Tail gas treatment equipment and semiconductor production equipment

By installing parallel liquid detection sensors at the liquid level line of the pollutant removal component in the exhaust gas treatment equipment, the problem of liquid leakage caused by single-point failure was solved, and stable operation and safe production of the equipment were achieved.

CN223832082UActive Publication Date: 2026-01-27ZHEJIANG ICSPROUT SEMICONDUCTOR CO LTD
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Patent Information

Application Number
CN202422990424.9
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-12-04
Publication Date
2026-01-27
Estimated Expiration
2034-12-04

AI Technical Summary

Technical Problem

Existing exhaust gas treatment equipment has a risk of liquid leakage due to a single point of failure in liquid level detection, which affects the stability and reliability of the equipment.

Method used

At least two parallel liquid detection sensors are installed at the liquid level line of the contaminant removal component to ensure that at least one sensor can send a drainage signal when it is working properly, so as to keep the liquid level within a safe range.

Benefits of technology

This improved the reliability and stability of the exhaust gas treatment equipment, prevented liquid leakage accidents, and ensured production safety.

✦ Generated by Eureka AI based on patent content.

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Abstract

The embodiment of the utility model provides tail gas treatment equipment and semiconductor production equipment, and the tail gas treatment equipment comprises a pollutant removal part, a liquid level line is arranged on the side wall of the pollutant removal part; the at least one liquid detection sensor is arranged on the liquid level line, and all the liquid detection sensors are connected in parallel; the liquid detection sensor is used for detecting liquid in the pollutant removal part; when one of the liquid detection sensors detects that the liquid level height of the liquid reaches the liquid level line, a drainage signal is sent out to discharge part of the liquid to the outside of the pollutant removal component, and the liquid level height of the liquid in the pollutant removal component is kept within the liquid level line. According to the technical scheme provided by the embodiment of the utility model, the working reliability and stability of the tail gas treatment equipment can be improved.
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Description

Technical Field

[0001] This application relates to the field of semiconductor manufacturing technology, specifically to an exhaust gas treatment device and a semiconductor production device. Background Technology

[0002] Exhaust gas treatment equipment is used in industries such as semiconductors, panels, and solar cells to treat harmful exhaust gases generated by equipment such as chemical vapor deposition (CVD) and etching machines. For example, a scrubber is one type of exhaust gas treatment equipment. The main purpose of exhaust gas treatment equipment is to reduce the impact of harmful gases on the environment and human health, ensuring the safety and compliance of the production process.

[0003] Therefore, in this context, how to provide technical solutions to improve the reliability and stability of exhaust gas treatment equipment has become a technical problem that urgently needs to be solved by those skilled in the art. Utility Model Content

[0004] In view of this, the present invention provides an exhaust gas treatment device and a semiconductor manufacturing device to improve the reliability and stability of the exhaust gas treatment device.

[0005] To achieve the above objectives, the present invention provides the following technical solutions.

[0006] In a first aspect, embodiments of the present invention provide an exhaust gas treatment device, comprising:

[0007] A contaminant removal component, wherein a liquid level line is provided on the side wall of the contaminant removal component;

[0008] At least one liquid detection sensor is disposed on the liquid level line, and the liquid detectors are connected in parallel; the liquid detection sensor is used to detect liquid in the contaminant removal component; when one of the liquid detection sensors detects that the liquid level reaches the liquid level line, it issues a drainage signal to discharge part of the liquid to the outside of the contaminant removal component, thereby maintaining the liquid level in the contaminant removal component within the liquid level line.

[0009] Secondly, this utility model provides a semiconductor manufacturing equipment, including: the exhaust gas treatment equipment as described in the first aspect.

[0010] This utility model provides an exhaust gas treatment device, comprising: a pollutant removal component, on which a liquid level line is provided; at least one liquid detection sensor is disposed on the liquid level line, and the liquid detectors are connected in parallel; the liquid detection sensor is used to detect liquid inside the pollutant removal component; when one of the liquid detection sensors detects that the liquid level reaches the liquid level line, it issues a drainage signal to discharge part of the liquid to the outside of the pollutant removal component, thereby maintaining the liquid level inside the pollutant removal component within the liquid level line.

[0011] As can be seen, the technical solution provided by this utility model embodiment, by setting at least one liquid detection sensor connected in parallel at the liquid level line of the pollutant removal component, can issue a drainage signal as soon as one of the liquid detection sensors detects that the liquid level in the pollutant removal component has reached the liquid level line, thereby discharging part of the liquid in the pollutant removal component to the outside, preventing liquid leakage accidents caused by the liquid level in the pollutant removal component exceeding the liquid level line. This ensures that the exhaust gas treatment equipment has a sufficient number of normally functioning liquid detection sensors, avoiding the situation where a single liquid detection sensor malfunctions and cannot accurately issue a drainage signal, thus preventing liquid leakage events in the pollutant removal component. Therefore, setting at least one liquid detection sensor connected in parallel can ensure the operational stability of the exhaust gas treatment equipment and ensure the overall industrial production safety. Therefore, the technical solution provided by this utility model embodiment can improve the operational reliability and stability of the exhaust gas treatment equipment. Attached Figure Description

[0012] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on the provided drawings without creative effort.

[0013] Figure 1 This is a schematic diagram of the exhaust gas treatment device provided in an embodiment of the present utility model;

[0014] Figure 2 This is another structural schematic diagram of the exhaust gas treatment device provided in this embodiment of the utility model;

[0015] Figure 3 This is a schematic diagram of the structure of a semiconductor manufacturing equipment provided in an embodiment of this utility model. Detailed Implementation

[0016] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0017] Semiconductor manufacturing involves multiple complex processes, such as thin film deposition, photolithography, etching, doping, and cleaning. These processes generate large amounts of waste gases containing harmful substances (hazardous exhaust gases), such as volatile organic compounds (VOCs), acidic gases, and alkaline gases. To meet stringent environmental regulations, measures are taken during semiconductor manufacturing to reduce the environmental impact of these harmful exhaust gases.

[0018] Therefore, exhaust gas treatment equipment has been introduced into the semiconductor manufacturing process. By treating harmful exhaust gases, the emission of harmful substances in these gases can be reduced, protecting the environment and human health. Simultaneously, exhaust gas treatment equipment can improve the safety of equipment cleaning and maintenance, and the reacted oxides are more easily filtered, thus improving the efficiency of harmful exhaust gas filtration.

[0019] For example, in semiconductor manufacturing processes, CVD (Chemical Vapor Deposition) equipment uses various gases or liquids to grow thin films. Some of these gases are toxic, corrosive, flammable, or explosive, such as hydrogen and silane. The semiconductor manufacturing process also generates some toxic byproducts. These harmful exhaust gases are pumped away by dry pumps and then undergo combustion and water washing treatment before being discharged. The equipment used for combustion and water washing typically employs water-washing exhaust gas treatment equipment, such as a scrubber.

[0020] Therefore, exhaust gas treatment equipment is very important in semiconductor manufacturing processes, and it is essential to improve the stability and reliability of exhaust gas treatment equipment.

[0021] Based on this, the present invention provides an exhaust gas treatment device to improve the reliability and stability of the exhaust gas treatment device.

[0022] Please refer to Figure 1 and Figure 2 , Figure 1 This is a schematic diagram of the exhaust gas treatment device provided in an embodiment of the present invention. Figure 2 This is another structural schematic diagram of the exhaust gas treatment device provided in this embodiment of the utility model.

[0023] like Figure 1 and Figure 2 As shown, the exhaust gas treatment device 10 includes:

[0024] A contaminant removal component 1, on the side wall of which a liquid level line L is provided;

[0025] At least one liquid detection sensor 2 is disposed on the liquid level line L, and the liquid detection sensors 2 are connected in parallel. The liquid detection sensor 2 is used to detect the liquid in the contaminant removal component 1. When one of the liquid detection sensors 2 detects that the liquid level reaches the liquid level line L, it issues a drainage signal to discharge part of the liquid to the outside of the contaminant removal component 1, thereby maintaining the liquid level in the contaminant removal component 1 within the liquid level line L.

[0026] The pollutant removal component 1 can utilize its internal liquid (process cooling water: PCW) to fully contact the harmful exhaust gas, separating particulate matter and residual harmful substances from the harmful exhaust gas, and discharging them with the water flow from the exhaust gas treatment equipment 10, thereby further removing harmful substances from the harmful exhaust gas.

[0027] The liquid inside the pollutant removal component 1 can dissolve or adsorb pollutants in the harmful exhaust gas, thereby achieving the purpose of purifying the harmful exhaust gas.

[0028] Meanwhile, the pollutant removal component 1 also has environmental protection and energy-saving functions. By recycling water, the pollutant removal component 1 effectively reduces water consumption, and its energy consumption is low during operation.

[0029] Furthermore, the pollutant removal component 1 is suitable for a variety of harmful exhaust gases and can handle a variety of different types of harmful exhaust gases, making it universally applicable, especially effective in treating water-soluble gases.

[0030] Based on the foregoing description, it can be understood that the exhaust gas treatment equipment 10 requires combustion and water washing to process harmful exhaust gases before they can be discharged. After combustion, the harmful exhaust gases need to be washed with water by the pollutant removal component 1, which requires a certain amount of water to be continuously circulated. Therefore, a liquid level line L is provided on the side wall of the pollutant removal component 1. The liquid level line L indicates the limit value of the liquid level in the pollutant removal component 1, ensuring that the liquid level is maintained within a safe and effective treatment range.

[0031] For example, the liquid level line L is linked with the functional systems (chemical dosing system and water replenishment / drainage system) of the exhaust gas treatment equipment 10 to achieve automated control. For instance, when the liquid level is higher than the liquid level line L, the functional system will stop water replenishment and chemical dosing; when the liquid level is lower than the liquid level line L, water replenishment will begin to ensure that the circulating pump does not run dry due to lack of water, thereby improving the automated operation efficiency of the exhaust gas treatment equipment 10.

[0032] The water sensor 2 is used to monitor the liquid level in the contaminant removal unit 1 in real time, ensuring that the liquid level is within the liquid level line L to maintain a safe and effective treatment range. Therefore, the water sensor 2 is positioned at the liquid level line L, allowing it to operate in conjunction with the aforementioned functional system to achieve automated control.

[0033] like Figure 1 As shown, during operation, the exhaust gas treatment equipment 10 continuously injects process cooling water into the pollutant removal component 1. When the liquid level rises to the position of the liquid detection sensor 2, the liquid detection sensor 2 detects the liquid level and sends a drainage signal to discharge some liquid to the outside of the pollutant removal component 1, thereby maintaining the liquid level in the pollutant removal component 1 within the liquid level line L, achieving the purpose of maintaining a fixed amount of circulating water and preventing overflow.

[0034] Furthermore, the liquid detection sensor 2 can also prevent false alarms. During the treatment of harmful exhaust gases by the exhaust gas treatment equipment 10, byproducts such as foam, elemental sulfur, and ammonium sulfate may be generated. These substances may adhere to the electrodes of the level gauge used to display the liquid level line L, leading to false level alarms. The liquid level detection sensor 2 prevents conductivity between the electrodes through insulation, reducing the occurrence of false alarms and improving the reliability of the liquid level line L displayed by the level gauge.

[0035] In summary, the accuracy of the liquid detection sensor 2 is crucial for the normal operation of the exhaust gas treatment equipment 10. It can prevent equipment malfunctions or safety and environmental problems caused by improper liquid levels, ensuring the operational stability and reliability of the exhaust gas treatment equipment 10. Therefore, ensuring the operational reliability and stability of the liquid detection sensor 2 directly affects the operational reliability and stability of the exhaust gas treatment equipment 10.

[0036] However, in the typical design of exhaust gas treatment equipment 10, only one liquid detection sensor 2 is installed at the liquid level line L. When the liquid detection sensor 2 is damaged or falsely alarms, the liquid in the pollutant removal component 1 will overflow because the liquid detection sensor 2 does not accurately and reliably send a drainage signal, or the liquid will be discharged outside the pollutant removal component 1 due to the liquid detection sensor 2 sending a drainage signal in advance, resulting in insufficient water volume and inadequate water washing.

[0037] In the current semiconductor manufacturing process, there have been several incidents of liquid (e.g., L4 liquid: polyoxyethylene lauryl ether) leakage due to the failure of the liquid detection sensor 2 to drain water.

[0038] Based on this, in this embodiment of the invention, at least one liquid level detection sensor 2 connected in parallel is provided at the position of the liquid level line L. Please continue to refer to... Figure 2 .

[0039] like Figure 2 As shown, multiple liquid level detection sensors 2 are added at the liquid level line L position on the side wall of the contaminant removal component 1. Figure 2 (Taking the addition of two liquid level sensors 2 as an example, the two added liquid level sensors 2 are then connected in parallel with the original single liquid level sensor 2. When the liquid level in the contaminant removal component 1 rises, the three liquid level sensors 2 detect the liquid level and issue a drainage signal to drain the liquid. Simultaneously, if one or two liquid level sensors 2 malfunction and fail, the remaining liquid level sensor 2 can still detect the liquid level. In other words, by installing multiple parallel liquid level sensors 2 at the liquid level line L, a sufficient number of normally functioning liquid level sensors 2 can be ensured, guaranteeing the reliability and stability of the exhaust gas treatment equipment 10.)

[0040] As can be seen, the technical solution provided by this utility model embodiment, by providing at least one liquid detection sensor 2 connected in parallel at the liquid level line L of the pollutant removal component 1, can issue a drainage signal when any one of the liquid detection sensors 2 detects that the liquid level in the pollutant removal component 1 reaches the liquid level line L, thereby discharging part of the liquid in the pollutant removal component 1 to the outside of the pollutant removal component 1. This avoids a liquid leakage accident caused by the liquid level in the pollutant removal component 1 exceeding the liquid level line L. This ensures that the exhaust gas treatment equipment 10 has a sufficient number of normally functioning liquid detection sensors 2, preventing a single liquid detection sensor 2 from malfunctioning and failing to accurately issue a drainage signal, thus avoiding a liquid leakage event in the pollutant removal component 1. Therefore, providing at least one liquid detection sensor 2 connected in parallel can ensure the operational stability of the exhaust gas treatment equipment 10 and ensure the overall industrial production safety. Therefore, the technical solution provided by this utility model embodiment can improve the operational reliability and stability of the exhaust gas treatment equipment 10.

[0041] To facilitate the removal of pollutants by using liquid, in one embodiment, the pollutant removal component 1 can be a water washing tank; the exhaust gas treatment device 10 is a water washing type exhaust gas treatment device.

[0042] Since liquid is used to remove pollutants from harmful exhaust gases, the pollutant removal component 1 can be a water washing tank, and the exhaust gas treatment equipment 10 can be a water washing type exhaust gas treatment equipment.

[0043] The water washing tank is an important component of water-washing exhaust gas treatment equipment. It provides a water source and removes particulate matter and residual harmful substances from the exhaust gas through a washing process.

[0044] In water-washing exhaust gas treatment equipment, harmful exhaust gases are first introduced into a water washing tank. Through contact between the liquid in the tank and the harmful exhaust gases, the harmful substances dissolve in the liquid, thereby purifying the exhaust gases. The water washing tank not only provides the water source needed for washing but also reduces water consumption through water recycling.

[0045] This includes water-washing exhaust gas treatment equipment with a washing tank, such as the aforementioned Scrubber equipment. Of course, water-washing exhaust gas treatment equipment can also be:

[0046] Combustion-water-washing exhaust gas treatment equipment: This equipment combines combustion and water washing technologies to treat flammable and water-soluble gases in exhaust gases, such as ammonia (NH3), silane (SiH4), and nitrogen trifluoride (NF3).

[0047] Electric heating water washing type exhaust gas treatment equipment: The process exhaust gas is heated by electric energy and decomposed at high temperature in the reaction chamber, so that the exhaust gas molecules are converted into various active particles and react to generate harmless substances such as water (H2O) and carbon dioxide (CO2). Then, the exhaust gas is washed, sprayed, atomized, cooled, and hydrolyzed by water washing tank.

[0048] Plasma water washing exhaust gas treatment equipment: This equipment uses a plasma generator to form a high-temperature plasma arc to ionize, bombard, and decompose the exhaust gas at high temperature, and then treats it through a water washing system such as rinsing, spraying, cooling, water dissolution and hydrolysis.

[0049] Scrubber: In four separate reaction chambers, the exhaust gas stream is sprayed with water. Solid byproducts are captured and dissolved by the water droplets, and then the scrubber separates the water from the outlet gas stream.

[0050] Water-washing exhaust gas treatment equipment involves the use of water washing tanks to capture and transform pollutants in harmful exhaust gases through physical or chemical methods, thereby reducing environmental pollution.

[0051] To facilitate the installation of the liquid level detection sensor, in one embodiment, the exhaust gas treatment equipment further includes: a mounting hole disposed on the side wall of the pollutant removal component at a position corresponding to the liquid level line, wherein the liquid detection sensor is disposed on the pollutant removal component through the mounting hole.

[0052] Please continue to refer to this. Figure 1 The exhaust gas treatment device 10 further includes:

[0053] Drain outlet 3 is provided on the pollutant removal component 1, and the location of the drain outlet 3 is lower than the location of the liquid level line L.

[0054] The drain outlet 3 can be used to discharge waste liquid generated after water washing treatment, which contains harmful substances and dust removed from harmful exhaust gases.

[0055] The drain outlet 3 is located on the contaminant removal component 1, and its position is below the liquid level line L, thereby facilitating the discharge of liquid. For example, the drain outlet 3 can be located at the bottom of the contaminant removal component 1. This allows the liquid to be discharged directly from the contaminant removal component 1, reducing the residence time of the liquid inside the contaminant removal component 1 and preventing harmful substances in the liquid from corroding or clogging the contaminant removal component 1.

[0056] Please continue to refer to this. Figure 1 To facilitate the protection of the various components in the exhaust gas treatment device 10, in one embodiment, the exhaust gas treatment device 10 further includes:

[0057] The housing 4 is provided with an exhaust gas inlet 41 for introducing harmful exhaust gases into the exhaust gas treatment device 10.

[0058] The exhaust gas inlet 41 can first introduce harmful exhaust gas into the exhaust gas treatment equipment 10, in preparation for the subsequent removal of pollutants.

[0059] To ensure the pollutant removal efficiency of the exhaust gas treatment equipment, in one embodiment, the exhaust gas treatment equipment further includes:

[0060] An adsorption device, located inside the housing, is used to adsorb pollutants in the harmful exhaust gas.

[0061] Adsorption devices typically use porous materials such as activated carbon and molecular sieves to effectively adsorb harmful substances in exhaust gases, such as sulfur dioxide and nitrogen oxides.

[0062] Harmful exhaust gases enter the exhaust gas treatment equipment 10 through exhaust gas inlet 41, and then enter the adsorption device. The adsorption device removes harmful substances such as organic solvents, acidic gases, and alkaline gases from the harmful exhaust gases through physical adsorption and chemical adsorption.

[0063] In one embodiment, the exhaust gas treatment device further includes:

[0064] A gas-water separator, located at the top of the housing, is used to separate the gas and water droplets processed by the pollutant removal component.

[0065] The gas-water separator operates after the pollutant removal component has completed pollutant removal. It can separate water and gas in the waste gas after it has been washed with water to remove the moisture it carries.

[0066] In order for the pollutant removal component to remove pollutants, in one embodiment, the pollutant removal component may include:

[0067] A water storage device, wherein the liquid level line is disposed on the side wall of the water storage device;

[0068] A spraying device is used to uniformly spray the liquid stored in the water storage device onto the pollutants adsorbed by the adsorption device, so as to achieve gas-liquid contact and removal of pollutants.

[0069] After being adsorbed, the harmful exhaust gases enter the pollutant removal component (also known as the water washing system). The pollutant removal component sprays liquid stored in the water storage device onto the adsorption device through a spraying device, causing the soluble pollutants in the harmful exhaust gases adsorbed by the adsorption device to dissolve in the liquid, thus achieving a purification effect.

[0070] In one embodiment, the exhaust gas treatment device further includes:

[0071] A pretreatment device is installed on the housing of the exhaust gas treatment device and connected to the exhaust gas inlet on the housing and the adsorption device. It is used to pretreat the harmful exhaust gas and transport the pretreated harmful exhaust gas into the adsorption device.

[0072] In some cases, harmful exhaust gases may require pretreatment to remove large particles and moisture. Pretreatment equipment can be devices such as bag filters or electrostatic precipitators.

[0073] In one embodiment, the exhaust gas treatment device further includes:

[0074] A control device, located outside the housing, is used to monitor the operating status of the exhaust gas treatment equipment and to adjust the operating conditions of the exhaust gas treatment equipment.

[0075] The control device can be integrated externally into the casing of the exhaust gas treatment equipment. The control device can be a standalone control cabinet or a control panel integrated with the exhaust gas treatment equipment. For example, a PLC (Programmable Logic Controller) touch panel design and human-machine interface control system can ensure the safe and efficient operation of the exhaust gas treatment equipment.

[0076] The control device monitors and adjusts the operating parameters of the exhaust gas treatment equipment in real time to ensure that the equipment operates effectively according to the designed parameters, while also guaranteeing operational safety and treatment efficiency.

[0077] This utility model embodiment also provides a semiconductor manufacturing equipment to ensure the stable operation of the semiconductor manufacturing process by ensuring the reliable and stable operation of the exhaust gas treatment equipment provided in the foregoing embodiment.

[0078] Please refer to Figure 3 , Figure 3 This is a schematic diagram of the structure of a semiconductor manufacturing equipment provided in an embodiment of this utility model.

[0079] like Figure 3 As shown, the semiconductor manufacturing equipment includes:

[0080] Exhaust gas treatment device 10 as described in any of the foregoing embodiments.

[0081] like Figure 3 As shown, in one embodiment, the semiconductor manufacturing equipment may further include:

[0082] Waste gas collection device 20 is used to capture and guide the generated harmful gases;

[0083] Pipeline 30 is connected to the waste gas collection device 20 and the exhaust gas treatment device 10, and is used to transport the harmful gas to the exhaust gas treatment device 10.

[0084] As can be seen, the technical solution provided by this utility model embodiment includes a tail gas treatment device 10 in the semiconductor manufacturing equipment. The tail gas treatment device 10 has at least one liquid detection sensor 2 connected in parallel at the liquid level line L of the contaminant removal component 1. Therefore, as long as one of the liquid detection sensors 2 detects that the liquid level in the contaminant removal component 1 reaches the liquid level line, it can send a drainage signal to discharge part of the liquid in the contaminant removal component 1 to the outside of the contaminant removal component 1, preventing liquid leakage accidents caused by the liquid level in the contaminant removal component 1 exceeding the liquid level line L. This ensures that the tail gas treatment device 10 has a sufficient number of normally functioning liquid detection sensors 2, preventing a single liquid detection sensor 2 from malfunctioning and failing to accurately send a drainage signal, thus avoiding liquid leakage events in the contaminant removal component 1. Therefore, setting at least one liquid detection sensor 2 connected in parallel can ensure the operational stability of the tail gas treatment device 10 and ensure the overall industrial production safety. Thus, the technical solution provided by this utility model embodiment can improve the operational reliability and stability of the tail gas treatment device 10.

[0085] The foregoing describes multiple embodiments of the present invention. The optional methods described in each embodiment can be combined and cross-referenced without conflict, thereby extending to a variety of possible embodiments. These can all be considered as embodiments disclosed or made public by the present invention.

[0086] While the embodiments of this utility model have been disclosed above, this utility model is not limited thereto. Any person skilled in the art can make various modifications and alterations without departing from the spirit and scope of this utility model; therefore, the scope of protection of this utility model should be determined by the scope defined in the claims.

Claims

1. A tail gas treatment device, characterized in that, include: A contaminant removal component, wherein a liquid level line is provided on the side wall of the contaminant removal component; The liquid level of the pollutant removal component is linked to the functional system of the exhaust gas treatment equipment; a certain amount of water is maintained inside the pollutant removal component for continuous circulation. At least one liquid detection sensor is disposed on the liquid level line, and the liquid detection sensors are connected in parallel; the liquid detection sensor is used to detect liquid in the contaminant removal component; when one of the liquid detection sensors detects that the liquid level reaches the liquid level line, a drainage signal is issued to drain part of the liquid to the outside of the contaminant removal component, so as to keep the liquid level in the contaminant removal component within the liquid level line; The liquid level detection sensor uses an insulating component to prevent electrical conduction between electrodes, thus preventing false alarms.

2. The exhaust gas treatment equipment as described in claim 1, characterized in that, Also includes: A drain outlet is provided on the contaminant removal component, and the location of the drain outlet is lower than the location of the liquid level line.

3. The exhaust gas treatment equipment as described in claim 2, characterized in that, Also includes: The housing is provided with an exhaust gas inlet for introducing harmful exhaust gases into the exhaust gas treatment equipment.

4. The exhaust gas treatment equipment as described in claim 3, characterized in that, Also includes: An adsorption device, located inside the housing, is used to adsorb pollutants in the harmful exhaust gas.

5. The exhaust gas treatment equipment as described in claim 4, characterized in that, Also includes: A gas-water separator, located at the top of the housing, is used to separate the gas and water droplets processed by the pollutant removal component.

6. The exhaust gas treatment equipment as described in claim 5, characterized in that, The pollutant removal component includes: A water storage device, wherein the liquid level line is disposed on the side wall of the water storage device; A spraying device is used to uniformly spray the liquid stored in the water storage device onto the pollutants adsorbed by the adsorption device, so as to achieve gas-liquid contact and removal of pollutants.

7. The exhaust gas treatment equipment as described in claim 6, characterized in that, Also includes: A pretreatment device is installed on the housing of the exhaust gas treatment device and connected to the exhaust gas inlet on the housing and the adsorption device. It is used to pretreat the harmful exhaust gas and transport the pretreated harmful exhaust gas into the adsorption device.

8. The exhaust gas treatment equipment as described in claim 6, characterized in that, Also includes: A mounting hole is provided on the side wall of the contaminant removal component at a position corresponding to the liquid level line, and the liquid detection sensor is installed on the contaminant removal component through the mounting hole.

9. The exhaust gas treatment equipment according to any one of claims 1-8, characterized in that, The pollutant removal component is a water washing tank; the exhaust gas treatment equipment is a water washing type exhaust gas treatment equipment.

10. The exhaust gas treatment equipment as described in claim 3, characterized in that, Also includes: A control device, located outside the housing, is used to monitor the operating status of the exhaust gas treatment equipment and to adjust the operating conditions of the exhaust gas treatment equipment.

11. A semiconductor manufacturing apparatus, characterized in that, include: The exhaust gas treatment device as described in any one of claims 1-10.

12. The semiconductor manufacturing equipment as described in claim 11, characterized in that, Also includes: Waste gas collection devices are used to capture and guide harmful gases generated. A pipeline, connected to the waste gas collection device and the exhaust gas treatment equipment, is used to transport the harmful gas to the exhaust gas treatment equipment.