Gas phase siliconizing splicing crucible tool

Abstract

The utility model discloses a gas phase siliconing splicing crucible tool, which belongs to the field of gas phase siliconing, and comprises a crucible bottom, a charging tray, a crucible cover and at least one crucible side wall, the crucible bottom is used for placing the charging tray, and at least three supporting nails are arranged in the crucible bottom; the charging tray is used for containing a gas-phase siliconizing raw material; the crucible side wall is used for adjusting the axial height of the crucible, and a supporting structure is arranged in the crucible side wall and used for supporting a product to be siliconized; a crucible cover is arranged at the upper end of the uppermost crucible side wall, and assembling steps matched with one another are arranged at the upper end of the crucible bottom, the two ends of the crucible side walls and the lower end of the crucible cover and used for rapid assembling of the crucible tool. According to the crucible tool, the splicing type structure is adopted, and the charging tray used for containing siliconizing raw materials is arranged in the crucible bottom, so that the manufacturing and using cost of the crucible tool is reduced, and the flexibility of the crucible tool for performing siliconizing operation on products of different structures and different specifications is improved.

Description

Technical Field

[0001] This utility model belongs to the field of vapor phase silicon infiltration, and specifically relates to a vapor phase silicon infiltration splicing crucible tooling. Background Technology

[0002] In the production of vapor-phase silicon carbide coatings, crucibles and their tooling play a crucial role. This process requires tooling materials to withstand high-temperature environments while possessing good chemical stability and thermal conductivity. Currently, graphite crucibles have become the mainstream choice in vapor-phase silicon infiltration processes due to their excellent high-temperature resistance and relatively low cost. However, traditional graphite crucible designs have some inherent limitations, particularly revealing several key issues in practical applications.

[0003] Specifically, the bottom inner surface of current mainstream graphite crucibles is designed as a flat structure, typically relying on supports to hold the product being processed. While this design seems simple and effective initially, its shortcomings become apparent as the process cycle progresses. After the process ends, unreacted silicon and generated silica often solidify unevenly at the bottom of the crucible, forming residues that are difficult to clean. These residues not only interfere with the accurate placement of supports in subsequent batches, affecting uniform heating and silicon infiltration, but also, due to the significant difference in thermal expansion coefficients between the graphite crucible and the solidified silicon, silica, and generated silicon carbide, long-term exposure can easily lead to cracking at the bottom of the crucible, thus shortening its lifespan.

[0004] Furthermore, the integral structure of traditional graphite crucibles means they use a large amount of material, and if any part of them breaks, the entire crucible is often unrepairable and must be scrapped, which greatly increases the cost of tooling. In the context of modern industry, which pursues efficient production and cost control, this high average cost has become a problem that urgently needs to be solved.

[0005] More importantly, as market demand for silicon carbide coated products diversifies, product specifications and structures become increasingly complex and varied, with different requirements for the support pin positions and the product's height above the raw material. Traditional monolithic graphite crucibles, due to their fixed structural design, struggle to meet these diverse process requirements, thus limiting their flexibility and applicability in a wider range of applications. Utility Model Content

[0006] The purpose of this invention is to overcome the shortcomings of the prior art and provide a vapor phase silicon infiltration splicing crucible tooling to solve the above-mentioned technical problems, reduce the cost of tooling use, and enhance the adaptability to products of different specifications.

[0007] To achieve the above objectives, the technical solution adopted by this utility model is as follows:

[0008] A vacuum-phase silicon infiltration splicing crucible fixture includes:

[0009] The crucible bottom is used to place the material tray, and the crucible bottom is provided with at least three support pins inside;

[0010] The tray is used to hold the vapor-phase silicate raw materials.

[0011] At least one crucible sidewall is provided for adjusting the axial height of the crucible. The crucible sidewall has a support structure inside for supporting the silicon-doped product. The uppermost crucible sidewall has a crucible cover at its upper end. The upper end of the crucible bottom, both ends of the crucible sidewall, and the lower end of the crucible cover have mutually cooperating assembly steps for quick assembly of the crucible tooling.

[0012] Furthermore, the support pin has a conical or triangular prism structure.

[0013] Furthermore, the crucible lid is provided with several through holes for vacuuming operations after the crucible tooling is assembled.

[0014] Furthermore, a radial expansion joint and an axial expansion joint are provided on one side of the assembly step to prevent excessive local thermal stress caused by uneven thermal expansion between the crucible bottom, crucible sidewall, and crucible cover, which could damage the crucible tooling.

[0015] Furthermore, the gap between the radial expansion joint and the axial expansion joint is 1mm-5mm.

[0016] Furthermore, the radial expansion joint and the axial expansion joint are located on the outer wall of the crucible tooling.

[0017] Furthermore, the support structure includes at least three transverse pillars, one end of which is threaded to the side wall of the crucible, and one end of which is provided with a needle-shaped support for supporting ring-shaped or cylindrical products.

[0018] Furthermore, the transverse support is provided with several adjustment blind holes, and the needle-shaped support pin is detachably installed in the adjustment blind holes for adjusting the position of the needle-shaped support pin according to the diameter of the ring or cylindrical product.

[0019] Furthermore, the support structure includes several crossbars for suspending the product to be infiltrated with silicon. Several stepped grooves of different depths are symmetrically provided on the side wall of the crucible. The two ends of the crossbars are placed in the stepped grooves. The crossbars have a circular or acute-angled isosceles triangle cross section.

[0020] The beneficial effects of this utility model are:

[0021] 1) This crucible fixture adopts a spliced ​​structure and has a material tray for placing siliconizing raw materials inside the crucible bottom. This not only reduces the manufacturing and use costs of the crucible fixture, but also improves the flexibility of the crucible fixture for siliconizing operations on products with different structures and specifications.

[0022] 2) The support pins adopt a conical or triangular prism structure, which reduces the contact area between the support pins and the material tray, and avoids the material tray and support pins being difficult to separate due to adhesion after the process.

[0023] 3) Several through holes for vacuuming are provided on the crucible lid, which helps to achieve a more uniform permeation process and thus generate a more uniform permeation layer.

[0024] 4) Radial expansion joints and axial expansion joints of 1mm-5mm are provided on the outside of the assembly steps to prevent excessive local thermal stress caused by uneven thermal expansion between the crucible bottom, crucible sidewall and crucible cover, which would damage the crucible tooling. This improves the structural stability of the crucible tooling during application and reduces the risk of tooling structure failure.

[0025] 5) Adjustable blind holes are provided on the transverse support columns of the supporting structure. The needle-shaped support pins are detachably installed in the adjustment blind holes, which makes it easy to adjust the position of the needle-shaped support pins according to the diameter of the ring or cylindrical products. Attached Figure Description

[0026] Appendix Figure 1 This is a schematic diagram of a gas-phase silicon infiltration splicing crucible tooling structure according to the present invention.

[0027] Appendix Figure 2 This is an exploded view of a vapor-phase silicate splicing crucible fixture according to this utility model.

[0028] Appendix Figure 3 This is a schematic diagram of the crucible bottom structure.

[0029] Appendix Figure 4 This is a schematic diagram of the crucible sidewall structure in Example 1.

[0030] Appendix Figure 5 yes Figure 4 Enlarged view of a portion of point A in the middle.

[0031] Appendix Figure 6 This is a schematic diagram of the crucible sidewall structure in Example 2.

[0032] Appendix Figure 7 This is a cross-sectional view of a vapor-phase silicate splicing crucible tooling according to the present invention.

[0033] Appendix Figure 8 yes Figure 7 Enlarged view of section B in the middle.

[0034] In the figure, 1 is the crucible bottom; 2 is the support pin; 3 is the material tray; 4 is the crucible side wall; 5 is the transverse support; 6 is the needle-shaped support pin; 7 is the adjustment blind hole; 8 is the stepped groove; 9 is the crossbar; 10 is the crucible cover; 11 is the through hole; 12 is the assembly step; 13 is the radial expansion joint; and 14 is the axial expansion joint. Detailed Implementation

[0035] The following will be combined with the appendix Figures 1-8 The technical solutions in the embodiments of this utility model are clearly and completely described herein. Obviously, the described embodiments are only some embodiments of this utility model, and not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of this utility model.

[0036] In the description of this utility model, it should be understood that the terms "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this utility model and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.

[0037] Example 1

[0038] like Figure 1 , Figure 2 As shown, a vapor-phase silicon infiltration splicing crucible fixture includes a crucible bottom 1, a material tray 3, a crucible lid 10, and at least one crucible sidewall 4. The crucible bottom 1 is used to place the material tray 3, as shown. Figure 3 As shown, at least three support pins 2 are provided inside the crucible bottom 1 to prevent the material tray 3 from being difficult to separate from the crucible bottom 1 due to adhesion after the silicon diffusion process is completed; the height of the crucible bottom 1 is minimized as much as possible to reduce the amount of cutting during the preparation of the crucible bottom 1, reduce material waste, and improve the preparation efficiency of the crucible bottom 1. In addition, the side of the crucible bottom 1 is provided with rounded corners between it and the ground to enhance the structural strength of the crucible bottom 1.

[0039] The tray 3 is used to hold the vapor phase silicon infiltration material, which avoids placing the silicon infiltration material directly on the crucible bottom 1, causing residue to solidify on the crucible bottom 1; the internal depth of the tray 3 is flexibly set according to the volume of material used in the process. Compared with the crucible bottom 1, the tray 3 has a simple structure, uses less material, and has a low cost, and can be used as a consumable.

[0040] The crucible sidewall 4 is used to adjust the axial height of the crucible. The crucible sidewall 4 has an internal support structure to support the silicon-doped product, increasing the space for vapor-phase silicon doping. Figure 1 , Figure 2 As shown, the uppermost side wall 4 of the crucible is provided with a crucible lid 10, as... Figure 3 , Figure 4 , Figure 6As shown, the upper end of the crucible bottom 1, both ends of the crucible side wall 4, and the lower end of the crucible cover 10 are provided with mutually cooperating assembly steps 12 for quick assembly of the crucible tooling.

[0041] During the silicon diffusion process, the material tray 3 is placed on the support pins 2 inside the crucible bottom 1, and the silicon diffusion material is placed inside the material tray 3. Then, according to the quantity and specifications of the product, the corresponding number of crucible sidewalls 4 are selected and stacked on the upper part of the crucible bottom 1. The product to be silicon diffused is placed on the support structure of the sidewalls. Finally, the crucible lid 10 is covered to carry out the silicon diffusion process. This not only reduces the manufacturing and use costs of the crucible fixture, but also improves the flexibility of the crucible fixture for silicon diffusion of products with different structures and specifications.

[0042] The support pin 2 has a conical or triangular prism structure, such as... Figure 3 As shown, in this embodiment, the support pin 2 adopts a conical structure, which reduces the contact area between the support pin 2 and the material tray 3, and avoids the material tray 3 and the support pin 2 being difficult to separate due to adhesion after the process is completed.

[0043] like Figure 2 As shown, the crucible cover 10 is provided with several through holes 11 for vacuuming operation after the crucible tooling is assembled, which helps to achieve a more uniform permeation process and thus generate a more uniform permeation layer.

[0044] like Figure 8 As shown, the assembly step 12 is provided with a radial expansion joint 13 and an axial expansion joint 14 on one side to prevent the crucible tooling from being damaged by excessive local thermal stress caused by uneven thermal expansion between the crucible bottom 1, the crucible side wall 4 and the crucible cover 10. This improves the structural stability of the crucible tooling during application and reduces the risk of tooling structure failure.

[0045] Preferably, the gap between the radial expansion joint 13 and the axial expansion joint 14 is 1mm-5mm.

[0046] like Figure 7 , Figure 8 As shown, the radial expansion joint 13 and the axial expansion joint 14 are located on the outer wall of the crucible fixture, so that the assembly step 12 forms an inner pressure sealing structure to prevent the gas inside the crucible fixture from corroding the structurally weak area near the sealing surface (the outer surface of the radial expansion joint 13 and the axial expansion joint 14).

[0047] like Figure 4 As shown, the support structure includes at least three transverse pillars 5. One end of each transverse pillar 5 is threaded to the side wall 4 of the crucible, and one end of each transverse pillar 5 is provided with a needle-shaped support 6 for supporting ring-shaped or cylindrical products.

[0048] like Figure 5As shown, the transverse support 5 is provided with a plurality of adjustment blind holes 7, and the needle-shaped support 6 is detachably installed in the adjustment blind holes 7 for adjusting the position of the needle-shaped support 6 according to the diameter of the ring or cylindrical product.

[0049] Example 2

[0050] like Figure 6 As shown, the support structure includes several crossbars 9 for suspending the product to be infiltrated with silicon. Several stepped grooves 8 of different depths are symmetrically provided on the side wall 4 of the crucible. The two ends of the crossbars 9 are placed in the stepped grooves 8. The cross section of the crossbars 9 is a circle or an acute-angled isosceles triangle.

[0051] like Figure 7 As shown, the crucible sidewall 4 of Example 1 and the crucible sidewall 4 of Example 2 can be used in combination according to the structure of the product. When the crucible sidewall 4 of Example 1 and the crucible sidewall 4 of Example 2 can be used in combination, the crossbars 9 inside the crucible sidewall 4 of Example 2 are staggered vertically to ensure the silicon diffusion effect of the product.

[0052] The above description is merely an example and illustration of the structure of this utility model. Those skilled in the art can make various modifications or additions to the specific embodiments described or use similar methods to replace them, as long as they do not deviate from the structure of the utility model or exceed the scope defined in the claims, they should all fall within the protection scope of this utility model.

Claims

1. A tooling for splicing vapor-phase silicon infiltration crucibles, characterized in that, include: The crucible bottom (1) is used to place the material tray (3), and the crucible bottom (1) is provided with at least three support nails (2); The tray (3) is used to hold the vapor phase silicate raw material; At least one crucible sidewall (4) is provided for adjusting the axial height of the crucible. The crucible sidewall (4) is provided with a support structure inside for supporting the silicon product to be infiltrated. The uppermost crucible sidewall (4) is provided with a crucible cover (10). The upper end of the crucible bottom (1), both ends of the crucible sidewall (4) and the lower end of the crucible cover (10) are provided with mutually cooperating assembly steps (12) for quick assembly of the crucible tooling.

2. The tooling for a vapor-phase silicate splicing crucible according to claim 1, characterized in that, The support pin (2) has a conical or triangular prism structure.

3. The tooling for a vapor-phase silicate splicing crucible according to claim 1, characterized in that, The crucible lid (10) is provided with several through holes (11) for vacuuming after the crucible tooling is assembled.

4. The tooling for a vapor-phase silicate splicing crucible according to claim 1, characterized in that, The assembly step (12) is provided with a radial expansion joint (13) and an axial expansion joint (14) on one side to prevent the crucible tooling from being damaged due to excessive local thermal stress caused by uneven thermal expansion between the crucible bottom (1), crucible sidewall (4) and crucible cover (10).

5. The tooling for a vapor-phase silicate splicing crucible according to claim 4, characterized in that, The gap between the radial expansion joint (13) and the axial expansion joint (14) is 1mm-5mm.

6. The tooling for a vapor-phase silicate splicing crucible according to claim 4, characterized in that, The radial expansion joint (13) and axial expansion joint (14) are located on the outer wall of the crucible fixture.

7. A vapor-phase silicate splicing crucible fixture according to any one of claims 1-6, characterized in that, The support structure includes at least three transverse pillars (5), one end of which is threaded to the side wall (4) of the crucible, and one end of which is provided with a needle-shaped support (6) for supporting ring-shaped or cylindrical products.

8. The tooling for a vapor-phase silicate splicing crucible according to claim 7, characterized in that, The transverse support (5) is provided with several adjustment blind holes (7), and the needle-shaped support (6) is detachably installed in the adjustment blind holes (7) for adjusting the position of the needle-shaped support (6) according to the diameter of the ring or cylindrical product.

9. A vacuum-phase silicate splicing crucible fixture according to any one of claims 1-6, characterized in that, The support structure includes several crossbars (9) for suspending the product to be infiltrated with silicon. Several stepped grooves (8) of different depths are symmetrically provided on the side wall (4) of the crucible. The two ends of the crossbars (9) are placed in the stepped grooves (8). The crossbars (9) have a circular or acute-angled isosceles triangle cross section.

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