Electrochromic device

Abstract

The utility model discloses an electrochromic device. The electrochromic device comprises a substrate; the first ITO layer, the electrochromic film layer and the second ITO layer are sequentially stacked on the substrate; the atomic layer deposition film layer covers the second ITO layer; the optical module is attached to the atomic layer deposition film layer through an optical transparent adhesive tape or optical transparent resin; through the laminated structure of the substrate, the ITO, the EC film, the ITO and the ALD, and in combination with the OCA / OCR laminated optical module, the light and thin and curved surface adaptation of the inorganic all-solid-state EC is realized.

Description

Technical Field

[0001] This invention relates to the field of electrochromic devices, and more particularly to an electrochromic device. Background Technology

[0002] In existing technologies, organic EC solutions, represented by liquid crystal ECs, can be adapted to curved AR / XR optical modules. However, user feedback indicates that external pressure on the lens surface can easily cause water ripples and irreversible defects, affecting the viewing area and posing certain safety issues. Furthermore, the transmittance range is narrow, with a minimum transmittance of only 20%, failing to completely block ultraviolet and visible light. The high transmittance is only 70%, unable to achieve the 80%-90% high transmittance effect. Additionally, the resolution, haze, and high transmittance issues of organic substrates also affect the ultra-high optical parameter requirements of AR / XR optical lenses. Traditional inorganic all-solid-state EC solutions are more suitable for AR / XR waveguide optical module integration, offering a wide transmittance adjustment range of 1%-80%. Both the substrate and film layers are made of inorganic materials, resulting in a longer lifespan and advantages in wear resistance, scratch resistance, and pressure resistance. However, the disadvantages include limitations due to process temperature, inability to use flexible substrates, and the high cost of planar or curved glass substrates, making them less competitive in terms of order cycle and cost. How to adapt inorganic all-solid-state ECs on glass substrates to AR / XR products with complex curved surfaces is a common pain point in the industry. Summary of the Invention

[0003] This invention addresses the shortcomings of existing inorganic all-solid-state electrochromic devices based on glass substrates, which cannot be adapted to complex curved surfaces, by providing an electrochromic device.

[0004] To solve the above-mentioned technical problems, the present invention provides the following technical solution: an electrochromic device, comprising: a substrate;

[0005] The first ITO layer, the electrochromic film layer, and the second ITO layer are sequentially stacked on the substrate.

[0006] An atomic layer deposition film covering the second ITO layer;

[0007] An optical module, wherein the optical module is bonded to an atomic layer deposition film by an optically transparent adhesive or an optically transparent resin;

[0008] By adopting the above technical solutions, based on the inorganic all-solid-state EC solution, surface modification and substrate optimization are used on the glass substrate to design an ultra-thin EC structure. Combined with the structural optimization of curved optical devices, the goal of adapting to curved surfaces is achieved, thereby providing a better solution for the industry. Through the stacked structure of substrate, ITO, EC film, ITO, and ALD, combined with OCA / OCR bonding optical modules, the thinness and curved surface adaptation of inorganic all-solid-state EC are realized.

[0009] The present invention is further configured such that: the two sides of the optical module are double-plane, double-convex, double-concave, plano-convex, or plano-concave;

[0010] When the optical module is convex or concave on the side facing the atomic layer deposition film, the optical module and the atomic layer deposition film are bonded together with optically transparent resin.

[0011] When the optical module is planar facing the side of the atomic layer deposition film, the optical module and the atomic layer deposition film are bonded together with optically transparent adhesive.

[0012] By adopting the above technical solutions, the pain point that traditional inorganic ECs cannot adapt to curved surface modules is solved.

[0013] The present invention is further configured such that: the substrate material is ultrathin flexible glass, and the thickness of the substrate is not greater than 0.25 mm.

[0014] By adopting the above technical solutions, the use of ultra-thin flexible glass makes the electrochromic device thinner and more durable.

[0015] The present invention is further configured such that: the thickness of the substrate is less than 0.15 mm, the thickness of the optically transparent adhesive or optically transparent resin is less than 0.1 mm, and the total thickness of the substrate, the first ITO layer, the electrochromic film layer, the second ITO layer and the atomic layer deposition film layer is not greater than 0.28 mm.

[0016] By adopting the above technical solution, the total thickness of the UTG substrate (≤0.15mm) and the ultra-thin adhesive layer (≤0.1mm) is ≤0.28mm, which meets the thin and light requirements of AR / XR devices.

[0017] The present invention is further configured such that the electrochromic film layer is an inorganic metal oxide film layer.

[0018] The present invention is further configured such that the atomic layer deposition film is made of silicon dioxide and / or aluminum oxide.

[0019] By adopting the above technical solutions, inorganic metal oxide EC films (such as WO3 / NiO) and ALD films (SiO2 / Al2O3) ensure high transmittance, wide adjustment range (1%-80%) and long-term stability.

[0020] The present invention is further configured such that: a first ITO layer, an electrochromic film layer and a second ITO layer are sequentially deposited on the substrate by physical vapor deposition;

[0021] The present invention is further configured such that a nanoscale atomic layer deposition film is deposited on the second ITO layer by chemical vapor deposition technology.

[0022] The present invention is further configured such that: the optically transparent resin is a UV-curable or thermosetting resin, used to fill the gap and maintain optical transparency when the optical module is bonded to the electrochromic device.

[0023] By adopting the above technical solutions, the PVD+ALD process achieves an ultra-thin EC structure, and the OCR UV / thermal curing process is adapted to curved surface bonding, improving the feasibility of mass production.

[0024] The present invention has significant technical effects due to the adoption of the above technical solutions: the substrate is thinned, ultra-thin flexible glass (UTG, ≤0.25mm) is used, and ALD film layer is used to replace the traditional cover plate packaging, which significantly reduces the device thickness (≤0.28mm) and weight (≤1.6g).

[0025] Curved surface adaptation: It uses OCR (Optically Transparent Resin) to bond curved optical modules, replacing OCA (Optically Transparent Adhesive) which is only applicable to flat surfaces, and supports complex curved surface designs such as double convex and double concave surfaces.

[0026] High-performance packaging utilizes ALD technology to deposit nanoscale silica / alumina films, achieving water and oxygen isolation and improving device lifespan and optical transmittance (high transmittance reaches 80%-90%). Attached Figure Description

[0027] Figure 1 It is an electrochromic device that uses a dual-plane optical module;

[0028] Figure 2 It is an electrochromic device that uses a dual-convex optical module;

[0029] Figure 3 It is an electrochromic device that uses a dual-concave optical module;

[0030] Figure 4 It is an electrochromic device that uses a plano-convex optical module;

[0031] Figure 5 It is an electrochromic device that uses a plano-concave optical module.

[0032] The parts referred to by the numbers in the above figures are as follows: 1. Substrate; 2. First ITO layer; 3. Electrochromic film layer; 4. Second ITO layer; 5. Atomic layer deposition film layer; 6. Optical module; 7. Optical transparent adhesive; 8. Optical transparent resin. Detailed Implementation

[0033] The present invention will now be described in further detail with reference to the accompanying drawings and embodiments.

[0034] Example:

[0035] An electrochromic device comprises, in sequence, a substrate 1, a first ITO layer 2, an electrochromic film layer 3, a second ITO layer 4, an atomic layer deposition film layer, and an optical module 6. The first ITO layer 2, the electrochromic film layer 3, and the second ITO layer 4 are sequentially deposited on the substrate 1 by physical vapor deposition. An atomic layer deposition film layer 5 is covered on the second ITO layer 4 by chemical vapor deposition. The optical module 6 is bonded to the atomic layer deposition film layer 5 by optically transparent adhesive 7 or optically transparent resin 8.

[0036] Atomic deposition film is a chemical vapor deposition (CVD) technique for precisely controlling film thickness. It involves alternating supply of reactive precursors to perform a layer-by-layer self-limiting chemical reaction on the substrate surface, depositing uniform and dense films with nanoscale precision.

[0037] Optical Clear Adhesive 7 (OCA) is a highly transparent optical adhesive primarily used for bonding displays, touch panels, or optical components to ensure that optical performance is not compromised.

[0038] Optical transparent resin 8 (OCR) is a liquid optically transparent resin 8 that is commonly used for liquid dispensing encapsulation. After curing under ultraviolet light or heat, it forms a highly transparent adhesive layer. Compared with OCA, OCR is suitable for bonding to more complex curved or irregular surfaces.

[0039] Electrochromic film layer 3 refers to the property of materials to undergo reversible color changes under the action of an external electric field. Electrochromic materials (such as WO3, NiO, Prussian Blue, etc.) can change light absorption characteristics by injecting or removing ions to achieve dynamic adjustment of transparency or color.

[0040] Indium Tin Oxide (ITO) is a transparent conductive oxide (TCO) widely used in touchscreens, electrochromic devices, and transparent electrodes. It is characterized by high light transmittance (>85%) and low resistivity (typically below 10). -4 (Ω·cm level).

[0041] The optical module 6 uses an AR / XR waveguide sheet. The two sides of the optical module 6 are either flat or curved, and the curved surfaces include convex and concave surfaces. Thus, the two sides of the optical module 6 can be arranged and combined to adopt a double-plane, double-convex, double-concave, plano-convex, or plano-concave configuration. Plano-convex and plano-concave refer to one side of the optical module 6 being flat and the other side being convex or concave. When the side of the optical module 6 facing the atomic layer deposition film 5 is convex or concave, the optical module 6 and the atomic layer deposition film 5 are bonded with optically transparent resin 8. When the side of the optical module 6 facing the atomic layer deposition film 5 is flat, the optical module 6 and the atomic layer deposition film 5 are bonded with optically transparent adhesive 7. The optically transparent resin 8 is a UV-curable or thermosetting resin, used to fill the gap and maintain optical transparency when the optical module 6 is bonded to the electrochromic device.

[0042] The substrate 1 is made of ultra-thin flexible glass, and the thickness of the substrate 1 is no more than 0.25 mm. In this embodiment, the thickness of the substrate 1 is less than 0.15 mm, the optically transparent adhesive 7 or optically transparent resin 8 is less than 0.1 mm, and the total thickness of the substrate 1, the first ITO layer 2, the electrochromic film layer 3, the second ITO layer 4 and the atomic layer deposition film layer 5 is no more than 0.28 mm. The electrochromic film layer 3 is made of inorganic metal oxide film layer, and the atomic layer deposition film layer 5 is made of silicon dioxide and / or aluminum oxide water-like isolation material.

[0043] Atomic layer deposition technology is used to deposit a nanoscale atomic layer deposition film 5 on ITO, achieving the effect of water and oxygen isolation and encapsulation on the surface of electrochromic film 3. This replaces the original EC cover plate + encapsulation glue solution, effectively reducing the thickness and weight of EC devices and providing higher transmittance.

[0044] The method for fabricating an electrochromic device includes the following steps:

[0045] Step 1: On substrate 1, a first ITO layer 2, an electrochromic film layer 3 and a second ITO layer 4 are sequentially deposited by physical vapor deposition.

[0046] Step 2: Deposit a nanoscale atomic layer deposition film 5 on the second ITO layer 4 using chemical vapor deposition technology;

[0047] Step 3: Use optically transparent adhesive 7 or optically transparent resin 8 to bond the electrochromic device to the planar or curved optical module 6.

[0048] The existing fabrication method yields a substrate 1 thickness of 0.95 mm, which is only suitable for planar optical modules 6. The fabrication method of this application solves the problem of bonding the curved optical module 6 with the electrochromic device from two directions. The first is to modify the optical lens into a plano-concave or plano-convex shape, which can accommodate a substrate 1 with a thickness of 0.1-0.95 mm with the curved lens. The second is to prepare a 0.28 mm electrochromic module by thinning the electrochromic device substrate 1 and removing the cover plate, resulting in a 70% thinner electrochromic device. Furthermore, the electrochromic module prepared by this method can weigh as little as 1.6 g, a 68% reduction in module weight. This allows for perfect compatibility with various lightweight AR / optical myopia lens devices, opening up a wider range of applications.

Claims

1. An electrochromic device, characterized in that, Comprising a substrate (1); a first ITO layer (2), an electrochromic film layer (3), and a second ITO layer (4) sequentially laminated on the substrate (1); an atomic layer deposition film layer (5) covering the second ITO layer (4); an optical module (6) adhered to the atomic layer deposition film layer (5) through an optically transparent adhesive (7) or an optically transparent resin (8); 2. An electrochromic device according to claim 1, characterised in that, both sides of the optical module (6) are flat, convex, concave, flat-convex, or flat-concave; when the side of the optical module (6) facing the atomic layer deposition film layer (5) is convex or concave, the optical module (6) and the atomic layer deposition film layer (5) are adhered through the optically transparent resin (8); when the side of the optical module (6) facing the atomic layer deposition film layer (5) is flat, the optical module (6) and the atomic layer deposition film layer (5) are adhered through the optically transparent adhesive (7).

3. An electrochromic device according to claim 1, wherein The substrate (1) is made of ultra-thin flexible glass, and the thickness of the substrate (1) is not greater than 0.25 mm.

4. An electrochromic device according to claim 3, characterised in that, The thickness of the substrate (1) is less than 0.15 mm, the thickness of the optically transparent adhesive (7) or the optically transparent resin (8) is less than 0.1 mm, and the sum of the thicknesses of the substrate (1), the first ITO layer (2), the electrochromic film layer (3), the second ITO layer (4), and the atomic layer deposition film layer (5) is not greater than 0.28 mm.

5. An electrochromic device according to claim 1, wherein The electrochromic film layer (3) is made of an inorganic metal oxide film layer.

6. An electrochromic device according to claim 1, wherein The atomic layer deposition film layer (5) is made of silicon dioxide and / or aluminum oxide.

7. The electrochromic device of claim 1, wherein, The first ITO layer (2), the electrochromic film layer (3), and the second ITO layer (4) are sequentially coated on the substrate (1) by physical vapor deposition; 8. The electrochromic device of claim 1, wherein, The second ITO layer (4) is deposited with a nanoscale atomic layer deposition film layer (5) by chemical vapor deposition technology.

9. The electrochromic device of claim 1, wherein, The optically transparent resin (8) is an ultraviolet-cured or heat-cured resin used to fill the gap and maintain optical transparency when the optical module (6) is adhered to the electrochromic device.

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