Diaphragm coating device

Abstract

The utility model discloses a diaphragm coating device, and belongs to the field of coating devices. According to the invention, the evaporation source is utilized to evaporate the material in the material groove to form a gaseous material; a gas inlet and a gas outlet which are located in the two ends of a vacuum cavity, and a gas introduction system and a vacuum exhaust system which are communicated with the gas inlet and the gas outlet are utilized, so that a gaseous material can flow in the direction from the gas inlet to the gas outlet; a certain included angle is formed between the gas flow direction and the surface of the diaphragm substrate so as to ensure that the gaseous material is better deposited on the diaphragm substrate; besides, a magnetic field and an electric field are formed in a deposition area of the vacuum chamber by utilizing a magnetic field and electric field control system, so that the gaseous material is migrated and deposited towards the diaphragm matrix arranged on the front surface of the first conveying belt under the combined action of the pressure difference, the magnetic field and the electric field, and the formed coating is uniform in thickness, compact in structure and strong in adhesive force; and the original pore structure of the diaphragm can be maintained.

Description

Technical Field

[0001] This application relates to the field of coating apparatus, and more particularly to a diaphragm coating apparatus. Background Technology

[0002] With the widespread application of lithium-ion batteries in electric vehicles, portable electronic devices, and other fields, the performance requirements for lithium-ion batteries are increasing. As one of the key components of a battery, the performance of the lithium-ion battery separator has a crucial impact on the battery's safety, charge-discharge performance, and cycle life.

[0003] Traditional lithium-ion battery separator coating technologies have several limitations. For example, some chemical coating methods may introduce impurities, affecting the chemical stability of the separator; while some existing physical coating technologies are insufficient in terms of coating uniformity, adhesion, and protection of the separator's pore structure. Furthermore, current coating technologies struggle to impart additional functionality (such as improved thermal stability and enhanced ion conductivity) to the separator while maintaining its basic properties (such as porosity and permeability). Therefore, there is an urgent need to develop a technology that produces a uniform, dense, and strongly adhered coating on the separator while preserving its original pore structure. Summary of the Invention

[0004] Based on the deficiencies of the existing technology, the purpose of this application is to provide a diaphragm coating device that can make the coating formed on the diaphragm uniform in thickness, dense in structure, strong in adhesion, and also maintain the original pore structure of the diaphragm.

[0005] To achieve the above objectives, this application provides a diaphragm coating apparatus, including a vacuum chamber, a material tank, a material evaporation source, a conveyor belt, a gas introduction system, a vacuum exhaust system, and a magnetic field and electric field control system.

[0006] The vacuum chamber includes an air inlet and an air outlet. The air inlet is located at one end of the vacuum chamber and is connected to the gas introduction system, while the air outlet is located at the other end of the vacuum chamber and is connected to the vacuum exhaust system.

[0007] The vacuum chamber includes a deposition area, the conveyor belt includes a first conveyor belt, the material tank and the first conveyor belt are sequentially distributed in the deposition area along the direction from the air inlet to the air outlet, the material tank is located next to the bottom of the front of the first conveyor belt, and the angle θ between the first conveyor belt and the horizontal plane satisfies: 0<θ≤90°;

[0008] The material evaporation source is used to evaporate the material in the material tank;

[0009] The magnetic field and electric field control system is used to generate magnetic and electric fields within the deposition area.

[0010] The diaphragm coating apparatus utilizes the material evaporation source to evaporate the material in the material tank, transforming it from a solid or liquid state into a gaseous state to obtain sufficient energy. A pressure difference is generated using a gas introduction system and a vacuum exhaust system, allowing the gaseous material to flow from the inlet to the outlet. Simultaneously, the first conveyor belt is inclined, ensuring the airflow direction forms a certain angle with the diaphragm substrate surface to guarantee better deposition of the gaseous material onto the substrate. The magnetic and electric field control system generates magnetic and electric fields in the deposition area. The magnetic field guides the trajectory of the gaseous material, resulting in more uniform deposition on the diaphragm substrate surface, while the electric field accelerates deposition and makes the coating denser. Under the combined action of the pressure difference, magnetic field, and electric field, the gaseous material migrates and deposits onto the diaphragm substrate positioned on the front of the first conveyor belt. This results in a coating with uniform thickness, dense structure, strong adhesion, and maintains the original pore structure of the diaphragm.

[0011] The value of θ can be adjusted according to the coating density and thickness. Preferably, θ is 40° to 50°. More preferably, θ is 45°. When θ is 40° to 50°, especially at an angle of 45°, the material can be delivered to the diaphragm surface more effectively, thereby improving the material utilization rate. Furthermore, at this angle, the gas resistance is relatively small, which is conducive to smooth operation within the vacuum chamber.

[0012] Preferably, the vacuum chamber further includes a finished product transport area, and the conveyor belt further includes a second conveyor belt located in the finished product transport area and connected to the top of the first conveyor belt. The diaphragm finished product is transported out of the deposition area via the second conveyor belt.

[0013] Preferably, the second conveyor belt includes a first end and a second end, the first end being connected to the top end of the first conveyor belt, and the position of the first end being no lower than the position of the second end. Setting the position of the first end no lower than the position of the second end prevents gaseous material from depositing on the finished diaphragm. The angle between the second conveyor belt and the horizontal direction can be selected from 0 to 90°, such as 0°, 5°, 10°, 20°, 30°, 40°, 50°, 60°, 70°, 80°, or 90°.

[0014] Preferably, the conveyor belt surface has a texture. The texture on the belt surface prevents the diaphragm from shifting during transport. More preferably, the texture is a dot matrix texture to further prevent the diaphragm from shifting during transport.

[0015] Preferably, the diaphragm coating apparatus further includes rollers and a conveying control system. The rollers support the conveyor belt, and the conveying control system controls the conveying speed of the conveyor belt. The rollers may be made of a high-temperature resistant, low-friction ceramic material.

[0016] Preferably, the system further includes an evaporation source control system for controlling the power of the material evaporation source. By using the power control system, the power of the material evaporation source can be controlled, thereby controlling the evaporation rate of the material.

[0017] Depending on the coating material, a suitable evaporation source can be selected. For example, the material evaporation source can be an electron beam evaporation source or a resistance heating evaporation source. For metal coating materials (such as aluminum, copper, etc.), an electron beam evaporation source can be used, which bombards the material target with a high-energy electron beam to cause it to evaporate instantly; for organic or ceramic coating materials, a resistance heating evaporation source can be used, which uses the heating of a resistance wire to cause the material to evaporate.

[0018] Preferably, the system further includes a heating element located outside the vacuum chamber and a control system for controlling the heating element outside the vacuum chamber. The overall temperature of the vacuum chamber can be controlled using the heating element outside the vacuum chamber and its control system.

[0019] Preferably, the system further includes a mass flow controller for controlling the gas flow rate of the gas introduction system. The mass flow controller controls the gas introduction system to introduce gas at a set flow rate. As needed, the gas introduction system can be used to introduce reactive gases (such as oxygen, nitrogen, etc.) or inert gases (such as argon, helium, etc.) into the vacuum chamber.

[0020] Preferably, the magnetic field and electric field control system includes adjustable magnetic field and electric field generating devices. Using these adjustable devices, the magnetic field strength and electric field strength can be controlled, thereby regulating the deposition of the coating. The magnetic field can be generated by an electromagnetic coil; the electric field can be generated by one or more electrode plates.

[0021] Preferably, the vacuum chamber is provided with an observation window and / or a detection interface. For example, a pressure detection interface, a temperature detection interface, etc., can be provided on the vacuum chamber.

[0022] An observation window and / or detection interface are provided on the vacuum chamber to monitor the deposition process.

[0023] Compared with the prior art, the beneficial effects of this application are as follows: This application uses an evaporation source to evaporate the material in the material tank to form a gaseous material; by using the air inlet and air outlet located at both ends of the vacuum chamber, as well as the gas introduction system and vacuum exhaust system connected to them respectively, the gaseous material can flow in the direction from the air inlet to the air outlet. At the same time, the first conveyor belt is set at an angle so that the airflow direction is at a certain angle with the surface of the diaphragm substrate to ensure that the gaseous material is better deposited on the diaphragm substrate; in addition, a magnetic field and electric field control system is used to form a magnetic field and an electric field in the deposition area of ​​the vacuum chamber, so that the gaseous material migrates and deposits on the diaphragm substrate placed on the front of the first conveyor belt under the combined action of pressure difference, magnetic field and electric field. The resulting coating has a uniform thickness, dense structure, strong adhesion, and can also maintain the original pore structure of the diaphragm. Attached Figure Description

[0024] Figure 1 This is a schematic diagram of the diaphragm coating device in the embodiments of this application;

[0025] Figure 2 This is a schematic diagram of the surface structure of the conveyor belt in one embodiment of this application;

[0026] Among them, 1-vacuum chamber, 11-air inlet, 12-air outlet, 2-material tank, 3-conveyor belt, 31-first conveyor belt, 32-second conveyor belt, 33-third conveyor belt, 4-gas introduction system, 5-vacuum exhaust system, 6-first control system, 7-second control system, 8-roller, 9-heating component. Detailed Implementation

[0027] To better illustrate the purpose, technical solution, and advantages of this application, the following description, in conjunction with specific embodiments and comparative examples, aims to provide a detailed understanding of the content of this application, rather than to limit its scope. All other embodiments obtained by those skilled in the art without inventive effort are within the protection scope of this application.

[0028] Reference Figure 1 This embodiment provides a diaphragm coating device, which includes a vacuum chamber 1, a material tank 2, a material evaporation source (not shown in the figure), a conveyor belt 3, a gas introduction system 4, a vacuum exhaust system 5, a first control system 6, and a second control system 7.

[0029] The vacuum chamber 1 includes an air inlet 11 and an air outlet 12. The air inlet 11 is located at one end of the vacuum chamber 1 and is connected to the gas introduction system 4. The air outlet 12 is located at the other end of the vacuum chamber 1 and is connected to the vacuum exhaust system 5.

[0030] Vacuum chamber 1 includes a deposition area, conveyor belt 3 includes a first conveyor belt 31, material tank 2 and conveyor belt 31 are distributed sequentially in the deposition area of ​​vacuum chamber 1 along the direction from air inlet 11 to air outlet 12, material tank 2 is located next to the bottom of the front of the first conveyor belt 31, and the angle θ between the first conveyor belt 31 and the horizontal plane satisfies: 0 < θ < 90°.

[0031] The material evaporation source is used to evaporate the material in material tank 2;

[0032] The first control system 6 includes a magnetic field and electric field control system, which is used to generate magnetic and electric fields in the deposition area of ​​the vacuum chamber 1.

[0033] The aforementioned diaphragm coating apparatus utilizes a material evaporation source to evaporate the material in the material tank 2, transforming it from a solid or liquid state into a gaseous state to obtain sufficient energy. A pressure difference is generated using the gas introduction system 4 and the vacuum exhaust system 5, allowing the gaseous material to flow along the direction from the inlet 11 to the outlet 12. Simultaneously, the first conveyor belt 31 is inclined, ensuring that the airflow direction forms a certain angle with the diaphragm substrate surface placed on the first conveyor belt 31, thus ensuring better deposition of the gaseous material onto the diaphragm substrate. A magnetic field and electric field control system can generate magnetic and electric fields within the deposition area of ​​the vacuum chamber 1. The magnetic field guides the trajectory of the gaseous material, allowing it to be deposited more uniformly on the diaphragm substrate surface, while the electric field accelerates the deposition of the gaseous material onto the diaphragm substrate surface and makes the coating denser. Under the combined action of the pressure difference, magnetic field, and electric field, the gaseous material migrates and deposits onto the diaphragm substrate placed on the front of the first conveyor belt 31. This results in a coating with uniform thickness, dense structure, strong adhesion, and maintains the original pore structure of the diaphragm.

[0034] The angle θ between the first conveyor belt 31 and the horizontal plane can be selected as 5°, 10°, 20°, 30°, 40°, 50°, 60°, 70°, 80°, or 90°, etc. The value of θ can be adjusted according to the coating surface density and thickness. The larger θ is, the greater the coating surface density and thickness. Preferably, θ is 40° to 50°. More preferably, θ is 45°.

[0035] The vacuum chamber 1 also includes a finished product transport area, and the conveyor belt 3 includes a second conveyor belt 32 and a third conveyor belt 33. The second conveyor belt is located in the finished product transport area of ​​the vacuum chamber 1 and is connected to the top of the first conveyor belt 31. The diaphragm finished product is transported out of the deposition area via the second conveyor belt 32.

[0036] The second conveyor belt 32 includes a first end and a second end, wherein the first end is connected to the top end of the first conveyor belt 31, and the position of the first end is not lower than the position of the second end, so as to avoid gaseous material from depositing on the finished diaphragm. The angle between the second conveyor belt 32 and the horizontal direction can be selected from 0 to 90°, such as 0°, 5°, 10°, 20°, 30°, 40°, 50°, 60°, 70°, 80° or 90°, etc.

[0037] The third conveyor belt 33 can be set horizontally or at an angle. When it is set at an angle, there is no limit to the angle of inclination from the horizontal direction.

[0038] The surface of conveyor belt 3 has a texture, for example, it can be selected as such. Figure 2 The dot matrix texture shown.

[0039] The aforementioned diaphragm coating apparatus also includes rollers 8, which support the conveyor belt 3 for transport; the first control system 6 includes a conveying control system, which controls the conveying speed of the conveyor belt 3. The rollers 8 can be made of high-temperature resistant, low-friction ceramic materials.

[0040] The first control system 6 includes an evaporation source control system, which controls the power of the material evaporation source, thereby controlling the evaporation rate of the material. A suitable evaporation source can be selected based on the coating material. For metal coating materials (such as aluminum, copper, etc.), an electron beam evaporation source can be used, where a high-energy electron beam bombards the material target, causing it to evaporate instantaneously. For organic or ceramic coating materials, a resistance heating evaporation source can be used, where the resistance wire heats the material to cause evaporation.

[0041] A vacuum chamber 1 extends through a first control system 6, which includes a heating element 9 and a control system for controlling the heating element 9. The heating element 9 is located outside the vacuum chamber 1, for example, below the vacuum chamber 1. The control system for controlling the heating element 9 can control the overall temperature of the vacuum chamber 1.

[0042] The second control system 7 is a mass flow controller, which is used to control the gas flow rate of the gas introduction system 4. The second control system 7 controls the gas introduction system 4 to introduce gas into the vacuum chamber 1 according to the set gas flow rate. As needed, the gas introduction system 4 can be used to introduce reactive gases (such as oxygen, nitrogen, etc.) or inert gases (such as argon, helium, etc.) into the vacuum chamber 1.

[0043] The aforementioned magnetic and electric field control system includes adjustable magnetic and electric field generating devices. These devices allow for control of the magnetic and electric field strengths, thereby regulating the deposition of the coating. The magnetic field can be generated by an electromagnetic coil; the electric field can be generated by one or more electrode plates.

[0044] The vacuum chamber 1 is equipped with an observation window and detection interfaces to monitor the deposition process. The detection interfaces include pressure detection interfaces and temperature detection interfaces.

[0045] The wall material of vacuum chamber 1 can be made of high-strength, low-outgassing stainless steel to ensure the stability of the internal high vacuum environment.

[0046] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this application and are not intended to limit the scope of protection of this application. Although this application has been described in detail with reference to preferred embodiments, those skilled in the art should understand that modifications or equivalent substitutions can be made to the technical solutions of this application without departing from the substance and scope of the technical solutions of this application.

Claims

1. A diaphragm coating apparatus characterized by, The vacuum chamber, the material tank, the material evaporation source, the conveying belt, the gas introduction system, the vacuum exhaust system, and the magnetic field and electric field control system; The vacuum chamber comprises an air inlet and an air outlet, the air inlet is located at one end of the vacuum chamber and communicates with the gas introduction system, and the air outlet is located at the other end of the vacuum chamber and communicates with the vacuum exhaust system; The vacuum chamber comprises a deposition area, the conveying belt comprises a first conveying belt, and the material tank and the first conveying belt are sequentially arranged in the deposition area along the direction from the air inlet to the air outlet, the material tank is located at the bottom of the front of the first conveying belt, and the included angle θ between the first conveying belt and the horizontal plane satisfies 0 < θ ≤ 90°. The material evaporation source is used for evaporating the material in the material tank. The magnetic field and electric field control system is used for forming a magnetic field and an electric field in the deposition area.

2. The diaphragm coating apparatus of claim 1, wherein The θ is 40°-50°.

3. The diaphragm coating apparatus of claim 1, wherein The vacuum chamber further comprises a finished product conveying area, and the conveying belt further comprises a second conveying belt, the second conveying belt is located in the finished product conveying area and is connected with the top end of the first conveying belt.

4. The diaphragm coating apparatus of claim 3, wherein The second conveying belt comprises a first end and a second end, the first end is connected with the top end of the first conveying belt, and the position of the first end is not lower than the position of the second end.

5. The diaphragm coating apparatus of claim 1, wherein The conveying belt surface has a texture, and the texture is a dot array texture.

6. The diaphragm coating apparatus of claim 1, wherein Further comprising a roller and a conveying control system, the roller is used for supporting the conveying of the conveying belt, and the conveying control system can control the conveying speed of the conveying belt.

7. The diaphragm coating apparatus of claim 1, wherein Further comprising an evaporation source control system, the evaporation source control system is used for controlling the power of the material evaporation source; the material evaporation source is an electron beam evaporation source or a resistance heating evaporation source.

8. The diaphragm coating apparatus of claim 1, wherein, Further comprising a heating component outside the vacuum chamber and a control system for controlling the heating component outside the vacuum chamber.

9. The diaphragm coating apparatus of claim 1, wherein, Further comprising a mass flow controller, the mass flow controller is used for controlling the gas flow of the gas introduction system.

10. The diaphragm coating apparatus of claim 1, wherein The magnetic field and electric field control system comprises adjustable magnetic field and electric field generating devices; and / or The vacuum chamber is provided with an observation window and / or a detection interface.

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