Novel magnetron sputtering target material thickness detection equipment

Abstract

The utility model belongs to the technical field of semiconductor coating equipment, and particularly relates to novel magnetron sputtering target material thickness detection equipment which comprises a main chamber, a back plate, a left baffle and a right baffle are arranged in the main chamber, a track transmission part, a guide rail and an infrared distance measuring sensor are arranged in a sputtering equipment process cavity, and the track transmission part drives the guide rail to move. The infrared distance measuring sensor moves along the guide rail to linearly measure the distance from the infrared distance measuring sensor to the surface of the target material, and then the residual thickness of the target material is calculated, so that the real-time monitoring of the thickness of the target material is realized, and the replacement time of the target material is accurately determined; compared with the prior art, the measuring precision and the production efficiency of the machine are improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to semiconductor coating equipment technical field more specifically, it relates to a novel magnetron sputtering target material thickness detection equipment. BACKGROUND

[0002] As an important component of semiconductor coating equipment, the stability and efficiency of magnetron sputtering equipment directly affect the quality and production efficiency of semiconductor products, however, in the actual production process, magnetron sputtering machine still faces many technical problems, among which the vacuum measurement problem of target thickness is particularly prominent.

[0003] In the process of magnetron sputtering coating, the target material will be consumed, and its thickness will gradually decrease. Since the target material is located in the vacuum coating chamber, we cannot directly observe the consumption of the target material. If the replacement time of the target material is not properly grasped, the late replacement will lead to the bombardment of plasma on the equipment, and then cause the damage of the equipment. Early replacement will lead to the waste of target material and increase the production cost.

[0004] At present, the target thickness checking methods commonly used in the industry mainly have two kinds;

[0005] The first method is to estimate the remaining amount of the target material by calculating the product of sputtering power and sputtering time. However, this method is affected by many factors, such as the change of sputtering rate, the difference of target material quality, etc., so its measurement accuracy is often not accurate enough;

[0006] The second method is to directly measure the thickness of the target material by using a vernier caliper and other physical measurement tools. Although this method has high measurement accuracy, since the magnetron sputtering cavity needs to be broken and evacuated, this process takes a long time, which greatly reduces the production efficiency of the machine. Utility model content

[0007] In view of the deficiencies existing in the prior art, the purpose of the utility model is to provide a novel magnetron sputtering target material thickness detection equipment which improves the measurement accuracy and the production efficiency of the machine.

[0008] To achieve the above purpose, the utility model provides the following technical scheme:

[0009] A novel magnetron sputtering target material thickness detection equipment, comprising a main chamber,

[0010] The main chamber is provided with a back plate, a left baffle and a right baffle for placing the target material,

[0011] The back plate, the left baffle and the right baffle are fixed with the inner wall of the main chamber,

[0012] The target material is fixed below the back plate, and the left baffle and the right baffle are placed below the target material,

[0013] The left baffle and the right baffle are symmetrically distributed,

[0014] The main chamber is provided with a track chamber in communication with the main chamber,

[0015] The main chamber and the track chamber are provided with a guide rail and a track transmission member,

[0016] The guide rail is arranged on the track transmission member and is in sliding connection with the track transmission member,

[0017] The guide rail is provided with an infrared distance measuring sensor, the infrared distance measuring sensor is arranged between the left baffle and the right baffle, and the infrared distance measuring sensor is arranged on the guide rail and is in sliding connection with the guide rail.

[0018] The utility model further sets up: the track transmission member includes motor and conveyer belt, and the motor is fixed in the track chamber and its output is connected with the conveyer belt.

[0019] The utility model further sets up: the left baffle and the right baffle all are equipped with extension plate, and the extension plate is arranged between the target material and the guide rail, and the extension plate one side is fixed with the left baffle one side and the right baffle one side respectively.

[0020] By adopting the above technical scheme, the utility model has the beneficial effects that:

[0021] By arranging the track transmission member, the guide rail and the infrared distance measuring sensor in the sputtering equipment process chamber, the track transmission member drives the guide rail to move, the infrared distance measuring sensor moves along the guide rail to measure the distance from the infrared distance measuring sensor to the target material surface in a straight line, and then the remaining thickness of the target material is calculated, the real-time monitoring of the target material thickness is realized, the replacement time of the target material is accurately determined, and therefore the measurement accuracy and the production efficiency of the machine table are improved. BRIEF DESCRIPTION OF DRAWINGS

[0022] Figure 1 It is a schematic view of the utility model embodiment.

[0023] The main chamber 1, the back plate 2, the left baffle 3, the right baffle 4, the track chamber 5, the guide rail 6, the track transmission member 7, the motor 8, the conveyer belt 9, the infrared distance measuring sensor 10, the extension plate 11 and the target material 201 are arranged. DETAILED DESCRIPTION

[0024] The technical scheme in the utility model embodiments will be clearly and completely described below with reference to the drawings in the utility model embodiments. Obviously, the described embodiments are only a part of the embodiments of the utility model, rather than all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of protection of the utility model.

[0025] In the description of the utility model, need understanding is, the terms "upper", "lower", "front", "back", "left", "right", "top", "bottom", "inner", "outer" and so on indicate the orientation or position relation is based on the orientation or position relation shown in the drawing, only for the convenience of describing the utility model and simplifying the description, and not indicate or imply that the indicated device or element must have a particular orientation, construct and operate in a particular orientation, therefore can not be understood as the limitation of the utility model.

[0026] As Figure 1 The novel magnetron sputtering target material thickness detection equipment includes main chamber 1, main chamber 1 is coated, and target material 201 provides vacuum coating environment, places target material 201 on back plate 2 in main chamber 1,

[0027] Track transmission 7 includes motor 8 and conveying belt 9, and motor 8 is fixed in track chamber 5, and the output end thereof is connected with conveying belt 9. Running motor 8, motor 8 drives conveying belt 9, and can drive conveying belt 9 to move,

[0028] Through the movement of conveying belt 9, guide rail 6 can be displaced on conveying belt 9,

[0029] Meanwhile, infrared distance measuring sensor 10 moves along guide rail 6, and the distance between sensor and target material 201 surface is measured, the distance between sensor and target material 201 surface is L1, after measurement is completed, the consumption thickness of target material 201 and the remaining thickness of target material 201 are obtained by calculation, the consumption thickness of target material 201 is ΔL, and the remaining thickness of target material 201 is L2.

[0030] Wherein, the relationship between the consumption thickness of target material 201 and the distance between sensor and target material 201 surface is: ΔL=L1-L0, wherein L0 is the distance between the surface of new target material 201, i.e. target material 201 not used, and infrared distance measuring sensor 10;The relationship between the remaining thickness of target material 201 and the consumption thickness of target material 201 is: L2=L-△L, wherein L is the initial thickness of target material 201.

[0031] Since left baffle 3 and right baffle 4 are installed in main chamber 1, left baffle 3 and right baffle 4 are symmetrically distributed, and infrared distance measuring sensor 10 can be blocked by left baffle 3 and right baffle 4, so that infrared distance measuring sensor 10 will not be transmitted into track chamber 5.

[0032] The left baffle 3 and the right baffle 4 are provided with an extension plate 11, and the left baffle 3 and the extension plate 11 and the right baffle 4 and the extension plate 11 are integrally formed and are in "L" shape, so that the extension plate 11 can protect the infrared distance sensor 10 when the infrared distance sensor 10 is moved to the left baffle 3 and the right baffle 4, and the extension plate 11 on the left baffle 3 and the extension plate 11 on the right baffle 4 do not affect the measurement of the infrared distance sensor 10.

[0033] Working principle: during measurement, the guide rail 6 is moved into the main chamber 1 from the track chamber 5 under the action of the track transmission member 7 until it stops at the connection between the main chamber 1 and the track chamber 5, then the infrared distance sensor 10 moves along the guide rail 6 and measures the distance from the infrared distance sensor 10 to the surface of the target material 201 until it stops at the right baffle 4, after the measurement is completed, the remaining thickness of the target material 201 is calculated, and during non-measurement, the infrared distance sensor 10 moves from the right baffle 4 to the left baffle 3 under the action of the guide rail 6, then the guide rail 6 is moved from the main chamber 1 back to the track chamber 5 under the action of the track transmission member 7, so as to prevent the target material 201 from sputtering onto the infrared distance sensor 10 and the guide rail 6 during coating.

[0034] The above is only the preferred embodiment of the present application, and is not used to limit the present application, and the person skilled in the art can make common changes and replacements within the technical scheme of the present application, which should be included in the protection scope of the present application.

Claims

1. A novel magnetron sputtering target thickness detection device, characterized in that, It comprises a main chamber (1), The main chamber (1) is provided with a back plate (2) for placing the target material (201), a left baffle (3) and a right baffle (4), The back plate (2), the left baffle (3) and the right baffle (4) are fixed with the inner wall of the main chamber (1), The target material (201) is fixed below the back plate (2), and the left baffle (3) and the right baffle (4) are both placed below the target material (201), The left baffle (3) and the right baffle (4) are symmetrically distributed, One side of the main chamber (1) is provided with a track chamber (5) which is in communication with the main chamber (1), A guide rail (6) and a track transmission member (7) are arranged between the main chamber (1) and the track chamber (5), The guide rail (6) is placed on the track transmission member (7) and is in sliding connection with the track transmission member (7), An infrared distance sensor (10) is arranged on the guide rail (6), the infrared distance sensor (10) is placed between the left baffle (3) and the right baffle (4), and the infrared distance sensor (10) is in sliding connection with the guide rail (6).

2. A novel magnetron sputtering target thickness detection device according to claim 1, characterized in that, The track transmission member (7) comprises a motor (8) and a conveying belt (9), the motor (8) is fixed in the track chamber (5), and the output end of the motor (8) is connected with the conveying belt (9).

3. The novel magnetron sputtering target thickness detection device according to claim 1, characterized in that, The left baffle (3) and the right baffle (4) are both provided with an extension plate (11), the extension plate (11) is placed between the target material (201) and the guide rail (6), and one side of the extension plate (11) is fixed with one side of the left baffle (3) and one side of the right baffle (4) respectively.

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