Coating system of display panel

Abstract

The utility model provides a coating system of a display panel, and relates to the technical field of display panel coating. The coating system of the display panel comprises a bedplate, wherein the bedplate is used for bearing a substrate of the display panel; the movable spraying mechanism comprises a movable frame and a nozzle mounted on the movable frame; the movable frame is arranged above the bedplate and can reciprocate along a first direction so as to drive the nozzle to coat photoresist on the surface of the substrate; the cleaning mechanism comprises a first vacuumizing device and an adsorption unit communicated with the first vacuumizing device; the adsorption unit is mounted on the moving frame; the adsorption unit can generate negative pressure under the action of the first vacuumizing device so as to move and adsorb particles on the platen. According to the photoresist coating device, the Particle on the platen can be effectively cleaned in advance, the foreign matter detection and alarm frequency during photoresist coating is reduced, the yield is improved, the moving frame is used for spraying and also used for driving the adsorption unit to clean, and the production efficiency is improved to a certain extent.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of display panel coating, in particular to a display panel coating system. BACKGROUND

[0002] In the display panel manufacturing process, the substrate is placed on the platen, and the photoresist is coated on the substrate. The coating process of the photoresist is mainly to spray the photoresist on the surface of the substrate film layer through the nozzle, the spraying speed is controlled by the pressure, the uniform movement of the nozzle is controlled by the linear motor, and after the coating is completed, the photoresist in the unexposed area is reserved after the exposure and development, and then etching is performed.

[0003] If there are particles on the area of the platen for placing the substrate, the area of the substrate corresponding to the particles will be raised. Therefore, the existing coating system generally has a foreign matter detection mechanism, which will issue an alarm signal and pause the coating when an abnormality is detected. If the foreign matter detection mechanism does not detect the abnormality during the coating process and continues to coat, the photoresist film thickness in the area will be uneven after coating, and the CD (Critical Dimension) will be larger or smaller after exposure and development. The CD is larger or smaller, which will cause line loss or short circuit, resulting in an increase in product unqualified rate, i.e. a decrease in good product rate. Utility model content

[0004] The purpose of the present application is to solve the above problems, and provide a display panel coating system which can clean the particles on the platen in advance, reduce the foreign matter detection alarm frequency, and improve the good product rate.

[0005] The present application provides a display panel coating system, which comprises:

[0006] A platen for carrying a substrate of a display panel;

[0007] A moving spraying mechanism comprising a moving frame and a nozzle mounted on the moving frame; the moving frame is arranged above the platen and can reciprocate along a first direction to drive the nozzle to coat photoresist on the surface of the substrate;

[0008] A cleaning mechanism comprising a first vacuum device and a suction unit in communication with the first vacuum device; the suction unit is mounted on the moving frame; the suction unit can generate negative pressure under the action of the first vacuum device to move and adsorb the particles on the platen.

[0009] According to the technical scheme provided in some embodiments of the present application, the first vacuum device is communicated with the adsorption unit through a vacuum pipeline; an electromagnetic valve is installed on the vacuum pipeline; the cleaning mechanism further comprises a particle collection chamber installed on the vacuum pipeline; a particle filtering structure is arranged in the particle collection chamber to collect the particles adsorbed by the adsorption unit in the particle collection chamber; the particle filtering structure is detachably connected to the side of the particle collection chamber that is relatively close to the adsorption unit; and the adsorption unit is an air knife device.

[0010] According to the technical scheme provided in some embodiments of the present application, the particle filtering structure comprises at least two layers of filter screens; and the pore diameters of the filter screens gradually decrease in the direction away from the adsorption unit.

[0011] According to the technical scheme provided in some embodiments of the present application, the maximum pore diameter of the filter screen is 1 mm, and the minimum pore diameter is 0.005 mm.

[0012] According to the technical scheme provided in some embodiments of the present application, the cleaning mechanism further comprises a vacuum chamber installed on the vacuum pipeline; the electromagnetic valve, the particle collection chamber and the vacuum chamber are sequentially arranged in the direction away from the adsorption unit; a vacuum degree sensor is arranged in the vacuum chamber; the vacuum degree sensor is used to detect the vacuum degree in the vacuum chamber in real time and generate a vacuum degree signal, and transmit the vacuum degree signal to a controller; and the controller is used to control the operating power of the first vacuum device according to the vacuum degree signal.

[0013] According to the technical scheme provided in some embodiments of the present application, a pressure regulating valve is further arranged on the vacuum pipeline; and the controller is further used to control the opening degree of the pressure regulating valve according to the vacuum degree signal.

[0014] According to the technical scheme provided in some embodiments of the present application, a plurality of air holes are distributed on the table plate; the cleaning mechanism further comprises an air blowing device; the air blowing device is communicated with at least one air hole, and is used to blow compressed air into each air hole.

[0015] According to the technical scheme provided in some embodiments of the present application, the absolute value of the pressure of the compressed air blown by the air blowing device is greater than the absolute value of the negative pressure generated at the adsorption unit.

[0016] According to the technical scheme provided in some embodiments of the present application, the pressure range of the compressed air blown by the air blowing device is 0.01 mpa-1 mpa; and the range of the negative pressure that can be generated at the adsorption unit is -200 kpa-1 kpa.

[0017] According to the technical scheme provided in some embodiments of the present application, the coating system of the display panel further comprises a second vacuum device in communication with at least one of the air holes; the second vacuum device is used to generate negative pressure at each of the air holes to adsorb the substrate on the platen; the negative pressure generated by the second vacuum device through the air holes ranges from-100 kpa to-10 kpa.

[0018] Compared with the prior art, the coating system of the display panel provided in the present application has the following advantages: the coating system of the display panel comprises a platen, a moving spraying mechanism and a cleaning mechanism, the cleaning mechanism comprises a first vacuum device and an adsorption unit in communication, and the adsorption unit is located on a moving frame of the moving spraying mechanism; before the spraying work is performed, the first vacuum device is controlled to be started to generate negative pressure at the adsorption unit; the adsorption unit moves and adsorbs the particles at different positions on the platen along with the movement of the moving frame to complete the cleaning work of the platen. The coating system provided in the present application can effectively clean the particles on the platen before coating the photoresist, reduces the frequency of foreign matter detection alarm during the coating of the photoresist, and improves the yield rate; on the other hand, the moving spraying and cleaning functions are integrated in one system, which reduces the floor area occupied by the equipment, and the moving frame is used for spraying and driving the adsorption unit to clean, which improves the production efficiency to a certain extent.

[0019] It should be understood that the description of technical features, technical schemes, advantages or similar language in the present application does not imply that all features and advantages can be achieved in any single embodiment. On the contrary, it can be understood that the description of a feature or an advantage means that the specific technical feature, technical scheme or advantage is included in at least one embodiment. Therefore, the description of technical features, technical schemes or advantages in the specification does not necessarily refer to the same embodiment. Furthermore, the technical features, technical schemes and advantages described in the embodiments can be combined in any appropriate manner. Those skilled in the art will understand that the embodiments can be implemented without one or more specific technical features, technical schemes or advantages of a particular embodiment. In other embodiments, additional technical features and advantages can be identified in specific embodiments that do not embody all embodiments. BRIEF DESCRIPTION OF DRAWINGS

[0020] In order to more clearly illustrate the technical schemes in the embodiments of the present application, the drawings required in the embodiment description will be briefly introduced as follows. Obviously, the drawings in the following description are only some embodiments of the present application, and those skilled in the art can obtain other drawings from these drawings without creating any creative labor.

[0021] Figure 1 The structure schematic diagram of the coating system of the display panel provided in the embodiments of the present application is shown in the figure.

[0022] The text annotations in the figures are as follows:

[0023] 1. platen; 11. air vent; 21. moving frame; 22. nozzle; 31. first vacuum device; 32. adsorption unit; 33. electromagnetic valve; 34. fine particle collection chamber; 341. fine particle filter structure; 35. vacuum chamber; 351. vacuum degree sensor; 36. air blowing device; 37. second vacuum device; 38. pressure regulating valve. DETAILED DESCRIPTION

[0024] In order for those skilled in the art to better understand the technical solutions of the present application, the technical solutions in the embodiments of the present application will be described clearly and completely below with reference to the drawings, and the description in this part is only exemplary and explanatory, and should not have any limiting effect on the protection scope of the present application. Specifically, the described embodiments are only a part of the embodiments of the present application, not all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative labor should belong to the protection scope of the present application.

[0025] It should be noted that similar reference numerals and letters represent similar items in the following drawings, so once an item is defined in one drawing, it does not need to be further defined and explained in subsequent drawings. In addition, the terms "comprise" and "have" and any variations thereof are intended to cover non-exclusive inclusion, for example, a process, method, system, product or device comprising a series of steps or units does not have to be limited to only those steps or units clearly listed, but can include other steps or units not clearly listed or inherent to these processes, methods, products or devices.

[0026] In the photoresist (i.e. photoresist) coating link of panel manufacturing, the normal process is to spray photoresist on the surface of the substrate film layer through the nozzle, to control the spraying speed by pressure, and to realize uniform coating by linear motor to control the uniform movement of the nozzle. The existing coating system is configured with a detection mechanism, and the detection end of the detection mechanism is generally located in front of the nozzle along the coating direction, which can be used to detect whether the substrate has an abnormality (such as whether there is a protrusion), and if an abnormality is detected, an alarm signal will be sent to prompt the operator that an abnormality has occurred. Once the alarm is given, the operator needs to pause the equipment operation, which affects the work efficiency; in addition, there is an abnormality caused by the Particle in the area on the platen for placing the substrate, which is not detected by the detection mechanism, at this time, if the photoresist is continued to be coated, it will cause the problem of uneven photoresist film thickness, which will reduce the product yield.

[0027] To solve the above problems, the present embodiment provides a coating system of a display panel, please refer to Figure 1The coating system comprises:

[0028] A table plate 1 for carrying a substrate of a display panel;

[0029] A moving spraying mechanism comprising a moving frame 21 and a nozzle 22 mounted on the moving frame 21; the moving frame 21 is arranged above the table plate 1 and is movable in a first direction to drive the nozzle 22 to coat photoresist on the surface of the substrate;

[0030] A cleaning mechanism comprising a first vacuum device 31 and a suction unit 32 in communication with the first vacuum device 31; the suction unit 32 is mounted on the moving frame 21; the suction unit 32 can generate negative pressure under the action of the first vacuum device 31 to move the particles on the table plate 1.

[0031] Specifically, the table plate 1 and the moving spraying mechanism are located in a closed working space; the table plate 1 is a basic carrying component of the entire coating system, and its main function is to carry the substrate of the display panel (not shown in the figure) to provide a stable carrying plane for subsequent photoresist coating; the moving spraying mechanism is used to move and spray photoresist on the substrate placed on the table plate 1 in the first direction; the first direction is the horizontal direction; the moving spraying mechanism comprises a moving frame 21 arranged above the table plate 1; when the moving frame 21 moves in the first direction, the nozzle 22 located thereon can be driven to move; the nozzle 22 coats photoresist on the surface of the substrate while moving; the moving frame 21 can make the photoresist uniformly cover different positions on the substrate, meeting the process requirements for photoresist coating in the production process of the display panel; since the moving spraying mechanism is a prior art, its detailed structure will not be described here.

[0032] The present application adds a cleaning mechanism to the existing table plate 1 and moving spraying mechanism; the first vacuum device 31 is located outside the closed working space; the first vacuum device 31 is the power source for generating negative pressure of the entire cleaning mechanism; it is in communication with the suction unit 32 through a vacuum pipeline to provide necessary negative pressure conditions for the suction unit 32; the suction unit 32 can move back and forth with the moving frame 21, so as to flexibly cover different areas on the table plate 1, thereby being able to adsorb the particles on the table plate 1 to achieve the purpose of cleaning the table plate 1; when cleaning operation is needed, i.e., when the particles on the table plate 1 need to be adsorbed, the vacuum pipeline is controlled to be turned on, so that an effective negative pressure passage is formed between the first vacuum device 31 and the suction unit 32, and the suction unit 32 can play the adsorption role; when cleaning is not needed, the vacuum pipeline can be disconnected to avoid affecting the subsequent photoresist coating work; in the embodiment, the first vacuum device 31 is a vacuum pump, specifically a small rotary vane vacuum pump; the suction unit 32 is an air knife device.

[0033] The cleaning mechanism of the display panel coating system provided by the embodiment is used to clean the particles on the base plate before coating the photoresist, and the cleaning mechanism is integrated with the mobile spraying mechanism, thereby reducing the floor space of the equipment, and the mobile frame is used for spraying and cleaning, thereby improving the production efficiency to a certain extent.

[0034] Further, the first vacuum device 31 is communicated with the adsorption unit 32 through a vacuum pipeline; an electromagnetic valve 33 is installed on the vacuum pipeline; the cleaning mechanism further comprises a particle collection chamber 34 installed on the vacuum pipeline; the particle collection chamber 34 is provided with a particle filtering structure 341, so as to collect the particles adsorbed by the adsorption unit 32 in the particle collection chamber 34; the particle filtering structure 341 is detachably connected to the side of the particle collection chamber 34 relatively close to the adsorption unit 32; and the adsorption unit 32 is a gas knife device.

[0035] Specifically, the vacuum pipeline is made of a corrosion-resistant and negative pressure-resistant material, such as a PVC pipe or a stainless steel pipe, and the electromagnetic valve 33 is arranged on the vacuum pipeline, which plays a key role in controlling the on-off of the vacuum pipeline. When the cleaning operation is needed, that is, when the particles on the base plate 1 need to be adsorbed, the vacuum pipeline is controlled to be conducted through the electromagnetic valve 33, and when the cleaning operation is not needed, the vacuum pipeline is controlled to be disconnected through the electromagnetic valve 33. The particle collection chamber 34 is also arranged on the vacuum pipeline, which plays a key role in collecting particles. After the particles on the base plate 1 are adsorbed by the adsorption unit 32, the adsorbed particles will enter the particle collection chamber 34 along with the airflow, and be intercepted by the particle filtering structure 341, so as to avoid the particles entering the first vacuum device 31 and affecting the normal operation of the cleaning mechanism.

[0036] Further, the particle filtering structure 341 comprises at least two layers of filter screens, and the pore sizes of the filter screens gradually decrease in the direction away from the adsorption unit 32.

[0037] Specifically, the particulate filtering structure 341 is composed of at least two layers of filter screens, for example, three layers, five layers, eight layers, etc., and the specific number of layers is not limited. The pore size of each layer of filter screens gradually decreases along the direction away from the adsorption unit 32. When the airflow with particulates enters the particulate collection chamber 34 from the adsorption unit 32, it will first pass through the filter screen with a relatively large pore size, and the larger particulates will be intercepted first. As the airflow continues to move forward, the subsequent filter screens with smaller pore sizes will further intercept smaller particulates. Through this layer-by-layer filtering method, good filtering and collecting effects can be achieved on particulates of different particle sizes, greatly improving the capture efficiency of particulates, and ensuring that as many particulates as possible are left in the particulate collection chamber 34 and do not enter the first vacuum device 31.

[0038] Further, the maximum pore size of the filter screen is 1 mm, and the minimum pore size is 0.005 mm.

[0039] Specifically, in this embodiment, the pore size of each layer of filter screens is limited, wherein the maximum pore size is limited to 1 mm, and the minimum pore size is limited to 0.005 mm, for example, it can be 1 mm, 0.7 mm, 0.5 mm, 0.3 mm, 0.01 mm, 0.005 mm, etc. For example, the particulate filtering structure 341 includes three layers of filter screens, and the pore sizes of the three layers of filter screens along the direction away from the adsorption unit 32 are 0.8 mm, 0.5 mm, and 0.2 mm, respectively. The pore size in the range of 0.005-1 mm basically covers various particle sizes of particulates that may appear on the platen 1 in the display panel substrate coating environment, which can more comprehensively protect the filtering and collecting of particulates, thereby maintaining the platen 1 in a relatively clean state and reducing the occurrence of product defects caused by particulate impurities.

[0040] Further, the particulate filtering structure 341 is detachably connected with the particulate collection chamber 34, and the particulate collection chamber 34 is provided with a falling device for facilitating the falling of particulates on the particulate filtering structure 341.

[0041] Specifically, the particulate filtering structure 341 and the particulate collection chamber 34 are connected in a detachable manner (such as threaded connection, buckle connection, etc.), and the particulate filtering structure 341 is detachably connected to the side of the particulate collection chamber 34 relatively close to the adsorption unit 32, facilitating the periodic cleaning of the particulates in the particulate collection chamber 34 and on the particulate filtering structure 341 by the staff.

[0042] In addition, when the particulate filtering structure 341 is used for a long time, a large amount of particulates will adhere to the filter screen, resulting in problems such as a decrease in the filtering efficiency of the filter screen and an increase in the airflow resistance. Therefore, a falling device can be arranged in the particulate collection chamber 34, which can be a vibration device that generates vibration of a certain frequency and amplitude through a mechanical structure, so that the particulates adhering to the particulate filtering structure 341 are subjected to external force and fall off the filter screen, thereby achieving the falling of the particulates. The falling device can also be a gas blowing device that sprays gas with a certain pressure to the particulate filtering structure 341 through a gas source (such as a gas pump), so that the particulates adhering to the filter screen are blown off by the impact force of the gas, facilitating the falling and collection of the particulates.

[0043] Further, the cleaning mechanism further comprises a vacuum chamber 35 arranged on the vacuum pipeline; the electromagnetic valve 33, the particulate collection chamber 34 and the vacuum chamber 35 are sequentially arranged in a direction away from the adsorption unit 32; the vacuum chamber 35 is provided with a vacuum degree sensor 351; the vacuum degree sensor 351 is configured to detect the vacuum degree in the vacuum chamber 35 in real time and generate a vacuum degree signal, and transmit the vacuum degree signal to the controller; the controller is configured to control the operating power of the first vacuumizing device 31 according to the vacuum degree signal.

[0044] Specifically, the vacuum chamber 35 is arranged below the table plate 1, for example, in a box structure, and opposite ends thereof are respectively provided with through holes connected with the vacuum pipeline, and the connection portions can be sealed by using rubber sealing rings or sealing glue. The main function of the vacuum chamber 35 is to create a relatively stable and controllable vacuum environment for the entire particulate adsorption process. During the working process of the cleaning mechanism, the vacuum degree directly affects the adsorption capacity of the adsorption unit 32, and only a suitable vacuum degree can ensure good adsorption effect on particulates of different particle sizes. In the present embodiment, the vacuum degree sensor 351 is arranged in the vacuum chamber 35, which can detect the vacuum degree signal in real time and feed it back to the controller. The controller will make a judgment and take corresponding measures according to the pre-set program and target vacuum degree range. If the current vacuum degree indicated by the vacuum degree signal is lower than the target vacuum degree, it means that the adsorption capacity of the adsorption unit can be insufficient. At this time, the controller will increase the operating power of the first vacuumizing device 31 to improve the vacuum degree in the vacuum chamber 35 and enhance the adsorption effect of the adsorption unit on the particulates. Conversely, if the current vacuum degree indicated by the vacuum degree signal is higher than the target vacuum degree, it can cause energy waste or unnecessary pressure on the equipment. Therefore, the controller will reduce the operating power of the first vacuumizing device 31 to make the vacuum degree fall within a suitable range. The target vacuum degree can be set according to the requirements of the gluing process, and the controller can be a programmable logic controller or a microcontroller.

[0045] Further, the vacuum pipeline is further provided with a pressure regulating valve 38; and the controller is further configured to control the opening degree of the pressure regulating valve 38 according to the vacuum degree signal.

[0046] Specifically, the pressure regulating valve 38 is arranged on the vacuum pipeline and electrically connected with the controller. When the vacuum degree sensor 351 detects the vacuum degree signal in the vacuum chamber 35 and transmits the signal to the controller, the controller will control the opening of the pressure regulating valve 38 according to the signal, in addition to controlling the running power of the first vacuum device 31, so as to adjust the flow and pressure of the gas in the vacuum pipeline, and further cooperate with the first vacuum device 31 to create a suitable vacuum environment with stable vacuum degree.

[0047] Further, the platform 1 is provided with a plurality of air holes 11; the cleaning mechanism further comprises a blowing device 36; the blowing device 36 is in communication with at least one air hole 11, and is used for blowing compressed air into each air hole 11.

[0048] Specifically, the area of the platform 1 for placing the substrate is divided into a plurality of air holes 11 penetrating the platform 1, and the air holes 11 are in communication with the blowing device 36 outside the sealed working space through the air pipeline. The blowing device 36 is, for example, an air compressor, which is used for blowing CDA (Clean Dry Air) through each air hole 11. In this way, on the one hand, the vacuum degree suitable for the coating process can be reached in the working space, and on the other hand, the non-clean air outside the working space can be prevented from being sucked into the working space to affect the cleanliness by simple adsorption.

[0049] Further, the absolute value of the pressure of the compressed air blown by the blowing device 36 is greater than the absolute value of the pressure of the negative pressure generated at the adsorption unit 32.

[0050] Specifically, the absolute value of the pressure of the compressed air blown by the blowing device 36 is greater than the absolute value of the pressure of the air extracted by the first vacuum device 31, so that the adsorption effect of the particles can be improved under the action of the pressure difference.

[0051] Preferably, the pressure range of the blown compressed air is 0.01 mpa~1 mpa. For example, it can be 0.01 mpa, 0.1 mpa, 0.2 mpa, 0.5 mpa, 0.8 mpa, 1 mpa.

[0052] Preferably, the range of the negative pressure generated at the adsorption unit 32 is -200 kpa~-1 kpa. For example, it can be -200 kpa, -170 kpa, -100 kpa, -80 kpa, -60 kpa, -10 kpa, -1 kpa, etc.

[0053] Further, the coating system further comprises a second vacuum device 37 in communication with at least one air hole 11; the second vacuum device 37 is used for generating negative pressure at each air hole 11 to adsorb the substrate on the platform 1.

[0054] Specifically, the second vacuum device 37 is a vacuum pump located outside the closed working space, which is used to perform air pumping during the coating stage to stably adsorb the substrate on the platen 1. The second vacuum device 37 and the air blowing device 36 are respectively connected with the air vent pipeline through a three-way valve. When the cleaning work is performed, the air blowing device 36 is communicated with each air vent hole 11 by switching the state of the three-way valve. When the coating work is performed, the second vacuum device 37 is communicated with each air vent hole 11 by switching the state of the three-way valve.

[0055] Optionally, the negative pressure range generated by the second vacuum device 37 through each air vent hole 11 is -100 kpa~10 kpa. For example, it can be -20 kpa, -30 kpa, -40 kpa, -50 kpa, -60 kpa, -70 kpa, -80 kpa, -90 kpa, etc.

[0056] The principles and implementation manners of the present application are described by using specific examples in the present application. The above example is only used to help understand the method of the present application and its core idea. The above description is only the preferred implementation manner of the present application. It should be pointed out that, due to the limitation of the expression, there are infinite specific structures. For the ordinary skilled in the art, some improvements, decorations or changes can be made without departing from the principles of the present application. The above technical features can also be combined in an appropriate manner. These improvements, decorations, changes or combinations, or the direct application of the inventive concept and technical solution to other occasions without improvement, shall be regarded as the protection scope of the present application.

Claims

1. A coating system of a display panel, characterized by, The application relates to a substrate cleaning device for a substrate, which comprises: a substrate plate for carrying a substrate of a display panel; a movable spraying mechanism comprising a movable frame and a nozzle mounted on the movable frame; the movable frame is arranged above the substrate plate and can reciprocate along a first direction to drive the nozzle to coat photoresist on the surface of the substrate; a cleaning mechanism comprising a first vacuum device and a suction unit in communication with the first vacuum device; the suction unit is mounted on the movable frame; the suction unit can generate negative pressure under the action of the first vacuum device to move and adsorb particles on the substrate plate.

2. The coating system of a display panel according to claim 1, wherein The first vacuum device is in communication with the suction unit through a vacuum pipeline; an electromagnetic valve is mounted on the vacuum pipeline; the cleaning mechanism further comprises a particle collection chamber mounted on the vacuum pipeline; the particle collection chamber is provided with a particle filtering structure to collect particles adsorbed by the suction unit in the particle collection chamber; the particle filtering structure is detachably connected to one side of the particle collection chamber close to the suction unit; and the suction unit is an air knife device.

3. The coating system of claim 2, wherein, The particle filtering structure comprises at least two layers of filter screens; the pore diameters of the filter screens gradually decrease in the direction away from the suction unit.

4. The coating system of claim 3, wherein, The maximum pore diameter of the filter screen is 1 mm, and the minimum pore diameter is 0.005 mm.

5. The coating system of claim 2, wherein, The cleaning mechanism further comprises a vacuum chamber mounted on the vacuum pipeline; the electromagnetic valve, the particle collection chamber and the vacuum chamber are sequentially arranged in the direction away from the suction unit; the vacuum chamber is provided with a vacuum degree sensor; the vacuum degree sensor is used for detecting the vacuum degree in the vacuum chamber in real time and generating a vacuum degree signal, and transmitting the vacuum degree signal to a controller; the controller is used for controlling the running power of the first vacuum device according to the vacuum degree signal.

6. The coating system of claim 5, wherein, The vacuum pipeline is further provided with a pressure regulating valve; and the controller is further used for controlling the opening degree of the pressure regulating valve according to the vacuum degree signal.

7. The coating system of claim 1, wherein The substrate plate is provided with a plurality of air holes; the cleaning mechanism further comprises an air blowing device; the air blowing device can be in communication with at least one air hole and is used for blowing compressed air into each air hole.

8. The coating system of claim 7, wherein, The absolute value of the pressure of the compressed air blown by the air blowing device is greater than the absolute value of the negative pressure generated at the suction unit.

9. The coating system of claim 8, wherein, The pressure range of the compressed air blown by the air blowing device is 0.01 mpa-1 mpa; and the range of the negative pressure generated at the suction unit is -200 kpa-1 kpa.

10. The coating system of claim 7, wherein, The application further comprises a second vacuum device in communication with at least one air hole; the second vacuum device is used for generating negative pressure at each air hole to adsorb the substrate on the substrate plate; and the range of the negative pressure generated by the second vacuum device through the air holes is -100 kpa-10 kpa.

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