High-precision PH control device
By using a high-precision pH control device and a PLC controller and metering pump working together, the problem of pH fluctuation during the synthesis of ternary precursors was solved, achieving stable pH control within the reactor and improving product quality.
Patent Information
- Application Number
- CN202423230702.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-26
- Publication Date
- 2026-02-03
- Estimated Expiration
- 2034-12-26
AI Technical Summary
In the existing technology, the pH control in the synthesis of ternary precursors has a lag, which leads to a lag in the change of alkali flow rate, resulting in pH fluctuations and affecting product quality.
A high-precision pH control device is adopted. Through a PLC controller combined with a magnetic pump and a metering pump, the pH value in the reactor is monitored and adjusted in real time. The magnetic pump and the metering pump work together to ensure the stability of the alkali flow rate and reduce pH fluctuations.
This achieved stable pH control within the reactor, improved product quality, and reduced the generation of substandard products.
Smart Images
Figure CN223861840U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of lithium-ion battery material technology, specifically to a high-precision pH control device. Background Technology
[0002] The pH value has a significant impact on the growth process of ternary precursors. The selection of the reaction pH and the stable control of the pH value during the reaction directly affect the particle size distribution of the precursor. If the pH value is out of control during the reaction, resulting in excessively high or low pH values, the product quality will decline sharply, resulting in substandard products.
[0003] In the preparation of ternary precursors, the flow rate of either a salt solution or an alkaline solution is typically fixed (usually the salt solution), while the flow rate of the other solution (usually the alkaline solution) is adjusted to achieve automatic pH control. First, a pH value is set on the pH controller. The salt or alkaline solution is converted into a current signal by a pH analyzer and transmitted to the pH controller. The pH controller then processes the deviation between the actual pH value and the set pH value and outputs an adjustment current signal, which is sent to an electric regulator. The electric regulator controls the flow rate of the alkaline solution to achieve automatic pH control.
[0004] During the use of this method, due to the time lag in the feedback of pH value measurement, the change in flow rate also lags, resulting in pH fluctuations. This problem becomes more severe as the required alkali flow rate increases. Summary of the Invention
[0005] To address the aforementioned problems, this application provides a high-precision pH control device to resolve pH fluctuations caused by excessive fluctuations in the alkali flow rate within the reaction vessel during the reaction process. The technical solution adopted by this utility model is as follows:
[0006] A high-precision pH control device includes a reaction vessel and pipelines. The reaction vessel is connected to an alkali tank via a delivery pipeline I1. A delivery pipeline II2 is also connected between the reaction vessel and the alkali tank. A magnetic pump, a flow meter, a PLC controller, and a frequency converter are installed on the delivery pipeline I1. A metering pump is installed on the delivery pipeline II2. The operation of both the delivery pipeline I1 and the delivery pipeline II2 is controlled by the PLC controller. A pH meter is installed on the reaction vessel.
[0007] Preferably, when the device is in use, the relationship between the alkaline solution flow rate V1 in infusion line I1 and the alkaline solution flow rate V2 in infusion line II2 should satisfy V2 < 0.5 * V1.
[0008] Preferably, the flow meter is an electromagnetic flow meter, which is installed on the infusion pipeline I1 to measure the flow rate in the infusion pipeline I1 and feed the measured flow rate back to the PLC controller.
[0009] Preferably, the pH meter is installed on the reactor to measure the pH value inside the reactor in real time and feed the measured pH value back to the PLC controller.
[0010] Preferably, the PLC controller can compare the measured pH with the set pH to calculate and then output an analog signal to control the metering pump.
[0011] This application has the following advantages compared with the prior art:
[0012] 1. This utility model uses a pH meter to measure the pH value of the liquid in the reaction vessel and feeds it back to the PLC controller. The PLC controller compares the measured pH with the set pH and calculates the value. It outputs an analog signal to control the metering pump. By changing the flow rate of the alkaline solution output by the metering pump, the pH in the vessel is kept stable at around the set value.
[0013] 2. In this utility model, when the required alkaline solution flow rate is very large, two infusion modes can be selected to be carried out simultaneously. Under the premise that the alkaline solution flow rate V1 in infusion pipeline I1 and the relationship V2 in infusion pipeline V2 are V2 < 0.5 * V1, the system can make the flow rate V2 in infusion pipeline II2 fluctuate within a small fluctuation range, thereby ensuring the stability of pH in the reactor. Attached Figure Description
[0014] Figure 1 : A schematic diagram of the overall structure of this utility model.
[0015] In the diagram: 1. Infusion line I, 2. Infusion line II, 3. Metering pump, 4. Magnetic pump, 5. pH meter, 6. Flow meter, 7. PLC controller, 8. Frequency converter, 9. Reactor, 10. Alkali tank. Detailed Implementation
[0016] Referring to the figures, this application provides a high-precision pH control device, including a reaction vessel 9 and pipelines. The reaction vessel 9 is connected to an alkali tank 10 via a delivery pipeline I1. A delivery pipeline II2 is also connected between the reaction vessel 9 and the alkali tank 10. A magnetic pump 4, a flow meter 6, a PLC controller 7, and a frequency converter 8 are installed on the delivery pipeline I1. A metering pump 3 is installed on the delivery pipeline II2. The operation of both delivery pipelines I1 and II2 is controlled by the PLC controller 7. A pH meter 5 is installed on the reaction vessel 9. Two PID control modules are configured on the PLC controller 7 to output corresponding analog signals based on the comparison and calculation of the measured signals and set values. The frequency converter 8 controls the output of the magnetic pump.
[0017] Working principle of this utility model:
[0018] The delivery pipeline I1 connects the alkali tank 10 and the reaction vessel 9. The magnetic pump 4 and the flow meter 6 are installed on the delivery pipeline I1. The flow meter 6 is installed at the output end of the magnetic pump 4 to measure the alkali flow rate in the delivery pipeline I1 and feed it back to the PLC controller 7. The PLC controller 7 configures a PID control module, and outputs the corresponding analog signal to control the frequency converter 8 based on the comparison and calculation of the measured signal and the set value. The frequency converter 8 changes the output power according to the signal of the PLC controller 7, thereby changing the output flow rate of the magnetic pump 4, and delivering a stable set alkali flow rate to the reaction vessel 9 through the delivery pipeline I1.
[0019] Furthermore, metering pump 3 is installed on delivery pipeline II2 to deliver alkaline solution. Metering pump 3 is controlled by PLC controller 7. pH meter 5 is installed on the side wall of reactor 9 to measure the pH value of the liquid in reactor 9 and feeds it back to PLC controller 7. PLC controller 7 is configured with a PID control module. Based on the comparison and calculation of the measured signal and the set value, it outputs the corresponding analog signal to control metering pump 3. By changing the output alkaline solution flow rate of metering pump 3, the pH in reactor 9 is kept stable, thereby reducing pH fluctuations.
[0020] Furthermore, when both pipelines are used simultaneously, the relationship between the alkaline solution flow rate V1 in infusion pipeline I1 and the alkaline solution flow rate V2 in infusion pipeline II2 should satisfy V2 < 0.5 * V1.
[0021] The technical solutions provided in this application have been described in detail above. Specific examples have been used to illustrate the principles and implementation methods of this application. The descriptions of the embodiments above are only for the purpose of helping to understand the structure and core ideas of this application. It should be noted that those skilled in the art can make several improvements and modifications to this application without departing from the principles of this application, and these improvements and modifications also fall within the protection scope of the claims of this application.
Claims
1. A high-precision pH control device, comprising a reaction vessel (9) and pipelines, wherein the reaction vessel (9) is connected to an alkali tank (10) via a liquid delivery pipeline I (1), characterized in that: The reactor (9) and the alkali tank (10) are connected by a delivery pipeline II (2). The delivery pipeline I (1) is equipped with a magnetic pump (4), a flow meter (6), a PLC controller (7) and a frequency converter (8). The delivery pipeline II (2) is equipped with a metering pump (3). The operation of the delivery pipeline I (1) and the delivery pipeline II (2) is controlled by the PLC controller (7). The reactor (9) is equipped with a pH meter (5).
2. The high-precision pH control device according to claim 1, characterized in that: When the device is in use, the relationship between the alkaline solution flow rate V1 in infusion line I (1) and the alkaline solution flow rate V2 in infusion line II (2) should satisfy V2 < 0.5 * V1.
3. The high-precision pH control device according to claim 1, characterized in that: The flow meter (6) is an electromagnetic flow meter, which is installed on the infusion pipeline I (1) to measure the flow rate in the infusion pipeline I (1) and feed the measured flow rate back to the PLC controller (7).
4. The high-precision pH control device according to claim 1, characterized in that: The pH meter (5) is installed on the reactor (9) to measure the pH value inside the reactor (9) in real time and feed the measured pH value back to the PLC controller (7).
5. A high-precision pH control device according to claim 1, characterized in that: The PLC controller (7) can compare the measured pH with the set pH to calculate and output an analog signal to control the metering pump (3).