Chemical treatment equipment

Abstract

The utility model relates to chemical treatment equipment, including process tank, auxiliary tank and pipeline component, the process tank extends along the first direction, the process tank and the auxiliary tank are arranged in order along the second direction perpendicular to the first direction, the process tank and the auxiliary tank are connected through the liquid supply component, the pipeline component is connected with the auxiliary tank through the liquid supply component, and the pipeline component is connected with the process tank through the liquid supply component. The pipeline assembly is connected to the side part, far away from the process tank, of the auxiliary tank, and the pipeline assembly and the process tank are arranged at an interval in the second direction, so that a maintenance channel is formed between the process tank and the pipeline assembly; operators can enter the maintenance channel to carry out maintenance operation on the side, close to the auxiliary tank, of the process tank, so that the operable width of the chemical treatment tank is widened, multiple groups of products to be processed can be conveyed at the same time for chemical treatment, and the yield of single chemical treatment equipment is remarkably improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to a kind of chemical treatment equipment. BACKGROUND

[0002] Chemical treatment tank is usually used to contain chemical liquid, to carry out chemical treatment to the product to be processed. For example, in the process of photovoltaic cell piece processing, it needs to be processed by electroplating, and in the process of processing, the cell piece to be electroplated needs to be immersed in the chemical treatment tank containing electroplating solution to carry out electroplating processing. Some auxiliary devices in the chemical treatment process need to be arranged near the chemical treatment tank, such as a sub-tank and a pipeline system need to be arranged to supplement the electroplating liquid into the chemical treatment tank, and an exhaust device needs to be arranged to exhaust harmful gas generated in the electroplating process. In this way, one side of the chemical treatment tank is usually blocked or closed, and the maintenance personnel cannot maintain the chemical treatment tank on that side. In addition, the chemical treatment tank is usually set to a small width, so that the output of a single chemical treatment equipment is limited. SUMMARY

[0003] The utility model aims at overcoming the defects of prior art, and provides a new chemical treatment equipment.

[0004] To achieve the above-mentioned purpose, the utility model adopts the technical scheme of: a chemical treatment equipment, the chemical treatment equipment includes process tank, sub-tank and pipeline assembly, the process tank extends along the first direction, the process tank and the sub-tank are sequentially arranged in the second direction perpendicular to the first direction, the process tank and the sub-tank are connected by liquid supply assembly, the pipeline assembly is connected to the side of the sub-tank away from the process tank, and the pipeline assembly is spaced apart from the process tank in the second direction, so as to form a maintenance channel between the process tank and the pipeline assembly.

[0005] In some embodiments, the chemical treatment equipment further includes a base with a device cavity, a partition plate is arranged in the base, the partition plate separates the device cavity into a main chamber and a sub-chamber along the second direction, the process tank is arranged in the main chamber, the sub-tank and the pipeline assembly are arranged in the sub-chamber, and the pipeline assembly is spaced apart from the partition plate.

[0006] In some embodiments, the chemical treatment equipment further includes an exhaust device, the exhaust device is arranged on the base and located above the main chamber, and the exhaust port of the exhaust device is in airflow communication with the main chamber and the sub-chamber, respectively.

[0007] In some embodiments, the machine base is provided with a mounting space above the main cavity, and the machine base is provided with a first baffle and a second baffle, the first baffle and the second baffle cooperated with the upper portion of the machine base to form the mounting space, and the air suction device is arranged in the mounting space, the mounting space is in air flow communication with the main cavity through the first baffle and in air flow communication with the auxiliary cavity through the second baffle.

[0008] In some embodiments, the first baffle and the second baffle are respectively connected to the upper portion of the partition plate, the first baffle extends in the horizontal direction, and the second baffle gradually extends upward from the upper end of the partition plate in the second direction away from the main cavity.

[0009] In some embodiments, the air suction port of the air suction device is arranged at a distance from the second baffle in the second direction, so that an air suction area is formed between the air suction device and the second baffle, and a plurality of through holes are arranged on the first baffle in the air suction area to communicate the air suction area and the main cavity.

[0010] In some embodiments, the chemical processing device further comprises a rectifier arranged in the mounting space, and the rectifier is arranged on the side of the air suction device away from the air suction port.

[0011] In some embodiments, the partition plate is movably arranged on the machine base, and an operation passage is formed between the main cavity and the auxiliary cavity when the partition plate is displaced relative to the machine base.

[0012] Alternatively, an operation window is arranged on the partition plate, and a partition member is movably arranged on the partition plate, the partition member can shield or expose the operation window.

[0013] In some embodiments, the liquid supply assembly is arranged in the main cavity below the process tank, and / or the pipeline assembly comprises a filter device and a main pipeline, the filter device and the main pipeline are arranged above the auxiliary tank and connected to the auxiliary tank.

[0014] In some embodiments, the chemical processing device is an electroplating device.

[0015] With the technical scheme, the chemical treatment equipment has the following advantages: the pipeline assembly is arranged on the side of the auxiliary groove away from the process groove, so that a maintenance channel is formed between the pipeline assembly and the process groove, an operator can enter the maintenance channel to perform maintenance operation on the side of the process groove close to the auxiliary groove, the operable width of the chemical treatment groove is widened, a plurality of groups of products to be processed can be simultaneously transmitted for chemical treatment, and the output of a single chemical treatment equipment is significantly improved. BRIEF DESCRIPTION OF DRAWINGS

[0016] In order to more clearly illustrate the technical scheme of the present application, the drawings used in the embodiments will be briefly introduced as follows. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative effort.

[0017] Figure 1 FIG. 1 is a perspective view of a chemical treatment groove according to an embodiment of the present application;

[0018] Figure 2 FIG. 2 is another perspective view of the chemical treatment groove according to the embodiment of the present application; Figure 1

[0019] Figure 3 FIG. 3 is a front view of the chemical treatment groove according to the embodiment of the present application; Figure 1

[0020] Figure 4 FIG. 4 is a rear view of the chemical treatment groove according to the embodiment of the present application; Figure 1

[0021] Figure 5 FIG. 5 is a left view of the chemical treatment groove according to the embodiment of the present application; Figure 1

[0022] Figure 6 FIG. 6 is a right view of the chemical treatment groove according to the embodiment of the present application; Figure 1 In the above drawings:

[0023] 1, base; 11, first baffle; 12, second baffle; 1A, main chamber; 1B, auxiliary chamber; 1C, maintenance channel; 1D, suction area; 13, front door; 14, rear door; 15, operation panel;

[0024] 2, process groove; 3, auxiliary groove;

[0025] 4, liquid supply assembly; 41, connecting pipe; 42, liquid pump;

[0026]

[0027] ​​​​​5, pipeline assembly; 51, filtering device; 52, main pipeline;

[0028] 6, partition; 7, air extraction device; 8, rectifier; 9, control cabinet. DETAILED DESCRIPTION

[0029] The preferred embodiments of the present application will be described in detail with reference to the drawings, so that the advantages and features of the present application can be more easily understood by those skilled in the art. It should be noted that the description of these embodiments is used to help understand the present application, but does not constitute a limitation on the present application. In addition, the technical features involved in each embodiment of the present application described below can be combined with each other as long as they do not conflict with each other.

[0030] In this paper, the terms "upper", "lower" and the like indicate the orientation or position relationship based on the orientation or position relationship shown when the chemical treatment equipment is working, and are only used to facilitate the description of the present application and simplify the description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application.

[0031] Figures 1 to 6 The drawings are drawn to scale, and in order to maintain the brevity of the specification, the proportions of the elements are not listed one by one, but the proportions and positions of the elements should be considered as part of the content of the specification.

[0032] Referring to Figures 1 to 6 A chemical treatment equipment is shown in the drawings, which includes a process tank 2, a secondary tank 3 and a pipeline assembly 5, wherein the process tank 2 is used to contain chemical treatment liquid for chemical treatment of products to be processed inserted therein. The process tank 2 extends along a first direction, and the products to be processed are usually transmitted into the process tank 2 along the first direction for chemical treatment, and are transmitted out of the process tank 2 along the first direction after the treatment is completed. The secondary tank 3 is mainly used to contain replenishing liquid to replenish the chemical treatment liquid in the process tank 2 when needed, so that the liquid level or the concentration of chemical medicine in the process tank 2 is controlled within a set range. The process tank 2 and the secondary tank 3 are arranged in sequence along a second direction, which is perpendicular to the first direction, and both the first direction and the second direction are horizontal directions. The process tank 2 and the secondary tank 3 are connected by a liquid supply assembly 4, which at least includes a connecting pipe 41 and a liquid pump 42, so that the chemical treatment liquid can be supplied from the secondary tank 3 to the process tank 2.

[0033] The pipeline assembly 5 mainly comprises necessary pipeline groups and treatment devices in the chemical treatment equipment, and is connected to the side of the auxiliary tank 3 away from the process tank 2. The pipeline assembly 5 is spaced apart from the process tank 2 in the second direction, so that a maintenance channel 1C is formed between the process tank 2 and the pipeline assembly 5. Thus, the operator can directly enter the maintenance channel 1C to perform maintenance operation on the inner side of the process tank 2 (i.e. the side of the process tank 2 close to the auxiliary tank 3). Therefore, the operator can conveniently perform maintenance on any side of the process tank 2, and the maintenance is more convenient. The operator can not be blocked by the pipeline assembly 5 to perform maintenance operation on the inner side of the process tank 2.

[0034] The pipeline assembly 5 at least comprises a filtering device 51 and a main pipeline 52, which are respectively arranged above the auxiliary tank 3 and connected to the auxiliary tank 3, for filtering treatment of the chemical treatment liquid and supplying liquid, etc. In some embodiments, the pipeline assembly 5 further comprises devices such as waste discharge device, circulation device, etc. These pipeline assemblies 5 are arranged on the side of the auxiliary tank 3 away from the process tank 2, so that a certain distance is formed between the pipeline assembly 5 and the process tank 2, thereby ensuring that a maintenance channel 1C for the operator to enter and exit can be formed therebetween.

[0035] Specifically, referring to the drawings, the chemical treatment equipment further comprises a base 1 having an equipment cavity, and a partition plate 6 is arranged in the base 1. The partition plate 6 divides the equipment cavity into a main chamber 1A and an auxiliary chamber 1B in the second direction. The process tank 2 is arranged in the main chamber 1A, and the liquid supply assembly 4 is also arranged in the main chamber 1A and located below the process tank 2. The auxiliary tank 3 and the pipeline assembly 5 are arranged in the auxiliary chamber 1B, and the pipeline assembly 5 is spaced apart from the partition plate 6. A maintenance channel 1C is formed between the partition plate 6 and the pipeline assembly 5.

[0036] During the processing, the exhaust gas generated by the process tank 2 cannot enter the auxiliary chamber 1B due to the blocking of the partition plate 6, which is beneficial to avoid the escape of the exhaust gas generated during production. When maintenance operation is needed on the inner side of the process tank 2, the operator can directly enter the maintenance channel 1C and open or pass through the partition plate 6 to perform maintenance on the inner side of the process tank 2.

[0037] Specifically, the partition plate 6 is movably arranged on the base 1. When the partition plate 6 is displaced relative to the base 1, an operation channel is formed between the main chamber 1A and the auxiliary chamber 1B. The operator can reach the inner side of the process tank 2 through the operation channel to perform maintenance operation. Alternatively, an operation window can be additionally formed on the partition plate 6. A blocking member (not shown in the drawings) is movably arranged on the partition plate 6. The blocking member can block or expose the operation window. When maintenance operation is needed, the operator opens the blocking member and performs maintenance operation on the inner side of the process tank 2 through the operation window.

[0038] The chemical processing equipment also includes an exhaust device 7, which is installed on the base 1 and located above the main chamber 1A. The exhaust port of the exhaust device 7 is connected to the main chamber 1A and the auxiliary chamber 1B respectively. In this way, when the exhaust device 7 is working, it can simultaneously exhaust the main chamber 1A and the auxiliary chamber 1B, so that the gas in the equipment cavity is discharged, preventing the gas generated during the processing from escaping to the outside of the chemical processing equipment, and ensuring the cleanliness of the airflow in the maintenance channel 1C.

[0039] Specifically, the base 1 has an installation space located above the main chamber 1A. A first baffle 11 and a second baffle 12 are fixed on the base 1, and the first baffle 11 and the second baffle 12 cooperate with the upper part of the base 1 to form the aforementioned installation space. The exhaust device 7 is installed in this installation space, and this installation space is in airflow communication with the main chamber 1A through the first baffle 11 and with the auxiliary chamber 1B through the second baffle 12.

[0040] Here, the first baffle 11 and the second baffle 12 are respectively connected to the upper part of the partition 6. The first baffle 11 extends horizontally, and the second baffle 12 extends upward from the upper end of the partition 6 along a second direction away from the main chamber 1A. The exhaust port of the exhaust device 7 faces the second baffle 12 and is spaced apart from the second baffle 12 in the second direction, which forms an exhaust zone 1D between the exhaust device 7 and the second baffle 12. The first baffle 11 located in the exhaust zone 1D has multiple through holes to connect the exhaust zone 1D with the main chamber 1A; the second baffle 12 is densely covered with through holes to connect the exhaust zone 1D with the auxiliary chamber 1B. In this way, when the exhaust device 7 is working, the airflow in both the main chamber 1A and the auxiliary chamber 1B can be drawn out by the exhaust device 7.

[0041] The chemical treatment equipment also includes a rectifier 8, which is used to regulate the operating current of the chemical treatment equipment. The rectifier 8 is also located within the aforementioned installation space, and is positioned on the side of the exhaust device 7 away from the exhaust port. The airflow drawn by the exhaust device 7 is discharged towards the rectifier 8, which also serves to cool the rectifier 8 and prevent it from overheating. Furthermore, the rectifier 8 is positioned close to the front of the base 1, and an operation panel 15 can be installed above the front of the base 1 for direct operation and monitoring of the rectifier 8's operating parameters. The chemical treatment equipment also includes a control cabinet 9, which is located above the auxiliary tank 3 and away from the main chamber 1A in a second direction. Specifically, it can be located on the upper rear side of the base 1 to avoid contact with the chemical treatment liquid and to facilitate electrical connections between various electrical components.

[0042] The base 1 is in the form of a box cabinet, and a front door 13 is arranged on the front side and a rear door 14 is arranged on the rear side, opening the front door 13 can perform maintenance operation on the outside of the process tank 2, passing through the maintenance passage 1C can perform maintenance operation on the inside of the process tank 2, and opening the rear door 14 can perform maintenance on the pipeline assembly 5.

[0043] The chemical processing equipment can be electroplating equipment or other equipment that needs to use chemical liquid to process the products to be processed, and the width of the process tank 2 of the chemical processing equipment in the second direction can be designed to be wider, so that multiple groups of products to be processed can be chemically processed at the same time, and the output of a single equipment can be greatly improved.

[0044] In summary, the chemical processing equipment has a simple overall layout, and the operator can conveniently maintain the two sides of the process tank 2, which can widen the operable width of the chemical processing tank, can simultaneously transport multiple groups of products to be processed for chemical processing, and significantly improves the output of a single chemical processing equipment.

[0045] It can be understood that the terms "first", "second" and the like are used to describe various information, but these information should not be limited to these terms. These terms are only used to distinguish the same type of information from each other, and do not indicate a particular order or importance. In fact, the expressions of "first", "second" and the like can be completely interchangeable. For example, the first information can also be referred to as the second information, and similarly, the second information can also be referred to as the first information without departing from the scope of the present disclosure.

[0046] The above embodiments are only for illustrating the technical concept and characteristics of the present application, and the purpose is to enable those skilled in the art to understand the content of the present application and to implement it, and cannot limit the protection scope of the present application. Any equivalent changes or modifications made according to the essence of the present application shall be covered within the protection scope of the present application.

Claims

1. A chemical processing apparatus, characterized by: The chemical treatment equipment comprises a process tank, a sub-tank and a pipeline assembly, the process tank extends along a first direction, the process tank and the sub-tank are sequentially arranged along a second direction perpendicular to the first direction, the process tank and the sub-tank are connected through a liquid supply assembly, the pipeline assembly is connected to a side of the sub-tank away from the process tank, and the pipeline assembly is spaced apart from the process tank in the second direction, so that a maintenance channel is formed between the process tank and the pipeline assembly.

2. The chemical processing apparatus of claim 1, wherein: The chemical treatment equipment further comprises a base with an equipment cavity, a partition plate is arranged in the base, the partition plate divides the equipment cavity into a main cavity and a sub-cavity along the second direction, the process tank is arranged in the main cavity, the sub-tank and the pipeline assembly are arranged in the sub-cavity, and the pipeline assembly is spaced apart from the partition plate.

3. The chemical processing apparatus of claim 2, wherein: The chemical treatment equipment further comprises an air extraction device, the air extraction device is arranged on the base and above the main cavity, and an air extraction opening of the air extraction device is in airflow communication with the main cavity and the sub-cavity, respectively.

4. The chemical processing apparatus of claim 3, wherein: The base is provided with a mounting space above the main cavity, and the base is fixedly provided with a first baffle and a second baffle, the first baffle and the second baffle cooperatively form the mounting space with an upper portion of the base, The air extraction device is arranged in the mounting space, the mounting space is in airflow communication with the main cavity through the first baffle and in airflow communication with the sub-cavity through the second baffle.

5. The chemical processing apparatus of claim 4, wherein: The first baffle and the second baffle are respectively connected to an upper portion of the partition plate, wherein the first baffle extends along a horizontal direction, and the second baffle gradually extends upward and away from the main cavity along the second direction from an upper end of the partition plate.

6. The chemical processing apparatus of claim 4, wherein: The air extraction opening of the air extraction device is spaced apart from the second baffle in the second direction, so that an air extraction area is formed between the air extraction device and the second baffle, and a plurality of through holes are formed in the first baffle in the air extraction area to connect the air extraction area and the main cavity.

7. The chemical processing apparatus of claim 4, wherein: The chemical treatment equipment further comprises a rectifier arranged in the mounting space and on a side of the air extraction device away from the air extraction opening.

8. The chemical processing apparatus of claim 2, wherein: The partition plate is movably arranged on the base, and an operation channel is formed between the main cavity and the sub-cavity when the partition plate is displaced relative to the base. Alternatively, an operation window is formed in the partition plate, and a blocking member is movably arranged on the partition plate, and the blocking member can shield or expose the operation window.

9. The chemical processing apparatus of claim 2, wherein: The liquid supply assembly is arranged in the main cavity and below the process tank, and / or the pipeline assembly comprises a filter device and a main pipeline, and the filter device and the main pipeline are arranged above the sub-tank and connected to the sub-tank.

10. The chemical processing apparatus of any one of claims 1 to 9, wherein: The chemical treatment equipment is an electroplating equipment.

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