Photoresist defoaming device

Abstract

The utility model relates to the technical field of semiconductor device equipment, in particular to a photoresist defoaming device. The device comprises a bottom frame and a defoaming mechanism, a top frame is hinged to the bottom frame, and heating rings are arranged on the bottom frame and the top frame; the bubble removing mechanism comprises a bubble removing barrel detachably arranged on the bottom frame, a discharging barrel detachably arranged on the top frame and bubble removing assemblies arranged on the top frame, the bubble removing barrel and the discharging barrel. The top end of the bubble removing barrel communicates with the bottom end of the discharging barrel, and the peripheral faces of the bubble removing barrel and the discharging barrel abut against the heating ring. According to the defoaming device, the photoresist is injected between the defoaming cylinder and the blanking cylinder, the temperature of the blanking cylinder and the defoaming cylinder is increased by the heating ring, and the heat exchange speed of the photoresist and the external environment is increased by the defoaming component, so that the fluidity of the photoresist is always in a state with the best defoaming efficiency.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor device equipment technology, and in particular to a photoresist debubbling device. Background Technology

[0002] Photoresist is a material used in semiconductor manufacturing; it is a special photosensitive polymer solution. Photoresist is used to create photolithographic patterns in the manufacture of devices such as integrated circuits and microchips. The main components of photoresist are polymers and photosensitizers. When light shines on the photoresist, the photosensitizer undergoes a chemical reaction, causing changes in the physical properties of the photoresist.

[0003] Chinese Patent CN221034602U discloses a photoresist debubbling device, belonging to the field of semiconductor device equipment technology. The photoresist debubbling device includes a debubbling tank, an inlet pipe, and a photoresist void sensor. The debubbling tank has a debubbling chamber inside, and is equipped with an inlet, an outlet, and an outlet communicating with the debubbling chamber. The outlet is located on the top wall of the debubbling chamber, and the outlet is located on the bottom wall. The inlet pipe passes through the inlet, and its outlet is vertically spaced from the outlet, with the outlet located below the outlet. The photoresist void sensor is connected to the inlet pipe and is used to detect the presence of gas inside the inlet pipe. The photoresist debubbling device can reduce the probability of gas from inside the debubbling chamber entering the inlet pipe, thereby reducing the probability of false alarms from the photoresist void sensor.

[0004] However, the above technical solution has the following shortcomings: the technical solution uses the increase of photoresist density to squeeze out and discharge the gas inside the photoresist. During the flow process, the photoresist will exchange heat with the external temperature, which will easily lead to an increase in hardness when it flows into the debubbling chamber, thereby affecting the debubbling efficiency of the photoresist. Utility Model Content

[0005] The purpose of this invention is to address the problems existing in the background technology by proposing a photoresist debubbling device that injects photoresist between a debubbling cylinder and a feeding cylinder, raises the temperature of the feeding cylinder and the debubbling cylinder with a heating ring, and increases the heat exchange rate between the photoresist and the external environment through a debubbling component, thereby ensuring that the flowability of the photoresist is always in the best state of debubbling efficiency.

[0006] The technical solution of this utility model is a photoresist debubbling device, comprising: a base frame with a top frame hinged thereon, and heating rings provided on both the base frame and the top frame; a debubbling mechanism, comprising a debubbling cylinder detachably mounted on the base frame, a feeding cylinder detachably mounted on the top frame, and a debubbling assembly mounted on the top frame, the debubbling cylinder, and the feeding cylinder; the top end of the debubbling cylinder is connected to the bottom end of the feeding cylinder, and the outer circumferential surfaces of both the debubbling cylinder and the feeding cylinder abut against the heating rings.

[0007] Preferably, both the base frame and the top frame have receiving frames, the two receiving frames are in contact with the outer circumferential surfaces of the bubble cylinder and the feed cylinder respectively, the two heating rings are located at the two receiving frames respectively, and the base frame and the feed cylinder are provided with limit plates.

[0008] Preferably, the defoaming assembly includes a motor mounted on a top frame, an upper mounting bracket detachably mounted on the top frame, a drive rod detachably and rotatably mounted on the top frame and the upper mounting bracket, an upper spiral conveying cylinder coaxially mounted on the drive rod, a lower mounting bracket detachably mounted on a base frame, a driven rod detachably and rotatably mounted on the lower mounting bracket, a lower spiral conveying cylinder coaxially mounted on the driven rod, and a bolt threaded onto both the drive rod and the driven rod; the motor, drive rod, and driven rod are sequentially driven and connected.

[0009] Preferably, both the lower mounting bracket and the upper mounting bracket are provided with sealing gaskets, and the two sealing gaskets abut against each other.

[0010] Preferably, the feeding cylinder is detachably connected to a feeding pipe and an exhaust pipe, and a sealing ring is provided between the feeding pipe, the exhaust pipe and the feeding cylinder.

[0011] Preferably, the top frame is equipped with a damping support rod for rotation.

[0012] Compared with the prior art, the present invention has the following beneficial technical effects:

[0013] In use, the photoresist is injected between the debubbling cylinder and the feeding cylinder. The heating ring raises the temperature of the debubbling cylinder and the feeding cylinder to the temperature required by the user, and drives the debubbling component to stir the photoresist, thereby improving the heat exchange between the photoresist and the debubbling cylinder and the feeding cylinder, so that the temperature of the photoresist is always kept at the temperature required by the user, thus ensuring the photoresist removal efficiency. Attached Figure Description

[0014] Figure 1 This is a schematic diagram of the structure of an embodiment of the present utility model;

[0015] Figure 2 This is a schematic diagram illustrating the opening method of an embodiment of the present utility model;

[0016] Figure 3 This is a cross-sectional view of an embodiment of the present utility model;

[0017] Figure 4 This is a schematic diagram of the structure of the drive rod, upper spiral conveyor cylinder, upper mounting frame, sealing gasket, and bolts in the embodiment of this utility model.

[0018] Reference numerals in the attached diagram: 1. Base frame; 2. Limiting plate; 3. Debubbling cylinder; 4. Lower mounting frame; 5. Driven rod; 6. Lower screw conveyor cylinder; 7. Discharge pipe; 8. Control valve; 9. Top frame; 10. Support rod; 11. Motor; 12. Drive rod; 13. Upper screw conveyor cylinder; 14. Upper mounting frame; 15. Discharge pipe; 16. Sealing ring; 17. Exhaust pipe; 18. Heating ring; 19. Sealing gasket; 20. Bolt; 21. Discharge cylinder. Detailed Implementation

[0019] Example 1

[0020] like Figures 1-4 As shown in this embodiment, a photoresist debubbling device includes a base frame 1 and a debubbling mechanism. A top frame 9 is hinged to the base frame 1, and heating rings 18 are provided on both the base frame 1 and the top frame 9. The debubbling mechanism includes a debubbling cylinder 3 detachably mounted on the base frame 1, a feeding cylinder 21 detachably mounted on the top frame 9, and debubbling components mounted on the top frame 9, the debubbling cylinder 3, and the feeding cylinder 21. The top end of the debubbling cylinder 3 is connected to the bottom end of the feeding cylinder 21, and the outer circumferences of both the debubbling cylinder 3 and the feeding cylinder 21 abut against the heating rings 18. Both the debubbling cylinder 3 and the feeding cylinder 21 can be integrally formed by die casting or other methods to reduce air exchange between the device and the external environment and improve the debubbling efficiency of the photoresist. The debubbling cylinder 3 is detachably connected to a discharge pipe 7, and a control valve 8 is connected to the discharge pipe 7. An elastic ring is provided between the discharge pipe 7 and the debubbling cylinder 3, which can improve the sealing performance of the device.

[0021] The feeding cylinder 21 is detachably connected to the feeding pipe 15 and the exhaust pipe 17. Sealing rings 16 are installed between the feeding pipe 15, the exhaust pipe 17, and the feeding cylinder 21. The exhaust pipe 17 is connected to an air pump, which remains operational throughout the desmearing process, thus maintaining a vacuum inside the feeding cylinder 21 and the debubbling cylinder 3 to improve the debubbling efficiency of the photoresist. A damped rotating support rod 10 is installed on the top frame 9. When the debubbling device is opened for maintenance and cleaning, the support rod 10 supports the top frame 9, reducing the difficulty of maintenance.

[0022] In this embodiment, the photoresist is injected between the debubbling cylinder 3 and the feeding cylinder 21. The heating ring 18 raises the temperature of the debubbling cylinder 3 and the feeding cylinder 21 to the temperature required by the user, and drives the debubbling component to stir the photoresist, thereby improving the heat exchange between the photoresist and the debubbling cylinder 3 and the feeding cylinder 21, so that the temperature of the photoresist is always kept at the temperature required by the user, thereby ensuring the photoresist removal efficiency.

[0023] Example 2

[0024] like Figures 1-3As shown, the photoresist debubbling device proposed in this embodiment has a receiving frame portion on both the base frame 1 and the top frame 9 compared to the first embodiment. The two receiving frames are in contact with the outer peripheral surfaces of the debubbling cylinder 3 and the feeding cylinder 21, respectively. The two heating rings 18 are located at the two receiving frames, respectively. Limiting plates 2 are provided on both the base frame 1 and the feeding cylinder 21.

[0025] In this embodiment, the user first sets the heating ring 18 onto the two receiving frames, and then sets the debubbling cylinder 3 and the feeding cylinder 21 onto the receiving frames. The receiving frames will push the heating ring 18 to always be in contact with the outer peripheral surfaces of the debubbling cylinder 3 and the feeding cylinder 21, thereby ensuring the stability of the internal temperature of the debubbling cylinder 3 and the feeding cylinder 21.

[0026] Example 3

[0027] like Figures 1-4 As shown, this embodiment proposes a photoresist debubbling device. Compared to Embodiment 1, in this embodiment, the debubbling assembly includes a motor 11 mounted on a top frame 9, an upper mounting bracket 14 detachably mounted on the top frame 9, a drive rod 12 detachably and rotatably mounted on the top frame 9 and the upper mounting bracket 14, an upper spiral conveyor cylinder 13 coaxially mounted on the drive rod 12, a lower mounting bracket 4 detachably mounted on a base frame 1, a driven rod 5 detachably and rotatably mounted on the lower mounting bracket 4, a lower spiral conveyor cylinder 6 coaxially mounted on the driven rod 5, and a bolt 20 threadedly connected to both the drive rod 12 and the driven rod 5. The motor 11, drive rod 12, and driven rod 5 are sequentially driven and connected. Both the lower mounting bracket 4 and the upper mounting bracket 14 are provided with sealing washers 19, and the two sealing washers 19 abut against each other.

[0028] In this embodiment, the user controls the motor 11 to drive the drive rod 12 to rotate, and the drive rod 12 drives the driven rod 5 to rotate. The lower spiral conveyor cylinder 6 and the upper spiral conveyor cylinder 13 cooperate to convey the photoresist from bottom to top, thereby increasing the flow range of the photoresist. This allows the air bubbles inside the photoresist to be removed under the action of high temperature, vacuum and stirring, thereby improving the defoaming efficiency of the photoresist. In addition, the sealing gasket 19 can prevent the photoresist from flowing to the connection point between the drive rod 12 and the driven rod 5. The drive rod 12 has a protrusion and the driven rod 5 has a groove. The drive rod 12 drives the driven rod 5 to rotate by abutting the protrusion against the groove of the driven rod 5.

[0029] The embodiments of the present invention have been described in detail above with reference to the accompanying drawings. However, the present invention is not limited thereto. Various changes can be made within the scope of knowledge possessed by those skilled in the art without departing from the spirit of the present invention.

Claims

1. A photoresist debubbling apparatus characterized by, include: A base frame (1) is hinged to a top frame (9), and heating rings (18) are provided on both the base frame (1) and the top frame (9); The defoaming mechanism includes a defoaming cylinder (3) detachably mounted on the base frame (1), a feeding cylinder (21) detachably mounted on the top frame (9), and a defoaming assembly mounted on the top frame (9), the defoaming cylinder (3), and the feeding cylinder (21); the top end of the defoaming cylinder (3) is connected to the bottom end of the feeding cylinder (21), and the outer circumferential surfaces of the defoaming cylinder (3) and the feeding cylinder (21) are in contact with the heating ring (18).

2. The bubble removing apparatus for photoresist according to claim 1, wherein Both the base frame (1) and the top frame (9) have a receiving frame part. The two receiving frames are in contact with the outer circumference of the bubble cylinder (3) and the feed cylinder (21), respectively. The two heating rings (18) are located at the two receiving frames. Limiting plates (2) are provided on both the base frame (1) and the feed cylinder (21).

3. The bubble removing apparatus for photoresist according to claim 1, wherein The defoaming assembly includes a motor (11) mounted on a top frame (9), an upper mounting bracket (14) detachably mounted on the top frame (9), a drive rod (12) detachably rotatably mounted on the top frame (9) and the upper mounting bracket (14), an upper spiral conveyor (13) coaxially mounted on the drive rod (12), a lower mounting bracket (4) detachably mounted on a base frame (1), a driven rod (5) detachably rotatably mounted on the lower mounting bracket (4), a lower spiral conveyor (6) coaxially mounted on the driven rod (5), and a bolt (20) threadedly connected to the drive rod (12) and the driven rod (5); the motor (11), the drive rod (12), and the driven rod (5) are sequentially driven and connected.

4. The bubble removing apparatus for photoresist according to claim 3, wherein Both the lower mounting bracket (4) and the upper mounting bracket (14) are provided with sealing gaskets (19), and the two sealing gaskets (19) abut against each other.

5. The bubble removing apparatus for photoresist according to claim 1, wherein The feeding cylinder (21) is detachably connected to the feeding pipe (15) and the exhaust pipe (17), and a sealing ring (16) is provided between the feeding pipe (15), the exhaust pipe (17) and the feeding cylinder (21).

6. The bubble removing apparatus for photoresist according to claim 1, wherein The top frame (9) is equipped with a damping support rod (10).

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