Exposure surface dose correction system

Abstract

The utility model discloses an exposure surface dose correction system, and relates to the technical field of photoetching equipment. The device specifically comprises a detection device, a first detector and a second detector, wherein the detection device is used for receiving and adjusting laser emitted by light source equipment; the first detector is installed on one side of the detection device and receives laser emitted by the detection device, and the laser is converted into an electric signal transmitted to the controller through photoelectric conversion. And the second detector is arranged at the periphery of the exposure surface, detects the laser emitted by the light source equipment and irradiated to the exposure surface through the lens, and photoelectrically converts the laser into an electric signal transmitted to the controller. The first detector measures the energy of the light source equipment, the second detector obtains the energy of the exposure surface, the energy of the first detector and the energy of the second detector form a closed loop through the controller, the second detector in the correctable light path can directly represent the energy of the exposure surface, the measurement precision of the exposure surface dose is improved, and the measurement accuracy is improved. And a mode of going deep into the detector is not needed.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of photoetching equipment, especially relates to an exposure surface dose correction system. BACKGROUND

[0002] In photoetching equipment, in order to improve the line width uniformity between exposure areas and inside the exposure area, different exposure doses need to be used for different plate thicknesses, line widths or photoetching glue, so the exposure surface dose must be accurately measured.

[0003] In the prior art, such as a direct writing photoetching equipment, the laser of the exposure focal plane passes through a digital micro-mirror DMD and numerous optical lenses, so even if the laser output does not change, it is difficult to ensure that the light energy of the exposure surface is unchanged; secondly, the direct writing photoetching usually works simultaneously by multiple exposure lenses, and the fluctuation conditions of each laser are not completely consistent, in order to ensure the exposure surface dose of each laser, the device needs to be opened and the probe is inserted inward, this process not only affects the overall environmental control, but also the probe is easily contacted with the device, and errors are easily caused due to the different angles and positions of the probe, high-precision calibration cannot be achieved, and errors of the angle and placement position of the device are caused.

[0004] Therefore, the present application solves the problem that the probe needs to be inserted into the device when the photoetching equipment is calibrated, which reduces the calibration precision and affects the environmental control of the photoetching equipment. UTILITY MODEL CONTENTS

[0005] The main purpose of the utility model is to provide an exposure surface dose correction system, which aims to improve the measurement precision of the exposure surface dose, ensure the correction effect of the exposure surface dose, and avoid affecting the environmental control of the photoetching equipment.

[0006] In order to achieve the above purpose, the utility model provides an exposure surface dose correction system, which comprises:

[0007] A detection device is used for receiving and adjusting the laser emitted by the light source equipment;

[0008] A first probe is installed on one side of the detection device and is used for receiving the laser emitted by the detection device and converting it into an electric signal;

[0009] A second probe is arranged on the periphery of the exposure surface, detects the laser emitted by the light source equipment and reflected to the exposure surface through the lens, and converts it into an electric signal; and

[0010] A controller receives the electric signals from the first probe and the second probe, generates a dose correction instruction according to the electric signals, and controls the exposure process.

[0011] Further, the electric signals of the first detector and the second detector are transmitted to the controller through a signal amplification module and / or a filter module.

[0012] Further, a beam splitter is mounted on the rack, and the laser emitted by the light source device is transmitted to the detection device through the beam splitter.

[0013] Further, the detection device comprises a fixing member connected to the rack, a focusing member and a light shielding member arranged in sequence on the fixing member and facing the first detector.

[0014] Further, the fixing member comprises a flange fixed on the rack, a first lens arranged on a light transmission part of the flange, and a first gasket for fixing the first lens on the flange, and a light homogenizer is further mounted on the end of the flange away from the first lens.

[0015] Further, the focusing member comprises a fixing structure and a light shielding structure connected in sequence, the fixing structure is detachably connected to the fixing member, and the fixing structure is further provided with a second lens at the end close to the light shielding structure.

[0016] Further, the outer wall of the light shielding structure is provided with an observation opening arranged in a circumferential direction.

[0017] Further, the inner wall of the light shielding member is provided with a positioning structure, and the outer wall of the light shielding structure is provided with a limiting groove matched with the positioning structure.

[0018] Further, the inner wall of the first detector is provided with a detection member for receiving the laser from the detection device.

[0019] Further, the detection member is a detection board card.

[0020] The above technical scheme has the following advantages:

[0021] The laser emitted by the light source device is transmitted to the first detector from the lens and the detection device, another path of the light source device is irradiated to the exposure surface through the lens, the first detector measures the energy of the light source device, the second detector obtains the energy of the exposure surface, and the energy of the first detector and the energy of the second detector are adjusted by the controller to adjust the fitting relationship therebetween, the second detector in the corrected light path can directly represent the energy of the exposure surface, the measurement precision of the exposure surface dose is improved, the correction effect of the exposure surface dose is ensured, and the deep detector is not needed, so that the influence on the environment control of the photoetching equipment is avoided. BRIEF DESCRIPTION OF DRAWINGS

[0022] The utility model will be combined with specific embodiment and drawing to carry out detailed explanation, wherein:

[0023] Figure 1 is a structural schematic view of the utility model;

[0024] Figure 2 is a structural view of the utility model detection device;

[0025] Figure 3 is a structural view of the utility model fixing member;

[0026] Figure 4 is a structural view of the utility model focusing member;

[0027] Figure 5 is a structural view of the utility model light shielding member;

[0028] Figure 6 is a structural view of the utility model first detector;

[0029] Figure 7 is a flow chart of the utility model exposure light source equipment.

[0030] In the figure: 1, first detector; 11, detection member; 2, detection device; 201, fixing member; 2011, flange; 2012, first gasket; 2013, lens one; 2014, second gasket; 2015, homogenizing mirror; 202, focusing member; 2021, positioning pin; 2022, third gasket; 2023, lens two; 2024, observation port; 2025, limiting groove; 2026, fixing structure; 2027, light shielding structure; 203, light shielding member; 2031, positioning structure; 3, beam splitter; 4, rack; 5, exposure surface; 6, second detector. DETAILED DESCRIPTION

[0031] In order to make the purpose, technical scheme and advantages of the utility model more clear, the following will make a detailed description of the utility model by combining with the drawings and examples. It should be understood that the following specific examples are only used to explain the utility model, and do not constitute limitation to the utility model.

[0032] On the exposure light source, unlike the mercury lamp used by the traditional mask photoetching equipment, the direct writing photoetching equipment uses continuous laser. In the exposure strip variation process of point exposure, the laser needs to switch out the light power constantly, leading to the increase of laser power fluctuation noise. With the continuous improvement of process requirements, the influence of the exposure dose variation caused by laser power fluctuation on the actual exposure effect is gradually increasing. In addition, the direct writing photoetching equipment generally selects multiple exposure light paths to work simultaneously in order to improve the production capacity. With the increase of the number of lasers, the laser light power fluctuation noise is further increased, and the error of the whole exposure system is also multiplied.

[0033] As Figure 1 and Figure 7As shown, an exposure surface dose correction system includes a detection device 2, a first detector 1, a second detector 6, and a controller. The detection device 2 is used to receive and adjust the laser emitted by the light source device. The first detector 1 is installed on one side of the detection device 2 to receive the laser emitted by the detection device 2 and convert it into an electrical signal, which is then transmitted to the controller. The second detector 6 is disposed around the exposure surface 5 to detect the laser emitted by the light source device and reflected onto the exposure surface 5 by a lens, and converts it into an electrical signal, which is then transmitted to the controller. The controller receives the electrical signals from the first detector 1 and the second detector 6, and generates a dose correction command based on the electrical signals to control the exposure process. Specifically, the controller receives and adjusts the fitting relationship between the electrical signals of the first detector 1 and the second detector 6. The controller can be a photodetector controller, such as a Femto ultrafast light receiver.

[0034] like Figure 1 As shown, specifically, the exposure light source emits a laser, which is redirected by a lens and then illuminates the detection device 2. The detection device 2 receives the laser from the lens, focuses it, and aligns it with the photosensitive surface of the first detector 1, greatly improving the accuracy of the first detector 1's measurement. The laser is then converted into an electrical signal and transmitted to the controller for reception and processing. The second detector 6 is installed at the exposure surface 5 and can directly monitor the energy of the exposure surface 5. The laser reaching the exposure surface 5 also passes through a digital micromirror (DMD) and numerous optical lenses. The transmittance of these optical devices may drift due to factors such as time and temperature. The second detector 6 periodically calibrates the optical path to the exposure surface 5. Each time it calibrates, the second detector 6 automatically moves to the vicinity of the focal plane of the optical path to be calibrated, and then initiates automatic focusing. The DMD then projects a full white image and sets the laser power. The first detector 1 and the second detector 6 simultaneously collect data and output it to the controller. The relationship between the output values ​​of the first detector 1 and the second detector 6 is obtained by fitting the data in the controller as follows:

[0035] X1 = K * X2 + b

[0036] Where X1 is the output value of the first detector 1, X2 is the output value of the second detector 6, and K and b are coefficients. The controller will automatically correct the scaling factor of the first detector 1 and the second detector 6. The detector in the corrected optical path can directly characterize the energy of the exposure surface 5.

[0037] To further realize automatic correction of exposure surface 5 energy and provide accurate data, the controller is mainly used to adjust the driving value of the laser in real time according to the output value of the first detector 1 and the output value of the second detector 6. After receiving the start exposure instruction, the upper computer generates the laser driving value according to the exposure dose, platform moving speed and other parameters, the first detector 1 starts to monitor the laser energy at the detection device 2 and outputs to the controller, the controller judges whether the exposure surface 5 dose fluctuates with the set dose at the start of exposure according to the input detection value, if it fluctuates, the laser driving value is adjusted according to the fluctuation size; if there is no fluctuation, it is judged whether the exposure is finished, if the exposure is finished, the collection is stopped, if not, it is returned to the above collection and judgment.

[0038] As shown in Figure 1 , in order to further improve the transmission effect of the electric signal, the electric signal of the first detector 1 and the second detector 6 is transmitted to the controller through the signal amplification module and / or the filtering module, after the photocurrent enters the first detector 1, it is processed through cross-group amplification, adaptive amplification and filtering, and then transmitted to the controller after the processing is completed, so as to improve the overall signal stability.

[0039] As shown in Figure 1 and Figure 7 , the lens includes a beam splitter 3 mounted on the rack 4, and the laser emitted by the light source device is emitted to the detection device 2 through the beam splitter 3, and the lens can be divided into a digital micromirror DMD and a plurality of optical lenses to ensure the overall laser reversing.

[0040] As shown in Figure 1 and Figure 2 , the detection device 2 includes a fixing member 201 connected to the rack 4 and a focusing member 202 and a light shielding member 203 arranged in sequence on the fixing member 201 facing the first detector 1, and the rack 4 is the main body for placing the first detector 1, the exposure light source device and a plurality of lenses, specifically:

[0041] As shown in Figure 2 and Figure 3 , the fixing member 201 includes a flange 2011 fixed on the rack 4, a lens one 2013 arranged on the light transmission part of the flange 2011 and a first gasket 2012 for fixing the lens one 2013 on the flange 2011, and the end of the flange 2011 away from the lens one 2013 is also provided with a light homogenizing mirror 2015, wherein the flange 2011 is fixed and tightened with the rack 4 through bolts to complete the installation, the lens one 2013 is installed on one end of the flange 2011 through the first gasket 2012, and the light homogenizing mirror 2015 is installed on the other end of the flange 2011 through the second gasket 2014, preferably the flange 2011 is provided with a stepped hole matched with the second gasket 2014 at the light homogenizing mirror 2015, and the second gasket 2014 is installed in the stepped hole.

[0042] AsFigure 2 And Figure 4 As shown in

[0043] As shown in Figure 4 The outer wall of the light shielding structure 2027 is provided with an observation port 2024 arranged in the circumferential direction, and the observation port 2024 is used for observing the state of the laser focusing on the first detector 1.

[0044] As shown in Figure 1 And Figure 5 The inner wall of the light shielding member 203 is provided with a positioning structure 2031, and the outer wall of the light shielding structure 2027 is provided with a limiting groove 2025 matched with the positioning structure 2031, wherein the positioning mechanism includes a convex strip, a convex or a convex block arranged on the inner wall of the light shielding member 203, when the light shielding member 203 moves to the light shielding structure 2027, the positioning mechanism and the limiting groove 2025 can stabilize the overall movement position, and the observation port 2024 is opened or closed in a sliding manner, so as to avoid the interference of external light source.

[0045] As shown in Figure 1 And Figure 6 The inner wall of the first detector 1 is provided with a detection member 11 for receiving laser from the detection device 2, and the detection member 11 is a detection board card, wherein the inner wall of the first detector 1 is fixedly installed by bolts, and the first detector 1 is composed of a silicon photodiode and a self-developed control board card. After the silicon photodiode receives the laser emitted from the detection device 2, photoelectric conversion is carried out to generate photoelectric current, and after the photoelectric current enters the control board card, cross-group amplification, adaptive amplification and filtering signal processing are carried out, and after the processing is completed, it is transmitted to the light detector controller, and the collected laser energy is detected.

[0046] The above merely describes preferred embodiments of the present application, and is not intended to limit the patent scope of the present application, and any equivalent structural transformation or direct / indirect application in other related technical fields under the inventive concept of the present application, as described in the present application specification and drawings, is included in the patent protection scope of the present application.

Claims

1. An exposure field dose correction system characterized by comprising: The application relates to a laser exposure device, which comprises the following parts: a detection device (2) for receiving and adjusting laser emitted by a light source device; a first detector (1) installed on one side of the detection device (2) for receiving the laser emitted by the detection device (2) and converting the laser into an electric signal; a second detector (6) arranged on the periphery of an exposure surface (5) for detecting the laser emitted by the light source device and reflected to the exposure surface (5) through a lens and converting the laser into an electric signal; and a controller for receiving the electric signals from the first detector (1) and the second detector (6) and generating a dose correction instruction according to the electric signals to control the exposure process. The electric signals of the first detector (1) and the second detector (6) are transmitted to the controller through a signal amplification module and / or a filtering module.

2. The exposure dose correction system of claim 1, wherein The laser emitted by the light source device is shot to the detection device (2) through a beam splitter (3) installed on a rack (4).

3. The exposure dose correction system of claim 1, wherein The detection device (2) comprises a fixing member (201) connected to the rack (4) and a focusing member (202) and a light shielding member (203) arranged on the fixing member (201) in sequence and facing the first detector (1).

4. The exposure dose correction system of claim 3, wherein The fixing member (201) comprises a flange (2011) fixed on the rack (4), a first lens (2013) arranged on a light transmission part of the flange (2011) and a first gasket (2012) for fixing the first lens (2013) on the flange (2011), and a light homogenizing mirror (2015) is further installed on the end of the flange (2011) away from the first lens (2013).

5. The exposure dose correction system of claim 4, wherein The focusing member (202) comprises a fixing structure (2026) and a light shielding structure (2027) connected in sequence, the fixing structure (2026) is detachably connected to the fixing member (201), and a second lens (2023) is further installed on the end of the fixing structure (2026) close to the light shielding structure (2027).

6. The exposure dose correction system of claim 4, wherein An observation opening (2024) is arranged on the outer wall of the light shielding structure (2027) in a circumferential direction.

7. The exposure dose correction system of claim 6, wherein A positioning structure (2031) is arranged on the inner wall of the light shielding member (203), and a limiting groove (2025) matched with the positioning structure (2031) is arranged on the outer wall of the light shielding structure (2027).

8. The exposure dose correction system of claim 6, wherein A detection member (11) for receiving the laser from the detection device (2) is arranged on the inner wall of the first detector (1).

9. The exposure dose correction system of claim 1, wherein The detection member (11) is a detection board card.

10. The exposure dose correction system of claim 9, wherein ​

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