Polishing equipment

Abstract

The utility model relates to the technical field of polishing, and discloses a polishing device which comprises a polishing body and a polishing liquid recycling bin, a polishing area is arranged on the polishing body, and a liquid outlet pipe is arranged at the bottom of the polishing area. The liquid outlet pipe is connected to a polishing liquid recycling barrel, a first filtering device is arranged at the joint of the polishing liquid recycling barrel and the liquid outlet pipe, a liquid return pipe communicated with the polishing area is arranged at the bottom of the polishing liquid recycling barrel, and a second filtering device is arranged on the liquid return pipe; the first filtering device and the second filtering device are respectively arranged on the liquid inlet pipe and the liquid outlet pipe of the polishing solution recycling barrel, so that the polishing solution entering the polishing solution recycling barrel is free of foreign matters such as cullet and large polishing solution blocks; and the second filtering device can ensure that the polishing solution entering the machining cycle again does not have tiny impurities and foreign matters, so that the cleanliness of the polishing solution entering the machining cycle again is ensured.

Description

TECHNICAL FIELD

[0001] The utility model relates to polishing technical field especially relates to a polishing equipment. BACKGROUND

[0002] In the field of flat panel display, glass substrate is usually polished by chemical mechanical polishing technology, and the polishing is realized by alternately performing chemical treatment and mechanical treatment to achieve the polishing of the surface of the glass substrate, so as to meet the micro-ripple degree and surface quality of the substrate required by the flat panel display. During the polishing process of the glass substrate, the polishing liquid is the main processing material, the flat glass is adsorbed on the polishing upper disc rubber pad, the polishing liquid flows on the lower disc surface and is uniformly distributed, and the upper and lower disc surfaces rotate and move linearly by pressure to realize the polishing of the surface of the flat glass. The polishing liquid is in a circulating flow state during the processing, and the flowing polishing liquid passes through a transition polishing liquid barrel through a pipeline, the polishing liquid is stirred uniformly in the barrel, and then is pumped back to the polishing disc part.

[0003] Since there are agglomerates in the polishing liquid, micro-scratches may occur on the glass substrate during the polishing process, and the micro-scratches occurring during the polishing process may also cause the presence of glass chips in the polishing liquid, thereby causing scratches on the glass substrate. In this case, in addition to normal cleaning of the agglomerates, the polishing liquid needs to be replaced when necessary, which not only causes waste of the polishing liquid, but also reduces the yield of the polishing product and affects the quality of the polishing product. SUMMARY

[0004] The utility model aims at solving the problem in at least one background art. To this end, the utility model provides a polishing equipment, which increases a multi-stage filtering device to realize effective polishing liquid filtration, ensures that the polishing liquid re-entering the processing cycle meets the processing requirements, thereby improving the utilization rate of the polishing liquid and the yield of the polishing product.

[0005] According to the polishing equipment provided by the utility model, the polishing main body is provided with a polishing area, and the polishing area is provided with a liquid outlet pipe at the bottom; the liquid outlet pipe is connected to the polishing liquid recovery barrel, the polishing liquid recovery barrel is provided with a first filtering device at the connection position with the liquid outlet pipe, the bottom of the polishing liquid recovery barrel is provided with a liquid return pipe in communication with the polishing area, and the liquid return pipe is provided with a second filtering device. Therefore, the first filtering device and the second filtering device are arranged on the liquid inlet pipe and the liquid outlet pipe of the polishing liquid recovery barrel, respectively, so that the polishing liquid entering the polishing liquid recovery barrel is free of foreign matters such as glass chips and large polishing liquid agglomerates, and the second filtering device ensures that the polishing liquid re-entering the processing cycle is free of small impurities, so that the cleanliness of the polishing liquid re-entering the processing cycle is ensured.

[0006] According to another embodiment of the present application, the first filtering device comprises a first body, and a plurality of through holes are formed on the surface of the first body.

[0007] According to another embodiment of the present application, the diameter of the through hole is 0-0.2 cm.

[0008] According to another embodiment of the present application, the first body comprises a base, and a cylindrical filter body is arranged on the base, and a plurality of first through holes are formed on the surface of the filter body.

[0009] According to another embodiment of the present application, the diameter of the filter body is 5-10 cm, and the height of the filter body is 10-20 cm.

[0010] According to another embodiment of the present application, the second filtering device comprises a second body and a filter screen, and the filter screen is arranged outside the second body.

[0011] According to another embodiment of the present application, the second body is a cylinder, and a plurality of second through holes are formed on the surface of the second body.

[0012] According to another embodiment of the present application, the pore size of the filter screen is smaller than the pore size of the second through hole.

[0013] According to another embodiment of the present application, the pore size of the second through hole is 0.5-2 cm.

[0014] According to another embodiment of the present application, a pressure pump is further arranged, and the pressure pump is used to transport the polishing liquid through the liquid return pipe to the polishing area.

[0015] Compared with the prior art, the present application has the following beneficial effects:

[0016] The polishing equipment disclosed by the present application comprises a polishing body and a polishing liquid recovery barrel, the polishing body is provided with a polishing area, the bottom of the polishing area is provided with a liquid outlet pipe, the liquid outlet pipe is connected to the polishing liquid recovery barrel, the polishing liquid recovery barrel is provided with a first filtering device at the connection position of the liquid outlet pipe, the bottom of the polishing liquid recovery barrel is provided with a liquid return pipe which is communicated with the polishing area, and the liquid return pipe is provided with a second filtering device, so that the first filtering device and the second filtering device are arranged on the liquid inlet pipe and the liquid outlet pipe of the polishing liquid recovery barrel respectively, the polishing liquid entering the polishing liquid recovery barrel is ensured to be free of foreign matters such as broken glass and large polishing liquid agglomerates, the second filtering device ensures that the polishing liquid re-entering the processing circulation is free of small impurity foreign matters, and the cleanliness of the polishing liquid re-entering the processing circulation is ensured.

[0017] Additional aspects and advantages of the present application will be set forth in part in the following description, and in part will become apparent to those skilled in the art upon examination of the following description, or can be learned by practice of the application. BRIEF DESCRIPTION OF DRAWINGS

[0018] The drawings are merely schematic and are non-limiting. It is further understood that the same reference numerals and characters can be used throughout the figures and that nomenclature similar to that used for similar objects can be used throughout.

[0019] Figure 1 A cross-sectional schematic view of an embodiment provided for the present application;

[0020] Figure 2 Another cross-sectional schematic view of an embodiment provided for the present application;

[0021] Figure 3 A flowchart schematic view of another embodiment provided for the present application;

[0022] The meanings of the reference signs marked in the figures are:

[0023] 100, polishing apparatus; 110, polishing main body; 111, polishing area;

[0024] 112, liquid outlet pipe; 113, liquid return pipe;

[0025] 120, polishing liquid recovery bucket;

[0026] 130, first filtering device; 131, first main body; 1311, base; 1312, filtering body;

[0027] 132, first through hole;

[0028] 140, second filtering device; 141, second main body; 142, filtering screen; 143, second through hole;

[0029] 150, pressurizing pump. DETAILED DESCRIPTION

[0030] Embodiments of the present application will be described in detail below, examples of which are shown in the drawings, wherein the same or similar reference signs represent the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by reference to the drawings are exemplary and are only used to explain the present application and cannot be understood as limiting the present application.

[0031] In the description of the present application, it is understood that the features limited as "first", "second" can explicitly or implicitly include one or more of the features. In the description of the present application, unless otherwise specified, the meaning of "a plurality of" is two or more.

[0032] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0033] To illustrate the polishing equipment provided in this application, the following detailed description is provided in conjunction with the accompanying drawings and textual descriptions of the embodiments.

[0034] The following is for reference. Figures 1-3 The polishing apparatus 100 according to an embodiment of the present utility model is described as follows: Figure 1 As shown, the polishing equipment 100 includes a polishing body 110 and a polishing liquid recovery tank 120 connected to the polishing body 110. Specifically, the polishing body 110 is provided with a polishing zone 111 for polishing glass substrates, etc. Further, a liquid outlet pipe 112 is provided at the bottom of the polishing zone 111 for discharging the polishing liquid after polishing. Further, the outlet of the liquid outlet pipe 112 is connected to the polishing liquid recovery tank 120, that is, the polishing liquid after polishing can flow into the polishing liquid recovery tank 120 through the liquid outlet pipe 112. Further, the polishing liquid recovery tank 120 and the liquid outlet pipe 112 are connected... A first filter device 130 is installed at the connection point 12 to perform a first filtration of the polishing fluid flowing in through the outlet pipe 112. Further, a return pipe 113, connected to the polishing zone 111, is installed at the bottom of the polishing fluid recovery tank 120. The return pipe 113 is used to return the treated polishing fluid to the polishing zone 111 for reuse. Specifically, a second filter device 140 is installed on the return pipe 113 to perform a second filtration of the polishing fluid flowing out through the return pipe 113. The second filter device 140 can filter finer impurities than the first filter device 130. Therefore, by installing the first filter device 130 and the second filter device 140 on the inlet and outlet pipes 112 of the polishing fluid recovery tank 120 respectively, it can be ensured that the polishing fluid entering the polishing fluid recovery tank 120 is free of broken glass and large polishing fluid clumps. The second filter device 140 ensures that the polishing fluid re-entering the processing cycle is free of tiny impurities, thus guaranteeing the cleanliness of the polishing fluid re-entering the processing cycle.

[0035] It should be noted that one or more other filtration devices can be added to the outlet pipe 112 and the return pipe 113 to further enhance the filtration effect.

[0036] According to one embodiment of the present invention, such as Figure 2As shown, the first filtering device 130 comprises a first body 131, and a plurality of first through holes 132 are formed in the surface of the first body 131, and it can be understood that the polished polishing liquid can be filtered through the plurality of first through holes 132 in the surface of the first body 131 and then flow into the polishing liquid recovery barrel 120.

[0037] According to an embodiment of the present application, as shown in Figure 2 As shown, the diameter of the first through hole 132 is 0-0.2 cm, and it can be understood that the plurality of first through holes 132 in the surface of the first body 131 are mainly used to filter larger impurities, therefore, in order to avoid that the first through hole 132 is too small to allow the polishing liquid to flow smoothly, and at the same time, in order to avoid that the first through hole 132 is too large to have a poor filtering effect, the diameter of the first through hole 132 is preferably 0.1 cm.

[0038] According to an embodiment of the present application, as shown in Figure 2 As shown, the first body 131 comprises a base 1311, and a cylindrical filter body 1312 is arranged on the base 1311, and a plurality of first through holes 132 are arranged on the surface of the filter body 1312, and it can be understood that the base 1311 is used to cooperate with the polishing liquid recovery barrel 120, so as to install the first filtering device 130 on the polishing liquid recovery barrel 120, and the filter body 1312 is provided with a plurality of first through holes 132, which can filter the polishing liquid, and further, the filter body 1312 can be uniformly provided with a plurality of first through holes 132, so that the filter body 1312 has the same filtering effect on different surfaces.

[0039] According to an embodiment of the present application, as shown in Figure 2 As shown, the diameter of the filter body 1312 is 5-10 cm, and the height of the filter body 1312 is 10-20 cm, preferably, the diameter of the filter body 1312 is 7.5 cm, and the height of the filter body 1312 is 12 cm, at this time, the filtering effect can be considered, and at the same time, the area occupied by the filter body 1312 is avoided to be too large.

[0040] According to an embodiment of the present application, as shown in Figure 3 As shown, the second filtering device 140 comprises a second body 141 and a filter screen 142, and the filter screen 142 is arranged outside the second body 141, and specifically, the filter screen 142 is used to intercept smaller impurities, and the second body 141 can be made of stainless steel or the like, and the softer filter screen 142 is arranged outside the second body 141, so as to ensure the filtering effect while considering the strength of the second filtering device 140 as a whole.

[0041] According to an embodiment of the present application, as shown in Figure 3As shown, the second body 141 is a cylinder, and the surface of the second body 141 is provided with a plurality of second through holes 143, further, the plurality of second through holes 143 are uniformly arranged on the surface of the second body 141, so that the second body 141 has the same filtering effect on different surfaces.

[0042] According to an embodiment of the present application, as shown in Figure 3 As shown, the pore size of the filter screen 142 is smaller than that of the second through hole 143, and it can be understood that the filter screen 142 is used to intercept smaller impurities, so the pore size of the filter screen 142 needs to be set to be smaller than that of the second through hole 143, so as to ensure the overall filtering effect.

[0043] According to an embodiment of the present application, as shown in Figure 3 As shown, the pore size of the second through hole 143 is 0.5-2cm, and it can be understood that the pore size of the second through hole 143 can be set in the above range, so that the polishing liquid can smoothly pass through the second body 141 and contact the filter screen 142, thereby performing secondary filtering.

[0044] According to an embodiment of the present application, as shown in Figure 1 As shown, it further comprises a pressure pump 150, and the pressure pump 150 is used to transport the polishing liquid passing through the liquid return pipe 113 to the polishing area 111.

[0045] The above is the preferred embodiment of the polishing equipment provided by the present application, and cannot be understood as the limitation of the protection scope of the present application, and those skilled in the art should know that various improvements or replacements can be made without departing from the concept of the present application, all improvements or replacements should be within the protection scope of the present application, that is, the protection scope of the present application should be subject to the claims.

[0046] In the case of no conflict, the above-mentioned embodiments and features in the embodiments can be combined with each other.

Claims

1. A polishing apparatus characterized by comprising: The utility model relates to a polishing device, comprising: a polishing body, wherein a polishing area is arranged on the polishing body, and a liquid outlet pipe is arranged at the bottom of the polishing area; a polishing liquid recovery bucket, wherein the liquid outlet pipe is connected to the polishing liquid recovery bucket, a first filtering device is arranged at the connection between the polishing liquid recovery bucket and the liquid outlet pipe, a liquid return pipe is arranged at the bottom of the polishing liquid recovery bucket and communicates with the polishing area, and a second filtering device is arranged on the liquid return pipe.

2. The polishing apparatus of claim 1, wherein The first filtering device comprises a first body, and a plurality of through holes are arranged on the surface of the first body.

3. The polishing apparatus of claim 2, wherein The diameter of the through hole is 0-0.2 cm.

4. The polishing apparatus of claim 2, wherein The first body comprises a base, and a cylindrical filter body is arranged on the base, wherein a plurality of first through holes are arranged on the surface of the filter body.

5. The polishing apparatus of claim 4, wherein The diameter of the filter body is 5-10 cm, and the height of the filter body is 10-20 cm.

6. The polishing apparatus of claim 1, wherein The second filtering device comprises a second body and a filter screen, and the filter screen is arranged outside the second body.

7. The polishing apparatus of claim 6 wherein, The second body is a cylinder, and a plurality of second through holes are arranged on the surface of the second body.

8. The polishing apparatus of claim 7 wherein, The pore size of the filter screen is smaller than the pore size of the second through hole.

9. The polishing apparatus of claim 8 wherein, The pore size of the second through hole is 0.5-2 cm.

10. The polishing apparatus of claim 1, wherein A pressurizing pump is further arranged, and the pressurizing pump is used to transport the polishing liquid in the liquid return pipe to the polishing area.

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