Photoresist conveying device

Abstract

The utility model discloses a photoresist conveying device which comprises a storage box, a conveying mechanism is arranged on one side of the storage box, and the conveying mechanism comprises a supporting seat, a draw-off pump, a draw-off pipe, a conveying pipe, a spray head and a flow control mechanism, the flow control mechanism comprises a mounting sleeve, a movable bin, control plates, a rotating sleeve, a matching sleeve, a screw rod, a push sleeve, a mounting ring, a limiting block, a movable spring, a limiting groove, a lock sleeve and an unlocking hole, the mounting sleeve is fixed to the extraction pipe, the movable bin is arranged in the mounting sleeve, the control plates are arranged in the movable bin in a sliding mode, and the rotating sleeve is rotationally connected with the mounting sleeve and the extraction pipe; and the flow control mechanism is unlimited by rotating the lock sleeve, so that the plurality of control plates can slide along the movable bin, the area of the flowing channel is further adjusted, the flowing channel of the photoresist is adjusted along with the movement of the control plates, the flow of the photoresist is accurately controlled, and different process requirements and the change of material characteristics are met.

Description

Technical Field

[0001] This utility model relates to the technical field, and more specifically, to a photoresist delivery device. Background Technology

[0002] In modern photolithography, the delivery accuracy and flow control of photoresist are crucial, especially in high-precision semiconductor manufacturing. As a key material, the uniform coating of photoresist during the photolithography process directly affects the quality and performance of the finished product. Traditional photoresist delivery systems usually rely on a fixed flow pump mechanism, which makes it difficult to flexibly adjust the flow rate of photoresist according to different process requirements. With the continuous development of photolithography technology, the requirements for fine operation are becoming increasingly higher. Existing photoresist delivery systems have failed to meet this demand for high flexibility, making it difficult to accurately control the amount of material delivered during the process, thereby affecting the overall production efficiency and product quality.

[0003] Meanwhile, with the diversification of photoresist materials and their properties, higher requirements are placed on the adaptability of photoresist delivery systems during the production process. Different photoresists vary in viscosity, flowability, and other aspects, which requires the delivery system to adjust the flow rate according to the characteristics of different materials. However, most existing delivery systems cannot flexibly adjust according to these differences. Delivery systems without adaptive adjustment functions may result in over- or under-processing of different photoresists, leading to defects during exposure and development. In severe cases, this can also affect subsequent processing steps, increase production costs, and reduce production stability. Utility Model Content

[0004] (a) Technical problems to be solved

[0005] To address the problems existing in the prior art, this utility model provides a photoresist delivery device to solve the technical problem mentioned in the background art that traditional photoresist delivery systems usually rely on a fixed flow rate pumping mechanism, which makes it difficult to flexibly adjust the flow rate of photoresist according to different process requirements.

[0006] (II) Technical Solution

[0007] To achieve the above objectives, this utility model provides the following technical solution: a photoresist delivery device, comprising a storage box, a delivery mechanism disposed on one side of the storage box, the delivery mechanism comprising a support base, an extraction pump, an extraction pipe, a delivery pipe, a nozzle, and a flow control mechanism, the support base being disposed outside the storage box, the extraction pump being mounted on the support base, the extraction pipe being connected to the extraction end of the extraction pump, the delivery pipe being connected to the output end of the extraction pump, the nozzle being mounted at the top of the delivery pipe, and the flow control mechanism being disposed on the extraction pipe, the flow control mechanism comprising a mounting sleeve, a movable chamber, a control plate, a rotating sleeve, a mating sleeve, a screw, a push sleeve, a mounting ring, and a limiting block. The system includes a movable spring, a limiting groove, a locking sleeve, and unlocking holes. The mounting sleeve is fixed to the extraction tube. The movable chamber is located inside the mounting sleeve. The control plate has multiple sets of sliding parts inside the movable chamber. The rotating sleeve rotatably connects the mounting sleeve and the extraction tube. The mating sleeve is installed on the inner wall of the rotating sleeve. The screw is threadedly connected to the inner side of the mating sleeve. The push sleeve is installed on the top of the screw. The mounting ring is fixed to the outer wall of the rotating sleeve. The limiting blocks have multiple sets of sliding parts installed on the mounting ring. The movable spring is installed at the bottom of the multiple sets of limiting blocks and connected to the bottom surface of the mounting ring. The limiting grooves have multiple sets distributed on the bottom surface of the mounting sleeve. The locking sleeve rotates on the outer wall of the connecting sleeve. The unlocking holes have multiple sets distributed on the bottom surface of the locking sleeve.

[0008] The present invention is further configured such that the delivery tube is a flexible tube and the extraction tube is a rigid tube. The combination of flexible and rigid tubes optimizes the photoresist delivery process. The rigid tube provides a more stable photoresist extraction channel, reducing the risk of pipe bending and deformation, while the flexible tube flexibly adapts to the diverse installation requirements of the delivery section, ensuring the stability and flexibility of photoresist flow.

[0009] This invention is further configured such that guide blocks are installed on the top surface of each of the multiple control boards, and guide grooves are formed inside the movable chamber. Multiple sets of guide grooves are provided and slidably connected to multiple sets of guide blocks. The cooperation between the guide blocks and guide grooves ensures smooth sliding of the control boards within the movable chamber, avoiding jamming problems caused by friction or misalignment, thereby ensuring the accuracy and smoothness of adjusting the photoresist flow rate.

[0010] This invention is further configured such that a support frame is installed inside the mounting sleeve, a limiting rod is installed on the bottom surface of the support frame, and a limiting hole is formed on the push sleeve. Both the limiting rod and the limiting hole are polygonal and slidably connected. The polygonal design of the limiting rod and the limiting hole enhances the stability and positioning accuracy of the push sleeve, allowing it to slide precisely along the limiting groove when adjusting the photoresist flow rate, preventing unstable flow adjustment due to misoperation.

[0011] This invention is further configured such that a connecting plate is installed on the top surface of each of the multiple sets of control boards, and a return spring is connected between each of the multiple sets of connecting plates and the inner wall of the mounting sleeve. The design of the connecting plates and return springs provides a reliable reset function for the control boards, ensuring that after the flow rate is adjusted, the control boards can quickly return to their original position, thereby ensuring the accuracy and stability of the flow rate adjustment.

[0012] This invention is further characterized in that guide grooves are formed on the top surface of each of the multiple sets of unlocking holes. The guide grooves ensure that the unlocking holes can smoothly cooperate with the limiting blocks during the unlocking process, avoiding jamming caused by improper operation and improving the convenience and stability of the lock operation.

[0013] This invention is further characterized in that the outer wall of the push sleeve and the inner ends of the multiple control plates are all provided with rounded corners. The rounded corner design reduces the friction between the push sleeve and the control plates, reduces the smooth sliding of the control plates caused by excessive friction, and ensures more flexible and stable flow regulation operation.

[0014] This invention is further configured such that the storage tank is equipped with a stirring mechanism, which includes a mounting frame, a motor, a rotating rod, and stirring blades. The mounting frame is mounted on the storage tank, the motor is mounted on the top surface of the mounting frame, the rotating rod is rotatably connected to the storage tank and fixedly connected to the motor output end, and multiple sets of stirring blades are mounted on the outer wall of the rotating rod. The stirring mechanism ensures the uniformity of the photoresist, avoids sedimentation and stratification, thereby ensuring consistent photoresist viscosity in each delivery and improving the precision and effect of the photolithography process.

[0015] The present invention is further configured such that the storage box is provided with a stirring mechanism, the stirring mechanism including a mounting frame, a motor, a rotating rod and stirring blades, the mounting frame is mounted on the storage box, the motor is mounted on the top surface of the mounting frame, the rotating rod is rotatably connected to the storage box and fixedly connected to the output end of the motor, and multiple sets of stirring blades are provided and mounted on the outer wall of the rotating rod.

[0016] (III) Beneficial Effects

[0017] Compared with the prior art, the present invention provides a photoresist delivery device, which has the following advantages:

[0018] 1. The conveying device can greatly improve the material precision in the photolithography process by precisely controlling the delivery volume and flow rate of photoresist. The conveying mechanism uses a pump to extract photoresist from the storage tank and stably deliver it through a rigid tube to a flexible tube. Then, it is precisely sprayed onto the designated position through a nozzle, achieving efficient and uniform delivery. The combination of rigid tube and flexible tube ensures more stable photoresist flow during the extraction process, avoiding uneven flow caused by pipe deformation or bending. This ensures that the photoresist delivered each time can be delivered to the required position according to the predetermined flow rate and direction, thereby improving the overall process precision and stability.

[0019] 2. The flow control mechanism releases the limit switch by rotating the locking sleeve, allowing multiple control boards to slide along the movable chamber and further adjust the area of ​​the flow channel. As the control board moves, it adjusts the flow channel of the photoresist, precisely controlling the flow rate of the photoresist to meet different process requirements and material properties. The cooperation of the reset spring and the limit block ensures the stability of the control board after adjustment, preventing problems such as excessive or insufficient flow due to improper operation. Finally, the locking sleeve and the limit block engage to limit the rotating sleeve, ensuring accurate and stable flow control, making the entire photoresist delivery process more reliable and flexible.

[0020] 3. The stirring mechanism ensures the uniformity and viscosity consistency of the photoresist during storage. A motor-driven rotating rod rotates, continuously stirring the photoresist in the storage tank. This prevents sedimentation or stratification that may occur after prolonged storage. By maintaining the uniformity of the photoresist, the stirring mechanism ensures consistent quality in each delivery, preventing the formation of bubbles or deposits. This is crucial for precise photolithography processes, improving not only the effectiveness of the photoresist but also the accuracy of subsequent processes, ensuring product quality stability. Attached Figure Description

[0021] Figure 1 This is a schematic diagram of the overall structure of a photoresist delivery device according to the present invention;

[0022] Figure 2 This is a schematic diagram of the installation structure of the flow control mechanism in this utility model;

[0023] Figure 3 This is a cross-sectional view of the flow control mechanism in this utility model.

[0024] Figure 4 This is a cross-sectional view of the push sleeve in this utility model;

[0025] Figure 5 This is a schematic diagram of the stirring mechanism in this utility model.

[0026] In the diagram: 1. Storage box; 2. Support base; 3. Extraction pump; 4. Extraction pipe; 5. Delivery pipe; 6. Nozzle; 7. Mounting sleeve; 8. Movable chamber; 9. Control panel; 10. Rotating sleeve; 11. Mating sleeve; 12. Screw; 13. Push sleeve; 14. Mounting ring; 15. Limiting block; 16. Movable spring; 17. Limiting groove; 18. Locking sleeve; 19. Unlocking hole; 20. Guide block; 21. Guide groove; 22. Support frame; 23. Limiting rod; 24. Limiting hole; 25. Connecting plate; 26. Return spring; 27. Guide groove; 28. Mounting frame; 29. ​​Motor; 30. Rotating rod; 31. Stirring blade. Detailed Implementation

[0027] It should be noted that, unless otherwise specified, the embodiments and features described in this application can be combined with each other. The present invention will now be described in detail with reference to the accompanying drawings and embodiments.

[0028] It should be noted that, unless otherwise specified, all technical and scientific terms used in this application have the same meaning as commonly understood by one of ordinary skill in the art to which this application pertains.

[0029] In this utility model, unless otherwise stated, the orientations used, such as "up" and "down", usually refer to the direction shown in the accompanying drawings, or to the vertical, perpendicular, or gravitational direction; similarly, for ease of understanding and description, "left" and "right" usually refer to the left and right shown in the accompanying drawings; "inner" and "outer" refer to the inner and outer contours of each component itself, but the above directional terms are not used to limit this utility model.

[0030] Please see Figures 1-5 A photoresist delivery device includes a storage box 1. A delivery mechanism is provided on one side of the storage box 1. The delivery mechanism includes a support base 2, a pump 3, a pumping pipe 4, a delivery pipe 5, a nozzle 6, and a flow control mechanism. The support base 2 is located outside the storage box. The pump 3 is mounted on the support base 2. The pumping pipe 4 is connected to the pumping end of the pump 3. The delivery pipe 5 is connected to the pumping end of the pump 3. The nozzle 6 is mounted on the top of the delivery pipe 5. The flow control mechanism is located on the pumping pipe 4 and includes a mounting sleeve 7, a movable chamber 8, a control board 9, a rotating sleeve 10, a mating sleeve 11, a screw 12, a push sleeve 13, a mounting ring 14, a limiting block 15, a movable spring 16, a limiting groove 17, a locking sleeve 18, and an unlocking hole 19. Mounting sleeve 7 is fixed on extraction tube 4. Movable chamber 8 is set inside mounting sleeve 7. Control plate 9 has multiple sets of sliding parts inside movable chamber 8. Rotating sleeve 10 rotatably connects mounting sleeve 7 and extraction tube 4. Mating sleeve 11 is installed on the inner wall of rotating sleeve 10. Screw 12 is threadedly connected to the inner side of mating sleeve 11. Push sleeve 13 is installed on the top of screw 12. Mounting ring 14 is fixed on the outer wall of rotating sleeve 10. Limiting block 15 has multiple sets of sliding parts installed on mounting ring 14. Movable spring 16 is installed at the bottom of multiple sets of limiting blocks 15 and connected to the bottom surface of mounting ring 14. Limiting groove 17 has multiple sets distributed on the bottom surface of mounting sleeve 7. Locking sleeve 18 rotates on the outer wall of connecting sleeve. Unlocking hole 19 has multiple sets distributed on the bottom surface of locking sleeve 18.

[0031] The delivery tube 5 is a flexible tube, and the extraction tube 4 is a rigid tube. The combination of rigid and flexible tubes ensures stability and flexibility in the photoresist delivery process. The rigid tube provides a fixed flow path, avoiding the impact of bending deformation on the flow rate, while the flexible tube allows for more flexible installation and adjustment to adapt to different operating requirements.

[0032] Guide blocks 20 are installed on the top surface of multiple control boards 9, and guide grooves 21 are provided in the movable chamber 8. Multiple guide grooves 21 are provided and are slidably connected to multiple sets of guide blocks 20. The cooperation between the guide blocks 20 and the guide grooves 21 ensures the smooth sliding of the control boards 9, avoids jamming, and ensures that the control boards can move accurately when adjusting the photoresist flow rate, thus ensuring the accuracy of flow control.

[0033] A support frame 22 is installed inside the mounting sleeve 7. A limiting rod 23 is installed on the bottom surface of the support frame 22. A limiting hole 24 is opened on the push sleeve 13. Both the limiting rod 23 and the limiting hole 24 are polygonal and slidably connected. The polygonal design of the limiting rod 23 and the limiting hole 24 improves the stability of the push sleeve 13, allowing it to slide precisely and fit tightly with the limiting kit. This ensures that the push sleeve 13 will not deviate during flow regulation, guaranteeing the accuracy and stability of flow control.

[0034] Multiple control boards 9 are equipped with connecting plates 25 on their top surfaces, and reset springs 26 are connected between the connecting plates 25 and the inner wall of the mounting sleeve 7. The design of the connecting plates 25 and the reset springs 26 ensures that the control boards 9 can quickly return to their original positions after the flow rate is adjusted, avoiding misadjustment of the flow rate due to improper operation, and ensuring the reliability and consistency of the photoresist flow rate control.

[0035] Each of the multiple unlocking holes 19 has a guide groove 27 on its top surface. The guide groove 27 provides a smooth movement path for the unlocking holes 19, avoiding jamming problems, improving the convenience and stability of the unlocking operation, and enabling the locking sleeve to operate smoothly when adjusting the flow rate, further ensuring the stable operation of the system.

[0036] The outer wall of the push sleeve 13 and the inner ends of the multiple control boards 9 are all provided with rounded corners. The rounded corner design reduces the friction between the push sleeve 13 and the control board 9, reduces the resistance during sliding, ensures a smoother and more stable photoresist flow adjustment process, and avoids inaccurate control caused by excessive friction.

[0037] In this embodiment, the support base 2 is located outside the storage tank, and the extraction pump 3 is installed on the support base 2. Photoresist is extracted from the storage tank through the extraction tube 4. After the extraction pump 3 is started, the photoresist enters the delivery tube 5 through the extraction tube 4, and is then transported to the nozzle 6 through the delivery tube 5. The nozzle 6 is located at the top of the delivery tube 5 and is used to spray the photoresist to a designated location, achieving precise delivery. The delivery tube 5 is a flexible tube, while the extraction tube 4 is a rigid tube. The use of a rigid tube ensures more stable photoresist flow during the extraction process, preventing bending or deformation. When it is necessary to adjust the photoresist delivery flow rate, the rotating locking sleeve 18 moves multiple unlocking slots to the bottom of multiple limiting blocks 15, releasing the contact with the multiple limiting blocks 15. Multiple reset springs 26 pull the limiting blocks 15 to move away from the limiting slots 17, releasing the limitation on the rotating sleeve 10. Subsequently, the rotating sleeve 10 is rotated... The rotating sleeve 11 rotates, and the sleeve 11 engages with the screw 12 through a threaded connection, causing the screw 12 to move along the sleeve 11. The screw 12 pushes the locking sleeve 18 to abut against the multiple control plates 9. The push sleeve 13 slides through the limiting hole 24 and the limiting rod 23, and the push sleeve 13 pushes the multiple control plates 9 to slide along the movable chamber 8. The control plates 9 slide along the guide groove 21 through the guide block 20. When the multiple control plates 9 move, they press the multiple reset springs 26 through the connecting plate 25. By adjusting the spacing between the multiple control plates 9, the area of ​​the flow channel is adjusted, thereby adjusting the flow of photoresist. After adjustment, the rotating locking sleeve 18 abuts against the limiting block 15 through the guide groove 27, which abuts against the multiple limiting blocks 15, guiding the limiting blocks 15 to the inner wall of the locking sleeve 18 to abut against it, thereby pushing the multiple limiting blocks 15 to engage in the slot, completing the limiting of the rotating sleeve 10.

[0038] Please see Figure 5 As one embodiment of the stirring mechanism: a stirring mechanism is provided on the storage tank. The stirring mechanism includes a mounting frame 28, a motor 29, a rotating rod 30, and stirring blades 31. The mounting frame 28 is installed on the storage tank, the motor 29 is installed on the top surface of the mounting frame 28, the rotating rod 30 is rotatably connected to the storage tank and fixedly connected to the output end of the motor 29, and multiple sets of stirring blades 31 are installed on the outer wall of the rotating rod 30.

[0039] More specifically, the motor 29 is fixed on the top surface of the mounting bracket 28 and connected to the output end of the motor 29 via the rotating rod 30, driving the stirring blade 31 to stir. The rotating rod 30 rotates and drives the stirring blade 31 to continuously stir in the storage tank, ensuring the viscosity and uniformity of the photoresist, thereby ensuring consistent photoresist quality each time it is delivered, without producing bubbles or deposits, and further improving the performance of the photoresist.

[0040] In summary, during the use or operation of the overall equipment: the support base 2 is located outside the storage tank, and the extraction pump 3 is installed on the support base 2. Photoresist is extracted from the storage tank through the extraction tube 4. After the extraction pump 3 is started, the photoresist enters the delivery tube 5 through the extraction tube 4, and is then transported to the nozzle 6 through the delivery tube 5. The nozzle 6 is located at the top of the delivery tube 5 and is used to spray the photoresist to a designated location, achieving precise delivery. The delivery tube 5 is a flexible tube, while the extraction tube 4 is a rigid tube. The use of a rigid tube ensures more stable photoresist flow during the extraction process, preventing bending or deformation. When it is necessary to adjust the photoresist delivery flow rate, the rotating locking sleeve 18 moves multiple unlocking slots to the bottom of multiple limiting blocks 15, releasing the contact with the multiple limiting blocks 15. Multiple reset springs 26 pull the limiting blocks 15 to move away from the limiting slots 17, releasing the limitation on the rotating sleeve 10. Then, the rotating sleeve 10 is rotated... The moving sleeve 10 drives the mating sleeve 11 to rotate. The mating sleeve 11 and the screw 12 are threaded together, so that the screw 12 moves along the mating sleeve 11. The screw 12 pushes the locking sleeve 18 to abut against the multiple control plates 9. The push sleeve 13 slides through the limiting hole 24 and the limiting rod 23. The push sleeve 13 pushes the multiple control plates 9 to slide along the movable chamber 8. The control plates 9 slide along the guide groove 21 through the guide block 20. When the multiple control plates 9 move, they squeeze the multiple reset springs 26 through the connecting plate 25. By adjusting the distance between the multiple control plates 9, the area of ​​the flow channel is adjusted, thereby adjusting the flow of photoresist. After adjustment, the rotating locking sleeve 18 abuts against the limiting block 15 through the guide groove 27 to abut against the multiple limiting blocks 15, guiding the limiting blocks 15 to the inner wall of the locking sleeve 18 to abut against it, thereby pushing the multiple limiting blocks 15 to engage in the slot, completing the limiting of the rotating sleeve 10.

[0041] The motor 29 is fixed on the top surface of the mounting bracket 28 and connected to the output end of the motor 29 via the rotating rod 30. The rotating rod 30 drives the stirring blade 31 to stir. The rotating rod 30 rotates and drives the stirring blade 31 to continuously stir in the storage tank, ensuring the viscosity and uniformity of the photoresist. This ensures that the quality of the photoresist delivered each time is consistent, and no bubbles or deposits are generated, further improving the performance of the photoresist.

[0042] Of all the solutions mentioned above, those involving the connection between two components can be selected according to the actual situation, such as welding, bolt and nut connection, bolt or screw connection, or other known connection methods, which will not be elaborated here. For all the fixed connections mentioned above, welding is preferred. Although embodiments of this utility model have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principles and spirit of this utility model. The scope of this utility model is defined by the appended claims and their equivalents.

Claims

1. A photoresist delivery apparatus comprising a storage cartridge (1), characterised in that: The storage box (1) is provided with a conveying mechanism on one side, the conveying mechanism comprises a supporting seat (2), a suction pump (3), a suction pipe (4), a conveying pipe (5), a spray head (6) and a flow control mechanism, the supporting seat (2) is arranged outside the storage box, the suction pump (3) is installed on the supporting seat (2), the suction pipe (4) is connected to the suction end of the suction pump (3), the conveying pipe (5) is connected to the output end of the suction pump (3), the spray head (6) is installed at the top end of the conveying pipe (5), the flow control mechanism is arranged on the suction pipe (4), the flow control mechanism comprises a mounting sleeve (7), a movable bin (8), a control plate (9), a rotating sleeve (10), a matching sleeve (11), a screw rod (12), a push sleeve (13), a mounting ring (14), a limiting block (15), a movable spring (16), a limiting groove (17), a locking sleeve (18) and an unlocking hole (19), the mounting sleeve (7) is fixed on the suction pipe (4), the movable bin (8) is arranged in the mounting sleeve (7), the control plate (9) is provided with a plurality of groups of sliding in the movable bin (8), the rotating sleeve (10) is rotatably connected with the mounting sleeve (7) and the suction pipe (4), the matching sleeve (11) is installed on the inner wall of the rotating sleeve (10), the screw rod (12) is threadedly connected to the inner side of the matching sleeve (11), the push sleeve (13) is installed at the top end of the screw rod (12), the mounting ring (14) is fixed on the outer wall of the rotating sleeve (10), the limiting block (15) is provided with a plurality of groups of slidingly installed on the mounting ring (14), the movable spring (16) is installed at the bottom end of the plurality of limiting blocks (15) and connected with the bottom surface of the mounting ring (14), the limiting groove (17) is provided with a plurality of groups of distributed on the bottom surface of the mounting sleeve (7), the locking sleeve (18) is rotatable on the outer wall of the connecting sleeve, and the unlocking hole (19) is provided with a plurality of groups of distributed on the bottom surface of the locking sleeve (18).

2. The photoresist delivery apparatus of claim 1, wherein: The conveying pipe (5) is arranged as a hose, and the suction pipe (4) is arranged as a hard pipe.

3. The photoresist delivery apparatus of claim 2, wherein the plurality of sets of rollers are arranged in a plurality of groups. The control plate (9) is provided with a guide block (20) on the top surface, the movable bin (8) is provided with a guide groove (21), and the guide groove (21) is provided with a plurality of groups and is respectively connected with a plurality of groups of guide blocks (20). ​ 4. The photoresist delivery apparatus of claim 3, wherein: The mounting sleeve (7) is provided with a supporting frame (22), the supporting frame (22) is provided with a limiting rod (23) on the bottom surface, the push sleeve (13) is provided with a limiting hole (24), and the limiting rod (23) and the limiting hole (24) are both polygonal and are in sliding connection.

5. The photoresist delivery apparatus of claim 4, wherein the plurality of sets of rollers are arranged in a plurality of groups. The control plate (9) is provided with a connecting plate (25) on the top surface, and a plurality of groups of connecting plates (25) and the inner wall of the mounting sleeve (7) are connected with a reset spring (26). ​ 6. The photoresist delivery apparatus of claim 5, wherein: A plurality of groups of the unlocking hole (19) are provided with a guide groove (27) on the top surface.

7. The photoresist delivery apparatus of claim 6, wherein: The push sleeve (13) is provided with a round corner on the outer wall and the inner end of a plurality of groups of control plates (9).

8. The photoresist delivery apparatus of claim 7, wherein: The storage box is provided with a stirring mechanism, which comprises a mounting frame (28), a motor (29), a rotating rod (30) and stirring blades (31), the mounting frame (28) is mounted on the storage box, the motor (29) is mounted on the top surface of the mounting frame (28), the rotating rod (30) is rotatably connected to the storage box and fixedly connected to the output end of the motor (29), and the stirring blades (31) are provided with a plurality of groups of mounting frames arranged on the outer wall of the rotating rod (30).

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