MA detection device for semiconductor clean room

Abstract

The utility model belongs to the technical field of MA detection, and discloses an MA detection device for a semiconductor clean room, which comprises a detection instrument, the detection instrument is connected with a sampling pipe, the sampling pipe is connected with an enrichment box, the enrichment box is connected with a connecting pipe, the connecting pipe is connected with a sucking pump, the sucking pump is connected with an air inlet pipe, the enrichment box is connected with a partition plate, and the partition plate is connected with an enrichment pipe. The partition plate is provided with a ventilation opening, the ventilation opening is matched with the enrichment pipe, the enrichment pipe is connected with an activated carbon column, the partition plate is connected with an electric heating wire, the enrichment pipe is sleeved with the electric heating wire, the enrichment box is connected with a gas carrying pipe, the gas carrying pipe is connected with a gas carrying bottle, and the enrichment box is connected with an anti-backflow device. According to the device, low-concentration MA substances in the environment can be effectively enriched, so that the concentration of the MA substances entering the subsequent part of the detection device is improved, a detection signal is enhanced, and trace MA substances can be more sensitively detected.

Description

Technical Field

[0001] This utility model relates to the field of MA detection technology, and in particular to an MA detection device for semiconductor cleanrooms. Background Technology

[0002] Silicon is the most fundamental material in semiconductor manufacturing. Acidic substances (such as hydrofluoric acid, HF) can react chemically with silicon. For example, hydrofluoric acid reacts with silicon to produce silicon tetrafluoride gas and water. This corrosion damages the surface structure of the silicon wafer, affecting its flatness and electrical properties. In the photolithography process, tiny corrosion pits on the silicon wafer surface can lead to a decrease in the precision of the photolithographic pattern, thereby affecting the chip's performance and dimensional accuracy. Therefore, manual inspection (MA) is required in semiconductor cleanrooms.

[0003] Since the MA substance in semiconductor cleanrooms is usually in a low concentration state, the amount of target MA substance entering the detection device is relatively small. The signal generated by the low concentration of MA substance may be very weak, close to the noise level of the detection device, making it difficult for the detection device to accurately identify and quantify these low concentrations of MA substance. This may result in the omission of some trace amounts of acidic contaminants, thus failing to detect potential contamination problems in a timely manner. Utility Model Content

[0004] The present invention aims to provide a MA detection device for semiconductor cleanrooms to solve the problems mentioned in the background art.

[0005] To achieve the above objectives, this utility model provides the following technical solution:

[0006] A MA (Magnetic Acrylamide) testing device for semiconductor cleanrooms includes a testing instrument connected to a sampling tube, an enrichment box connected to the sampling tube, a connecting pipe connected to the enrichment box, an air pump connected to the connecting pipe, an air inlet pipe connected to the air pump, a partition connected to the enrichment box, an enrichment tube connected to the partition, a vent on the partition that mates with the enrichment tube, an activated carbon column connected to the enrichment tube, an electric heating wire connected to the partition and fitted around the enrichment tube, an exhaust pipe and a carrier gas pipe connected to the enrichment box, a carrier gas cylinder connected to the carrier gas pipe, and an anti-backflow device connected to the enrichment box.

[0007] Preferably, the anti-backflow device includes a baffle plate that cooperates with a connecting pipe, the enrichment box is connected to a bracket, the bracket is connected to a support plate, the support plate is connected to a telescopic rod, the telescopic end of the telescopic rod is connected to the baffle plate, and a spring is sleeved on the outside of the telescopic rod, with both ends of the spring connected to the baffle plate and the support plate respectively.

[0008] Preferably, the baffle is connected to a rubber pad, which cooperates with the connecting pipe.

[0009] Preferably, the air intake pipe is detachably connected to a filter screen.

[0010] Preferably, the enrichment tube is made of a high-temperature resistant material.

[0011] Preferably, the enrichment box is connected to a control panel, which is electrically connected to an electric heating wire.

[0012] The beneficial effects of this technical solution compared to existing technologies are as follows:

[0013] (1) This technical solution provides a relatively enclosed space for the entire enrichment process by setting up an enrichment box, baffles, enrichment tubes, and activated carbon columns. The baffles guide the flow path of the gas in the enrichment box, ensuring that the gas must flow through the activated carbon column. When the gas containing MA passes through the activated carbon column, the molecules of MA are adsorbed onto the pore surface of the activated carbon. This adsorption effectively enriches low concentrations of MA in the environment. By setting up an electric heating wire, thermal desorption of the activated carbon can occur, allowing the adsorbed MA to be desorbed from the surface of the activated carbon. The desorbed MA is released in gaseous form, increasing the concentration of MA entering the subsequent part of the detection device, thereby enhancing the detection signal and facilitating more sensitive detection of trace amounts of MA. By setting up a vacuum pump, the gas in the cleanroom can quickly enter the enrichment box, accelerating the entire detection process and enabling more timely detection of the presence and concentration changes of MA.

[0014] (2) By setting springs, telescopic rods and support plates, the baffle can be squeezed so that the baffle seals the connecting pipe. When the gas squeezes the baffle from the correct direction, the spring will contract, allowing the gas to pass through, ensuring that the gas can only flow in the predetermined direction, preventing the backflow of gas enriched with acidic substances, avoiding the corrosion of the pump by acidic substances, and extending the service life of the pump.

[0015] (3) By setting a rubber pad, when the baffle is closed by the spring, telescopic rod and support plate, the rubber pad will be squeezed and deformed to fill the tiny gap between the baffle and the connecting pipe. The rubber pad can also fit tightly against the inner wall of the connecting pipe through its own deformation, thereby forming a relatively sealed space and effectively preventing gas from leaking through the gap.

[0016] (4) By setting up a filter screen, fine impurities in the air are prevented from entering the air pump, reducing their wear on the internal structure of the air pump and extending the service life of the air pump.

[0017] (5) By setting up a high-temperature resistant enrichment tube, the thermal desorption process is ensured to proceed smoothly, so that MA substances can be effectively desorbed from the adsorbent material and the thermal desorption operation can be repeated. The enrichment tube and adsorbent material can be reused multiple times, reducing the cost and time of frequent component replacement. Attached Figure Description

[0018] Figure 1 This is a frontal sectional view of the present invention;

[0019] Figure 2 for Figure 1 Enlarged view of point A;

[0020] Figure 3 This is a front view of the present invention;

[0021] Figure reference numerals: 1. Detection instrument; 2. Sampling tube; 3. Separator; 4. Enrichment box; 5. Air pump; 6. Air inlet pipe; 7. Filter screen; 8. Connecting pipe; 9. Carrier gas pipe; 10. Air vent; 11. Enrichment tube; 12. Electric heating wire; 13. Activated carbon column; 14. Exhaust pipe; 15. Baffle; 16. Spring; 17. Telescopic rod; 18. Support plate; 19. Bracket; 20. Rubber pad; 21. Control panel. Detailed Implementation

[0022] The present invention will now be described in further detail with reference to the accompanying drawings and embodiments:

[0023] like Figure 1-3The device shown is for MA testing in a semiconductor cleanroom. It includes a testing instrument 1 connected to a sampling tube 2 with a valve. An enrichment box 4 is connected to the end of the sampling tube 2 furthest from the testing instrument 1. A connecting pipe 8 is connected to the left side wall of the enrichment box 4, and an air pump 5 is connected to the other end of the connecting pipe 8. An air inlet pipe 6 is connected to the air inlet of the air pump 5, and a filter screen 7 is detachably connected to the inner wall of the air inlet pipe 6. Two sets of partitions 3 are connected to the inner wall of the enrichment box 4, and several enrichment tubes 11 are connected to the two sets of partitions 3. The enrichment tubes 11 are made of high-temperature resistant material. Several vents 10 are provided on the partitions 3, aligned with the enrichment tubes 11. Activated carbon columns 13 are connected to the inner wall of the enrichment tubes 11. An electric heating wire 12 is connected to the two sets of partitions 3, and the electric heating wire 12 is sleeved on the outside of the enrichment tubes 11. A control panel 21 is connected to the front wall of the enrichment box 4, and the control panel 21 is electrically connected to the electric heating wire 12. The top wall of the enrichment chamber 4 is connected to an exhaust pipe 14 and a carrier gas pipe 9. Both the exhaust pipe 14 and the carrier gas pipe 9 are equipped with valves. The exhaust pipe 14 is located between the right-side partition 3 and the right-side wall of the enrichment chamber 4, and the carrier gas pipe 9 is located between the left-side partition 3 and the left-side wall of the enrichment chamber 4. The carrier gas pipe 9 is connected to a carrier gas cylinder. The vacuum pump 5 is started, drawing air from the cleanroom through the air inlet pipe 6. The filter screen 7 on the inner wall of the air inlet pipe 6 intercepts fine impurities in the air, preventing them from entering the vacuum pump 5, thus protecting the internal structure of the vacuum pump 5 and ensuring the stability of the air extraction process. The air filtered by the filter screen 7 enters the enrichment chamber 4 through the connecting pipe 8. The gas entering the enrichment chamber 4 is guided by two sets of partitions 3 and enters the enrichment tube 11 through the vent 10 on the partitions 3. The activated carbon column 13 inside the enrichment tube 11 uses its adsorption properties to adsorb and enrich MA in the gas. The adsorbed gas is discharged through the exhaust pipe 14. When the activated carbon in the enrichment tube 11 has adsorbed a certain amount of MA, it needs to be desorbed for subsequent detection. At this time, the electric heating wire 12 is activated through the control panel 21. The electric heating wire 12 is sleeved on the outside of the enrichment tube 11. After being energized, it generates heat to heat the enrichment tube 11. Since the enrichment tube 11 is made of high-temperature resistant material, it can withstand the high temperature required during the thermal desorption process and will not deform or be damaged due to high temperature. Under the action of high temperature, the MA adsorbed on the activated carbon is desorbed from the surface of the activated carbon and becomes gaseous again. The carrier gas bottle delivers carrier gas into the enrichment chamber 4 through the carrier gas pipe 9. The carrier gas carries the desorbed MA out of the enrichment chamber 4 and into the detection instrument 1 through the sampling tube 2.

[0024] like Figure 2As shown, the enrichment box 4 is connected to an anti-backflow device, which includes a baffle 15 that cooperates with the connecting pipe 8. A bracket 19 is connected to the left side wall of the enrichment box 4, and a support plate 18 is connected to the bracket 19. A telescopic rod 17 is connected to the side of the support plate 18 closest to the left side wall of the enrichment box 4. The telescopic end of the telescopic rod 17 is connected to the baffle 15, and a spring 16 is sleeved on the outside of the telescopic rod 17. The two ends of the spring 16 are connected to the baffle 15 and the support plate 18, respectively. A rubber pad 20 is connected to the side of the baffle 15 away from the telescopic rod 17, and the rubber pad 20 cooperates with the connecting pipe 8. When the vacuum pump 5 is working normally, the gas pushes the baffle 15, causing the spring 16 to contract, and the baffle 15 moves away from the connecting pipe 8, allowing the gas to smoothly pass through the connecting pipe 8 and enter the enrichment box 4. When the vacuum pump 5 stops working or malfunctions, causing the gas to tend to flow back, the spring 16 returns to its original state, pushing the baffle 15 so that the rubber pad 20 on the baffle 15 tightly adheres to the connecting pipe 8, thereby sealing the connecting pipe 8 and preventing the gas from flowing back.

[0025] The specific implementation process is as follows:

[0026] In use, close the carrier gas pipe 9 valve and the sampling pipe 2 valve, open the exhaust pipe 14 valve, and start the vacuum pump 5 to allow outside air to enter the enrichment box 4 and flow through the enrichment pipe 11. The MA substance in the air is adsorbed by the activated carbon column 13 and then discharged through the exhaust pipe 14. After a period of time, enrichment is complete. Close the vacuum pump 5, open the carrier gas pipe 9 valve to fill the enrichment box 4 with carrier gas, and then close the exhaust pipe 14 valve. Start the electric heating wire 12 via the control panel 21 to heat the enrichment pipe 11, causing the MA substance to desorb from the activated carbon column 13. Open the sampling pipe 2 valve, and the carrier gas carries the MA substance through the sampling pipe 2 into the detection instrument 1 for detection.

[0027] The above descriptions are merely embodiments of this utility model. Commonly known technical solutions and / or characteristics are not described in detail here. It should be noted that those skilled in the art can make various modifications and improvements without departing from the technical solution of this utility model. These modifications and improvements should also be considered within the scope of protection of this utility model, and will not affect the effectiveness of the implementation of this utility model or the practicality of the patent. The scope of protection claimed in this application should be determined by the content of its claims, and the specific embodiments described in the specification can be used to interpret the content of the claims.

Claims

1. A semiconductor clean room MA detection apparatus, characterized by: The application relates to a detection instrument (1) which is connected with a sampling pipe (2), the sampling pipe (2) is connected with an enrichment box (4), the enrichment box (4) is connected with a connecting pipe (8), the connecting pipe (8) is connected with an air suction pump (5), the air suction pump (5) is connected with an air inlet pipe (6), the enrichment box (4) is connected with a partition plate (3), the partition plate (3) is connected with an enrichment pipe (11), the partition plate (3) is provided with a vent (10), the vent (10) is matched with the enrichment pipe (11), the enrichment pipe (11) is connected with an active carbon column (13), the partition plate (3) is connected with an electric heating wire (12), the electric heating wire (12) is arranged outside the enrichment pipe (11), the enrichment box (4) is connected with an air outlet pipe (14) and a carrier gas pipe (9), the carrier gas pipe (9) is connected with a carrier gas bottle, and the enrichment box (4) is connected with an anti-backflow device.

2. A MA detection device for a semiconductor clean room as recited in claim 1, wherein: The anti-backflow device comprises a baffle (15) which is matched with the connecting pipe (8), the enrichment box (4) is connected with a support (19), the support (19) is connected with a supporting plate (18), the supporting plate (18) is connected with a telescopic rod (17), the telescopic rod (17) is connected with the baffle (15) at the telescopic end, a spring (16) is arranged outside the telescopic rod (17), and the spring (16) is connected with the baffle (15) and the supporting plate (18) at two ends.

3. A MA detection device for a semiconductor clean room as recited in claim 2, wherein: The baffle (15) is connected with a rubber pad (20) which is matched with the connecting pipe (8).

4. A MA detection device for a semiconductor clean room as recited in claim 1, wherein: The air inlet pipe (6) is detachably connected with a filter screen (7).

5. A MA detection device for a semiconductor clean room as recited in claim 1, wherein: The enrichment pipe (11) is made of high-temperature-resistant material.

6. A MA detection device for a semiconductor clean room as recited in claim 1, wherein: The enrichment box (4) is connected with a control panel (21) which is electrically connected with the electric heating wire (12).

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