Material reaction system with cleaning module

Abstract

The utility model relates to a material reaction system with a cleaning module, which comprises a reaction kettle and the cleaning module, the cleaning module is connected with the reaction kettle, the cleaning module comprises a water path cleaning module and a gas path cleaning module, and the water path cleaning module and the gas path cleaning module are respectively connected with the reaction kettle. The cleaning module supplies high-pressure water into the reaction kettle and discharges the high-pressure water out of the reaction kettle through the water path cleaning module to clean the reaction kettle, and supplies high-pressure gas into the reaction kettle and discharges the high-pressure gas out of the reaction kettle through the gas path cleaning module to clean the reaction kettle. By arranging the cleaning module, high-pressure water or high-pressure gas is introduced into the reaction kettle to scour the interior of the reaction kettle, so that condensed and precipitated brine substances and impurities are flushed out, and the reaction kettle is cleaned; the water path cleaning module and the gas path cleaning module share a cleaning inlet and a cleaning outlet, so that the possibility of leakage of the reaction kettle due to excessive pipelines is avoided; the cleaning inlet is formed in the top end, and the cleaning outlet is formed in the bottom end, so that cleaning quality and efficiency are improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of material reaction kettles, and particularly relates to a material reaction system with a cleaning module. BACKGROUND

[0002] A brine reaction kettle is a device specially designed for processing and processing brine (an aqueous solution containing high-concentration salt), which has a wide range of applications in many industries.

[0003] In the existing brine reaction process, brine may condense and precipitate, and the deposition of the precipitate for a long time may cause blockage of the pipeline of the reaction device.

[0004] Therefore, the prior art has defects and needs to be improved. SUMMARY

[0005] The present application provides a material reaction system with a cleaning module to solve the problem that in the brine reaction process, brine may condense and precipitate, and the deposition of the precipitate for a long time may cause blockage of the pipeline of the reaction device.

[0006] In a first aspect, the present application provides a material reaction system with a cleaning module, comprising a reaction kettle and a cleaning module, wherein the cleaning module is connected to the reaction kettle, the cleaning module comprises a water route cleaning module and a gas route cleaning module, the water route cleaning module and the gas route cleaning module are respectively connected to the reaction kettle, the cleaning module supplies high-pressure water into the reaction kettle through the water route cleaning module and discharges to clean the reaction kettle, and the cleaning module supplies high-pressure gas into the reaction kettle through the gas route cleaning module and discharges to clean the reaction kettle.

[0007] Optionally, the cleaning module comprises a cleaning inlet and a cleaning outlet, the cleaning inlet is connected to the top end of the reaction kettle, and the cleaning outlet is connected to the bottom end of the reaction kettle.

[0008] Optionally, the water route cleaning module comprises a water supply module and a liquid recovery module, the water supply module is connected to the cleaning inlet, and the liquid recovery module is connected to the cleaning outlet.

[0009] Optionally, the gas route cleaning module comprises a gas supply module and a gas recovery module, the gas supply module is connected to the cleaning inlet, and the gas recovery module is connected to the cleaning outlet.

[0010] Optionally, a heat preservation layer is arranged between the inner wall and the outer wall of the reaction kettle.

[0011] Optionally, the reaction kettle is connected with a first material stirring kettle and a second material stirring kettle, the first material stirring kettle contains a first material and stirs the first material when working, the second material stirring kettle contains a second material and stirs the second material when working, and the reaction kettle stirs and reacts the first material injected from the first material stirring kettle and the second material injected from the second material stirring kettle to form a first intermediate product.

[0012] Optionally, the reaction kettle is connected with an emulsifying device and a finished product kettle, the emulsifying device contains a third material and stirs and emulsifies the third material to form a second intermediate product when working, and the finished product kettle contains a fourth material and stirs and reacts the first intermediate product, the second intermediate product and the fourth material injected to form a final product.

[0013] Optionally, the reaction kettle is provided with an air pressure sensor for detecting the air pressure in the reaction kettle.

[0014] Optionally, the reaction kettle is further provided with a suction mechanism connected with the reaction kettle, the air pressure sensor is provided with an air pressure threshold value, the air pressure sensor acquires an air pressure value in the reaction kettle and compares the air pressure value with the air pressure threshold value, and when the air pressure value is greater than the air pressure threshold value, the air pressure sensor controls the suction mechanism to perform air suction work on the inside of the reaction kettle.

[0015] Optionally, a longitudinal stirring pipe is arranged in the axial direction of the reaction kettle and connected with a liquid cooling mechanism outside the reaction kettle.

[0016] The above technical solution provided by the embodiment of the present application has the following advantages compared with the prior art:

[0017] The embodiment of the present application provides a cleaning module, high-pressure water or high-pressure gas is introduced into the reaction kettle to realize flushing of the inside of the reaction kettle, so that the condensed and precipitated brine and other impurities are flushed out, and the reaction kettle is cleaned; the waterway cleaning module and the gasway cleaning module share a cleaning inlet and a cleaning outlet, so that the possibility of leakage of the reaction kettle caused by too many pipelines is avoided; the cleaning inlet is arranged at the top end and the cleaning outlet is arranged at the bottom end, so that the high-pressure water and the high-pressure gas can more smoothly flush the inside and be discharged, which is beneficial to improving the cleaning quality and efficiency. BRIEF DESCRIPTION OF DRAWINGS

[0018] The drawings incorporated into the specification and forming a part thereof, illustrate embodiments consistent with the present application and, together with the specification, serve to explain the principles of the application.

[0019] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, for those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0020] One or more embodiments are illustrated by way of example with reference numerals in the accompanying drawings. These illustrations do not constitute a limitation on the embodiments. Elements with the same reference numerals in the drawings are denoted as similar elements. Unless otherwise stated, the figures in the drawings are not to be limited by scale.

[0021] Figure 1 A simplified module diagram of the first material stirring tank, the second material stirring tank, the reaction vessel, the emulsification device, and the finished product tank provided in the embodiments of this application.

[0022] Figure 2 A simplified block diagram of the pressure sensor, suction mechanism, and part of the reaction vessel provided in the embodiments of this application.

[0023] Figure 3 A simplified diagram of the cleaning module provided in an embodiment of this application.

[0024] Figure 4 This is a partial three-dimensional view of a material reaction system with a cleaning module provided in an embodiment of this application.

[0025] Figure 5 for Figure 4 A sectional view.

[0026] Figure 6 A perspective view of a heat exchanger provided in an embodiment of this application.

[0027] Figure 7 A simplified diagram of the liquid supply module and heat exchanger provided in the embodiments of this application.

[0028] Figure 8 This is a perspective view of the longitudinal stirring tube, the annular stirring tube, the scraping structure, and the shearing structure provided in the embodiments of this application.

[0029] Explanation of reference numerals in the attached figures:

[0030] 1, first material stirring kettle; 2, second material stirring kettle; 3, reaction kettle; 4, emulsifying device; 5, finished product kettle; 6, air pressure sensor; 7, suction mechanism; 8, liquid recovery mechanism; 9, condensing structure; 10, liquid backflow pipeline; 11, gas recovery pipeline; 12, cleaning module; 13, waterway cleaning module; 14, gasway cleaning module; 15, cleaning inlet; 16, cleaning outlet; 17, water supply module; 18, liquid recovery module; 19, gas supply module; 20, gas recovery module; 21, thermal insulation layer; 23, heat exchanger; 24, liquid supply module; 25, longitudinal stirring pipe; 26, annular stirring pipe; 27, bottom scraping structure; 28, shearing structure; 29, rate control module; 30, low-temperature liquid module; 31, high-temperature liquid module. DETAILED DESCRIPTION

[0031] To make the objectives, technical solutions, and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be described clearly and completely below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by a person of ordinary skill in the art without creative work fall within the protection scope of the present application.

[0032] The following disclosure provides many different embodiments or examples for implementing different structures of the present application. In order to simplify the disclosure of the present application, the components and settings of specific examples are described below. Of course, they are only examples, and the purpose is not to limit the present application. In addition, the present application can repeatedly refer to the reference numerals and / or letters in different examples. Such repetition is for the purpose of simplification and clarity, and does not indicate the relationship between the various embodiments and / or settings discussed.

[0033] For ease of description, spatial relative terms can be used herein to describe the positional relationship or movement of one element or feature relative to another element or feature as shown in the drawings, such as "inner", "outer", "inside", "outside", "below", "under", "above", "on", "front", "back", etc. Such spatial relative terms are intended to include different orientations of the device in use or operation in addition to the orientation depicted in the drawings. For example, if the device in the drawings is turned over or reversed, or the orientation of the device is changed, the directional indications are also changed accordingly, for example: the element described as "below" or "under" other elements or features will be subsequently oriented as "above" or "above" other elements or features. Therefore, the example term "below" can include both upward and downward positions. The device can be additionally oriented (rotated 90 degrees or in other directions) and the spatial relative relationship descriptors used herein are interpreted accordingly.

[0034] In order to solve the technical problems in the prior art, the present application provides a material reaction system with a cleaning module, which can realize flushing of the inside of the reaction kettle by introducing high-pressure water or high-pressure gas into the reaction kettle to flush out the condensed, precipitated brine and other impurities, thereby achieving cleaning of the reaction kettle. The waterway cleaning module and the gasway cleaning module share a cleaning inlet and a cleaning outlet, which avoids the possibility of leakage of the reaction kettle caused by excessive pipeline settings. The cleaning inlet is arranged at the top end and the cleaning outlet is arranged at the bottom end, so that the high-pressure water and the high-pressure gas can more smoothly flush and discharge the inside, which is beneficial to improve the cleaning quality and efficiency.

[0035] Figures 1-8The material reaction system with a cleaning module provided by the embodiment of the application comprises a first material stirring tank 1, a second material stirring tank 2, a reaction tank 3, an emulsifying device 4 and a finished product tank 5. The first material stirring tank 1 and the second material stirring tank 2 are connected with the reaction tank 3 respectively, the reaction tank 3 and the emulsifying device 4 are connected with the finished product tank 5 respectively. The first material stirring tank 1 contains the first material and stirs the first material during work. The second material stirring tank 2 contains the second material and stirs the second material during work. The reaction tank 3 stirs and reacts the first material injected from the first material stirring tank 1 and the second material injected from the second material stirring tank 2 during work to form a first intermediate product. The emulsifying device 4 contains the third material and stirs and emulsifies the third material during work to form a second intermediate product. The finished product tank 5 contains the fourth material and stirs and reacts the first intermediate product, the second intermediate product and the fourth material injected during work to form a final product. The first material stirring tank 1, the second material stirring tank 2, the emulsifying device 4 and the finished product tank 5 can be respectively fed to avoid the safety hazard caused by the early mixing reaction of the materials, the increase of the gas pressure and the generation of a large amount of gas caused by feeding to one place, and to provide a safe and efficient production system for brine reaction. The final product is discharged from the discharge port of the finished product tank 5.

[0036] Please refer to Figure 2 The reaction tank 3 is provided with a gas pressure sensor 6 and a suction mechanism 7. The gas pressure sensor 6 is used for detecting the gas pressure in the reaction tank 3. The suction mechanism 7 is connected with the reaction tank 3. The gas pressure sensor 6 is provided with a gas pressure threshold value. The gas pressure sensor 6 obtains the gas pressure value in the reaction tank 3 and compares the gas pressure value with the gas pressure threshold value. When the gas pressure value is greater than the gas pressure threshold value, the gas pressure sensor 6 controls the suction mechanism 7 to perform the gas suction work on the inside of the reaction tank 3. The gas pressure sensor 6 and the suction mechanism 7 can control the gas pressure in the reaction tank 3 in real time, avoid the explosion of the reaction tank 3 caused by the excessive gas pressure in the reaction tank 3, and improve the safety factor. At the same time, the gas pressure is maintained within a preset range to promote the full reaction of the materials and reduce the generation of more foam. Preferably, the suction mechanism 7 is a gas suction pump structure, but is not limited thereto. Other structures for gas suction can also be used. Further preferably, the suction mechanism 7 is connected with the top of the reaction tank 3. In this way, when the suction mechanism 7 performs the gas suction work, it has a high probability of sucking away the gas in the reaction tank 3 instead of the liquid such as the materials, thereby effectively reducing the pressure and avoiding the waste of the materials caused by sucking away a large amount of liquid.

[0037] Please continue to refer to Figure 2The material reaction system with the cleaning module of the present application further comprises a liquid recovery mechanism 8 connected with the suction mechanism 7 for recovering the liquid small molecules sucked out with the gas. By arranging the liquid recovery mechanism 8, the liquid small molecules sucked out by the suction mechanism 7 can flow back into the reaction kettle 3, thus avoiding the waste caused by the loss of the material and improving the use efficiency of the material. Further, the liquid recovery mechanism 8 comprises a condensing structure 9 connected with the suction mechanism 7, a liquid backflow pipeline 10 and a gas recovery pipeline 11, one end of the liquid backflow pipeline 10 and one end of the gas recovery pipeline 11 are respectively connected with the condensing structure 9, and the other end of the liquid backflow pipeline 10 is connected with the reaction kettle 3. The liquid small molecules are condensed into larger liquid beads by the condensing structure 9 and flow back into the reaction kettle 3 through the liquid backflow pipeline 10, and the gas is transmitted to the treatment device outside through the gas recovery pipeline 11.

[0038] Please continue to refer to Figure 3 The material reaction system with the cleaning module of the present application further comprises a cleaning module 12 connected with the reaction kettle 3 for supplying high-pressure water or high-pressure gas into the reaction kettle 3 and discharging to clean the reaction kettle 3. The arrangement of the cleaning module 12 realizes high-intensity flushing inside the reaction kettle 3 to flush out the condensed and precipitated brine substances and other impurities, thus achieving the cleaning of the reaction kettle 3. Further, the cleaning module 12 comprises a waterway cleaning module 13 and a gasway cleaning module 14, the waterway cleaning module 13 and the gasway cleaning module 14 are respectively connected with the reaction kettle 3, the waterway cleaning module 13 is used for supplying high-pressure water into the reaction kettle 3 and discharging to clean the reaction kettle 3, and the gasway cleaning module 14 is used for supplying high-pressure gas into the reaction kettle 3 and discharging to clean the reaction kettle 3. It can be understood that the gas and water supplied by the cleaning module 12 are both food-grade.

[0039] Please refer to Figure 4 The cleaning module 12 comprises a cleaning inlet 15 and a cleaning outlet 16, the cleaning inlet 15 is connected at the top end of the reaction kettle 3, and the cleaning outlet 16 is connected at the bottom end of the reaction kettle 3. The cleaning inlet 15 arranged at the top end of the reaction kettle 3 can make the high-pressure gas or high-pressure water smoothly enter without being easily blocked by the material, and also without the possibility of material backflow and damage to the cleaning module 12. The waterway cleaning module 13 comprises a water supply module 17 and a liquid recovery module 18, the water supply module 17 is connected with the cleaning inlet 15, and the liquid recovery module 18 is connected with the cleaning outlet 16. The gasway cleaning module 14 comprises a gas supply module 19 and a gas recovery module 20, the gas supply module 19 is connected with the cleaning inlet 15, and the gas recovery module 20 is connected with the cleaning outlet 16. That is, the waterway cleaning module 13 and the gasway cleaning module 14 share the cleaning inlet 15 and the cleaning outlet 16, thus avoiding the possibility of leakage of the reaction kettle 3 caused by the arrangement of too many pipelines.

[0040] Please refer to Figures 5-7 A heat preservation layer 21 is arranged between the inner wall and the outer wall of the reaction kettle 3, and a heat preservation cavity is arranged in the heat preservation layer 21. The heat preservation cavity is connected with a heat exchanger 23, the heat exchanger 23 is connected with a liquid supply module 24, the liquid supply module 24 is used to provide low-temperature water and / or high-temperature water to the heat exchanger 23, and the heat exchanger 23 is used to inject the low-temperature water or the high-temperature water provided by the liquid supply module 24 into the heat preservation cavity, or is used to inject the low-temperature water and the high-temperature water mixed and heat-exchanged into the heat preservation cavity, so that the injected water meets the reaction temperature of the material at the inner wall of the reaction kettle 3, and the reaction efficiency is improved. Specifically, the liquid supply module 24 includes a low-temperature liquid module 30 and a high-temperature liquid module 31, and the low-temperature liquid module 30 and the high-temperature liquid module 31 are respectively connected with the heat exchanger 23. The low-temperature liquid module 30 is used to provide low-temperature liquid, and the high-temperature liquid module 31 is used to provide high-temperature liquid. By providing high-temperature liquid or low-temperature liquid or mixing the two to provide for the heat preservation cavity, it is avoided that only providing high-temperature liquid or low-temperature liquid causes that the temperature demand of the material at the inner wall of the reaction kettle 3 cannot be met. By arranging the heat preservation layer 21 between the inner wall and the outer wall of the reaction kettle 3, and by cooperating the liquid supply module 24 with the heat exchanger 23 to inject water meeting the required temperature of the reaction into the heat preservation cavity, it is beneficial to promote that the material located at the inner wall can fully react, and it is beneficial to improve the overall reaction efficiency.

[0041] Please refer to Figure 8 A longitudinal stirring pipe 25, a ring-shaped stirring pipe 26, a bottom scraping structure 27 and a shearing structure 28 in the shape of an overall "eye" are arranged in the reaction kettle 3. The longitudinal stirring pipe 25 is arranged along the axial direction of the reaction kettle 3. The ring-shaped stirring pipe 26 is connected to the bottom of the longitudinal stirring pipe 25. The bottom scraping structure 27 is arranged at the bottom of the longitudinal stirring pipe 25 and is connected with the ring-shaped stirring pipe 26. The shearing structure 28 is connected to the side of the longitudinal stirring pipe 25. The ring-shaped stirring pipe 26 is used to drive the bottom scraping structure 27 to rotate while providing a certain stirring function. The bottom scraping structure 27 is used to scrape off the material adhered to the bottom of the reaction kettle 3 when the longitudinal stirring pipe 25 moves. The shearing structure 28 is used to shear the large block of material when the longitudinal stirring pipe 25 moves. By arranging the longitudinal stirring pipe 25, the reaction rate is accelerated and the reaction quality is improved. By arranging the bottom scraping structure 27, the material located at the bottom of the reaction kettle 3 can be scraped off, so that the adhesion and residue of the material are avoided, and the utilization rate of the material is affected. By arranging the shearing structure 28, most of the large block of reactants in the reaction kettle 3 can be sheared, so that the quality of the intermediate product is improved. Preferably, the shearing structure 28 is in the shape of a disc, and a shearing knife extends outward from the outer periphery of the shearing structure 28. However, the shearing structure 28 can also be in other structures, and the specific structure can be determined according to the properties of the large block of reactants.

[0042] In the present application, the longitudinal stirring pipe 25 is in a tubular hollow structure, specifically in a longitudinally arranged serpentine pipe structure, which is in communication with the annular stirring pipe 26, and at the same time, a liquid cooling mechanism (not shown in the figure) and a rate control module 29 are arranged outside the reaction kettle 3, and the longitudinal stirring pipe 25 and the annular stirring pipe 26 are connected with the liquid cooling mechanism outside the reaction kettle 3. The longitudinal stirring pipe 25 in the longitudinally arranged serpentine pipe structure occupies a larger area size on the rotating surface, which can better realize the stirring function, and at the same time, the longitudinal stirring pipe 25 is provided with cooling liquid by the liquid cooling mechanism to realize the heat exchange between the longitudinal stirring pipe and the reaction cavity, so that the temperature in the reaction kettle 3 can be maintained at the required temperature for reaction, which is beneficial to promote the full reaction of the material and improve the reaction efficiency. The rate control module 29 is connected with the longitudinal stirring pipe 25, and the rate control module 29 is used for controlling the rotating speed of the longitudinal stirring pipe 25.

[0043] In the above embodiments, the description of each embodiment has its own emphasis, and the parts not described in detail in a certain embodiment can be referred to the related description of other embodiments.

[0044] In the description of the present application, it should be understood that the orientations or positional relationships indicated by the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise" and the like are based on the orientations or positional relationships shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and therefore cannot be understood as indicating or implying that the devices or elements indicated must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the present application.

[0045] In addition, the terms "first" and "second" are only for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined with "first" and "second" can explicitly or implicitly include one or more of the features. In the description of the present application, the meaning of "multiple" is two or more, unless otherwise specifically limited.

[0046] In the present application, unless otherwise specifically defined and limited, the terms "mounting", "connection", "connection", "fixing" and the like should be understood in a broad sense, for example, it can be connected, or detachable, or integrated; it can be mechanical connection, or electrical connection; it can be directly connected, or indirectly connected through an intermediate medium, or the internal communication of two elements or the interaction relationship between two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0047] In the present application, unless specifically defined otherwise, the expression "on" or "under" of a first feature with respect to a second feature can include that the first and second features are in direct contact, or that the first and second features are not in direct contact but are in contact through another feature between them. Moreover, the expression "on", "above" and "over" of a first feature with respect to a second feature includes that the first feature is directly above and obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. The expression "under", "below" and "underneath" of a first feature with respect to a second feature includes that the first feature is directly below and obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.

[0048] In the description of the present specification, the description of the terms "one embodiment", "some embodiments", "an example", "a specific example", or "some examples" and the like means that the specific feature, structure, material or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present application. In the present specification, the illustrative description of the above terms should not be understood as necessarily referring to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in a suitable manner. In addition, a person skilled in the art can combine and combine different embodiments or examples described in the present specification.

[0049] Obviously, those skilled in the art can make various modifications and variations to the present application without departing from the spirit and scope of the present application. Thus, any modifications and variations of the present application that fall within the scope of the claims of the present application and their equivalents are intended to be included in the present application.

[0050] The above is a specific embodiment of the present application, but the protection scope of the present application is not limited thereto, and any person skilled in the art can easily think of various equivalent modifications or replacements within the technical scope disclosed by the present application, and these modifications or replacements should be included in the protection scope of the present application. Therefore, the protection scope of the present application should be subject to the protection scope of the claims.

Claims

1. A material reaction system having a cleaning module, characterized by: The utility model provides a reaction kettle and a cleaning module, the cleaning module is connected with the reaction kettle, the cleaning module includes waterway cleaning module and gas path cleaning module, the waterway cleaning module and gas path cleaning module are connected with the reaction kettle respectively, the cleaning module supplies high pressure water body to the reaction kettle and realizes the cleaning of the reaction kettle through the waterway cleaning module, and realizes the cleaning of the reaction kettle through the gas path cleaning module by supplying high pressure gas to the reaction kettle and discharging.

2. The material reaction system with a cleaning module according to claim 1, characterized in that: The cleaning module includes a cleaning inlet and a cleaning outlet, the cleaning inlet is connected to the top end of the reaction kettle, and the cleaning outlet is connected to the bottom end of the reaction kettle.

3. The material reaction system with a cleaning module of claim 2, wherein: The waterway cleaning module includes a water supply module and a liquid recovery module, the water supply module is connected to the cleaning inlet, and the liquid recovery module is connected to the cleaning outlet.

4. The material reaction system with a cleaning module of claim 2, wherein: The gas path cleaning module includes a gas supply module and a gas recovery module, the gas supply module is connected to the cleaning inlet, and the gas recovery module is connected to the cleaning outlet.

5. The material reaction system with a cleaning module of claim 1, wherein: A heat preservation layer is arranged between the inner wall and the outer wall of the reaction kettle.

6. The material reaction system with a cleaning module of claim 1, wherein: The utility model also includes a first material stirring kettle and a second material stirring kettle, the first material stirring kettle and the second material stirring kettle are respectively connected to the reaction kettle, the first material stirring kettle contains a first material and stirs the first material when working, the second material stirring kettle contains a second material and stirs the second material when working, and the reaction kettle stirs and reacts the first material injected from the first material stirring kettle and the second material injected from the second material stirring kettle when working to form a first intermediate product.

7. The material reaction system with a cleaning module of claim 6, wherein: The utility model also includes an emulsifying device and a finished product kettle, the reaction kettle and the emulsifying device are respectively connected to the finished product kettle, the emulsifying device contains a third material and stirs and emulsifies the third material when working to form a second intermediate product, and the finished product kettle contains a fourth material and stirs and reacts the injected first intermediate product, second intermediate product, and fourth material when working to form a final product.

8. The material reaction system with a cleaning module of claim 1, wherein: A gas pressure sensor is arranged on the reaction kettle, and the gas pressure sensor is used to detect the gas pressure in the reaction kettle.

9. The material reaction system with a cleaning module of claim 8, wherein: The reaction kettle is also provided with a suction mechanism, the suction mechanism is connected to the reaction kettle, a gas pressure threshold value is arranged in the gas pressure sensor, the gas pressure sensor obtains the gas pressure value in the reaction kettle and compares the gas pressure value with the gas pressure threshold value, when the gas pressure value is greater than the gas pressure threshold value, the gas pressure sensor controls the suction mechanism to perform air suction work on the inside of the reaction kettle.

10. The material reaction system with a cleaning module of claim 1, wherein: A longitudinal stirring pipe is arranged in the axial direction of the reaction kettle, and the longitudinal stirring pipe is connected to a liquid cooling mechanism outside the reaction kettle.

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