Gas supply system for chemical vapor deposition

Abstract

The utility model provides a gas supply system for chemical vapor deposition. The gas supply system comprises a shell, a material source container and a bubbling device are arranged in the shell, chemical source liquid is contained in the material source container, the material source container is connected with the bubbling device through a liquid supply pipe network, and the bubbling device is communicated with the outside of the shell through a gas supply pipe network; an external gas inlet pipe network, a carrier gas inlet pipe network and a cleaning gas inlet pipe network are further arranged in the shell, the external gas inlet pipe network is communicated with the material source container and used for providing pressurized gas, the carrier gas inlet pipe network is communicated with the bubbling device and used for providing carrier gas, and the cleaning gas inlet pipe network is communicated with the external gas inlet pipe network and the carrier gas inlet pipe network and used for providing cleaning gas. The chemical source liquid supplementing device is small in size and easy to operate, the liquid supplementing amount of chemical source liquid can be accurately controlled, and continuity and stability of chemical source supply are guaranteed.

Description

TECHNICAL FIELD

[0001] The utility model belongs to thin film deposition technical field relates to chemical vapor deposition technology especially relates to a kind of for chemical vapor deposition gas supply system. BACKGROUND

[0002] Chemical source liquid precursor is the main material of chemical vapor deposition process, and is also the core material of epitaxial growth. During the thin film growth process, the chemical source liquid precursor needs to be introduced into the reaction cavity through the gas channel of the chemical vapor deposition equipment to form a thin film layer that meets the requirements. The required chemical source liquid in the existing equipment is stored in a special chemical source liquid storage room, which occupies a large amount of space in the factory and has a high cost. Moreover, the pipeline from the storage room to the chemical vapor deposition equipment is too long, which cannot accurately control the introduction process of the chemical source liquid, greatly interfering with the liquid level stability and temperature stability of the chemical source liquid. In addition, the chemical source bottle, as a storage container for the reaction source liquid, is small in size and difficult to meet the needs of long-term continuous process, and the time-consuming for maintenance or replacement of new source bottles is long, which reduces the process efficiency.

[0003] CN218631952U discloses a liquid supplementing system for semiconductor equipment, comprising a main liquid supplementing tank, an auxiliary liquid supplementing tank, a liquid passing valve and a liquid supply device; the main liquid supplementing tank and the auxiliary liquid supplementing tank are both used for containing cooling liquid; the main liquid supplementing tank, the auxiliary liquid supplementing tank and the liquid supply device are all connected with the liquid passing valve; when the main liquid supplementing tank is connected with the liquid supply device, the auxiliary liquid supplementing tank is isolated from the liquid supply device; when the auxiliary liquid supplementing tank is connected with the liquid supply device, the main liquid supplementing tank is isolated from the liquid supply device; the liquid passing valve is used for controlling the cooling liquid in the main liquid supplementing tank and the auxiliary liquid supplementing tank to pass into the liquid supply device; or the liquid passing valve is used for controlling the cooling liquid in the liquid supply device to pass into the main liquid supplementing tank and the auxiliary liquid supplementing tank; the liquid supply device participates in forming the cooling liquid passages of a plurality of semiconductor equipment, and is used for supplying cooling liquid to the plurality of semiconductor equipment.

[0004] CN115094385A discloses a coating equipment containing a liquid supply system, comprising a supply system and a vacuum evaporation machine, the supply system includes a liquid storage bottle for storing liquid raw materials, the inside of the liquid storage bottle is sealed, and the top of the liquid storage bottle is provided with an air inlet pipe and a liquid outlet pipe, the air inlet pipe is connected with a high-pressure gas source, the air inlet pipe is higher than the liquid level of the liquid raw materials, and the liquid outlet pipe is submerged at the bottom of the liquid raw materials; a first valve is connected with the liquid outlet pipe through a conveying pipeline; a filter is connected with the first valve through a conveying pipeline; a liquid mass flow meter is connected with the filter through a conveying pipeline; a gas-liquid separator is connected with the liquid mass flow meter through a conveying pipeline; a second valve is connected with the gas-liquid separator and the vacuum evaporation machine through a conveying pipeline; and a heating device is arranged on the conveying pipeline.

[0005] However, existing gas supply equipment still suffers from poor chemical source liquid stability, low gas replenishment efficiency, and complex chemical source maintenance or replacement operations. This not only affects the continuity of chemical source supply but also easily leads to leaks and serious safety accidents. Utility Model Content

[0006] To address the shortcomings of existing technologies, the purpose of this invention is to provide a gas supply system for chemical vapor deposition. The system has a small footprint, is easy to operate, facilitates the replacement of chemical source solutions, ensures the continuity and stability of chemical source supply, and can precisely control the replenishment amount of chemical source solutions, eliminating the impact of replenishment on liquid level stability.

[0007] To achieve this objective, the present invention adopts the following technical solution:

[0008] This invention provides a gas supply system for chemical vapor deposition. The gas supply system includes a housing, inside which are disposed a material source container and a foaming device. The material source container contains a chemical source liquid and is connected to the foaming device via a liquid supply network. The foaming device is connected to the outside of the housing via a gas supply network. A first weighing and metering component and a second weighing and metering component are respectively disposed at the bottom of the material source container and the foaming device. A liquid level detection component is also disposed inside the foaming device. The housing is also provided with an external air inlet network, a carrier gas inlet network, and a cleaning air inlet network. The external air inlet network is connected to the material source container and is used to provide pressurized gas. The carrier gas inlet network is connected to the foaming device and is used to provide carrier gas. The cleaning air inlet network is connected to both the external air inlet network and the carrier gas inlet network and is used to provide cleaning gas.

[0009] This invention stores the chemical source liquid in a material source container, which is then placed at the front end of the foaming device to convert the chemical source liquid into a reactive gas for supply to external equipment. When the amount of chemical source liquid in the foaming device is insufficient, it can be supplied to the foaming device in small amounts multiple times from the material source container, effectively controlling the supply speed and quantity of the chemical source liquid, making the chemical source liquid in the foaming device more stable and controllable. When the amount of chemical source liquid in the material source container is insufficient, simply replacing the material source container will continue the supply of chemical source liquid, effectively shortening maintenance time.

[0010] As a preferred embodiment of this utility model, the interior of the shell is provided with a first box and a second box, the material source container is located in the first box, and the foaming device is located in the second box.

[0011] The housing is also provided with a first gas detection component, the first box is provided with a second gas detection component, and the second box is provided with a third gas detection component.

[0012] This invention detects whether there is a dangerous gas leak in the shell, the first box, and the second box, thereby enabling leak detection and troubleshooting of the system operation and ensuring the safety of the chemical source liquid supply.

[0013] Preferably, the volume of the material source container is 0.3 to 1.5 times the volume of the foaming device, for example, it can be 0.3 times, 0.33 times, 0.4 times, 0.5 times, 0.6 times, 0.8 times, 1 time, 1.1 times, 1.2 times, 1.3 times, 1.4 times or 1.5 times, but it is not limited to the listed values. Other unlisted values ​​within this range are also applicable.

[0014] In this invention, if the volume of the material source container is too small, the number of times the material source container needs to be replaced increases, which can easily cause gas leakage and pose a safety hazard. If the volume of the material source container is too large, the difficulty of replacing the material source container increases with its weight, which reduces work efficiency.

[0015] This invention reduces the system's footprint, lowers operating costs, and alleviates the burden on users regarding the replacement and replenishment of chemical source solutions.

[0016] As a preferred embodiment of this utility model, a cooling device is provided on the outside of the shell, and the cooling device is circulatedly connected to the foaming device.

[0017] The cooling device of this invention is used to control the operating temperature of the foaming device, ensuring temperature uniformity during foaming operation and making the flow rate of the reaction gas more uniform.

[0018] As a preferred embodiment of this utility model, the liquid supply network includes a replenishment pipe, one end of which extends into the material source container and is located below the surface of the chemical source liquid, and the other end of which is connected to the foaming device.

[0019] The replenishment pipeline is provided with a first manual valve, a first pneumatic valve, a second pneumatic valve, and a second manual valve in sequence along the flow direction of the chemical source liquid.

[0020] As a preferred technical solution of this utility model, the gas supply network includes a main gas outlet pipe, a branch gas supply pipe and a detection branch pipe. One end of the main gas outlet pipe extends into the aerating device, and the other end is connected to the branch gas supply pipe and the detection branch pipe respectively. The ends of the branch gas supply pipe and the detection branch pipe away from the main gas outlet pipe are independently connected to the outside of the housing.

[0021] The main outlet pipe is equipped with a third manual valve, the gas supply branch pipe is equipped with a third pneumatic valve and a fourth manual valve in sequence along the gas flow direction, and the detection branch pipe is equipped with a fifth manual valve.

[0022] The gas supply branch pipe of this invention is used to supply reaction gas to the reaction zone of the chemical vapor deposition equipment outside the housing, and the detection branch pipe is used to transport the reaction gas to the detection equipment outside the housing for gas detection.

[0023] As a preferred embodiment of the present invention, the external air intake network includes a first air intake main pipe, one end of which extends into the material source container and is located above the surface of the chemical source liquid, and the other end is connected to the outside of the shell.

[0024] Along the flow direction of the pressurized gas, the first intake pipe is sequentially equipped with a sixth manual valve, a first filter, a fourth pneumatic valve, a first pressure regulating valve, a flow detection component, a first check valve, a fifth pneumatic valve, and a seventh manual valve.

[0025] The section of the first main intake pipe located between the fifth pneumatic valve and the seventh manual valve is connected to the cleaning intake pipe network.

[0026] As a preferred embodiment of the present invention, the carrier gas inlet pipeline includes a second inlet main pipe, one end of which extends into the foaming device, and the other end of which is connected to the outside of the housing.

[0027] The second intake main pipe is provided with an eighth manual valve, a second check valve, a second filter, a sixth pneumatic valve, a second pressure regulating valve, a first pressure detection component, a seventh pneumatic valve and a ninth manual valve in sequence along the flow direction of the carrier gas.

[0028] The section of the second intake main pipe located between the first pressure detection component and the seventh pneumatic valve is connected to the cleaning intake pipe network.

[0029] The foaming device is equipped with a second pressure detection component.

[0030] This invention detects the gas pressure inside the bubbling device to prevent dangers such as explosions caused by excessive pressure inside the bubbling device.

[0031] As a preferred technical solution of this utility model, the cleaning air intake network includes a cleaning main pipe, a first cleaning branch pipe and a second cleaning branch pipe. One end of the cleaning main pipe is connected to the outside of the housing, and the other end is connected to the first cleaning branch pipe and the second cleaning branch pipe respectively. The end of the first cleaning branch pipe away from the cleaning main pipe is connected to the external air intake network and the liquid supply network respectively. The end of the second cleaning branch pipe away from the cleaning main pipe is connected to the carrier gas intake network.

[0032] The cleaning main pipe is provided with a tenth manual valve, a third filter, an eighth pneumatic valve and a third pressure regulating valve in sequence along the flow direction of the cleaning gas. The first cleaning branch pipe is provided with a third check valve, a ninth pneumatic valve and a tenth pneumatic valve in sequence along the flow direction of the cleaning gas. The second cleaning branch pipe is provided with a fourth check valve and an eleventh pneumatic valve in sequence along the flow direction of the cleaning gas.

[0033] In this invention, the cleaning inlet pipe network is used for cleaning operations during the replacement or replenishment of the chemical source solution after the chemical vapor deposition equipment has completed its work. Simultaneously, when the system detects a hazardous gas leak within the casing, the first chamber, or the second chamber, cleaning gas can be introduced into the casing through the cleaning main pipe to clean the corresponding pipe network.

[0034] As a preferred embodiment of this utility model, the housing is further provided with an air extraction pipe, and the air extraction pipe is externally connected to a vacuum pumping device.

[0035] The housing is also equipped with a temperature sensing component and a negative pressure detection component.

[0036] This invention uses an external vacuum device to continuously evacuate the inside of the housing. When gas leakage occurs in the housing, the gas can be extracted to the outside of the housing through the extraction pipe, and then discharged after post-treatment, thereby improving the safety of the system operation.

[0037] As a preferred embodiment of this utility model, the material source container includes at least two replenishment bottles arranged in parallel, and the at least two replenishment bottles are independently connected to the foaming device, the external air inlet network and the cleaning air inlet network.

[0038] The gas supply system for chemical vapor deposition provided by this utility model includes a liquid replenishment process and a source replacement process. The liquid replenishment process specifically includes: introducing pressurized gas into the material source container using an external air inlet network; transporting the chemical source liquid to the foaming device through the liquid supply network to form reactive gas; and then sending the reactive gas into the reaction zone of the chemical vapor deposition equipment through the gas supply network. The source replacement process specifically includes: cutting off the supply of the chemical source liquid; introducing cleaning gas into the material source container through a cleaning air inlet network for cleaning; after cleaning, disconnecting the connection between the material source container and the external air inlet network; and then replacing the material source container.

[0039] The system refers to an equipment system, device system, or production device.

[0040] Compared with the prior art, the beneficial effects of this utility model are as follows:

[0041] This invention provides a gas supply system for chemical vapor deposition. Through optimized design, the gas supply device and pipeline network are integrated into a unified housing, significantly reducing the system's footprint. Simultaneously, the material source container holding the chemical source solution is positioned at the front end of the foaming device, ensuring liquid level stability within the foaming device and achieving continuous gas supply. Furthermore, the use of external air inlet pipelines, carrier gas inlet pipelines, and cleaning air inlet pipelines allows for precise control of the chemical source solution supply, simplifying and facilitating chemical source solution replacement and replenishment operations, shortening maintenance time, reducing chemical source solution costs, and improving work efficiency. Attached Figure Description

[0042] Figure 1 This is a schematic diagram of the gas supply system for chemical vapor deposition provided in one embodiment 1 of the present invention.

[0043] Figure 2 This is a schematic diagram of the structure of the liquid supply network and the gas supply network provided in one embodiment 1 of this utility model.

[0044] Figure 3 This is a schematic diagram of the external air intake network provided in one embodiment 1 of the present invention.

[0045] Figure 4 This is a schematic diagram of the structure of the carrier gas intake pipeline network provided in one embodiment 1 of this utility model.

[0046] Figure 5 This is a schematic diagram of the structure of the cleaning air intake network provided in one embodiment 1 of this utility model.

[0047] Among them, 100-shell; 101-first gas detection component; 102-temperature sensing component; 103-negative pressure detection component; 200-first housing; 201-second gas detection component; 300-second housing; 301-third gas detection component; 400-material source container; 500-bubbling device; 600-cooling device; 401-first weighing and metering component; 501-second weighing and metering component; 502-liquid level detection component.

[0048] 1-First air inlet main pipe; 2-Liquid replenishment pipe; 3-First cleaning branch pipe; 4-Cleaning main pipe; 5-Second cleaning branch pipe; 6-Air outlet main pipe; 7-Air supply branch pipe; 8-Detection branch pipe; 9-Second air inlet main pipe; 10-Air extraction pipe; 21-Liquid inlet pipe; 22-Liquid outlet pipe.

[0049] K1 - First manual valve; K2 - Second manual valve; K3 - Third manual valve; K4 - Fourth manual valve; K5 - Fifth manual valve; K6 - Sixth manual valve; K7 - Seventh manual valve; K8 - Eighth manual valve; K9 - Ninth manual valve; K10 - Tenth manual valve; P1 - First pneumatic valve; P2 - Second pneumatic valve; P3 - Third pneumatic valve; P4 - Fourth pneumatic valve; P5 - Fifth pneumatic valve; P6 - Sixth pneumatic valve; P7 - Seventh pneumatic valve; P8 - Eighth pneumatic valve; P9 - Ninth pneumatic valve; P10 - Tenth pneumatic valve; P11 - Eleventh pneumatic valve; S1 - First diaphragm valve; S2 - Second diaphragm valve.

[0050] 11-First filter; 91-Second filter; 41-Third filter; 12-First check valve; 92-Second check valve; 32-Third check valve; 52-Fourth check valve; 13-First pressure regulating valve; 93-Second pressure regulating valve; 43-Third pressure regulating valve; 14-Flow detection assembly; 94-First pressure detection assembly; 95-Second pressure detection assembly. Detailed Implementation

[0051] It should be understood that in the description of this utility model, the terms "center," "upper," "lower," "front," "rear," "left," "right," "top," "bottom," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. These terms are used only for the convenience of describing this utility model and for simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model. Furthermore, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, features defined with "first," "second," etc., may explicitly or implicitly include one or more of that feature. In the description of this utility model, unless otherwise stated, "a plurality of" means two or more.

[0052] It should be noted that, in the description of this utility model, unless otherwise explicitly specified and limited, the terms "set," "connected," and "linked" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0053] Those skilled in the art should understand that this utility model necessarily includes the necessary pipelines, conventional valves and general pump equipment for achieving complete process, but the above content is not the main utility model point of this utility model. Those skilled in the art can add layouts based on process flow and equipment structure selection. This utility model does not make any special requirements or specific limitations in this regard.

[0054] The technical solution of this utility model will be further described below with reference to the accompanying drawings and specific embodiments.

[0055] Traditional chemical vapor deposition equipment stores the chemical source solution in a dedicated storage room. Because the pipeline between the dedicated storage room and the foaming device is long, it can easily interfere with the stability of the liquid level and temperature of the chemical source solution, resulting in uncontrollable supply of chemical source solution. Furthermore, the operation of replacing and replenishing the chemical source solution is complicated, which is not conducive to the continuity of chemical source solution supply.

[0056] In one specific embodiment, this utility model provides a gas supply system for chemical vapor deposition, including a housing. Inside the housing are a material source container and a foaming device. The material source container contains a chemical source liquid and is connected to the foaming device via a supply pipeline, for feeding the chemical source liquid into the foaming device for foaming treatment to form a reactive gas. The foaming device is connected to the outside of the housing via a gas supply pipeline, for delivering the reactive gas to corresponding equipment outside the housing. A first weighing and metering component is installed at the bottom of the material source container for online weighing of the material source container. When insufficient weight is detected, the material source container is replaced to replenish the chemical source liquid, ensuring a sufficient supply of chemical source liquid in the foaming device. A second weighing and metering component is installed at the bottom of the foaming device for online weighing of the foaming device. When insufficient weight is detected, the chemical source liquid in the material source container is replenished to the foaming device via the supply pipeline. The foaming device is also equipped with a liquid level detection component to detect the liquid level of the chemical source liquid inside the foaming device. When the liquid level is insufficient, the chemical source liquid in the material source container is promptly replenished to the foaming device through the liquid supply network. The housing is also equipped with an external air inlet network, a carrier gas inlet network, and a cleaning air inlet network. The external air inlet network is connected to the material source container and provides pressurized gas. By increasing the pressure in the cavity of the material source container, the chemical source liquid is squeezed into the liquid supply network and then sent to the foaming device. The carrier gas inlet network is connected to the foaming device and provides carrier gas for foaming to generate reactive gas. The cleaning air inlet network is connected to both the external air inlet network and the carrier gas inlet network and provides cleaning gas for cleaning the internal network of the housing.

[0057] In some embodiments, the housing is also provided with an exhaust pipe, which is connected to a vacuum pumping device to continuously evacuate the housing, maintain a negative pressure inside the housing, and also discharge dangerous gases inside the housing through the exhaust pipe, thereby improving operational safety.

[0058] Furthermore, the housing is also equipped with a first gas detection component, a temperature sensing component, and a negative pressure detection component. The first gas detection component detects whether there is a hazardous gas leak inside the housing. If a leak is detected, the valves on the hazardous gas pipelines inside the housing are closed, and the valves on the cleaning inlet pipeline are opened to clean the pipeline network inside the housing. After the hazardous gas is completely extracted by the negative pressure inside the housing, leak detection and troubleshooting are performed on the hazardous gas pipelines. The temperature sensing component detects the temperature inside the housing to prevent excessively high temperatures caused by hazardous gas leaks, which could lead to explosions or other hazardous reactions. The negative pressure detection component detects the negative pressure inside the housing. If the negative pressure inside the housing is insufficient, personnel need to check for cracks or damage between the extraction pipeline and the housing. The system is restarted only after the negative pressure returns to normal.

[0059] In some embodiments, the housing contains a first chamber and a second chamber. The material source container is located in the first chamber, and the foaming device is located in the second chamber. Preferably, the volume of the material source container is 0.3 to 1.5 times the volume of the foaming device.

[0060] Furthermore, a second gas detection component is installed inside the first chamber to detect whether a gas leak has occurred within the first chamber. When the second gas detection component detects a hazardous gas leak, it closes the valves on all hazardous gas pipelines within the first chamber and opens the valves on the cleaning inlet pipeline to clean the pipeline. After the hazardous gas is completely extracted by the negative pressure inside the casing, the hazardous gas pipelines are checked for leaks. A third gas detection component is installed inside the second chamber to detect whether a gas leak has occurred within the second chamber. When the third gas detection component detects a hazardous gas leak, it closes the valves on all hazardous gas pipelines within the second chamber and opens the valves on the cleaning inlet pipeline to clean the pipeline. After the hazardous gas is completely extracted by the negative pressure inside the casing, the hazardous gas pipelines are checked for leaks.

[0061] In some embodiments, the material source container includes at least two replenishment bottles arranged in parallel, each of which is independently connected to the foaming device, the external air inlet network, and the cleaning air inlet network. This invention allows for the configuration of multiple parallel replenishment bottles as replenishment containers for the chemical source liquid, with each replenishment bottle equipped with an independent network and valve assembly. The supply network can be equipped with multiple universal connectors and valve assemblies to independently connect the parallel replenishment bottles to the foaming device. The external air inlet network can be equipped with multiple universal connectors and valve assemblies to independently inject pressurized gas into different replenishment bottles. Similarly, the cleaning air inlet network can also be equipped with multiple universal connectors and valve assemblies, connecting to multiple parallel replenishment bottles. When one of the replenishment bottles is opened, the others are closed. After the chemical source liquid in the opened replenishment bottle is completely used up, the bottle is closed and the source liquid is replaced. At the same time, any of the other replenishment bottles is opened to continuously provide a sufficient supply of chemical source liquid to the foaming device. This greatly reduces the risk of operation stoppage due to insufficient chemical source liquid in the foaming device and improves the practicality of the replenishment bottles.

[0062] In some embodiments, a cooling device is provided on the exterior of the housing. This cooling device is circulated to the foaming device to provide cooling water and thus control the temperature of the foaming device. Specifically, the cooling device is circulated to the foaming device via an inlet pipe and an outlet pipe. The inlet of the inlet pipe is connected to the outlet of the cooling device, and the inlet pipe passes sequentially through the housing and the second casing, connecting to the water inlet of the foaming device. The inlet of the outlet pipe is connected to the water outlet of the foaming device, and the outlet pipe passes sequentially through the second casing and the housing, connecting to the inlet of the cooling device. Furthermore, a first diaphragm valve and a second diaphragm valve are respectively provided on the inlet pipe and the outlet pipe to control the opening and closing of the cooling water. After the cooling water is kept at a constant temperature by the cooling device, it flows through the inlet pipe and the first diaphragm valve to the foaming device, providing a uniform and stable temperature for the foaming device. After the cooling water passes through the foaming device, its temperature changes, and it flows back into the cooling device through the outlet pipe and the second diaphragm valve to re-stabilize the temperature. When the system is working, the first diaphragm valve and the second diaphragm valve must be opened simultaneously to ensure that the inlet and outlet pipes are unobstructed.

[0063] It should also be noted that the cooling device of this utility model necessarily includes a chiller unit, necessary pipelines, conventional valves and general pump equipment for realizing the process. Those skilled in the art can add layouts based on the process flow and equipment structure selection. This utility model does not make any special requirements or specific limitations in this regard.

[0064] In some embodiments, the liquid supply network includes a replenishment pipe, one end of which extends into the material source container and is located below the surface of the chemical source liquid. The other end of the replenishment pipe connects to the foaming device and is located in a cavity above the surface of the chemical source liquid within the foaming device. Along the flow direction of the chemical source liquid, the replenishment pipe is sequentially equipped with a first manual valve, a first pneumatic valve, a second pneumatic valve, and a second manual valve. The first manual valve is located on a section of the replenishment pipe inside the first housing. The chemical source liquid enters the replenishment pipe through the first manual valve. When the material source container needs to be replaced, the first manual valve should be closed to disconnect the material source container from the replenishment pipe. The first pneumatic valve is located on a section of the replenishment pipe outside the first housing. It is closed during pipe cleaning and reopened after cleaning. The second pneumatic valve is located on a section of the replenishment pipe outside the second housing and is used to switch the connection between the replenishment pipe and the foaming device. The second manual valve is located on the liquid replenishment pipeline inside the second tank. When it is necessary to replace the material source container, closing the second manual valve will disconnect the connection between the foaming device and the material source container.

[0065] In some embodiments, the gas supply network includes a main outlet pipe, supply branch pipes, and detection branch pipes. The main outlet pipe serves as the main pipeline for transporting the reactant gas. One end of the main outlet pipe passes through the second housing and extends into the bubbling device. The other end connects to both the supply branch pipe and the detection branch pipe. The ends of the supply branch pipe and the detection branch pipe furthest from the main outlet pipe are independently connected to the outside of the housing. The supply branch pipe is the branch pipe through which the reactant gas flows to the reaction zone, and the detection branch pipe is the branch pipe through which the reactant gas flows to the detection equipment. A third manual valve is installed on the main outlet pipe, located on a section of the main outlet pipe inside the second housing. This third manual valve is a safety valve; it is opened when the system is operating to ensure the reactant gas flows into the main outlet pipe, and closed when the system stops operating. A third pneumatic valve and a fourth manual valve are sequentially installed on the supply branch pipes along the gas flow direction to control the flow of reactant gas into the reaction zone during system operation. The fourth manual valve is opened before system operation to ensure unimpeded transport of the reactant gas, and closed when the system stops to ensure no flow of reactant gas. The detection branch pipe is equipped with a fifth manual valve. When gas detection is required, the fifth manual valve is opened to collect gas, and when not needed, the fifth manual valve is closed.

[0066] In some embodiments, the external air intake network includes a first main air intake pipe. One end of the first main air intake pipe penetrates the first housing, extends into the material source container, and is located above the surface of the chemical source liquid. The other end connects to the outside of the housing, serving as a connection to a gas supply pipe or gas source located outside the housing that provides pressurized gas. The pressurized gas is then delivered to the cavity of the material source container, increasing the cavity pressure and forcing the chemical source liquid into the foaming device. The pressurized gas can be hydrogen, commonly used in the art. Along the flow direction of the pressurized gas, the first main air intake pipe is sequentially equipped with a sixth manual valve 1, a first filter, a fourth pneumatic valve, a first pressure regulating valve, a flow detection component, a first check valve, a fifth pneumatic valve, and a seventh manual valve. The sixth manual valve is a manual control valve for the first main air intake pipe, allowing manual control of its opening and closing. When the system is shut down, the sixth manual valve is manually closed to reduce the risk of gas leakage from the first main air intake pipe; when the system is running, the sixth manual valve is manually opened to allow pressurized gas to enter the first main air intake pipe. The first filter, located after the sixth manual valve, is used to filter impurities in the pressurized gas, preventing them from contaminating subsequent pipelines, valve assemblies, or chemical source liquids. The fourth pneumatic valve, located after the first filter, is used to control the opening and closing of the replenishment process. The first pressure regulating valve is used to adjust the pressure of the pressurized gas, preventing uncontrollable replenishment volume due to excessive pressure or slow replenishment speed due to insufficient pressure. The flow detection component is used to regulate the gas flow rate entering the material source container, thereby precisely controlling the replenishment volume. The first one-way valve prevents backflow of gas in the first intake main pipe when replenishment stops. Furthermore, the section of the first intake main pipe located between the fifth pneumatic valve and the seventh manual valve is connected to the cleaning intake pipeline network. The fifth pneumatic valve is installed on the section of the first intake main pipe located outside the first housing; it is closed when the pipeline network is being cleaned and opened when cleaning is not required. The seventh manual valve is installed on the pipe section of the first air intake main pipe located inside the first housing. When it is necessary to replace the material source container, the seventh manual valve should be closed to disconnect the material source container from the first air intake main pipe.

[0067] In some embodiments, the carrier gas inlet pipeline includes a second main inlet pipe. One end of the second main inlet pipe passes through the second housing and extends into the foaming device, while the other end connects to the outside of the housing. This connects to a gas supply pipe or source located outside the housing that provides the carrier gas, thereby delivering the carrier gas to the foaming device. The carrier gas can be hydrogen, commonly used in the art. Along the flow direction of the carrier gas, the second main inlet pipe is sequentially equipped with an eighth manual valve, a second one-way valve, a second filter, a sixth pneumatic valve, a second pressure regulating valve, a first pressure detection component, a seventh pneumatic valve, and a ninth manual valve. The eighth manual valve is a manual control valve for the second main inlet pipe, allowing manual control of its opening and closing. When the system is shut down, the eighth manual valve is manually closed to reduce the risk of gas leakage from the second main inlet pipe; when the system is running, the eighth manual valve is manually opened to allow external carrier gas to enter the second main inlet pipe. The second one-way valve prevents backflow of gas within the second main inlet pipe. The second filter is used to filter impurities contained in the carrier gas, preventing impurities from contaminating subsequent pipelines, valve assemblies, or chemical source liquids. The sixth pneumatic valve is used to switch the opening and closing of the second main air intake pipe. The second pressure regulating valve is used to regulate the pressure of the carrier gas, preventing uncontrollable carrier gas flow due to excessive pressure or slow carrier gas flow due to insufficient pressure. The first pressure detection component is used to detect the pressure of the carrier gas in the second main air intake pipe. Furthermore, the section of the second main air intake pipe located between the first pressure detection component and the seventh pneumatic valve is connected to the cleaning air intake network. The seventh pneumatic valve is installed on the section of the second main air intake pipe located outside the second housing, and is used to switch the opening and closing of the cleaning gas. The ninth manual valve is installed on the section of the second main air intake pipe located inside the second housing. When the system is shut down, closing the ninth manual valve disconnects the aerator from the second main air intake pipe, improving operational safety.

[0068] Furthermore, the foaming device is equipped with a second pressure detection component to detect the air pressure inside the foaming device and prevent the risk of explosion due to excessive pressure.

[0069] In some embodiments, the cleaning air intake network includes a main cleaning pipe, a first cleaning branch pipe, and a second cleaning branch pipe. One end of the main cleaning pipe is connected to the outside of the housing, serving as a connection to a gas supply pipe or source located outside the housing that provides cleaning gas. The other end of the main cleaning pipe is connected to the first and second cleaning branch pipes, respectively. The end of the first cleaning branch pipe furthest from the main cleaning pipe is connected to the external air intake network and the liquid supply network, respectively. The end of the second cleaning branch pipe furthest from the main cleaning pipe is connected to the carrier gas intake network, enabling cleaning of the network when changing material source containers. Along the flow direction of the cleaning gas, the main cleaning pipe is sequentially equipped with a tenth manual valve, a third filter, an eighth pneumatic valve, and a third pressure regulating valve. The tenth manual valve is closed during system operation to prevent cleaning gas from entering the pipeline and affecting the reaction gas of the foaming device. It is opened when cleaning is required. The third filter filters impurities brought in by the cleaning gas from the outside, preventing impurities from contaminating subsequent pipelines, valve groups, or chemical source liquids. The eighth pneumatic valve switches the flow of cleaning gas during the cleaning process. The third pressure regulating valve is used to regulate the pressure of the cleaning gas to prevent damage to the interface due to excessive pressure in the cleaning main pipe.

[0070] The end of the first cleaning branch pipe furthest from the main cleaning pipe is connected to both the first air intake main pipe and the replenishment pipe. A third one-way valve, a ninth pneumatic valve, and a tenth pneumatic valve are sequentially installed on the first cleaning branch pipe along the flow direction of the cleaning gas. Specifically, the outlet of the first cleaning branch pipe connects to the section of the first air intake main pipe located between the fifth pneumatic valve and the seventh manual valve. The section of the first cleaning branch pipe located between the ninth and tenth pneumatic valves connects to the section of the replenishment pipe located between the first manual valve and the first pneumatic valve. The third one-way valve prevents backflow of residual gas in the first air intake main pipe after the ninth pneumatic valve is opened. The ninth pneumatic valve is used to switch the opening and closing of the cleaning gas entering the first air intake main pipe and the replenishment pipe during cleaning. The tenth pneumatic valve is used to switch the opening and closing of the cleaning gas entering the first air intake main pipe during cleaning.

[0071] A fourth check valve and an eleventh pneumatic valve are sequentially installed on the second cleaning branch pipe along the flow direction of the cleaning gas. Specifically, the outlet of the second cleaning branch pipe connects to the section of the second main intake pipe located between the first pressure detection component and the seventh pneumatic valve. The fourth check valve prevents backflow of residual carrier gas in the second main intake pipe after the eleventh pneumatic valve is opened. The eleventh pneumatic valve is used to switch the opening and closing of the cleaning gas entering the second main intake pipe during cleaning.

[0072] The gas supply system provided by this utility model requires the opening of the first, second, third, fourth, sixth, seventh, eighth, and ninth manual valves during operation. When liquid replenishment is needed, the first, second, fourth, and fifth pneumatic valves are opened to inject pressurized gas into the first inlet main pipe. After pressure and flow control by the first pressure regulating valve and flow detection component, the gas enters the material source container to force the chemical source liquid into the foaming device. Carrier gas is injected into the housing through the second inlet main pipe, and the sixth and seventh pneumatic valves are opened. After pressure control by the second pressure regulating valve, the carrier gas enters the foaming device and mixes with the chemical source liquid to form a gas-liquid mixture reaction gas. Subsequently, the third pneumatic valve is opened to deliver the reaction gas to the reaction zone of the chemical vapor deposition equipment.

[0073] When the gas supply system provided by this utility model requires replacement of the material source container, the sixth, fourth, eighth, first, second, third, ninth, and seventh manual valves must be closed. Then, the tenth, first, and seventh manual valves must be opened. After cleaning the first air inlet main pipe and the liquid replenishment pipe with cleaning gas, the seventh and first manual valves must be closed again. The connection between the material source container and the first air inlet main pipe and the liquid replenishment pipe must be disconnected, and the material source container can then be replaced.

[0074] It should be noted that the gas supply system of this utility model is also equipped with necessary connecting pipelines and switch control valves. This utility model does not impose any special limitations on these. Those skilled in the art should reasonably adjust, add, or delete them according to actual production needs. It should be clarified that new technical solutions generated by deleting some unnecessary connecting pipelines and switch control valves, or replacing single-function switch control valves with multi-function integrated control valves, or using external automatic control systems electrically connected to the switch control valves to control the opening of the corresponding valves, etc., which are common and well-known technical means by those skilled in the art, also fall within the scope of disclosure and protection of this utility model.

[0075] For example, the gas supply method using the gas supply system for chemical vapor deposition described in this utility model includes a liquid replenishment process and a source replacement process.

[0076] The replenishment process specifically includes: introducing pressurized gas into the material source container through an external air inlet network, transporting the chemical source liquid to the foaming device through a liquid supply network to form reaction gas, and then sending the reaction gas into the reaction zone of the chemical vapor deposition equipment through a gas supply network.

[0077] The source replacement process specifically includes: cutting off the delivery of the chemical source liquid, using the cleaning air inlet network to introduce cleaning gas into the material source container for cleaning, and after cleaning, disconnecting the connection between the material source container and the external air inlet network, and then replacing the material source container.

[0078] Example 1

[0079] This embodiment provides a gas supply system for chemical vapor deposition, such as... Figure 1 As shown, the device includes a housing 100, inside which are a first chamber 200 and a second chamber 300. The first chamber 200 contains a material source container 400, which holds a chemical source liquid. A first weighing and metering component 401 is located at the bottom of the material source container 400. The second chamber 300 contains a foaming device 500, with a second weighing and metering component 501 located at its bottom. The foaming device 500 also contains a liquid level detection component 502 and a second pressure detection component 95. The volume of the material source container 400 is 0.5 times the volume of the foaming device 500.

[0080] like Figure 1 and Figure 2 As shown, a vacuum pipe 10 is provided on the housing 100, and a vacuum pumping device is connected to the external vacuum pipe 10 for continuous vacuuming. The housing 100 is also equipped with a first gas detection component 101, a temperature sensing component 102, and a negative pressure detection component 103, used to detect hazardous gas leakage, temperature, and negative pressure status within the housing 100, respectively. A second gas detection component 201 is provided inside the first enclosure 200 for detecting hazardous gas leakage within the first enclosure 200. A third gas detection component 301 is provided inside the second enclosure 300 for detecting hazardous gas leakage within the second enclosure 300. Figure 2As shown, the material source container 400 is connected to the foaming device 500 via a liquid supply network. The liquid supply network includes a replenishment pipe 2, one end of which passes through the first housing 200 and extends into the material source container 400, positioned below the surface of the chemical source liquid. The other end of the replenishment pipe 2 passes through the second housing 300 and extends into the foaming device 500, used to transport the chemical source liquid to the foaming device 500. Along the flow direction of the chemical source liquid, the replenishment pipe 2 is sequentially equipped with a first manual valve K1, a first pneumatic valve P1, a second pneumatic valve P2, and a second manual valve K2. The foaming device 500 is connected to the outside of the housing 100 via an air supply network. The air supply network includes a main air outlet pipe 6, a branch air supply pipe 7, and a detection branch pipe 8. One end of the main air outlet pipe 6 passes through the second housing 300 and extends into the foaming device 500, while the other end of the main air outlet pipe 6 is connected to both the branch air supply pipe 7 and the detection branch pipe 8. The gas supply branch pipe 7, at its end furthest from the main gas outlet pipe 6, connects to the outside of the housing 100 and is used to connect to the reaction zone of the chemical vapor deposition equipment. The detection branch pipe 8, at its end furthest from the main gas outlet pipe 6, connects to the outside of the housing 100 and is used to connect to detection equipment. A third manual valve K3 is installed on the main gas outlet pipe 6, located on a section of the main gas outlet pipe 6 inside the second housing 300. A third pneumatic valve P3 and a fourth manual valve K4 are sequentially installed on the gas supply branch pipe 7 along the direction of the reaction gas flow. A fifth manual valve K5 is installed on the detection branch pipe 8. Figure 1 As shown, a cooling device 600 is also provided on the outside of the housing 100. The cooling device 600 is circulatedly connected to the foaming device 500 through the liquid inlet pipe 21 and the liquid outlet pipe 22. A first diaphragm valve S1 and a second diaphragm valve S2 are respectively provided on the liquid inlet pipe 21 and the liquid outlet pipe 22.

[0081] The housing 100 also includes an external air intake network, a carrier air intake network, and a cleaning air intake network. For example... Figure 3 As shown, the external air intake network includes a first main air intake pipe 1. One end of the first main air intake pipe 1 passes through the first housing 200 and extends into the material source container 400, positioned above the surface of the chemical source liquid. The other end of the first main air intake pipe 1 connects to the outside of the housing 100, used to connect to a gas supply source providing pressurized gas, which can be hydrogen, to inject pressurized gas into the material source container 400. Along the flow direction of the pressurized gas, the first main air intake pipe 1 is sequentially equipped with a sixth manual valve K6, a first filter 11, a fourth pneumatic valve P4, a first pressure regulating valve 13, a flow detection component 14, a first check valve 12, a fifth pneumatic valve P5, and a seventh manual valve K7. Figure 4As shown, the carrier gas inlet pipeline includes a second main inlet pipe 9. One end of the second main inlet pipe 9 penetrates the second housing 300 and extends below the surface of the chemical source liquid inside the foaming device 500. The other end of the second main inlet pipe 9 connects to the outside of the housing 100 to connect to a gas supply source for injecting carrier gas into the foaming device 500; this carrier gas can be hydrogen. Along the flow direction of the carrier gas, the second main inlet pipe 9 is sequentially equipped with an eighth manual valve K8, a second one-way valve 92, a second filter 91, a sixth pneumatic valve P6, a second pressure regulating valve 93, a first pressure detection component 94, a seventh pneumatic valve P7, and a ninth manual valve K9. Figure 5 As shown, the cleaning intake pipeline network includes a main cleaning pipe 4, a first cleaning branch pipe 3, and a second cleaning branch pipe 5. One end of the main cleaning pipe 4 is connected to the outside of the housing 100 and is used to connect to the gas supply source for providing cleaning gas. The other end of the main cleaning pipe 4 is connected to the first cleaning branch pipe 3 and the second cleaning branch pipe 5 respectively. The end of the first cleaning branch pipe 3 away from the main cleaning pipe 4 is connected to the first intake main pipe 1 and the liquid replenishment pipe 2 respectively. The end of the second cleaning branch pipe 5 away from the main cleaning pipe 4 is connected to the second intake main pipe 9. The main cleaning pipe 4 is equipped with a tenth manual valve K10, a third filter 41, an eighth pneumatic valve P8, and a third pressure regulating valve 43 in sequence along the flow direction of the cleaning gas. The first cleaning branch pipe 3 is equipped with a third one-way valve 32, a ninth pneumatic valve P9, and a tenth pneumatic valve P10 in sequence along the flow direction of the cleaning gas. The outlet of the first cleaning branch pipe 3 is connected to the section of the first intake main pipe 1 located between the fifth pneumatic valve P5 and the seventh manual valve K7. The first cleaning branch pipe 3, located between the ninth pneumatic valve P9 and the tenth pneumatic valve P10, connects to the section of the replenishment pipe 2 located between the first manual valve K1 and the first pneumatic valve P1. The second cleaning branch pipe 5 is sequentially equipped with a fourth one-way valve 52 and an eleventh pneumatic valve P11 along the flow direction of the cleaning gas. The outlet of the second cleaning branch pipe 5 connects to the section of the second air inlet main pipe 9 located between the first pressure detection component 94 and the seventh pneumatic valve P7.

[0082] During operation, the gas supply system of this embodiment requires the opening of the first manual valve K1, the second manual valve K2, the third manual valve K3, the fourth manual valve K4, the sixth manual valve K6, the seventh manual valve K7, the eighth manual valve K8, and the ninth manual valve K9. When liquid replenishment is needed, the first pneumatic valve P1, the second pneumatic valve P2, the fourth pneumatic valve P4, and the fifth pneumatic valve P5 are opened, while ensuring that the remaining pneumatic valves are closed. The pressurized gas is injected into the first air inlet pipe 1, and after pressure and flow control by the first pressure regulating valve 13 and the flow detection component 14, it enters the material source container 400 to force the chemical source liquid into the foaming device 500. After liquid replenishment is completed, the carrier gas is injected into the housing 100 through the second air inlet pipe 9, and the sixth pneumatic valve P6 and the seventh pneumatic valve P7 are opened. The carrier gas enters the foaming device 500 after pressure control by the second pressure regulating valve 93, and mixes with the chemical source liquid to form a gas-liquid mixture reaction gas. Then, the third pneumatic valve P3 is opened to deliver the reaction gas to the reaction zone of the chemical vapor deposition equipment.

[0083] When the gas supply system of this embodiment requires replacement of the material source container 400, the first manual valve K1, the second manual valve K2, the third manual valve K3, the fourth manual valve K4, the sixth manual valve K6, the seventh manual valve K7, the eighth manual valve K8, and the ninth manual valve K9 must be closed first to keep the system in a standstill. Then, the first manual valve K1, the seventh manual valve K7, and the tenth manual valve K10 are opened to clean the first air inlet main pipe 1 and the liquid replenishment pipe 2 with cleaning gas. After that, the first manual valve K1 and the seventh manual valve K7 are closed again, and the connection between the material source container 400 and the first air inlet main pipe 1 and the liquid replenishment pipe 2 is disconnected. Then, the material source container 400 can be replaced.

[0084] Example 2

[0085] This embodiment provides a gas supply system for chemical vapor deposition. The difference from Embodiment 1 is that the material source container includes multiple replenishment bottles arranged in parallel as replenishment containers for the chemical source liquid. Each replenishment bottle is equipped with an independent pipeline and valve group to independently connect to the foaming device, the external air inlet pipeline and the cleaning air inlet pipeline. The rest of the structure is the same as that of Embodiment 1.

[0086] In this embodiment, when one of the replenishment bottles is opened, the other replenishment bottles are closed. After the chemical source liquid in the opened replenishment bottle is completely used up, the replenishment bottle is closed and the source liquid is replaced. At the same time, any of the other replenishment bottles is opened to continuously provide sufficient chemical source liquid to the foaming device, which greatly reduces the risk of operation stoppage due to insufficient chemical source liquid in the foaming device.

[0087] The applicant declares that the above description is only a specific embodiment of the present utility model, but the protection scope of the present utility model is not limited thereto. Those skilled in the art should understand that any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope disclosed in the present utility model fall within the protection and disclosure scope of the present utility model.

Claims

1. A gas supply system for chemical vapor deposition, characterized in that, The gas supply system includes a shell, inside which a material source container and a foaming device are installed. The material source container contains a chemical source liquid and is connected to the foaming device through a liquid supply network. The foaming device is connected to the outside of the shell through a gas supply network. A first weighing and metering component and a second weighing and metering component are respectively installed at the bottom of the material source container and the foaming device. A liquid level detection component is also installed inside the foaming device. The housing is also provided with an external air inlet network, a carrier gas inlet network, and a cleaning air inlet network. The external air inlet network is connected to the material source container and is used to provide pressurized gas. The carrier gas inlet network is connected to the foaming device and is used to provide carrier gas. The cleaning air inlet network is connected to both the external air inlet network and the carrier gas inlet network and is used to provide cleaning gas.

2. The gas supply system for chemical vapor deposition according to claim 1, characterized in that, The shell is internally provided with a first box and a second box, the material source container is located in the first box, and the foaming device is located in the second box; The housing is also provided with a first gas detection component, the first box is provided with a second gas detection component, and the second box is provided with a third gas detection component. The volume of the material source container is 0.3 to 1.5 times the volume of the foaming device.

3. The gas supply system for chemical vapor deposition according to claim 1, characterized in that, A cooling device is provided on the outside of the housing, and the cooling device is circulatedly connected to the foaming device.

4. The gas supply system for chemical vapor deposition according to claim 1, characterized in that, The liquid supply network includes a replenishment pipe, one end of which extends into the material source container and is located below the surface of the chemical source liquid, and the other end of which is connected to the foaming device. The replenishment pipeline is provided with a first manual valve, a first pneumatic valve, a second pneumatic valve, and a second manual valve in sequence along the flow direction of the chemical source liquid.

5. The gas supply system for chemical vapor deposition according to claim 1, characterized in that, The gas supply network includes a main gas outlet pipe, a branch gas supply pipe, and a detection branch pipe. One end of the main gas outlet pipe extends into the aerating device, and the other end is connected to the branch gas supply pipe and the detection branch pipe respectively. The ends of the branch gas supply pipe and the detection branch pipe away from the main gas outlet pipe are independently connected to the outside of the housing. The main outlet pipe is equipped with a third manual valve, the gas supply branch pipe is equipped with a third pneumatic valve and a fourth manual valve in sequence along the gas flow direction, and the detection branch pipe is equipped with a fifth manual valve.

6. The gas supply system for chemical vapor deposition according to claim 1, characterized in that, The external air intake network includes a first air intake main pipe, one end of which extends into the material source container and is located above the liquid surface of the chemical source liquid, and the other end is connected to the outside of the shell. Along the flow direction of the pressurized gas, the first intake pipe is sequentially provided with a sixth manual valve, a first filter, a fourth pneumatic valve, a first pressure regulating valve, a flow detection component, a first check valve, a fifth pneumatic valve, and a seventh manual valve. The section of the first main intake pipe located between the fifth pneumatic valve and the seventh manual valve is connected to the cleaning intake pipe network.

7. The gas supply system for chemical vapor deposition according to claim 6, characterized in that, The carrier gas inlet pipeline includes a second inlet main pipe, one end of which extends into the foaming device, and the other end of which is connected to the outside of the housing; The second intake main pipe is provided with an eighth manual valve, a second check valve, a second filter, a sixth pneumatic valve, a second pressure regulating valve, a first pressure detection component, a seventh pneumatic valve and a ninth manual valve in sequence along the flow direction of the carrier gas. The section of the second main intake pipe located between the first pressure detection component and the seventh pneumatic valve is connected to the cleaning intake pipe network; The foaming device is equipped with a second pressure detection component.

8. The gas supply system for chemical vapor deposition according to claim 7, characterized in that, The cleaning air intake network includes a cleaning main pipe, a first cleaning branch pipe and a second cleaning branch pipe. One end of the cleaning main pipe is connected to the outside of the housing, and the other end is connected to the first cleaning branch pipe and the second cleaning branch pipe respectively. The end of the first cleaning branch pipe away from the cleaning main pipe is connected to the external air intake network and the liquid supply network respectively. The end of the second cleaning branch pipe away from the cleaning main pipe is connected to the carrier gas intake network. The cleaning main pipe is provided with a tenth manual valve, a third filter, an eighth pneumatic valve and a third pressure regulating valve in sequence along the flow direction of the cleaning gas. The first cleaning branch pipe is provided with a third check valve, a ninth pneumatic valve and a tenth pneumatic valve in sequence along the flow direction of the cleaning gas. The second cleaning branch pipe is provided with a fourth check valve and an eleventh pneumatic valve in sequence along the flow direction of the cleaning gas.

9. The gas supply system for chemical vapor deposition according to claim 1, characterized in that, The housing is also provided with an air extraction pipe, and the air extraction pipe is externally connected to a vacuum pumping device. The housing is also equipped with a temperature sensing component and a negative pressure detection component.

10. The gas supply system for chemical vapor deposition according to claim 1, characterized in that, The material source container includes at least two replenishment bottles arranged in parallel, and the at least two replenishment bottles are independently connected to the foaming device, the external air inlet network and the cleaning air inlet network.

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