Chemical mechanical polishing equipment

Abstract

The utility model discloses chemical mechanical polishing equipment which comprises a front unit, a rear unit, a control unit and a control unit, and the front unit is used for detecting a to-be-polished part; the conveying mechanism comprises a first six-axis mechanical arm, the first six-axis mechanical arm comprises a first rotating seat and a first six-connecting-rod assembly rotationally connected to the first rotating seat, and the first six-connecting-rod assembly can do telescopic motion and / or pitching motion; the first six-axis mechanical arm is used for conveying the to-be-polished part to the polishing unit, and the polishing unit is used for polishing the to-be-polished part, so that the to-be-polished part becomes a polished part; the first six-axis mechanical arm is further used for conveying the polished part to the cleaning unit, and the cleaning unit is used for cleaning the polished part; and the front unit is also used for detecting the cleaned polished part. According to the invention, each unit in the equipment can be compactly arranged.

Description

Technical Field

[0001] This application relates to the field of chemical mechanical polishing technology, and more particularly to a chemical mechanical polishing device. Background Technology

[0002] Chemical mechanical polishing (CMP) is one of the key technologies for semiconductor surface processing. Related technologies typically include an Equipment Front-End Module (EFEM), a polishing module, a cleaning module, and a transfer mechanism. The transfer mechanism is used to transfer wafers between the EFEM, polishing, and cleaning modules.

[0003] In related technologies, the transmission mechanism typically includes a cylindrical coordinate robot, which typically includes a rotary axis, a telescopic arm, and a hand. The rotary axis extends vertically along its axial direction, the telescopic arm extends horizontally, and the telescopic arm is movably mounted on the rotary axis along its axial direction. The hand is movably mounted on the telescopic arm along its extension direction.

[0004] For a cylindrical coordinate robot to achieve long-distance horizontal transmission, the telescopic arm needs to have a correspondingly long horizontal length. However, a horizontally extending and long telescopic arm results in a large turning radius for the cylindrical coordinate robot in the horizontal direction, which in turn leads to a large space occupied by the cylindrical coordinate robot within the equipment. This also makes it impossible to achieve a compact layout of the various modules in the chemical mechanical polishing equipment. Utility Model Content

[0005] In view of the above-mentioned shortcomings in the related technologies, this application provides a chemical mechanical polishing device to solve the problem that the modules in the chemical mechanical polishing device of the related technologies cannot achieve a compact layout.

[0006] To address the aforementioned technical problems, in a first aspect, this application provides a chemical mechanical polishing apparatus, which includes:

[0007] A pre-processor unit, which is used to detect the workpiece to be polished;

[0008] The transmission mechanism includes a first six-axis manipulator, which includes a first rotary seat and a first six-bar linkage assembly rotatably connected to the first rotary seat. The first six-bar linkage assembly is capable of telescopic movement and / or pitching movement.

[0009] A polishing unit, wherein the first six-axis robot is used to transfer the detected workpiece to be polished to the polishing unit, and the polishing unit is used to polish the workpiece to be polished so that the workpiece to be polished becomes a polished workpiece;

[0010] The cleaning unit, the first six-axis robot arm is also used to transfer the polished part to the cleaning unit, the cleaning unit is used to clean the polished part, and the front unit is also used to inspect the cleaned polished part.

[0011] In a possible implementation of the first aspect, the polishing unit includes two polishing modules spaced apart, with a first channel segment between the two polishing modules, and each polishing module includes at least one polishing module for polishing the workpiece to be polished.

[0012] In a possible implementation of the first aspect, the chemical mechanical polishing equipment further includes a first temporary storage module, and the transmission mechanism further includes a second six-axis manipulator. The second six-axis manipulator includes a second rotary seat and a second six-bar linkage assembly rotatably connected to the second rotary seat. The second six-bar linkage assembly is capable of telescopic movement and / or pitching movement.

[0013] The first six-axis robot is used to transfer the detected workpiece to be polished to the first temporary storage module, and the second six-axis robot is used to transfer the workpiece to be polished in the first temporary storage module to the polishing module, so that the first six-axis robot indirectly transfers the detected workpiece to be polished to the polishing module.

[0014] In one possible implementation of the first aspect, the first channel segment has a first inner bottom wall, on which a first vertical mounting surface is provided, and the second rotating seat is mounted sideways to the first vertical mounting surface; or...

[0015] The chemical mechanical polishing equipment includes a housing with an inner top wall, and the second rotating seat is inverted on the inner top wall.

[0016] In one possible implementation of the first aspect, a second six-axis robot is provided, which is used to transfer the workpiece to be polished and the polished workpiece between the first temporary storage module and the two polishing modules; or...

[0017] There are two second six-axis robotic arms. One second six-axis robotic arm is used to transfer the workpiece to be polished and the polished workpiece between the first temporary storage module and one of the polishing modules. The other second six-axis robotic arm is used to transfer the workpiece to be polished and the polished workpiece between the first temporary storage module and the other polishing module.

[0018] In one possible implementation of the first aspect, the cleaning unit includes two cleaning modules spaced apart, with a second channel segment between the two cleaning modules. The length direction of the second channel segment is a first direction. Each cleaning module includes at least one cleaning module for cleaning the polished part.

[0019] In a possible implementation of the first aspect, the front unit is located on one side of the two cleaning modules in the first direction, and the polishing unit is located on the other side of the two cleaning modules in the first direction.

[0020] In one possible implementation of the first aspect, a single six-axis robot is provided, which is used to transfer the workpiece to be polished and the polished workpiece between the front unit, the polishing unit, and the two cleaning modules; or...

[0021] Two first six-axis robotic arms are provided. One first six-axis robotic arm is used to transfer the workpiece to be polished and the polished workpiece between the front unit, the polishing unit and a cleaning module. The other first six-axis robotic arm is used to transfer the workpiece to be polished and the polished workpiece between the front unit, the polishing unit and another cleaning module.

[0022] In one possible implementation of the first aspect, a first six-axis robot is provided, which is located in the middle of the second channel segment in the first direction. The first six-axis robot is also used to transfer the polished part within each of the cleaning modules of the two cleaning modules.

[0023] In one possible implementation of the first aspect, two first six-axis robots are provided, one of which is also used to transfer the polished part within the cleaning module of one of the cleaning modules, and the other of which is also used to transfer the polished part within the cleaning module of another of the cleaning modules.

[0024] In one possible implementation of the first aspect, the second channel segment has a second inner bottom wall, on which a second vertical mounting surface is provided, and the first rotating seat is mounted sideways to the second vertical mounting surface; or...

[0025] The chemical mechanical polishing equipment includes a housing with an inner top wall, and the first rotating seat is inverted and mounted on the inner top wall.

[0026] In one possible implementation of the first aspect, the chemical mechanical polishing equipment further includes a second temporary storage module, which is used to temporarily store the workpiece to be polished detected by the front unit;

[0027] The first six-axis robot is also used to transfer the detected workpiece to be polished from the second temporary storage module to the polishing unit.

[0028] Compared with related technologies, this application has at least the following beneficial effects:

[0029] In this application, when the chemical mechanical polishing equipment performs chemical mechanical polishing, both the workpiece to be polished and the polished workpiece are wafers. The first six-axis robot in the transfer mechanism can transfer the wafer to be polished detected by the pre-unit to the polishing unit so that the polishing unit can polish the wafer to be polished. After polishing, the first six-axis robot can transfer the polished wafer to the cleaning unit so that the cleaning unit can clean the polished wafer. After cleaning, the pre-unit can detect the cleaned polished wafer.

[0030] Compared with related technologies, this application has the advantage that the first six-axis manipulator includes a first rotary seat and a first six-bar linkage assembly rotatably connected to the first rotary seat. Since the first six-bar linkage assembly can perform telescopic and / or pitching movements, when the first six-axis manipulator needs to rotate, its horizontal dimensions can be reduced through the telescopic and / or pitching movements of the first six-bar linkage assembly, thereby reducing the turning radius. This is beneficial for the first six-axis manipulator to occupy less space in the equipment, and thus facilitates a compact layout of the various units in the chemical mechanical polishing equipment.

[0031] In addition, firstly, the longer the extension distance of a traditional robotic arm, the larger its turning radius will be, but its extension speed must be reduced, otherwise the robotic arm will easily shake. However, for the six-axis robotic arm in this application, its extension speed is not affected by the extension distance, and it can always maintain a relatively fast extension speed, thereby improving the overall productivity of the equipment. At the same time, it can also maintain stable movement at a relatively fast extension speed.

[0032] Secondly, polishing slurries are corrosive and prone to crystallization. Furthermore, traditional robotic arms cannot be side-mounted or flipped, making them susceptible to contamination by the polishing slurry during wafer transfer. Therefore, waterproofing is necessary for traditional robotic arms. In contrast, the six-axis robotic arm of this application allows for convenient flipping and side-mounting, preventing contamination of the robotic arm body with polishing slurry during wafer transfer and eliminating the need for additional waterproofing. Attached Figure Description

[0033] To more clearly illustrate the technical solutions in the embodiments of this application, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0034] Figure 1 A schematic diagram of the chemical mechanical polishing apparatus provided in the embodiments of this application;

[0035] Figure 2 One of the schematic diagrams provided in this application illustrates the use of a first six-axis robotic arm for transmission.

[0036] Figure 3 A second schematic diagram illustrating the use of a first six-axis robotic arm for transmission, provided as an embodiment of this application;

[0037] Figure 4 One of the schematic diagrams provided for transmission using a second six-axis robot arm in an embodiment of this application;

[0038] Figure 5 A second schematic diagram illustrating the use of a second six-axis robotic arm for transmission, provided as an embodiment of this application;

[0039] Figure 6 The third schematic diagram illustrating the use of a second six-axis robotic arm for transmission in an embodiment of this application;

[0040] Figure 7 A schematic diagram showing a second six-axis robotic arm provided for an embodiment of this application;

[0041] Figure 8 A schematic diagram showing two second six-axis robotic arms provided for an embodiment of this application;

[0042] Figure 9 A schematic diagram showing a first six-axis robotic arm mounted on the side, provided for an embodiment of this application;

[0043] Figure 10 A schematic diagram showing an inverted first six-axis robotic arm provided for an embodiment of this application;

[0044] Figure 11 A schematic diagram showing two inverted first six-axis robotic arms provided for an embodiment of this application;

[0045] Figure 12 A schematic diagram illustrating the vertical transport of a polished part according to an embodiment of this application;

[0046] Figure 13 This is a schematic diagram of the horizontal transfer of a polished part provided in an embodiment of this application.

[0047] Explanation of reference numerals in the attached figures:

[0048] 1-Front-end unit;

[0049] 2-Polishing module;

[0050] 3-Cleaning module;

[0051] 4-First six-axis manipulator; 41-First rotary seat; 42-First six-link assembly;

[0052] 5-First channel section; 51-First vertical mounting surface;

[0053] 6-Second six-axis robot; 61-Second rotary seat; 62-Second six-link assembly;

[0054] 7-First temporary storage module;

[0055] 8- Parts to be polished;

[0056] 9 - Polished parts;

[0057] 10 - Second channel section; 101 - Second vertical mounting surface;

[0058] 20 - Second temporary storage module. Detailed Implementation

[0059] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0060] In this application, the terms "upper," "lower," "left," "right," "front," "rear," "top," "bottom," "inner," "outer," "vertical," "horizontal," "lateral," and "longitudinal" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. These terms are primarily for the purpose of better describing this application and its embodiments, and are not intended to limit the indicated device, element, or component to having a specific orientation, or to be constructed and operated in a specific orientation.

[0061] Furthermore, in addition to indicating location or positional relationship, some of the aforementioned terms may also have other meanings. For example, the term "above" may also be used in some cases to indicate a certain dependency or connection relationship. Those skilled in the art can understand the specific meaning of these terms in this application based on the specific circumstances.

[0062] Furthermore, the terms "installation," "setup," "equipped with," "connection," and "linked" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral structure; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium, or an internal connection between two devices, components, or parts. Those skilled in the art can understand the specific meaning of these terms in this application based on the specific circumstances.

[0063] Furthermore, the terms "first," "second," etc., are primarily used to distinguish different devices, elements, or components (which may be the same or different in specific type and construction), and are not intended to indicate or imply the relative importance or quantity of the indicated devices, elements, or components. Unless otherwise stated, "a plurality of" means two or more.

[0064] As described in the background section of this application, chemical mechanical polishing (CMP) is one of the key technologies for semiconductor surface processing. In related technologies, CMP equipment typically includes an Equipment Front-End Module (EFEM), a polishing module, a cleaning module, and a transfer mechanism, wherein the transfer mechanism is used to transfer wafers between the EFEM, polishing module, and cleaning module.

[0065] In related technologies, the transmission mechanism typically includes a cylindrical coordinate robot, which typically includes a rotary axis, a telescopic arm, and a hand. The rotary axis extends vertically along its axial direction, the telescopic arm extends horizontally, and the telescopic arm is movably mounted on the rotary axis along its axial direction. The hand is movably mounted on the telescopic arm along its extension direction.

[0066] For a cylindrical coordinate robot to achieve long-distance horizontal transmission, the telescopic arm needs to have a correspondingly long horizontal length. However, a horizontally extending and long telescopic arm results in a large turning radius for the cylindrical coordinate robot in the horizontal direction, which in turn leads to a large space occupied by the cylindrical coordinate robot within the equipment. This also makes it impossible to achieve a compact layout of the various modules in the chemical mechanical polishing equipment.

[0067] Example 1

[0068] In view of the above-mentioned problems, this application provides a chemical mechanical polishing device to solve the problem that the modules in the chemical mechanical polishing device of the related art cannot be arranged in a compact manner.

[0069] The technical solution of this application will be further described below with reference to specific embodiments and accompanying drawings:

[0070] like Figure 1 As shown, the chemical mechanical polishing (CMP) equipment includes a pre-processing unit 1, a polishing unit, a cleaning unit, and a transfer mechanism. The transfer mechanism includes a first six-axis robot 4, which comprises a first rotary base 41 and a first six-bar linkage 42 rotatably connected to the first rotary base 41. The first six-bar linkage 42 is capable of telescopic and / or pitching movements. The pre-processing unit 1 is used to detect the workpiece 8 to be polished. The first six-axis robot 4 is used to transfer the detected workpiece 8 to the polishing unit, and the polishing unit is used to polish the workpiece 8 to become a polished workpiece 9.

[0071] The first six-axis robot 4 is also used to transfer the polished part 9 to the cleaning unit, the cleaning unit is used to clean the polished part 9, and the front unit 1 is also used to inspect the cleaned polished part 9.

[0072] In this application, when the chemical mechanical polishing equipment performs chemical mechanical polishing, both the workpiece to be polished 8 and the polished workpiece 9 are wafers. The first six-axis robot 4 in the transfer mechanism can transfer the wafer to be polished detected by the front unit 1 to the polishing unit so that the polishing unit can polish the wafer to be polished. After polishing, the first six-axis robot 4 can transfer the polished wafer to the cleaning unit so that the cleaning unit can clean the polished wafer. After cleaning, the front unit 1 can detect the cleaned polished wafer.

[0073] Compared with related technologies, this application has the advantage that the first six-axis manipulator 4 includes a first rotating base 41 and a first six-bar linkage 42 rotatably connected to the first rotating base 41. Since the first six-bar linkage 42 can perform telescopic and / or pitching movements, when the first six-axis manipulator 4 needs to rotate, its horizontal dimensions can be reduced through the telescopic and / or pitching movements of the first six-bar linkage 42, thereby reducing the turning radius. This is beneficial for the first six-axis manipulator 4 to occupy less space in the equipment, and thus facilitates a compact layout of the various units in the chemical mechanical polishing equipment.

[0074] For the workpiece 8 to be polished and the polished workpiece 9, this embodiment uses a wafer as an example for explanation. In other embodiments, the workpiece 8 to be polished and the polished workpiece 9 can be any other object. This application embodiment does not specifically limit this.

[0075] In a preferred embodiment, the first six-axis manipulator 4 is capable of telescopic and pitching movements.

[0076] With this configuration, on the one hand, the first six-axis robot 4 can have a large stroke in the vertical direction through the telescopic and pitching movements of the first six-link assembly 42, so that the units in the equipment do not need to be kept at the same height. Even when there is a large height difference between different units, wafer transfer can still be completed. That is, the first six-axis robot 4 is suitable for high-altitude scenarios.

[0077] On the other hand, compared with the robotic arms in related technologies, the transmission distance of the robotic arms in related technologies matches their rotation radius while occupying the same rotation radius. However, after the telescopic and pitching movements of the first six-axis robotic arm 4 through the first six-link assembly 42, its transmission distance can exceed its rotation radius. Moreover, the transmission distance of the first six-axis robotic arm 4 can usually reach twice that of the robotic arms in related technologies, thus having a longer transmission distance. In other words, the first six-axis robotic arm 4 is suitable for long-distance scenarios.

[0078] Furthermore, this application does not specifically limit the structure of the first six-bar linkage 42. Since adjacent links in the first six-bar linkage 42 are connected by joints, and since each joint can perform simultaneous or sequential actions at multiple angles, the first six-axis robot 4 can be adapted to multi-angle scenarios through the actions of each joint.

[0079] For the pre-processor unit 1, the polishing unit, and the cleaning unit, the embodiments of this application do not specifically limit the structure of each unit.

[0080] For the polishing unit, further, such as Figure 1 As shown, the polishing unit includes two polishing modules spaced apart, with a first channel segment 5 between the two polishing modules. Each polishing module includes at least one polishing module 2, which is used to polish the workpiece 8 to be polished.

[0081] This configuration allows for multiple polishing modules 2, enabling the polishing of the workpiece 8 by multiple modules 2 simultaneously. Each polishing module 2 can perform polishing operations concurrently, improving the efficiency of the chemical mechanical polishing equipment and consequently increasing production output. The two spaced-apart polishing modules not only optimize the arrangement of the polishing modules 2 within the equipment, ensuring a neat and compact layout, but also facilitate maintenance and repair of the polishing modules 2 via the first channel section 5. Furthermore, it facilitates the transfer of the workpiece 8 to be polished and the already polished workpiece 9.

[0082] In this embodiment, as Figure 1 As shown, each polishing module includes two polishing modules 2. In other embodiments, each polishing module may also include one, three or more polishing modules 2. This application does not specifically limit this.

[0083] like Figure 1 As shown, the chemical mechanical polishing equipment also includes a first temporary storage module 7, and the transmission mechanism also includes a second six-axis manipulator 6. The second six-axis manipulator 6 includes a second rotary seat 61 and a second six-bar linkage 62 rotatably connected to the second rotary seat 61. The second six-bar linkage 62 can perform telescopic movement and / or pitching movement.

[0084] like Figure 2 and Figure 3 As shown, the first six-axis robot 4 is used to transfer the detected workpiece 8 to be polished to the first temporary storage module 7, such as... Figure 4 , Figure 5 and Figure 6 As shown, the second six-axis robot 6 is used to transfer the workpiece 8 to be polished in the first temporary storage module 7 to the polishing module 2, so that the first six-axis robot 4 can indirectly transfer the detected workpiece 8 to the polishing module 2.

[0085] Firstly, the second six-axis robot 6 transfers the workpieces 8 to be polished to each polishing module 2. This not only facilitates the transfer of the workpieces 8 to each polishing module 2, but also eliminates the need for the first six-axis robot 4 to directly transfer the workpieces 8 to each polishing module 2. This reduces the transfer distance of the first six-axis robot 4, thereby reducing its turning radius and facilitating a compact layout of the modules within the equipment. Secondly, since the second six-link assembly 62 can perform telescopic and / or pitching movements, it also has a smaller turning radius, similar to the first six-axis robot 4. Consequently, the second six-axis robot 6 also contributes to a compact layout of the units within the equipment. Thirdly, by setting up the first temporary storage module 7, indirect transmission between the workpiece to be polished 8 and the polished workpiece 9 can be realized between the first six-axis robot 4 and the second six-axis robot 6. There is no need for the first six-axis robot 4 to directly transmit the workpiece to be polished 8 to the second six-axis robot 6, which helps to avoid interference between the first six-axis robot 4 and the second six-axis robot 6. In addition, since the polishing module 2 has a certain processing time, after the first six-axis robot 4 places the workpiece to be polished 8 in the first temporary storage module 7, it can continue to transmit other workpieces to be polished 8, or after the second six-axis robot 6 places the polished workpiece 9 in the first temporary storage module 7, it can continue to transmit other polished workpieces 9, thereby improving work efficiency.

[0086] In this embodiment of the application, the second six-axis robot 6 is similar to the first six-axis robot 4. The second six-axis robot 6 can also be applied to scenarios with high drops, long distances, and multiple angles. This will not be described in detail in this embodiment of the application.

[0087] Furthermore, the polishing unit has polishing modules 2 with at least two different polishing precisions, such as... Figure 5 and Figure 6As shown, the second six-axis robot 6 is also used to transfer the workpiece 8 to be polished between polishing modules 2 with different polishing precisions, so as to perform polishing processing with different polishing precisions in sequence.

[0088] With this setup, by transferring the workpiece 8 to be polished between polishing modules 2 with different polishing precisions, the workpiece 8 can be polished sequentially with different polishing precisions, thereby meeting different processing requirements.

[0089] In this embodiment, the polishing unit may have two, three or more polishing modules 2 with different polishing precisions. This embodiment does not specifically limit this.

[0090] Of course, in other embodiments, the polishing precision of each polishing module 2 can be the same according to the actual process requirements.

[0091] Regarding the installation method of the second rotating seat 61, in one embodiment, as follows: Figure 1 , Figure 5 and Figure 6 As shown, the first channel segment 5 has a first inner bottom wall, on which a first vertical mounting surface 51 is provided, and the second rotating seat 61 is mounted on the first vertical mounting surface 51.

[0092] By side-mounting the second rotating seat 61, it is beneficial to reduce the space occupied by the second rotating seat 61 on the first inner bottom wall, thereby making room for personnel to enter for equipment maintenance.

[0093] In another embodiment, such as Figure 7 and Figure 8 As shown, the chemical mechanical polishing equipment includes an equipment housing (not shown in the figure), the equipment housing having an inner top wall, and a second rotating seat 61 invertedly mounted on the inner top wall.

[0094] By inverting the second rotating seat 61, the space occupied by the second rotating seat 61 on the first inner bottom wall can be avoided, thus allowing sufficient space for personnel to enter and perform equipment maintenance.

[0095] In other embodiments, the second rotating seat 61 can also be mounted upright on the horizontal mounting surface of the first inner bottom wall. This arrangement facilitates the installation of the second rotating seat 61 within the first channel segment 5.

[0096] Regarding the number of the second six-axis robotic arm 6, in one embodiment, such as... Figure 7 As shown, a second six-axis robot 6 is provided. The second six-axis robot 6 is used to transfer the workpiece to be polished 8 and the polished workpiece 9 (not marked in the figure) between the first temporary storage module 7 and the two polishing modules.

[0097] Setting up a second six-axis robot 6 not only ensures the normal transmission between the workpiece to be polished 8 and the polished workpiece 9 in the first temporary storage module 7 and the two polishing modules, but also helps to reduce the number of second six-axis robots 6, thereby reducing manufacturing costs. It also helps to reduce the space occupied by the second six-axis robot 6 in the equipment.

[0098] In another embodiment, such as Figure 8 As shown, there are two second six-axis robotic arms 6. One second six-axis robotic arm 6 is used to transfer the workpiece to be polished 8 and the polished workpiece 9 (not marked in the figure) between the first temporary storage module 7 and a polishing module. The other second six-axis robotic arm 6 is used to transfer the workpiece to be polished 8 and the polished workpiece 9 (not marked in the figure) between the first temporary storage module 7 and another polishing module.

[0099] Two second six-axis robotic arms 6 are set up to transfer the workpiece 8 to be polished and the polished workpiece 9 between the first temporary storage module 7 and the two polishing modules, which is beneficial to improving the transfer efficiency of the workpiece 8 to be polished and the polished workpiece 9, and thus helps to increase the production capacity.

[0100] For cleaning module 3, further, such as Figure 1 As shown, the cleaning unit includes two cleaning modules spaced apart, with a second channel segment 10 between the two cleaning modules. The length direction of the second channel segment 10 is the first direction. Figure 1 (in the Y direction), each cleaning module includes at least one cleaning module 3, which is used to clean the polished part 9.

[0101] This configuration allows for multiple cleaning modules 3. After polishing, the polished parts 9 can be transferred to each cleaning module 3 separately. This means that different polished parts 9 can be cleaned using multiple cleaning modules 3, thus improving the working efficiency of the chemical mechanical polishing equipment and consequently increasing the maximum output. Setting up two spaced cleaning modules not only optimizes the arrangement of the cleaning modules 3 within the equipment, making them neat and compact, but also facilitates maintenance and repair of each cleaning module 3 via the second channel section 10. Furthermore, it also facilitates the transfer of polished parts 9 to each cleaning module 3.

[0102] In this embodiment, as Figure 1 As shown, each cleaning module includes a cleaning module 3. In other embodiments, each cleaning module may also include two, three or more cleaning modules 3. This application does not specifically limit this.

[0103] Furthermore, such as Figure 1As shown, the front unit 1 is located on one side of the two cleaning modules in the first direction, and the polishing unit is located on the other side of the two cleaning modules in the first direction.

[0104] With this configuration, the polished part 9 can be sequentially transferred to the cleaning unit and the pre-positioning unit 1 after passing through the polishing unit, which optimizes the transfer path of the polished part 9 and facilitates the transfer of the polished part 9 between the polishing unit, the cleaning unit and the pre-positioning unit 1.

[0105] Regarding the number of the first six-axis robotic arm 4, in one embodiment, such as Figure 9 and Figure 10 As shown, a first six-axis robot 4 is provided. The first six-axis robot 4 is used to transfer the workpiece to be polished 8 (not marked in the figure) and the polished workpiece 9 between the front unit 1, the polishing unit and the two cleaning modules.

[0106] Setting up a first six-axis robot 4 can not only ensure the normal transmission of the workpiece 8 to be polished and the polished workpiece 9 between the front unit 1, the polishing unit and the two cleaning modules, but also help reduce the number of first six-axis robots 4, thereby reducing manufacturing costs. At the same time, it also helps reduce the space occupied by the first six-axis robot 4 in the equipment.

[0107] Furthermore, such as Figure 10 As shown, the first six-axis robot 4 is positioned in the middle of the second channel segment 10 in the first direction. The first six-axis robot 4 is also used to transfer the polished parts 9 within each cleaning module 3 of the two cleaning modules.

[0108] With this configuration, the polished part 9 can be transferred in each cleaning module by the first six-axis robot 4, eliminating the need for other transfer mechanisms. This simplifies the structure of the cleaning module and helps reduce the manufacturing cost of the equipment while ensuring high working efficiency.

[0109] Regarding the number of the first six-axis robotic arm 4, in another embodiment, such as Figure 11 As shown, there are two first six-axis robotic arms 4. One first six-axis robotic arm 4 is used to transfer the workpiece to be polished 8 (not marked in the figure) and the polished workpiece 9 between the front unit 1, the polishing unit and a cleaning module. The other first six-axis robotic arm 4 is used to transfer the workpiece to be polished 8 (not marked in the figure) and the polished workpiece 9 between the front unit 1, the polishing unit and another cleaning module.

[0110] Two first six-axis robotic arms 4 are set up to transfer the workpieces to be polished 8 and the polished workpieces 9 to two cleaning modules respectively. This is beneficial to improve the transfer efficiency of the workpieces to be polished 8 and the polished workpieces 9, and thus helps to increase the production capacity.

[0111] Furthermore, such as Figure 11 As shown, a first six-axis robot 4 is also used to transfer the polished part 9 within the cleaning module 3 of a cleaning module, and another first six-axis robot 4 is also used to transfer the polished part 9 within the cleaning module 3 of another cleaning module.

[0112] With this configuration, the polished parts 9 can be transferred only through the first six-axis robot 4 within the cleaning module 3 of each cleaning module. There is no need to set up other transfer mechanisms at the cleaning module to transfer the polished parts 9, which simplifies the structural composition of the cleaning module. While ensuring the high working efficiency of the chemical mechanical polishing equipment, it also helps to reduce the manufacturing cost of the equipment.

[0113] For the cleaning module 3, since the cleaning module 3 includes a cleaning chamber and a drying chamber, the first six-axis robot 4 transfers the polished part 9 within the cleaning module 3, that is, the first six-axis robot 4 transfers the polished part 9 between the cleaning chamber, drying chamber and other chambers within the cleaning module 3.

[0114] Regarding the installation method of the first rotating seat 41, in one embodiment, as follows: Figure 1 As shown, the second channel section 10 has a second inner bottom wall, on which a second vertical mounting surface 101 is provided, and the first rotating seat 41 is mounted on the second vertical mounting surface 101.

[0115] By side mounting the first rotating seat 41, it is beneficial to reduce the space occupied by the first rotating seat 41 on the second inner bottom wall, thereby making room for personnel to enter for equipment maintenance.

[0116] In another embodiment, such as Figure 10 and Figure 11 As shown, the chemical mechanical polishing equipment includes an equipment housing (not shown in the figure), the equipment housing has an inner top wall, and a first rotating seat 41 is inverted on the inner top wall.

[0117] By inverting the first rotating seat 41, the space occupied by the first rotating seat 41 on the second inner bottom wall can be avoided, thus allowing sufficient space for personnel to enter and perform equipment maintenance.

[0118] In other embodiments, the first rotating seat 41 can also be mounted upright on the horizontal mounting surface of the second inner bottom wall. This arrangement facilitates the installation of the first rotating seat 41 within the second channel section 10.

[0119] Regarding the transmission method of the polished part 9, in one embodiment, such as... Figure 12As shown, after the polished part 9 is polished, the second six-axis robot 6 will transfer the polished part 9 to the first temporary storage module 7 for temporary storage. The first six-axis robot 4 will pick up the polished part 9 from the first temporary storage module 7 and adjust the polished part 9 to a vertical position for transfer to the cleaning module 3. At the same time, the vertically positioned polished part 9 will also be transferred within the cleaning module 3. This arrangement facilitates the entry and exit of the polished part 9 when the opening for picking up and placing the polished part 9 is relatively small. Furthermore, it eliminates the need for other transfer mechanisms within the cleaning module, further simplifying the equipment layout and reducing costs.

[0120] In another embodiment, such as Figure 13 As shown, after the first six-axis robot 4 picks up the polished part 9 from the first temporary storage module 7, it adjusts the polished part 9 to a horizontal position and transfers it to the cleaning module 3. At the same time, it also transfers the horizontally positioned polished part 9 within the cleaning module 3. With this configuration, the cleaning module group does not need to have other transfer mechanisms, which can further simplify the equipment layout and reduce costs.

[0121] like Figure 1 As shown, Figure 1 , Figure 2 and Figure 3 As shown, the chemical mechanical polishing equipment also includes a second temporary storage module 20, which is used to temporarily store the workpiece 8 to be polished detected by the pre-processing unit 1. The first six-axis robot 4 is also used to transfer the workpiece 8 to be polished detected in the second temporary storage module 20 to the polishing unit.

[0122] By setting up the second temporary storage module 20, the workpiece 8 to be polished can be indirectly transferred between the first six-axis robot 4 and the front unit 1. The front unit 1 does not need to directly transfer the workpiece 8 to be polished to the first six-axis robot 4, which helps to avoid interference between the first six-axis robot 4 and the front unit 1, and at the same time facilitates the storage of the workpiece 8 detected by the front unit 1.

[0123] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this application, and are not intended to limit them. Although this application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this application.

Claims

1. A chemical mechanical polishing device, characterized in that, include: A pre-processor unit, which is used to detect the workpiece to be polished; The transmission mechanism includes a first six-axis manipulator, which includes a first rotary seat and a first six-bar linkage assembly rotatably connected to the first rotary seat. The first six-bar linkage assembly is capable of telescopic movement and / or pitching movement. A polishing unit, wherein the first six-axis robot is used to transfer the detected workpiece to be polished to the polishing unit, and the polishing unit is used to polish the workpiece to be polished so that the workpiece to be polished becomes a polished workpiece; The cleaning unit, the first six-axis robot arm is also used to transfer the polished part to the cleaning unit, the cleaning unit is used to clean the polished part, and the front unit is also used to inspect the cleaned polished part.

2. The chemical mechanical polishing equipment according to claim 1, characterized in that, The polishing unit includes two polishing modules spaced apart, with a first channel segment between the two polishing modules. Each polishing module includes at least one polishing module for polishing the workpiece to be polished.

3. The chemical mechanical polishing equipment according to claim 2, characterized in that, The chemical mechanical polishing equipment also includes a first temporary storage module, and the transmission mechanism also includes a second six-axis manipulator. The second six-axis manipulator includes a second rotary seat and a second six-bar linkage assembly rotatably connected to the second rotary seat. The second six-bar linkage assembly can perform telescopic movement and / or pitching movement. The first six-axis robot is used to transfer the detected workpiece to be polished to the first temporary storage module, and the second six-axis robot is used to transfer the workpiece to be polished in the first temporary storage module to the polishing module, so that the first six-axis robot indirectly transfers the detected workpiece to be polished to the polishing module.

4. The chemical mechanical polishing equipment according to claim 3, characterized in that, The first channel segment has a first inner bottom wall, on which a first vertical mounting surface is provided, and the second rotating seat is mounted on the first vertical mounting surface; or, The chemical mechanical polishing equipment includes a housing with an inner top wall, and the second rotating seat is inverted on the inner top wall.

5. The chemical mechanical polishing apparatus according to claim 3 or 4, characterized in that, One second six-axis robot is provided, which is used to transfer the workpiece to be polished and the polished workpiece between the first temporary storage module and the two polishing modules; or... There are two second six-axis robotic arms. One second six-axis robotic arm is used to transfer the workpiece to be polished and the polished workpiece between the first temporary storage module and one of the polishing modules. The other second six-axis robotic arm is used to transfer the workpiece to be polished and the polished workpiece between the first temporary storage module and the other polishing module.

6. The chemical mechanical polishing apparatus according to any one of claims 1-4, characterized in that, The cleaning unit includes two cleaning modules spaced apart, with a second channel segment between the two cleaning modules. The length direction of the second channel segment is the first direction. Each cleaning module includes at least one cleaning module for cleaning the polished part.

7. The chemical mechanical polishing equipment according to claim 6, characterized in that, The front unit is located on one side of the two cleaning modules in the first direction, and the polishing unit is located on the other side of the two cleaning modules in the first direction.

8. The chemical mechanical polishing equipment according to claim 6, characterized in that, One first six-axis robot is provided, and the first six-axis robot is used to transfer the workpiece to be polished and the polished workpiece between the front unit, the polishing unit and the two cleaning modules; or, Two first six-axis robotic arms are provided. One first six-axis robotic arm is used to transfer the workpiece to be polished and the polished workpiece between the front unit, the polishing unit and a cleaning module. The other first six-axis robotic arm is used to transfer the workpiece to be polished and the polished workpiece between the front unit, the polishing unit and another cleaning module.

9. The chemical mechanical polishing equipment according to claim 8, characterized in that, The first six-axis robot is provided, and the first six-axis robot is located in the middle of the second channel segment in the first direction. The first six-axis robot is also used to transfer the polished part in each of the cleaning modules of the two cleaning modules.

10. The chemical mechanical polishing apparatus according to claim 8, characterized in that, Two first six-axis robotic arms are provided. One first six-axis robotic arm is also used to transfer the polished part within the cleaning module of one of the cleaning modules, and the other first six-axis robotic arm is also used to transfer the polished part within the cleaning module of another cleaning module.

11. The chemical mechanical polishing apparatus according to claim 6, characterized in that, The second channel segment has a second inner bottom wall, on which a second vertical mounting surface is provided, and the first rotating seat is mounted on the second vertical mounting surface; or, The chemical mechanical polishing equipment includes a housing with an inner top wall, and the first rotating seat is inverted and mounted on the inner top wall.

12. The chemical mechanical polishing apparatus according to any one of claims 1-4, characterized in that, The chemical mechanical polishing equipment further includes a second temporary storage module, which is used to temporarily store the workpiece to be polished detected by the front unit; The first six-axis robot is also used to transfer the detected workpiece to be polished from the second temporary storage module to the polishing unit.

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