall of the suction pipe is removed, the inner diameter of the suction pipe is prevented from being reduced, the permeability of the suction pipe is improved, the smoothness of the cleaning agent circulating flow is improved, and the situation that the cleaning agent circulating speed is reduced due to the blockage of the suction pipe is avoided.

[0008] In a further technical solution, the wall scraping assembly comprises a first fixed plate, a vortex fan, a rotating shaft, a first rotating frame, a scraping strip, a spring and a second fixed plate, the first fixed plate is fixedly connected to the inner wall of the suction pipe close to the annular cleaning tank, the second fixed plate is fixedly connected to the inner wall of the suction pipe away from the first fixed plate, the vortex fan is rotatably connected to the bottom of the first fixed plate away from the annular cleaning tank, one end of the rotating shaft is fixedly connected to the middle of the vortex fan, the other end of the rotating shaft is rotatably connected to the top of the second fixed plate close to the vortex fan, the first rotating frame is fixedly connected to the side wall of the rotating shaft, the scraping strip is slidably connected to the side wall of the first rotating frame away from the rotating shaft, one end of the spring is fixedly connected to the side wall of the scraping strip, the other end of the spring is fixedly connected to the inside of the first rotating frame, and the spring is arranged in multiple groups on the side wall of the scraping strip and is uniformly distributed on the side wall of the scraping strip.

[0009] The step is characterized in that the first fixed plate, the vortex fan, the rotating shaft, the first rotating frame, the scraping strip, the spring and the second fixed plate are arranged to form a suction pipe inner wall cleaning structure, so that the inner wall of the suction pipe is cleaned, impurities or foreign matter adhered to the inner wall of the suction pipe is removed, the situation that the suction pipe is blocked or the pipe diameter is reduced is avoided, the permeability of the suction pipe is improved, and the situation that the cleaning agent circulating flow rate is reduced is avoided.

[0010] In a further technical solution, the stirring assembly comprises a servo motor, a rotating plate and a poking plate, the servo motor is fixedly connected to the bottom of the cleaning operation table close to the annular cleaning tank, the bottom of the rotating plate is fixedly connected to the transmission end of the servo motor, the rotating plate is rotatably connected to the inner wall bottom of the annular cleaning tank, the poking plate is fixedly connected to the top of the rotating plate, and multiple groups of the poking plate are arranged on the top of the rotating plate.

[0011] The step is characterized in that the servo motor, the rotating plate and the poking plate are arranged to form a cleaning agent stirring structure, so that the cleaning agent in the annular cleaning tank is stirred and impacted on the surface of the semiconductor, the flowability of the cleaning agent in the annular cleaning tank is improved, and the cleaning speed of the cleaning agent on the semiconductor is improved.

[0012] In a further technical solution, the object holding assembly comprises a cleaning basket and a hanger, the cleaning basket is slidingly fitted on the inner side wall of the annular cleaning tank, a plurality of groups of the cleaning basket are arranged on the inner side wall of the annular cleaning tank, and the hanger is fixedly connected to the top of the cleaning basket and clamped on the top of the annular cleaning tank.

[0013] This step forms a semiconductor classification storage structure by arranging the cleaning basket and the hanger, realizes the function of placing different types of semiconductors in different cleaning baskets for cleaning, reduces the classification step after cleaning, and improves the independence between different semiconductors during cleaning.

[0014] In a further technical solution, the cleaning assembly comprises a second rotating frame and a brush, the second rotating frame is fixedly connected to the side wall of the rotating shaft away from the first rotating frame, the brush is fixedly connected to the side wall of the second rotating frame away from the rotating shaft, a plurality of groups of the brush are arranged on the side wall of the second rotating frame and are uniformly distributed on the side wall of the second rotating frame.

[0015] This step forms an inner side wall cleaning structure of the water suction pipe by arranging the second rotating frame and the brush, realizes the function of cleaning the inner side wall of the water suction pipe, improves the cleanliness of the inner side wall of the water suction pipe, and reduces the situation that impurities or foreign matters adhere to the inner side wall of the water suction pipe to cause the pipe diameter of the water suction pipe to become smaller.

[0016] In a further technical solution, the bottom of the cleaning operation table is fixedly connected to universal wheels, and a plurality of groups of the universal wheels are arranged on the bottom of the cleaning operation table and are symmetrically arranged.

[0017] This step forms a moving structure by arranging the universal wheels, improves the convenience of moving the device.

[0018] In a further technical solution, a top cover is detachably mounted on the top of the annular cleaning tank.

[0019] During cleaning, the top cover is mounted on the top of the annular cleaning tank to seal the annular cleaning tank, reduces the splashing of the cleaning agent during agitation, and reduces the situation that the cleaning agent splashes onto other equipment to cause damage to the equipment.

[0020] The beneficial effects of the utility model are:

[0021] 1. By arranging the cleaning operation table, the layer plate, the annular cleaning tank, the water suction pipe, the filter cartridge, the water pump, the water outlet pipe, the wall scraping assembly, the cleaning assembly, and the stirring assembly, a cleaning agent circulating purification structure is formed, the function of filtering and purifying the cleaning agent in the annular cleaning tank is realized, the situation that dust or foreign matters adhere to the inner side wall of the water suction pipe to cause the inner diameter of the water suction pipe to become smaller is solved, the permeability of the water suction pipe is improved, the smoothness of the cleaning agent during circulating flow is improved, and the situation that the water suction pipe is blocked to reduce the circulating speed of the cleaning agent is reduced.

[0022] 2, through the first fixed plate, the turbofan, the rotating shaft, the first rotating frame, the scraping strip, the spring and the second fixed plate are set, constitute the inside wall cleaning structure of the water pumping pipe, realized the function of cleaning the inside wall of the water pumping pipe, solved the situation that the impurity or foreign matter adheres to the inside wall of the water pumping pipe and causes the water pumping pipe to be blocked or the pipe diameter to be small, improved the permeability of the water pumping pipe, reduced the situation that the cleaning agent circulation flow rate is slow. BRIEF DESCRIPTION OF DRAWINGS

[0023] Figure 1 It is the whole structure schematic diagram of the embodiment of the utility model;

[0024] Figure 2 It is the structure schematic diagram of the cooperation of the cleaning basket and the annular cleaning tank in the embodiment of the utility model;

[0025] Figure 3 It is the structure schematic diagram of the cooperation of the rotating shaft and the rotating frame in the embodiment of the utility model;

[0026] Figure 4 It is the structure schematic diagram of the cooperation of the scraping strip and the first rotating frame in the embodiment of the utility model.

[0027] Mark explanation:

[0028] 1, cleaning operation platform;11, layer board;12, annular cleaning tank;13, water pumping pipe;14, filter cartridge;15, water pump;16, water outlet pipe;2, first fixed plate;21, turbofan;22, rotating shaft;23, first rotating frame;24, scraping strip;25, spring;26, second fixed plate;3, servo motor;31, rotating plate;32, push plate;4, cleaning basket;41, hanger;5, second rotating frame;51, brush;6, universal wheel;7, top cover. DETAILED DESCRIPTION

[0029] The embodiment of the utility model is further explained below in combination with the drawings.

[0030] Embodiment:

[0031] As Figures 1-4As shown, including cleaning operation platform 1, cleaning operation platform 1 inside fixedly connected with layer plate 11, cleaning operation platform 1 top fixedly connected with annular cleaning tank 12, annular cleaning tank 12 bottom fixedly connected with water suction pipe 13, water suction pipe 13 inside is equipped with wall scraping assembly and cleaning assembly, water suction pipe 13 away from the end of annular cleaning tank 12 fixedly connected with filter cartridge 14, filter cartridge 14 bottom fixedly connected in the top of layer plate 11, layer plate 11 away from the top of filter cartridge 14 fixedly connected with water pump 15, water pump 15 is communicated with filter cartridge 14 through pipeline, water pump 15 output end fixedly connected with water outlet pipe 16, water outlet pipe 16 end away from water pump 15 is fixedly connected in the middle of annular cleaning tank 12, annular cleaning tank 12 inside is equipped with object holding assembly, annular cleaning tank 12 inside is equipped with stirring assembly.

[0032] The working principle of the above technical solution is as follows:

[0033] In work, the cleaning agent is put into the annular cleaning tank 12, the semiconductor to be cleaned is put into the object holding assembly, the object holding assembly and the semiconductor to be cleaned are put into the cleaning agent in the annular cleaning tank 12, the stirring assembly is started to drive the cleaning agent to stir in the annular cleaning tank 12, the semiconductor is cleaned, and the dust or foreign matter adhered to the surface of the semiconductor is removed, the dust or foreign matter is suspended in the cleaning agent in the annular cleaning tank 12, during cleaning, the water pump 15 is started, the water pump 15 sucks the cleaning agent in the annular cleaning tank 12 into the filter cartridge 14 through the water suction pipe 13, the cleaning agent is filtered through the filter cartridge 14 and discharged into the annular cleaning tank 12 from the water outlet pipe 16, forming a circulating purification structure, when the water suction pipe 13 sucks the cleaning agent, the wall scraping assembly and the cleaning assembly clean the inner side wall of the water suction pipe 13, and the dust or foreign matter adhered to the inner side wall of the water suction pipe 13 is cleaned.

[0034] In another embodiment, as shown in Figure 3 and Figure 4 As shown, the wall scraping assembly comprises a first fixed plate 2, a turbofan 21, a rotating shaft 22, a first rotating frame 23, a scraping strip 24, a spring 25 and a second fixed plate 26, the first fixed plate 2 is fixedly connected to the inner side wall of the water suction pipe 13 close to the annular cleaning tank 12, the second fixed plate 26 is fixedly connected to the inner side wall of the water suction pipe 13 away from the first fixed plate 2, the turbofan 21 is rotatably connected to the bottom of the first fixed plate 2 away from the annular cleaning tank 12, one end of the rotating shaft 22 is fixedly connected to the middle of the turbofan 21, the other end of the rotating shaft 22 is rotatably connected to the top of the second fixed plate 26 close to the turbofan 21, the first rotating frame 23 is fixedly connected to the side wall of the rotating shaft 22, the scraping strip 24 is slidably connected to the side wall of the first rotating frame 23 away from the rotating shaft 22, one end of the spring 25 is fixedly connected to the side wall of the scraping strip 24, the other end of the spring 25 is fixedly connected to the inside of the first rotating frame 23, the spring 25 is provided with multiple groups on the side wall of the scraping strip 24 and is uniformly distributed on the side wall of the scraping strip 24.

[0035] In use, when the cleaning agent is sucked into the filter cylinder 14 through the suction pipe 13, the cleaning agent impacts the vortex fan 21, drives the vortex fan 21 to rotate, drives the rotating shaft 22, the first rotating frame 23 and the scraping strip 24 to rotate, the spring 25 is pressed against the first rotating frame 23 to move close to the inner wall of the suction pipe 13, and the impurities or foreign matters adhered to the inner wall of the suction pipe 13 are scraped off by the scraping strip 24 when the scraping strip 24 rotates.

[0036] In another embodiment, as shown in Figure 1 and Figure 2 , the stirring assembly comprises a servo motor 3, a rotating plate 31 and a poking plate 32, the servo motor 3 is fixedly connected to the bottom of the cleaning operation table 1 close to the annular cleaning tank 12, the bottom of the rotating plate 31 is fixedly connected to the transmission end of the servo motor 3, the rotating plate 31 is rotatably connected to the inner wall of the bottom of the annular cleaning tank 12, and the poking plate 32 is fixedly connected to the top of the rotating plate 31. Multiple groups of the poking plate 32 are arranged on the top of the rotating plate 31.

[0037] In use, the servo motor 3 is started, the servo motor 3 drives the rotating plate 31 and the poking plate 32 to rotate forward, the poking plate 32 stirs the cleaning agent in the annular cleaning tank 12, and the dust or foreign matters adhered to the surface of the semiconductor are washed off by the cleaning agent impacting the surface of the semiconductor.

[0038] In another embodiment, as shown in Figure 2 , the object holding assembly comprises a cleaning basket 4 and a hanger 41, the cleaning basket 4 is slidingly fitted to the inner wall of the annular cleaning tank 12, multiple groups of the cleaning basket 4 are arranged on the inner wall of the annular cleaning tank 12, and the hanger 41 is fixedly connected to the top of the cleaning basket 4 and is clamped to the top of the annular cleaning tank 12.

[0039] In use, before cleaning, the semiconductor to be cleaned is placed in the cleaning basket 4, different types of semiconductors are respectively placed in different cleaning baskets 4, and the hanger 41 is clamped to the top of the annular cleaning tank 12, so that the cleaning basket 4 and the semiconductor are immersed in the cleaning agent.

[0040] In another embodiment, as shown in Figure 3 and Figure 4 , the cleaning assembly comprises a second rotating frame 5 and a brush 51, the second rotating frame 5 is fixedly connected to the side wall of the rotating shaft 22 away from the first rotating frame 23, the brush 51 is fixedly connected to the side wall of the second rotating frame 5 away from the rotating shaft 22, multiple groups of the brush 51 are arranged on the side wall of the second rotating frame 5 and are uniformly distributed on the side wall of the second rotating frame 5.

[0041] In use, when the rotating shaft 22 rotates, the second rotating frame 5 and the brush 51 are driven to rotate, the brush 51 contacts the inner wall of the suction pipe 13 to clean the inner wall of the suction pipe 13, and the impurities or foreign matters adhered to the inner wall of the suction pipe 13 are swept off.

[0042] In another embodiment, asFigure 1 As shown in the figure, the bottom of the cleaning operation table 1 is fixedly connected with universal wheels 6, and multiple groups of universal wheels 6 are arranged symmetrically at the bottom of the cleaning operation table 1.

[0043] In work, when the device needs to be moved, the device is moved through the universal wheels 6.

[0044] In another embodiment, as shown in the figure, a top cover 7 is detachably installed at the top of the annular cleaning tank 12. Figure 1

[0045] In work, when cleaning, the top cover 7 is installed at the top of the annular cleaning tank 12 to seal the annular cleaning tank 12, so as to reduce the splashing of the cleaning agent when it is stirred and reduce the damage to the equipment caused by the splashing of the cleaning agent to other equipment.

[0046] The above embodiments only express the specific implementation manners of the present application, and the description is more specific and detailed, but it cannot be understood as the limitation of the patent scope of the present application. It should be pointed out that for ordinary skilled persons in the art, without departing from the concept of the present application, a number of modifications and improvements can be made, which all belong to the protection scope of the present application.​

Claims

1. A circulating cleaning tank for semiconductors, comprising a cleaning operation platform (1), characterized in that: The inside of the cleaning operation platform (1) is fixedly connected with a layer plate (11), the top of the cleaning operation platform (1) is fixedly connected with an annular cleaning tank (12), the bottom of the annular cleaning tank (12) is fixedly connected with a water suction pipe (13), the inside of the water suction pipe (13) is provided with a wall scraping assembly and a cleaning assembly, the end of the water suction pipe (13) away from the annular cleaning tank (12) is fixedly connected with a filter cylinder (14), the bottom of the filter cylinder (14) is fixedly connected to the top of the layer plate (11), the top of the layer plate (11) away from the filter cylinder (14) is fixedly connected with a water pump (15), the water pump (15) is communicated with the filter cylinder (14) through a pipeline, the output end of the water pump (15) is fixedly connected with a water outlet pipe (16), the end of the water outlet pipe (16) away from the water pump (15) is fixedly connected in the middle of the annular cleaning tank (12), the inside of the annular cleaning tank (12) is provided with a supporting assembly, and the inside of the annular cleaning tank (12) is provided with a stirring assembly.

2. The recirculating cleaning tank for semiconductor use according to claim 1, wherein: The wall scraping assembly comprises a first fixed plate (2), a vortex fan (21), a rotating shaft (22), a first rotating frame (23), a scraping strip (24), a spring (25) and a second fixed plate (26), the first fixed plate (2) is fixedly connected to the inner side wall of the water suction pipe (13) close to the annular cleaning tank (12), the second fixed plate (26) is fixedly connected to the inner side wall of the water suction pipe (13) away from the first fixed plate (2), the vortex fan (21) is rotatably connected to the bottom of the first fixed plate (2) away from the annular cleaning tank (12), one end of the rotating shaft (22) is fixedly connected to the middle of the vortex fan (21), the other end of the rotating shaft (22) is rotatably connected to the top of the second fixed plate (26) close to the vortex fan (21), the first rotating frame (23) is fixedly connected to the side wall of the rotating shaft (22), the scraping strip (24) is slidably connected to the side wall of the first rotating frame (23) away from the rotating shaft (22), one end of the spring (25) is fixedly connected to the side wall of the scraping strip (24), the other end of the spring (25) is fixedly connected to the inside of the first rotating frame (23), and a plurality of groups of the spring (25) are arranged on the side wall of the scraping strip (24) and are uniformly distributed on the side wall of the scraping strip (24).

3. The recirculating cleaning tank for semiconductor use according to claim 1, wherein: The stirring assembly comprises a servo motor (3), a rotating plate (31) and a pushing plate (32), the servo motor (3) is fixedly connected to the bottom of the cleaning operation platform (1) close to the annular cleaning tank (12), the bottom of the rotating plate (31) is fixedly connected to the driving end of the servo motor (3), the rotating plate (31) is rotatably connected to the inner side wall bottom of the annular cleaning tank (12), and the pushing plate (32) is fixedly connected to the top of the rotating plate (31). A plurality of groups of the pushing plate (32) are arranged on the top of the rotating plate (31).

4. The recirculating cleaning tank for semiconductor use according to claim 1, wherein: The supporting assembly comprises a cleaning basket (4) and a hanger (41), the cleaning basket (4) is slidably connected to the inner side wall of the annular cleaning tank (12), a plurality of groups of the cleaning basket (4) are arranged on the inner side wall of the annular cleaning tank (12), and the hanger (41) is fixedly connected to the top of the cleaning basket (4).

5. The recirculating cleaning tank for semiconductor use according to claim 2, wherein: Said cleaning assembly includes a second rotating frame (5) and a brush (51), the second rotating frame (5) is fixedly connected to the side wall of the rotating shaft (22) away from the first rotating frame (23), the brush (51) is fixedly connected to the side wall of the second rotating frame (5) away from the rotating shaft (22), the brush (51) is provided in multiple groups on the side wall of the second rotating frame (5) and is uniformly distributed on the side wall of the second rotating frame (5).

6. The recirculating cleaning tank for semiconductor use according to claim 1, wherein: Said cleaning operation platform (1) is fixedly connected to the universal wheel (6) at the bottom, multiple groups of universal wheels (6) are arranged on the bottom of the cleaning operation platform (1) and are symmetrically arranged.

7. The recirculating cleaning tank for semiconductor use according to claim 1, wherein: A top cover (7) is detachably mounted on the top of the annular cleaning tank (12).

Images