Transparent conductive glass and perovskite thin film battery assembly

Abstract

The utility model discloses transparent conductive glass and a perovskite thin film battery assembly. The transparent conductive glass comprises a transparent substrate, the transparent substrate is provided with a first surface and a second surface which are opposite, and a first direction and a second direction which are perpendicular to each other, a plurality of grooves extending in the second direction are formed in the second surface in parallel, and diffuse reflection patterns are arranged at the bottoms of the grooves; and the transparent conducting layer is stacked on the non-groove area on the second surface and stacked on the bottom and at least one side wall of the groove so as to form a continuous or discontinuous transparent conducting layer structure in the first direction. When the transparent conductive glass disclosed by the utility model is used for manufacturing a perovskite thin film battery assembly, the laser scribing passes can be obviously reduced, so that the process is simplified, and the ablation damage to the perovskite thin film battery caused by multiple laser scribing is avoided, thereby reducing the dead zone area; the stability and the power generation efficiency of the assembly are improved; and the service life of the assembly is prolonged.

Description

Technical Field

[0001] This utility model relates to the field of solar cell module technology, specifically to a transparent conductive glass and perovskite thin film battery module. Background Technology

[0002] Currently, the manufacturing process of large-area perovskite thin-film solar cell modules generally employs four laser scribing processes (P1, P2, P3, and P4) to divide the large-area perovskite thin-film solar cell into several perovskite sub-cells connected in series, thereby producing a large-area perovskite module.

[0003] However, laser scribing can cause some damage to perovskite thin-film solar cells (i.e., laser scribing can ablate the perovskite thin-film solar cells, thus causing damage), resulting in a loss of efficiency of the perovskite thin-film solar cell module. Moreover, the multiple laser scribing processes (P1, P2, P3, P4) not only increase the difficulty and cost of the process, but also significantly reduce the efficiency of perovskite thin-film solar cells by creating dead zones in the P1, P2, P3 laser scribing process and the safe zones between P1-P2 and P2-P3. Utility Model Content

[0004] The purpose of this invention is to address the problems of reduced module efficiency, increased manufacturing difficulty, and higher costs associated with the multiple laser scribing processes used in the current large-area perovskite thin-film battery module manufacturing process. A transparent conductive glass has been designed to significantly reduce the number of laser scribing passes when using this glass to manufacture thin-film battery modules. This simplifies the process, avoids the ablation damage to the perovskite thin-film battery caused by multiple laser scribing passes, reduces the dead zone area, improves module stability and power generation efficiency, and extends the module's lifespan, effectively solving the aforementioned problems.

[0005] To achieve the above objectives, this utility model is implemented through the following technical solution:

[0006] This utility model designs a transparent conductive glass, which includes:

[0007] A transparent substrate has a first surface and a second surface opposite to each other, and a first direction and a second direction perpendicular to each other. A plurality of grooves extending along the second direction are arranged parallel to each other on the second surface, and the bottom of the grooves is provided with a diffuse reflection pattern.

[0008] A transparent conductive layer is stacked on the non-groove area of ​​the second surface and stacked on the bottom of the groove and at least one sidewall of the groove to form a continuous or discontinuous transparent conductive layer structure in the first direction (specifically, if a transparent conductive layer is provided on the bottom of the groove and on both opposite sidewalls of the groove in the first direction, the transparent conductive layer formed is a continuous structure; if a transparent conductive layer is provided on the bottom of the groove and on one of the sidewalls, the transparent conductive layer formed is a discontinuous structure).

[0009] Furthermore, a transparent conductive glass: the transparent conductive glass further includes an anti-reflective layer stacked on the first surface.

[0010] Furthermore, a transparent conductive glass: the depth of the groove is set to 10.0 to 1000.0 μm.

[0011] Furthermore, in a transparent conductive glass, the width of the groove in the first direction is set to 50.0–150.0 μm.

[0012] The manufacturing method of transparent conductive glass includes the following steps:

[0013] S1. Provide a transparent substrate;

[0014] Specifically, the raw materials required for preparing the transparent substrate (including silicon dioxide, calcium oxide, sodium oxide, magnesium oxide, aluminum oxide, etc.) are provided, the raw materials are mixed and melted to form a glass melt, the glass melt is then cooled and pressed to obtain the transparent substrate.

[0015] S2. A plurality of grooves arranged in parallel along the first direction and extending along the second direction are rolled out on the second surface of the transparent substrate by a roll forming process.

[0016] S3. A diffuse reflection pattern is formed at the bottom of the groove (the diffuse reflection pattern can be formed at the bottom of the groove by chemical etching);

[0017] S4. Using magnetron sputtering, ITO, FTO, or AZO material is deposited on the non-groove area of ​​the second surface, the bottom of the groove, and at least one sidewall of the groove to form a continuous or discontinuous transparent conductive layer in the first direction (depositing the above material on two opposite sidewalls of the groove can form a continuous transparent conductive layer in the first direction, while depositing the above material on only one sidewall of the groove can form a discontinuous transparent conductive layer in the first direction), thereby producing transparent conductive glass.

[0018] This utility model also provides a perovskite thin-film battery module, which includes the following structure:

[0019] The aforementioned transparent conductive glass;

[0020] A first transmission layer is stacked on the transparent conductive layer of the transparent conductive glass;

[0021] A perovskite solar cell layer is stacked on the first transport layer;

[0022] A second transmission layer is stacked on the perovskite solar cell layer;

[0023] A back electrode, which is stacked on the second transmission layer;

[0024] A plurality of first insulating gates are vertically disposed in the first transport layer, the perovskite cell layer and the second transport layer, and separate the first transport layer, the perovskite cell layer and the second transport layer in a first direction. One end of the first insulating gate extends into the groove and contacts the transparent conductive layer at the bottom of the groove. The first insulating gate also directly contacts one sidewall of the groove (that is, there is no transparent conductive layer on the sidewall of the groove that directly contacts the first insulating gate, while the other sidewall of the groove opposite to the first insulating gate is provided with a transparent conductive layer at this time), so as to separate the continuous transparent conductive layer in the first direction. The other end of the first insulating gate contacts the back electrode.

[0025] A plurality of second insulating gates are vertically disposed in the first transport layer, the perovskite cell layer, the second transport layer and the back electrode and separate the four in a first direction. One end of the second insulating gate extends into the groove and contacts the transparent conductive layer at the bottom of the groove. The back electrode extends into the gap between the first insulating gate and the second insulating gate and contacts the transparent conductive layer at the bottom of the groove.

[0026] An encapsulation layer is stacked on the back electrode, and one end of the second insulating gate away from the groove is in contact with the encapsulation layer;

[0027] The back glass is stacked on the encapsulation layer;

[0028] And a sealant, which is circumferentially disposed between the transparent conductive glass and the back glass, surrounding the first transport layer, the perovskite cell layer, the second transport layer and the back electrode.

[0029] Furthermore, in a perovskite thin-film battery assembly, the widths of the first insulating gate and the second insulating gate in the first direction are respectively set to 100.0~1000.0 nm.

[0030] Furthermore, a perovskite thin-film battery module: the first insulating grid and the second insulating grid are respectively made of metal oxide, nitride or fluoride insulating materials.

[0031] Specifically, the transparent conductive glass of this invention utilizes a laser to sequentially scribe each functional layer (first transmission layer, perovskite cell layer, and second transmission layer) along one side wall of a groove to form a laser scribe line, which serves to separate the transparent conductive layer (i.e., transparent electrode) from the functional layers. Simultaneously, insulating grids (first insulating grid and second insulating grid) are set at the opposite cut surfaces in the laser scribe line to insulate and encapsulate the exposed cross-section at the laser scribe line position. Finally, the extension of the back electrode forms an electrical connection with the transparent conductive layer exposed at the laser scribe line in the groove, thus completing the series connection between the sub-perovskite cells.

[0032] The beneficial effects of this utility model are:

[0033] (1) This utility model designs a transparent conductive glass that can significantly reduce the number of laser scribing passes when used to manufacture perovskite thin-film battery modules (only one laser scribing process is required). This not only simplifies the process but also avoids the ablation damage to the perovskite thin-film battery caused by multiple laser scribing passes, thereby reducing the dead area, improving the stability and power generation efficiency of the module, and extending the service life of the module.

[0034] (2) The transparent conductive glass designed in this utility model has multiple spaced grooves on the glass and a diffuse reflection pattern structure at the bottom of the grooves. The diffuse reflection pattern and height difference in the grooves can reuse the light in the dead zone, thereby improving the efficiency of the component. At the same time, the height difference of the grooves can be used to break the transparent conductive layer, eliminating the need for laser scribing to break the transparent conductive layer in the traditional process. Therefore, a laser scribing process can be reduced, which simplifies the process, saves costs, and avoids the laser scribing from ablating the functional layer and affecting the battery efficiency.

[0035] (3) In the perovskite thin-film battery module of this utility model, the laser scribing is located in the groove. By setting the diffuse reflection pattern structure at the bottom of the groove, the reflection of light at the laser scribing (dead zone) position is increased, thereby effectively improving the utilization rate of incident light, thereby enabling the perovskite battery layer to generate more charge, thereby increasing the short-circuit current of the perovskite battery, and thus effectively improving the photoelectric conversion efficiency of the perovskite thin-film battery module.

[0036] (4) The perovskite thin-film battery module assembled with transparent conductive glass designed in this utility model can be manufactured using only one laser scribing process, which can significantly reduce the thermal impact and dead zone of multiple laser scribing processes, resulting in good stability, small dead zone and high photoelectric conversion efficiency of the module. Attached Figure Description

[0037] To more clearly illustrate the technical solutions of the embodiments of this utility model, the drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0038] Figure 1 A schematic diagram of the structure of a transparent conductive glass designed for Embodiment 1 of this utility model;

[0039] Figure 2 for Figure 1 Cross-sectional view;

[0040] Figure 3 A cross-sectional view of a transparent conductive glass designed for Embodiment 2 of this utility model;

[0041] Figure 4 This is a schematic diagram of the structure of a perovskite thin-film battery module provided in Embodiment 3 of this utility model;

[0042] Figure 5 A process flow diagram of step S2 in the method for fabricating a perovskite thin-film battery module;

[0043] Figure 6 A process flow diagram of step S3 in the method for fabricating a perovskite thin-film battery module;

[0044] Figure 7 A process flow diagram of step S4 in the method for fabricating a perovskite thin-film battery module;

[0045] Figure 8 The process flow diagram for step S5 of the method for fabricating a perovskite thin-film battery module.

[0046] The markings in the diagram are: 1-transparent substrate, 2-transparent conductive layer, 3-antireflective layer, 4-first transmission layer, 5-perovskite cell layer, 6-second transmission layer, 7-back electrode, 8-first insulating gate, 9-second insulating gate, 10-encapsulation layer, 11-first surface, 12-second surface, 13-groove, 14-diffuse reflection pattern, 15-non-groove area, 16-back glass, 17-sealant, 18-laser scribing. Detailed Implementation

[0047] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. The following description of at least one exemplary embodiment is merely illustrative and is in no way intended to limit the present utility model or its application or use. All other embodiments obtained by those skilled in the art based on the embodiments of the present utility model without creative effort are within the scope of protection of the present utility model.

[0048] In the description of this utility model, it should be understood that the terms "upper," "lower," "left," "right," "top," and "bottom," etc., indicating orientation or positional relationships, are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model. Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, features defined with "first" and "second" may explicitly or implicitly include one or more of that feature. Moreover, the terms "first," "second," etc., are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be interchanged where appropriate so that embodiments of this utility model described herein can be implemented in orders other than those illustrated or described herein.

[0049] Example 1

[0050] like Figures 1-2 As shown, this embodiment 1 provides a transparent conductive glass, which includes:

[0051] A transparent substrate 1 has a first surface 11 and a second surface 12 opposite to each other and a first direction and a second direction perpendicular to each other. A plurality of grooves 13 extending along the second direction are arranged parallel to each other on the second surface 12, and a diffuse reflection pattern 14 is also provided at the bottom of the grooves 13. An anti-reflection layer 3 is also stacked on the first surface 11. The depth of the grooves 13 is set to 10.0 to 1000.0 μm, and the width of the grooves 13 in the first direction is set to 50.0 to 150.0 μm.

[0052] A transparent conductive layer 2 is stacked on the non-groove area 15 on the second surface 12 and on the bottom of the groove 13 and the two sidewalls opposite to the groove 13, to form a continuous transparent conductive layer 2 structure in the first direction.

[0053] The diffuse reflection pattern 14 at the bottom of the groove 13 in the transparent conductive glass of Example 1 can effectively improve the utilization rate of incident light in the dead zone, enabling the perovskite cell layer to generate more charge, thereby increasing the short-circuit current of the perovskite thin film cell and effectively improving the photoelectric conversion efficiency of the perovskite thin film cell module.

[0054] The method for manufacturing the transparent conductive glass in Embodiment 1 above includes the following steps:

[0055] S1. Provide a transparent substrate 1;

[0056] Specifically, the raw materials required for preparing the transparent substrate 1 (including silicon dioxide, calcium oxide, sodium oxide, magnesium oxide, aluminum oxide, etc.) are provided. The raw materials are mixed and melted to form a glass melt. The glass melt is then poured into a mold or rolling mill and pressed to obtain a transparent substrate. The transparent substrate is extruded through a mold design structure or an upper and lower roller design structure to form a transparent substrate with grooves 13. Then, it is annealed in an annealing furnace. After cutting, a number of grooves 13 are rolled out on the second surface 12 of the transparent substrate 1, which are arranged parallel to the first direction and extend along the second direction. Diffuse reflection patterns 14 are rolled out at the bottom of the grooves 13, or diffuse reflection patterns 14 are formed at the bottom of the grooves 13 by chemical etching process.

[0057] S2. Using magnetron sputtering, ITO material is deposited in the non-recessed area 15 of the second surface 12, the bottom of the recess 13, and the two opposing sidewalls in the recess 13, thereby forming a continuous transparent conductive layer 2 in the first direction (e.g., Figure 1 The groove 13 shown has a transparent conductive layer 2 on each of its two sidewalls facing each other in the first direction, and an anti-reflection layer 3 is prepared on the first surface 11 to obtain transparent conductive glass.

[0058] Example 2

[0059] like Figure 3 As shown, this embodiment 2 provides a transparent conductive glass, which includes:

[0060] A transparent substrate 1 has a first surface 11 and a second surface 12 opposite to each other and a first direction and a second direction perpendicular to each other. A plurality of grooves 13 extending along the second direction are arranged parallel to each other on the second surface 12, and a diffuse reflection pattern 14 is also provided at the bottom of the grooves 13. An anti-reflection layer 3 is also stacked on the first surface 11. The depth of the grooves 13 is set to 10.0 to 1000.0 μm, and the width of the grooves 13 in the first direction is set to 50.0 to 150.0 μm.

[0061] A transparent conductive layer 2 is stacked on the non-groove area 15 on the second surface 12 and on the bottom of the groove 13 and one sidewall of the groove 13 (the other sidewall does not have the transparent conductive layer 2), to form a structure of transparent conductive layer 2 that is discontinuous in the first direction.

[0062] The method for manufacturing the transparent conductive glass in Example 2 above includes the following steps:

[0063] S1. Provide a transparent substrate 1;

[0064] Specifically, the raw materials required for preparing the transparent substrate 1 (including silicon dioxide, calcium oxide, sodium oxide, magnesium oxide, aluminum oxide, etc.) are provided. The raw materials are mixed and melted to form a glass melt. The glass melt is then poured into a mold or rolling mill and pressed to obtain a transparent substrate. The transparent substrate is extruded through a mold design structure or an upper and lower roller design structure to form a transparent substrate with grooves 13. Then, it is annealed in an annealing furnace. After cutting, a number of grooves 13 are rolled out on the second surface 12 of the transparent substrate 1, which are arranged parallel to the first direction and extend along the second direction. Diffuse reflection patterns 14 are rolled out at the bottom of the grooves 13, or diffuse reflection patterns 14 are formed at the bottom of the grooves 13 by chemical etching process.

[0065] S2. ITO material is deposited on the non-groove area 15 of the second surface 12, the bottom of the groove 13, and one sidewall of the groove 13 using a magnetron sputtering process, thereby forming a discontinuous transparent conductive layer 2 in the first direction, and an anti-reflection layer 3 is prepared on the first surface 11 to obtain transparent conductive glass.

[0066] Example 3

[0067] like Figure 4 As shown, this embodiment 3 provides a perovskite thin-film battery module, which includes the following structure:

[0068] Transparent conductive glass of Example 1;

[0069] The first transmission layer 4 is stacked on the transparent conductive layer 2 of the transparent conductive glass;

[0070] The perovskite solar cell layer 5 is stacked on the first transmission layer 4;

[0071] The second transmission layer 6 is stacked on the perovskite solar cell layer 5;

[0072] Back electrode 7 is stacked on the second transmission layer 6;

[0073] A plurality of first insulating gates 8 are vertically disposed in the first transport layer 4, the perovskite cell layer 5 and the second transport layer 6, and in the first direction, the first transport layer 4, the perovskite cell layer 5 and the second transport layer 6 are separated. One end of the first insulating gate 8 extends into the groove 13 and contacts the transparent conductive layer 2 at the bottom of the groove 13. The first insulating gate 8 is also in direct contact with one sidewall of the groove 13 (since the transparent conductive layer 2 is disposed on both sidewalls of the groove 13 of the transparent conductive glass in Embodiment 1, it is necessary to remove the transparent conductive layer 2 on one sidewall to form a structure in which the first insulating gate 8 is in direct contact with the sidewall of the groove 13). The first insulating gate 8 is used to separate the continuous transparent conductive layer 2. The other end of the first insulating gate 8 is in contact with the back electrode 7. The width of the first insulating gate 8 in the first direction is set to 100.0~1000.0 nm.

[0074] A plurality of second insulating gates 9 are vertically disposed in the first transport layer 4, the perovskite cell layer 5, the second transport layer 6 and the back electrode 7, and separate the above four layers in a first direction. One end of the second insulating gate 9 extends into the groove 13 and contacts the transparent conductive layer 2 at the bottom of the groove 13. The back electrode 7 extends into the gap between the first insulating gate 8 and the second insulating gate 9 and contacts the transparent conductive layer 2 at the bottom of the groove 13. The width of the second insulating gate 9 in the first direction is set to 100.0 to 1000.0 nm.

[0075] An encapsulation layer 10 is stacked on the back electrode 7, and one end of the second insulating gate 9 away from the groove 13 is in contact with the encapsulation layer 10.

[0076] Back glass 16 is stacked on the encapsulation layer 10;

[0077] And sealant 17, which is circumferentially disposed between transparent conductive glass and back glass 16, surrounding the first transport layer 4, perovskite cell layer 5, second transport layer 6 and back electrode 7.

[0078] The fabrication method of the perovskite thin-film battery module in Example 3 above includes the following specific steps:

[0079] S1. Provide the transparent conductive glass of Example 1;

[0080] S2. The first transport layer 4, the perovskite cell layer 5, and the second transport layer 6 are sequentially deposited or coated on the transparent conductive layer 2 of the transparent conductive glass, as follows: Figure 5 As shown;

[0081] S3. Perform laser scribing at an angle perpendicular to the second transmission layer 6 and close to one sidewall of the groove 13 to form a laser scribe line 18 that cuts through the second transmission layer 6, the perovskite solar cell layer 5, and the first transmission layer 4, but does not cut through the transparent conductive layer 2 at the bottom of the groove 13. The width of the laser scribe line 18 is smaller than the width of the groove 13. Figure 6 As shown;

[0082] Since the laser scribing is close to the side wall of the groove 13, the laser can remove the transparent conductive layer 2 originally provided on the side wall of the groove 13, so that the originally continuous transparent conductive layer 2 in the transparent conductive glass of Example 1 becomes a discontinuous transparent conductive layer 2, and the break point of the transparent conductive layer 2 is the side wall of the groove 13.

[0083] S4. Using a mask according to the design, the area outside the laser scribing 18 is masked. Then, a parallel first insulating gate 8 and a second insulating gate 9 are formed on two opposite sidewalls in the first direction (i.e., the width direction of the laser scribing 18) of the laser scribing 18 by chemical deposition. One end of the first insulating gate 8 contacts the transparent conductive layer 2 at the bottom of the groove 13, and the other end extends to be flush with the surface of the second transmission layer 6. One end of the second insulating gate 9 also contacts the transparent conductive layer 2 at the bottom of the groove 13, and the other end extends above the surface of the second transmission layer 6. Figure 7 As shown;

[0084] S5. Using a mask according to the design, one end of the second insulating gate 9 that is higher than the surface of the second transmission layer 6 is masked, and then a back electrode 7 is deposited on the second transmission layer 6, as shown. Figure 8 As shown;

[0085] S6. After the positive and negative leads of the component are made, the encapsulation layer 10, the sealant 17 and the back glass 16 are sequentially laid on the back electrode 7, and then the component is put into a laminator for lamination. After lamination, the perovskite thin film battery component is obtained.

[0086] The above-described preferred embodiments of this utility model are for illustrative purposes only and are not intended to limit the scope of this utility model. Any obvious variations or modifications derived from the technical solutions of this utility model are still within the protection scope of this utility model.

Claims

1. A transparent conductive glass, characterized by, The transparent conductive glass comprises: a transparent substrate (1) having opposite first and second surfaces (11, 12) and having mutually perpendicular first and second directions, the second surface (12) having a plurality of grooves (13) extending in the second direction arranged in parallel thereon, the bottoms of the grooves (13) being provided with diffuse reflection patterns (14); a transparent conductive layer (2) being laminated on the non-groove area (15) of the second surface (12) and on the bottoms and at least one side wall of the grooves (13) to form a continuous or discontinuous transparent conductive layer (2) structure in the first direction.

2. The transparent conductive glass according to claim 1, wherein The transparent conductive glass further comprises an anti-reflection layer (3) laminated on the first surface (11).

3. The transparent conductive glass according to claim 1, wherein The depth of the grooves (13) is set to 10.0-1000.0 μm.

4. The transparent conductive glass according to claim 1, wherein The width of the grooves (13) in the first direction is set to 50.0-150.0 μm.

5. A perovskite thin film cell assembly characterized by, comprises the following structure: the transparent conductive glass according to any one of claims 1-4; a first transport layer (4) laminated on the transparent conductive layer (2); a perovskite cell layer (5) laminated on the first transport layer (4); a second transport layer (6) laminated on the perovskite cell layer (5); a back electrode (7) laminated on the second transport layer (6); a plurality of first insulating gates (8) vertically arranged in the first transport layer (4), the perovskite cell layer (5) and the second transport layer (6) and separating the three in the first direction, one end of the first insulating gate (8) extending into the groove (13) and being in contact with the transparent conductive layer (2) at the bottom of the groove (13), the first insulating gate (8) also being in direct contact with one side wall of the groove (13) to separate the continuous transparent conductive layer (2), the other end of the first insulating gate (8) being in contact with the back electrode (7); a plurality of second insulating gates (9) vertically arranged in the first transport layer (4), the perovskite cell layer (5), the second transport layer (6) and the back electrode (7) and separating the four in the first direction, one end of the second insulating gate (9) extending into the groove (13) and being in contact with the transparent conductive layer (2) at the bottom of the groove (13), the back electrode (7) extending into the gap between the first insulating gate (8) and the second insulating gate (9) and being in contact with the transparent conductive layer (2) at the bottom of the groove (13); an encapsulation layer (10) laminated on the back electrode (7), the end of the second insulating gate (9) away from the groove (13) being in contact with the encapsulation layer (10); a back glass (16) laminated on the encapsulation layer (10); and a sealant (17) arranged between the transparent conductive glass and the back glass (16) around the periphery of the first transport layer (4), the perovskite cell layer (5), the second transport layer (6) and the back electrode (7).

6. A perovskite thin film cell assembly according to claim 5, wherein, The widths of the first and second insulating gates (8, 9) in the first direction are set to 100.0-1000.0 nm, respectively.

7. A perovskite thin film cell assembly according to claim 5 or 6, wherein, The first and second insulated gates (8, 9) are made of an insulating material of the metal oxide, nitride or fluoride type.

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