Sputtering device structure developed based on desktop cluster equipment

Abstract

The utility model relates to the technical field of vacuum equipment, in particular to a sputtering device structure developed on the basis of desktop cluster equipment, which comprises a sputtering device mounted at the upper end of a mounting seat, the sputtering device is of a conical structure, the upper end of the sputtering device is provided with a through hole, the upper end of the mounting seat is connected with an insulating plate, the sputtering device is positioned in the insulating plate, and the insulating plate is provided with a through hole. A groove is further formed in the insulating plate, the groove extends into the mounting seat, and an insulating sleeve is mounted in the groove; the negative-voltage sputtering device and the 0V mounting seat form a gradient electric field, ion beam focusing is optimized by combining an internal conical structure, scattering and energy loss are reduced, the sealing performance and the insulating performance of the device are guaranteed by utilizing the design of an insulating sleeve and a sealing gasket, the sputtering device can support quick disassembly and assembly, the maintenance efficiency is remarkably improved, and the service life of the device is prolonged. Meanwhile, the device can be used in a low-temperature and vacuum environment, and the device meets the high-precision requirement of a cluster beam current system on ion beam separation and transmission.

Description

TECHNICAL FIELD

[0001] The utility model belongs to vacuum equipment technical field, more particularly to a sputterer structure based on desktop cluster equipment development. BACKGROUND

[0002] Skimmer has important applications in the fields of ion beam, mass spectrometry, and vacuum technology, especially in the process of ion beam guiding and screening between ion source and mass analysis instruments. In sputtering technology, ion beams (usually argon ions or other gas ions) are accelerated by an acceleration electric field and then hit the target material, causing atoms or molecules on the target surface to be sputtered. These sputtered atoms or molecules form a complex particle group, such as ion clusters, under the gas pressure of the sputtering source. The ion beam generated by the sputtering source may contain a large number of unwanted stray ions, which can affect the accuracy of subsequent analysis. Therefore, a device is needed between the ion source and the analysis device (such as a mass spectrometer) to filter and ensure that only the required ion beam is transmitted downstream. Skimmer, as an ion screening and transmission device, functions to remove unwanted ions or stray particles through physical or electric field guidance. It is usually located between the ion source and the analysis instrument. In mass spectrometry, skimmer is used to guide the ion beam generated by sputtering into the mass analysis instrument, improving measurement precision and accuracy; it can also adjust the ion beam flow distribution in the ion source vacuum pipeline to ensure that the ion beam can smoothly enter the subsequent analysis device. In addition, skimmer plays a key role in material science and quantum research fields, such as low-temperature research, superconducting materials, and quantum phenomenon exploration, providing important support for related research by precisely controlling ion beam flow. In summary, skimmer, as an efficient ion beam screening and guiding device, plays an important role in multiple scientific research and industrial application fields;

[0003] The existing skimmer technology has some deficiencies. First of all, the sealing problem in the vacuum environment is particularly prominent, both to ensure the air tightness of the device and to prevent the device from leaking electricity. Secondly, the design of skimmer may limit the resolution of the ion beam, especially when dealing with complex ion mixtures, it is difficult to effectively distinguish different types of ions. The precision requirements of the structure design also challenge the long-term stability of the skimmer, and the errors in the manufacturing process may affect its overall performance. In addition, some skimmer designs have energy loss problems, affecting the efficiency and accuracy of the experiment. Finally, different mass spectrometers and experimental environments have different requirements for skimmer, and the existing design has not fully adapted to all analysis needs, especially in extreme environments, its performance may not be stable enough; therefore, improving the sealing insulation, quick release, and precision requirements is still a key direction for the optimization of skimmer technology. Utility model content

[0004] The utility model discloses a sputterer structure developed based on desktop cluster equipment, to solve the problem raised in the background art.

[0005] To achieve the above object, the utility model provides the following technical scheme:

[0006] A sputterer structure developed based on desktop cluster equipment, comprising:

[0007] The sputterer installed on the upper end of the mounting seat adopts a negative voltage design, forms a gradient electric field with the mounting seat, and forms a potential barrier with the surrounding electric field. Only ions with energy higher than the potential barrier can pass through, thereby more effectively screening ions of a specific energy, improving separation resolution, and the negative voltage and the surrounding electric field synergistically form a focusing effect of the ion beam, so that the ions are accelerated or decelerated in the negative voltage field and are transmitted along an optimized path, reducing scattering and energy loss. The sputterer is provided in a conical structure, a through hole with a diameter of 5 mm is formed in the upper end of the sputterer, to effectively screen ions and reduce the interference of stray ions. A cavity is formed in the sputterer, and the geometric shape of the conical cavity makes the electric field distribution more uniform when the ion beam is injected from the tip, forming a natural focusing effect and significantly improving the ion control precision. An insulating plate is connected to the upper end of the mounting seat, and the sputterer is located inside the insulating plate. A gasket is also arranged inside the insulating plate. The gasket is used in combination with the insulating plate to ensure the vacuum sealing performance of the equipment, prevent gas leakage and external pollution, meet the strict requirements of high-precision experiments, and form a multiple protection mechanism in combination with the anti-breakdown groove design, effectively eliminate the possibility of electric field breakdown, and significantly improve the safety and stability of the system.

[0008] Preferably, the mounting seat is provided in a circular structure.

[0009] Preferably, the taper angle of the sputterer is 45 degrees, which optimizes the transmission path of the ion beam, reduces the collision with the wall surface, reduces the risk of local electric field concentration and discharge, and improves the stability and service life of the device.

[0010] Preferably, the mounting seat is connected with a flange, which facilitates quick disassembly and assembly, significantly reduces maintenance cost and time, and is modular in structure, facilitating replacement and upgrading, adapting to different experimental requirements, and being compatible with working conditions in extreme environments such as low temperature and vacuum, thereby providing flexibility and reliability for complex experimental scenarios.

[0011] Compared with the prior art, the utility model has the beneficial effects that:

[0012] The utility model discloses a gradient electric field is formed with the mounting seat of 0V of the sputterer of negative voltage setting, and the ion beam focus is optimized in combination with internal conical structure, reduces scattering and energy loss, simultaneously, the sealing property and insulation performance of device are guaranteed using insulating sleeve and sealing washer design, the sputterer can support quick dismounting, maintenance efficiency is improved significantly, and simultaneously, the device also supports using under low temperature and vacuum environment, and the device not only satisfies the high precision requirement of cluster beam system to ion beam separation and transmission. BRIEF DESCRIPTION OF DRAWINGS

[0013] Fig. 1 It is whole structure schematic diagram of the utility model;

[0014] Fig. 2 It is internal structure schematic diagram of the utility model;

[0015] In the drawing: 1, mounting seat;2, insulating plate;3, sputterer;4, insulating sleeve. PREFERRED EMBODIMENT

[0016] The technical scheme in the embodiments of the utility model will be described clearly and completely below in conjunction with the drawings in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, rather than all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of the utility model.

[0017] EMBODIMENT

[0018] Please refer to Figs. 1-2 As shown in the figure, a sputterer structure developed based on desktop cluster equipment, comprising:

[0019] The sputterer 3 installed on the upper end of the mounting seat 1 is designed with a negative voltage, forming a gradient electric field with the mounting seat 1. The negative voltage forms a potential barrier with the surrounding electric field, so only ions with energy higher than the potential barrier can pass through, thereby more effectively screening ions of a specific energy, improving separation resolution. The negative voltage and the surrounding electric field work together to form a focusing effect of the ion beam, accelerating or decelerating the ions in the negative voltage field along an optimized path, reducing scattering and energy loss. The sputterer 3 is designed in a conical structure, with a through-hole of 5mm in diameter at the upper end of the sputterer 3, effectively screening ions and reducing the interference of stray ions. A cavity is provided inside the sputterer 3. The geometric shape of the conical cavity makes the electric field distribution more uniform when the ion beam is injected from the tip, forming a natural focusing effect and significantly improving the precision of ion manipulation. The upper end of the mounting seat 1 is connected to an insulating plate 2, and the sputterer 3 is located inside the insulating plate 2. A gasket is also provided inside the insulating plate 2. The gasket cooperates with the insulating plate 2 to ensure the vacuum sealing performance of the device, preventing gas leakage and external contamination, and meeting the strict requirements of high-precision experiments. A groove is also provided inside the insulating plate 2, extending into the interior of the mounting seat 1, i.e. 2mm into the interior of the mounting seat 1. An insulating sleeve 4 is installed inside the groove, with the insulating sleeve 4 extending 2mm into the interior of the mounting seat 1 after installation. In combination with the anti-breakdown groove design, a multiple protection mechanism is formed to effectively eliminate the possibility of electric field breakdown, significantly improving the safety and stability of the system.

[0020] Reference Figs. 1-2 As shown, the mounting seat 1 is designed in a circular structure.

[0021] Reference Figs. 1-2 As shown, the taper angle of the sputterer 3 is 45 degrees, optimizing the transmission path of the ion beam, reducing collisions with the wall, and reducing the risk of local electric field concentration and discharge, improving the stability and service life of the device.

[0022] Reference Figs. 1-2 As shown, the mounting seat 1 is connected to a flange, facilitating quick disassembly and assembly, significantly reducing maintenance costs and time. The modular structure facilitates replacement and upgrading, adapting to different experimental requirements while being compatible with low-temperature, vacuum and other extreme working conditions, providing flexibility and reliability for complex experimental scenarios.

[0023] The utility model discloses a gradient electric field is formed with the mounting seat 1 of 0V of sputterer 3 of negative voltage setting, and the ion beam focus is optimized in combination internal conical structure, reduces scattering and energy loss, and simultaneously insulating sleeve 4 and sealing washer design guarantee the sealing property and insulating performance of device, the sputterer 3 can support quick dismounting, has improved maintenance efficiency significantly, and simultaneously the device also supports under low temperature and vacuum environment use, the device not only satisfies the high accuracy requirement of cluster beam system to ion beam separation and transmission, also provides reliable experimental basis for superconductive material research, quantum phenomenon exploration (such as superfluidity and Bose-Einstein condensation) and material thermology, electrical and magnetic characteristic research, successfully solved the problem of traditional sputterer in resolution, control accuracy and airtightness.

[0024] Although the embodiments of the utility model have been shown and described, it will be understood by those of ordinary skill in the art that various changes, modifications, alternatives, and variations can be made thereto without departing from the principles and spirit of the utility model, and the scope of the utility model is defined by the appended claims and their equivalents.

Claims

1. A sputterer structure developed based on a desktop cluster apparatus, characterized by, The utility model relates to a sputtering device, including: The sputtering device (3) is arranged on the upper end of the mounting base (1), the sputtering device (3) is provided as a conical structure, the upper end of the sputtering device (3) is provided with a through hole, the upper end of the mounting base (1) is connected with an insulating plate (2), the sputtering device (3) is located in the inside of the insulating plate (2), the inside of the insulating plate (2) is also provided with a recess, the recess extends to the inside of the mounting base (1), and the inside of the recess is provided with an insulating sleeve (4).

2. A sputterer structure based on a desktop cluster tool according to claim 1, characterized in that: The mounting base (1) is provided as a circular structure.

3. A sputterer structure based on a desktop cluster tool according to claim 2, characterized in that: The taper angle of the sputtering device (3) is 45 degrees.

4. The sputterer structure developed based on the desktop cluster apparatus according to claim 3, characterized in that: The mounting base (1) is connected with a flange.

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