Semiconductor wet electron chemical purification small-scale test device
By employing PTFE and PFA materials and a high-purity nitrogen protection system, the semiconductor wet electronic chemical purification device solves the problems of high metal ion precipitation, low purification efficiency, and poor moisture and oxidation resistance in traditional devices. It achieves multi-stage purification of high-purity chemicals and convenient maintenance, making it suitable for laboratory pilot tests.
Patent Information
- Application Number
- CN202520513797.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-03-24
- Publication Date
- 2026-02-17
- Estimated Expiration
- 2035-03-24
AI Technical Summary
Traditional semiconductor wet electronic chemical purification devices suffer from high metal ion precipitation, low purification efficiency, complex device structure, and inconvenient operation, making it difficult to meet the requirements of high-purity chemicals. They also lack moisture-proof and oxidation-proof measures, making chemicals susceptible to contamination during the purification process.
The storage tanks, pumps, purification columns, and pipelines are made of PTFE and PFA materials and equipped with a high-purity nitrogen protection system. The multi-stage purification system and detachable quick-connect filters are designed to ensure that the metal ion precipitation is less than 1ppt. The multi-stage purification removes organic impurities and submicron particles and prevents chemical oxidation and moisture absorption.
It achieves metal ion precipitation of less than 1ppt for high-purity chemicals, effectively removes submicron-sized particles, meets the requirements of G5-level high-purity chemicals, and has a compact structure that is easy to maintain, making it suitable for laboratory-scale testing.
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Figure CN223914741U_ABST
Abstract
Description
Technical Field
[0001] This application relates to the technical field of high-purity ultrapure chemical reagent purification equipment, specifically a pilot-scale device for purifying semiconductor wet electronic chemicals. Background Technology
[0002] In semiconductor manufacturing, the purity of wet electronic chemicals such as isopropanol and methanol has a significant impact on product quality and performance. Traditional purification devices suffer from the following problems: high metal ion precipitation, making it difficult to meet the requirements of G5 and higher purity chemicals; low purification efficiency, unable to effectively remove submicron-sized particles and organic impurities; complex device structure, inconvenient operation, and limited flexibility for small-scale laboratory applications; and a lack of effective moisture and oxidation prevention measures, making chemicals susceptible to contamination during purification. Summary of the Invention
[0003] To address the shortcomings of existing technologies, this application provides a pilot-scale apparatus for purifying semiconductor wet electronic chemicals, thereby solving the problems of insufficient purification performance and complex apparatus in the aforementioned existing technologies.
[0004] To achieve the above objectives, this application provides the following technical solution:
[0005] A pilot-scale apparatus for purifying semiconductor wet electronic chemicals includes a storage tank, a diaphragm pump, a purification column, a capsule filter, and pipelines. The reagent delivery outlet of the storage tank is connected to the inlet of the purification column via a pipeline through the diaphragm pump. The outlet of the purification column is connected to the inlet of the capsule filter via a pipeline, and the outlet of the capsule filter is connected to the reagent delivery inlet of the storage tank via a pipeline. The storage tank, the pump body of the diaphragm pump, the filter element and the shell of the capsule filter are all made of PTFE material, and the purification column and pipelines are all made of PFA material. The purification column is filled with a high-purity adsorbent.
[0006] Preferably, the storage tank is equipped with a high-purity inert gas input / output port.
[0007] Preferably, the inert gas is nitrogen.
[0008] Preferably, the purification column comprises two purification columns connected by a pipeline, and the metal ion precipitation in each purification column is less than 1 ppt.
[0009] Preferably, the purification column has a detachable structure.
[0010] Preferably, the capsule filter comprises two stages of capsule filters, which are connected by a pipe, and the metal ion release from each stage of the capsule filter is less than 1 ppt.
[0011] Preferably, in the two-stage capsule filter, the first-stage capsule filter uses a 0.1μm filter element, and the second-stage capsule filter uses a 0.03μm filter element.
[0012] Preferably, the interface between the capsule filter and the pipeline is a quick-connect interface.
[0013] Preferably, the flow rate of the diaphragm pump is in the range of 0-100 mL / min.
[0014] Preferably, the metal ion precipitation in the pipeline is less than 1 ppt.
[0015] This application employs innovative structural design and material selection, such as a fully inert material design. All parts of the device that come into contact with chemicals, including storage tanks, pumps, purification columns, filters, and pipelines, are made of PTFE or PFA materials, ensuring that metal ion precipitation is less than 1 ppt, meeting the requirements for G5 or even higher-level high-purity chemicals. The high-purity nitrogen protection system, by equipping the PTFE storage tank with high-purity nitrogen inlet and outlet ports, continuously introduces high-purity nitrogen to create an inert gas protective environment, effectively preventing chemicals from absorbing moisture and undergoing oxidation, ensuring purification efficiency. The multi-stage purification system uses two PFA purification columns and two PTFE capsule filter cartridges to achieve multi-stage purification, efficiently removing organic impurities, metal ions, and submicron-sized particles. The purification columns and filters feature a detachable and quick-connect design, facilitating the replacement of adsorbents and filters and maintenance, improving the flexibility and service life of the device. Ultra-high precision filtration uses two-stage PTFE capsule filter cartridges, effectively removing submicron-sized particles and ensuring ultra-high purity of chemicals. This invention addresses the problems of high metal ion precipitation, low purification efficiency, and poor moisture and oxidation resistance in existing technologies, meeting the purification requirements of G5 and even higher-level high-purity chemicals. The modular and compact design of the device in this application results in a small footprint, making it suitable for laboratory pilot-scale tests and R&D applications, while also facilitating movement and installation. Attached Figure Description
[0016] Figure 1 This is a schematic diagram of the structural connection frame of an embodiment of this application;
[0017] Among them, 1-storage tank, 2-diaphragm pump, 31-first-stage purification column, 32-second-stage purification column, 41-first-stage capsule filter, 42-second-stage capsule filter, 5-pipeline, 6-nitrogen. Detailed Implementation
[0018] The technical solutions in the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments.
[0019] This embodiment provides a technical solution: An embodiment of a small-scale purification device for semiconductor wet electronic chemicals disclosed in this solution includes a storage tank 1 made of polytetrafluoroethylene (PTFE), a diaphragm pump 2 made of PTFE, a first-stage purification column 31, a second-stage purification column 32, a first-stage capsule filter 41, a second-stage capsule filter 42, and pipelines 5. In this embodiment, the storage tank 1 has a volume of 1L and is used to store wet electronic chemicals to be purified, such as isopropanol and methanol. The storage tank 1 made of this material has excellent chemical inertness and corrosion resistance, ensuring that the chemicals are not contaminated during storage. The storage tank 1 is also equipped with a high-purity nitrogen gas inlet / outlet 6. By continuously introducing high-purity nitrogen gas, an inert gas protective environment is formed to prevent the chemicals from absorbing moisture from the air and from oxidation.
[0020] The reagent delivery outlet of the storage tank 1 is connected to the inlet of the first-stage purification column 31 via a pipe 5 through a diaphragm pump 2. The diaphragm pump 2 is used to pump chemicals from the storage tank 1 and deliver them to the subsequent purification system. The pump body is also made of PTFE to ensure that no metal ions are released from the parts in contact with the chemicals, meeting the requirements for ultra-high purity. In this embodiment, the flow rate range is 0-100 mL / min, which can maintain a suitable reagent delivery rate in laboratory small-scale tests. Since the purification column in this embodiment includes two-stage purification columns, the first-stage purification column 31 and the second-stage purification column 32 are connected by a pipe 5. Each purification column in this embodiment is 300 mm high and 20 mm in diameter. The purification columns are filled with high-purity adsorbents such as molecular sieves and activated carbon to remove organic impurities and metal ions from the chemicals. Both purification columns are made of PFA material, and PFA materials from manufacturers such as Daikin Industries, Japan can be selected. The metal ion release is less than 1 ppt. The purification column is designed with a detachable structure such as a threaded connection or a rotary bayonet connection for easy replacement of the adsorbent and maintenance. Only the sealing of the connection needs to be ensured.
[0021] The outlet of the second-stage purification column 32 is connected to the inlet of the first-stage capsule filter 41 via pipe 5. The outlet of the second-stage capsule filter 42 is connected to the reagent delivery inlet of the storage tank 1 via pipe 5. The first-stage capsule filter 41 and the second-stage capsule filter 42 are also connected via pipe 5. The two-stage capsule filter includes 0.1μm and 0.03μm filters. The 0.1μm filter is used to remove particulate matter, and the 0.03μm filter is used to further remove submicron impurities to ensure ultra-high purity of chemicals. The filter element and shell are both made of PTFE. In this embodiment, an Intergol capsule filter is selected, with metal ion precipitation less than 1ppt. In this embodiment, the interface between the capsule filter and pipe 5 adopts a quick-connect design for easy replacement and cleaning.
[0022] All connecting pipes 5 are made of pure PFA material to ensure that metal ion release is less than 1 ppt. Pipes 5 are compactly designed with sealed connections to prevent leakage and contamination.
[0023] The wet electronic chemicals to be purified first enter a 1-liter PTFE storage tank 1. A PTFE diaphragm pump 2 then delivers the chemicals to two PFA purification columns for initial purification, removing organic impurities and metal ions. The purified chemicals then pass sequentially through 0.1μm and 0.03μm PTFE capsule filters to remove particulate matter and submicron-sized impurities. Finally, the purified chemicals are returned to the 1-liter PTFE storage tank 1, completing the cyclic purification process. This cyclic purification can be repeated multiple times until the desired purity is achieved.
[0024] In the description of this application, it should be noted that the terms "center," "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the accompanying drawings and are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation on this application. Furthermore, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance.
[0025] The above description is only a preferred embodiment of the present solution, but the scope of protection claimed by the present solution is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the technology disclosed in this application, based on the technical solution and inventive concept of this application, should be included within the scope of protection of this application.
Claims
1. A semiconductor wet electronic chemical purification pilot plant device, characterized by: The system includes a storage tank (1), a diaphragm pump (2), a purification column, a capsule filter, and a pipeline (5). The reagent delivery outlet of the storage tank (1) is connected to the inlet of the purification column via the diaphragm pump (2) through the pipeline (5). The outlet of the purification column is connected to the inlet of the capsule filter through the pipeline (5). The outlet of the capsule filter is connected to the reagent delivery inlet of the storage tank (1) through the pipeline (5). The pump body of the storage tank (1), the pump body of the diaphragm pump (2), the filter element and the shell of the capsule filter are all made of PTFE material. The purification column and the pipeline (5) are all made of PFA material. The purification column is filled with a high-purity adsorbent.
2. The semiconductor wet electronic chemical purification pilot-scale apparatus according to claim 1, characterized in that: The storage tank (1) is equipped with a high-purity inert gas input / output port.
3. The semiconductor wet electronic chemical purification pilot-scale apparatus according to claim 2, characterized in that: The inert gas used is nitrogen (6).
4. The semiconductor wet electronic chemical purification pilot-scale apparatus according to claim 1, characterized in that: The purification column includes two purification columns, which are connected by a pipe (5). The metal ion precipitation in each purification column is less than 1ppt.
5. The semiconductor wet electronic chemical purification pilot-scale apparatus according to claim 4, characterized in that: The purification column has a detachable structure.
6. The semiconductor wet electronic chemical purification pilot-scale apparatus according to claim 1, characterized in that: The capsule filter includes two stages of capsule filters, which are connected by a pipe (5). The metal ion precipitation of each stage of capsule filter is less than 1ppt.
7. The semiconductor wet electronic chemical purification pilot-scale apparatus according to claim 6, characterized in that: The two-stage capsule filter uses a 0.1μm filter element for the first stage and a 0.03μm filter element for the second stage.
8. The semiconductor wet electronic chemical purification pilot-scale apparatus according to claim 1, characterized in that: The interface between the capsule filter and the pipe (5) is a quick-connect interface.
9. The semiconductor wet electronic chemical purification pilot-scale apparatus according to claim 1, characterized in that: The diaphragm pump (2) has a flow rate range of 0-100 mL / min.
10. The semiconductor wet electronic chemical purification pilot-scale apparatus according to claim 1, characterized in that: The metal ion precipitation in the pipe (5) is less than 1ppt.