Hydrogen and nitrogen separation device in polycrystalline silicon production process

Abstract

The utility model relates to the technical field of polycrystalline silicon production, in particular to a hydrogen-nitrogen separation device in a polycrystalline silicon production process, a hydrogen-containing line is connected with a plurality of groups of anti-disproportionation towers, and tail gas discharge ends of the plurality of groups of anti-disproportionation towers are connected with a hydrogen line; a first spraying guide tank and a first stamping assembly are arranged on the hydrogen-containing line and located at the front ends of the multiple sets of anti-disproportionation towers, the output end of the first stamping assembly is connected with the input end of the first spraying guide tank, and the output end of the first spraying guide tank is connected with the hydrogen-containing line; the hydrogen-containing line is sequentially connected with two groups of low-point condensate draining branches and a cryogenic assembly at the rear ends of the multiple groups of anti-disproportionation towers; a second stamping assembly is arranged at the input end of the second spraying guide tank, the output end of the second spraying guide tank is connected with the hydrogen-containing line, and a liquid discharging branch line is connected between the cryogenic assembly and the second spraying guide tank; the input end of the third spray guide tank is respectively connected with two groups of low-point condensate drain branches, the output end of the third spray guide tank is connected with a nitrogen line, and valves are arranged on the two groups of low-point condensate drain branches.

Description

TECHNICAL FIELD

[0001] The utility model relates to the polycrystal silicon production technical field especially points to a polycrystal silicon production process hydrogen nitrogen separation device. BACKGROUND

[0002] In the polycrystal silicon production process, hydrogen nitrogen separation is a vital link, and polycrystal silicon is widely used in many fields such as photovoltaic and electronic information as a kind of key semiconductor material, and the production process has extremely high requirements on the device of each link, and hydrogen nitrogen separation device directly influences production efficiency and product quality, especially in rectification system, the effect of hydrogen nitrogen separation has a profound influence on the whole production process, the traditional hydrogen nitrogen separation device often cannot achieve the ideal effect when facing the above-mentioned complex situation, at present, the hydrogen recovery rate in the release tail gas is extremely low, only 0%, and the hydrogen content in the rectification system tail gas is 60.13%, and the nitrogen content accounts for 35.17%. The low hydrogen recovery rate not only causes the waste of hydrogen resources, but also may affect the efficiency and product quality of the subsequent production link, and therefore, the present application provides a polycrystal silicon production process hydrogen nitrogen separation device to solve the above technical problems. SUMMARY

[0003] In view of the deficiencies in the above background art, the utility model provides a polycrystal silicon production process hydrogen nitrogen separation device, which solves the technical problems of low hydrogen recovery rate of the current hydrogen nitrogen separation equipment and waste of hydrogen resources, and may affect the efficiency and product quality of the subsequent production link.

[0004] The technical scheme of the utility model is realized as follows: a polycrystal silicon production process hydrogen nitrogen separation device, comprising hydrogen-containing line and nitrogen-containing line and No. 1 guide tank and No. 2 guide tank and No. 3 guide tank, characterized by: a plurality of reverse disproportionation towers are arranged on the hydrogen-containing line, and the tail gas discharge end of the plurality of reverse disproportionation towers is connected with the hydrogen line; a No. 1 guide tank and a first stamping assembly are arranged on the hydrogen-containing line at the front end of the plurality of reverse disproportionation towers, the output end of the first stamping assembly is connected with the input end of the No. 1 guide tank, and the output end of the No. 1 guide tank is connected with the hydrogen-containing line; two groups of low-point condensate discharge branches and a deep cooling assembly are sequentially connected on the hydrogen-containing line at the rear end of the plurality of reverse disproportionation towers; a second stamping assembly is arranged on the input end of the No. 2 guide tank, and the output end is connected with the hydrogen-containing line, and a liquid outlet branch is connected between the deep cooling assembly and the No. 2 guide tank; the input end of the No. 3 guide tank is connected with the two groups of low-point condensate discharge branches respectively, and the output end is connected with the nitrogen line, and valves are arranged on the two groups of low-point condensate discharge branches.

[0005] As a preferred solution, a DR guide tube and a reboiler guide tube connected with the third guide tank are further included, the DR guide tube and the reboiler guide tube are connected through an auxiliary branch, and the second guide tank and the third guide tank are connected with a pressure pipeline.

[0006] As a preferred solution, a nitrogen purging assembly is arranged on the hydrogen line between the groups of reverse dehydrogenation towers and on the reboiler guide tube.

[0007] As a preferred solution, the nitrogen purging assembly arranged on the hydrogen line between the groups of reverse dehydrogenation towers comprises a plurality of nitrogen nozzles and a valve for controlling the injection amount of nitrogen, the injection directions of the plurality of nitrogen nozzles are adjustable, and the nitrogen purging assembly arranged on the reboiler guide tube comprises a nitrogen inlet and a valve with adjustable flow, and the nitrogen inlet is connected with a filter.

[0008] As a preferred solution, the first and second stamping assemblies each comprise an H2 charging device and an N2 charging device, and a valve is arranged for controlling the input of the charging gas, and the H2 charging device and the N2 charging device can be used for corresponding charging operation of the first or second guide tank independently or simultaneously.

[0009] As a preferred solution, the cryogenic assembly comprises a water cooler and a freon cryogenic cooler arranged on the hydrogen line, and a liquid outlet branch is connected between the freon cryogenic cooler and the second guide tank.

[0010] As a preferred solution, when the pressure pipeline is connected with the second guide tank and the third guide tank, a control valve is arranged to adjust the transmission of the material.

[0011] As a preferred solution, the groups of reverse dehydrogenation towers comprise a T3A tower, a T3B tower and a T11 tower, and the tail gas discharge ends of the towers are connected with the hydrogen line through an input pipeline.

[0012] As a preferred solution, the auxiliary branch is provided with a flow regulating valve for regulating the liquid flow between the DR guide tube and the reboiler guide tube.

[0013] As a preferred solution, a temperature sensor is arranged below the cryogenic assembly arranged on the hydrogen line at the rear end of the groups of reverse dehydrogenation towers, the temperature sensor can monitor the temperature below the cryogenic assembly in real time and transmit a signal to a control system.

[0014] The utility model discloses the beneficial effect:

[0015] One, a plurality of reverse disproportionation towers are arranged on the hydrogen-containing gas line, and a No. 1 guide tank, a cryogenic assembly and the like are reasonably connected, so that the gas can sequentially pass through a plurality of processing links after entering the hydrogen line, the tail gas discharge end of the reverse disproportionation tower is connected with the hydrogen line, the No. 1 guide tank and the first punching assembly at the front end perform preliminary processing and buffering on the gas, and the cryogenic assembly at the rear end realizes hydrogen-nitrogen separation at a suitable temperature through a water cooler and a freon cryogenic cooler, and this process design is helpful to improve the efficiency and precision of hydrogen-nitrogen separation.

[0016] Two, the first punching assembly and the second punching assembly include H2 charging devices and N2 charging devices and are provided with valve control charging gas input, charging operation can be performed on the No. 1 guide tank or the No. 2 guide tank alone or simultaneously according to different working conditions, the gas can stably and smoothly flow in the system, and this is favorable to improve the hydrogen-nitrogen separation effect.

[0017] Three, the rear end of the hydrogen-containing gas line is provided with two groups of low point condensate discharge branches and is provided with valves, the input end of the No. 3 guide tank is connected with the two groups of low point condensate discharge branches, and the accumulated liquid in the system can be effectively treated in time, so as to prevent the accumulated liquid from interfering with the gas flow and the hydrogen-nitrogen separation process, thereby improving the overall separation efficiency.

[0018] Four, through optimization of the structure and operation process of the hydrogen-nitrogen separation device, hydrogen-nitrogen separation can be more effectively realized, the hydrogen recovery rate can be improved, hydrogen waste can be reduced, the resource utilization rate can be improved, and the production cost can be reduced.

[0019] Five, the punching assembly can use the H2 charging device and the N2 charging device alone or simultaneously to perform charging operation on the guide tank, the demand for gas pressure in different production stages and working conditions can be met, meanwhile, a temperature sensor is arranged below the cryogenic assembly, the temperature can be monitored in real time and fed back to the control system, the control system adjusts the working state of the cryogenic assembly according to the temperature signal, the system can effectively operate under different temperature conditions, and the adaptability and flexibility of the system are improved.

[0020] Other advantages, objects and features of the present application will be described in the following description, and will be apparent to those skilled in the art to some extent, or can be taught from the practice of the present application based on the study of the following. BRIEF DESCRIPTION OF DRAWINGS

[0021] In order to more clearly illustrate the embodiments of the present application, the drawings needed in the following embodiment description will be briefly introduced. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creating laborious work.

[0022] Figure 1The whole circuit schematic view of the utility model is shown in the figure.

[0023] In the figure: 1: hydrogen-containing line, 2: nitrogen-containing line, 3: No. 1 guide tank, 4: No. 2 guide tank, 5: No. 3 guide tank, 6: reverse disproportionation tower, 7: first punching assembly, 8: low point condensate branch, 9: cryogenic assembly, 10: second punching assembly, 11: liquid down branch, 12: DR guide main pipe, 13: reboiler guide main pipe, 14: auxiliary branch, 15: pressing pipe line, 16: purging nitrogen assembly, 17: H2 pressure charging device, 18: N2 pressure charging device, 19: water cooler, 20: Freon cryogenic cooler, 21: T3A tower, 22: T3B tower, 23: T11 tower. DETAILED DESCRIPTION

[0024] The utility model will be described below in conjunction with the drawings in the embodiment of the utility model Figure 1 The technical solutions in the embodiments of the utility model are clearly and completely described, obviously, the described embodiments are only part of the embodiments of the utility model, rather than all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by those skilled in the art without creative labor belong to the scope of protection of the utility model.

[0025] Embodiment 1, a hydrogen-nitrogen separation device in the production process of polysilicon, including hydrogen-containing line 1 and nitrogen-containing line 2 and No. 1 guide tank 3 and No. 2 guide tank 4 and No. 3 guide tank 5, its characterized in that: hydrogen-containing line 1 is equipped with a plurality of reverse disproportionation towers 6, the tail gas discharge end of a plurality of reverse disproportionation towers 6 is connected with hydrogen line 1, the front end of a plurality of reverse disproportionation towers 6 on hydrogen-containing line 1 is equipped with No. 1 guide tank 3 and first punching assembly 7, the output end of first punching assembly 7 is connected with the input end of No. 1 guide tank 3, the output end of No. 1 guide tank 3 is connected with hydrogen-containing line 1, the rear end of a plurality of reverse disproportionation towers 6 on hydrogen-containing line 1 is sequentially connected with two groups of low point condensate branch 8 and cryogenic assembly 9, the input end of No. 2 guide tank 4 is equipped with second punching assembly 10, and the output end is connected with hydrogen-containing line 1, and the cryogenic assembly 9 is connected with No. 2 guide tank 4 through liquid down branch 11, the input end of No. 3 guide tank 5 is connected with two groups of low point condensate branch 8 respectively, and the output end is connected with nitrogen-containing line 2, and the two groups of low point condensate branch 8 are equipped with valves.

[0026] As a further embodiment, the first punching assembly 7 and the second punching assembly 10 each include an H2 pressure charging device 17 and an N2 pressure charging device 18, and a valve is provided for controlling the input of the pressure charging gas, and the H2 pressure charging device 17 and the N2 pressure charging device 18 can be used to individually or simultaneously perform corresponding pressure charging operations on the No. 1 guide tank 3 or the No. 2 guide tank 4.

[0027] As a further embodiment, the plurality of reverse disproportionation columns 6 includes a T3A column 21, a T3B column 22, and a T11 column 23, and the tail gas outlet of each column is connected to the hydrogen-containing line 1 through an input pipeline.

[0028] In use, the hydrogen-containing line 1 serves as the main channel for gas transmission, and is made of materials with good corrosion resistance and sealing performance to ensure that the hydrogen gas does not leak during transmission and does not chemically react with the pipeline. The plurality of reverse disproportionation columns 6 (T3A column 21, T3B column 22, and T11 column 23) connected to the hydrogen-containing line 1 are similar in structure and each includes a column body, an internal packing layer, and an inlet and outlet connection part at the top and bottom of the column. The column body is made of high-strength alloy material and can withstand certain pressure and temperature changes. The internal packing layer is filled with specific catalyst or adsorbent materials to facilitate the reaction and separation process of the gas in the column. For example, the packing layer of the T3A column may have better adsorption and conversion capacity for certain specific impurity components.

[0029] The first condensate tank 3 is located at the front end of the plurality of reverse disproportionation columns 6 on the hydrogen-containing line 1. It has a certain volume and is made of stainless steel with good pressure resistance and corrosion resistance. The tank body is provided with a liquid level monitoring device (not shown in detail) for real-time monitoring of the liquid level in the tank. The first punch assembly 7 is closely connected to the first condensate tank 3. The H2 charging device 17 and the N2 charging device 18 are respectively connected to the hydrogen source and the nitrogen source through dedicated pipelines and high-precision valves. These valves can accurately control the flow and pressure of the gas to ensure that the amount and pressure of the gas charged into the first condensate tank 3 meet the requirements.

[0030] The nitrogen-containing line 2 is mainly used to discharge the separated nitrogen gas. Its line design and material selection are similar to those of the hydrogen-containing line 1 to ensure the smooth discharge of nitrogen gas without leakage or chemical reaction. The third condensate tank 5 is connected to the nitrogen-containing line 2. It has similarities in structure and function with the first and second condensate tanks 3 and 4. The third condensate tank 5 also has a liquid level monitoring device and a gas inlet and outlet connection part. Its input end is connected to the hydrogen-containing line 1 through two sets of low-point condensate discharge branches 8, and its output end is directly connected to the nitrogen-containing line 2. The two sets of low-point condensate discharge branches 8 are made of stainless steel, and their valves are corrosion-resistant ball valves that can accurately control the opening and closing of the branches and the discharge of liquid.

[0031] The second condensate tank 4 is located near the cryogenic assembly 9. Its input end has a second punch assembly 10 that is similar in structure and function to the first punch assembly 7 of the first condensate tank 3. The tank body of the second condensate tank 4 is also made of stainless steel and is provided with a gas-liquid separation device (not shown in detail) inside to effectively separate the gas and liquid entering the tank.

[0032] The DR guide pipe 12 and the reboiler guide pipe 13 are connected with the third guide tank 5, and are made of corrosion-resistant material. The DR guide pipe 12 is mainly used for collecting certain specific liquid components in the third guide tank 5, and the reboiler guide pipe 13 is used for liquid transmission related to the reboiler (the specific function is related to the working principle of the reboiler, which is not described in detail here). The auxiliary branch 14 is connected between the DR guide pipe 12 and the reboiler guide pipe 13, and the flow regulating valve can accurately control the liquid flow between the two pipes. The pressure pipe 15 is connected between the second guide tank 4 and the third guide tank 5, and the control valve is an electric regulating valve, which can accurately adjust the transmission amount of the material according to the control signal of the system.

[0033] The purge nitrogen assembly 16 on the hydrogen line 1 between the groups of dehydrogenation columns 6 and on the reboiler guide pipe 13 has different structures and functions. The nitrogen nozzles of the purge nitrogen assembly 16 between the dehydrogenation columns 6 are uniformly distributed around the gas passage, and the valve adopts an electromagnetic regulating valve, which can accurately control the injection amount of nitrogen according to the system setting. The filter of the purge nitrogen assembly 16 on the reboiler guide pipe 13 adopts a high-efficiency filter screen structure, which can effectively filter the small impurities in the nitrogen, and the adjustable flow valve is a needle valve, which can accurately control the flow of nitrogen.

[0034] As a further embodiment, the DR guide pipe 12 and the reboiler guide pipe 13 connected with the third guide tank 5 are further included, the DR guide pipe 12 and the reboiler guide pipe 13 are connected through the auxiliary branch 14, and the second guide tank 4 and the third guide tank 5 are connected with the pressure pipe 15.

[0035] As a further embodiment, the purge nitrogen assembly 16 is arranged on the hydrogen line 1 between the groups of dehydrogenation columns 6 and on the reboiler guide pipe 13.

[0036] As a further embodiment, the purge nitrogen assembly 16 on the hydrogen line 1 between the groups of dehydrogenation columns 6 includes a plurality of nitrogen nozzles and a valve for controlling the injection amount of nitrogen, the injection direction of the plurality of nitrogen nozzles is adjustable, and the purge nitrogen assembly 16 on the reboiler guide pipe 13 includes a nitrogen inlet and an adjustable flow valve, and the nitrogen inlet is connected with a filter.

[0037] In use, the principle of the nitrogen purge assembly 16 located between the groups of reverse disproportionation towers 6 on the hydrogen-containing line 1 is based on the inertness and purging performance of nitrogen. As an inert gas, nitrogen does not chemically react with other substances in the system. By injecting nitrogen into the gas passage, impurities in the passage can be purged out to prevent the accumulation of impurities affecting the flow and reaction of the gas. The principle of the nitrogen purge assembly 16 located on the reboiler guide tank 13 is also based on the inertness and purging performance of nitrogen. By injecting nitrogen into the tank, impurities in the tank can be cleaned up to promote the flow of substances and ensure the normal operation of the system. At the same time, the filter can remove impurities in the nitrogen to ensure that the nitrogen injected into the tank is pure.

[0038] As a further embodiment, the cryogenic assembly 9 includes a water cooler 19 and a freon cryogenic cooler 20 located on the hydrogen-containing line 1. The freon cryogenic cooler 20 is connected to the second guide tank 4 by a liquid downflow branch 11.

[0039] In use, the cryogenic assembly 9 includes a water cooler 19 and a freon cryogenic cooler 20. The water cooler 19 cools the gas in the hydrogen-containing line 1 by circulating cooling water. The water cooler 19 is internally provided with a cooling pipe, and the gas flows in the pipe while the cooling water flows in the opposite direction outside the pipe to reduce the temperature of the gas through heat exchange. The freon cryogenic cooler 20 further cools the gas cooled by the water cooler 19. Freon evaporates in a specific circulation system inside the freon cryogenic cooler 20 to absorb heat, thereby greatly reducing the temperature of the gas to achieve the phase change conditions of certain components in the gas. The freon cryogenic cooler 20 is connected to the second guide tank 4 by a liquid downflow branch 11. When the gas undergoes phase change during the cryogenic process to produce liquid substances, the liquid substances are transported to the second guide tank 4 through the liquid downflow branch 11.

[0040] As a further embodiment, when the material conveying line 15 is connected to the second guide tank 4 and the third guide tank 5, a control valve is provided to adjust the transmission of the material.

[0041] As a further embodiment, the auxiliary branch 14 is provided with a flow regulating valve for regulating the flow of liquid between the DR guide tank 12 and the reboiler guide tank 13.

[0042] As a further embodiment, a temperature sensor is provided below the cryogenic assembly 9 located at the rear end of the groups of reverse disproportionation towers 6 on the hydrogen-containing line 1.

[0043] I. Working principle of each component.

[0044] Dehydrogenation tower principle: In the multiple dehydrogenation tower 6, take T3A tower as an example, when the mixed gas containing hydrogen enters the tower, the gas undergoes dehydrogenation reaction under the action of catalyst in the internal packing layer. By reasonably setting the type and quantity of catalyst in the packing layer and controlling the temperature and pressure in the tower, the effect of dehydrogenation reaction can be optimized, and the purity of hydrogen can be improved.

[0045] Guide tank principle: The working principle of No. 1 guide tank 3, No. 2 guide tank 4 and No. 3 guide tank 5 is based on the gas-liquid separation principle. When the gas enters the guide tank, due to the density difference between the gas and the liquid, a natural gas-liquid separation process will occur in the space in the tank. The gas flows upward, and the liquid deposits at the bottom of the tank due to gravity. For No. 1 guide tank 3 and No. 2 guide tank 4, the pressurization operation of the punch assembly will affect the gas-liquid separation effect in the tank. Proper pressurization can change the pressure environment in the tank, making the separation of gas and liquid more thorough. For example, when the pressure in the tank rises, the density of the gas decreases relatively, and the deposition speed of the liquid increases, thereby improving the efficiency of gas-liquid separation. At the same time, the liquid level monitoring device can monitor the liquid level in the tank in real time. When the liquid level reaches a certain value, the liquid can be discharged through the liquid discharge port at the bottom of the tank (not shown in detail) to maintain the normal working state of the tank.

[0046] Deep cooling component principle: The cooling principle of the water cooler 19 is based on the heat exchange principle. When the gas containing hydrogen flows outside the water pipe in the water cooler 19, the circulating cooling water flows in the water pipe. Because the specific heat capacity of water is large, it can absorb a large amount of heat. Through the heat conduction action of the pipe wall, the temperature of the gas will gradually decrease. The cooling principle of Freon deep cooler 20 is based on the physical properties of Freon. Freon has a low boiling point. In the evaporator, Freon absorbs heat and evaporates into a gaseous state. This process will absorb a large amount of heat from the surrounding gas, thereby rapidly reducing the temperature of the gas. By controlling the evaporation and condensation process of Freon, the cooling temperature of the gas can be accurately controlled, and the deep cooling separation of the gas can be realized.

[0047] Punch assembly principle: The working principle of the first punch assembly 7 and the second punch assembly 10 is based on the compressibility of gas. When hydrogen or nitrogen is charged into No. 1 guide tank 3 or No. 2 guide tank 4, the gas is compressed in the tank, and the pressure in the tank will rise. By controlling the type, quantity and pressure of the charged gas, the pressure environment and gas composition in the tank can be adjusted. For example, when it is necessary to increase the hydrogen content in the tank, hydrogen can be charged through H2 pressurization device 17; when it is necessary to adjust the pressure in the tank without changing the gas composition, hydrogen and nitrogen can be charged simultaneously according to a certain proportion. This pressurization operation is very important for gas-liquid separation, material storage and subsequent processing in the guide tank.

[0048] The principle of the nitrogen purge assembly located between the groups of reverse disproportionation towers 6 on the hydrogen-containing line 1 is based on the inertness and purging performance of nitrogen. As an inert gas, nitrogen does not chemically react with other substances in the system. By injecting nitrogen into the gas channel, impurities in the channel can be purged out to prevent the accumulation of impurities affecting the flow of gas and reactions. The principle of the nitrogen purge assembly located on the reboiler guide pipe 13 is also based on the inertness and purging performance of nitrogen. By injecting nitrogen into the pipe, impurities in the pipe can be cleaned up to promote the flow of substances and ensure the normal operation of the system. At the same time, the filter can remove impurities in the nitrogen to ensure that the nitrogen injected into the pipe is pure.

[0049] II. Workflow

[0050] ① Initial preparation stage: Check whether each component of the entire device is installed correctly, whether the connection is tight, whether the valve is in the correct open or closed state, and whether the liquid level monitoring device, temperature sensor, and other instruments are working normally.

[0051] The first stamping assembly 7 is used to pressurize the first guide tank 3. First, open the total valve connected to the hydrogen source and the nitrogen source, then according to the actual demand, open the valve of the H2 pressurizing device 17 or the N2 pressurizing device 18, or open both at the same time, pressurize the first guide tank 3 according to the set pressurizing amount, ensure that the pressure in the tank reaches the appropriate value, and prepare for the subsequent entry of hydrogen-containing gas line 1.

[0052] Similar operations are performed on the second stamping assembly 10 to pressurize the second guide tank 4 to reach the appropriate pressure state to meet the subsequent requirements for receiving liquid substances and gas treatment.

[0053] ② Gas treatment stage: The hydrogen-containing mixed gas enters the device from the hydrogen-containing line 1, first entering the first guide tank 3. In the first guide tank 3, the gas is preliminarily separated into liquid and gas, and the liquid settles at the bottom of the tank. The gas continues to move forward along the hydrogen-containing line 1.

[0054] The gas enters the multiple reverse disproportionation towers 6 (T3A tower 21, T3B tower 22, and T11 tower 23). In the towers, according to the principle of reverse disproportionation reaction, the impurity components in the gas undergo reverse disproportionation reaction under the action of catalyst to improve the purity of hydrogen. The treated tail gas is discharged from the tail gas discharge end of each tower through the input pipeline back to the hydrogen line 1.

[0055] Between the reverse disproportionation towers 6, according to the need, open the valve in the nitrogen purge assembly 16 for controlling the amount of nitrogen injection, adjust the injection direction of the nitrogen nozzle, and inject nitrogen into the gas channel to purge the gas channel and prevent the accumulation of impurities.

[0056] ③ Deep cooling separation and subsequent processing stage: the gas after the reverse disproportionation tower 6 continues to flow along the hydrogen-containing line 1, enters the deep cooling assembly 9, first enters the water cooler 19, which preliminarily cools the gas through circulating cooling water, and then enters the Freon deep cooler 20, which further deeply cools the gas. During the cooling process, according to the principle of deep cooling separation, some components in the gas will change phase from gas to liquid, and the liquid material is transported to the second condenser 4 through the liquid branch line 11.

[0057] The second condenser 4 receives the liquid material from the liquid branch line 11, and also separates the gas and liquid entering the tank. If necessary, the second condenser 4 can be pressurized by the second pressurizing assembly 10 to ensure that the pressure in the tank is appropriate, facilitating the storage and subsequent processing of the liquid material.

[0058] ④ Nitrogen separation and discharge stage: the gas after the deep cooling assembly 9 continues to flow along the hydrogen-containing line 1, and when it passes through the two groups of low-point condensation branches 8, the valves of the low-point condensation branches 8 are opened to discharge the small amount of liquid material that may exist.

[0059] The gas enters the third condenser 5, where it is finally separated into gas and liquid. The separated nitrogen gas is discharged through the nitrogen-containing line 2, while the other materials remain in the third condenser 5. If necessary, the materials in the third condenser 5 can be further processed and transported through the DR condenser main pipe 12 and the reboiler condenser main pipe 13 and related auxiliary branches 14. At the same time, the control valve on the material pressure line 15 can be adjusted to regulate the transmission of materials between the second condenser 4 and the third condenser 5 as needed.

[0060] On the reboiler condenser main pipe 13, the valve for controlling the flow of nitrogen gas in the nitrogen gas blowing assembly 16 is opened as needed to inject nitrogen gas into the main pipe, blow the materials in the main pipe, promote the flow of materials, and ensure the normal operation of the system.

[0061] The temperature sensor below the deep cooling assembly 9 on the hydrogen-containing line 1 after the multiple reverse disproportionation towers 6 monitors the temperature in real time and transmits the signal to the control system. The control system adjusts the temperature difference between the water cooler 19 and the Freon deep cooler 20 through the temperature adjusting device (if any) according to the temperature condition, optimizing the deep cooling separation effect of hydrogen.

[0062] In this application, unless otherwise explicitly specified and limited, the terms "mounting", "connection", "connecting", "fixed", and similar terms should be interpreted broadly, for example, can be fixed connection, can also be detachable connection, or integrated; can be mechanical connection, can also be electrical connection; can be directly connected, can also be indirectly connected through an intermediate medium, can be internal communication of two elements or interaction relationship between two elements. For those skilled in the art, the specific meaning of the above terms in this application can be understood according to the specific circumstances. In this application, unless otherwise explicitly specified and limited, the first feature is "on" or "under" the second feature, which can be direct contact between the first and second features, or indirect contact between the first and second features through an intermediate medium. Moreover, the first feature "above", "above" and "above" the second feature can be directly above or obliquely above the first feature, or only indicates that the horizontal height of the first feature is higher than that of the second feature. The first feature "below", "below" and "below" the second feature can be directly below or obliquely below the first feature, or only indicates that the horizontal height of the first feature is less than that of the second feature. In the description of the specification, the description of the reference terms "one embodiment", "some embodiments", "example", "specific example", or "some examples" means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the application. In this specification, the illustrative description of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any appropriate manner in any one or more embodiments or examples. In addition, those skilled in the art can combine and combine the different embodiments or examples described in the specification and the features of the different embodiments or examples without contradiction.

[0063] Although the embodiments of the application have been shown and described above, it can be understood that the above embodiments are exemplary and cannot be understood as limiting the application, and those skilled in the art can make changes, modifications, replacements and variations to the above embodiments within the scope of the application.

Claims

1. A hydrogen-nitrogen separation device in a polysilicon production process, comprising a hydrogen-containing line (1) and a nitrogen-containing line (2) and a first guide tank (3), a second guide tank (4) and a third guide tank (5), characterized in that: The hydrogen-containing gas line (1) is provided with a plurality of groups of reverse disproportionation towers (6), and tail gas discharge ends of the plurality of groups of reverse disproportionation towers (6) are connected with the hydrogen-containing gas line (1); a first punching assembly (7) and a first guide tank (3) are arranged on the hydrogen-containing gas line (1) at a front end of the plurality of groups of reverse disproportionation towers (6); an output end of the first punching assembly (7) is connected with an input end of the first guide tank (3); and an output end of the first guide tank (3) is connected with the hydrogen-containing gas line (1). ​ 2. The hydrogen-nitrogen separation device for use in a polysilicon production process according to claim 1, wherein The hydrogen-containing gas line (1) is provided with a plurality of groups of reverse disproportionation towers (6), and tail gas discharge ends of the plurality of groups of reverse disproportionation towers (6) are connected with the hydrogen-containing gas line (1); a first punching assembly (7) and a first guide tank (3) are arranged on the hydrogen-containing gas line (1) at a front end of the plurality of groups of reverse disproportionation towers (6); an output end of the first punching assembly (7) is connected with an input end of the first guide tank (3); and an output end of the first guide tank (3) is connected with the hydrogen-containing gas line (1).

3. The hydrogen-nitrogen separation device for use in a polysilicon production process according to claim 2, wherein The hydrogen-containing gas line (1) is provided with a plurality of groups of reverse disproportionation towers (6), and tail gas discharge ends of the plurality of groups of reverse disproportionation towers (6) are connected with the hydrogen-containing gas line (1); a first punching assembly (7) and a first guide tank (3) are arranged on the hydrogen-containing gas line (1) at a front end of the plurality of groups of reverse disproportionation towers (6); an output end of the first punching assembly (7) is connected with an input end of the first guide tank (3); and an output end of the first guide tank (3) is connected with the hydrogen-containing gas line (1).

4. The hydrogen-nitrogen separation device for use in a polysilicon production process according to claim 3, wherein The hydrogen-containing gas line (1) is provided with a plurality of groups of reverse disproportionation towers (6), and tail gas discharge ends of the plurality of groups of reverse disproportionation towers (6) are connected with the hydrogen-containing gas line (1); a first punching assembly (7) and a first guide tank (3) are arranged on the hydrogen-containing gas line (1) at a front end of the plurality of groups of reverse disproportionation towers (6); an output end of the first punching assembly (7) is connected with an input end of the first guide tank (3); and an output end of the first guide tank (3) is connected with the hydrogen-containing gas line (1).

5. The hydrogen-nitrogen separation device for use in a polysilicon production process according to claim 1, wherein The hydrogen-containing gas line (1) is provided with a plurality of groups of reverse disproportionation towers (6), and tail gas discharge ends of the plurality of groups of reverse disproportionation towers (6) are connected with the hydrogen-containing gas line (1); a first punching assembly (7) and a first guide tank (3) are arranged on the hydrogen-containing gas line (1) at a front end of the plurality of groups of reverse disproportionation towers (6); an output end of the first punching assembly (7) is connected with an input end of the first guide tank (3); and an output end of the first guide tank (3) is connected with the hydrogen-containing gas line (1).

6. The hydrogen-nitrogen separation device for a polysilicon production process according to claim 1, wherein The hydrogen-containing gas line (1) is provided with a plurality of groups of reverse disproportionation towers (6), and tail gas discharge ends of the plurality of groups of reverse disproportionation towers (6) are connected with the hydrogen-containing gas line (1); a first punching assembly (7) and a first guide tank (3) are arranged on the hydrogen-containing gas line (1) at a front end of the plurality of groups of reverse disproportionation towers (6); an output end of the first punching assembly (7) is connected with an input end of the first guide tank (3); and an output end of the first guide tank (3) is connected with the hydrogen-containing gas line (1).

7. The hydrogen-nitrogen separation device for a polysilicon production process according to claim 2, wherein The hydrogen-containing gas line (1) is provided with a plurality of groups of reverse disproportionation towers (6), and tail gas discharge ends of the plurality of groups of reverse disproportionation towers (6) are connected with the hydrogen-containing gas line (1); a first punching assembly (7) and a first guide tank (3) are arranged on the hydrogen-containing gas line (1) at a front end of the plurality of groups of reverse disproportionation towers (6); an output end of the first punching assembly (7) is connected with an input end of the first guide tank (3); and an output end of the first guide tank (3) is connected with the hydrogen-containing gas line (1).

8. The hydrogen-nitrogen separation device for a polysilicon production process according to claim 1, wherein The hydrogen-containing gas line (1) is provided with a plurality of groups of reverse disproportionation towers (6), and tail gas discharge ends of the plurality of groups of reverse disproportionation towers (6) are connected with the hydrogen-containing gas line (1); a first punching assembly (7) and a first guide tank (3) are arranged on the hydrogen-containing gas line (1) at a front end of the plurality of groups of reverse disproportionation towers (6); an output end of the first punching assembly (7) is connected with an input end of the first guide tank (3); and an output end of the first guide tank (3) is connected with the hydrogen-containing gas line (1).

9. The hydrogen-nitrogen separation device for a polysilicon production process according to claim 2, wherein The auxiliary branch (14) is provided with a flow regulating valve for regulating the liquid flow between the DR guide pipe (12) and the reboiler guide pipe (13).

10. The hydrogen-nitrogen separation device for a polysilicon production process according to claim 1, wherein The hydrogen-containing gas line (1) is provided with a temperature sensor below the cryogenic assembly (9) at the rear end of the multiple groups of reverse disproportionation towers (6).

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