Gas purification system

Abstract

The utility model provides a gas purification system. The gas purification system comprises a gas supply device, a pretreatment device and three adsorption devices, the gas supply device is used for providing a gas to be treated. The pretreatment device is connected with the gas supply device. The pretreatment device is sequentially connected with the three adsorption devices, wherein each of the three adsorption devices comprises a first tubular adsorption unit, a second tubular adsorption unit and two heating units. The second tubular adsorption unit is connected with the first tubular adsorption unit, and the first tubular adsorption unit and the second tubular adsorption unit are alternately in an adsorption state and a regeneration state. The two heating units are adjacent to the first tubular adsorption unit and the second tubular adsorption unit respectively. Therefore, the high-purity target gas can be separated from the to-be-treated gas, and the target gas can be recycled.

Description

Technical Field

[0001] This invention provides a gas purification system, specifically a gas purification system that uses three adsorption devices to sequentially process a gas to be treated. Background Technology

[0002] Industrial processes such as semiconductors and optoelectronics often generate large amounts of waste gas, which contains components such as hydrogen and ammonia, both of which are important raw materials for production. Therefore, if target gases such as hydrogen and ammonia can be separated and purified from waste gas, it can not only reduce resource waste but also significantly reduce production costs.

[0003] Conventional technology uses pressure swing adsorption (PSA) to purify target gases from waste gas. In PSA systems, two adsorption towers filled with adsorbent material are typically used, and the adsorption or desorption of the adsorbent material is controlled by changing the pressure. However, PSA often struggles to completely remove impurities from the adsorbent material, resulting in less than ideal purity of the purified target gas.

[0004] In view of this, improving the purity of the target gas obtained through purification has become the goal of relevant industry players. Utility Model Content

[0005] One embodiment of the present invention provides a gas purification system, comprising a gas supply device, a pretreatment device, and a three-adsorption device. The gas supply device provides a gas to be treated. The pretreatment device is connected to the gas supply device and is used to filter out a solid particle and a water-soluble impurity from the gas to be treated. The pretreatment device and the three-adsorption device are connected sequentially, each of the three adsorption devices comprising a first tubular adsorption unit, a second tubular adsorption unit, and two heating units. The second tubular adsorption unit is connected to the first tubular adsorption unit, and the first and second tubular adsorption units alternately exist in an adsorption state and a regeneration state. The two heating units are respectively disposed adjacent to the first and second tubular adsorption units.

[0006] According to the gas purification system of the aforementioned embodiments, the three adsorption devices can be a first adsorption device, a second adsorption device, and a third adsorption device, respectively. The first adsorption device is connected to the pretreatment device, the second adsorption device is connected to the first adsorption device, and the third adsorption device is connected to the second adsorption device.

[0007] According to the gas purification system of the aforementioned embodiments, the first tubular adsorption unit and the second tubular adsorption unit of the first adsorption device can be used to filter out water vapor in the gas to be treated.

[0008] According to the gas purification system of the aforementioned embodiments, the materials of the first tubular adsorption unit and the second tubular adsorption unit of the first adsorption device may include activated carbon, carbon molecular sieve, activated alumina, zeolite, silica gel molecular sieve, aerogel, metal-organic framework molecular sieve, covalent organic framework molecular sieve, bentonite, sepiolite, boron group element materials, nitrogen group element materials or lithium-type molecular sieve.

[0009] According to the gas purification system of the aforementioned embodiments, the first tubular adsorption unit of the second adsorption device and the second tubular adsorption unit of the second adsorption device can be used to filter out a volatile organic compound, a perfluorinated compound, ammonia, or a sulfide-containing gas from the gas to be treated.

[0010] According to the gas purification system of the aforementioned embodiments, the materials of the first tubular adsorption unit of the second adsorption device and the second tubular adsorption unit of the second adsorption device may include activated carbon, carbon molecular sieve, zeolite, silica gel molecular sieve, aerogel, metal-organic framework molecular sieve, covalent organic framework molecular sieve, bentonite, sepiolite, boron group element materials, nitrogen group element materials or lithium type molecular sieve.

[0011] According to the gas purification system of the aforementioned embodiments, the first tubular adsorption unit and the second tubular adsorption unit of the third adsorption device can be used to filter out carbon dioxide, carbon monoxide, methane, nitrogen or oxygen from the gas to be treated.

[0012] According to the gas purification system of the aforementioned embodiments, the materials of the first tubular adsorption unit of the third adsorption device and the second tubular adsorption unit of the third adsorption device may include activated carbon, carbon molecular sieve, zeolite, metal-organic framework molecular sieve, covalent organic framework molecular sieve, bentonite, sepiolite, boron group element materials, nitrogen group element materials or lithium type molecular sieve.

[0013] According to the gas purification system of the aforementioned embodiments, the material of the first tubular adsorption unit of the third adsorption device and the material of the second tubular adsorption unit of the third adsorption device may further include a metal ion, a metal particle or a catalyst material.

[0014] In the gas purification system according to the foregoing embodiments, the aforementioned metal particles may be silver particles, copper particles, carbon particles, or titanium particles.

[0015] According to the gas purification system of the aforementioned embodiment, the porosity of the three first tubular adsorption units of the aforementioned three adsorption devices can be 20% to 80%, and the porosity of the three second tubular adsorption units of the aforementioned three adsorption devices can be 20% to 80%.

[0016] According to the gas purification system of the aforementioned embodiment, the specific surface area of ​​the three first tubular adsorption units of the aforementioned three adsorption devices can be greater than 2000 m². 2 / m 3 The specific surface area of ​​the three second tubular adsorption units in the aforementioned three-adsorption device can be greater than 2000 m². 2 / m 3 .

[0017] According to the gas purification system of the aforementioned embodiment, each of the three adsorption devices may further include a gas driving unit. The gas driving unit connects the first tubular adsorption unit and the second tubular adsorption unit.

[0018] In the gas purification system according to the foregoing embodiments, the gas driving unit may be a blower or a vacuum motor.

[0019] According to the gas purification system of the aforementioned embodiments, the inlet pressure of the gas purification system can be greater than 1 atm.

[0020] According to the gas purification system of the aforementioned embodiment, each of the three adsorption devices may further include two control units. The two control units are respectively connected to two heating units.

[0021] Therefore, this novel gas purification system, by comprising a gas supply device, a pretreatment device, and a three-adsorption device, wherein each of the three adsorption devices includes a first tubular adsorption unit, a second tubular adsorption unit, and two heating units, can separate high-purity target gas from the gas to be treated, thereby realizing the reuse of the target gas. Attached Figure Description

[0022] To make the above and other objects, features, advantages and embodiments of this invention more apparent and understandable, the accompanying drawings are described below:

[0023] Figure 1 This is a schematic diagram illustrating a gas purification system according to one embodiment of the present invention; and

[0024] Figure 2 This is a schematic diagram illustrating a gas purification system according to another embodiment of the present invention.

[0025] The reference numerals in the attached figures are explained as follows:

[0026] 100, 200: Gas purification system

[0027] 101, 201: Gases to be processed

[0028] 102, 202: First purified gas

[0029] 103, 203: Second purified gas

[0030] 104, 204: Product gases

[0031] 105, 205: Extraction gas

[0032] 106, 206: Impurity gases

[0033] 110, 210: Gas supply devices

[0034] 120, 220: Pretreatment devices

[0035] 130: Adsorption device

[0036] 131, 231, 241, 251: First tubular adsorption unit

[0037] 132, 232, 242, 252: Second tubular adsorption unit

[0038] 133: Heating unit

[0039] 221: Gas washing equipment

[0040] 222: Freeze-drying equipment

[0041] 230: First adsorption device

[0042] 233a, 243a, 253a: First heating unit

[0043] 233b, 243b, 253b: Second heating unit

[0044] 234, 244, 254: Exhaust ports

[0045] 235, 245, 255: Gas-driven units

[0046] 236a, 246a, 256a: First control unit

[0047] 236b, 246b, 256b: Second control unit

[0048] 237, 247, 257: Airflow Lifting Unit

[0049] 238, 248, 258: Airflow backstop unit

[0050] 240: Second adsorption device

[0051] 250: Third adsorption device

[0052] 260: First exhaust device

[0053] 270: Second exhaust device Detailed Implementation

[0054] The various embodiments of this invention will be discussed in more detail below. However, these embodiments can be applications of various novel concepts and can be implemented in various different specific scopes. The specific embodiments are for illustrative purposes only and are not limited to the scope of disclosure. Furthermore, for the sake of simplicity in the drawings, some conventional structures and elements will be shown in a simple schematic manner in the drawings, and repeated elements may be represented by the same number.

[0055] Please refer to Figure 1 This is a schematic diagram illustrating a gas purification system 100 according to one embodiment of the present invention. The gas purification system 100 includes a gas supply device 110, a pretreatment device 120, and a three-adsorption device 130.

[0056] A gas supply device 110 is used to provide a gas 101 to be treated. Specifically, the gas supply device 110 may have an inlet pressure greater than 1 atm to drive the gas 101 to be treated to flow in the gas purification system 100. Furthermore, the gas 101 to be treated may include a target gas and a substance to be treated. The target gas may be a gas to be purified, such as hydrogen, and the substance to be treated may be a substance to be filtered out, such as carbon monoxide, carbon dioxide, or a sulfur-containing gas. Further, in the gas purification system 100, the gas 101 to be treated may be waste gas generated during industrial production processes, but this invention is not limited thereto.

[0057] The pretreatment device 120 is connected to the gas supply device 110, and is used to filter out a solid particle and a water-soluble impurity from the gas to be treated 101. Specifically, the pretreatment device 120 performs pretreatment on the gas to be treated 101, including filtration, washing, and drying, to remove solid particles and water-soluble impurities, and can also preliminarily remove some water vapor from the gas to be treated 101.

[0058] The pretreatment device 120 and the three adsorption devices 130 are sequentially connected, and each of the three adsorption devices 130 includes a first tubular adsorption unit 131, a second tubular adsorption unit 132, and two heating units 133. The second tubular adsorption unit 132 is connected to the first tubular adsorption unit 131, and the first tubular adsorption unit 131 and the second tubular adsorption unit 132 alternately exist in an adsorption state and a regeneration state. Specifically, the first tubular adsorption unit 131 and the second tubular adsorption unit 132 are used to adsorb and filter out the substances to be treated in the gas to be treated 101, so as to purify the target gas from the gas to be treated 101. In this way, by including the three adsorption devices 130 in the gas purification system 100 and configuring the three adsorption devices 130 sequentially connected, the gas to be treated 101 can be repeatedly treated to adsorb the substances to be treated therein, thereby purifying the target gas with high purity.

[0059] Furthermore, in Figure 1 In this embodiment, when the first tubular adsorption unit 131 is in the adsorption state, the second tubular adsorption unit 132 can be in the regeneration state, and when the first tubular adsorption unit 131 is in the regeneration state, the second tubular adsorption unit 132 can be in the adsorption state. This allows for continuous separation and purification of the target gas in the gas to be treated 101, thereby increasing the production capacity of the gas purification system 100. Details regarding the adsorption and regeneration states of the first tubular adsorption unit 131 and the second tubular adsorption unit 132 will be explained in detail in subsequent paragraphs.

[0060] Furthermore, the porosity of the three first tubular adsorption units 131 of the three-adsorption device 130 can be 20% to 80%, the porosity of the three second tubular adsorption units 132 of the three-adsorption device 130 can be 20% to 80%, and the specific surface area of ​​the three first tubular adsorption units 131 of the three-adsorption device 130 can be greater than 2000 m². 2 / m 3 The specific surface area of ​​the three second tubular adsorption units 132 of the three-adsorption device 130 can be greater than 2000 m². 2 / m 3 This improves the adsorption effect of each first tubular adsorption unit 131 and each second tubular adsorption unit 132, thereby facilitating the acquisition of high-quality target gas.

[0061] Two heating units 133 are respectively disposed adjacent to the first tubular adsorption unit 131 and the second tubular adsorption unit 132. Specifically, in the gas purification system 100, each heating unit 133 may be ring-shaped, and the two heating units 133 may be respectively arranged around the first tubular adsorption unit 131 and the second tubular adsorption unit 132. The two heating units 133 heat the first tubular adsorption unit 131 and the second tubular adsorption unit 132 respectively, so that the first tubular adsorption unit 131 and the second tubular adsorption unit 132 can be desorbed and regenerated. This will facilitate the continuous use of the first tubular adsorption unit 131 and the second tubular adsorption unit 132, thereby reducing the operating cost of the gas purification system 100. Furthermore, the heating temperature range of each heating unit 133 may be between 100℃ and 200℃ to effectively improve the desorption efficiency of the first tubular adsorption unit 131 and the second tubular adsorption unit 132, but the present invention is not limited thereto.

[0062] The following will describe the details of the gas purification system 100 purifying the target gas, which in this embodiment may be hydrogen. Furthermore, the following description is based on the example of the first tubular adsorption unit 131 being in an adsorption state and the second tubular adsorption unit 132 being in a regeneration state.

[0063] like Figure 1 As shown, after the pretreatment device 120 filters out solid particles and water-soluble impurities from the gas to be treated 101, the gas to be treated 101 is conveyed to the first tubular adsorption unit 131 of an adsorption device 130. At this time, the first tubular adsorption unit 131 of the adsorption device 130 adsorbs the substances to be treated in the gas to be treated 101 and generates a first purified gas 102, which contains hydrogen and some unfiltered substances to be treated. Next, the first purified gas 102 is conveyed to the first tubular adsorption unit 131 of another adsorption device 130, where the first tubular adsorption unit 131 adsorbs the remaining substances to be treated in the first purified gas 102 to further filter out the substances and generate a second purified gas 103. Then, the second purified gas 103 is conveyed to the first tubular adsorption unit 131 of the next adsorption device 130 for purification and generates a product gas 104, which contains hydrogen. In this way, by sequentially processing the gas to be processed 101 through the pretreatment device 120 and the three adsorption devices 130, a product gas 104 containing high-purity hydrogen can be obtained, wherein the purity of the hydrogen can be greater than 7N (that is, the purity is greater than 99.99999%), thereby realizing the reuse of hydrogen resources.

[0064] Furthermore, when the first tubular adsorption unit 131 is in the adsorption state, the three heating units 133 adjacent to the three second tubular adsorption units 132 will heat the three second tubular adsorption units 132 respectively. At this time, 0.5% to 20% of the product gas 104 will be separated and used as a stripping gas 105. The stripping gas 105 will be transported and diverted to the second tubular adsorption units 132 in the three adsorption devices 130 to desorb the substances to be treated in each second tubular adsorption unit 132, forming an impurity gas 106, which contains the substances to be treated. In this way, the first tubular adsorption unit 131 and the second tubular adsorption unit 132 in the adsorption device 130 can alternately be in the adsorption state and the regeneration state, thereby improving the production capacity of the gas purification system 100. In addition, by separating a portion of the product gas 104 for use as the stripping gas 105, the risk of a decrease in the purity of the product gas 104 caused by using external gas as the stripping gas 105 can be effectively avoided.

[0065] Please refer to Figure 2 This is a schematic diagram illustrating a gas purification system 200 according to another embodiment of the present invention. The gas purification system 200 includes a gas supply device 210, a pretreatment device 220, a first adsorption device 230, a second adsorption device 240, a third adsorption device 250, a first exhaust device 260, and a second exhaust device 270.

[0066] Gas supply device 210 is used to provide a gas to be processed 201. Specifically, the gas to be processed 201 may include a target gas and a substance to be processed. The target gas may be a gas to be purified, such as hydrogen, and the substance to be processed may be a substance to be filtered out, such as methane, ammonia, or a sulfide-containing gas.

[0067] The pretreatment device 220 is connected to the gas supply device 210, and is used to filter out a solid particle and a water-soluble impurity from the gas to be treated 201. Specifically, the pretreatment device 220 may include a gas washing device 221 and a freeze-drying device 222. The gas washing device 221 is connected to the gas supply device 210, and the freeze-drying device 222 is connected to the gas washing device 221. The gas washing device 221 washes the gas to be treated 201 to filter out the solid particles and water-soluble impurities, while the freeze-drying device 222 dries the gas to be treated 201 to initially remove some of the water vapor.

[0068] The pretreatment device 220 is sequentially connected to the first adsorption device 230, the second adsorption device 240, and the third adsorption device 250. Specifically, the first adsorption device 230 is connected to the freeze-drying equipment 222 of the pretreatment device 220, the second adsorption device 240 is connected to the first adsorption device 230, and the third adsorption device 250 is connected to the second adsorption device 240.

[0069] The first adsorption device 230 includes a first tubular adsorption unit 231, a second tubular adsorption unit 232, a first heating unit 233a, a second heating unit 233b, an exhaust port 234, a gas driving unit 235, a first control unit 236a, a second control unit 236b, an airflow lifting unit 237, and multiple airflow backflow prevention units 238.

[0070] The second tubular adsorption unit 232 is connected to the first tubular adsorption unit 231, and the first tubular adsorption unit 231 and the second tubular adsorption unit 232 alternately exist in an adsorption state and a regeneration state. Thus, when the gas to be treated 201 is delivered to the first tubular adsorption unit 231 or the second tubular adsorption unit 232, the first tubular adsorption unit 231 in the adsorption state or the second tubular adsorption unit 232 in the adsorption state adsorbs the substances to be treated in the gas to be treated 201 and generates a first purified gas 202.

[0071] The first heating unit 233a is adjacent to the first tubular adsorption unit 231, and the second heating unit 233b is adjacent to the second tubular adsorption unit 232. The first heating unit 233a and the second heating unit 233b heat the first tubular adsorption unit 231 and the second tubular adsorption unit 232 respectively, so that the first tubular adsorption unit 231 and the second tubular adsorption unit 232 can be desorbed and regenerated. This will facilitate the continuous use of the first tubular adsorption unit 231 and the second tubular adsorption unit 232, thereby reducing the operating cost of the gas purification system 200.

[0072] The exhaust port 234 connects the first tubular adsorption unit 231 and the second tubular adsorption unit 232, wherein the exhaust port 234 can be used to discharge the first purified gas 202 from the first adsorption device 230.

[0073] The gas driving unit 235 connects to the freeze-drying equipment 222, the first tubular adsorption unit 231, and the second tubular adsorption unit 232. The gas driving unit 235 can drive the gas to be treated 201 through either the first tubular adsorption unit 231 or the second tubular adsorption unit 232. In this way, the gas to be treated 201 can be rapidly transported to either the first tubular adsorption unit 231 or the second tubular adsorption unit 232 for purification via the gas driving unit 235, thereby improving the efficiency of the gas purification system 200. Furthermore, the gas driving unit 235 can be a blower or a vacuum motor, but this invention is not limited to these.

[0074] The first control unit 236a and the second control unit 236b are respectively connected to the first heating unit 233a and the second heating unit 233b. The first control unit 236a and the second control unit 236b control the first heating unit 233a and the second heating unit 233b to heat the first tubular adsorption unit 231 and the second tubular adsorption unit 232, respectively. In this way, the first control unit 236a and the second control unit 236b can precisely control the time that the first tubular adsorption unit 231 or the second tubular adsorption unit 232 is in the adsorption state or the regeneration state, thereby improving the operating efficiency of the gas purification system 200. Furthermore, in Figure 2 In the first adsorption device 230, the first tubular adsorption unit 231 can be connected to the gas driving unit 235 through the first control unit 236a, and the second tubular adsorption unit 232 can be connected to the gas driving unit 235 through the second control unit 236b. The first control unit 236a and the second control unit 236b can be used to control the flow rate and speed of gas entering or leaving the first tubular adsorption unit 231 and the second tubular adsorption unit 232, thereby improving the flexibility of the gas purification system 200.

[0075] The gas flow extraction unit 237 connects the first tubular adsorption unit 231 and the second tubular adsorption unit 232. The gas flow extraction unit 237 can be used to divert an extraction gas 205 to the first tubular adsorption unit 231 or the second tubular adsorption unit 232 to facilitate the desorption and regeneration of the first tubular adsorption unit 231 or the second tubular adsorption unit 232.

[0076] Multiple airflow backflow prevention units 238 are connected to the first tubular adsorption unit 231 and the second tubular adsorption unit 232. Specifically, in... Figure 2In the first adsorption device 230, there are four airflow backflow prevention units 238. These four units are respectively located between the first tubular adsorption unit 231 and the exhaust port 234, between the second tubular adsorption unit 232 and the exhaust port 234, between the first tubular adsorption unit 231 and the airflow flushing unit 237, and between the second tubular adsorption unit 232 and the airflow flushing unit 237. By configuring multiple airflow backflow prevention units 238, gas backflow can be prevented, thereby effectively avoiding a decrease in the purity of the first purified gas 202, or contamination of the first tubular adsorption unit 231 or the second tubular adsorption unit 232.

[0077] The second adsorption device 240 includes a first tubular adsorption unit 241, a second tubular adsorption unit 242, a first heating unit 243a, a second heating unit 243b, an exhaust port 244, a gas driving unit 245, a first control unit 246a, a second control unit 246b, an airflow flushing unit 247, and multiple airflow backflow prevention units 248, wherein the first tubular adsorption unit 241, the second tubular adsorption unit 242, the first heating unit 243a, the second heating unit 243b, and the first control unit 246a... The second control unit 246b, the airflow lifting unit 247, and the airflow backflow prevention unit 248 are structurally similar to the first tubular adsorption unit 231, the second tubular adsorption unit 232, the first heating unit 233a, the second heating unit 233b, the first control unit 236a, the second control unit 236b, the airflow lifting unit 237, and the airflow backflow prevention unit 238 of the first adsorption device 230, and their connection methods are also similar. For details and connection methods of the same components, please refer to the description of the first adsorption device 230, which will not be repeated here.

[0078] like Figure 2 As shown, when the first purified gas 202 is delivered to the first tubular adsorption unit 241 or the second tubular adsorption unit 242 of the second adsorption device 240, the first tubular adsorption unit 241 or the second tubular adsorption unit 242 in the adsorption state adsorbs the remaining substances to be treated in the first purified gas 202 and generates a second purified gas 203.

[0079] The exhaust port 244 is connected to the first tubular adsorption unit 241 and the second tubular adsorption unit 242 through the airflow backflow prevention unit 248, wherein the exhaust port 244 can be used to discharge the second purified gas 203 out of the second adsorption device 240.

[0080] The gas driving unit 245 is connected to the exhaust port 234 of the first adsorption device 230, and is connected to the first tubular adsorption unit 241 and the second tubular adsorption unit 242 via the first control unit 246a and the second control unit 246b of the second adsorption device 240. The gas driving unit 245 can drive the first purified gas 202 to be transported to the first tubular adsorption unit 241 or the second tubular adsorption unit 242 via the first control unit 246a or the second control unit 246b. In this way, the first purified gas 202 can be quickly transported to the first tubular adsorption unit 241 or the second tubular adsorption unit 242 for purification via the gas driving unit 245, thereby improving the efficiency of the gas purification system 200. Furthermore, the gas driving unit 245 can be a blower or a vacuum motor, but this invention is not limited to these.

[0081] The third adsorption device 250 includes a first tubular adsorption unit 251, a second tubular adsorption unit 252, a first heating unit 253a, a second heating unit 253b, an exhaust port 254, a gas driving unit 255, a first control unit 256a, a second control unit 256b, an airflow flushing unit 257, and multiple airflow backflow prevention units 258, wherein the first tubular adsorption unit 251, the second tubular adsorption unit 252, the first heating unit 253a, the second heating unit 253b, and the first control unit 256a... The second control unit 256b, the airflow lifting unit 257, and the airflow backflow prevention unit 258 are structurally similar to the first tubular adsorption unit 231, the second tubular adsorption unit 232, the first heating unit 233a, the second heating unit 233b, the first control unit 236a, the second control unit 236b, the airflow lifting unit 237, and the airflow backflow prevention unit 238 of the first adsorption device 230, and their connection methods are also similar. For details and connection methods of the same components, please refer to the description of the first adsorption device 230, which will not be repeated here.

[0082] For example Figure 2As shown, when the second purified gas 203 is conveyed to the first tubular adsorption unit 251 or the second tubular adsorption unit 252 of the third adsorption device 250, the first tubular adsorption unit 251 or the second tubular adsorption unit 252 in the adsorption state purifies the second purified gas 203 and produces a product gas 204. A portion of the product gas 204 is separated and used as a stripping gas 205. The stripping gas 205 is conveyed and diverted to the first adsorption device 230, the second adsorption device 240 and the third adsorption device 250, causing the first tubular adsorption unit 231, the first tubular adsorption unit 241, the first tubular adsorption unit 251, the second tubular adsorption unit 232, the second tubular adsorption unit 242 or the second tubular adsorption unit 252 to undergo desorption and regeneration, producing an impurity gas 206.

[0083] The exhaust port 254 is connected to the first tubular adsorption unit 251 and the second tubular adsorption unit 252 through the airflow backflow prevention unit 258, wherein the exhaust port 254 can be used to discharge the product gas 204 out of the third adsorption device 250.

[0084] The gas driving unit 255 is connected to the exhaust port 244 of the second adsorption device 240, and is connected to the first tubular adsorption unit 251 and the second tubular adsorption unit 252 via the first control unit 256a and the second control unit 256b of the third adsorption device 250. The gas driving unit 255 can drive the second purified gas 203 to be transported to the first tubular adsorption unit 251 or the second tubular adsorption unit 252 via the first control unit 256a or the second control unit 256b. In this way, the second purified gas 203 can be rapidly transported to the first tubular adsorption unit 251 or the second tubular adsorption unit 252 for purification via the gas driving unit 255, thereby improving the efficiency of the gas purification system 200. Furthermore, the gas driving unit 255 can be a blower or a vacuum motor, but this invention is not limited to these.

[0085] The first exhaust device 260 is connected to the exhaust port 254 of the third adsorption device 250, wherein the first exhaust device 260 can be used to discharge the product gas 204 out of the gas purification system 200.

[0086] The second exhaust device 270 is connected to the first adsorption device 230, the second adsorption device 240, and the third adsorption device 250, wherein the second exhaust device 270 can be used to discharge impurity gas 206 from the gas purification system 200. Specifically, the second exhaust device 270 is connected to the first control unit 236a, the second control unit 236b of the first adsorption device 230, the first control unit 246a, the second control unit 246b of the second adsorption device 240, the first control unit 256a, and the second control unit 256b of the third adsorption device 250. Furthermore, the second exhaust device 270 can be a vacuum pump to provide a suction environment, but this invention is not limited thereto.

[0087] In the gas purification system 200, the first tubular adsorption unit 231 and the second tubular adsorption unit 232, the first tubular adsorption unit 241 and the second tubular adsorption unit 242, and the first tubular adsorption unit 251 and the second tubular adsorption unit 252 can each contain different adsorption materials according to different adsorption requirements. For example, the material of the first tubular adsorption unit 231 and the second tubular adsorption unit 232 can be the same, the material of the first tubular adsorption unit 241 and the second tubular adsorption unit 242 can be the same, and the material of the first tubular adsorption unit 251 and the second tubular adsorption unit 252 can be the same, but the materials of the first tubular adsorption unit 231, the first tubular adsorption unit 241, and the first tubular adsorption unit 251 can be the same or different.

[0088] In detail, in the gas purification system 200, the first tubular adsorption unit 231 and the second tubular adsorption unit 232 of the first adsorption device 230 can be used to filter out water vapor in the gas to be treated 201. The materials of the first tubular adsorption unit 231 and the second tubular adsorption unit 232 of the first adsorption device 230 may include activated carbon, carbon molecular sieve, activated alumina, zeolite, silica gel molecular sieve, aerogel, metal-organic framework molecular sieve, covalent organic framework molecular sieve, bentonite, sepiolite, mordenite, boron group element materials, nitrogen group element materials or lithium type molecular sieve. The first tubular adsorption unit 241 and the second tubular adsorption unit 242 of the second adsorption device 240 can be used to filter out volatile organic compounds, perfluorinated compounds, ammonia or sulfide-containing gases in the gas to be treated 201. The materials of the first tubular adsorption unit 241 and the second tubular adsorption unit 242 of the second adsorption device 240 may include activated carbon, carbon molecular sieve, zeolite, silica gel molecular sieve, aerogel, metal-organic framework molecular sieve, covalent organic framework molecular sieve, bentonite, sepiolite, mordenite, boron group element materials, nitrogen group element materials or lithium-type molecular sieve. The first tubular adsorption unit 251 and the second tubular adsorption unit 252 of the third adsorption device 250 can be used to filter out carbon dioxide, carbon monoxide, methane, nitrogen, or oxygen from the gas to be treated 201. The materials of the first tubular adsorption unit 251 and the second tubular adsorption unit 252 of the third adsorption device 250 can include activated carbon, carbon molecular sieves, zeolite, metal-organic framework molecular sieves, covalent organic framework molecular sieves, bentonite, sepiolite, mordenite, boron group element materials, nitrogen group element materials, or lithium-type molecular sieves. Furthermore, the materials of the first tubular adsorption unit 251 and the second tubular adsorption unit 252 of the third adsorption device 250 can further include metal ions, metal particles, or catalyst materials, wherein the metal particles can be silver particles, copper particles, carbon particles, or titanium particles. In this way, the first adsorption device 230, the second adsorption device 240 and the third adsorption device 250 can be used to adsorb different substances to be treated, thereby effectively improving the purity of the purified target gas.

[0089] Furthermore, if the target gas is hydrogen, when the first adsorption device 230, the second adsorption device 240, and the third adsorption device 250 sequentially process the gas to be treated 201, a first purified gas 202, a second purified gas 203, and a product gas 204 can be generated sequentially. The purity of hydrogen in the gas to be treated 201 can be 70% to 90%, the purity of hydrogen in the first purified gas 202 can be greater than 4N (i.e., greater than 99.99%), the purity of hydrogen in the second purified gas 203 can be greater than 5N (i.e., greater than 99.999%), and the purity of hydrogen in the product gas 204 can be greater than 7N (i.e., greater than 99.99999%).

[0090] Please refer to Table 1, which presents the measurement results of the substances to be treated and their concentrations in the gas to be treated 201, the first purified gas 202, the second purified gas 203, and the product gas 204. During the measurement of the substances to be treated, the first adsorption device 230 uses pressure swing adsorption (PSA) or pressure swing vacuum adsorption (PSV) to adsorb the substances to be treated in the gas to be treated 201 to produce the first purified gas 202. The second adsorption device 240 uses temperature swing adsorption (TSA) or temperature swing vacuum adsorption (TVA) to adsorb the remaining substances to be treated in the first purified gas 202 to produce the second purified gas 203. The third adsorption device 250 uses TSA to adsorb the remaining substances to be treated in the second purified gas 203 to produce the product gas 204. However, it should be noted that the first adsorption device 230, the second adsorption device 240, and the third adsorption device 250 can use different adsorption methods to adsorb or desorb the substances to be treated; this invention is not limited to the aforementioned adsorption methods.

[0091]

[0092] As shown in Table 1, the gas to be treated 201 is sequentially processed by the first adsorption device 230, the second adsorption device 240, and the third adsorption device 250. The concentration of the substance to be treated in the sequentially generated first purified gas 202, second purified gas 203, and product gas 204 can be gradually reduced to less than 0.01 ppm, thus ensuring that the hydrogen purity in the product gas 204 is greater than 7N. Therefore, the product gas 204 meets the standards for electronic-grade hydrogen and can be used in processes in high-tech industries such as semiconductors, thereby realizing the reuse of hydrogen resources. Furthermore, the hydrogen recovery rate of the gas purification system 200 can be greater than 80%, which helps to significantly reduce the cost of hydrogen production.

[0093] In summary, the advantages of this novel gas purification system are as follows: First, by including a gas supply device, a pretreatment device, and a three-adsorption device, with each of the three adsorption devices comprising a first tubular adsorption unit, a second tubular adsorption unit, and two heating units, the system can separate a high-purity target gas from the gas to be treated, thereby enabling the reuse of the target gas. Second, by using different materials for the three first tubular adsorption units or the three second tubular adsorption units, the purity of the target gas can be further improved. Third, by ensuring that the porosity, porosity, specific surface area, and specific surface area of ​​each first and second tubular adsorption unit meet specific ranges, the gas filtration efficiency can be improved. Fourth, by including a gas driving unit and a control unit in each of the three adsorption devices, the operational efficiency, ease of use, and production capacity of the gas purification system can be improved. Fifth, by configuring each of the three adsorption devices to include two control units, the three adsorption devices can operate independently. The time the first and second tubular adsorption units are in adsorption or regeneration states can be controlled according to a set time or by detecting the adsorption status of the first and second tubular adsorption units, thereby improving the ease of use and production capacity of the gas purification system. Therefore, this novel gas purification system has commercial application potential in related industries.

[0094] Although the present invention has been disclosed above with reference to embodiments, it is not intended to limit the present invention. Any person skilled in the art can make various modifications and refinements without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the present invention shall be determined by the appended claims.

Claims

1. A gas purification system, characterized in that, Include: A gas supply device for supplying a gas to be processed; A pretreatment device connected to the gas supply device, wherein the pretreatment device is used to filter out a solid particle and a water-soluble impurity from the gas to be treated; as well as A three-adsorption device, wherein the pretreatment device is sequentially connected to the three adsorption devices, and each of the three adsorption devices comprises: First tubular adsorption unit; A second tubular adsorption unit is connected to the first tubular adsorption unit, and the first tubular adsorption unit and the second tubular adsorption unit alternately exist in an adsorption state and a regeneration state; and Two heating units are respectively disposed adjacent to the first tubular adsorption unit and the second tubular adsorption unit.

2. The gas purification system as described in claim 1, characterized in that, The three adsorption devices are a first adsorption device, a second adsorption device, and a third adsorption device. The first adsorption device is connected to the pretreatment device, the second adsorption device is connected to the first adsorption device, and the third adsorption device is connected to the second adsorption device.

3. The gas purification system as described in claim 2, characterized in that, The first tubular adsorption unit and the second tubular adsorption unit of the first adsorption device are used to filter out water vapor from the gas to be treated.

4. The gas purification system as described in claim 3, characterized in that, The materials of the first tubular adsorption unit and the second tubular adsorption unit of the first adsorption device include activated carbon, carbon molecular sieve, activated alumina, zeolite, silica gel molecular sieve, aerogel, metal-organic framework molecular sieve, covalent organic framework molecular sieve, bentonite, sepiolite, boron group element materials, nitrogen group element materials, or lithium-type molecular sieve.

5. The gas purification system as described in claim 2, characterized in that, The first tubular adsorption unit and the second tubular adsorption unit of the second adsorption device are used to filter out a volatile organic compound, a perfluorinated compound, ammonia, or a sulfide-containing gas from the gas to be treated.

6. The gas purification system as described in claim 5, characterized in that, The materials of the first tubular adsorption unit of the second adsorption device and the second tubular adsorption unit of the second adsorption device include activated carbon, carbon molecular sieve, zeolite, silica gel molecular sieve, aerogel, metal-organic framework molecular sieve, covalent organic framework molecular sieve, bentonite, sepiolite, boron group element materials, nitrogen group element materials or lithium type molecular sieve.

7. The gas purification system as described in claim 2, characterized in that, The first tubular adsorption unit and the second tubular adsorption unit of the third adsorption device are used to filter out carbon dioxide, carbon monoxide, methane, nitrogen or oxygen from the gas to be treated.

8. The gas purification system as described in claim 7, characterized in that, The materials of the first tubular adsorption unit and the second tubular adsorption unit of the third adsorption device include activated carbon, carbon molecular sieve, zeolite, metal-organic framework molecular sieve, covalent organic framework molecular sieve, bentonite, sepiolite, boron group element materials, nitrogen group element materials, or lithium-type molecular sieve.

9. The gas purification system as described in claim 8, characterized in that, The material of the first tubular adsorption unit of the third adsorption device and the material of the second tubular adsorption unit of the third adsorption device further include a metal ion, a metal particle or a catalyst material.

10. The gas purification system as described in claim 9, characterized in that, The metal particles can be silver, copper, carbon, or titanium.

11. The gas purification system as described in claim 1, characterized in that, The porosity of the first tubular adsorption unit of the three adsorption devices is 20% to 80%, and the porosity of the second tubular adsorption unit of the three adsorption devices is 20% to 80%.

12. The gas purification system as described in claim 1, characterized in that, The specific surface area of ​​the first tubular adsorption unit in this three-adsorption device is greater than 2000 m². 2 / m 3 The specific surface area of ​​the second tubular adsorption unit in the three adsorption devices is greater than 2000 m². 2 / m 3 .

13. The gas purification system as described in claim 1, characterized in that, Each of the three adsorption devices further includes: A gas-driven unit connects the first tubular adsorption unit and the second tubular adsorption unit.

14. The gas purification system as described in claim 13, characterized in that, The gas drive unit is either a blower or a vacuum motor.

15. The gas purification system as described in claim 1, characterized in that, The inlet pressure of this gas purification system is greater than 1 atm.

16. The gas purification system as described in claim 1, characterized in that, Each of the three adsorption devices further includes: Two control units are connected to the two heating units respectively.

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