Vacuum heating device of sputter coating machine

Abstract

The utility model provides a vacuum heating device of a sputter coating machine, which comprises a process cavity, a bottom plate is arranged at the bottom of the process cavity, the vacuum heating device comprises a heating lamp tube assembly and a vacuum electrode assembly, the vacuum electrode assembly comprises a conductive column, an electrode and an electrode mounting seat, the electrode mounting seat is connected below the bottom plate, the electrode is arranged inside the electrode mounting seat, and the conductive column is connected with the bottom plate. A mounting hole is formed in the bottom of the electrode mounting base, the conductive columns penetrate through the mounting hole and are sleeved with the electrodes, the heating lamp tube assembly is arranged in the process cavity, the two ends of the heating lamp tube assembly are each connected with one conductive column, the conductive column at one end is sleeved with the positive electrode, and the conductive column at the other end is sleeved with the negative electrode. The process cavity is baked and heated to keep the temperature required by the process, and a temperature sensor assembly is arranged on the outer side of the process cavity and used for detecting the temperature in the cavity and controlling starting and stopping of the vacuum heating device to prevent the temperature in the cavity from being too high.

Description

TECHNICAL FIELD

[0001] The utility model relates to sputter coating technology field, more specifically, relate to a kind of vacuum heating device of sputter coating machine. BACKGROUND

[0002] Sputter coating technology is the phenomenon that the atom of target material is hit by ion bombardment surface, the atom generated by sputtering is deposited on the surface of substrate to form film, which is called sputter coating. In order to obtain high quality optical thin film, a certain amount of working gas is filled in the magnetron sputtering device, the gas is ionized by target gun ignition, and the ion is impacted on the target material under the action of electric field and magnetic field, and the atom of target material is deposited on the substrate to form film. Accurate control of reaction gas pressure, target and substrate spacing, sputtering power and other parameters to accurately control the deposition rate to obtain high quality optical thin film material.

[0003] Unlike conventional magnetron sputtering, reactive sputtering requires chemical reaction, so the substrate is usually at a high temperature, and the substrate temperature has a great influence on the composition of the obtained compound.

[0004] Therefore, a heating device in vacuum is needed to achieve the high temperature required by the process. UTILITY MODEL CONTENT

[0005] Therefore, in order to solve the above problems, the utility model provides a kind of vacuum heating device of sputter coating machine, including process cavity 10, the process cavity 10 is hollow chamber, the bottom of process cavity 10 is provided with bottom plate 11, vacuum heating device 20 passes through the bottom plate 11 and is connected with process cavity 10, the vacuum heating device 20 includes heating lamp tube assembly 21, vacuum electrode assembly 22, the vacuum electrode assembly 22 includes conductive column 221, electrode 222, electrode mounting seat 223, the electrode mounting seat 223 is connected below bottom plate 11, electrode 222 is arranged in the inside of electrode mounting seat 223, the bottom of electrode mounting seat 223 is provided with mounting hole, the conductive column 221 passes through mounting hole and is sleeved with electrode 222, the heating lamp tube assembly 21 is placed in process cavity 10, two ends of the heating lamp tube assembly 21 are connected with one conductive column 221 respectively, the conductive column 221 of one end is sleeved with positive electrode 222, and the conductive column 221 of the other end is sleeved with negative electrode 222, the heating lamp tube assembly 21 is powered on through wire 40, the process cavity 10 is baked and heated, so that the process cavity 10 is kept at the temperature required by the process, temperature sensor assembly 30 is arranged on the outside of process cavity 10, which is used to detect the temperature in the cavity, and control the start and stop of vacuum heating device 20 to avoid the temperature in the cavity being too high, and ensure that the process effect is better.

[0006] A kind of vacuum heating device of sputtering coating machine, including process cavity 10, the process cavity 10 is hollow chamber, the bottom of process cavity 10 is equipped with bottom plate 11, it is characterized in that: vacuum heating device 20 passes through the bottom plate 11 and is connected with process cavity 10, vacuum heating device 20 includes heating lamp tube assembly 21, vacuum electrode assembly 22, vacuum electrode assembly 22 includes electrically conductive column 221, electrode 222, electrode mounting seat 223, electrode mounting seat 223 is connected below bottom plate 11, electrode 222 is arranged in electrode mounting seat 223, the bottom of electrode mounting seat 223 is equipped with mounting hole, electrically conductive column 221 passes through mounting hole and is sleeved with electrode 222, heating lamp tube assembly 21 is placed in process cavity 10, the two ends of heating lamp tube assembly 21 are connected with one electrically conductive column 221 respectively, the electrically conductive column 221 of one end is sleeved with positive electrode 222, the electrically conductive column 221 of the other end is sleeved with negative electrode 222, heating lamp tube assembly 21 is powered by wire 40, the process cavity 10 is baked and heated, temperature sensor assembly 30 is equipped on the outside of process cavity 10.

[0007] Further, the temperature sensor assembly 30 includes a mounting plate 31 and a temperature control switch 32, the mounting plate 31 is connected with the outside wall of the process cavity 10, and the temperature control switch 32 is arranged on the mounting plate 31. The preset value of the temperature control switch 32 is 95℃ and 145℃. The process temperature requirement is within 100℃. When the temperature in the cavity reaches 95℃, the heating stops. When the 95℃ sensor fails, the 145℃ sensor works to prevent the temperature from being too high and damaging other components, serving as a double insurance. When the temperature in the cavity is lower than 95℃, the heating lamp tube assembly 21 is powered on. When the temperature in the cavity is higher than 145℃, the heating lamp tube assembly 21 is powered off, so that the process cavity 10 maintains the temperature required by the process.

[0008] Further, the temperature sensor assembly 30 further includes a bracket 33 and a protective cover 34. The bracket 33 is connected to the bottom of the mounting plate 31. The edges of the protective cover 34 are connected with the bracket 33 and the mounting plate 31 respectively, so that the temperature control switch 32 is arranged in the cavity surrounded by the protective cover 34, the bracket 33 and the mounting plate 31, for protecting the temperature control switch 32.

[0009] Further, the heating lamp tube assembly 21 is at least two groups of symmetrically arranged. The two ends of each heating lamp tube assembly 21 are connected with one vacuum electrode assembly 22.

[0010] Further, one end of the electrically conductive column 221 above the electrode 222 is placed in the vacuum, and the other end is placed outside the vacuum. A ceramic sleeve 224 is arranged between the electrically conductive columns 221 in the vacuum and outside the vacuum for insulation.

[0011] Further, the electrically conductive column 221 outside the vacuum is provided with an electrode shield 226, which is connected with the bottom of the electrode mounting seat 223.

[0012] Further, a sealing ring 225 is arranged between the electrode 222 and the ceramic sleeve 224, which is made of copper.

[0013] Further, the heating lamp assembly 21 comprises a heating lamp 211, both ends of which are provided with a heating lamp clamp 212, which is connected with the top end of the electrically conductive column 221.

[0014] Further, the positive and negative electrodes of different groups of vacuum electrode assemblies 22 are connected through a wire 40, one end of which is connected with the lower end of the electrically conductive column 221 of the positive electrode 222, and the other end is connected with the lower end of the electrically conductive column 221 of the negative electrode 222, which is connected with an external power supply device.

[0015] Further, the wire 40 between different groups of vacuum electrode assemblies 22 is provided with a corrugated pipe 41 for protecting the wire 40.

[0016] Further, the wire 40 between the same group of vacuum electrode assemblies 22 is provided with a wire shield 42, one end of which is connected with the mounting seat of the positive electrode 222, and the other end is connected with the mounting seat of the corresponding negative electrode 222, which is used for protecting the wire 40.

[0017] The beneficial effects of this utility model are as follows: This utility model proposes a vacuum heating device for a sputtering coating machine, including a process chamber 10, which is a hollow chamber. A base plate 11 is provided at the bottom of the process chamber 10. A vacuum heating device 20 passes through the base plate 11 and is connected to the process chamber 10. The vacuum heating device 20 includes a heating lamp assembly 21 and a vacuum electrode assembly 22. The vacuum electrode assembly 22 includes a conductive post 221, an electrode 222, and an electrode mounting base 223. The electrode mounting base 223 is connected below the base plate 11, and the electrode 222 is disposed inside the electrode mounting base 223. The bottom of the electrode mounting base 223 is provided with a mounting hole. The conductive post 221 passes through the mounting hole and is sleeved with the electrode 222. The heating lamp assembly 21 is placed inside the process chamber 10. Each end of the heating lamp assembly 21 is connected to a conductive post 221. One conductive post 221 is sleeved with the positive electrode 222, and the other conductive post 221 is sleeved with the negative electrode 222. The heating lamp assembly 21 is powered through the wire 40 to bake and heat the process chamber 10 so that the process chamber 10 is maintained at the temperature required by the process. A temperature sensor assembly 30 is provided on the outside of the process chamber 10 to detect the temperature inside the chamber and control the start and stop of the vacuum heating device 20 to avoid the temperature inside the chamber being too high and to ensure better process results. Attached Figure Description

[0018] Figure 1 This is a structural diagram showing the installation position of the vacuum heating device in the sputtering coating machine of this utility model.

[0019] Figure 2 This is an overall structural diagram of the vacuum heating device of the sputtering coating machine of this utility model.

[0020] Figure 3 This is a cross-sectional view of the installation position of the vacuum heating device of the sputtering coating machine of this utility model.

[0021] Figure 4 This is a structural diagram of the vacuum electrode assembly of the vacuum heating device of the sputtering coating machine of this utility model.

[0022] Figure 5 This is a cross-sectional view of the vacuum electrode assembly of the vacuum heating device of the sputtering coating machine of this utility model.

[0023] Figure 6 This is a partial structural diagram of the vacuum electrode assembly of the vacuum heating device of the sputtering coating machine of this utility model.

[0024] Figure 7 This is a cross-sectional view of the temperature sensor assembly of the vacuum heating device of the sputtering coating machine of this utility model.

[0025] Figure 8The utility model discloses a partial structure diagram of vacuum heating device of sputter coating machine.

[0026] Main element symbol explanation

[0027] Process cavity 10, bottom plate 11, vacuum heating device 20, heating lamp tube subassembly 21, heating lamp tube 211, heating lamp tube clamp 212, vacuum electrode subassembly 22, electrically conductive column 221, electrode 222, electrode mounting seat 223, ceramic sleeve 224, sealing ring 225, electrode shield 226, temperature sensor subassembly 30, mounting plate 31, temperature control switch 32, support 33, protective cover 34, wire 40, bellow 41, wire shield 42.

[0028] The following specific embodiments will further illustrate the utility model in connection with the above-mentioned drawings. Specific embodiment Example 1:

[0029] As Figure 1 Shown, for the installation position structure diagram of vacuum heating device of sputter coating machine of the utility model, as Figure 2 Shown, for the overall structure diagram of vacuum heating device of sputter coating machine of the utility model, as Figure 3 Shown, for the installation position cross section of vacuum heating device of sputter coating machine of the utility model, as Figure 4 Shown, for vacuum electrode subassembly structure diagram of vacuum heating device of sputter coating machine of the utility model, as Figure 5 Shown, for vacuum electrode subassembly cross section of vacuum heating device of sputter coating machine of the utility model, as Figure 6 Shown, for vacuum electrode subassembly partial structure diagram of vacuum heating device of sputter coating machine of the utility model, as Figure 7 Shown, for temperature sensor subassembly cross section of vacuum heating device of sputter coating machine of the utility model, as Figure 8 Shown, for partial structure diagram of vacuum heating device of sputter coating machine of the utility model.

[0030] A vacuum heating device of a sputtering coating machine, comprising a process cavity 10, the process cavity 10 is a hollow chamber, the bottom of the process cavity 10 is provided with a bottom plate 11, characterized in that: a vacuum heating device 20 is connected with the process cavity 10 through the bottom plate 11, the vacuum heating device 20 comprises a heating lamp tube assembly 21 and a vacuum electrode assembly 22, the vacuum electrode assembly 22 comprises a conductive column 221, an electrode 222 and an electrode mounting seat 223, the electrode mounting seat 223 is connected below the bottom plate 11, the electrode 222 is arranged inside the electrode mounting seat 223, the bottom of the electrode mounting seat 223 is provided with a mounting hole, the conductive column 221 passes through the mounting hole and is sleeved with the electrode 222, the heating lamp tube assembly 21 is arranged in the process cavity 10, two ends of the heating lamp tube assembly 21 are respectively connected with one conductive column 221, the conductive column 221 at one end is sleeved with a positive electrode 222, and the conductive column 221 at the other end is sleeved with a negative electrode 222, the heating lamp tube assembly 21 is powered through a wire 40, the process cavity 10 is baked and heated, and a temperature sensor assembly 30 is arranged outside the process cavity 10.

[0031] The temperature sensor assembly 30 comprises a mounting plate 31 and a temperature control switch 32, the mounting plate 31 is connected with the outer wall of the process cavity 10, and the temperature control switch 32 is arranged on the mounting plate 31, the preset value of the temperature control switch 32 is 95℃ and 145℃, the process required temperature is within 100℃, when the temperature in the cavity reaches 95℃, the heating is stopped, when the 95℃ sensor fails, the 145℃ sensor works, so as to prevent the temperature from being too high and damaging other elements, and the double insurance effect is achieved, when the temperature in the cavity is lower than 95℃, the heating lamp tube assembly 21 is powered, when the temperature in the cavity is higher than 145℃, the heating lamp tube assembly 21 is powered off, and the process cavity 10 is kept at the process required temperature.

[0032] The temperature sensor assembly 30 further comprises a support 33 and a protective cover 34, the support 33 is connected to the bottom of the mounting plate 31, and the edges of the protective cover 34 are connected with the support 33 and the mounting plate 31 respectively, so that the temperature control switch 32 is arranged in a cavity formed by the protective cover 34, the support 33 and the mounting plate 31, and the temperature control switch 32 is protected.

[0033] The heating lamp tube assembly 21 is at least two groups of symmetrically arranged, and two ends of each group of the heating lamp tube assembly 21 are connected with one vacuum electrode assembly 22.

[0034] One end of the conductive column 221 above the electrode 222 is arranged in the vacuum, and the other end is arranged outside the vacuum, a ceramic sleeve 224 is arranged between the conductive columns 221 in the vacuum and outside the vacuum, and the ceramic sleeve 224 is used for insulation.

[0035] The electrically conductive column 221 outside the vacuum is externally provided with an electrode shield 226, which is connected with the bottom of the electrode mounting seat 223.

[0036] The sealing ring 225 is provided between the electrode 222 and the ceramic sleeve 224, and the sealing ring 225 is made of copper.

[0037] The heating lamp assembly 21 comprises a heating lamp 211, and both ends of the heating lamp 211 are provided with heating lamp clamps 212, which are connected with the top end of the electrically conductive column 221.

[0038] The positive electrode and the negative electrode of the different groups of vacuum electrode assemblies 22 are communicated through wires 40, one end of the wire 40 is connected with the lower end of the electrically conductive column 221 of the positive electrode 222, the other end is connected with the lower end of the electrically conductive column 221 of the negative electrode 222, and the external power supply equipment is connected through the wire 40.

[0039] The wire 40 between the different groups of vacuum electrode assemblies 22 is externally provided with a corrugated pipe 41 for protecting the wire 40.

[0040] The wire 40 between the same group of vacuum electrode assemblies 22 is externally provided with a wire shield 42, one end of the wire shield 42 is connected with the mounting seat of the positive electrode 222, and the other end is connected with the mounting seat of the corresponding negative electrode 222, for protecting the wire 40.

[0041] The vacuum heating device of the sputtering coating machine has the advantages that the vacuum heating device is provided, the process cavity 10 is a hollow cavity, the bottom plate 11 is arranged at the bottom of the process cavity 10, the vacuum heating device 20 is connected with the process cavity 10 through the bottom plate 11, the vacuum heating device 20 comprises a heating lamp assembly 21 and vacuum electrode assemblies 22, the vacuum electrode assemblies 22 comprise electrically conductive columns 221, electrodes 222 and electrode mounting seats 223, the electrode mounting seat 223 is connected below the bottom plate 11, the electrode 222 is arranged inside the electrode mounting seat 223, the bottom of the electrode mounting seat 223 is provided with a mounting hole, the electrically conductive column 221 passes through the mounting hole and is sleeved with the electrode 222, the heating lamp assembly 21 is arranged in the process cavity 10, both ends of the heating lamp assembly 21 are connected with one electrically conductive column 221 respectively, the electrically conductive column 221 at one end is sleeved with the positive electrode 222, and the electrically conductive column 221 at the other end is sleeved with the negative electrode 222, the heating lamp assembly 21 is powered through the wire 40, the process cavity 10 is baked and heated, the process cavity 10 is kept at a temperature required by a process, the temperature sensor assembly 30 is arranged outside the process cavity 10, the temperature inside the cavity is detected, the start and stop of the vacuum heating device 20 are controlled to avoid that the temperature inside the cavity is too high, and the process effect is better.

[0042] The above embodiments only express several implementation manners of the utility model, the description is more specific and detailed, but can not therefore be understood as the limitation of the utility model patent range. It should be pointed out that for ordinary skilled person in the art, without departing from the utility model concept, several deformations and improvements can be made, which belong to the protection range of the utility model. Therefore, the protection range of the utility model patent should be subject to the appended claims.

Claims

1. A vacuum heating device of a sputtering coating machine, comprising a process cavity (10), the process cavity (10) is a hollow chamber, the bottom of the process cavity (10) is provided with a bottom plate (11), characterized in that: The vacuum heating device (20) is connected with the process cavity (10) through the bottom plate (11), the vacuum heating device (20) comprises a heating lamp tube assembly (21) and a vacuum electrode assembly (22), the vacuum electrode assembly (22) comprises a conductive column (221), an electrode (222) and an electrode mounting seat (223), the electrode mounting seat (223) is connected below the bottom plate (11), the electrode (222) is arranged in the electrode mounting seat (223), the bottom of the electrode mounting seat (223) is provided with a mounting hole, the conductive column (221) passes through the mounting hole and is sleeved with the electrode (222), the heating lamp tube assembly (21) is arranged in the process cavity (10), two ends of the heating lamp tube assembly (21) are connected with one conductive column (221) respectively, the conductive column (221) at one end is sleeved with the positive electrode (222), and the conductive column (221) at the other end is sleeved with the negative electrode (222), the heating lamp tube assembly (21) is powered through a wire (40), the process cavity (10) is baked and heated, and the process cavity (10) is provided with a temperature sensor assembly (30) outside.

2. The vacuum heating device for sputter coating machine according to claim 1, wherein: The temperature sensor assembly (30) comprises a mounting plate (31) and a temperature control switch (32), the mounting plate (31) is connected with the outer wall of the process cavity (10), and the temperature control switch (32) is arranged on the mounting plate (31).

3. The vacuum heating device for sputter coating machine as claimed in claim 2, wherein: The temperature sensor assembly (30) further comprises a support (33) and a protective cover (34), the support (33) is connected to the bottom of the mounting plate (31), and the edges of the protective cover (34) are connected with the support (33) and the mounting plate (31) respectively, so that the temperature control switch (32) is arranged in a cavity formed by the protective cover (34), the support (33) and the mounting plate (31), and the temperature control switch (32) is protected.

4. The vacuum heating device for sputtering film deposition machine as claimed in claim 1, wherein: The heating lamp tube assembly (21) is at least two groups of symmetrically arranged, and two ends of each group of the heating lamp tube assembly (21) are connected with one vacuum electrode assembly (22).

5. The vacuum heating device for sputter coating machine as claimed in claim 1, wherein: The conductive column (221) is arranged above the electrode (222), one end of the conductive column (221) is arranged in the vacuum, and the other end of the conductive column (221) is arranged outside the vacuum, a ceramic sleeve (224) is arranged between the conductive columns (221) in the vacuum and outside the vacuum, and the ceramic sleeve (224) is used for insulation.

6. The vacuum heating device for sputtering film deposition machine as recited in claim 1 wherein: The conductive column (221) outside the vacuum is provided with an electrode shield (226), and the electrode shield (226) is connected with the bottom of the electrode mounting seat (223).

7. The vacuum heating device for sputter coating machine as claimed in claim 1, wherein: The heating lamp tube assembly (21) comprises a heating lamp tube (211), and the heating lamp tube (211) is provided with a heating lamp tube clamp (212) at two ends, and the heating lamp tube clamp (212) is connected with one end of the top of the conductive column (221).

8. The vacuum heating device for sputter coating machine as claimed in claim 1, wherein: The positive electrode and the negative electrode of the vacuum electrode assembly (22) of different groups are communicated through a wire (40), one end of the wire (40) is connected with the lower end of the conductive column (221) of the positive electrode (222), the other end of the wire (40) is connected with the lower end of the conductive column (221) of the negative electrode (222), and an external power supply device is connected through the wire (40).

9. The vacuum heating device for sputter coating machine as claimed in claim 1, wherein: The lead (40) between the vacuum electrode assemblies (22) of different groups is sleeved with a corrugated pipe (41) for protecting the lead (40).

10. The vacuum heating device for sputter coating machine as claimed in claim 1, wherein: The lead (40) between the vacuum electrode assemblies (22) of the same group is sleeved with a lead cover (42), one end of the lead cover (42) is connected with the mounting seat of the positive electrode (222), and the other end is connected with the mounting seat of the corresponding negative electrode (222), for protecting the lead (40).

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