Ion beam auxiliary deposition device in FIB-SEM double-beam system

Abstract

The utility model discloses an ion beam auxiliary deposition device in an FIB-SEM double-beam system. The ion beam auxiliary deposition device comprises a working table, and a sealing box body is fixedly arranged at the top of the working table; an ion column system penetrating into the sealing box body is arranged on one side of the sealing box body, an electronic column system is arranged at the top of the sealing box body, a back plate is arranged on the back face of the sealing box body, a rotating mechanism is fixedly installed on the back plate, and an output shaft of the rotating mechanism is provided with an electric push rod and a clamping paw which are located in the sealing box body. The rotating mechanism is at least used for rotation of the electric push rod and the clamping paw, the electric push rod is at least used for linear stretching of the clamping paw, and the clamping paw is at least used for self-adaptive clamping of products. The rotating mechanism adopted by the utility model can drive the clamping paws and the product to rotate, so that the ion column system and the electronic column system can process the product more favorably, the product can be driven to move linearly by utilizing the electric push rod, and the high-efficiency processing of the product is improved.

Description

Technical Field

[0001] This utility model relates to the field of electronic product processing technology, specifically to an ion beam-assisted deposition device in a FIB-SEM dual-beam system. Background Technology

[0002] The FIB-SEM dual-beam system is a high-precision micro-nano fabrication and characterization device that combines focused ion beam (FIB) and scanning electron microscope (SEM), and is widely used in materials science, semiconductors, biology and other fields.

[0003] Dual-beam collaborative operation: Focused ion beam (FIB): Utilizes liquid metal ion sources such as gallium (Ga+) to generate a high-energy ion beam (typically 1-30 kV) for nanoscale etching, deposition, or cutting of samples. Scanning electron microscope (SEM): Employs electron beam imaging to observe sample surface morphology and processing in real time. Synchronous operation: FIB and SEM share the same sample stage, enabling simultaneous processing and imaging (GisMOS technology), supporting real-time feedback and precise control.

[0004] Because dual-beam operation is required for electronic products, the products must be able to be imaged in real time by an electron beam and etched or deposited by a focused ion beam during installation. However, current product installation structures are relatively fixed with limited range of free movement, making it difficult to effectively balance electron beam imaging and focused ion beam processing, resulting in low efficiency and quality in electronic product processing. Therefore, there is an urgent need to design an ion beam-assisted deposition device in a FIB-SEM dual-beam system to solve the above problems. Utility Model Content

[0005] The purpose of this invention is to provide an ion beam-assisted deposition device in a FIB-SEM dual-beam system to address the aforementioned shortcomings in the prior art.

[0006] To achieve the above objectives, this utility model provides the following technical solution:

[0007] An ion beam-assisted deposition apparatus in a FIB-SEM dual-beam system includes a worktable, the top of which is fixedly fitted with a sealed enclosure.

[0008] One side of the sealed enclosure is provided with an ion column system that extends into the interior of the sealed enclosure. The ion column system generates a focused ion beam, which is used at least for nanoscale etching, deposition or cutting of products.

[0009] The top of the sealed enclosure is equipped with an electron column system, which uses electron beam imaging to observe the surface morphology and processing of the product in real time.

[0010] The back of the sealed box is provided with a back plate, and a rotating mechanism is fixedly installed on the back plate. The output shaft of the rotating mechanism is provided with an electric push rod and a clamping gripper located inside the sealed box. The rotating mechanism is used for at least the rotation of the electric push rod and the clamping gripper. The electric push rod is used for at least the linear extension and retraction of the clamping gripper. The clamping gripper is used for at least the adaptive clamping of the product.

[0011] Preferably, the front of the sealed enclosure is provided with a sealing door, which is a sliding door.

[0012] Preferably, the sealing door includes a guide structure disposed on the front of the sealing box, and the front of the sealing door is provided with an observation window and a handle;

[0013] The guide structure includes a slide groove on the front of the sealed housing, and a guide strip inserted into the slide groove on the back of the sealed door.

[0014] Preferably, the rotating mechanism includes a motor base fixed to the outer wall of the back plate, and a forward and reverse motor is fixed on the motor base. A transmission shaft is connected to the output shaft of the forward and reverse motor, and a rotating frame is installed at one end of the transmission shaft.

[0015] Preferably, the electric push rod is fixedly installed inside the rotating frame, and a brush is provided on the outside of the drive shaft, the brush being electrically connected to the electric push rod.

[0016] Preferably, the gripper includes a fixed claw, an adjustable movable claw on one side of the fixed claw, a support block connected to the outer wall of one side of the movable claw, a rotating seat fixedly installed on the outer wall of one side of the fixed claw, and a screw rotatably inserted into the interior of the rotating seat. A nut is also sleeved on the outside of the screw, and the outer wall of one side of the nut is fixedly connected to the support block through a rod.

[0017] In the above technical solution, the ion beam-assisted deposition device in the FIB-SEM dual-beam system provided by this utility model has the following advantages:

[0018] (1) The rotating mechanism adopted can drive the gripper and the product to rotate, which is more conducive to the processing of the product by the ion column system and the electron column system.

[0019] (2) The electric push rod can drive the product to move in a straight line, which improves the efficiency of product processing.

[0020] (3) The gripper can be adjusted in size to adapt to different products, thus improving the practicality of the gripper. Attached Figure Description

[0021] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in this utility model. For those skilled in the art, other drawings can be obtained based on these drawings.

[0022] Figure 1 This is a schematic diagram of an angle structure for an embodiment of an ion beam-assisted deposition device in a FIB-SEM dual-beam system according to the present invention.

[0023] Figure 2 This is another schematic diagram of the structure of an embodiment of an ion beam assisted deposition device in a FIB-SEM dual-beam system according to the present invention.

[0024] Figure 3 This is a schematic diagram of the sealed box structure provided for an embodiment of an ion beam assisted deposition device in a FIB-SEM dual-beam system according to the present invention.

[0025] Figure 4 This is a schematic diagram of the rotating mechanism structure provided in an embodiment of an ion beam assisted deposition device in a FIB-SEM dual-beam system according to the present invention.

[0026] Figure 5 This is a schematic diagram of the gripper structure provided in an embodiment of an ion beam assisted deposition device in a FIB-SEM dual-beam system according to the present invention.

[0027] 1. Workbench; 2. Sealed chamber; 3. Sealed door; 31. Observation window; 32. Handle; 33. Guide structure; 4. Ion column system; 5. Electron column system; 6. Rotation mechanism; 61. Motor base; 62. Forward and reverse motor; 63. Brush; 64. Drive shaft; 65. Rotating frame; 7. Back plate; 8. Electric push rod; 9. Clamping gripper; 91. Fixed gripper; 92. Movable gripper; 93. Support block; 94. Rotating seat; 95. Screw; 96. Nut. Detailed Implementation

[0028] To enable those skilled in the art to better understand the technical solution of this utility model, the present utility model will be further described in detail below with reference to the accompanying drawings.

[0029] like Figure 1-5As shown in the embodiment of this utility model, an ion beam assisted deposition device in a FIB-SEM dual-beam system includes a worktable 1, with a sealed box 2 fixedly mounted on the top of the worktable 1; an ion column system 4 penetrating into the interior of the sealed box 2 is provided on one side of the sealed box 2, the ion column system 4 generates a focused ion beam, which is used at least for nanoscale etching, deposition, or cutting of products; an electron column system 5 is provided on the top of the sealed box 2, the electron column system 5 uses electron beam imaging to observe the surface morphology and processing of the product in real time; a back plate 7 is provided on the back of the sealed box 2, and a rotating mechanism 6 is fixedly mounted on the back plate 7; the output shaft of the rotating mechanism 6 is provided with an electric push rod 8 and a clamping gripper 9 located inside the sealed box 2; the rotating mechanism 6 is used at least for the rotation of the electric push rod 8 and the clamping gripper 9; the electric push rod 8 is used at least for the linear extension and retraction of the clamping gripper 9; and the clamping gripper 9 is used at least for adaptive clamping of the product.

[0030] In this embodiment, a workbench 1 is included, and a sealed box 2 is fixedly installed on the top of the workbench 1.

[0031] In this embodiment, an ion column system 4 penetrating into the interior of the sealed box 2 is provided on one side. The ion column system 4 generates a focused ion beam, which is used at least for nanoscale etching, deposition or cutting of products.

[0032] In this embodiment, an electron column system 5 is provided on the top of the sealed box 2. The electron column system 5 uses electron beam imaging to observe the surface morphology and processing of the product in real time.

[0033] In this embodiment, a back plate 7 is provided on the back of the sealed box 2, and a rotating mechanism 6 is fixedly installed on the back plate 7.

[0034] Specifically, the rotating mechanism 6 includes a motor base 61 fixed on the outer wall of the back plate 7, and a forward and reverse motor 62 is fixed on the motor base 61. A transmission shaft 64 is connected to the output shaft of the forward and reverse motor 62, and a rotating frame 65 is installed at one end of the transmission shaft 64. When the forward and reverse motor 62 is started, the rotating frame 65 is driven to rotate in both directions through the transmission shaft 64, thereby adjusting the angle of the product and facilitating better deposition processing of the ion beam.

[0035] In this embodiment, the output shaft of the rotating mechanism 6 is provided with an electric push rod 8 located inside the sealed housing 2. The rotating mechanism 6 is used for at least the rotation of the electric push rod 8 and the gripper 9, and the electric push rod 8 is used for at least the linear extension and retraction of the gripper 9.

[0036] Specifically, the electric push rod 8 is fixedly installed inside the rotating frame 65, and the external of the drive shaft 64 is provided with a brush 63. The brush 63 is electrically connected to the electric push rod 8. When the drive shaft 64 rotates, it can drive the electric push rod 8 to rotate synchronously. The brush 63 provides power to the electric push rod 8, ensuring that the electric push rod 8 can also move linearly when rotating, thus changing the position of the product inside the sealed box 2.

[0037] In this embodiment, the output shaft of the rotating mechanism 6 is provided with a clamping gripper 9 located inside the sealed housing 2. The clamping gripper 9 is used at least for adaptive clamping of the product.

[0038] Specifically, the gripper 9 includes a fixed gripper 91, an adjustable movable gripper 92 on one side of the fixed gripper 91, a support block 93 connected to the outer wall of one side of the movable gripper 92, and a rotating seat 94 fixedly installed on the outer wall of one side of the fixed gripper 91. A screw 95 is rotatably inserted into the interior of the rotating seat 94, and a nut 96 is sleeved on the outside of the screw 95. The outer wall of one side of the nut 96 is fixedly connected to the support block 93 via a rod. When gripping and fixing products of different specifications, the operator can rotate the screw 95 by hand, causing the screw 95 to move the nut 96. The nut 96 then moves the rod and the support block 93 synchronously, which can adjust the position of the movable gripper 92, thereby changing the distance between the movable gripper 92 and the fixed gripper 91, and stably gripping products of different specifications.

[0039] In this embodiment, a sealing door 3 is provided on the front of the sealed box 2, and the sealing door 3 is a push-pull structure.

[0040] Specifically, the sealed door 3 includes a guide structure 33 on the front of the sealed box 2. The front of the sealed door 3 is provided with an observation window 31 and a handle 32. The observation window 31 allows observation of the internal product processing status, and the handle 32 facilitates the opening and closing of the sealed door 3.

[0041] Specifically, the guide structure 33 includes a slide groove on the front of the sealed housing 2, and a guide strip inserted into the slide groove on the back of the sealed door 3. The guide strip slides inside the slide groove, thereby realizing the pushing and pulling of the sealed door 3, and also ensuring the sealing performance of the sealed door 3 to the front of the sealed housing 2.

[0042] The foregoing description only illustrates certain exemplary embodiments of the present invention. Undoubtedly, those skilled in the art can modify the described embodiments in various ways without departing from the spirit and scope of the present invention. Therefore, the above drawings and descriptions are illustrative in nature and should not be construed as limiting the scope of protection of the claims of the present invention.

Claims

1. An ion beam-assisted deposition apparatus in a FIB-SEM dual-beam system, comprising a stage (1), characterized in that, A sealed box (2) is fixedly installed on the top of the workbench (1); One side of the sealed enclosure (2) is provided with an ion column system (4) that extends into the interior of the sealed enclosure (2). The ion column system (4) generates a focused ion beam, which is used at least for nanoscale etching, deposition or cutting of products. The top of the sealed box (2) is equipped with an electron column system (5), which uses electron beam imaging to observe the surface morphology and processing of the product in real time. The back of the sealed housing (2) is provided with a back plate (7), and a rotating mechanism (6) is fixedly installed on the back plate (7). The output shaft of the rotating mechanism (6) is provided with an electric push rod (8) and a clamping gripper (9) located inside the sealed housing (2). The rotating mechanism (6) is used at least for the rotation of the electric push rod (8) and the clamping gripper (9). The electric push rod (8) is used at least for the linear extension and retraction of the clamping gripper (9). The clamping gripper (9) is used at least for the adaptive clamping of the product.

2. The ion beam-assisted deposition apparatus in a FIB-SEM dual-beam system according to claim 1, characterized in that, The front of the sealed box (2) is provided with a sealing door (3), which is a push-pull structure.

3. The ion beam-assisted deposition apparatus in a FIB-SEM dual-beam system according to claim 2, characterized in that, The sealing door (3) includes a guide structure (33) provided on the front of the sealing box (2), and the front of the sealing door (3) is provided with an observation window (31) and a handle (32); The guide structure (33) includes a groove on the front of the sealed box (2), and a guide bar inserted into the groove is provided on the back of the sealed door (3).

4. The ion beam-assisted deposition apparatus in a FIB-SEM dual-beam system according to claim 1, characterized in that, The rotating mechanism (6) includes a motor base (61) fixed on the outer wall of the back plate (7), and a forward and reverse motor (62) is fixed on the motor base (61). A transmission shaft (64) is connected to the output shaft of the forward and reverse motor (62), and a rotating frame (65) is installed at one end of the transmission shaft (64).

5. The ion beam-assisted deposition apparatus in a FIB-SEM dual-beam system according to claim 4, characterized in that, The electric push rod (8) is fixedly installed inside the rotating frame (65), and the drive shaft (64) is provided with a brush (63) on the outside, which is electrically connected to the electric push rod (8).

6. The ion beam-assisted deposition apparatus in a FIB-SEM dual-beam system according to claim 1, characterized in that, The gripper (9) includes a fixed gripper (91), an adjustable movable gripper (92) is provided on one side of the fixed gripper (91), a support block (93) is connected to the outer wall of one side of the movable gripper (92), a rotating seat (94) is fixedly installed on the outer wall of one side of the fixed gripper (91), and a screw (95) is rotatably inserted into the inside of the rotating seat (94). A nut (96) is also sleeved on the outside of the screw (95), and the outer wall of one side of the nut (96) is fixedly connected to the support block (93) through a rod.

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