Double-circulation vacuum device and semiconductor device processing equipment

Abstract

The utility model discloses a double-circulation vacuum device and semiconductor device processing equipment, the double-circulation vacuum device comprises a water tank, the water tank comprises a water outlet and a water inlet, the water outlet is close to the bottom of the water tank, and at least two water ring vacuum pumps are connected between the water outlet and the water inlet. A liquid level detection assembly used for detecting the liquid level of liquid in the water tank is arranged in the water tank. The water ring type vacuum pumps are adopted to generate negative pressure, liquid sucked in the pipeline can be directly discharged through the water ring type vacuum pumps, additional vacuum liquid discharging tanks and vacuum generators are not needed, the structure is simpler, the at least two water ring type vacuum pumps are arranged, the vacuum capacity can be improved through simultaneous work of the multiple water ring type vacuum pumps, and the working efficiency is improved. And when one water ring vacuum pump breaks down, other water ring vacuum pumps work normally, so that the redundancy of the vacuum system is improved.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor device processing, and in particular to a dual-cycle vacuum device and semiconductor device processing equipment. Background Technology

[0002] In various semiconductor processing equipment, such as dicing machines and thinning machines, vacuum adsorption is commonly used for fixing and transferring semiconductor devices. Therefore, a stable vacuum system is fundamental for reliable semiconductor device processing. Patent document CN220249680U discloses a usable vacuum pipeline.

[0003] In this structure, a vacuum generator is used to generate negative pressure. In order to solve the problem of liquid being sucked into the vacuum pipeline, an additional vacuum drain tank and vacuum generator are required to discharge the liquid sucked in during vacuuming, which increases the complexity of the structure. In addition, this method requires a gas source to cooperate with the vacuum generator to generate negative pressure, and lacks necessary redundancy measures, which poses certain risks. Utility Model Content

[0004] The purpose of this invention is to solve the above-mentioned problems in the prior art and to provide a dual-cycle vacuum device and semiconductor device processing equipment.

[0005] The objective of this utility model is achieved through the following technical solution:

[0006] A dual-circulation vacuum device includes a water tank, which has an outlet and an inlet. The outlet is located near the bottom of the water tank. At least two water ring vacuum pumps are connected between the outlet and the inlet. A liquid level detection component is installed inside the water tank to detect the liquid level inside the tank.

[0007] Preferably, in the dual-circulation vacuum device, the water tank includes two outlets and two inlets, the inlet of each water ring vacuum pump is connected to an outlet through an inlet pipe, and the outlet of each water ring vacuum pump is connected to an inlet through an outlet pipe.

[0008] Preferably, in the dual-circulation vacuum device, the water tank is provided with a baffle corresponding to the inner end of each water inlet.

[0009] Preferably, in the dual-circulation vacuum device, a temperature sensor for detecting the temperature of the liquid inside the water tank is provided at the water tank, and the tank body is also provided with a liquid replenishment port for connecting to a water source.

[0010] Preferably, in the dual-cycle vacuum device, the liquid level detection component includes a first liquid level sensor for detecting low liquid levels and a second liquid level sensor for detecting medium liquid levels.

[0011] Preferably, in the dual-circulation vacuum device, the height difference between the low liquid level and the outlet is between 110-135mm, and the height difference between the medium liquid level and the outlet is between 180-210mm.

[0012] Preferably, in the dual-cycle vacuum device, an overflow port higher than the middle liquid level is provided on the side plate of the housing, a third liquid level sensor is provided inside the housing, the liquid level detected by the third liquid level sensor is higher than the middle height of the overflow port, a drain port is also provided on the housing, and a valve body is provided at the drain port.

[0013] Preferably, in the dual-circulation vacuum device, the height difference between the overflow port and the liquid level is between 20-30 mm.

[0014] Preferably, in the dual-cycle vacuum device, the side plate of the housing is provided with an exhaust port and / or a cavitation port near the top and / or the housing is also provided with a drain port.

[0015] Semiconductor device processing equipment, including the dual-cycle vacuum device as described in any of the above.

[0016] The advantages of this utility model's technical solution are mainly reflected in:

[0017] This invention utilizes a water ring vacuum pump to generate negative pressure, enabling the direct removal of liquid drawn into the pipeline without the need for an additional vacuum drain tank and vacuum generator. This simplifies the structure. By employing at least two water ring vacuum pumps, the simultaneous operation of multiple pumps can enhance vacuum capacity. Furthermore, if one water ring vacuum pump fails, the others can continue operating normally, thus improving the redundancy of the vacuum system. Additionally, this design allows for the recycling of liquid within the tank, which helps reduce operating costs.

[0018] This invention uses a temperature sensor to detect the liquid temperature and adjusts the temperature by adding a replenishment port when the temperature is abnormal, effectively ensuring that the liquid temperature in the tank meets the working requirements of the water ring vacuum pump.

[0019] This invention features a baffle plate inside the water tank that corresponds to the water inlet, which effectively reduces the impact of liquid entering the water tank and minimizes the effect of water flow disturbance on the water circulation vacuum pump.

[0020] This invention provides an overflow port on the water tank and uses a third liquid level sensor to detect the liquid level, thereby ensuring timely detection of any abnormalities in the overflow port. When the overflow port is blocked, liquid is drained through the drain outlet to ensure the stable operation of the water ring vacuum pump. Attached Figure Description

[0021] Figure 1 This is a perspective view of the dual-circulation vacuum device of this utility model, in which the top cover of the water tank is omitted;

[0022] Figure 2 This is a cross-sectional view of the water tank of this utility model, with the top cover of the water tank omitted in the figure;

[0023] Figure 3 This is a perspective view of the water tank of this utility model with the top cover removed. Detailed Implementation

[0024] The purpose, advantages, and features of this utility model will be illustrated and explained through the following non-limiting description of preferred embodiments. These embodiments are merely typical examples of applying the technical solutions of this utility model, and all technical solutions formed by equivalent substitutions or equivalent transformations fall within the scope of protection claimed by this utility model.

[0025] In the description of the solution, it should be noted that the terms "center," "upper," "lower," "left," "right," "front," "rear," "vertical," "horizontal," "inner," and "outer," etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the accompanying drawings and are only for the convenience and simplification of description. They do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0026] Example 1

[0027] The dual-cycle vacuum device disclosed in this utility model will now be described in conjunction with the accompanying drawings, as shown below. Figure 1 As shown, it includes a water tank 100, which includes an outlet 110 and an inlet 120. The outlet 110 is located near the bottom of the water tank 100. At least two water ring vacuum pumps 200 are connected between the outlet 110 and the inlet 120. A liquid level detection component 300 for detecting the liquid level in the water tank 100 is provided inside the water tank 100.

[0028] Specifically, the water tank 100 can be a known feasible shape, preferably, as shown in the attached figure. Figure 1As shown, the water tank 100 is a rectangular box, which may include one outlet and one inlet, so that the two water ring vacuum pumps 200 are connected in parallel between the outlet and the inlet. Alternatively, the water tank may include multiple outlets and one inlet. For example, the water tank 100 includes two outlets 110 and two inlets 120. The two outlets 110 are arranged side-by-side on a narrower side plate of the water tank 100, near the bottom of the water tank 100. The two inlets 120 are also arranged side-by-side on one side of the water tank, corresponding to the positions of the water ring vacuum pumps 200 to facilitate pipe installation. There are two water ring vacuum pumps 200. The inlet 210 of each water ring vacuum pump 200 is connected to one outlet 110 through an inlet pipe (not shown in the figure), and the outlet 220 of each water ring vacuum pump 200 is connected to one inlet 120 through an outlet pipe. Furthermore, to prevent significant agitation of the liquid in the water tank 100 caused by water ingress, a baffle 400 corresponding to the inner end of each of the water inlets 120 is provided inside the water tank 100. The baffle maintains a certain distance from the inner wall of the side plate where the water inlet is located, so that when the liquid is pumped back into the water tank 100 from the water inlet 120, the ingress can be blocked by the baffle 400 to reduce the impact force of the ingress.

[0029] As attached Figure 2 As shown, the liquid level detection component 300 can be a multi-point photoelectric liquid level sensor, which can be used to detect low and medium liquid levels in the water tank 100. Alternatively, in some embodiments, the liquid level detection component 300 may include a first liquid level sensor 310 for detecting low liquid levels and a second liquid level sensor 320 for detecting medium liquid levels. The first and second liquid level sensors 310 and 320 are, for example, float level gauges. The first and second liquid level sensors are fixed to a fixing plate 340 inside the water tank, and the fixing plate has notches for installation. The height difference between the low liquid level and the outlet 110 is between 110-135 mm, and the height difference between the medium liquid level and the outlet 110 is between 180-210 mm. When the water ring vacuum is working, the liquid level in the water tank is kept at the medium level.

[0030] As attached Figure 2 Appendix Figure 3As shown, in order to improve the safety of system operation, an overflow port 130 higher than the intermediate liquid level is provided on the side plate of the water tank. The height difference between the overflow port 130 and the intermediate liquid level is between 20-30mm. In addition, the overflow port 130 can be detected in time if it is blocked. The liquid level detection component 300 also includes a third liquid level sensor 330. The third liquid level sensor 330 is also a float level gauge and is fixed on the fixed plate. The liquid level detected by the third liquid level sensor 330 is higher than the middle height of the overflow port 130. When the third liquid level sensor 330 detects that the liquid level in the water tank 100 reaches the level detected by the third liquid level sensor 330, it can be determined that the overflow port 130 may be blocked. Correspondingly, a drain port 140 is also provided on the water tank 100. The drain port 140 is located at or near the bottom of the tank. At the same time, the drain port 140 is provided with a valve body. The valve body can be an automatic valve or a manual valve. Thus, when the third liquid level sensor 330 detects that the liquid level in the water tank 100 has reached a high level, the control device can issue an alarm to remind the operator to open the valve body connected to the drain port or control the valve body connected to the drain port 140 to open automatically.

[0031] As attached Figure 3 As shown, in order to avoid the liquid temperature in the water tank 100 being too high and affecting the reliable operation of the water ring vacuum pump 200, a temperature sensor 500 for detecting the liquid temperature inside the water tank 100 is provided. The tank body is also provided with a liquid replenishment port 150 for connecting to a water source. When the temperature sensor detects that the liquid temperature in the water tank exceeds a predetermined value, such as 30°C, liquid can be replenished into the water tank through the water source connected to the liquid replenishment port 150 to reduce the temperature of the liquid inside the tank.

[0032] The side plate of the water tank is provided with an exhaust port 160 and / or a cavitation port 170 near the top.

[0033] When using the dual-cycle vacuum device, connect the water ring vacuum pump, liquid level detection component, temperature sensor, and other electronic components to the control device. Connect the air inlet of the water ring vacuum pump to the vacuum suction cup, vacuum stage, and other vacuum adsorption devices. Connect the liquid replenishment port to the water source through a pipeline. When vacuum adsorption is required, simply start the water ring vacuum pump.

[0034] Example 2

[0035] This embodiment discloses a semiconductor device processing apparatus, including a dual-cycle vacuum device as described in any of the above embodiments.

[0036] This utility model has many other embodiments. All technical solutions formed by equivalent transformation or equivalent transformation fall within the protection scope of this utility model.

Claims

1. A double cycle vacuum apparatus comprising a water tank, said water tank comprising a water outlet and a water inlet, said water outlet being proximate to the bottom of said water tank, characterized in that: At least two water ring vacuum pumps are connected between the water outlet and the water inlet, and a liquid level detection assembly for detecting the liquid level in the water tank is arranged in the water tank.

2. The dual cycle vacuum apparatus of claim 1, wherein: The water tank comprises two water outlets and two water inlets, the liquid inlet of each water ring vacuum pump is connected to one water outlet through a liquid inlet pipe, and the liquid outlet of each water ring vacuum pump is connected to one water inlet through a liquid outlet pipe.

3. The dual cycle vacuum apparatus of claim 2, wherein: A baffle corresponding to the inner end of each water inlet is arranged in the water tank.

4. The dual cycle vacuum apparatus of claim 1, wherein: A temperature sensor for detecting the temperature of the liquid in the water tank is arranged on the water tank, and a liquid supplementing port for connecting a water source is arranged on the tank.

5. The dual cycle vacuum apparatus of claim 1, wherein: The liquid level detection assembly comprises a first liquid level sensor for detecting a low liquid level and a second liquid level sensor for detecting a medium liquid level.

6. The dual cycle vacuum apparatus of claim 5, wherein: The height difference between the low liquid level and the water outlet is between 110 mm and 135 mm, and the height difference between the medium liquid level and the water outlet is between 180 mm and 210 mm.

7. The dual cycle vacuum apparatus of claim 1, wherein: An overflow port higher than the medium liquid level is arranged on the side plate of the tank, a third liquid level sensor is arranged in the tank, the detection liquid level of the third liquid level sensor is higher than the middle height of the overflow port, a drain port is further arranged on the tank, and a valve body is arranged at the drain port.

8. The dual cycle vacuum apparatus of claim 7, wherein: The height difference between the overflow port and the medium liquid level is between 20 mm and 30 mm.

9. The dual cycle vacuum apparatus of any of claims 1-8, wherein: An air outlet and / or a cavitation port close to the top of the tank are arranged on the side plate of the tank.

10. A semiconductor device processing apparatus, characterized by: The double-circulation vacuum device comprises the double-circulation vacuum device according to any one of claims 1-9.

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