Photoresist supply device

Abstract

The utility model discloses a photoresist supply device which comprises a base, a pressurizing mechanism is arranged on the base, the pressurizing mechanism comprises a support frame, a mounting frame, a pressing cylinder, a plurality of groups of glue storage tanks, a screw rod, a rubber pad, a transmission plate and a motor, and a control mechanism is arranged at the bottom end of each group of glue storage tanks. The control mechanism comprises a control sleeve, an adjusting sleeve, a center rod, a transmission sleeve, a sealing sleeve, a glue passing hole and an adjusting mechanism, the control sleeve is arranged below the glue storage tank, the adjusting sleeve is installed on the inner wall of the control sleeve, the center rod is rotatably installed on the adjusting sleeve, the transmission sleeve is connected to the outer wall of the center rod, the sealing sleeve is installed on the outer wall of the transmission sleeve, and the glue passing hole is formed in the outer wall of the adjusting sleeve. The control mechanism has the beneficial effects that the flow of photoresist can be effectively adjusted through the combined design of the control sleeve, the adjusting sleeve and the center rod, and the structural design not only improves the stability of photoresist supply, but also adapts to the adjusting requirements of different flow requirements.

Description

Technical Field

[0001] This utility model relates to the field of photoresist supply technology, and more specifically, to a photoresist supply device. Background Technology

[0002] The PCB photoresist supply device uses a pump to provide the power to draw photoresist into the cavity. When coating is required, the PCB photoresist is ejected from the cavity through the nozzle and coated onto the printed circuit board (PCB). The substrate after PR coating is exposed and developed to obtain the required circuit pattern. Existing PCB photoresist supply devices usually store an appropriate amount of photoresist in a storage tank for convenience and supply it directly when needed.

[0003] However, in practical applications, different process requirements result in significant differences in the amount of photoresist supplied. For example, in some high-precision processing scenarios, photoresist needs to be supplied precisely at extremely low flow rates to meet the molding requirements of fine structures; while in large-area coating scenarios, a large flow rate of photoresist needs to be supplied quickly to improve production efficiency. In existing technologies, the supply device often adopts a fixed flow channel. This design makes it difficult to flexibly adjust the amount of photoresist supplied according to different demand scenarios, resulting in the supply process being difficult to balance accuracy and efficiency.

[0004] Furthermore, in actual operation, due to the high viscosity and certain rheological properties of photoresist, the flow rate adjustment needs to consider a variety of factors, including the uniformity of applied pressure, the adjustment of the flow channel opening, and the flow state of the photoresist. Existing photoresist supply devices lack effective adjustment mechanisms in these aspects, and usually only roughly control the flow rate by changing the pressure. This method is prone to uneven supply, which in turn affects the stability and consistency of the processing. Utility Model Content

[0005] (a) Technical problems to be solved

[0006] To address the problems existing in the prior art, this utility model provides a photoresist supply device to solve the technical problem mentioned in the background art that the existing photoresist supply devices lack effective adjustment mechanisms in these aspects, and usually only roughly control the flow rate by changing the pressure, which easily causes uneven supply.

[0007] (II) Technical Solution

[0008] To achieve the above objectives, this utility model provides the following technical solution: a photoresist supply device, comprising a base, on which a pressurizing mechanism is provided. The pressurizing mechanism includes a support frame, a mounting frame, a pressure cylinder, a photoresist storage tank, a screw, a rubber pad, a transmission plate, and a motor. The support frame is mounted on the base, and multiple sets of mounting frames are mounted on the support frame. The pressure cylinder is mounted at the bottom of the multiple sets of mounting frames, and the photoresist storage tank is mounted at the bottom of the multiple sets of pressure cylinders. The screw is threadedly connected to the multiple sets of mounting frames, and the rubber pad is mounted at the bottom of the multiple sets of screws. The transmission plate is mounted at the top of the multiple sets of screws, and the motor is mounted on the top surface of the multiple sets of transmission plates, with its output end connected to the screw. Each of the multiple sets of photoresist storage tanks has a control mechanism at its bottom. The control mechanism includes a control sleeve, an adjusting sleeve, a central rod, a transmission sleeve, a sealing sleeve, a photoresist passage hole, and an adjusting mechanism. The control sleeve is located below the photoresist storage tank, the adjusting sleeve is mounted on the inner wall of the control sleeve, the central rod is rotatably mounted on the adjusting sleeve, the transmission sleeve is connected to the outer wall of the central rod, the sealing sleeve is mounted on the outer wall of the transmission sleeve, and the photoresist passage hole is located on the outer wall of the adjusting sleeve.

[0009] The present invention is further configured such that the adjusting mechanism includes a spiral groove, a protrusion, a rotating sleeve, and a connecting rod. The spiral groove is disposed on the outer wall of the central rod, the protrusion is installed on the inner wall of the transmission sleeve, the rotating sleeve rotatably connects the photoresist tank and the control sleeve, and multiple sets of connecting rods are disposed on the inner wall of the rotating sleeve and connected to the outer wall of the central rod. This structure, through the sliding cooperation of the spiral groove and the protrusion, enables the central rod to convert the rotational motion into the axial movement of the transmission sleeve when rotating, thereby driving the sleeve to slide axially. At the same time, the rotational connection between the rotating sleeve and the photoresist tank and the control sleeve makes the overall movement of the adjusting mechanism more stable. The multiple sets of connecting rods enhance the stability and connection strength between the central rod and the rotating sleeve, thereby realizing the precise adjustment of the photoresist supply flow rate.

[0010] The present invention is further configured such that limiting rods are installed on the top surface of multiple sets of mounting frames. Multiple sets of limiting rods are provided and are slidably connected to multiple sets of transmission plates. This design ensures that the transmission plates can slide up and down along a fixed trajectory during movement through the sliding cooperation between the limiting rods and the transmission plates, avoiding the phenomenon of displacement or tilting of the transmission plates during movement. At the same time, the setting of multiple sets of limiting rods can adapt to the synchronous movement of multiple sets of transmission plates, thereby ensuring that the pressure applied by the pressure cylinder to the photoresist is uniform, further improving the stability and uniformity of the photoresist supply.

[0011] The present invention is further configured such that a photoresist supply tube is installed at the bottom of each of the multiple control sleeves. This design allows the photoresist in the storage tank to pass smoothly through the control sleeve and be transported to the designated position. The multiple sets of the photoresist supply tubes adapt to the simultaneous operation requirements of multiple storage tanks, thereby improving the photoresist supply efficiency and ensuring the stability and controllability of the photoresist supply path.

[0012] The present invention is further configured such that an outer ring is installed on the outer wall of each of the multiple sets of control sleeves, and a fixing rod is connected between the top surface of each of the multiple sets of outer rings and the glue storage tank. The fixing rod is provided in multiple sets. This structure enhances the stability between the control sleeve and the glue storage tank through the connection between the outer ring and the fixing rod. At the same time, the design of multiple sets of fixing rods enables the glue storage tank to be more firmly fixed to the device when subjected to the force of the pressure cylinder, thereby avoiding the occurrence of displacement or loosening of the glue storage tank due to pressure fluctuations or mechanical movement, and further improving the overall working stability and reliability of the device.

[0013] The present invention is further configured such that two sets of spiral grooves are distributed on the outer wall of the central rod, and two sets of protrusions are installed on the inner wall of the transmission sleeve and slidably connected with the two sets of spiral grooves. This design, by setting two sets of spiral grooves on the outer wall of the central rod and setting two sets of protrusions on the inner wall of the transmission sleeve to cooperate with them, achieves a more stable sliding fit between the central rod and the transmission sleeve, thereby enhancing the accuracy and durability of the adjustment mechanism. The setting of the double sets of spiral grooves and protrusions makes the axial movement of the transmission sleeve more stable and avoids the offset or jamming phenomenon that may be caused by a single fit structure.

[0014] The present invention is further configured such that the outer wall of the cover and the inner wall of the adjusting sleeve are tightly fitted and slidably connected. This structure ensures the sealing of the photoresist supply channel during the adjustment process through the tight fit between the cover and the adjusting sleeve, thereby effectively preventing photoresist leakage during the adjustment process. At the same time, this sliding connection method can ensure the smoothness and stability of the cover movement during the adjustment process, thereby achieving precise control of the photoresist supply flow.

[0015] The present invention is further configured such that the outer wall of the sleeve is provided with a guide strip, and the inner wall of the adjusting sleeve is provided with a guide groove. Multiple sets of guide strips and guide grooves are provided and slidably connected. This design, through the sliding cooperation of the guide strips and guide grooves, further ensures the directional stability of the sleeve when it moves within the adjusting sleeve. The multiple sets of guide strips and guide grooves enhance the anti-displacement capability of the sleeve during the adjustment process, avoiding the situation where the opening of the photoresist through hole is inaccurate due to the deviation of the sleeve movement, thereby ensuring the accuracy and reliability of the photoresist supply flow rate adjustment.

[0016] (III) Beneficial Effects

[0017] Compared with the prior art, the present invention provides a photoresist supply device, which has the following advantages:

[0018] 1. The beneficial effect of the pressurizing mechanism lies in the high stability of the entire device achieved through the multiple configurations of the support frame and mounting frame. Simultaneously, the motor drives the screw to rotate, and the threaded engagement between the screw and the mounting frame precisely controls the up-and-down movement of the transmission plate. The transmission plate further pushes the rubber pad to apply pressure to the inside of the pressure cylinder, thereby extruding the photoresist from the storage tank through air pressure. This design enables a uniform and stable photoresist supply, improving the efficiency and accuracy of the supply and meeting the requirements of different processes.

[0019] 2. The beneficial effect of the control mechanism is that the combined design of the control sleeve, adjusting sleeve and center rod can effectively regulate the flow rate of photoresist. The control sleeve provides a stable connection structure for the storage tank, while the adjusting sleeve, through its rotational cooperation with the center rod, allows for flexible adjustment of the opening of the photoresist passage. At the same time, the tight fit design between the sealing sleeve and the adjusting sleeve further prevents photoresist leakage, ensuring the sealing and reliability of the photoresist supply process. This structural design not only improves the stability of photoresist supply, but also adapts to the adjustment requirements of different flow rates.

[0020] 3. The beneficial effects of the adjustment mechanism are reflected in the fact that through the sliding cooperation of the spiral groove and the protrusion on the central rod, as well as the motion linkage between the transmission sleeve and the cover, it is possible to achieve precise control of the opening of the photoresist passage. Specifically, the design of the spiral groove and the protrusion converts the rotational motion into the axial motion of the transmission sleeve. The axial movement of the transmission sleeve acts on the cover, causing it to slide along the inner wall of the adjustment sleeve, thereby adjusting the exposed area of ​​the photoresist passage. The sliding cooperation between the guide bar and the guide groove further ensures the motion stability of the cover and avoids the phenomenon of offset. This design can adjust the supply flow of photoresist according to different photolithography requirements, making the photoresist supply process more precise and flexible, and improving the applicability of the device. Attached Figure Description

[0021] Figure 1 This is a schematic diagram of the overall structure of a photoresist supply device according to the present invention.

[0022] Figure 2 This is a cross-sectional view of the rubber storage tank in this utility model;

[0023] Figure 3 This is a cross-sectional view of the control mechanism in this utility model.

[0024] Figure 4 This is a cross-sectional view of the adjusting sleeve in this utility model;

[0025] Figure 5 This is a cross-sectional view of the cover in this utility model.

[0026] In the diagram: 1. Base; 2. Support frame; 3. Mounting frame; 4. Pressure cylinder; 5. Glue storage tank; 6. Screw; 7. Rubber pad; 8. Transmission plate; 9. Motor; 10. Control sleeve; 11. Adjusting sleeve; 12. Center rod; 13. Transmission sleeve; 14. Sealing sleeve; 15. Glue passage hole; 16. Spiral groove; 17. Protrusion; 18. Rotating sleeve; 19. Connecting rod; 20. Limiting rod; 21. Glue supply pipe; 22. Outer ring; 23. Fixing rod; 24. Guide strip; 25. Guide groove. Detailed Implementation

[0027] It should be noted that, unless otherwise specified, the embodiments and features described in this application can be combined with each other. The present invention will now be described in detail with reference to the accompanying drawings and embodiments.

[0028] It should be noted that, unless otherwise specified, all technical and scientific terms used in this application have the same meaning as commonly understood by one of ordinary skill in the art to which this application pertains.

[0029] In this utility model, unless otherwise stated, the orientations used, such as "up" and "down", usually refer to the direction shown in the accompanying drawings, or to the vertical, perpendicular, or gravitational direction; similarly, for ease of understanding and description, "left" and "right" usually refer to the left and right shown in the accompanying drawings; "inner" and "outer" refer to the inner and outer contours of each component itself, but the above directional terms are not used to limit this utility model.

[0030] Please see Figures 1-5 A photoresist supply device includes a base 1, on which a pressurizing mechanism is mounted. The pressurizing mechanism includes a support frame 2, a mounting frame 3, a pressure cylinder 4, a photoresist storage tank 5, a screw 6, a rubber pad 7, a transmission plate 8, and a motor 9. The support frame 2 is mounted on the base 1. Multiple sets of mounting frames 3 are mounted on the support frame 2. The pressure cylinder 4 is mounted at the bottom of the multiple sets of mounting frames 3. The photoresist storage tank 5 is mounted at the bottom of the multiple sets of pressure cylinders 4. The screw 6 is threadedly connected to the multiple sets of mounting frames 3. The rubber pad 7 is mounted at the bottom of the multiple sets of screws 6. The transmission plate 8 is mounted at the top of the multiple sets of screws 6. The motor 9... 9 is installed on the top surface of multiple sets of transmission plates 8 and the output end is connected to the screw 6. Multiple sets of glue storage tanks 5 are equipped with control mechanisms at the bottom. The control mechanisms include control sleeve 10, adjusting sleeve 11, center rod 12, transmission sleeve 13, sealing sleeve 14, glue passage hole 15 and adjustment mechanism. Control sleeve 10 is located below glue storage tank 5. Adjusting sleeve 11 is installed on the inner wall of control sleeve 10. Center rod 12 is rotatably installed on adjusting sleeve 11. Transmission sleeve 13 is connected to the outer wall of center rod 12. Sealing sleeve 14 is installed on the outer wall of transmission sleeve 13. Glue passage hole 15 is located on the outer wall of adjusting sleeve 11.

[0031] The adjustment mechanism includes a spiral groove 16, a protrusion 17, a rotating sleeve 18, and a connecting rod 19. The spiral groove 16 is located on the outer wall of the central rod 12, the protrusion 17 is installed on the inner wall of the transmission sleeve 13, the rotating sleeve 18 rotatably connects the glue storage tank 5 and the control sleeve 10, and the connecting rod 19 is provided with multiple sets installed on the inner wall of the rotating sleeve 18 and connected to the outer wall of the central rod 12.

[0032] Each of the multiple mounting frames 3 has a limit rod 20 installed on its top surface. The limit rod 20 is provided in multiple sets and is slidably connected to the multiple sets of transmission plates 8.

[0033] Each of the multiple control sleeves 10 is equipped with a glue supply tube 21 at its bottom.

[0034] Each of the multiple control sleeves 10 has an outer ring 22 installed on its outer wall. Each of the multiple outer rings 22 has a fixing rod 23 connected to the top surface of the glue storage tank 5. There are multiple sets of fixing rods 23.

[0035] Two sets of spiral grooves 16 are provided on the outer wall of the central rod 12, and two sets of protrusions 17 are provided on the inner wall of the transmission sleeve 13 and are slidably connected to the two sets of spiral grooves 16.

[0036] The outer wall of the cover 14 is tightly fitted and slidably connected to the inner wall of the adjusting sleeve 11.

[0037] The outer wall of the cover 14 is provided with a guide strip 24, and the inner wall of the adjusting sleeve 11 is provided with a guide groove 25. Multiple sets of guide strips 24 and guide grooves 25 are provided and are slidably connected.

[0038] In this embodiment, the photoresist storage tank 5 stores photoresist. When surface coating is required, the motor 9 is started to drive the screw 6 to rotate. The screw 6 rotates and engages with the mounting frame 3 through a thread, thereby driving the transmission plate 8 to slide along multiple sets of limiting rods 20. At the same time, the screw 6 pushes the rubber pad 7 downward along the pressure cylinder 4. The air pressure in the pressure cylinder 4 forces the photoresist in the storage tank 5 to be extruded through the glue supply pipe 21, providing a photoresist supply. When it is necessary to adjust the photoresist supply flow rate, the rotating sleeve 1 is rotated. 8. The central rod 12 is rotated by multiple sets of connecting rods 19. The rotation of the central rod 12 causes the spiral groove 16 to slide with the protrusion 17. The sliding engagement between the spiral groove 16 and the protrusion 17 causes the transmission sleeve 13 to move axially along the central rod 12. The axial movement of the transmission sleeve 13 acts on the sealing sleeve 14, causing the sealing sleeve 14 to slide along the inner wall of the adjusting sleeve 11, thereby adjusting the opening of the photoresist hole 15. The larger the exposed area of ​​the photoresist hole 15, the greater the flow of photoresist, and vice versa.

[0039] In summary, during the use or operation of the overall equipment: the photoresist storage tank 5 stores photoresist. When surface coating is required, the motor 9 is started, driving the screw 6 to rotate. The screw 6 rotates and engages with the mounting frame 3 via a thread, thereby driving the transmission plate 8 to slide along multiple sets of limit rods 20. Simultaneously, the screw 6 pushes the rubber pad 7 downwards along the pressure cylinder 4. The air pressure inside the pressure cylinder 4 forces the photoresist in the storage tank 5 to be extruded through the supply pipe 21, providing a photoresist supply. When it is necessary to adjust the photoresist supply flow rate, the motor 9 rotates... The rotating sleeve 18 drives the central rod 12 to rotate through multiple sets of connecting rods 19. The rotation of the central rod 12 causes the spiral groove 16 to slide with the protrusion 17. The sliding engagement between the spiral groove 16 and the protrusion 17 causes the transmission sleeve 13 to move axially along the central rod 12. The axial movement of the transmission sleeve 13 acts on the sealing sleeve 14, causing the sealing sleeve 14 to slide along the inner wall of the adjusting sleeve 11, thereby adjusting the opening of the photoresist passage 15. The larger the exposed area of ​​the photoresist passage 15, the greater the flow of photoresist, and vice versa.

[0040] Of all the solutions mentioned above, those involving the connection between two components can be selected according to the actual situation, such as welding, bolt and nut connection, bolt or screw connection, or other known connection methods, which will not be elaborated here. For all the fixed connections mentioned above, welding is preferred. Although embodiments of this utility model have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principles and spirit of this utility model. The scope of this utility model is defined by the appended claims and their equivalents.

Claims

1. A photoresist supply device comprising a base (1), characterized in that: The base (1) is provided with a pressing mechanism, the pressing mechanism comprises a support frame (2), a mounting frame (3), a pressing cylinder (4), a glue storage tank (5), a screw rod (6), a rubber pad (7), a transmission plate (8) and a motor (9), the support frame (2) is installed on the base (1), the mounting frame (3) is provided with a plurality of groups of mounting frames (2), the pressing cylinder (4) is installed at the bottom end of the plurality of mounting frames (3), the glue storage tank (5) is installed at the bottom end of the plurality of pressing cylinders (4), the screw rod (6) is threadedly connected to the plurality of mounting frames (3), the rubber pad (7) is installed at the bottom end of the plurality of screw rods (6), the transmission plate (8) is installed at the top end of the plurality of screw rods (6), the motor (9) is installed on the top surface of the plurality of transmission plates (8) and the output end is connected with the screw rod (6), a plurality of control mechanisms are arranged at the bottom end of the plurality of glue storage tanks (5), the control mechanism comprises a control sleeve (10), an adjusting sleeve (11), a center rod (12), a transmission sleeve (13), an envelope (14), a glue passing hole (15) and an adjusting mechanism, the control sleeve (10) is arranged below the glue storage tank (5), the adjusting sleeve (11) is installed on the inner wall of the control sleeve (10), the center rod (12) is rotatably installed on the adjusting sleeve (11), the transmission sleeve (13) is connected to the outer wall of the center rod (12), the envelope (14) is installed on the outer wall of the transmission sleeve (13), and the glue passing hole (15) is arranged on the outer wall of the adjusting sleeve (11).

2. The photoresist supply apparatus of claim 1, wherein: The adjusting mechanism comprises a spiral groove (16), a protrusion (17), a rotating sleeve (18) and a connecting rod (19), the spiral groove (16) is arranged on the outer wall of the center rod (12), the protrusion (17) is installed on the inner wall of the transmission sleeve (13), the rotating sleeve (18) is rotatably connected with the glue storage tank (5) and the control sleeve (10), and the connecting rod (19) is provided with a plurality of groups of mounting frames (18) and is connected with the outer wall of the center rod (12).

3. The photoresist supply apparatus of claim 2, wherein the plurality of groups of photoresist containers are arranged in a plurality of rows. The top surface of the mounting frame (3) is provided with a limiting rod (20), and the limiting rod (20) is provided with a plurality of groups and is respectively connected with a plurality of transmission plates (8).

4. The photoresist supply apparatus of claim 3, wherein: A plurality of control sleeves (10) are arranged at the bottom end of the glue storage tank (5).

5. The photoresist supply apparatus of claim 4, wherein the plurality of groups of photoresist containers are arranged in a plurality of rows. The outer wall of the control sleeve (10) is provided with an outer ring (22), and the top surface of the plurality of outer rings (22) and the glue storage tank (5) are connected with a fixing rod (23), and the fixing rod (23) is provided with a plurality of groups.

6. The photoresist supply apparatus of claim 5, wherein: The spiral groove (16) is provided with two groups of distribution on the outer wall of the center rod (12), and the protrusion (17) is provided with two groups of mounting frames (13) and is connected with the two groups of spiral grooves (16).

7. The photoresist supply apparatus of claim 6, wherein: The outer wall of the envelope (14) is tightly attached to the inner wall of the adjusting sleeve (11) and is connected with the adjusting sleeve (11).

8. The photoresist supply apparatus of claim 7, wherein: The outer wall of the envelope (14) is provided with a guide strip (24), the inner wall of the adjusting sleeve (11) is provided with a guide groove (25), and the guide strip (24) and the guide groove (25) are provided with a plurality of groups and are connected.

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