Annealing device

Abstract

The annealing device comprises a furnace body, a first switch valve, a heating structure, a cooling structure and a driving structure, a storage cavity, an annealing cavity and a taking-out cavity are sequentially defined by the furnace body from top to bottom, the taking-out cavity is communicated with the annealing cavity through a first communication opening, and the storage cavity is communicated with the annealing cavity through a second communication opening; the taking-out cavity is provided with a taking-out opening capable of being opened and closed so that workpieces can be taken out, the storage cavity is provided with a storage inlet capable of being opened and closed so that a plurality of workpieces to be annealed can be stored in, the heating structure is arranged on the furnace body and located in the annealing cavity, the cooling structure is arranged on the furnace body and corresponds to the annealing cavity, and the driving structure can move among the storage cavity, the annealing cavity and the taking-out cavity. And the driving device is used for driving the workpieces in the storage cavity into the annealing cavity and driving the workpieces in the annealing cavity into the taking-out cavity in sequence. Therefore, sequential annealing of the multiple workpieces in the storage cavity is conveniently achieved, and the working efficiency of the annealing device is improved.

Description

Technical Field

[0001] This utility model relates to the field of single crystal processing and preparation technology, and in particular to an annealing apparatus. Background Technology

[0002] Monocrystalline silicon ingots grown via the Czochralski method are susceptible to resistivity variations due to differences in heating history and oxygen content, which can lead to P / N inversion in severe cases. Therefore, annealing is necessary to eliminate the adverse effects of oxygen donors. However, annealing equipment in related technologies has relatively low operating efficiency. Utility Model Content

[0003] This invention aims to solve at least one of the technical problems existing in the prior art. To this end, this invention proposes an annealing device in which, after the storage chamber contains an annealed workpiece, the drive structure can transfer the workpiece to be annealed into the annealing chamber for annealing. By closing the first switch valve, the removal chamber and the annealing chamber are not connected, eliminating the need to stop the furnace due to the removal of the workpiece, thus improving the working efficiency of the annealing device.

[0004] The annealing apparatus according to an embodiment of the present invention includes: a furnace body, a first switching valve, a heating structure, a cooling structure, and a driving structure. The furnace body defines a storage chamber, an annealing chamber, and a take-out chamber from top to bottom. The take-out chamber is connected to the annealing chamber through a first connecting port, and the storage chamber is connected to the annealing chamber through a second connecting port. The take-out chamber has an openable take-out port for taking out workpieces, and the storage chamber has an openable storage port for storing multiple workpieces to be annealed. The first switching valve is located at the first connecting port and is used to control the connection and disconnection between the take-out chamber and the annealing chamber. The heating structure is located in the furnace body and inside the annealing chamber. The cooling structure is located in the furnace body and is arranged corresponding to the annealing chamber, and is spaced apart on the side of the heating structure near the first connecting port. The driving structure is located in the furnace body and can move between the storage chamber, the annealing chamber, and the take-out chamber to drive the workpieces in the storage chamber to the annealing chamber and to sequentially drive the workpieces in the annealing chamber to the take-out chamber.

[0005] According to the annealing apparatus of this utility model embodiment, the storage chamber can be used to store multiple workpieces to be annealed. When the drive structure transfers the annealed workpiece to the take-out chamber, the first switch valve is closed to prevent the take-out chamber and the annealing chamber from communicating. The annealed workpiece can be taken out through the take-out port. The take-out process does not easily affect the annealing chamber, which can improve the stability of the atmosphere in the annealing chamber. There is no need to stop the furnace due to the take-out of the workpiece in the take-out chamber, which can improve the working efficiency of the annealing apparatus.

[0006] In some embodiments, the driving structure includes a first driving component and a second driving component. The first driving component includes a first carrier member, which carries a workpiece and can move between a storage cavity and an annealing cavity through a second communication port to drive the workpiece in the storage cavity into the annealing cavity. The second driving component is independently disposed from the first driving component and includes a second carrier member, which carries a workpiece and can move between an annealing cavity and a take-out cavity through the first communication port to receive the workpiece on the first carrier member and drive the workpiece into the take-out cavity.

[0007] In some embodiments, the annealing chamber has a heating position and a junction position. The heating structure is used to heat the workpiece at the heating position. The first support member and the second support member junction the workpiece at the junction position. Relative to the junction position, the heating position is located adjacent to the first communication port, so that the second support member is used to move the workpiece to the heating position for heating and through the cooling structure; and / or, the annealing apparatus further includes a plurality of bases, each base being adapted to support the bottom of a corresponding workpiece. Each base is separably coupled with the first support member and separably coupled with the second support member, wherein the base is adapted to be placed on the first support member, and the second support member is vertically and rotatably configured. The outer periphery of the base... The wall has multiple first grooves and multiple second grooves. The multiple first grooves are arranged sequentially around the vertical central axis of the base. Each first groove is spaced apart from the top surface of the base and extends around the vertical central axis. The multiple second grooves are spaced apart around the vertical central axis of the base. Each second groove is connected to the top of the corresponding first groove and penetrates the top surface of the base. The second support member has a placement cavity. The bottom of the placement cavity has a through-hole for the workpiece to enter and exit. The outer periphery of the through-hole is provided with multiple spaced claws. The claws extend toward the vertical central axis of the placement cavity. The claws are adapted to stop and engage with the corresponding first groove through the corresponding second groove and separate from the corresponding first groove.

[0008] In some embodiments, when the annealing apparatus includes multiple bases, the second support member is a cage-like structure and includes: a bracket, multiple vertical ribs and multiple limiting members. The multiple vertical ribs are spaced apart around the vertical central axis of the placement cavity. Each vertical rib extends vertically and its upper end is connected to the bracket. The lower end of each vertical rib is bent and connected to a claw. Each limiting member is disposed on the corresponding vertical rib and is at least partially located on the radial inner side of the corresponding vertical rib. The limiting member extends toward the vertical central axis of the placement cavity beyond the corresponding claw and is adapted to limit and cooperate with the outer peripheral wall of the workpiece.

[0009] In some embodiments, the annealing apparatus further includes: a conveying table, a support table, and a transfer structure. The conveying table is disposed in a storage cavity and is used to sequentially convey multiple workpieces to a preset position in the horizontal direction. The support table is disposed in the storage cavity and is spaced apart on one side of the conveying table in the horizontal direction and surrounds a first support member. The first support member can be raised and lowered relative to the support table, and the lowest position of the first support member is located below the support table. The transfer structure is disposed in the storage cavity and is used to transfer the workpieces on the conveying table at the preset position to the upper side of the support table. The storage inlet is located on the side of the conveying table away from the support table in the horizontal direction.

[0010] In some embodiments, the storage cavity has a first protective gas inlet and a first vacuum port, each of the first protective gas inlet and the first vacuum port being spaced apart from the first communication port and the take-out port respectively; and / or, the annealing apparatus further includes a second switching valve, the second switching valve being located at the second communication port and used to control the on / off connection between the storage cavity and the annealing cavity, and the take-out cavity has a second protective gas inlet and a second vacuum port, each of the second protective gas inlet and the second vacuum port being spaced apart from the second communication port and the storage inlet respectively.

[0011] In some embodiments, the cooling structure is disposed in the annealing chamber and both the cooling structure and the heating structure are formed as vertically arranged cylindrical structures. The cooling structure is spaced above the heating structure and located radially inside the heating structure. The upper end of the cooling structure is connected to the first communication port. The annealing device also includes a heat insulation structure, which is disposed in the annealing chamber and surrounds the heating structure. The heat insulation structure separates the heating structure from the cooling structure.

[0012] In some embodiments, the thermal insulation structure includes: a first insulation part and a second insulation part. The first insulation part is disposed between the heating structure and the furnace body, and the upper end of the first insulation part has a clearance opening to avoid the cooling structure. The second insulation part is formed as a cylindrical structure and is sleeved outside the cooling structure. The upper end of the second insulation part is connected to the clearance opening, and the lower end extends downward beyond the lower end of the cooling structure and extends radially inward beyond the inner peripheral wall of the cooling structure. The axial length of the cooling structure is L, and the axial length of the second insulation part is H, where 1.5≤L / H≤3.

[0013] In some embodiments, the workpiece is a crystal rod segment, the first connecting port is located at the top of the annealing chamber, the second connecting port is located at the bottom of the annealing chamber and is vertically opposite to the first connecting port, and the driving structure is configured to drive the workpiece to rise, fall and rotate so that the workpiece passes through the second connecting port and the first connecting port in sequence.

[0014] In some embodiments, both the heating structure and the cooling structure are formed as cylindrical structures and are both vertically arranged to avoid the first and second connecting ports. The annealing device further includes: a first temperature measuring structure and a second temperature measuring structure. The first temperature measuring structure is used to measure the top temperature T1 of the workpiece. The first temperature measuring structure is located at the top of the extraction chamber and opposite to the first connecting port. The second temperature measuring structure is used to measure the bottom temperature T2 of the workpiece and is located at the second connecting port. The annealing chamber has a heating position. The driving structure is configured to drive the workpiece to the heating position for rotational heating. At the heating position, |T1-T2|≤10℃.

[0015] Additional aspects and advantages of this invention will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. Attached Figure Description

[0016] The above and / or additional aspects and advantages of this utility model will become apparent and readily understood from the description of the embodiments taken in conjunction with the following drawings, in which:

[0017] Figure 1 This is a schematic diagram of an annealing apparatus according to some embodiments of the present invention;

[0018] Figure 2 for Figure 1 Another schematic diagram of the annealing apparatus shown;

[0019] Figure 3 for Figure 1 Another schematic diagram of the annealing apparatus shown;

[0020] Figure 4 for Figure 1 Another schematic diagram of the annealing apparatus shown;

[0021] Figure 5 for Figure 1 A schematic diagram of the base shown;

[0022] Figure 6 for Figure 5 Another schematic diagram of the base shown;

[0023] Figure 7 for Figure 5 A cross-sectional view of the base shown;

[0024] Figure 8 for Figure 5 Another schematic diagram of the base shown;

[0025] Figure 9 for Figure 5 Another schematic diagram of the base shown;

[0026] Figure 10 for Figure 1 A schematic diagram of the second support member shown;

[0027] Figure 11 for Figure 10 Another schematic diagram of the second carrier shown;

[0028] Figure 12 The graph shows the measurement data of the first and second temperature measuring structures after the workpiece is heated at different positions relative to the heating structure.

[0029] Figure label:

[0030] Annealing apparatus 100, furnace body 1, storage chamber 10, storage inlet 10a, first protective gas inlet 10b, first vacuum port 10c, annealing chamber 11, first connecting port 11a, second connecting port 11b, removal chamber 12, removal outlet 12a, second protective gas inlet 12b, second vacuum port 12c, first switching valve 20, second switching valve 22, heating structure 30, cooling structure 32, driving structure 4, first driving component 40, first bearing component 41, rod 41a, positioning part 41b, second driving component 42, second bearing component 43, placement chamber 43a, bracket 4 3b, vertical ribs 43c, limiting component 43d, through port 43e, claw 43f, base 5, first groove 50, second groove 51, first seat body 52, second seat body 53, third seat body 54, measuring hole 55, positioning groove 56, conveying table 60, bearing table 62, transfer structure 64, first robotic arm 64a, second robotic arm 64b, pick-and-place clamp 64c, limiting bracket protrusion 64d, thermal insulation structure 7, first thermal insulation part 70, first part 70a, second part 70b, second thermal insulation part 72, first temperature measuring structure 80, second temperature measuring structure 82, workpiece 9. Detailed Implementation

[0031] The embodiments of this utility model are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain this utility model, and should not be construed as limiting this utility model.

[0032] The following disclosure provides numerous different embodiments or examples for implementing various structures of the present invention. To simplify the disclosure, specific examples of components and arrangements are described below. These are merely examples and are not intended to limit the scope of the invention. Furthermore, reference numerals and / or letters may be repeated in different examples. Such repetition is for simplification and clarity and does not in itself indicate a relationship between the various embodiments and / or arrangements discussed. In addition, examples of various specific processes and materials are provided in this invention; however, those skilled in the art will recognize the applicability of other processes and / or the use of other materials.

[0033] In the description of the embodiments in this application, the term "and / or" is merely a description of the relationship between related objects, indicating that three relationships can exist. For example, A and / or B can represent: A existing alone, A and B existing simultaneously, and B existing alone. Additionally, the character " / " in this document generally indicates that the preceding and following related objects have an "or" relationship.

[0034] Hereinafter, with reference to the accompanying drawings, an annealing apparatus 100 according to an embodiment of the present invention will be described.

[0035] like Figures 1-4 As shown, the annealing apparatus 100 includes: a furnace body 1, a first switching valve 20, a heating structure 30, a cooling structure 32, and a driving structure 4. The furnace body 1 defines a storage chamber 10, an annealing chamber 11, and a take-out chamber 12 from top to bottom. The storage chamber 10 is located above the annealing chamber 11, and the take-out chamber 12 is located below the annealing chamber 11. The storage chamber 10 is used to hold multiple workpieces 9 to be annealed. The take-out chamber 12 is connected to the annealing chamber 11 through a first connecting port 11a, and the storage chamber 10 is connected to the annealing chamber 11 through a second connecting port 11b. The take-out chamber 12 has an openable and closed take-out port 12a for taking out the workpieces 9, and the storage chamber 10 has an openable and closed storage port 10a for holding multiple workpieces 9 to be annealed. Storage; The first switching valve 20 is located at the first connecting port 11a, and the first switching valve 20 is used to control the opening and closing between the take-out chamber 12 and the annealing chamber 11. The heating structure 30 is located in the furnace body 1 and is located in the annealing chamber 11. The cooling structure 32 is located in the furnace body 1 and is arranged corresponding to the annealing chamber 11. The cooling structure 32 is spaced apart on the side of the heating structure 30 near the first connecting port 11a. The driving structure 4 is located in the furnace body 1 and can move between the storage chamber 10, the annealing chamber 11 and the take-out chamber 12, so as to drive the workpiece 9 in the storage chamber 10 to the annealing chamber 11, and to drive the workpiece 9 in the annealing chamber 11 to the take-out chamber 12 in sequence.

[0036] For example, the drive structure 4 can be used to move multiple workpieces 9 from the storage cavity 10 to the annealing cavity 11 one by one, and to move one workpiece 9 from the annealing cavity 11 to the removal cavity 12. In other words, the drive structure 4 can move one workpiece 9 from the storage cavity 10 to the annealing cavity 11 at a time, and it can also move one workpiece 9 from the annealing cavity 11 to the removal cavity 12 at a time. The drive structure 4 can also be used to move one workpiece 9 sequentially through the heating structure 30 and the cooling structure 32 to achieve annealing of the workpiece 9. The drive structure 4 can transfer the workpiece 9 to be annealed in the storage cavity 10 to the annealing cavity 11 through the second connecting port 11b for annealing, and it can also transfer the annealed workpiece 9 to the removal cavity 12 through the first connecting port 11a.

[0037] For example, after an annealed workpiece 9 is placed in the extraction chamber 12, the first switch valve 20 is closed to disconnect the extraction chamber 12 from the annealing chamber 11, allowing the worker to switch the extraction outlet 12a from the closed state to the open state and extract the annealed workpiece 9 through the extraction outlet 12a. After the annealed workpiece 9 is extracted, the extraction outlet 12a is switched to the closed state, and then the first switch valve 20 is opened to connect the extraction chamber 12 and the annealing chamber 11, so that the next workpiece 9 can be transferred to the extraction chamber 12 after annealing. Then the first switch valve 20 is closed, and this cycle is repeated. Obviously, in the process of extracting the annealed workpiece 9, the extraction chamber 12 and the annealing chamber 11 are first isolated. After opening the outlet 12a and removing the workpiece 9, close the outlet 12a first, and then connect the removal chamber 12 and the annealing chamber 11. This helps to reduce the influence of the external environment (such as temperature) on the atmosphere inside the annealing chamber 11 during the removal of the workpiece 9. It also makes it easier to anneal the second workpiece 9 after the first workpiece 9 has been annealed, so that the heating structure 30 and the cooling structure 32 do not need to be stopped and restarted. Therefore, for multiple workpieces 9 stored in the storage chamber 10, the annealing device 100 can anneal the multiple workpieces 9 sequentially. In addition, the heating structure 30 and the cooling structure 32 do not need to be stopped and restarted repeatedly during the whole process, so as to realize the sequential annealing of multiple workpieces 9 in the storage chamber 10, improve work efficiency, and increase production capacity.

[0038] Furthermore, the above-mentioned arrangement of the extraction cavity 12 facilitates a suitable reduction in the size of the extraction cavity 12. When the extraction cavity 12 is connected to the annealing cavity 11 after the workpiece 9 is removed and the extraction outlet 12a is closed, the influence of the atmosphere inside the extraction cavity 12 / the outside environment on the atmosphere inside the annealing cavity 11 is relatively small. Moreover, the extraction cavity 12 does not need to store the workpiece 9, and the annealed workpiece 9 can be removed in time for subsequent processing.

[0039] This application sets up a first switching valve 20 so that the take-out chamber 12 can work as an independent chamber. That is, the workpiece 9 that has been annealed is not easily interfered with by the components of the annealing chamber 11 when it is taken out through the take-out port 12a. At the same time, the workpiece 9 taken out through the take-out port 12a is not easily interfered with the annealing chamber 11 for annealing the workpiece 9 to be annealed. This reduces the downtime of the annealing device 100 and allows the annealing device 100 to anneal multiple workpieces 9 in the storage chamber 10 in sequence, which helps to improve the working efficiency of the annealing device 100.

[0040] In related technologies, after the workpiece has been annealed, the annealing device needs to stop operating before it can be removed. The device must then restart to anneal the next workpiece, resulting in low efficiency. In contrast, the removal of the annealed workpiece 9 in this application does not easily affect the annealing chamber 11, thus reducing the downtime of the annealing device 100 and improving its efficiency. Furthermore, the furnace body 1 contains a storage chamber 10, an annealing chamber 11, and a removal chamber 12. The furnace body 1 provides a relatively sealed environment for these three chambers, making it less susceptible to external environmental interference during the annealing of the workpiece 9. This reduces the possibility of contamination and improves the product quality of the workpiece 9.

[0041] Furthermore, the heating structure 30 and the cooling structure 32 are located in the annealing chamber 11, and the cooling structure 32 is spaced apart on the side of the heating structure 30 near the first connecting port 11a. That is, compared with the heating structure 30, the cooling structure 32 is closer to the take-out chamber 12. When the annealing device 100 is working, the heating structure 30 first heats the workpiece 9, and then the cooling structure 32 cools the workpiece 9. Through the above arrangement of the heating structure 30 and the cooling structure 32, the transfer path of the workpiece 9 can be more clearly defined, so that the drive structure 4 can first pass through the heating structure 30 to heat the workpiece 9 and then pass through the cooling structure 32 to cool it down during the transfer of the workpiece 9, thus completing the annealing. This achieves a good match between the arrangement of the heating structure 30 and the cooling structure 32 and the transfer of the workpiece 9 by the drive structure 4, which to a certain extent helps to shorten the transfer distance of the workpiece 9 and improves the working efficiency of the annealing device 100. Furthermore, the heating structure 30 and the cooling structure 32 are spaced apart to minimize mutual interference. The heating structure 30 provides a good heating effect on the workpiece 9, and the cooling structure 32 provides a good cooling effect, ensuring a good annealing effect for the workpiece 9. For example, if the workpiece 9 to be annealed is a crystal rod segment, annealing the crystal rod segment using the aforementioned heating structure 30 and cooling structure 32 helps eliminate the adverse effects of oxygen donors, resulting in a higher quality crystal rod segment. Of course, the workpiece 9 to be annealed can also be a silicon wafer.

[0042] Oxygen donors are understood to be defect structures with donor characteristics formed by oxygen impurities in semiconductor materials such as silicon single crystals under specific heat treatment conditions (e.g., around 450°C). They can increase the resistivity of a semiconductor material that was originally P-type, or even cause it to invert to N-type. This is because oxygen atoms polymerize during heat treatment to form electrically active polymers, donating electrons to become donors. Annealing is used to address the oxygen donor problem by heat-treating the material at a temperature higher than the oxygen donor formation temperature (e.g., around 700°C). This allows the oxygen donors to return to their interstitial oxygen state, thus eliminating their adverse effects on electrical properties such as resistivity. Rapid cooling is then necessary to prevent the re-formation of oxygen donors and ensure the stability of the material's properties.

[0043] According to the annealing apparatus 100 of this utility model embodiment, the storage chamber 10 can be used to store multiple workpieces 9 to be annealed. When the drive structure 4 transfers at least one workpiece 9 that has been annealed to the take-out chamber 12, the first switch valve 20 is closed so that the take-out chamber 12 and the annealing chamber 11 are not connected. The annealed workpiece 9 can be taken out through the take-out port 12a. The take-out process does not easily affect the annealing chamber 11, which can improve the stability of the atmosphere in the annealing chamber 11. There is no need to stop the furnace due to the take-out of the workpiece 9 in the take-out chamber 12, which is conducive to improving the working efficiency of the annealing apparatus 100.

[0044] like Figures 1-4 As shown, in some embodiments, the drive structure 4 includes a first drive component 40 and a second drive component 42. The first drive component 40 includes a first support member 41, which carries the workpiece 9 and can move between the storage cavity 10 and the annealing cavity 11 through the second communication port 11b to move the workpiece 9 from the storage cavity 10 to the annealing cavity 11. The second drive component 42 is independently configured from the first drive component 40, so the second drive component 42 and the first drive component 40 operate independently and their operating states do not interfere with each other. The second drive component 42 includes a second support member 43, which carries one workpiece 9 and can move between the annealing cavity 11 and the removal cavity 12 through the first communication port 11a to receive the workpiece 9 on the first support member 41 and move the workpiece 9 into the removal cavity 12. It can be understood that the first support member 41 can be used to carry one workpiece 9.

[0045] As can be seen, the first carrier 41 can transfer the unannealed workpiece 9 into the annealing chamber 11, while the second carrier 43 can transfer the annealed workpiece 9 into the removal chamber 12. During the process of the second carrier 43 transferring the previous annealed workpiece 9, the first carrier 41 simultaneously transfers the next workpiece 9 to be annealed toward the annealing chamber 11. That is to say, the second carrier 43 transfers the previous annealed workpiece 9, which corresponds to the first time period, and the first carrier 41 transfers the next workpiece 9 to be annealed into the annealing chamber 11, which corresponds to the second time period. The second time period overlaps with the first time period at least partially, so that the first carrier 41 can prepare in advance for the annealing of the next workpiece 9, which is conducive to further improving the working efficiency of the annealing device 100.

[0046] It is understood that the first driving component 40 may further include a first driving mechanism, which drives the first carrier 41 to move; the second driving component 42 may further include a second driving mechanism, which drives the second carrier 43 to move. The structures of the first driving mechanism and the second driving mechanism are well known to those skilled in the art according to the required movement mode of the corresponding carrier 41, and will not be described in detail here.

[0047] In addition, during the heating and cooling process of workpiece 9, the first support member 41 carries the workpiece to the annealing chamber 11, the second support member 43 receives the workpiece 9, and then the workpiece is annealed through the heating structure 30. After the annealing is completed, the second support member 43 carries the workpiece 9 through the cooling structure 32 and continues to carry the workpiece 9 to the removal chamber 12.

[0048] Of course, in other embodiments of this application, the driving structure 4 can also be a single driving component. This driving component moves a workpiece 9 into the annealing chamber 11, and after passing through the heating structure 30 and the cooling structure 32 in sequence to complete the annealing, it continues to move the workpiece 9 to the removal chamber 12, and then moves towards the storage chamber 10 to transfer the next workpiece 9 in the above manner. For example, the first connecting port 11a is located at the top of the annealing chamber 11, and the second connecting port 11b is located at the bottom of the annealing chamber 11. The driving component can include a lifting structure or a suspension structure, so that the driving component can carry the workpiece 9 to rise and descend to the storage chamber 10 to move the next workpiece 9.

[0049] like Figures 1-11 As shown, in some embodiments, the annealing apparatus 100 satisfies at least one of the following conditions A1 to A2.

[0050] In condition A1, the annealing chamber 11 has a heating position and a transfer position. The heating structure 30 is used to heat the workpiece 9 in the heating position. The first support member 41 and the second support member 43 transfer the workpiece 9 at the transfer position. When the workpiece 9 moves to the transfer position, the second support member 43 takes the workpiece 9 from the first support member 41. Relative to the transfer position, the heating position is set adjacent to the first connecting port 11a so that the second support member 43 can be used to drive the workpiece 9 to the heating position for heating and through the cooling structure 32.

[0051] Relative to the handover position, the heating structure 30 is located adjacent to the first connecting port 11a, and the first carrier 41 and the second carrier 43 hand over the workpiece 9 at the handover position. That is, the first carrier 41 is only used to transfer the workpiece 9 to be annealed from the storage cavity 10 to the annealing cavity 11, and will not participate in the annealing operation of the workpiece 9 to be annealed. After the first carrier 41 transfers the workpiece 9 to be annealed from the storage cavity 10 to the handover position, the second carrier 43 can receive the workpiece 9 to be annealed on the first carrier 41, and then transfer the workpiece 9 to be annealed to the heating position and the cooling structure 32 position in sequence through the second carrier 43 to perform the annealing operation of the workpiece 9 to be annealed. At this time, the first carrier 41 can prepare the next workpiece 9 to be annealed. It can be seen that the second carrier 43 realizes the annealing operation of the workpiece 9 throughout the process. Since annealing requires a certain amount of time, the first carrier 41 can make good use of this time to transfer the next workpiece 9 to be annealed, so that the annealing device 100 can have a better working rhythm and improve the working efficiency of the annealing device 100.

[0052] The second support member 43 is used to move the workpiece 9 to the heating position and then through the cooling structure 32. The annealing operation of the workpiece 9 can be realized through the second support member 43. The second support member 43 integrates the heating and cooling steps of the workpiece 9 into a continuous process, reducing the time for manual intervention and equipment switching, thereby significantly improving production efficiency. At the same time, if other operations need to be performed on the workpiece 9 during the annealing process, such as the workpiece 9 needing to rotate during heating or cooling, only the second drive member 42 needs to be adjusted. This simplifies the structure of the first drive member 40 and eliminates the need for complex adjustments to the first drive member 40, thereby reducing operational complexity and improving the working efficiency of the annealing device 100.

[0053] For example, after the first carrier 41 transfers a workpiece 9 from the storage cavity 10 to the handover position, the second carrier 43 can receive the workpiece 9 on the first carrier 41. Then, the second carrier 43 will sequentially pass the heating position and the cooling structure 32 position for annealing. As long as the workpiece is transferred to the second carrier 43, the first carrier 41 can move toward the storage cavity 10 to transfer the next workpiece 9 to be annealed. For example, when the second carrier 43 transfers the annealed workpiece 9 to the take-out cavity 12, the first carrier 41 can transfer the next workpiece 9 to be annealed to the handover position.

[0054] Condition A2, the annealing apparatus 100 also includes a plurality of bases 5, each base 5 being adapted to support the bottom of a corresponding workpiece 9. Each base 5 is separable from and can be detachably fitted with the first support member 41, and each base 5 is separable from and can be detachably fitted with the second support member 43. The base 5 is adapted to be placed on the first support member 41, and the second support member 43 is liftable and rotatable. The outer peripheral wall of the base 5 is formed with a plurality of first grooves 50 and a plurality of second grooves 51. The plurality of first grooves 50 are arranged around the vertical central axis of the base 5 (e.g., ...). Figure 7 The L1 components are arranged sequentially, with each first groove 50 spaced apart from the top surface of the base 5 and extending around the vertical central axis. Multiple second grooves 51 are spaced apart around the vertical central axis of the base 5, each second groove 51 connecting to the top of the corresponding first groove 50 and penetrating the top surface of the base 5. The second support member 43 has a placement cavity 43a, with a passage 43e at the bottom of the placement cavity 43a for the workpiece 9 to enter and exit. Multiple spaced-apart claws 43f are provided on the outer periphery of the passage 43e, with the claws 43f facing the vertical central axis of the placement cavity 43a (e.g., ...). Figure 10 The L2) extends, and the claw 43f is adapted to abut against the corresponding first groove 50 through the corresponding second groove 51, and the claw 43f is adapted to separate from the corresponding first groove 50 through the corresponding second groove 51.

[0055] By setting the base 5, the first support member 41 and the second support member 43 will not directly contact the workpiece 9. The first support member 41 and the second support member 43 indirectly cooperate with the workpiece 9 through the base 5, so that the first support member 41 and the second support member 43 are less likely to damage the workpiece 9. When the second support member 43 supports the workpiece 9 on the first support member 41, the second support member 43 can cooperate with the base 5 and lift the base 5, thereby separating the base 5 from the first support member 41. There is no specific restriction on the direction of movement of the first support member 41. For example, the first support member 41 can be raised and lowered; the second support member 43 can be rotated. When the workpiece 9 is cooled, the second support member 43 can indirectly drive the workpiece 9 to rotate through the base 5, so that the cooling of the workpiece 9 can be more uniform and the workpiece 9 is less likely to have excessive local internal stress, which is conducive to improving the product quality of the workpiece 9. Multiple first grooves 50 are arranged along the circumference of the base 5. Adjacent first grooves 50 can be connected or not connected. For example, multiple first grooves 50 are spaced apart along the circumference of the base 5, or multiple first grooves 50 are connected to form an annular groove. The second support member 43 also has a placement cavity 43a. The workpiece 9 can enter the placement cavity 43a through the opening 43e at the bottom of the placement cavity 43a.

[0056] The following explains the cooperation between the second support member 43 and the base 5 in the embodiments of this application.

[0057] The first support member 41 moves the workpiece 9 into the annealing chamber 11 via the base 5, positioning the workpiece 9 at the junction. By rotating the second support member 43, the chuck 43f rotates, allowing multiple chucks 43f and multiple second grooves 51 to be positioned in a one-to-one correspondence. Each chuck 43f is located directly above its corresponding second groove 51, minimizing interference when the chucks 43f and second grooves 51 engage. The second support member 43 is then lowered, allowing the chucks 43f to engage with the first groove 50 via the second groove 51. The second support member 43 is then rotated again, causing the chucks 43f to rotate, allowing the chucks 43f and their corresponding second grooves 51 to be axially misaligned. Finally, the second support member 43 is raised, allowing the chucks 43f to abut against the top wall of the first groove 50, thus achieving the engagement of the second support member 43, the base 5, and the workpiece 9, facilitating subsequent transfer and rotation of the workpiece 9. It is understandable that the process of separating the chuck 43f from the first groove 50 is similar to the process of engaging the chuck 43f with the first groove 50, so it will not be described in detail here.

[0058] For example, the base 5 includes a first base portion 52, a second base portion 53, and a third base portion 54, which are arranged sequentially along the vertical central axis of the base 5. The workpiece 9 is adapted to be placed on the upper surface of the first base portion 52. The outer periphery of the second base portion 53 is located within the outer periphery of the first base portion 52, that is, the outer diameter of the second base portion 53 is smaller than the outer diameter of the first base portion 52, so that a first groove 50 is formed between the first base portion 52 and the second base portion 53. A plurality of second grooves 51 are arranged at intervals around the vertical central axis of the base 5, and the second grooves 51 penetrate through the upper and lower surfaces of the first base portion 52, so that the claw 43f can abut against the lower surface of the first base portion 52 through the second grooves 51, thereby realizing the cooperation of the second support member 43, the base 5, and the workpiece 9. Optionally, if the annealing apparatus 100 includes the second temperature measuring structure 82 described below, the base 5 may be provided with a measuring hole 55 to avoid the temperature measuring signal of the second temperature measuring structure 82.

[0059] In some embodiments, the rotational speed of the second support member 43 is v1, where 0.5 rpm ≤ v1 ≤ 15 rpm. After the second support member 43 and the base 5 are engaged, the second support member 43 can drive the base 5 and the workpiece 9 to rotate together. By limiting the rotational speed of the second support member 43 to the range of 0.5 rpm ≤ v1 ≤ 15 rpm, the heating or cooling of the workpiece 9 can be made more uniform, and the workpiece 9 is less likely to experience large shaking on the base 5, which helps to improve the reliability of the annealing device 100. For example, v1 can be 0.5 rpm, 2 rpm, 5 rpm, 8 rpm, 9.5 rpm, 11.5 rpm, 13 rpm, 15 rpm, etc.

[0060] like Figures 1-4 As shown, in some embodiments, the first support member 41 includes a rod 41a and a positioning part 41b. The positioning part 41b is located at the upper end of the rod 41a, and a positioning groove 56 is formed at the lower end of the base 5. The positioning part 41b is adapted to be limited and fitted in the positioning groove 56. For example, the positioning part 41b is conical and the positioning groove 56 is a conical groove, so that the first support member 41 and the base 5 can be separably fitted, and the first support member 41 can stably support the base 5.

[0061] like Figures 1-11As shown, in some embodiments, when the annealing apparatus 100 at least satisfies condition A2, the second support member 43 is a cage-like structure and includes a bracket 43b, a plurality of vertical ribs 43c and a plurality of limiting members 43d. The plurality of vertical ribs 43c are spaced apart around the vertical central axis of the placement cavity 43a. Each vertical rib 43c extends vertically, and the upper end of each vertical rib 43c is connected to the bracket 43b. The lower end of each vertical rib 43c is bent and connected to a claw 43f. Each limiting member 43d is provided on the corresponding vertical rib 43c and each limiting member 43d is at least partially located radially inside the corresponding vertical rib 43c. The limiting member 43d extends toward the vertical central axis of the placement cavity 43a beyond the corresponding claw 43f, and the limiting member 43d is adapted to limit and cooperate with the outer peripheral wall of the workpiece 9.

[0062] As can be seen, multiple vertical ribs 43c are spaced apart circumferentially along the placement cavity 43a. The space between the bracket 43b, the multiple vertical ribs 43c, and the multiple jaws 43f defines the placement cavity 43a, and the interval between the multiple jaws 43f defines the opening 43e of the placement cavity 43a, so that the workpiece 9 can enter the placement cavity 43a through the opening 43e. The workpiece 9 is less likely to interfere with the second support member 43, thereby reducing the possibility of damage to the workpiece 9. It can be understood that the bracket 43b can be disc-shaped, cross-shaped, or star-shaped, etc., and the operator can choose according to the actual usage requirements.

[0063] For example, the outer peripheral wall of the base 5 has a plurality of first grooves 50 and second grooves 51. The second support member 43 includes a bracket 43b, a plurality of vertical ribs 43c and a plurality of limiting members 43d. When the base 5 and the second support member 43 are engaged, rotating the second support member 43 causes the claws 43f to rotate, so that the plurality of claws 43f and the plurality of second grooves 51 can be set one-to-one. Then the second support member 43 is lowered so that the claws 43f can engage with the first grooves 50 through the second grooves 51. At this time, the plurality of vertical ribs 43c are spaced apart on the outer periphery of the base 5. The second support member 43 is rotated to rotate the claw 43f and the vertical rib 43c, so that the vertical rib 43c is less likely to interfere with the base 5. Then the second support member 43 is rotated to rotate the claw 43f, for example, the second support member 43 rotates the claw 43f by 45°, so that the claw 43f and the second groove 51 are circumferentially misaligned. At this time, the second support member 43 is raised so that the claw 43f can abut against the side wall of the first groove 50 along the vertical central axis facing the top surface of the base 5, thereby realizing the cooperation of the second support member 43, the base 5 and the workpiece 9.

[0064] Furthermore, each limiting member 43d is provided on the corresponding vertical rib 43c. For example, each vertical rib 43c has one or more limiting members 43d, and the limiting member 43d extends beyond the corresponding claw 43f towards the vertical center axis of the placement cavity 43a. That is, relative to the claw 43f, the limiting member 43d is set closer to the vertical center axis of the placement cavity 43a. The limiting member 43d can limit and cooperate with the outer peripheral wall of the workpiece 9. For example, the limiting member 43d and the workpiece 9 are in a radial clearance fit in the placement cavity 43a (e.g., the radial distance between the limiting member 43d and the workpiece 9 in the placement cavity 43a is 2mm to 3mm). When the annealing device 100 is subjected to external force or vibration, the workpiece 9 placed on the base 5 may be at risk of tilting. At this time, a portion of the limiting member 43d can abut against the outer peripheral wall of the workpiece 9 to prevent the workpiece 9 from tilting too much, thereby reducing the risk of the workpiece 9 falling and improving the reliability of the annealing device 100.

[0065] Optionally, the limiting member 43d is a carbon carbon bolt. Carbon carbon bolts have good high temperature resistance, which can improve the service life of the limiting member 43d in the annealing device 100. In addition, carbon carbon bolts have good strength, so that the limiting member 43d can stably limit the outer peripheral wall of the workpiece 9, which can improve the reliability of the annealing device 100.

[0066] like Figures 1-4 As shown, in some embodiments, the annealing apparatus 100 further includes a conveyor 60, a support platform 62, and a transfer structure 64. The conveyor 60 is disposed within the storage cavity 10 and is used to move multiple workpieces 9 along a horizontal direction (e.g., Figure 1 The workpiece 9 (in the AA' direction) is sequentially conveyed to a preset position. A support platform 62 is located within the storage cavity 10. The support platforms 62 are spaced apart on one side of the conveyor platform 60 in the horizontal direction and surround the first support member 41. The first support member 41 can be raised and lowered relative to the support platform 62, and its lowest position is below the support platform 62. A transfer structure 64 is located within the storage cavity 10 and is used to transfer the workpiece 9, which is at a preset position on the conveyor platform 60, to the upper side of the support platform 62. It can be seen that the conveyor platform 60 allows the transfer structure 64 to have a relatively clear initial position (corresponding to the preset position) and end position (corresponding to the support platform 62) when transferring the workpiece 9. This allows the transfer structure 64 to perform the transfer directly according to the preset path and action without additional position adjustment or calibration, improving the accuracy of the transfer. Furthermore, since the transfer position of the workpiece 9 is fixed, the transfer structure 64 does not need to search or locate before each transfer, thus reducing waiting and preparation time and improving the working efficiency of the annealing device 100.

[0067] Furthermore, since the support platform 62 is arranged around the first support member 41, the radial dimension of the support platform 62 is larger than that of the first support member 41, providing a larger placement surface for the workpiece 9. During transfer, the first support member 41 first descends to its lowest position, and then the transfer structure 64 transfers the workpiece 9 to the upper side of the support platform 62. It is not necessary to precisely level the upper surface of the first support member 41 and the upper surface of the support platform 62. The workpiece 9 can be placed directly on the support platform 62, so that the first support member 41 does not easily interfere with the transfer of the transfer structure 64, which simplifies the transfer process of the transfer structure 64. Then the first support member 41 rises to drive the workpiece 9 away from the support platform 62 and move toward the annealing chamber 11.

[0068] Optionally, the first bearing element 41 is a graphite shaft, which has good high temperature resistance and facilitates the improvement of the service life of the first bearing element 41.

[0069] like Figures 1-4 As shown, in some embodiments, the annealing apparatus 100 further includes a conveyor 60, a support platform 62, and a transfer structure 64. The storage cavity 10 has an openable storage inlet 10a for storing the workpiece 9. The storage inlet 10a is located on the conveyor 60 in the horizontal direction (e.g., Figure 1 On the side away from the bearing platform 62 in the direction of AA'.

[0070] As can be seen, the support platform 62 is spaced apart on one side of the conveyor platform 60 in the horizontal direction, and the storage inlet 10a is located on the side of the conveyor platform 60 away from the support platform 62 in the horizontal direction. That is, the storage inlet 10a and the support platform 62 are located on the two sides of the conveyor platform 60 in the horizontal direction. When there is no workpiece 9 to be annealed in the storage cavity 10, the storage inlet 10a can be opened so that the operator can place the workpiece 9 into the storage cavity 10 through the storage inlet 10a. At the same time, the conveyor platform 60 moves the workpiece 9 in the horizontal direction. This allows the operator to place multiple workpieces 9 in sequence without having to put their hands or body too much into the storage cavity 10. They only need to operate from a suitable position outside the storage cavity 10, which ensures both operational convenience and improved work safety.

[0071] like Figures 1-4 As shown, in some embodiments, the storage cavity 10 has an on / off storage inlet 10a spaced apart from the second communication port 11b for storing the workpiece 9. The annealing device 100 also includes a second switching valve 22, which is located at the second communication port 11b and is used to control the connection and disconnection between the storage cavity 10 and the annealing cavity 11.

[0072] By setting the second switching valve 22, when annealing the workpiece 9 in the annealing chamber 11, the annealing chamber 11 can be isolated from the storage chamber 10 by closing the second switching valve 22, thereby improving the annealing effect, reducing the volume of the heating space, and reducing the required heating amount. At the same time, it can also reduce the impact on the workpiece 9 in the storage chamber 10.

[0073] In addition, the storage chamber 10 can be used to store multiple workpieces 9 to be annealed. When there are no workpieces 9 to be annealed in the storage chamber 10 or the number of workpieces 9 to be annealed is small, the second switch valve 22 is closed so that the take-out chamber 12 and the annealing chamber 11 are not connected. This allows the operator to put workpieces 9 into the storage chamber 10 through the storage inlet 10a. At the same time, the annealing chamber 11 can still be in operation. This makes it easy to ensure that the storage of workpieces 9 into the storage chamber 10 does not affect the atmosphere of the annealing chamber 11, which is conducive to further annealing more workpieces 9 in sequence.

[0074] Therefore, by setting a second switching valve 22, this application enables the storage chamber 10 to operate as an independent chamber. That is, the workpiece 9 to be annealed stored through the storage inlet 10a is less likely to be interfered with by the components of the annealing chamber 11. At the same time, storing the workpiece 9 to be annealed through the storage inlet 10a is less likely to interfere with the annealing of the workpiece 9 by the annealing chamber 11. This further reduces the downtime of the annealing device 100, so that the annealing device 100 can anneal multiple workpieces 9 sequentially without being limited to multiple workpieces in the storage chamber 10, thereby improving the working efficiency of the annealing device 100.

[0075] like Figures 1-4 As shown, in some embodiments, the annealing apparatus 100 is configured to satisfy at least one of the following conditions B1 to B2.

[0076] Condition B1: The storage chamber 10 has a first protective gas inlet 10b and a first vacuum port 10c. Each of the first protective gas inlet 10b and the first vacuum port 10c is spaced apart from the first connecting port 11a and the take-out port 12a. When it is necessary to evacuate the take-out chamber 12 and the annealing chamber 11, the gas in the take-out chamber 12 can be extracted through the first vacuum port 10c, and the gas in the annealing chamber 11 can be extracted through the first connecting port 11a and then through the first vacuum port 10c. When it is necessary to fill the take-out chamber 12 and the annealing chamber 11 with protective gas, for example, by filling the take-out chamber 12 and the annealing chamber 11 with inert gas (such as argon, nitrogen, etc.), part of the protective gas through the first protective gas inlet 10b can be directly filled into the take-out chamber 12, and the other part of the protective gas can be indirectly filled into the annealing chamber 11 through the first connecting port 11a. Therefore, the air in the annealing chamber 11 can be extracted through the first vacuum port 10c, and the annealing chamber 11 can be filled with protective gas through the first protective gas inlet 10b, so that the surface of the workpiece 9 is less likely to generate oxides during the annealing process, thus reducing the risk of oxidation of the workpiece 9.

[0077] For example, when workpiece 9 needs to be annealed, the annealing chamber 11 and the removal chamber 12 can be evacuated to a vacuum through the first vacuum port 10c. Then, protective gas is introduced into the annealing chamber 11 and the removal chamber 12 through the first protective gas inlet 10b until the furnace pressure of the annealing chamber 11 and the removal chamber 12 is 10 torr (at this point, even if other oxides volatilize in the annealing chamber 11, it will not have a significant impact on workpiece 9). Then, the first connecting port 11a is closed, and workpiece 9 is annealed in the annealing chamber 11. After annealing, workpiece 9 is transferred from the annealing chamber 11 to the removal chamber 12 through the drive structure 4. When it is necessary to remove the annealed workpiece 9 through the removal port 12a, it can be... First, close the first connecting port 11a, then fill the extraction chamber 12 with protective gas through the first protective gas inlet 10b until the furnace pressure in the extraction chamber 12 reaches atmospheric pressure. Then, take out the annealed workpiece 9 through the extraction outlet 12a, and then close the extraction outlet 12a so that the extraction chamber 12 is not connected to the external environment. Then, make the furnace pressure of the extraction chamber 12 10 torr through the first vacuum port 10c and the first protective gas inlet 10b so that the atmosphere (including pressure and protective gas atmosphere) of the extraction chamber 12 and the annealing chamber 11 can be approximately the same after opening the first connecting port 11a. The annealing chamber 11 can always maintain a relatively stable furnace pressure, which is conducive to improving the stability of the annealing device 100.

[0078] Condition B2: The storage chamber 10 has an on / off storage inlet 10a spaced apart from the second communication port 11b for storing the workpiece 9. The annealing device 100 also includes a second switching valve 22, which is located at the second communication port 11b and is used to control the connection and disconnection between the storage chamber 10 and the annealing chamber 11. The take-out chamber 12 has a second protective gas inlet 12b and a second vacuum port 12c, each of which is spaced apart from the second communication port 11b and the storage inlet 10a.

[0079] Each of the second protective gas inlet 12b and the second vacuum port 12c is spaced apart from the second connecting port 11b and the storage inlet 10a. When it is necessary to evacuate the storage chamber 10 and the annealing chamber 11, the gas in the storage chamber 10 can be directly extracted through the second vacuum port 12c, and the gas in the annealing chamber 11 is extracted through the second connecting port 11b and then through the second vacuum port 12c. When it is necessary to fill the storage chamber 10 and the annealing chamber 11 with protective gas, for example, by filling the storage chamber 10 and the annealing chamber 11 with inert gas (such as argon, nitrogen, etc.), part of the protective gas through the second protective gas inlet 12b can be directly filled into the storage chamber 10, and the other part of the protective gas can be indirectly filled into the annealing chamber 11 through the second connecting port 11b. Therefore, the air in the annealing chamber 11 can be extracted through the second vacuum port 12c, and the annealing chamber 11 can be filled with protective gas through the second protective gas inlet 12b, so that the surface of the workpiece 9 is less likely to generate oxides during the annealing process, thus reducing the risk of oxidation of the workpiece 9.

[0080] For example, when workpiece 9 needs to be annealed, the annealing chamber 11 and storage chamber 10 can be evacuated to a vacuum through the second vacuum port 12c. Then, protective gas is introduced into the annealing chamber 11 and storage chamber 10 through the second protective gas inlet 12b until the furnace pressure of the annealing chamber 11 and storage chamber 10 is 10 torr. The second connecting port 11b is then closed, and workpiece 9 is annealed in the annealing chamber 11. When workpiece 9 to be annealed needs to be stored through the storage port 10a, the second connecting port 11b can be closed first, and then protective gas is introduced into the storage chamber 10 through the second protective gas inlet 12b. The furnace is filled with protective gas until the furnace pressure in the storage chamber 10 reaches atmospheric pressure. Then, the workpiece 9 to be annealed is stored through the storage inlet 10a. The storage inlet 10a is then closed to prevent the storage chamber 10 from being connected to the external environment. The furnace pressure in the storage chamber 10 is then reduced to 10 torr through the second vacuum port 12c and the second protective gas inlet 12b. This ensures that the atmosphere in the storage chamber 10 and the annealing chamber 11 is approximately the same after the second connection port 11b is opened. The annealing chamber 11 can always maintain a relatively stable furnace pressure and protective gas atmosphere, which helps to improve the stability of the annealing device 100.

[0081] like Figures 1-4As shown, in some embodiments, the cooling structure 32 is disposed within the annealing chamber 11, and both the cooling structure 32 and the heating structure 30 are formed as vertically arranged cylindrical structures. The cooling structure 32 is spaced above the heating structure 30 and is located radially inside the heating structure 30. The upper end of the cooling structure 32 is connected to the first connecting port 11a. The annealing apparatus 100 also includes a thermal insulation structure 7, which is disposed within the annealing chamber 11 and surrounds the heating structure 30, separating the heating structure 30 from the cooling structure 32.

[0082] At this time, the first connecting port 11a can be located at the top of the annealing chamber 11, and the removal chamber 12 can be located above the annealing chamber 11, so that the workpiece 9 can move from bottom to top in the annealing chamber 11, making the movement path simpler and clearer, which is conducive to improving the working efficiency of the annealing device 100. Moreover, the heat insulation structure 7 can effectively reduce the heat transferred to the external environment, so that more heat is retained in the annealing chamber 11, improving the heat utilization rate and making the heating process more efficient and stable. At the same time, since the heat insulation structure 7 reduces heat loss, the heating structure 30 can heat the workpiece 9 to the required temperature in a shorter time, which is conducive to improving the working efficiency of the annealing device 100. In addition, the surface temperature of the heating structure 30 is usually high when it is working. If personnel accidentally come into contact with it, it is easy to cause burns. The setting of the heat insulation structure 7 can effectively reduce the outer surface temperature of the furnace body 1, reduce the risk of burns to personnel, and ensure the safety of operators.

[0083] The thermal insulation structure 7 separates the heating structure 30 from the cooling structure 32, reducing the mutual interference of heat between them. This ensures that when the workpiece 9 is heated, the temperature of the heating structure 30 can stably reach the annealing temperature, while the cooling structure 32 can apply a certain cooling rate to the workpiece 9 during cooling, thus improving product quality and production yield. The cooling structure 32 is located radially inside the heating structure 30, allowing for a certain amount of space between the cooling structure 32 and the heating structure 30 to accommodate the thermal insulation structure 7.

[0084] Furthermore, the cylindrical structure of the cooling structure 32 and the heating structure 30 provides sufficient space for the workpiece 9 to move within the annealing chamber 11. The workpiece 9 can move to the radially inner side of the heating structure 30 to be heated, and it can move to the radially inner side of the cooling structure 32 to be cooled. Since the upper end of the cooling structure 32 is connected to the first connecting port 11a, after the workpiece 9 is cooled, it is adjacent to the first connecting port 11a and is basically vertically opposite to the first connecting port 11a. This facilitates the timely and smooth movement of the workpiece 9 through the first connecting port 11a to the removal chamber 12, which helps to reduce the volume of the annealing chamber 11 and facilitates the timely transfer of the annealed workpiece 9.

[0085] In other embodiments of this application, the cooling structure 32 may also be located outside the furnace body 1, which can also cool the workpiece 9 inside the annealing chamber 11.

[0086] like Figures 1-4 As shown, in some embodiments, the thermal insulation structure 7 includes a first thermal insulation part 70 and a second thermal insulation part 72. The first thermal insulation part 70 is disposed between the heating structure 30 and the furnace body 1, and the upper end of the first thermal insulation part 70 forms a clearance opening to avoid the cooling structure 32. The second thermal insulation part 72 is formed into a cylindrical structure and is sleeved on the outside of the cooling structure 32. The upper end of the second thermal insulation part 72 is connected to the clearance opening, and the lower end of the second thermal insulation part 72 extends downward beyond the lower end of the cooling structure 32 and extends radially inward beyond the inner peripheral wall of the cooling structure 32.

[0087] As can be seen, the first heat-insulating part 70 is located between the heating structure 30 and the furnace body 1, increasing the thermal resistance between the heating structure 30 and the furnace body 1, and reducing the heat transferred from the heating structure 30 to the furnace body 1. This allows the heating structure 30 to have good heating efficiency for the workpiece 9 to be annealed, while preventing excessive increase in the outer surface temperature of the furnace body 1, reducing the risk of burns to personnel, and improving operator safety. The upper end of the first heat-insulating part 70 has a clearance opening for the cooling structure 32. Combined with the setting of the second heat-insulating part 72, this allows the driving structure to... When the workpiece 9 is driven to move into the cooling structure 32 for cooling, it is not easy to interfere with the heat insulation structure 7. The second heat insulation part 72 can be formed as a guide tube. The lower end of the second heat insulation part 72 and the lower end of the cooling structure 32 are in contact, or the lower end of the second heat insulation part 72 and the lower end of the cooling structure 32 are spaced apart, so that the second heat insulation part 72 can effectively separate the heating structure 30 and the cooling structure 32, so as to reduce the mutual heat transfer between the heating structure 30 and the cooling structure 32, and facilitate the improvement of the product quality of the workpiece 9.

[0088] The axial length of the cooling structure 32 is L, and the axial length of the second insulation part 72 is H. 1.5 ≤ L / H ≤ 3. By setting the ratio of the axial length of the cooling structure 32 to the axial length of the second insulation part 72 within the range of 1.5 to 3, the axial length of the cooling structure 32 is greater than the axial length of the second insulation part 72. This allows at least a portion of the cooling structure 32 to extend upwards through the clearance opening, meaning at least a portion of the cooling structure 32 can be located outside the first insulation part 70. The portion of the cooling structure 32 located within the first insulation part 70 is connected to the first connecting port 11a, facilitating a larger cooling area. The workpiece 9 can move towards the first connecting port 11a within the cooling area, achieving a certain cooling effect on the workpiece 9 while shortening the distance between the workpiece 9 and the first connecting port 11a. Compared to cooling the workpiece at a position far from the first connecting port, this arrangement further improves work efficiency.

[0089] Optionally, the first insulation part 70 is an insulation felt, and the second insulation part 72 includes a high-temperature resistant shell and an insulation felt filled in the high-temperature resistant shell.

[0090] Furthermore, the driving structure 4 drives the workpiece 9 through the area where the cooling structure 32 is located at a speed v2. Since 1 mm / min ≤ v2 ≤ 10 mm / min, the speed of the workpiece 9 passing through the area where the cooling structure 32 is located is set within the range of 1 mm / min to 10 mm / min. This allows the workpiece 9 to enter the area where the cooling structure 32 is located at a suitable speed, ensuring a more uniform temperature on the upper and lower surfaces of the workpiece 9 during cooling. This reduces the likelihood of excessive internal stress during the cooling process and improves the product quality of the workpiece 9. For example, v2 can be 1 mm / min, 3 mm / min, 5 mm / min, 6 mm / min, 7 mm / min, 9 mm / min, 10 mm / min, etc.

[0091] like Figures 1-4 As shown, in some embodiments, the annealing apparatus 100 further includes a second switching valve 22, which is located at the second communication port 11b and is used to control the connection and disconnection between the storage chamber 10 and the annealing chamber 11. The first heat preservation part 70 includes a first part 70a and a second part 70b, which are separable. The first part 70a is located on the second switching valve 22. When the second switching valve 22 is opened, the first part 70a can move with the second switching valve 22, thereby separating the first part 70a and the second part 70b, so that the drive structure 4 can transfer the workpiece 9 to be annealed into the annealing chamber 11 without easily interfering with the first heat preservation part 70. When the second switching valve 22 is closed, the first part 70a and the second part 70b can re-coordinate, so that the first part 70a and the second part 70b can surround the heating structure 30 to achieve the separation and heat preservation of the annealing chamber 11 from the outside world. Therefore, the first heat-insulating part 70 is less likely to affect the transfer of the workpiece 9 from the storage chamber 10 to the annealing chamber 11, and at the same time, it can have relatively good heat insulation performance, which facilitates the reliability of the annealing device 100. Specifically, when the second switching valve 22 is closed, the temperature inside the storage chamber 10 is 15℃~35℃.

[0092] Specifically, in some examples of this utility model, reference is made to... Figures 1-4The transfer structure 64 includes a first robotic arm 64a, a second robotic arm 64b, and a pick-and-place clamp 64c. The bottom of the first robotic arm 64a is rotatably fixed to the bottom wall of the furnace body 1. One end of the second robotic arm 64b is rotatably connected to the top end of the first robotic arm 64a. The pick-and-place clamp 64c is installed on the end of the second robotic arm 64b opposite to the first robotic arm 64a. The rotation and lifting of the pick-and-place clamp 64c can be controlled by the first robotic arm 64a and the second robotic arm 64b.

[0093] Under the conveyor 60, the workpiece 9 to be annealed, placed on the base 5, can be conveyed to a preset position close to the transfer structure 64. At this time, the distance between the axis of the workpiece 9 and the axis of the first robotic arm 64a is R. Subsequently, with the help of the first robotic arm 64a and the second robotic arm 64b of the transfer structure 64, the distance between the axis of the pick-and-place clamp 64c and the axis of the first robotic arm 64a is also R. At the same time, the height of the limiting protrusion 64d at the bottom of the pick-and-place clamp 64c is consistent with the height of the second groove 51 of the base 5. Next, with the rotation of the first robotic arm 64a, the limiting protrusion 64d of the pick-and-place clamp 64c is screwed into the second groove 51. At this time, the first robotic arm 64a and the second robotic arm 64b can control the pick-and-place clamp 64c to lift the base 5 and the workpiece 9 and transfer them to the support table 62. It should be noted that the length of the limiting protrusion 64d is consistent with the radial depth of the second groove 51, and the width of the limiting protrusion 64d is greater than the circumferential width of the first groove 50.

[0094] like Figures 1-4 As shown, in some embodiments, workpiece 9 is a crystal rod segment, that is, workpiece 9 is a crystal rod segment formed by cutting a crystal rod. For example, the axial length of the entire crystal rod is 2m to 3m, while the axial length of the crystal rod segment is about 300mm. By reducing the axial dimension of workpiece 9, the temperature difference between the upper and lower surfaces of workpiece 9 will not be too large when workpiece 9 is heated or cooled, so that the annealing effect of workpiece 9 can be better, the stress in the annealing process can be better released, and the volume limitation of the annealing device 100 is reduced. Compared with the annealing of silicon wafers in some technologies, it can improve production efficiency.

[0095] The first connecting port 11a is located at the top of the annealing chamber 11, and the second connecting port 11b is located at the bottom of the annealing chamber 11. The second connecting port 11b and the first connecting port 11a are vertically opposite each other. The driving structure 4 is configured to drive the workpiece 9 to rise, fall and rotate so that the workpiece 9 passes through the second connecting port 11b and the first connecting port 11a in sequence. The take-out chamber 12, the annealing chamber 11 and the storage chamber 10 are arranged in sequence from top to bottom. At the same time, the cooling structure 32 is also located above the heating structure 30 so that the path of the workpiece 9 driven by the driving structure 4 can be more clearly defined, thereby improving the reliability of the annealing device 100.

[0096] In some embodiments, such as Figures 1-4 As shown, both the heating structure 30 and the cooling structure 32 are cylindrical structures and are vertically arranged to avoid the first connecting port 11a and the second connecting port 11b. For example, the central axes of the heating structure 30, the cooling structure 32, the first connecting port 11a and the second connecting port 11b are coincident, so that when the driving structure 4 drives the workpiece 9 to move, it is not easy to interfere with the heating structure 30 and the cooling structure 32, which facilitates the improvement of the stability of the annealing device 100. The annealing device 100 also includes a first temperature measuring structure 80 and a second temperature measuring structure 82. The first temperature measuring structure 80 is located at the top of the extraction chamber 12 and is used to measure the top temperature T1 of the workpiece 9. The first temperature measuring structure 80 is opposite to the first connecting port 11a. The second temperature measuring structure 82 is located at the bottom of the annealing chamber 11 and is used to measure the bottom temperature T2 of the workpiece 9. The second temperature measuring structure 82 is located at the second connecting port 11b. The annealing chamber 11 has a heating position. The driving structure 4 is configured to drive the workpiece 9 to the heating position for rotational heating. At this time, the driving structure 4 can avoid the temperature measuring signals of the first temperature measuring structure 80 and the second temperature measuring structure 82. At the heating position, |T1-T2|≤10℃.

[0097] As can be seen, the annealing chamber 11 has a heating position. The driving structure 4 moves the workpiece 9 to the heating position, and then the driving structure 4 rotates the workpiece 9 to heat it, so that the temperature difference between the top and bottom of the workpiece 9 does not exceed 10°C. This ensures that all parts of the workpiece 9 have a relatively uniform heating amount, which helps to reduce the internal stress generated in the workpiece 9 during the heating process, thereby improving product quality. At the same time, the arrangement of the heating structure 30 and the cooling structure 32 does not obstruct the workpiece 9, which facilitates reliable temperature measurement of the workpiece by the first temperature measuring structure 80 and the second temperature measuring structure 82. For example, in On the horizontal plane, the orthographic projection of the first temperature measuring structure 80 is located within the orthographic projection range of the peripheral wall of the first connecting port 11a, and also within the orthographic projection range of the peripheral wall of the second connecting port 11b. The orthographic projection of the second temperature measuring structure 82 is located within the orthographic projection range of the peripheral wall of the first connecting port 11a (for example, if a second switching valve 22 is provided at the second connecting port 11b, the second temperature measuring structure 82 is installed on the second switching valve 22; if a second switching valve 22 is not provided at the second connecting port 11b, a mounting bracket can be provided at the second connecting port 11b to install the second temperature measuring structure 82).

[0098] For example, after workpiece 9 is rotated and heated in the heating position for 1 hour, the internal temperature and surface temperature of workpiece 9 are made to be approximately the same, so that the subsequent cooling process can be carried out. When the driving structure 4 drives workpiece 9 to the position of cooling structure 32, the driving structure 4 drives workpiece 9 to rotate and cool, so that each part of workpiece 9 can obtain a relatively uniform cooling effect, which is conducive to reducing the internal stress generated by workpiece 9 during the cooling process, thereby improving product quality. After workpiece 9 is rotated and cooled in the cooling position for 1 hour, the internal temperature and surface temperature of workpiece 9 are made to be approximately the same. At this time, when the temperature difference between the top and bottom of workpiece 9 is not more than 10°C, it indicates that workpiece 9 has been cooled and annealed. Then, the driving structure 4 drives workpiece 9 to be transferred to the removal cavity 12, which is convenient for the removal of workpiece 9 after annealing.

[0099] like Figure 12 As shown, this application also proposes a method for finding the heating position corresponding to the heating structure 30 of the cylindrical structure.

[0100] The annealing apparatus 100 also includes a third temperature measuring structure for measuring the heating temperature of the heating structure 30. The heating structure 30 is first heated to stabilize its temperature at 850℃. The highest temperature is generally found at the center of the heating structure 30 along its axial direction, denoted as point H. The center point O of the axial length of the workpiece 9, i.e., halfway along its axial length, is moved along the axial direction of the heating structure 30 to H-50mm (which can be understood as the center point O being located on the side of the heating structure 30 away from the cooling structure 32 along the axial direction of point H, and 50mm away from point H along the axial direction of the heating structure 30), H-40mm, H-30mm, H-20mm, H-10mm, and H (which can be understood as the center point). The workpiece is rotated and heated at multiple locations, including H+10mm (where center point 0 and H point are located on the same radial plane perpendicular to the central axis of heating structure 30, which can be understood as center point 0 being located on the side of heating structure 30 facing cooling structure 32, and 10mm away from H point in the axial direction of heating structure 30), H+20mm, H+30mm, H+40mm, and H+50mm. For example, the heating time is 1 hour. After heating, the first temperature measuring structure 80 and the second temperature measuring structure 82 measure the temperature of workpiece 9. When the difference between the temperature measurement result T1 of the first temperature measuring structure 80 and the temperature measurement result T2 of the second temperature measuring structure 82 at a certain location does not exceed 10℃, this location is selected as the heating position. For example, in Figure 12 In the example, at the H-10mm position, T1 and T2 are close, and this point is recorded as the equilibrium point, which is also the heating position.

[0101] like Figures 1-11As shown, in some embodiments, the drive structure 4 includes a first drive component 40 and a second drive component 42. The first drive component 40 includes a first support member 41, which carries the workpiece 9 and can move between the storage cavity 10 and the annealing cavity 11 through the second communication port 11b to move the workpiece 9 in the storage cavity 10 into the annealing cavity 11. The second drive component 42 includes a second support member 43, which receives the workpiece 9 on the first support member 41 and moves the workpiece 9 into the removal cavity 12. The second support member 43 is used to move the workpiece 9 to the heating structure 30 for heating and through the cooling structure 32. The second support member 43 is liftable and rotatable, and the top portion of the second support member 43 is hollowed out. The annealing apparatus 100 also includes multiple bases 5, each base 5 being adapted to support the bottom of a corresponding workpiece 9. A second support member 43 is separably fitted to the base 5, and after the second support member 43 is fitted to the base 5, the second support member 43, the workpiece 9, and the base 5 are arranged sequentially in the vertical direction. A measuring hole 55 is also formed on the base 5, penetrating along the vertical central axis of the base 5. A first temperature measuring structure 80 is located at the top of the extraction chamber 12 and is used to measure the top temperature T1 of the workpiece 9. The first temperature measuring structure 80 and the second support member 43 are arranged opposite each other in the vertical direction. A second temperature measuring structure 82 is located at the bottom of the annealing chamber 11 and is used to measure the bottom temperature T2 of the workpiece 9. The second temperature measuring structure 82 and the measuring hole 55 are arranged opposite each other in the vertical direction.

[0102] As can be seen, when heating or cooling, it is necessary to measure the top temperature of the workpiece 9. The second support member 43 drives the base 5 and the workpiece 9 to rotate together, so that at least part of the hollow area of ​​the second support member 43 can be intermittently set up and down opposite the first temperature measuring structure 80, so that the second support member 43 does not easily affect the temperature measurement of the first temperature measuring structure 80, which facilitates the improvement of the reliability of the annealing device 100.

[0103] Exemplarily, the second carrier 43 includes a bracket 43b and a plurality of vertical ribs 43c. The bracket 43b is partially hollowed out. For example, the bracket 43b is configured as a "cross" shape, or a "rice" shape, etc. The plurality of vertical ribs 43c are arranged at intervals around the vertical central axis of the placement cavity 43a. Each vertical rib 43c extends vertically, and the upper ends of the plurality of vertical ribs 43c are connected to the bracket 43b. The lower end of each vertical rib 43c is respectively bent and connected with a claw 43f. A plurality of first grooves 50 and a plurality of second grooves 51 are formed on the outer peripheral wall of the base 5. The plurality of first grooves 50 are arranged in sequence around the vertical central axis of the base 5. Each first groove 50 is arranged at an interval from the top surface of the base 5 and extends around the vertical central axis. The plurality of second grooves 51 are arranged at intervals around the vertical central axis of the base 5. Each second groove 51 communicates with the top of the corresponding first groove 50 and penetrates the top surface of the base 5. The claw 43f is adapted to be abutted and fitted in the corresponding first groove 50 through the corresponding second groove 51 and separated from the corresponding first groove 50. Thus, the second receiving member and the first temperature measuring structure 80 are arranged opposite to each other up and down, that is, the bracket 43b and the first temperature measuring structure 80 are arranged opposite to each other up and down. When the bracket 43b rotates, the hollow area on the bracket 43b can be intermittently arranged opposite to the first temperature measuring structure 80 up and down, so that the bracket 43b is not likely to affect the temperature measurement of the first temperature measuring structure 80, which is convenient for improving the reliability of the annealing device 100.

[0104] In addition, when heating or cooling, it is necessary to measure the bottom temperature of the workpiece 9. The second temperature measuring structure 82 and the measuring hole 55 are arranged opposite to each other up and down, so that the base 5 does not affect the temperature measurement of the second temperature measuring structure 82, which is convenient for improving the reliability of the annealing device 100.

[0105] Furthermore, the annealing device 100 further includes a second switching valve 22. The second switching valve 22 is arranged at the second communication port 11b and is used to control the on-off between the storage cavity 10 and the annealing cavity 11. The second temperature measuring structure 82 is arranged on the second switching valve 22. After the first carrier 41 transfers the workpiece 9 to be annealed from the storage cavity 10 to the annealing cavity 11, the second carrier 43 can receive the workpiece 9 on the first carrier 41. At this time, the first carrier 41 can return to the storage cavity 10 to prepare for the next workpiece 9 to be annealed. By closing the second communication port 11b and the second temperature measuring structure 82 being arranged on the second switching valve 22, the second temperature measuring structure 82 and the temperature measuring hole can be more conveniently arranged opposite to each other up and down, without the need to adjust the second temperature measuring structure 82 or the second carrier 43 in the horizontal direction, which is convenient for improving the working efficiency of the annealing device 100.

[0106] Next, please refer to again Figures 1-11This application describes an annealing apparatus 100 according to a specific embodiment. The annealing apparatus 100 includes: a furnace body 1, a first switching valve 20, a heating structure 30, a cooling structure 32, a driving structure 4, a base 5, a conveying platform 60, a bearing platform 62, a transfer structure 64, a second switching valve 22, a heat insulation structure 7, a first temperature measuring structure 80, and a second temperature measuring structure 82.

[0107] The furnace body 1 has a storage cavity 10, an annealing cavity 11, and a take-out cavity 12 arranged sequentially from top to bottom. The workpiece 9 is a crystal rod segment. The storage cavity 10 is used to hold multiple workpieces 9 to be annealed. The storage cavity 10 is connected to the annealing cavity 11 through a second connecting port 11b. The storage cavity 10 has a first protective gas inlet 10b and a first vacuum port 10c. Each of the first protective gas inlet 10b and the first vacuum port 10c is spaced apart from the first connecting port 11a and the take-out port 12a. The storage cavity 10 has an openable storage inlet 10a spaced apart from the second connecting port 11b for supplying... Workpiece 9 is stored in the storage chamber 12, which has a switchable outlet 12a for retrieving workpiece 9. The storage chamber 12 is connected to the annealing chamber 11 via a first connecting port 11a. The storage chamber 12 has a second protective gas inlet 12b and a second vacuum port 12c. Each of the second protective gas inlet 12b and the second vacuum port 12c is spaced apart from the second connecting port 11b and the storage inlet 10a. The first connecting port 11a is located at the top of the annealing chamber 11, and the second connecting port 11b is located at the bottom of the annealing chamber 11, with the second connecting port 11b and the first connecting port 11a being vertically opposite each other. The volume of the storage chamber 10 is smaller than the volume of the storage chamber 12, therefore the number of workpieces that the storage chamber 12 can store is less than the number of workpieces that the storage chamber 10 can store.

[0108] The first switching valve 20 is located at the first connecting port 11a and is used to control the opening and closing of the extraction chamber 12 and the annealing chamber 11. The second switching valve 22 is located at the second connecting port 11b and is used to control the opening and closing of the extraction chamber 12 and the annealing chamber 11.

[0109] Both the heating structure 30 and the cooling structure 32 are located inside the annealing chamber 11. Both the heating structure 30 and the cooling structure 32 are formed as vertically arranged cylindrical structures. The cooling structure 32 is spaced above the heating structure 30 and is located radially inside the heating structure 30. The upper end of the cooling structure 32 is connected to the first connecting port 11a. The heat insulation structure 7 includes a first heat insulation part 70 and a second heat insulation part 72. The first heat insulation part 70 is located between the heating structure 30 and the furnace body 1, and the upper end of the first heat insulation part 70 forms a clearance opening to avoid the cooling structure 32. The second heat insulation part 72 is formed as a cylindrical structure and is sleeved outside the cooling structure 32. The upper end of the second heat insulation part 72 is connected to the clearance opening, and the lower end extends downward beyond the lower end of the cooling structure 32 and radially inward beyond the inner circumferential wall of the cooling structure 32.

[0110] The first temperature measuring structure 80 is located at the top of the extraction chamber 12 and is used to measure the top temperature T1 of the workpiece 9. The second temperature measuring structure 82 is located at the bottom of the annealing chamber 11 and is used to measure the bottom temperature T2 of the workpiece 9. The annealing chamber 11 has a heating position. The driving structure 4 is configured to drive the workpiece 9 to the heating position for rotational heating.

[0111] The drive structure 4 is located in the furnace body 1. The drive structure 4 includes a first drive component 40 and a second drive component 42. The first drive component 40 and the second drive component 42 are independently arranged. The first drive component 40 includes a first support member 41, which is used to support the workpiece 9 and can move between the storage cavity 10 and the annealing cavity 11 through the second communication port 11b, so as to drive the workpiece 9 in the storage cavity 10 into the annealing cavity 11. The second drive component 42 includes a second support member 43, which is used to support the workpiece 9 and can move between the annealing cavity 11 and the take-out cavity 12 through the first communication port 11a, so as to receive the workpiece 9 on the first support member 41 and drive the workpiece 9 into the take-out cavity 12. The second support member 43 is used to drive the workpiece 9 to the heating structure 30 for heating and through the cooling structure 32.

[0112] Each base 5 is adapted to support the bottom of the corresponding workpiece 9. Each base 5 is separable from the first support member 41 and from the second support member 43. The base 5 is adapted to be placed on the first support member 41, and the second support member 43 is height-adjustable and rotatable. The outer peripheral wall of the base 5 has multiple first grooves 50 and multiple second grooves 51. The multiple first grooves 50 are arranged sequentially around the vertical central axis of the base 5. Each first groove 50 is spaced apart from the top surface of the base 5 and extends around the vertical central axis. The multiple second grooves 51 extend around the vertical central axis of the base 5. The central axis is spaced apart. Each second groove 51 is connected to the top of the corresponding first groove 50 and penetrates the top surface of the base 5. The second support member 43 has a placement cavity 43a. The bottom of the placement cavity 43a forms a passage 43e for the workpiece 9 to enter and exit. The outer periphery of the passage 43e is provided with a plurality of spaced claws 43f. The claws 43f extend toward the vertical central axis of the placement cavity 43a. The claws 43f are adapted to stop and cooperate with the corresponding first groove 50 through the corresponding second groove 51, and the claws 43f are adapted to separate from the corresponding first groove 50 through the corresponding second groove 51.

[0113] The second support member 43 is a cage-like structure and includes a support 43b, multiple vertical ribs 43c, and multiple limiting members 43d. The multiple vertical ribs 43c are spaced apart around the vertical central axis of the placement cavity 43a. Each vertical rib 43c extends vertically and its upper end is connected to the support 43b. Each vertical rib 43c has a claw 43f bent at its lower end. Each limiting member 43d is provided on the corresponding vertical rib 43c and each limiting member 43d is at least partially located on the radial inner side of the corresponding vertical rib 43c. The limiting member 43d extends toward the vertical central axis of the placement cavity 43a beyond the corresponding claw 43f and is adapted to limit the fit against the outer peripheral wall of the workpiece 9.

[0114] The conveyor 60 is located inside the storage cavity 10 and is used to sequentially convey multiple workpieces 9 to a preset position in the horizontal direction. The support platform 62 is located inside the storage cavity 10 and is spaced apart on one side of the conveyor 60 in the horizontal direction. The support platform 62 is arranged around the first support member 41, which can be raised and lowered relative to the support platform 62. The lowest position of the first support member 41 is located below the support platform 62. The transfer structure 64 is located inside the storage cavity 10 and is used to transfer the workpieces 9 at the preset position on the conveyor 60 to the upper side of the support platform 62. The storage cavity 10 has an openable storage inlet 10a for storing workpieces 9. The storage inlet 10a is located on the side of the conveyor 60 away from the support platform 62 in the horizontal direction.

[0115] As can be seen, the annealing process of the annealing apparatus 100 for the crystal rod segments is as follows.

[0116] First, multiple crystal rod segments are placed into the storage chamber 10 through the storage inlet 10a. Then, the storage inlet 10a is closed to prevent the furnace body 1 from communicating with the external environment. Next, the storage chamber 10, annealing chamber 11, and take-out chamber 12 are evacuated to a certain degree of vacuum through the first vacuum port 10c and the second vacuum port 12c. Then, protective gas is introduced into the storage chamber 10, annealing chamber 11, and take-out chamber 12 through the first protective gas inlet 10b and the second protective gas inlet 12b until the overall furnace pressure is 10 torr. First, the first connecting port 11a is closed through the first switching valve 20, and the second connecting port 11b is closed through the second switching valve 22, so that the storage chamber 10 and the take-out chamber 12 are not connected to the annealing chamber 11. When the connection is established, the heating structure 30 heats the annealing chamber 11 to the annealing temperature, for example, 850°C. The second connecting port 11b is opened via the second switching valve 22, allowing the first carrier 41 to transfer the crystal rod segment to be annealed from the storage chamber 10 to the annealing chamber 11. Then, the first connecting port 11a is opened via the first switching valve 20, allowing the second carrier 43 to receive the annealed crystal rod segment from the first carrier 41 through the first connecting port 11a. After receiving the segment, the first carrier 41 can return to the storage chamber 10 through the second connecting port 11b, ready for the next crystal rod segment to be annealed. The second connecting port 11b is then closed via the second switching valve 22. The second carrier 43 then transfers the crystal rod segment to be annealed... The annealed crystal rod segment is transferred to the heating structure 30 for rotary heating, and then the temperature is stabilized for one hour. After heating, the second support member 43 transfers the crystal rod segment to be annealed to the cooling structure 32 for rotary cooling, and then the temperature is stabilized for one hour. After cooling, the second support member 43 can transfer the annealed crystal rod segment to the removal chamber 12 through the first connecting port 11a. At this time, the first connecting port 11a can be closed by the first switching valve 20 to prevent the removal chamber 12 from communicating with the annealing chamber 11. Then, protective gas is introduced into the removal chamber 12 through the first protective gas inlet 10b until the furnace pressure in the removal chamber 12 reaches atmospheric pressure. Finally, the annealed workpiece 9 is removed through the removal outlet 12a. Then, the outlet 12a is closed to prevent the extraction chamber 12 from communicating with the external environment. The furnace pressure of the extraction chamber 12 is then set to 10 torr through the first vacuum port 10c and the first protective gas inlet 10b. This ensures that the furnace pressure of the extraction chamber 12 and the annealing chamber 11 are approximately the same after the first connecting port 11a is opened, meaning that the annealing chamber 11 can always maintain a relatively stable furnace pressure. At the same time, the second connecting port 11b is opened through the second switching valve 22 so that the second carrier 43 can transfer the next crystal rod segment to be annealed to the annealing chamber 11. This cycle is repeated to enable the annealing device 100 to automatically anneal multiple crystal rod segments sequentially, thereby improving the working efficiency of the annealing device 100.

[0117] It is understandable that the process of "storing the crystal rod segment to be annealed through the storage inlet 10a" is similar to the process of "retrieving the annealed crystal rod segment through the outlet 12a", and will not be described in detail here.

[0118] Furthermore, it should be noted that the various specific technical features described in the above specific embodiments can be combined in any suitable manner without contradiction. To avoid unnecessary repetition, this application will not describe the various possible combinations separately. In addition, various different embodiments of this application can also be arbitrarily combined, as long as they do not violate the spirit of this application, they should also be regarded as the content disclosed in this application.

[0119] In the description of this application, it should be understood that the terms "center," "lateral," "length," "thickness," "top," "bottom," "inner," "outer," "axial," "radial," and "circumferential," etc., indicating orientation or positional relationships, are based on the orientation or positional relationships shown in the accompanying drawings and are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model. Furthermore, features defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this utility model, unless otherwise stated, "multiple" means two or more. In the description of this application, it should be noted that, unless otherwise explicitly specified and limited, the terms "installed," "connected," and "linked" should be interpreted broadly. For example, it can refer to a fixed connection, a detachable connection, or an integral connection; it can refer to a mechanical connection or an electrical connection; it can refer to a direct connection or an indirect connection through an intermediate medium; it can refer to the internal communication of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0120] In this application, unless otherwise expressly specified and limited, "above" or "below" the second feature can mean that the first feature is in direct contact with the second feature, or that the first feature is in indirect contact with the second feature through an intermediate medium. Furthermore, "above," "over," and "on the upper side" of the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "on the lower side" of the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0121] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "illustrative embodiment," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of the present invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0122] Although embodiments of the present invention have been shown and described, those skilled in the art will understand that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the claims and their equivalents.

Claims

1. An annealing apparatus, characterized in that, include: The furnace body defines, from top to bottom, a take-out chamber, an annealing chamber, and a storage chamber. The take-out chamber is connected to the annealing chamber through a first connecting port, and the storage chamber is connected to the annealing chamber through a second connecting port. The take-out chamber has an openable take-out port for taking out the annealed workpiece, and the storage chamber has an openable storage port for storing multiple workpieces to be annealed. A first switching valve is located at the first communication port and is used to control the connection between the extraction chamber and the annealing chamber. A heating structure is disposed in the furnace body and located within the annealing chamber; A cooling structure is provided in the furnace body and corresponding to the annealing chamber, and is spaced apart on the side of the heating structure near the first communication port; A driving structure is provided in the furnace body and can move between the storage cavity, the annealing cavity and the take-out cavity to drive the workpiece in the storage cavity to the annealing cavity and to drive the workpiece in the annealing cavity to the take-out cavity in sequence.

2. The annealing apparatus according to claim 1, characterized in that, The driving structure includes: A first driving component, comprising a first carrier member, the first carrier member being used to carry a workpiece and being movable between the storage cavity and the annealing cavity through the second communication port, for driving the workpiece in the storage cavity into the annealing cavity; The second driving component is independently configured from the first driving component. The second driving component includes a second carrier, which is used to carry a workpiece and can move between the annealing chamber and the extraction chamber through the first communication port, so as to receive the workpiece on the first carrier and drive the workpiece into the extraction chamber.

3. The annealing apparatus according to claim 2, characterized in that, The annealing chamber has a heating position and a junction position. The heating structure is used to heat the workpiece located at the heating position. The first support member and the second support member connect the workpiece at the junction position. The heating position is located adjacent to the first communication port relative to the junction position, so that the second support member can move the workpiece to the heating position for heating and passing it through the cooling structure; and / or... The annealing apparatus further includes multiple bases, each base being adapted to support the bottom of a corresponding workpiece. Each base is separable from and can be separable from the first support member and the second support member. The base is adapted to be placed on the first support member, and the second support member is height-adjustable and rotatable. The outer peripheral wall of each base has multiple first grooves and multiple second grooves. The multiple first grooves are sequentially arranged around the vertical central axis of the base, each first groove being spaced apart from the top surface of the base and extending around the vertical central axis. The multiple second grooves are spaced apart around the vertical central axis of the base, each second groove communicating with the top of the corresponding first groove and penetrating the top surface of the base. The second support member has a placement cavity, the bottom of which has an opening for workpiece entry and exit. The outer periphery of the opening has multiple spaced-apart claws extending toward the vertical central axis of the placement cavity. The claws are adapted to engage with the corresponding first groove via the corresponding second groove and are separable from the corresponding first groove.

4. The annealing apparatus according to claim 3, characterized in that, When the annealing apparatus includes multiple bases, the second support member is a cage-like structure and includes: support; Multiple vertical ribs are spaced apart around the vertical central axis of the placement cavity. Each vertical rib extends vertically and its upper end is connected to the bracket. The lower end of each vertical rib is bent and connected to the claw. Multiple limiting members, each of the limiting members being disposed on the corresponding vertical rib and at least partially located on the radially inner side of the corresponding vertical rib, the limiting members extending toward the vertical central axis of the placement cavity beyond the corresponding chuck, and adapted to limit the engagement with the outer peripheral wall of the workpiece.

5. The annealing apparatus according to claim 2, characterized in that, The annealing apparatus further includes: A conveyor table is provided inside the storage cavity and is used to sequentially convey multiple workpieces to a preset position in a horizontal direction. A support platform is provided in the storage cavity. The support platform is spaced apart on one side of the conveyor platform in the horizontal direction and is arranged around the first support member. The first support member can be raised and lowered relative to the support platform, and the lowest position of the first support member is located below the support platform. A transfer structure is provided within the storage cavity and is used to transfer the workpiece located at the preset position on the conveyor table to the upper part of the support table. The storage inlet is located on the side of the conveyor platform away from the bearing platform in the horizontal direction.

6. The annealing apparatus according to claim 1, characterized in that, The storage cavity has a first protective gas inlet and a first vacuum port, each of the first protective gas inlet and the first vacuum port being spaced apart from the first communication port and the outlet port; and / or The annealing device further includes a second switching valve, which is located at the second communication port and is used to control the connection and disconnection between the storage chamber and the annealing chamber. The extraction chamber has a second protective gas inlet and a second vacuum port, each of which is spaced apart from the second communication port and the storage port.

7. The annealing apparatus according to claim 1, characterized in that, The cooling structure is disposed within the annealing chamber, and both it and the heating structure are vertically arranged cylindrical structures. The cooling structure is spaced above the heating structure and located radially inside the heating structure. The upper end of the cooling structure is connected to the first communication port. The annealing apparatus further includes: A thermal insulation structure is provided inside the annealing chamber and surrounds the heating structure, and the thermal insulation structure separates the heating structure from the cooling structure.

8. The annealing apparatus according to claim 7, characterized in that, The thermal insulation structure includes: The first heat insulation part is disposed between the heating structure and the furnace body, and the upper end of the first heat insulation part has a clearance opening to avoid the cooling structure. The second insulation part is formed as a cylindrical structure and is sleeved outside the cooling structure. The upper end of the second insulation part is connected to the clearance opening, and the lower end extends downward beyond the lower end of the cooling structure and extends radially inward beyond the inner circumferential wall of the cooling structure. The axial length of the cooling structure is L, and the axial length of the second insulation part is H, where 1.5≤L / H≤3.

9. The annealing apparatus according to any one of claims 1-8, characterized in that, The workpiece is a crystal rod segment. The first connecting port is located at the top of the annealing chamber, and the second connecting port is located at the bottom of the annealing chamber and is vertically opposite to the first connecting port. The driving structure is configured to drive the workpiece to rise, fall and rotate so that the workpiece passes through the second connecting port and the first connecting port in sequence.

10. The annealing apparatus according to claim 9, characterized in that, Both the heating structure and the cooling structure are cylindrical and vertically arranged to avoid the first and second connecting ports. The annealing device further includes: A first temperature measuring structure and a second temperature measuring structure. The first temperature measuring structure is used to measure the top temperature T1 of the workpiece. The first temperature measuring structure is located at the top of the extraction cavity and opposite to the first communication port. The second temperature measuring structure is used to measure the bottom temperature T2 of the workpiece and is located at the second communication port. The annealing cavity has a heating position. The driving structure is configured to drive the workpiece to the heating position for rotational heating. At the heating position, |T1-T2|≤10℃.

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