Particle screening device and thin film deposition equipment

Abstract

The utility model provides a particle screening device and thin film deposition equipment, relates to the technical field of semiconductor equipment, and aims to solve the problem of how to improve the applicability of the particle screening device. Specifically, the particle screening device comprises a plurality of screening pieces which are arranged in a stacked mode, each screening piece is provided with screening holes in an array mode, and the screening holes of the multiple screening pieces are communicated.

Description

Technical Field

[0001] This application relates to the field of semiconductor equipment technology, and more particularly to particle screening devices and thin film deposition equipment. Background Technology

[0002] Thin film deposition equipment refers to equipment that uses methods such as evaporation, sputtering, and ion deposition to eject particles from a target and deposit them onto a substrate, such as a silicon wafer, thereby forming a thin film on the substrate. Because the movement direction of the ejected particles is irregular, it can easily lead to uneven film thickness on the substrate. Therefore, thin film deposition equipment typically includes a particle filtering device to filter out particles with unsuitable movement directions, thus ensuring the uniformity of the film thickness on the substrate.

[0003] In the prior art, particle screening devices are provided with screening through holes of a certain depth so that some particles can pass through the screening through holes and be deposited on the substrate to achieve particle filtration. However, the depth of the screening through holes in the above-mentioned particle screening devices cannot meet the different thin film deposition requirements, resulting in poor applicability of the particle screening devices. Utility Model Content

[0004] This application discloses a particle screening apparatus and a thin film deposition equipment to address the technical problem of how to improve the applicability of particle screening apparatus.

[0005] In a first aspect, this application provides a particle screening device, which includes a plurality of screening elements stacked on top of each other. Each screening element array is provided with screening holes, and the screening holes of the plurality of screening elements are connected.

[0006] According to the particle screening device provided in this application, the screening holes of multiple screening elements can be connected to form a screening channel for screening particles. When particles pass through the particle screening device, some ions can pass through the screening channel and be deposited on the substrate, while other ions are blocked and adsorbed by the inner wall of the screening channel and cannot move to the substrate, thereby ensuring the deposition quality and thickness of the film on the substrate.

[0007] Furthermore, by stacking multiple screening elements, the height of the screening channel along the axial direction of the screening holes can be adjusted by changing the number of screening elements to accommodate changes in thin film deposition requirements. This ensures that particles passing through the screening channel meet the thin film deposition requirements. In this way, the height of the screening channel can be adjusted without replacing the entire particle screening device, allowing it to adapt to a wider range of thin film deposition requirements and improving its applicability.

[0008] In one possible implementation, multiple screening elements are detachably connected. This detachable connection facilitates the removal and installation of multiple screening elements, allowing for quick adjustments to the number of elements based on thin film deposition requirements, thereby improving adjustment efficiency. Furthermore, when a large number of particles are absorbed by the screening elements, multiple elements can be disassembled for cleaning. This facilitates cleaning and avoids the creation of cleaning dead zones due to excessive screening channel height when cleaning multiple elements as a whole, which would negatively impact cleaning effectiveness.

[0009] In one possible implementation, each screening element is provided with a connection hole; the particle screening device also includes fasteners that are connected to multiple connection holes in the multiple screening elements. Connecting multiple screening elements by using fasteners in conjunction with the connection holes facilitates connection and ensures the stability of the connection.

[0010] In one possible implementation, the fastener includes a screw, a first nut, and a second nut. The screw passes through multiple connection holes in multiple screening components. The first nut is located on one side of the multiple screening components, and the second nut is located on the other side of the multiple screening components. Both the first nut and the second nut are screwed onto the screw. In this way, after the screw passes through the multiple connection holes in the multiple screening components, the first nut and the second nut are tightened from both ends of the screw, thereby connecting the multiple screening components. This facilitates the connection of multiple screening components and ensures the stability of the connection.

[0011] In one possible implementation, the fastener includes a pin that engages with multiple connection holes in multiple screen components. Engaging the pin in the multiple connection holes of the multiple screen components facilitates the connection of the multiple screen components. Furthermore, when it is necessary to disassemble a screen component close to the base, it is only necessary to adjust the position of the pin with the back of the base using appropriate tools until the pin disengages from the connection hole of the screen component close to the base, thus facilitating the removal of the screen component close to the base.

[0012] In one possible implementation, for two adjacent filter elements, one filter element has a first snap-fit ​​portion and the other filter element has a second snap-fit ​​portion, and the first snap-fit ​​portion engages with the second snap-fit ​​portion. By engaging the first and second snap-fit ​​portions, it is convenient to connect two adjacent filter elements, and it allows for quick connection of two adjacent filter elements, thereby improving the connection efficiency of multiple filter elements.

[0013] In one possible implementation, one of the first and second engaging portions is a engaging groove, and the other is a engaging protrusion, which engages within the engaging groove. The engaging groove and the engaging protrusion have relatively simple structures and are easy to implement, thus facilitating the processing of the screening components and the connection of multiple screening components.

[0014] In one possible implementation, the snap-fit ​​groove includes a first groove recessed along a first direction and a second groove recessed from the inner wall surface of the first groove along a second direction. The first direction is consistent with the arrangement direction of the plurality of screening elements, and the second direction is perpendicular to the first direction. The snap-fit ​​protrusion includes a first protrusion protruding along the first direction and a second protrusion protruding from the surface of the first protrusion along the second direction. The first protrusion is located within the first groove, and the second protrusion is located within the second groove. By having the first protrusion located in the first groove and the second protrusion located in the second groove, the second groove can limit the second protrusion to prevent the first and second protrusions from exiting the snap-fit ​​groove, thereby ensuring the snap-fit ​​effect between the snap-fit ​​protrusion and the snap-fit ​​groove.

[0015] In one possible implementation, multiple screening components are welded together. Welding ensures the connection strength of the multiple screening components and improves the stability of the connected components.

[0016] In one possible implementation, the screening element comprises multiple splicing structures that interlock to define multiple screening holes. This allows for the creation of different numbers of screening holes through the splicing structures, resulting in varying numbers of screening holes in different screening elements and consequently different screening channel heights at different locations within the particle screening device. Thus, when different film deposition requirements exist at different locations on the substrate, the number of screening holes in different screening elements can be adjusted according to the deposition requirements, thereby adjusting the height of the screening channels corresponding to different locations on the substrate and further improving the applicability of the particle screening device. Furthermore, since the screening element is formed by splicing multiple structures, it can be further disassembled when cleaning is required, allowing for more thorough cleaning and improving the cleaning effect.

[0017] In one possible implementation, the splicing structure includes a connecting portion and multiple splicing portions connected to the periphery of the connecting portion. The multiple splicing structures are arranged circumferentially along the screening hole, and the splicing portions of the multiple splicing structures enclose and form the screening hole. By providing the connecting portion and the multiple splicing portions, the structure of the splicing structure can be made more reasonable, making it convenient to splice multiple screening holes using multiple splicing structures.

[0018] In one possible implementation, two adjacent splicing portions of multiple splicing structures enclose each other to form a screening hole, and the splicing portions of two adjacent splicing structures that form the screening hole are connected. This facilitates the connection of multiple splicing structures, and the multiple screening holes formed after splicing are identical, thus enabling particle screening.

[0019] In one possible implementation, the splicing portions forming the screening holes by the enclosing of two adjacent splicing structures are respectively a first splicing portion and a second splicing portion. The first splicing portion includes multiple first protrusions, which are spaced apart circumferentially along the connecting portion. The second splicing portion includes multiple second protrusions, which are spaced apart circumferentially along the connecting portion. Along the circumferential direction of the connecting portion, the multiple first protrusions and multiple second protrusions are alternately arranged. In this way, the multiple first protrusions and multiple second protrusions cooperate to restrict the movement of the splicing structure along the circumferential direction of the screening hole, thereby ensuring the stability of the spliced ​​structures after splicing. Furthermore, when splicing multiple splicing structures together, it is only necessary to insert the first protrusions between two adjacent second protrusions and the second protrusions between two adjacent first protrusions, thus facilitating the splicing of multiple splicing structures.

[0020] In one possible implementation, the particle screening device further includes a housing with an installation channel within which multiple screening components are disposed. The multiple screening components include a first screening component and a second screening component, with the first screening component connected to the housing and the second screening component connected to the first screening component. This allows for easier installation of the multiple screening components within the housing by first connecting the first and second screening components and then installing them as a whole into the housing. This avoids space constraints when connecting the first and second screening components within the housing, thus facilitating the installation of multiple screening components within the housing.

[0021] In one possible implementation, the housing includes a main body and multiple support portions disposed inside the main body. These support portions have different heights along the extension direction of the mounting channel and are staggered circumferentially along the mounting channel. The first screening member includes a main body and mounting portions disposed around the main body, with the mounting portions mounted on the support portions. This allows the first screening member to be placed on different support portions, thereby adjusting the distance between the first screening member and the target material to further screen particles that meet the desired movement direction. This further facilitates the adjustment of the particle screening device for particle screening.

[0022] In one possible implementation, the support portion includes a plurality of support bosses spaced circumferentially along the mounting channel. Supporting the mounting portion with these multiple support bosses improves the support effect on the first screening element.

[0023] In one possible implementation, the thickness of the first screening member along the axial direction of the installation channel is greater than or equal to 20 mm and less than or equal to 30 mm. Setting the thickness of the first screening member within this range ensures its structural strength, thereby providing better support for the second screening member after it is connected to the first, thus guaranteeing the structural stability of the connected multiple screening members.

[0024] In one possible implementation, the thickness of the second screening element along the axial direction of the mounting channel is greater than or equal to 10 mm and less than or equal to 50 mm. Setting the thickness of the second screening element within the range of greater than or equal to 10 mm and less than or equal to 50 mm allows for easy combination of particle screening devices that meet various thin film deposition requirements.

[0025] Secondly, this application provides a thin film deposition apparatus, which includes a reaction chamber and a particle screening device provided in the first aspect, wherein the particle screening device is disposed within the reaction chamber.

[0026] Since the thin film deposition apparatus provided in this application embodiment includes the particle screening device provided in the first aspect, both can solve the same problem and achieve the same effect. Attached Figure Description

[0027] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0028] Figure 1 This is a schematic diagram of the structure of a thin film deposition apparatus provided in an embodiment of this application;

[0029] Figure 2 A schematic diagram of a particle screening device provided for related technologies;

[0030] Figure 3 for Figure 2 A top view of the particle sieving device shown.

[0031] Figure 4 for Figure 3 Schematic diagram of the AA section structure;

[0032] Figure 5 This is a schematic diagram of the particle screening device provided in the embodiments of this application;

[0033] Figure 6 for Figure 5A schematic diagram of the particle sieving device shown from a relative perspective;

[0034] Figure 7 for Figure 5 A top view of the particle sieving device shown.

[0035] Figure 8 for Figure 7 Schematic diagram of the cross-sectional structure of the middle BB;

[0036] Figure 9 for Figure 7 Another schematic diagram of the cross-sectional structure at point BB;

[0037] Figure 10 for Figure 5 The diagram shows the structural diagram of the shell in the particle screening device.

[0038] Figure 11 for Figure 10 Schematic diagram of the cross-sectional structure of the middle CC section;

[0039] Figure 12 for Figure 5 A schematic diagram showing the cooperation relationship between the support and the first screening element in the particle screening device shown.

[0040] Figure 13 for Figure 12 Enlarged view of point D;

[0041] Figure 14 for Figure 5 Enlarged schematic diagram of the structure at point E in the middle;

[0042] Figure 15 for Figure 6 Enlarged schematic diagram of the structure at point F;

[0043] Figure 16 for Figure 5 A schematic diagram of a screening element in the particle screening device shown.

[0044] Figure 17 for Figure 16 Enlarged schematic diagram of the structure at point G in the middle;

[0045] Figure 18 for Figure 8 Enlarged schematic diagram of the structure at point K;

[0046] Figure 19 for Figure 5 A schematic diagram of another connection method between two adjacent screening elements in the particle screening device shown.

[0047] Figure 20 for Figure 15 A schematic diagram of the splicing structure in the screening component shown;

[0048] Figure 21 for Figure 20 A schematic diagram of the splicing structure shown from another perspective;

[0049] Figure 22 for Figure 6 A schematic diagram of the edge splicing structure in the particle screening device shown.

[0050] Figure 23 for Figure 22 The diagram shows the edge splicing structure from another perspective.

[0051] Explanation of reference numerals in the attached figures:

[0052] 1000 Thin film deposition equipment; 100 Reaction chamber; 1001 Containing cavity; 1002 Opening; 200 Target material; 300 Particle generation device; 400 Particle screening device; 2000 Substrate;

[0053] 10. Cylindrical outer shell; 20. Honeycomb structure; 201. Hexagonal through-hole;

[0054] 1. Housing; 11. Mounting channel; 12. Main body; 13. Support part; 131. Support boss; 1311. Support groove; 132. First support part; 133. Second support part;

[0055] 2. Screening component; 21. Screening hole; 22. Third screening component; 23. Fourth screening component; 24. Screening channel; 25. First screening component; 251. Main body; 252. Mounting part; 26. Second screening component; 27. Connecting hole; 28. First snap-fit ​​part; 281. Snap-fit ​​groove; 2811. First groove; 2812. Second groove; 29. ​​Second snap-fit ​​part; 291. Snap-fit ​​protrusion; 2911. First protrusion; 2912. Second protrusion; 2A. Fifth screening component; 2B. Sixth screening component; 210. Splicing structure; 2101. Connecting part; 2102. Splicing part; 2103. First splicing part; 2103A. First protrusion; 2104. Second splicing part; 2104A. Second protrusion; 2105. Third splicing part; 2106. Fourth splicing part; 2107. Fifth splicing part;

[0056] 3. Fastener; 31. Screw; 32. First nut; 33. Second nut. Detailed Implementation

[0057] In the embodiments of this application, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation" and "connection" should be interpreted broadly. For example, "connection" can be a detachable connection or a non-detachable connection; it can be a direct connection or an indirect connection through an intermediate medium.

[0058] In the embodiments of this application, it should be understood that the directional terms mentioned, such as "upper", "lower", "inner", "outer", etc., are only for reference to the direction of the accompanying drawings. Therefore, the directional terms used are for better and clearer explanation and understanding of the embodiments of this application, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the embodiments of this application.

[0059] In the embodiments of this application, the terms "first," "second," "third," and "fourth" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Therefore, a feature defined with "first," "second," "third," and "fourth" may explicitly or implicitly include one or more of that feature.

[0060] In the embodiments of this application, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus.

[0061] In the embodiments of this application, "and / or" is merely a description of the relationship between related objects, indicating that there can be three relationships. For example, A and / or B can represent three situations: A exists alone, A and B exist simultaneously, and B exists alone.

[0062] Please see Figure 1 , Figure 1 This is a schematic diagram of a thin film deposition apparatus 1000 provided in an embodiment of this application. The thin film deposition apparatus 1000 is used to deposit a thin film on a substrate 2000. The thin film deposition apparatus 1000 can be used in semiconductor manufacturing, thin-film photovoltaic cell manufacturing, display thin film manufacturing, optical thin film manufacturing, etc. This application illustrates the use of the thin film deposition apparatus 1000 in semiconductor manufacturing as an example.

[0063] Please continue reading. Figure 1 The thin film deposition apparatus 1000 may include a reaction chamber 100, a target 200, and a particle generation device 300. The particle generation device 300 is connected to the target 200 and acts on the target 200 to generate particles, thereby depositing the particles on the substrate 2000 and forming a thin film on the substrate 2000. The particles may be electrons, atoms, protons, neutrons, ions, etc., and this application does not specifically limit their types.

[0064] The reaction chamber 100 includes a accommodating cavity 1001 and an opening 1002 communicating with the accommodating cavity 1001. The accommodating cavity 1001 is used to place a substrate 2000, such as a wafer, to be deposited as a thin film. A reactive gas may also be disposed within the accommodating cavity 1001. The reactive gas reacts with particles generated by the target material 200 to generate a desired compound, thereby depositing the desired compound thin film on the substrate 2000. The target material 200 is disposed at the opening 1002 of the reaction chamber 100 and serves as the raw material for generating the particles. The target material 200 can be a metal such as copper, an oxide such as silicon dioxide, or other thin films such as semiconductor polycrystalline silicon.

[0065] In some examples, thin films can be deposited on the substrate 2000 using a vapor deposition process. For instance, the particle generation device 300 can be a heating device that heats the target material 200, causing it to evaporate or sublimate into gaseous particles. These gaseous particles then migrate to the substrate 2000 and deposit there, thus forming a thin film on the substrate 2000. The heating device can be a resistance heating device, an electron beam heating device, a laser heating device, etc., and this application does not specifically limit its application to these methods. Vapor deposition processes result in high-quality thin films, ensuring consistent film quality.

[0066] In other examples, thin films can also be deposited on the substrate 2000 using an ion plating process. For instance, the particle generation device 300 can be a cathode arc source that bombards the target 200 with an arc discharge, causing the target 200 to evaporate and ionize, thereby forming metal ions or gas ions. These ions migrate to the substrate 2000 and deposit on it, thus forming a thin film. The thin film formed by ion plating has high density and strong adhesion, which can increase the tightness between the thin film and the substrate 2000.

[0067] The arc discharge bombardment of the target 200 is divided into two stages. The first stage bombardment of the target 200 is to enable the highly charged ions generated by the target 200 to bombard the surface of the substrate 2000 at high speed, thereby cleaning the surface of the substrate 2000 by sputtering. The second stage bombardment of the target 200 is to enable the ions generated by the target 200 to deposit on the substrate 2000 to form a thin film on the substrate 2000.

[0068] In some other examples, thin films can also be deposited on the substrate 2000 using a sputtering process. For instance, the particle generation device 300 can be a magnetic field device that ionizes the sputtering gas into ions. These ions are accelerated and bombard the target 200, causing target 200 atoms to be sputtered out. The sputtered target 200 atoms can then migrate to the substrate 2000 and deposit on it, thereby forming a thin film on the substrate 2000. The sputtering process has wide applicability and can be applied to the coating of most materials.

[0069] The magnetic field device can be a permanent magnet, electromagnet, etc. The sputtering gas is usually an inert gas, such as argon, helium, neon, krypton, xenon, etc. To ensure effective momentum transfer when the sputtering gas bombards the target 200, the atomic weight of the sputtering gas should be close to that of the target 200. For example, if the target 200 is a light element, neon can be used as the sputtering gas; if the target 200 is a heavy element, krypton or xenon can be used.

[0070] In some embodiments, during the deposition of a thin film on the substrate 2000, the movement direction of ions ejected from the target 200 is chaotic, which can easily lead to the inability to deposit a film of the desired thickness and quality at the desired location on the substrate 2000. Based on this, please refer to... Figure 1 The thin film deposition apparatus 1000 may further include a particle screening device 400. The particle screening device 400 is disposed within the receiving cavity 1001 and located between the target 200 and the substrate 2000. The particle screening device 400 filters out particles whose movement direction does not conform to the expected direction, thereby allowing particles capable of moving to the desired location on the substrate 2000 to pass through the particle screening device 400 and be deposited on the substrate 2000, thus ensuring the thickness and quality of the thin film deposited on the substrate 2000.

[0071] For related technologies, please refer to Figure 2 , Figure 2 A schematic diagram of a particle screening device 400 provided for related technologies. The particle screening device 400 typically includes a cylindrical housing 10 and a honeycomb structure 20 disposed within the cylindrical housing 10. (See also...) Figure 3 and Figure 4 , Figure 3 for Figure 2 The diagram shows a top view of the particle sieving device 400. Figure 4 for Figure 3 A cross-sectional view of the structure is shown in Figure AA. The honeycomb structure 20 is provided with hexagonal through-holes 201. Some of the particles ejected from the target 200 can pass through the hexagonal through-holes 201 and be deposited on the substrate 2000, while others will collide with the inner wall surface of the hexagonal through-holes 201 and the inner wall surface of the cylindrical shell 10, thereby being blocked and adsorbed on the honeycomb structure 20 and the cylindrical shell 10. In this way, by adjusting the height and width of the hexagonal through-holes 201 in the axial direction of the cylindrical shell 10 (i.e., the diameter of the inscribed circle of the hexagon), the particles moving in the desired direction can pass through the hexagonal through-holes 201 of the particle screening device 400, thereby ensuring the deposition quality and thickness of the film on the substrate 2000.

[0072] However, the height and width (i.e., the diameter of the inscribed circle of the hexagonal through-hole 201) of the aforementioned hexagonal through-hole 201 in the axial direction of the cylindrical outer shell 10 are fixed and cannot be adjusted. In other words, one particle screening device 400 can only match the processing requirements of a substrate 2000 with one type of thin film deposition requirement. If the deposition quality and thickness requirements of the thin film on the substrate 2000 change, the entire particle screening device 400 needs to be replaced with a particle screening device 400 whose height and width of the hexagonal through-hole 201 meet the thin film deposition requirements. Thus, the applicability of the particle screening device 400 is poor, and it cannot quickly adjust the height of the hexagonal through-hole 201 in the particle screening device according to changes in thin film deposition requirements, making the adjustment of the particle screening device 400 quite troublesome.

[0073] Based on this, please refer to Figure 5 and Figure 6 , Figure 5 This is a schematic diagram of the structure of the particle screening device 400 provided in the embodiments of this application; Figure 6 for Figure 5 The diagram shows the structure of the particle screening device 400 from a relative perspective. The particle screening device 400 provided in this application may include a housing 1 and multiple screening components 2. The housing 1 is disposed within the receiving cavity 1001 of the reaction chamber 100 and is used to connect to the reaction chamber 100, facilitating the connection between the particle screening device 400 and the reaction chamber 100. For example, the housing 1 and the reaction chamber 100 may be connected by screwing, snap-fitting, lapping, riveting, welding, or other methods.

[0074] The housing 1 is provided with a mounting channel 11 for setting up the screening elements 2. By placing multiple screening elements 2 within the mounting channel 11, the housing 1 can protect the multiple screening elements 2. The axis of the mounting channel 11 can be aligned with the arrangement direction of the target 200 and the substrate 2000, thus facilitating the movement of particles ejected from the target 200 through the mounting channel 11 to the substrate 2000 for deposition.

[0075] In some examples, the shell 1 can be a cylindrical structure, a frustum-shaped structure, a square cylindrical structure, etc. This application does not impose specific limitations on it.

[0076] Please continue reading. Figure 7 and Figure 8 , Figure 7 for Figure 5 The diagram shows a top view of the particle sieving device 400. Figure 8 for Figure 7A cross-sectional view of the structure is shown in Figure BB. Multiple filter elements 2 can be stacked, and each filter element 2 array is provided with a filter hole 21, wherein the axis of the filter hole 21 can be aligned with the axis of the mounting channel 11. For example, the filter hole 21 can be a square hole, a circular hole, an elliptical hole, a polygonal hole, such as a regular polygonal hole, etc. This application uses a regular hexagonal hole as an example for illustration.

[0077] The filter holes 21 of multiple filter elements 2 are connected. For an example, please refer to [link / reference needed]. Figure 8 Each filter element 2 can have multiple filter holes 21, and the number of filter holes 21 in each filter element 2 can be the same. In this case, the filter holes 21 of multiple filter elements 2 can correspond one-to-one.

[0078] For another example, please refer to Figure 9 , Figure 9 for Figure 7 Another schematic diagram of the cross-sectional structure at point BB. The number of screening holes 21 in each screening element 2 can also be different. In this case, the screening element 2 with fewer screening holes 21 can be the third screening element 22, and the screening element 2 with more screening holes 21 can be the fourth screening element 23. One screening hole 21 in the third screening element 22 can be found to have a corresponding and connected screening hole 21 in the fourth screening element 23.

[0079] Please continue reading. Figure 8 When the screening holes 21 of multiple screening elements 2 are connected, a screening channel 24 is formed to screen particles. During the process of particles passing through the mounting channel 11, some ions can pass through the screening channel 24 and be deposited on the substrate 2000, while other ions will be blocked and adsorbed by the inner wall surface of the screening channel 24 and the inner wall surface of the mounting channel 11 and cannot move to the substrate 2000, thereby ensuring the deposition quality and thickness of the film on the substrate 2000.

[0080] Furthermore, by stacking multiple screening elements 2, the height of the screening channel 24 in the axial direction of the screening hole 21 can be adjusted by changing the number of screening elements 2 layers after the thin film deposition requirements on the substrate 2000 change. This ensures that the particles passing through the screening channel 24 meet the thin film deposition requirements. In this way, the height of the screening channel 24 can be adjusted without replacing the entire particle screening device 400, thereby enabling the particle screening device 400 to adapt to more thin film deposition requirements and improving its applicability.

[0081] In some embodiments, please continue reading Figure 8 The multiple filter elements 2 may include a first filter element 25 and a second filter element 26. The first filter element 25 is connected to the housing 1.

[0082] In some examples, please refer to Figure 10 and Figure 11 , Figure 10 for Figure 5 The diagram shows the structure of the housing 1 in the particle screening device 400. Figure 11 for Figure 10 A cross-sectional view of the structure is shown in the diagram. The housing 1 may include a body portion 12 and a support portion 13 connected to the inside of the body portion 12. The body portion 12 may form the aforementioned mounting channel 11.

[0083] Please see Figure 12 and Figure 13 , Figure 12 for Figure 5 The diagram shows the cooperation relationship between the support 13 and the first screening element 25 in the particle screening device. Figure 13 for Figure 12 Enlarged view at point D. The support portion 13 supports the first screening member 25. Specifically, the first screening member 25 may include a main body portion 251 and a mounting portion 252 disposed around the main body portion 251. The main body portion 251 is provided with screening holes 21. The mounting portion 252 is disposed on the support portion 13. For example, if the mounting channel 11 is vertically arranged and the target material 200 is disposed above the particle screening device 400, when connecting the first screening member 25 to the housing 1, it is only necessary to place the first screening member 25 on the upper side of the support portion 13.

[0084] The mounting part 252 is supported by the support part 13. The first screening part 25 can be connected to the housing 1 simply by placing the first screening part 25 on the support part 13, which facilitates the connection between the first screening part 25 and the housing 1 and improves the connection efficiency.

[0085] In some examples, please refer to [link / reference]. Figure 12 and Figure 13 The support portion 13 may include a plurality of support bosses 131 spaced circumferentially along the mounting channel 11. Correspondingly, the first screening member 25 may have a plurality of mounting portions 252, which are spaced circumferentially along the mounting channel 11. Each mounting portion 252 is mounted on a support boss 131, so that the plurality of support bosses 131 support the plurality of mounting portions 252, thereby improving the support effect on the first screening member 25.

[0086] In some examples, please refer to [link / reference]. Figure 13 The support boss 131 is provided with a support groove 1311, and the mounting part 252 can be provided in the support groove 1311 so as to limit the mounting part 252 through the support groove 1311 and improve the stability of the mounting part 252 on the support boss 131.

[0087] In some examples, the mounting portion 252 can be a rod-shaped structure, a plate-shaped structure, etc. Multiple mounting portions 252, the main body portion 251, and the housing 1 can also form multiple screening holes 21, which can also screen particles to improve the film deposition quality in the substrate 2000.

[0088] In other examples, the support portion 13 may also include a plurality of support grooves spaced circumferentially along the mounting channel 11, the support grooves being recessed from the inner wall surface of the housing 1 toward the outer wall surface and extending to the side surface of the housing 1 facing the target material 200. One mounting portion 252 is disposed within one support groove, so that multiple mounting portions 252 are supported by multiple support grooves, which can also improve the support effect on the first screening member 25.

[0089] This application is illustrated by way of example with the mounting section 252 including a plurality of support bosses 131.

[0090] In some examples, please refer to [link / reference]. Figure 11 The number of support portions 13 can be multiple. The multiple support portions 13 have different heights in the extension direction of the mounting channel 11 and are staggered along the circumference of the mounting channel 11. That is, the support portion 13 closest to the base 2000 among the multiple support portions 13 is the first support portion 132. The gap between any two adjacent support bosses 131 in the first support portion 132 is the first gap L1. At least part of the projection of a support boss 131 of any support portion 13 on the side of the first support portion 132 facing the target 200 in the axial direction of the mounting channel 11 is located within the projection of the first gap in the axial direction of the mounting channel 11.

[0091] For example, the plurality of supports 13 include a first support 132 and a second support 133, the second support 133 being located on the side of the first support 132 facing the target 200, and the first support 132 and the second support 133 being offset from each other along the circumferential direction of the mounting channel 11. In the axial direction of the mounting channel 11, at least a portion of the projection of a support boss 131 of the second support 133 lies within the projection of the space between two adjacent support bosses 131 of the first support 132.

[0092] In this way, the first screening element 25 can be placed on different support parts 13, thereby adjusting the distance between the first screening element 25 and the target material 200, so as to further screen particles that meet the expected movement direction. This makes it easier to adjust the particle screening device 400 to screen particles.

[0093] In other examples, the first screening component 25 can also be connected to the housing 1 by means of snap-fit, screw-fit, riveting, welding, etc. This also facilitates the connection between the first screening component 25 and the housing 1.

[0094] Please see Figure 14 and Figure 15 , Figure 14 for Figure 5 Enlarged schematic diagram of the structure at point E in the middle. Figure 15 for Figure 6 Enlarged schematic diagram of the structure at point F. The second screening element 26 is connected to the first screening element 25. In this way, when installing multiple screening elements 2 into the housing 1, the first screening element 25 and the second screening element 26 can be connected first, and then the first screening element 25 and the second screening element 26 can be installed as a whole into the housing 1. This avoids space constraints when connecting the first screening element 25 and the second screening element 26 within the housing 1, thus facilitating the installation of multiple screening elements 2 within the housing 1.

[0095] For example, the second filter element 26 is connected to the side of the first filter element 25 facing away from the target material 200. In this way, the second filter element 26 can be prevented from interfering with the particles entering the screening holes 21 formed by the multiple mounting parts 252, the main body part 251 and the housing 1, so as to ensure that the particles pass through the screening holes 21 smoothly.

[0096] As another example, the second screening member 26 can also be connected to the side of the first screening member 25 facing the target material 200, thus also screening particles. Furthermore, the amount of particles entering the screening hole 21 formed by the mounting portion 252, the main body portion 251, and the housing 1 can be limited as needed to control the film deposition requirements.

[0097] In some examples, the number of second screening elements 26 can be one or more. When there are multiple second screening elements 26, the multiple screening elements 2 can be stacked on the side of the first screening element 25 facing away from the target 200, or the multiple screening elements 2 can be stacked on the side of the first screening element 25 facing the target 200, or some of the multiple screening elements 2 can be stacked on the side of the first screening element 25 facing the target 200, and another portion can be stacked on the side of the first screening element 25 facing away from the target 200. This application illustrates this by example with multiple second screening elements 26 stacked on the side of the first screening element 25 facing away from the target 200.

[0098] In some embodiments, please continue reading Figure 8 Along the axial direction of the installation channel 11, the thickness of the first screening element 25 (e.g.) Figure 8The thickness H1 shown is greater than or equal to 20 mm and less than or equal to 30 mm. For example, the thickness of the first screening element 25 can be 20 mm, 22 mm, 24 mm, 25 mm, 26 mm, 28 mm, 30 mm, etc.

[0099] The thickness of the first screening member 25 is set within the range of greater than or equal to 20 mm and less than or equal to 30 mm, which can ensure the structural strength of the first screening member 25. This provides better support for the second screening member 26 after it is connected to the first screening member 25, thereby ensuring the structural stability of the multiple screening members 2 after they are connected.

[0100] In some embodiments, please continue reading Figure 8 Along the axial direction of the installation channel 11, the thickness of the second screening element 26 (e.g.) Figure 8 The thickness H2 shown is greater than or equal to 10 mm and less than or equal to 50 mm. For example, the thickness of the second filter element 26 can be 10 mm, 15 mm, 20 mm, 25 mm, 30 mm, 35 mm, 40 mm, 45 mm, 50 mm, etc.

[0101] The thickness of the second screening element 26 is set within the range of greater than or equal to 10 mm and less than or equal to 50 mm, which can be easily combined to form a particle screening device 400 that meets various thin film deposition requirements.

[0102] The connection method of multiple filter elements 2 is explained below.

[0103] In some embodiments, the plurality of filter elements 2 are detachably connected. For example, a first filter element 25 and a second filter element 26 are detachably connected. Two adjacent second filter elements 26 among the plurality of second filter elements 26 are detachably connected.

[0104] The detachable connection of multiple screening elements 2 facilitates their disassembly and installation, allowing for quick adjustment of the number of screening elements 2 according to thin film deposition requirements, thereby improving adjustment efficiency. Furthermore, when a large number of particles are absorbed on the screening elements 2, multiple screening elements 2 can be disassembled for cleaning. This facilitates cleaning and avoids the creation of cleaning dead zones due to excessive height of the screening channel 24 when cleaning multiple screening elements 2 as a whole, which would affect the cleaning effect.

[0105] In some embodiments, please refer to Figure 16 and Figure 17 , Figure 16 for Figure 5 The diagram shows a structural schematic of a screening element in a particle screening device. Figure 17 for Figure 16Enlarged schematic diagram of the structure at point G. Each screen element 2 is provided with a connecting hole 27. For example, the axial direction of the connecting hole 27 can be aligned with the axial direction of the mounting channel 11.

[0106] Please see Figure 17 and Figure 18 , Figure 18 for Figure 8 A magnified schematic diagram of the structure at point K. The particle screening device 400 also includes a fastener 3, which is connected to multiple connection holes 27 within the multiple screening elements 2. The connection of the multiple screening elements 2 is achieved by the fastener 3 cooperating with the connection holes 27, which makes the connection of the multiple screening elements 2 more convenient and ensures the stability of the connection.

[0107] In some examples, each filter element 2 may have one or more connecting holes 27. When each filter element 2 has multiple connecting holes 27, the number of fasteners 3 may also be multiple, with one fastener 3 connected to one connecting hole 27 of each filter element 2. This further makes the connection of multiple filter elements 2 more stable.

[0108] In some embodiments, please refer to Figure 14 , Figure 15 and Figure 18 The fastener 3 includes a screw 31, a first nut 32, and a second nut 33. The screw 31 passes through multiple connection holes 27 of the multiple screening elements 2. That is, after the multiple screening elements 2 are stacked, the screw 31 is sequentially passed through the connection holes 27 of each screening element 2 along the axial direction of the connection holes 27.

[0109] The first nut 32 is located on one side of the multiple screening components 2, and the second nut 33 is located on the other side of the multiple screening components 2. Both the first nut 32 and the second nut 33 are screwed onto the screw 31. After the screw 31 passes through the multiple connecting holes 27 of the multiple screening components 2, the first nut 32 and the second nut 33 are tightened from both ends of the screw 31, thereby connecting the multiple screening components 2. This facilitates the connection of the multiple screening components 2 and ensures the stability of the connection.

[0110] In some other embodiments, the fastener 3 includes a pin that engages with multiple connection holes 27 of the multiple screening elements 2. That is, after the multiple screening elements 2 are stacked, the pin is sequentially inserted into the connection hole 27 of each screening element 2 along the axial direction of the connection hole 27, and the pin can be interference-fitted with each screening element 2 to achieve engagement of the pin within the connection hole 27 of each screening element 2, thereby connecting the multiple screening elements 2. This connection method is also relatively convenient. Furthermore, when it is necessary to disassemble the screening element 2 near the substrate 2000, it is only necessary to adjust the position of the pin towards the target material 200 using appropriate tools to disengage the pin from the connection hole 27 of the screening element 2 near the substrate 2000, thus facilitating the removal of the screening element 2 near the substrate 2000.

[0111] In other embodiments, please refer to Figure 19 , Figure 19 for Figure 5 The diagram shows another connection method between two adjacent screening elements 2 in the particle screening device 400. For the two adjacent screening elements 2, one screening element 2 is provided with a first snap-fit ​​part 28, and the other screening element 2 is provided with a second snap-fit ​​part 29. The first snap-fit ​​part 28 and the second snap-fit ​​part 29 are snapped together.

[0112] By engaging the first snap-fit ​​part 28 and the second snap-fit ​​part 29, it is possible to easily connect two adjacent filter elements 2, and to quickly connect two adjacent filter elements 2, thereby improving the connection efficiency of multiple filter elements 2.

[0113] In some examples, for two adjacent filter elements 2, the first snap-fit ​​portion 28 is located at the end of one filter element 2 facing the other filter element 2, and the second snap-fit ​​portion 29 is located at the end of the other filter element 2 facing one of the filter elements 2. This facilitates the placement of the first snap-fit ​​portion 28 and the second snap-fit ​​portion 29, as well as the snap-fit ​​between the first snap-fit ​​portion 28 and the second snap-fit ​​portion 29.

[0114] In other examples, the first snap-fit ​​portion 28 and the second snap-fit ​​portion 29 may also be located at other positions on the filter element 2, for example, on one side of the filter element 2 perpendicular to the axial direction of the mounting channel 11. This also allows for the snap-fit ​​of two adjacent filter elements 2.

[0115] In some embodiments, please continue reading Figure 19 One of the first engaging portion 28 and the second engaging portion 29 is an engaging groove 281, and the other of the first engaging portion 28 and the second engaging portion 29 is an engaging protrusion 291. The engaging protrusion 291 engages within the engaging groove 281. The structures of the engaging groove 281 and the engaging protrusion 291 are relatively simple and easy to implement, thus facilitating the processing of the screening element 2 and the connection of multiple screening elements 2.

[0116] In some embodiments, please continue reading Figure 19 The snap-fit ​​groove 281 includes a first direction (e.g., Figure 19 The first groove 2811, recessed in the direction X shown in the figure, and the inner wall surface of the first groove 2811 along the second direction (e.g., Figure 19 The second groove 2812 is recessed in the direction Y shown. The first direction is consistent with the arrangement direction of the plurality of filter elements 2, and the second direction is perpendicular to the first direction. For example, two adjacent filter elements 2 are a fifth filter element 2A and a sixth filter element 2B, and a snap-fit ​​groove 281 is provided on the fifth filter element 2A. The first groove 2811 can be recessed from the surface of the fifth filter element 2A toward the sixth filter element 2B in a direction opposite to the sixth filter element 2B.

[0117] The snap-fit ​​protrusion 291 includes a first protrusion 2911 protruding in a first direction and a second protrusion 2912 protruding in a second direction from the surface of the first protrusion 2911; the first protrusion 2911 is located within a first groove 2811, and the second protrusion 2912 is located within a second groove 2812. For example, the first protrusion 2911 may protrude from the surface of the sixth filter element 2B toward the fifth filter element 2A.

[0118] With the first protrusion 2911 provided in the first groove 2811 and the second protrusion 2912 provided in the second groove 2812, the second protrusion 2912 can be limited by the second groove 2812 to prevent the first protrusion 2911 and the second protrusion 2912 from exiting the snap-fit ​​groove 281, so as to ensure the snap-fit ​​effect between the snap-fit ​​protrusion 291 and the snap-fit ​​groove 281.

[0119] The second protrusion 2912 may be elastic to facilitate the second protrusion 2912 passing through the first groove 2811 and engaging with the second groove 2812.

[0120] In some examples, there can be multiple second grooves 2812, which are spaced apart along the axial direction of the first groove 2811. Correspondingly, there can also be multiple second protrusions 2912, with one second protrusion 2912 engaging with one second groove 2812, which can further improve the engagement effect between the engaging protrusion 291 and the engaging groove 281.

[0121] In some other embodiments, the snap-fit ​​groove 281 may only include the first groove portion 2811, and the snap-fit ​​protrusion 291 may only include the first protrusion portion 2911. The first protrusion portion 2911 is located in the first groove portion 2811 and is in interference fit with the screening member 2 where the first groove portion 2811 is located, such as the fifth screening member 2A. In this way, two adjacent screening members 2 can also be snapped together.

[0122] In some other embodiments, the first latching portion 28 and the second latching portion 29 can also be latched by other latching methods, such as by a hook. This application does not specifically limit this.

[0123] In some other embodiments, the multiple screening elements 2 can also be welded. For example, the multiple screening elements 2 can be welded by high-temperature brazing, argon arc welding, or other methods. This allows for the connection of the multiple screening elements 2, ensuring the connection strength and improving the stability of the connected multiple screening elements 2. In this case, when it is necessary to disassemble the screening elements 2, they can be disassembled by desoldering.

[0124] In some embodiments, please continue reading Figure 15 The screening element 2 includes multiple splicing structures 210, which are spliced ​​together to define multiple screening holes 21. In this way, different numbers of screening holes 21 can be created by splicing the splicing structures 210, resulting in different numbers of screening holes 21 in different screening elements 2, and consequently, different heights of the screening channels 24 at different positions in the particle screening device 400. Thus, when the thin film deposition requirements at different positions on the substrate 2000 are different, the number of screening holes 21 in different screening elements 2 can be adjusted according to the deposition requirements to adjust the height of the screening channels 24 corresponding to different positions on the substrate 2000, thereby further improving the applicability of the particle screening device 400.

[0125] Furthermore, the filter element 2 is formed by splicing multiple splicing structures 210. When it is necessary to clean the filter element 2, the filter element 2 can be further disassembled, thereby enabling a more thorough cleaning of the filter element 2 and improving the cleaning effect of the filter element 2.

[0126] In some embodiments, both the first screening element 25 and the second screening element 26 may include multiple splicing structures 210. This allows for more flexible adjustment of the screening channel 24 in the particle screening device 400 and enables more thorough cleaning of the particle screening device 400.

[0127] In other embodiments, the first screening element 25 is a single-piece structure, and the second screening element 26 includes multiple splicing structures 210. This facilitates the adjustment of the screening channel 24 in the particle screening device 400 and the cleaning of the particle screening device 400, while also ensuring the structural strength of the first screening element 25, thereby ensuring the stability of the multiple screening elements 2 after connection.

[0128] In other embodiments, please continue to refer to Figure 16 Each screening element 2 can also be a single, integral structure. This ensures the structural strength of each screening element 2, thereby enhancing the structural strength of the particle screening device 400.

[0129] This application is illustrated by way of example, with the first screening element 25 as an integral structure and the second screening element 26 comprising multiple splicing structures 210.

[0130] In some embodiments, the material of the splicing structure 210 may include an aluminum alloy. Aluminum alloys have strong and wear-resistant properties, which can improve the durability of the screening element 2. Furthermore, aluminum alloys are relatively inexpensive, reducing the economic impact of the screening element 2.

[0131] In some embodiments, please refer to Figure 20 and Figure 21 , Figure 20 for Figure 15 The diagram shows the structure of the splicing structure 210 in the screening component 2. Figure 21 for Figure 20 The diagram shows the splicing structure 210 from another perspective. The splicing structure 210 includes a connecting portion 2101 and multiple splicing portions 2102. The connecting portion 2101 is used to connect multiple screening elements 2; for example, the connecting portion 2101 has a connecting hole 27. As another example, the connecting portion 2101 has a snap-fit ​​protrusion 291 and a snap-fit ​​groove 281.

[0132] Multiple splicing portions 2102 are connected to the periphery of the connecting portion 2101, and multiple splicing structures 210 are arranged circumferentially along the screening hole 21, with the splicing portions 2102 of the multiple splicing structures 210 surrounding and forming the screening hole 21. That is, for a splicing portion 2102 of a splicing structure 210, one side surface of the splicing portion 2102 in the radial direction of the screening hole 21 is part of the inner wall surface of one of the screening holes 21, and the other side surface of the splicing portion 2102 in the radial direction of the screening hole 21 is part of the inner wall surface of another screening hole 21.

[0133] By setting the connecting part 2101 and multiple splicing parts 2102, the structure of the splicing structure 210 can be made more reasonable, and multiple screening holes 21 can be spliced ​​together by multiple splicing structures 210.

[0134] In some examples, the splicing part 2102 can be a plate-like structure, a block-like structure, etc. This application does not specifically limit it in this regard.

[0135] In some examples, multiple splicing structures 210 can have the same structure, which facilitates batch processing of splicing structures 210 and improves processing efficiency.

[0136] In other examples, the structures of the multiple splicing structures 210 can also be different, thus forming multiple screening holes 21. They can also be spliced ​​into screening holes 21 of different shapes as needed to improve the functionality of the particle screening device 400.

[0137] In some embodiments, adjacent splicing portions 2102 of a plurality of splicing structures 210 enclose and form a screening hole 21, and the splicing portions 2102 of adjacent splicing structures 210 that enclose the screening hole 21 are connected. In some examples, please refer to [further details]. Figure 15 and Figure 20 In a splicing structure 210, the number of splicing portions 2102 can be three. For any screening hole 21, it can be formed by six splicing structures 210. Each of the six splicing structures 210 has two adjacent splicing portions 2102 spliced ​​together to form a hexagonal screening hole 21. For two adjacent splicing structures 210, one splicing portion 2102 of one splicing structure 210 is connected to one splicing portion 2102 of the other splicing structure 210. In other examples, the number of splicing portions 2102 in the splicing structure 210 can also be other numbers, so that the screening hole 21 formed after splicing multiple splicing structures 210 is a hole of other shapes.

[0138] In this way, multiple splicing structures 210 can be easily connected, and the multiple screening holes 21 formed after splicing multiple splicing structures 210 are the same, so as to facilitate the screening of particles.

[0139] In some embodiments, please refer to Figure 15 and Figure 20 The splicing portions 2102 formed by the enclosing of two adjacent splicing structures 210 to form the screening hole 21 are respectively the first splicing portion 2103 and the second splicing portion 2104. The first splicing portion 2103 includes a plurality of first protrusions 2103A, which are spaced apart circumferentially along the connecting portion 2101. For example, the splicing portion 2102 is a plate-like structure, and the thickness direction of the plate-like structure is perpendicular to the axial direction of the screening hole 21. In this case, the plurality of first protrusions 2103A can be spaced apart along the thickness direction of the splicing portion 2102.

[0140] The second splicing portion 2104 includes a plurality of second protrusions 2104A, which are spaced apart circumferentially along the connecting portion 2101. The arrangement and structure of the second protrusions 2104A can be the same as those of the first protrusion 2103A, and will not be described in detail here.

[0141] Along the circumferential direction of the connecting portion 2101, a plurality of first protrusions 2103A and a plurality of second protrusions 2104A are alternately arranged in sequence. That is, at least one of the plurality of first protrusions 2103A is located between two adjacent second protrusions 2104A, and at least one of the plurality of second protrusions 2104A is located between two adjacent first protrusions 2103A.

[0142] In this way, the multiple first protrusions 2103A and multiple second protrusions 2104A cooperate to restrict the circumferential movement of the splicing structure 210 along the screening hole 21, thereby ensuring the stability of the spliced ​​structures 210 after splicing. Furthermore, when splicing multiple splicing structures 210 together, it is only necessary to insert the first protrusion 2103A between two adjacent second protrusions 2104A, and the second protrusion 2104A between two adjacent first protrusions 2103A, thus facilitating the splicing of multiple splicing structures 210.

[0143] In some other embodiments, the first splicing part 2103 and the second splicing part 2104 may also be connected by means of screwing, snapping, welding, riveting, etc., and this application does not make specific limitations in this regard.

[0144] In some embodiments, please continue reading Figure 6 Among the multiple splicing structures 210, some splicing structures 210 are edge splicing structures 210A, forming the outermost ring structure of the screening element 2. Among the multiple splicing portions 2102 in the edge splicing structure 210A, one splicing portion 2102 is not used to define the screening holes 21. For ease of description, the splicing portion 2102 in the edge splicing structure 210A that is not used to define the screening holes 21 is named the support splicing portion. That is, the support splicing portion is located outside the outermost ring of the screening holes 21 in the screening element 2.

[0145] To improve the structural strength of the screening component formed by splicing the edge splicing structure 210A with other splicing structures 210, and to reduce the impact of the support splicing part on particles passing between the screening component and the inner wall of the shell, the support splicing part can be designed as a diagonal bracing structure.

[0146] For an example, please refer to Figure 22 and Figure 23 , Figure 22 for Figure 6 The diagram shows the structure of the edge splicing structure 210A in the particle screening device 400. Figure 23 for Figure 22 The diagram shows the edge splicing structure 210A from another perspective. The edge splicing structure 210A includes a third splicing part 2105, a fourth splicing part 2106, and a fifth splicing part 2107. The third splicing part 2105 and the fourth splicing part 2106 are used to define the screening holes, and the fifth splicing part 2107 is located outside the outermost ring of screening holes. The fifth splicing part 2107 can be a diagonal bracing structure.

[0147] In the description of this specification, specific features, structures, materials, or characteristics may be combined in any suitable manner in one or more embodiments or examples.

[0148] The above-described preferred embodiments have further illustrated the purpose, technical solutions, and advantages of this application. It should be understood that the above are merely preferred embodiments of this application and are not intended to limit this application. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A particle sorting device, characterized by, It includes multiple filter elements, which are stacked together. Each filter element array is provided with a filter hole, and the filter holes of the multiple filter elements are connected.

2. The particle sorting device of claim 1, wherein The multiple screening elements are detachably connected.

3. The particle sorting device of claim 2, wherein, Each of the aforementioned screening components is provided with a connection hole; The particle screening device further includes fasteners connected to the plurality of connection holes of the plurality of screening elements.

4. The particle sorting device of claim 3, wherein The fastener includes a screw, a first nut, and a second nut. The screw passes through multiple connecting holes of the multiple screening elements. The first nut is located on one side of the multiple screening elements, and the second nut is located on the other side of the multiple screening elements. Both the first nut and the second nut are screwed to the screw. Alternatively, the fastener may include a pin that engages with one of the connection holes of the plurality of the plurality of the screening elements.

5. The particle sorting device of claim 2, wherein For two adjacent filter elements, one filter element is provided with a first snap-fit ​​portion and the other filter element is provided with a second snap-fit ​​portion, and the first snap-fit ​​portion snaps into the second snap-fit ​​portion.

6. The particle sorting device of claim 5, wherein One of the first snap-fit ​​portion and the second snap-fit ​​portion is a snap-fit ​​groove, and the other of the first snap-fit ​​portion and the second snap-fit ​​portion is a snap-fit ​​protrusion, which snaps into the snap-fit ​​groove.

7. The particle sorting device of claim 6, wherein The snap-fit ​​groove includes a first groove recessed along a first direction and a second groove recessed along a second direction from the inner wall surface of the first groove. The first direction is consistent with the arrangement direction of the plurality of screening elements, and the second direction is perpendicular to the first direction. The snap-fit ​​protrusion includes a first protrusion protruding along a first direction and a second protrusion protruding from the surface of the first protrusion along a second direction; the first protrusion is located within the first groove, and the second protrusion is located within the second groove.

8. The particle sorting device of claim 1, wherein, Multiple of the aforementioned screening components are welded.

9. The particle sorting device according to any one of claims 1 to 8, characterized in that The screening component includes multiple splicing structures, which are spliced ​​together to define multiple screening holes.

10. The particle screening device according to claim 9, characterized in that, The splicing structure includes a connecting part and a plurality of splicing parts connected to the periphery of the connecting part. The plurality of splicing structures are arranged circumferentially along the screening hole, and the splicing parts of the plurality of splicing structures surround the screening hole.

11. The particle sorting device of claim 10, wherein, The screening hole is formed by two adjacent splicing parts of the multiple splicing structures, and the splicing parts that form the screening hole by two adjacent splicing structures are connected.

12. The particle sorting device of claim 11, wherein, The splicing portions that form the screening holes by enclosing two adjacent splicing structures are respectively a first splicing portion and a second splicing portion. The first splicing portion includes a plurality of first protrusions, which are spaced apart circumferentially along the connecting portion. The second splicing part includes a plurality of second protrusions, which are spaced apart circumferentially along the connecting part; Along the circumference of the connecting portion, a plurality of first protrusions and a plurality of second protrusions are alternately arranged in sequence.

13. The particle sorting device according to any one of claims 1 to 12, characterized in that It also includes a housing, which has an installation channel, and a plurality of the screening elements are disposed within the installation channel; The plurality of filter elements includes a first filter element and a second filter element, wherein the first filter element is connected to the housing and the second filter element is connected to the first filter element.

14. The particle sorting device of claim 13, wherein, The housing includes a main body and a plurality of support parts disposed inside the main body. The plurality of support parts have different heights in the extension direction of the mounting channel and are staggered along the circumferential direction of the mounting channel. The first screening component includes a main body and a mounting portion disposed on the periphery of the main body, the mounting portion being disposed on the support portion.

15. The particle sorting device of claim 14, wherein, The support includes a plurality of support bosses spaced circumferentially along the mounting channel.

16. The particle sorting device according to any one of claims 13-15, characterized in that, Along the axial direction of the installation channel, the thickness of the first screening element is greater than or equal to 20 mm and less than or equal to 30 mm.

17. The particle sorting device according to any one of claims 13-15, characterized in that, Along the axial direction of the installation channel, the thickness of the second screening element is greater than or equal to 10 mm and less than or equal to 50 mm.

18. A thin film deposition apparatus, characterized by, The invention includes a reaction chamber and a particle screening device according to any one of claims 1-17, wherein the particle screening device is disposed within the reaction chamber.

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