Optical device and semiconductor apparatus

By using a purely mechanical fixing and limiting structure design, the problem of light pollution of optical devices under ultraviolet light irradiation is solved, the stability and durability of optical performance are improved, and light damage and contaminant generation of optical devices are avoided.

CN224052475UActive Publication Date: 2026-03-27SHENZHEN SICARRIER IND MACHINES CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-03-18
Publication Date
2026-03-27

AI Technical Summary

Technical Problem

When optical devices are irradiated with ultraviolet light, the chemical bonds of the adhesive material break and react with impurities to form pollutants, resulting in reduced optical performance and light damage. Existing fixing methods cannot effectively prevent light pollution.

Method used

The waveplate is fixed by a purely mechanical means, which restricts its position and rotation through a support, guide ring and pressure ring, avoiding the use of adhesive materials. The optical properties and cleanliness are maintained by using a limiting structure and a gas cleaning system.

Benefits of technology

It significantly reduces the generation of contaminants inside optical devices, improves optical performance and durability, avoids light damage, and ensures the stability and reliability of optical devices in the ultraviolet band.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model provides an optical device and semiconductor equipment, and relates to the technical field of optical instruments, the optical device comprises a sleeve, a wave plate, a guide ring and a pressing ring, the sleeve is provided with a supporting part, the pressing ring, the guide ring, the wave plate and the supporting part are sequentially arranged in the axial direction, the guide ring is provided with a first limiting structure, and the sleeve is internally provided with a second limiting structure. The first limiting structure and the second limiting structure are matched to limit relative rotation of the guide ring and the sleeve in the axial direction, and the pressing ring and the sleeve are fixedly connected, so that the wave plate cannot rotate in the axial direction and cannot move in the axial direction, pure mechanical fixing of the wave plate is achieved, and under ultraviolet irradiation, the wave plate cannot be damaged. The optical device which is purely mechanically fixed does not generate a large amount of pollutants under the action of high-energy ultraviolet photons, so that the generation of light pollution is reduced fundamentally, and the light pollution resistance of the optical device is remarkably improved.
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Description

[0001] This application claims priority to the Chinese patent application No. 202411096071.6, filed on August 12, 2024, entitled “Optical device and semiconductor device”, the entire content of which is incorporated herein by reference. TECHNICAL FIELD

[0002] The present application relates to the technical field of optical instruments, in particular to an optical device and a semiconductor device. BACKGROUND

[0003] When an optical device is exposed to ultraviolet light (10nm-400nm), the surface contaminants and the endogenous contaminants of the optical device, the contaminants in the air and other impurities react with each other under the action of ultraviolet photons with super high energy, and deposits are formed at the light spot, i.e., the optical device light pollution phenomenon occurs. The deposits at the light spot can absorb ultraviolet light, resulting in a significant reduction in the transmittance or reflectance of the optical device, causing insufficient light energy at the light-requiring end, and the device performance indicators do not meet the standards. Moreover, under the long-term action of high-energy laser, the temperature at the light spot rises, which can cause optical damage and reduce the durability of the optical device.

[0004] The wave plate can be used to compose the above-mentioned optical device, and is usually fixed in the optical device by adhesive, for example, an air gap wave plate is formed by connecting and fixing two quartz plates and a spacer with adhesive, and then the side surface of the air gap wave plate and the sleeve are connected and fixed by adhesive. However, the adhesive used to fix the above-mentioned quartz plate and spacer, and to fix the wave plate and sleeve, can become a source of pollution inside the optical device. Specifically, under the irradiation of ultraviolet light, the adhesive can break the chemical bond, thereby reacting with other impurities, resulting in the generation of a large amount of contaminants and serious light pollution in the inner layer of the wave plate. CONTENT OF THE INVENTION

[0005] The present application provides an optical device and a semiconductor device, which avoids leaving a source of pollution inside the optical device by mechanically fixing the wave plate in the optical device, and reduces the generation of light pollution.

[0006] In a first aspect, the present application provides an optical device, comprising: a sleeve provided with a support part, the sleeve having a channel, the support part being located in the channel; a wave plate located in the channel and abutting against the support part along an axial direction of the sleeve; a guide ring located in the channel and located on a side of the wave plate away from the support part, the guide ring being provided with a first limiting structure, the sleeve being provided with a second limiting structure, the first limiting structure and the second limiting structure cooperating to limit relative rotation of the guide ring and the sleeve about the axial direction; and a pressing ring, at least part of the pressing ring being located in the channel and located on a side of the guide ring away from the wave plate, the pressing ring being fixedly connected to the sleeve, the pressing ring abutting against the guide ring along the axial direction, the guide ring abutting against the wave plate, and the wave plate being fixed between the guide ring and the support part.

[0007] In the optical device provided by the present application, the position of the wave plate along the axial direction is limited by the pressing ring and the support part, and the wave plate is separated from other structures by the guide ring so that the wave plate cannot rotate about the axial direction, thereby achieving pure mechanical fixing of the wave plate, keeping the polarization characteristics of the wave plate unchanged, and avoiding the generation of a large amount of pollutants under the action of high-energy ultraviolet photons, thereby avoiding the problem of optical pollution caused by the use of adhesive to fix the wave plate, and reducing the generation of optical pollution from the root, so that the optical device has a significant improvement in optical pollution resistance, and the performance and durability of the optical device are improved.

[0008] In a possible implementation, the second limiting structure comprises a guide groove, the first limiting structure comprises a protrusion matched with the guide groove, and the protrusion of the first limiting structure is accommodated in the guide groove of the second limiting structure; and / or the second limiting structure comprises a protrusion, the first limiting structure comprises a guide groove matched with the protrusion of the second limiting structure, and the protrusion of the second limiting structure is accommodated in the guide groove of the first limiting structure. The rotation of the guide ring about the axial direction of the sleeve is limited, so that the wave plate is prevented from rotating relatively due to the torque transmitted by other structures, and the wave plate does not need to be fixed by using adhesive on the side or inside of the wave plate, so that the optical characteristics of the wave plate remain unchanged, and even if the wave plate is irradiated in the ultraviolet band, there is no adhesive material in the wave plate to break the chemical bond, and there is also no large amount of pollutants generated by the mutual reaction of other impurities, thereby reducing the pollution source in the wave plate from the root and significantly improving the optical pollution resistance of the wave plate.

[0009] In a possible implementation, the number of the second limiting structures is at least two, and the number of the first limiting structures is at least two, the at least two first limiting structures are arranged at intervals along the circumference of the guide ring, and the first limiting structures and the second limiting structures are arranged one by one. The at least two first limiting structures and the at least two second limiting structures jointly resist the torque, avoiding damage or breakage of the first limiting structures and the second limiting structures caused by relatively large stress, and facilitating improvement of the reliability of the first limiting structures and the second limiting structures.

[0010] In a possible implementation, the at least two first limiting structures are arranged at intervals uniformly around the outer wall of the guide ring. The interaction force between the single first limiting structure and the single second limiting structure is avoided from being relatively large, thereby avoiding damage or breakage of the first limiting structures and the second limiting structures, and facilitating improvement of the reliability of each first limiting structure and each second limiting structure, thereby ensuring that the guide ring does not transmit the torque to the wave plate, and facilitating guarantee of the optical characteristics of the optical device.

[0011] In a possible implementation, the sleeve is provided with fixing holes penetrating through the side wall of the sleeve, the fixing holes are used for allowing the fixing members to pass through to be fixedly connected with the compression ring, the relative positions of the compression ring and the sleeve are fixed, and thereby the positions of the wave plate and the guide ring clamped between the compression ring and the support part in the channel along the axial direction are fixed. The step of dispensing glue between the side surface of the wave plate and the sleeve is omitted, the pollution source inside the optical device is reduced from the root, and the possible pollutants inside the optical device are greatly reduced.

[0012] In a possible implementation, the number of the fixing holes is at least two, and the at least two fixing holes are arranged at intervals along the circumference of the sleeve, facilitating reduction of the interaction force between the single fixing hole and the single fixing member, and avoiding damage or breakage of the fixing hole and the fixing member, and facilitating guarantee of the structural stability of the optical device.

[0013] In a possible implementation, the at least two fixing holes are arranged at intervals uniformly around the outer wall of the sleeve, such that the force generated by the compression ring along the axial direction can be uniformly dispersed to the at least two fixing holes and the at least two fixing members, the interaction force between the single fixing hole and the single fixing member is avoided from being relatively large, thereby avoiding damage or breakage of the fixing hole and the fixing member, and facilitating improvement of the reliability of each fixing hole and each fixing member, and guaranteeing the structural stability of the optical device.

[0014] In a possible implementation, the sleeve is in a cylindrical shape, the sleeve is provided with a first threaded structure, the compression ring is provided with a second threaded structure, and the first threaded structure and the second threaded structure are threadedly connected. By threadedly connecting the sleeve and the compression ring, pressure is applied to the guide ring and the wave plate during screwing of the compression ring and the sleeve, so that the wave plate is prevented from moving axially in the channel. The step of dispensing glue between the side surface of the wave plate and the sleeve is omitted, so that the pollution source inside the optical device is removed from the root, and the pollution inside the optical device is greatly reduced.

[0015] In a possible implementation, the wave plate includes a first crystal plate, a second crystal plate, and a spacer, the first crystal plate and the second crystal plate are arranged in a stacked manner along the axial direction, and the spacer is arranged between the first crystal plate and the second crystal plate. By designing the angle of relative rotation of the first crystal plate and the second crystal plate, it can be ensured that the wave plate meets the polarization design direction of light, and an air gap is formed between the first crystal plate and the second crystal plate, clean gas can be blown into the air gap to ensure the cleanliness inside the wave plate.

[0016] In a possible implementation, the spacer has at least two air holes, and the at least two air holes penetrate the side wall of the spacer. When the wave plate has an exogenous pollutant inside, clean gas can be blown into at least one air hole, and the clean gas flows out from another at least one air hole, so that the exogenous pollutant inside the wave plate is taken out of the wave plate by the clean gas, which is beneficial to ensure the cleanliness inside the wave plate and avoid light damage caused by long-term existence of the exogenous pollutant in the optical device, and is beneficial to improve the durability of the optical device.

[0017] In a possible implementation, the sleeve is provided with an air inlet hole and an air outlet hole, the air inlet hole and the air outlet hole penetrate the side wall of the sleeve, the air inlet hole is in communication with one of the at least two air holes, and the air outlet hole is in communication with another of the at least two air holes. Clean gas can enter the air hole through the air inlet hole, and then enter the wave plate, and then be blown out of the air outlet hole, so that an air passage is formed in the optical device, so that when the optical device has an exogenous pollutant inside, the wave plate and the sleeve do not need to be disassembled, the nozzle of the clean gas can be matched with the outside of the sleeve to remove the exogenous pollutant inside the optical device, thereby improving the durability of the optical device and reducing the cost.

[0018] In a possible implementation manner, the sleeve is in a cylindrical shape, and the air inlet hole and the air outlet hole are located at two radial ends of the sleeve. By locating the air inlet hole and the air outlet hole at the two radial ends of the sleeve, the path of the cleaning gas from the air inlet hole to the air outlet hole is a diameter of the sleeve, so that the moving path of the cleaning gas is shortened, and the cleaning gas can clean the entire air gap, that is, the cleaning gas has a large coverage area and can cover the light transmission area, so that the light transmission area is clean.

[0019] In a possible implementation manner, the air hole in communication with the air inlet hole covers the air inlet hole, and the air hole in communication with the air outlet hole covers the air outlet hole. The size of the air hole does not interfere with the flow of the cleaning gas at the air inlet hole and the air outlet hole. By designing the shape and size of the air inlet hole and the air outlet hole, the flow rate of the cleaning gas in the inner layer center area of the wave plate can be designed, that is, the flow rate of the cleaning gas in the light transmission area is designed, which is beneficial to the formation of the gas film protection layer on the inner surfaces of the first crystal plate and the second crystal plate, and the cleaning gas has no backflow at the air outlet hole, so that the external source pollutants in the environment cannot be sucked into the interlayer of the wave plate by backflow through the air outlet of the sleeve, and the cleaning efficiency is ensured.

[0020] In a possible implementation manner, the area of the air inlet hole is smaller than the area of the air outlet hole. By making the area of the air inlet hole smaller than the area of the air outlet hole, the pressure at the air outlet hole is higher than the ambient pressure, so that the cleaning gas at the air outlet hole has no backflow phenomenon, and at the same time, the sufficient cleaning gas covers the light transmission area, and the external source pollutants in the environment cannot be sucked into the interlayer of the wave plate by backflow through the air outlet of the sleeve.

[0021] In a possible implementation manner, the number of the air holes is at least four, the at least four air holes are uniformly and spacedly arranged around the spacer, and the axes of the air inlet hole and the air outlet hole respectively coincide with the centers of two symmetrically arranged air holes. By satisfying the above structure of the sleeve and the spacer, the cleaning gas can form a uniform flow field in the interlayer of the wave plate, the cleaning gas is blown into the interlayer of the wave plate from the air inlet hole and flows out to the environment from the air outlet hole, and the gas film protection layer is formed on the inner surfaces of the first crystal plate and the second crystal plate, so that the external source pollutants cannot stay in the light transmission area.

[0022] In a possible implementation manner, the optical device works in an ultraviolet wave band.

[0023] In a second aspect, the application provides a semiconductor device, which comprises a workbench and the optical device in any one of the first aspect embodiments, and the optical device is mounted on the workbench. BRIEF DESCRIPTION OF DRAWINGS

[0024] Figure 1 is a quarter sectional view of an optical device provided by embodiments of the present application;

[0025] Figure 2 is a three-dimensional schematic view of an optical device provided by embodiments of the present application;

[0026] Figure 3 is a half sectional view of an optical device provided by embodiments of the present application;

[0027] Figure 4 is a sectional schematic view of an optical device provided by embodiments of the present application;

[0028] Figure 5 is a schematic view of an optical device provided by embodiments of the present application Figure 1 ;

[0029] Figure 6 is Figure 5 a sectional view along A-A;

[0030] Figure 7 is a schematic view of an optical device provided by embodiments of the present application Figure 2 ;

[0031] Figure 8 is Figure 7 a sectional view along B-B;

[0032] Figure 9 is an exploded schematic view of a guide ring and a sleeve provided by embodiments of the present application;

[0033] Figure 10 is a schematic view of an optical device provided by embodiments of the present application Figure 3 ;

[0034] Figure 11 is Figure 10 a sectional view along C-C;

[0035] Figure 12 is an exploded schematic view of a first crystal wafer, a second crystal wafer and a spacer ring provided by embodiments of the present application;

[0036] Figure 13 is an exploded schematic view of a wave plate, a guide ring, a press ring and a sleeve provided by embodiments of the present application;

[0037] Figure 14 is an exploded schematic view of a first crystal wafer, a second crystal wafer and a spacer ring provided by embodiments of the present application;

[0038] Figure 15 is an exploded schematic view of a wave plate and a guide ring provided by embodiments of the present application;

[0039] Figure 16FIG. 1 is an exploded schematic view of a guide ring, a compression ring and a sleeve provided by an embodiment of the present application.

[0040] Legend of reference signs:

[0041] 10-sleeve, 11-supporting part, 12-channel, 13-inlet hole, 14-outlet hole, 15-first threaded structure, 16-second limiting structure, 17-fixing hole;

[0042] 20-wave plate, 21-first crystal plate, 22-second crystal plate, 23-separation ring, 231-vent hole;

[0043] 30-guide ring, 31-first limiting structure;

[0044] 40-compression ring, 41-second threaded structure. DETAILED DESCRIPTION

[0045] The embodiments of the present application will be described below in conjunction with the accompanying drawings.

[0046] For the convenience of understanding, the English abbreviations and related technical terms involved in the embodiments of the present application will be explained and described below.

[0047] It should be clear that the described embodiments are only some of the embodiments of the present application, not all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative labor fall within the scope of protection of the present application.

[0048] The terms used in the embodiments of the present application are only for the purpose of describing the specific embodiments, and are not intended to limit the present application. The singular forms "a", "an" and "the" used in the embodiments of the present application and the appended claims are also intended to include the plural forms, unless the context clearly indicates otherwise.

[0049] It should be understood that the term "and / or" used herein is only to describe the same field of associated objects, which means that there can be three relationships, for example, A and / or B can represent: A exists alone, A and B exist together, and B exists alone. In addition, the character " / " in this paper generally represents that the front and rear associated objects are a "or" relationship.

[0050] It should be understood that "first", "second", etc. used in the present application are only for the purpose of distinguishing the description, and cannot be understood as indicating or implying relative importance, nor can it be understood as indicating or implying order.

[0051] In the description of the present application, the terms "center", "upper", "lower", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer" and the like indicate the orientation or positional relationship shown in the drawings based on the orientation or positional relationship, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation of the present application.

[0052] In the description of the present application, it should be noted that unless otherwise explicitly specified and limited, the terms "mounting", "connecting", "connecting" should be understood broadly, for example, it can be fixed connection, or detachable connection, or abutting connection or integral connection, it can be mechanical connection, or electrical connection, it can be direct connection, or indirect connection through intermediate medium, or internal communication of two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0053] In addition, the technical features involved in the different embodiments of the present application described below can be combined with each other as long as there is no conflict.

[0054] When the optical device is applied under ultraviolet light, it will be affected by ultraviolet photons with super high energy, causing the chemical bonds of surface contaminants on the optical device to break, and the surface contaminants will also react with endogenous contaminants of the optical device, air pollutants, particles and other impurities, etc. to form deposits at the light spot, i.e. light pollution phenomenon. Light pollution will cause the optical performance of the optical device to degrade and attenuate greatly, the most intuitive performance is that the deposits at the light spot will absorb ultraviolet light, resulting in a significant reduction in the transmittance or reflectance of the optical device, causing insufficient light energy at the light end, and the performance indicators of the equipment installed with the optical device do not meet the standards. In addition, the deposits at the light spot of the optical device will absorb ultraviolet light, causing the temperature at the light spot to rise under the long-term action of high-energy laser, resulting in optical damage and reducing the durability of the optical device.

[0055] The optical device includes a wave plate 20, which is an optical component capable of generating an additional optical path difference (or phase difference) between two light vibrations perpendicular to each other, and the wave plate 20 has a wide range of applications in optical experiments, optical equipment and communication systems. An optical device is formed by a wave plate 20 formed by a spacer 23 sandwiched between two quartz plates, and then mounted in a sleeve 10. Among them, the spacer 23 is sandwiched between the two quartz plates to have an air gap between the two quartz plates, and the wave plate 20 can be called an air gap wave plate. The two quartz plates and the spacer 23 are connected and fixed by gluing to avoid relative rotation of the two quartz plates. The wave plate 20 has specific polarization characteristics, and the side surface of the wave plate 20 and the sleeve 10 are connected and fixed by gluing to avoid relative rotation or axial movement of the wave plate 20 and the sleeve 10, thereby ensuring the structural stability of the optical device. However, under the irradiation of ultraviolet light, the adhesive between the two quartz plates and the spacer 23 and the adhesive between the side surface of the wave plate 20 and the sleeve 10 will break the chemical bond, thereby reacting with other impurities to generate a large amount of pollutants inside the optical device, that is, the adhesive used to fix the optical components in the optical device becomes a source of pollution inside the optical device.

[0056] In this case, even if clean gas is blown into the interior of the optical device to clean the pollutants, it cannot resist the light pollution generated by the pollution source inside the optical device. Therefore, serious light pollution occurs in the inner layer of the optical device, and the optical device is damaged in the ultraviolet waveband in a short time. Therefore, in order to improve the performance of the optical device and improve the durability of the optical device, it is necessary to reduce the internal pollution source of the optical device.

[0057] The present application provides an optical device, please refer to Figure 1 , Figure 2 , Figure 3 and Figure 4The optical device includes a sleeve 10, a wave plate 20, a guide ring 30 and a pressing ring 40. The sleeve 10 has a channel 12, which is an internal cavity of the sleeve 10. The internal cavity of the sleeve 10 is referred to as the channel 12 because the light path passes through the internal cavity of the sleeve 10. The sleeve 10 is provided with a support portion 11 located in the channel 12. The wave plate 20 is located in the channel 12 and abuts the support portion 11 in the axial direction, so that the support portion 11 supports the wave plate 20. The wave plate 20 can be fixed inside the sleeve 10, so that the optical device has the optical properties of the wave plate 20. The wave plate 20 includes but is not limited to a quarter-wave plate or a half-wave plate. The wave plate 20 is used to produce a relative phase delay between the polarization components of the two vibration directions of the polarized light, thereby changing the polarization properties of the light. The optical device with the wave plate 20 can be used with other optical elements to achieve different functions. For example, the wave plate 20 can be used to change the phase delay of the incident light. The polarizer is used together with the optical device to make a polarization direction rotator. The wave plate 20 can be used to change the polarization direction of the polarized light. The polarizer and the optical device are used together to make a light attenuator. Alternatively, the polarizer, the optical device and the polarization beam splitter are used together to form an arbitrary light intensity ratio device.

[0058] The guide ring 30 is in the shape of a ring and is located in the channel 12 and on the side of the wave plate 20 away from the support portion 11, i.e. the guide ring 30 and the support portion 11 are clamped on both sides of the wave plate 20. When the guide ring 30 is installed on the sleeve 10, the two sides of the wave plate 20 are limited by the support portion 11 and the guide ring 30, so that the wave plate 20 cannot move axially in the channel 12 of the sleeve 10. The guide ring 30 is provided with a first limiting structure 31, and the sleeve 10 is provided with a second limiting structure 16. The first limiting structure 31 and the second limiting structure 16 cooperate to limit the relative rotation of the guide ring 30 and the sleeve 10 about the axial direction, so that the guide ring 30 cannot rotate relative to the sleeve 10 in the channel 12. The guide ring 30 and the support portion 11 are located on both sides of the wave plate 20, separating the wave plate 20 from other structures. The guide ring 30 cannot rotate in the channel 12. The support portion 11 is part of the structure of the sleeve 10. The guide ring 30 and the support portion 11 on both sides of the wave plate 20 cannot rotate relative to each other, so that the wave plate 20 also cannot rotate in the channel 12.

[0059] In one embodiment, the wave plate 20 includes a first crystal sheet 21 and a second crystal sheet 22. The first crystal sheet 21 and the second crystal sheet 22 are arranged in a stack along the axial direction. The first crystal sheet 21 and the second crystal sheet 22 are relatively rotated about the axial direction by a certain angle. The wave plate 20 can have certain polarization properties. Therefore, by keeping the relative angle between the first crystal sheet 21 and the second crystal sheet 22 unchanged, the polarization properties of the wave plate 20 can be ensured to be unchanged.

[0060] The guide ring 30 and the support part 11 separate the wave plate 20 from other structures, the guide ring 30 cannot rotate in the channel 12, the support part 11 is part of the sleeve 10 structure, the guide ring 30 and the support part 11 on both sides of the wave plate 20 cannot rotate relative to each other, which is beneficial to avoid the first crystal sheet 21 and the second crystal sheet 22 from being rotated relative to each other by the torque transmitted by other structures, thereby ensuring that the relative angle between the first crystal sheet 21 and the second crystal sheet 22 is unchanged, that is, the polarization characteristics of the wave plate 20 are unchanged, and further ensuring that the optical characteristics of the optical device are unchanged. Also, it avoids fixing the wave plate 20 by gluing, for example, the first crystal sheet 21 and the second crystal sheet 22 of the wave plate 20 are both fixed by gluing, thereby avoiding the chemical bond rupture of the adhesive substance in the wave plate 20 and the reaction with other impurities to produce light pollution under ultraviolet light conditions, that is, avoiding leaving a pollution source inside the wave plate 20. From the root, the generation of light pollution inside the wave plate 20 is reduced, which significantly improves the light pollution resistance of the wave plate 20.

[0061] The shape of the pressing ring 40 is a ring body, at least part of the pressing ring 40 is located in the channel 12 and on the side of the guide ring 30 away from the wave plate 20, the pressing ring 40 and the sleeve 10 are fixedly connected, that is, at least part of the pressing ring 40, the guide ring 30 and the wave plate 20 are arranged in sequence along the axial direction of the sleeve 10, and the positions of the pressing ring 40 and the support part 11 in the channel 12 along the axial direction are fixed. In the axial direction, the pressing ring 40 abuts against the guide ring 30, the guide ring 30 abuts against the wave plate 20, and the wave plate 20 is fixed between the guide ring 30 and the support part 11, so that the wave plate 20 and the guide ring 30 are clamped between the pressing ring 40 and the support part 11. Since the positions of the pressing ring 40 and the support part 11 in the channel 12 along the axial direction are fixed, the positions of the wave plate 20 and the guide ring 30 in the channel 12 along the axial direction are fixed. Since the guide ring 30 separates the wave plate 20 from other structures to prevent the wave plate 20 from rotating in the channel 12, and the pressing ring 40 and the support part 11 jointly limit the axial position of the wave plate 20, the relative position of the wave plate 20 and the sleeve 10 is always unchanged, thereby realizing the modular assembly of the optical device. The assembly process adopts a pure mechanical fixed connection method without the need for gluing to prevent the adhesive substance from producing light pollution, and also ensures the structural stability of the optical device.

[0062] And, without using the way of adhesive in the optical device, the pure mechanical fixation of the wave plate 20 is realized by the support part 11, the guide ring 30 and the pressing ring 40, which not only ensures the assembly stability of the optical device, but also avoids leaving the pollution source in the optical device. Compared with the way of using adhesive fixation in the optical device, when the optical device works under the condition of ultraviolet waveband light, the optical device using pure mechanical fixation has no adhesive material in the optical device, so as not to produce a large amount of pollutants under the action of high-energy ultraviolet photons, thereby avoiding serious light pollution in the optical device, damaging the wave plate 20 in the ultraviolet waveband for a short time, reducing the generation of light pollution from the root, significantly improving the light pollution resistance of the optical device, and also being beneficial to improve the durability of the optical device and improve the performance of the optical device.

[0063] The pressing ring 40 and the support part 11 can be located at both ends of the sleeve 10 respectively, so that the length of the sleeve 10 in the axial direction is equal to the total length of the support part 11, the wave plate 20, the guide ring 30 and the pressing ring 40 in the axial direction, thereby reducing the volume of the sleeve 10, i.e. reducing the volume of the optical device, which is beneficial to the application of the optical device on different equipment; the pressing ring 40 and the support part 11 can also be located in the channel 12 of the sleeve 10 respectively, so that the length of the sleeve 10 in the axial direction is greater than the total length of the support part 11, the wave plate 20, the guide ring 30 and the pressing ring 40 in the axial direction, so that other structures can also be arranged in the channel 12 of the sleeve 10.

[0064] For example, the sleeve 10 has a first end and a second end opposite in the axial direction, the support part 11 is arranged at the first end, and the guide ring 30 is fixedly connected with the second end. In the assembly process of the optical device, the wave plate 20 is first placed into the channel 12, so that the wave plate 20 and the support part 11 are in contact in the axial direction, and then the guide ring 30 is placed into the channel 12, so that the guide ring 30 is in contact with the wave plate 20 on the side away from the support part 11. In the process of contacting the guide ring 30 and the wave plate 20, the guide ring 30 and the sleeve 10 only move relatively in the axial direction, and at the same time, in the subsequent assembly process, the first limiting structure 31 and the second limiting structure 16 cooperate to avoid the wave plate 20 being subjected to torque, so that the wave plate 20 and the sleeve 10 do not rotate relatively. Then the pressing ring 40 and the second end are fixedly connected, at least part of the pressing ring 40 is inside the channel 12, and the pressing ring 40 and the guide ring 30 are in contact or abut on the side away from the wave plate 20, so that the wave plate 20 cannot move in the axial direction in the channel 12.

[0065] The optical device provided in the application comprises a sleeve 10, a wave plate 20, a guide ring 30 and a pressing ring 40. The sleeve 10 has a channel 12. The sleeve 10 is provided with a support part 11 which is located in the channel 12. The wave plate 20 is located in the channel 12 and abuts against the support part 11 in the axial direction. The guide ring 30 is located in the channel 12 and on the side of the wave plate 20 away from the support part 11, so that the guide ring 30 separates the wave plate 20 from other structures. The guide ring 30 is provided with a first limiting structure 31. The sleeve 10 is provided with a second limiting structure 16. The first limiting structure 31 and the second limiting structure 16 cooperate to limit the relative rotation of the guide ring 30 and the sleeve 10 in the axial direction, so that the wave plate 20 cannot rotate in the channel 12, which is beneficial to keeping the optical characteristics of the optical device unchanged and avoiding the use of adhesive to fix the wave plate 20, thereby avoiding leaving a pollution source in the wave plate 20 and significantly improving the light pollution resistance of the wave plate 20. At least part of the pressing ring 40 is located in the channel 12 and on the side of the guide ring 30 away from the wave plate 20. The pressing ring 40 is fixedly connected with the sleeve 10. In the axial direction, the pressing ring 40 abuts against the guide ring 30, the guide ring 30 abuts against the wave plate 20, and the wave plate 20 is fixed between the guide ring 30 and the support part 11. Since the positions of the pressing ring 40 and the support part 11 in the channel 12 in the axial direction are fixed, the positions of the wave plate 20 and the guide ring 30 in the channel 12 in the axial direction are fixed. The pressing ring 40 and the support part 11 jointly limit the position of the wave plate 20 in the axial direction, so that the relative position of the wave plate 20 and the sleeve 10 in space is always unchanged, thereby ensuring the assembly stability of the optical device. At the same time, the wave plate 20 is purely mechanically fixed by the support part 11, the guide ring 30 and the pressing ring 40, thereby avoiding leaving a pollution source in the optical device. Therefore, a large amount of pollutants will not be generated in the optical device under the action of high-energy ultraviolet photons, thereby avoiding serious light pollution in the optical device and damage to the wave plate 20. The light pollution resistance of the optical device is significantly improved, which is beneficial to improving the durability and performance of the optical device.

[0066] In one possible implementation manner, referring to Figure 3 、 Figure 5 、 Figure 6 、 Figure 7 、 Figure 8 and Figure 9 , the second limiting structure 16 comprises a guide groove and / or a protrusion, the first limiting structure 31 comprises a protrusion and / or a guide groove which are adapted to the second limiting structure 16, the protrusion is accommodated in the guide groove, so that the guide groove limits the rotation of the protrusion in the axial direction of the sleeve 10, thereby limiting the rotation of the guide ring 30 in the axial direction of the sleeve 10.

[0067] By matching the first limiting structure 31 and the second limiting structure 16, the axial rotation of the guide ring 30 around the sleeve 10 is limited, so that the relative rotation of the wave plate 20 caused by the torque transmitted by other structures is avoided. Without using adhesives on the side of the wave plate 20 or inside the wave plate 20 to fix the wave plate 20, the optical properties of the wave plate 20 are unchanged. Even if the wave plate 20 is exposed to ultraviolet light, there is no chemical bond rupture of the adhesive inside the wave plate 20, and there is also no reaction with other impurities to produce a large amount of pollutants. The pollution source inside the wave plate 20 is removed from the root, the possible pollutants inside the wave plate 20 are greatly reduced, and the wave plate 20 is not damaged by serious light pollution in the inner layer of the wave plate 20 in a short time in the ultraviolet band. The light pollution resistance of the wave plate 20 is significantly improved.

[0068] In an embodiment, the second limiting structure 16 can include a guide groove, and the first limiting structure 31 can include a protrusion. The guide groove can extend in the axial direction, and the guide groove has an opening on one end face of the sleeve 10. When the guide ring 30 enters the channel 12, the protrusion enters the opening of the guide groove, and the protrusion is always accommodated in the guide groove until the guide ring 30 moves to contact or abut the wave plate 20. At this time, during the contact between the guide ring 30 and the wave plate 20, the guide ring 30 and the sleeve 10 only move relatively in the axial direction, and in the subsequent assembly process, the first limiting structure 31 and the second limiting structure 16 cooperate to avoid the torque on the wave plate 20, so that the wave plate 20 and the sleeve 10 do not rotate relative to each other.

[0069] The guide groove can be arranged only inside the channel 12, and a protrusion capable of telescopic movement can be arranged on the outer wall surface of the guide ring 30. When the guide ring 30 enters the channel 12, the protrusion is first compressed by the inner wall of the channel 12. When the guide ring 30 moves to the guide groove, the protrusion extends from the outer wall surface of the guide ring 30 and extends into the guide groove, so that the guide groove limits the axial rotation of the protrusion around the sleeve 10. And before the guide ring 30 contacts the wave plate 20, the protrusion enters the guide groove, so that during the contact between the guide ring 30 and the wave plate 20, the guide groove limits the guide ring 30 to move relatively with the sleeve 10 only in the axial direction, and in the subsequent assembly process, the first limiting structure 31 and the second limiting structure 16 cooperate to avoid the torque on the wave plate 20, so that the wave plate 20 and the sleeve 10 do not rotate relative to each other.

[0070] In one embodiment, the second limiting structure 16 can include a protrusion, and the first limiting structure 31 can include a guide slot. In this case, in order to facilitate the installation of the wave plate 20 inside the channel 12, the radial length of the wave plate 20 needs to be set to enable the wave plate 20 to pass through the protrusion and contact or abut against the support portion 11. When the protrusion cannot be retracted on the inner wall of the channel 12, the radial length of the wave plate 20 needs to be less than or equal to the inner diameter of the channel 12 at the position of the protrusion, and the inner diameter of the channel 12 at the position of the support portion 11 needs to be less than the radial length of the wave plate 20, so as to facilitate the installation of the optical components in the optical device. When the protrusion can be retracted on the inner wall of the channel 12, only the inner diameter of the channel 12 at the position of the support portion 11 needs to be less than the radial length of the wave plate 20. In the assembly process of the optical components in the optical device, the protrusion is first compressed into the inner wall of the channel 12, and then the wave plate 20 is placed into the sleeve 10 and contacts the support portion 11. After the wave plate 20 is placed, the protrusion is extended from the inner wall of the channel 12, and then the guide ring 30 is placed into the channel 12, so that the protrusion extends into the guide slot, thereby achieving the mutual limitation of the slot and the protrusion and avoiding the rotation of the guide ring 30 around the axis of the sleeve 10.

[0071] In one embodiment, the first limiting structure 31 can include a protrusion and a guide slot, and the second limiting structure 16 can include a protrusion and a guide slot. The protrusion of the first limiting structure 31 and the guide slot of the second limiting structure 16 are connected in a matching manner, and the guide slot of the first limiting structure 31 and the protrusion of the second limiting structure 16 are connected in a matching manner.

[0072] In one possible implementation, referring to Figure 3 , Figure 5 , Figure 6 , Figure 7 , Figure 8 and Figure 9 , the number of the second limiting structures 16 is at least two, the number of the first limiting structures 31 is at least two, the at least two first limiting structures 31 are arranged at intervals along the circumference of the guide ring 30, and the first limiting structures 31 and the second limiting structures 16 are arranged in a one-to-one correspondence, i.e., the at least two second limiting structures 16 are also arranged at intervals along the circumference of the sleeve 10. Due to the matching of the first limiting structure 31 and the second limiting structure 16, the guide ring 30 cannot rotate around the axis relative to the sleeve 10 inside the channel 12. When the guide ring 30 is subjected to a torque transmitted by other structures, the first limiting structure 31 and the second limiting structure 16 will generate interaction forces to resist the torque.

[0073] By spacing the at least two first limiting structures 31 along the circumference of the guide ring 30, the at least two second limiting structures 16 are also spaced along the circumference of the sleeve 10, so that the at least two first limiting structures 31 and the at least two second limiting structures 16 jointly resist the torque, so that the interaction force generated between the individual first limiting structures 31 and the individual second limiting structures 16 is small, avoiding damage or damage to the first limiting structures 31 and the second limiting structures 16 due to large force, and facilitating improvement of the reliability of the first limiting structures 31 and the second limiting structures 16, so as to ensure that the guide ring 30 does not transmit the torque to the wave plate 20, and facilitate ensuring that the optical properties of the optical device remain unchanged.

[0074] In an embodiment, the at least two first limiting structures 31 include at least one guide groove and at least one protrusion, and the at least two second limiting structures 16 include at least one protrusion and at least one guide groove matched with the first limiting structures 31, wherein the guide grooves in the first limiting structures 31 and the protrusions in the second limiting structures 16 correspond one by one, and the protrusions in the first limiting structures 31 and the guide grooves in the second limiting structures 16 correspond one by one.

[0075] In a possible implementation, please refer to Figure 3 、 Figure 5 、 Figure 6 、 Figure 7 、 Figure 8 and Figure 9 The at least two first limiting structures 31 are uniformly spaced around the outer wall of the guide ring 30, and the at least two second limiting structures 16 are also uniformly spaced around the inner wall of the sleeve 10. This embodiment takes two first limiting structures 31 and two second limiting structures 16 as an example. When the guide ring 30 is subjected to the torque transmitted by other structures, the two first limiting structures 31 and the two second limiting structures 16 are uniformly spaced around the axis of the sleeve 10, so that the interaction force generated by the first limiting structures 31 and the second limiting structures 16 to resist the torque is uniformly dispersed around the axis of the sleeve 10 to each first limiting structure 31 and each second limiting structure 16.

[0076] By subjecting each first limiting structure 31 and each second limiting structure 16 to the same force, the interaction force generated between the individual first limiting structures 31 and the individual second limiting structures 16 is large, thereby avoiding damage or damage to the first limiting structures 31 and the second limiting structures 16, and facilitating improvement of the reliability of each first limiting structure 31 and each second limiting structure 16, thereby ensuring that the guide ring 30 does not transmit the torque to the wave plate 20, and facilitating ensuring that the optical properties of the optical device remain unchanged.

[0077] In a possible implementation, please refer to Figure 2 、 Figure 4、 Figure 9 、 Figure 10 、 Figure 13 and Figure 16 The sleeve 10 is provided with a fixing hole 17 penetrating through the side wall of the sleeve 10, the fixing hole 17 is used for fixing members to pass through and fixedly connect with the pressing ring 40, so that the relative position of the pressing ring 40 and the sleeve 10 is fixed, thereby the wave plate 20 and the guide ring 30 clamped between the pressing ring 40 and the supporting part 11 are fixed in the axial position in the channel 12.

[0078] Compared with fixing the relative position between the wave plate 20 and the sleeve 10 by means of gluing, the step of dispensing glue between the side of the wave plate 20 and the sleeve 10 is omitted, so that the chemical bond of the glue between the wave plate 20 and the sleeve 10 will not be broken under the condition of ultraviolet light, and further, there is no large amount of pollutants generated by the mutual reaction of the glue and other impurities, thereby reducing the pollution source inside the optical device and greatly reducing the possible pollutants inside the optical device.

[0079] In an embodiment, the fixing hole 17 is a threaded hole, a jack screw is threadedly connected with the threaded hole, so that the jack screw and the pressing ring 40 abut against each other, and the jack screw and the pressing ring 40 have a certain friction force therebetween to limit the axial movement of the pressing ring 40 along the sleeve 10, thereby ensuring that the relative position of the pressing ring 40 and the sleeve 10 is unchanged.

[0080] In an embodiment, the side of the pressing ring 40 is provided with a threaded hole, the threaded hole and the fixing hole 17 are in one-to-one communication, and a bolt is threadedly connected by penetrating through the fixing hole 17 and the threaded hole, so that the bolt fixes the relative position between the pressing ring 40 and the sleeve 10.

[0081] In a possible implementation, referring to Figure 2 、 Figure 4 、 Figure 9 、 Figure 10 、 Figure 13 and Figure 16 The number of fixing holes 17 is at least two, and the at least two fixing holes 17 are arranged at intervals in the circumferential direction of the sleeve 10, and correspondingly, the number of fixing members is at least two, and the fixing holes 17 and the fixing members are arranged one by one. Since the fixing member is fixedly connected with the pressing ring 40 by penetrating through the fixing hole 17, the pressing ring 40 will not move axially relative to the sleeve 10, and when the pressing ring 40 is subjected to an axial force, the fixing hole 17 and the fixing member will generate interaction force to resist the movement of the pressing ring 40.

[0082] By arranging the at least two fixing holes 17 along the circumference of the sleeve 10, the at least two fixing holes 17 and the at least two fixing members can jointly bear the axial force generated by the compression ring 40, which helps to reduce the interaction force between the single fixing hole 17 and the single fixing member, avoids damage or breakage of the fixing hole 17 and the fixing member, and helps to ensure the structural stability of the optical device. Compared with arranging the at least two fixing holes 17 along the axial direction of the sleeve 10, when the axial length of the compression ring 40 is constant, the area of the fixing hole 17 can be increased, so that a thicker fixing member can be used, so that the strength of the fixing member is larger; when the area of the fixing hole 17 is constant, the axial length of the compression ring 40 and the sleeve 10 can be reduced, so that the volume of the sleeve 10 is reduced, that is, the volume of the optical device is reduced, which is beneficial to the application of the optical device in different equipment.

[0083] In an embodiment, referring to Figure 2 , Figure 4 , Figure 9 , Figure 10 , Figure 13 and Figure 16 , the at least two fixing holes 17 are arranged uniformly around the outer wall of the sleeve 10, so that the axial force generated by the compression ring 40 can be uniformly distributed to the at least two fixing holes 17 and the at least two fixing members, avoiding that the interaction force between the single fixing hole 17 and the single fixing member is too large, thereby avoiding damage or breakage of the fixing hole 17 and the fixing member, which helps to improve the reliability of each fixing hole 17 and each fixing member, and ensures the structural stability of the optical device.

[0084] In a possible implementation, referring to Figure 4 , the sleeve 10 is provided with a first threaded structure 15, and the compression ring 40 is provided with a second threaded structure 41, the first threaded structure 15 and the second threaded structure 41 are threadedly connected, so that the compression ring 40 and the sleeve 10 are fixedly connected, improving the connection stability of the compression ring 40 and the sleeve 10, so that the wave plate 20 and the guide ring 30 clamped between the compression ring 40 and the support part 11 are fixed in the axial position in the channel 12. By threadedly connecting the sleeve 10 and the compression ring 40, pressure is applied to the guide ring 30 and the wave plate 20 during the tightening process of the compression ring 40 and the sleeve 10, which ensures that the wave plate 20 does not move axially in the channel 12.

[0085] In an embodiment, the compression ring 40 is entirely located in the channel 12 of the sleeve 10, the inner side wall of the sleeve 10 is provided with a first threaded structure 15, and the outer wall surface of the compression ring 40 is provided with a second threaded structure 41. During the tightening process of the compression ring 40 and the sleeve 10, the compression ring 40 gradually enters the channel 12 of the sleeve 10.

[0086] In one embodiment, at least part of the pressing ring 40 is located outside the sleeve 10. The pressing ring 40 can wrap the inner wall surface and the outer wall surface of the sleeve 10 at the same time. In this case, the first threaded structure 15 can be arranged on the inner wall surface of the sleeve 10 or on the outer surface of the sleeve 10.

[0087] In one possible implementation, referring to Figure 1 、 Figure 3 、 Figure 4 、 Figure 12 、 Figure 14 and Figure 16 The wave plate 20 includes a first crystal sheet 21, a second crystal sheet 22, and a spacer 23. The first crystal sheet 21 and the second crystal sheet 22 are arranged in a stack along an axial direction. The first crystal sheet 21 and the second crystal sheet 22 are rotated at a certain angle around the axial direction to enable the wave plate 20 to have a certain polarization characteristic. The first crystal sheet 21 and the second crystal sheet 22 are arranged to rotate at a certain angle relative to each other in advance, so that the wave plate 20 meets the design direction of the polarization of light.

[0088] The spacer 23 is in the shape of a ring and is arranged between the first crystal sheet 21 and the second crystal sheet 22 to form an air gap between the first crystal sheet 21 and the second crystal sheet 22. When the wave plate 20 has extraneous contaminants inside, clean gas can be blown into the air gap to carry the extraneous contaminants inside the wave plate 20 out of the wave plate 20, thereby ensuring the cleanliness of the wave plate 20 and avoiding the long-term existence of extraneous contaminants in the optical device to cause light damage, which is conducive to improving the durability of the optical device.

[0089] For example, during the assembly of the optical device, the first crystal sheet 21, the spacer 23, and the second crystal sheet 22 are arranged in a stack in sequence, so that the first crystal sheet 21 and the second crystal sheet 22 have a certain relative angle around the axial direction, so that the wave plate 20 has a certain polarization characteristic. Then, the wave plate 20 is placed in the channel 12, so that the wave plate 20 and the support part 11 are in contact along the axial direction. Then, the guide ring 30 and the pressing ring 40 are placed in the channel 12 in sequence, and the assembly of the optical device is completed.

[0090] In one possible implementation, referring to Figure 1 、 Figure 3 、 Figure 4 、 Figure 12 、 Figure 14 and Figure 16The spacer ring 23 has at least two air holes 231, each of which penetrates the side wall of the spacer ring 23, so that the at least two air holes 231 can allow airflow to pass through the spacer ring 23. When the wave plate 20 has exogenous contaminants inside, clean gas can be blown into at least one air hole 231, and the clean gas can flow out from another at least one air hole 231, so that the exogenous contaminants inside the wave plate 20 can be taken out of the wave plate 20 by the clean gas, which is conducive to ensuring the cleanliness of the wave plate 20 and avoiding optical damage caused by long-term existence of exogenous contaminants in the optical device, and is conducive to improving the durability of the optical device.

[0091] In an embodiment, the at least two air holes 231 are arranged along the circumference of the spacer ring 23, so that the clean gas can enter from one side of the spacer ring 23 and blow out from the other side, so that the area swept by the clean gas is larger, and the flow path of the clean gas is more single, so that the moving path of the exogenous contaminants in the air gap is consistent, avoiding the formation of turbulence of the clean gas in the air gap, thereby avoiding the diffusion of the exogenous contaminants in the air gap, and improving the cleaning efficiency.

[0092] Compared with the at least two air holes 231 arranged along the axial direction of the spacer ring 23, when the optical device has different design sizes, for example, the length of the spacer ring 23 along the axial direction needs to be the same as the pre-set size, the flow of the clean gas can be increased by increasing the area of the air hole 231, thereby improving the cleaning strength; for example, the area of the air hole 231 needs to be the same as the pre-set area, the length of the spacer ring 23 along the axial direction can be reduced, thereby reducing the volume of the air gap and the volume of the wave plate 20, which is conducive to avoiding the accumulation of exogenous contaminants in the air gap.

[0093] In a possible implementation, referring to Figure 2 , Figure 4 , Figure 9 , Figure 10 , Figure 11 , Figure 13 and Figure 16 , the sleeve 10 is provided with an air inlet hole 13 and an air outlet hole 14, each of which penetrates the side wall of the sleeve 10, and the air inlet hole 13 and the air outlet hole 14 are in communication with the at least two air holes 231 to form an air passage 12, that is, the clean gas can enter the air hole 231 through the air inlet hole 13, and then enter the inside of the wave plate 20 and blow out from the air outlet hole 14, thereby forming an air passage 12 in the optical device, so that when the optical device has exogenous contaminants inside, the wave plate 20 and the sleeve 10 do not need to be disassembled, and the nozzle of the clean gas can be matched with the outside of the sleeve 10 to remove the exogenous contaminants inside the optical device, thereby improving the durability of the optical device and improving the performance of the optical device.

[0094] In one embodiment, the at least two air holes 231 are arranged along the circumference of the partition ring 23, the inlet hole 13 and the outlet hole 14 are arranged along the circumference of the sleeve 10, the inlet hole 13 is communicated with one air hole 231, and the outlet hole 14 is communicated with another air hole 231. The movement of the foreign contaminants in the air gap is irregular due to the flow of the cleaning gas in the air gap, the flow path of the cleaning gas is relatively single, the movement path of the foreign contaminants in the air gap is consistent, and it is ensured that the foreign contaminants do not stay in the light transmission area, thereby improving the cleaning efficiency. It should be noted that the light transmission area refers to the cavity area between the first crystal wafer 21 and the second crystal wafer 22.

[0095] In one possible implementation, referring to Figure 2 , Figure 4 , Figure 9 , Figure 10 , Figure 11 , Figure 13 and Figure 16 , the sleeve 10 is in a cylindrical shape, the inlet hole 13 and the outlet hole 14 are located at the two radial ends of the sleeve 10, so that the path of the cleaning gas entering from the inlet hole 13 and blowing out from the outlet hole 14 is a straight line path in the sleeve 10, so that the movement path of the cleaning gas is shortened while ensuring that the cleaning gas can clean the entire space of the air gap, that is, the coverage area of the cleaning gas is large, which can cover the light transmission area and ensure the cleanliness of the light transmission area.

[0096] In one embodiment, the at least two air holes 231 are arranged along the circumference of the partition ring 23, and the two air holes 231 are located at the two radial ends of the partition ring 23, the inlet hole 13 is communicated with one air hole 231, and the outlet hole 14 is communicated with another air hole 231, so that the flow field of the cleaning gas in the wave plate 20 is uniformly distributed, and the coverage area of the cleaning gas is large, which can cover the light transmission area. When the cleaning gas is blown into the interlayer of the wave plate 20, the cleaning gas can form a gas film protective layer on the inner surfaces of the first crystal wafer 21 and the second crystal wafer 22, thereby ensuring that the foreign contaminants do not stay in the light transmission area, thereby improving the durability of the optical device and improving the performance of the optical device.

[0097] In one possible implementation, referring to Figure 1 , Figure 3 , Figure 4 , Figure 13 and Figure 16The vent hole 231 covers the air inlet hole 13 and the air outlet hole 14, so that the size of the vent hole 231 does not affect the flow of the cleaning gas entering from the air inlet hole 13, and correspondingly, the size of the vent hole 231 does not affect the flow of the cleaning gas blowing out from the air outlet hole 14.

[0098] By designing the shape and size of the air inlet hole 13 and the air outlet hole 14, it is beneficial to control the formation of the gas film protective layer on the inner surface of the first crystal wafer 21 and the second crystal wafer 22 by the cleaning gas, and the cleaning gas at the air outlet hole 14 does not backflow, which does not bring the external source pollutants in the environment from the air outlet of the sleeve 10 to be backflowed and sucked into the interlayer of the wave plate 20, ensuring the cleaning efficiency.

[0099] When designing the shape and size of the air inlet hole 13 and the air outlet hole 14, the internal structure of the sleeve 10 and the wave plate 20 can be simulated according to the simulation software, and the shape and size of the air inlet hole 13 and the air outlet hole 14 are designed, and then the cleaning gas is introduced from the air inlet hole 13. Through the simulation of the simulation software, the flow rate value of the cleaning gas at the light transmission area is measured or calculated, and whether the cleaning gas backflow occurs at the air outlet hole 14. When the shape and size of the air inlet hole 13 and the air outlet hole 14 meet the design requirements, the air inlet hole 13 and the air outlet hole 14 are manufactured according to the experimental values.

[0100] In one possible implementation, please refer to Figure 3 、 Figure 4 、 Figure 10 and Figure 11 The area of the air inlet hole 13 is smaller than the area of the air outlet hole 14. Among them, the area of the air outlet hole 14 is positively correlated with the designed flow rate of the cleaning gas at the center of the crystal wafer inside the wave plate 20.

[0101] By making the area of the air inlet hole 13 smaller than the area of the air outlet hole 14, the pressure at the air outlet hole is higher than the ambient pressure, so that the cleaning gas at the air outlet hole 14 has no backflow phenomenon, while ensuring that the cleaning gas sufficiently covers the light transmission area, the external source pollutants in the environment cannot be backflowed and sucked into the interlayer of the wave plate 20 from the air outlet of the sleeve 10.

[0102] In one embodiment, please refer to Figure 14 、 Figure 15 and Figure 16The number of the air holes 231 is at least four, the at least four air holes 231 are evenly spaced around the partition ring 23, the axis of the air inlet hole 13 and the axis of the air outlet hole 14 respectively coincide with the centers of two symmetrically arranged air holes 231, so that the cleaning gas can form a uniform flow field inside the wave plate 20 interlayer, the cleaning gas is blown into the interlayer of the wave plate 20 from the air inlet hole 13, and then flows out to the environment from the air outlet hole 14, forming an air film protective layer on the inner surface of the first crystal wafer 21 and the second crystal wafer 22, ensuring that exogenous pollutants will not stay in the light passing area.

[0103] In an embodiment, the optical device of the present application works in the ultraviolet wave band, wherein the ultraviolet wave band corresponds to a wavelength in the range of 10nm-400nm in vacuum, and no pollutants are generated in the optical device under the action of high-energy ultraviolet photons, avoiding serious light pollution in the interior of the optical device and causing damage to the wave plate. The optical device has significantly improved light pollution resistance, which is beneficial to improve the durability and performance of the optical device.

[0104] The present application also provides a semiconductor equipment, comprising a workbench and the aforementioned optical device. Figures 1-16 The optical device shown in any embodiment is mounted on the workbench.

[0105] It can be understood that the semiconductor equipment in the present embodiment has the optical device in the above-mentioned embodiments, and therefore, the semiconductor equipment in the present embodiment has all the technical effects of the optical device in the above-mentioned embodiments. Since the technical effects of the optical device have been fully described in the above-mentioned embodiments, they will not be repeated here.

[0106] The above embodiments are only used to illustrate the technical solutions of the present application, but not limit it; although the present application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that they can still modify the technical solutions recorded in the foregoing embodiments, or make equivalent replacements to some technical features; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the scope of the technical solutions of the embodiments of the present application, and should be included in the protection scope of the present application.

Claims

1. An optical device, characterized by The application relates to a wave plate assembly. The application comprises: a sleeve provided with a support part, the sleeve having a channel, the support part being located in the channel; a wave plate located in the channel and abutting against the support part along the axial direction of the sleeve; a guide ring located in the channel and located on the side of the wave plate away from the support part, the guide ring being provided with a first limiting structure, the sleeve being provided with a second limiting structure, the first limiting structure and the second limiting structure cooperating to limit the relative rotation of the guide ring and the sleeve around the axial direction; a pressing ring, at least part of the pressing ring being located in the channel and located on the side of the guide ring away from the wave plate, the pressing ring being fixedly connected with the sleeve, along the axial direction, the pressing ring abutting against the guide ring, the guide ring abutting against the wave plate, the wave plate being fixed between the guide ring and the support part; 2. The optical device of claim 1, wherein, the wave plate comprising a first crystal plate, a second crystal plate and a spacer ring, the first crystal plate and the second crystal plate being arranged in a stack along the axial direction, the spacer ring being clamped between the first crystal plate and the second crystal plate. the second limiting structure comprising a guide groove, the first limiting structure comprising a protrusion matched with the guide groove of the second limiting structure, the protrusion of the first limiting structure being accommodated in the guide groove of the second limiting structure; 3. The optical device of claim 2, wherein, and / or, the second limiting structure comprising a protrusion, the first limiting structure comprising a guide groove matched with the protrusion of the second limiting structure, the protrusion of the second limiting structure being accommodated in the guide groove of the first limiting structure.

4. The optical device of claim 3, wherein, the number of the second limiting structures being at least two, the number of the first limiting structures being at least two, at least two of the first limiting structures being arranged at intervals along the circumferential direction of the guide ring, the first limiting structures and the second limiting structures being arranged in one-to-one correspondence.

5. The optical device according to any of claims 1-4, characterized in that at least two of the first limiting structures being arranged at intervals uniformly around the outer wall of the guide ring.

6. The optical device of claim 5, wherein, the sleeve being provided with a fixing hole, the fixing hole penetrating the side wall of the sleeve, the fixing hole being used for allowing a fixing member to pass through to be fixedly connected with the pressing ring.

7. The optical device of claim 6, wherein, the number of the fixing holes being at least two, at least two of the fixing holes being arranged at intervals along the circumferential direction of the sleeve.

8. The optical device according to any of claims 1-4, characterized in that at least two of the fixing holes being arranged at intervals uniformly around the outer wall of the sleeve.

9. The optical device according to any of claims 1-4, characterized in that the sleeve being in the shape of a cylindrical sleeve, the sleeve being provided with a first threaded structure, the pressing ring being provided with a second threaded structure, the first threaded structure and the second threaded structure being screw-connected.

10. The optical device of claim 9, wherein, the spacer ring having at least two air holes, the at least two air holes penetrating the side wall of the spacer ring.

11. The optical device of claim 10, wherein, the sleeve being provided with an air inlet hole and an air outlet hole, the air inlet hole and the air outlet hole penetrating the side wall of the sleeve, one of the at least two air holes being communicated with the air inlet hole, the other of the at least two air holes being communicated with the air outlet hole.

12. The optical device according to claim 10 or 11, characterized in that the sleeve being in the shape of a cylindrical sleeve, the air inlet hole and the air outlet hole being located at the two radial ends of the sleeve.

13. The optical device according to claim 10 or 11, characterized in that, the air hole communicated with the air inlet hole covering the air inlet hole, the air hole communicated with the air outlet hole covering the air outlet hole. the area of the air inlet hole being smaller than the area of the air outlet hole.

14. The optical device of claim 13, wherein, The number of the vent holes is at least four, and the at least four vent holes are evenly spaced around the partition ring, and the axes of the air inlet hole and the air outlet hole respectively coincide with the centers of two symmetrically arranged vent holes.

15. The optical device according to any of claims 1-4, characterized in that The optical device works in the ultraviolet wave band.

16. A semiconductor device, characterized by comprising: The optical device of any one of claims 1 to 15 is installed on the workbench.