Heater convenient for manipulator to pick and place
By designing stepped and chamfered structures on the heater, the problems of easy breakage of wafers by robotic arms and delamination caused by thermal stress concentration were solved, achieving convenient handling and extended service life.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- BEIJING BOYU SEMICON VESSEL CRAFTWORK TECH CO LTD
- Filing Date
- 2025-04-29
- Publication Date
- 2026-04-24
AI Technical Summary
Existing heaters are prone to causing wafer breakage when robotic arms handle wafers, and there is also the problem of thermal stress concentration leading to delamination.
The design incorporates a stepped structure and a chamfered structure. The steps are equipped with bosses, and the bosses are connected to the heater body by a bevel or arc-shaped chamfer. The outer diameter is smaller than that of the wafer, ensuring convenient handling by the robotic arm and avoiding delamination caused by thermal stress concentration.
This technology enables convenient handling of wafers by robotic arms, reduces the probability of wafer breakage, and extends the service life of the heater.
Smart Images
Figure CN224164906U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of heater technology, and in particular to a heater that is easy for a robotic arm to pick up and place. Background Technology
[0002] In processes such as chemical vapor deposition, physical phase vapor deposition, oxidation, and nitriding, PBN+PG+PBN heaters are heater elements formed on PBN substrates using conductive materials such as pyrolytic graphite (PG) in a predetermined pattern. They are used to heat wafers in semiconductor, wafer epitaxy, and liquid crystal manufacturing processes. To meet the demands of automation upgrades, and to enable robotic arms to handle wafer handling, most existing heaters are flat, making automated wafer handling inconvenient and prone to causing wafers to fall and break. Utility Model Content
[0003] In view of the above-mentioned defects or deficiencies in the prior art, it is desirable to provide a heater that is easy for a robotic arm to pick up and place. A stepped structure is designed to facilitate the picking up and placing by the robotic arm, and a chamfer structure is designed between the step and the heater body to avoid the problem of heater delamination and ensure the service life of the heater.
[0004] This utility model provides a heater that is easy for a robotic arm to handle, comprising a heater body; a boss is provided on the top of the heater body; the side wall of the boss and the heater body form a chamfered or arc-shaped chamfer; the outer diameter of the boss is smaller than the outer diameter of the object being heated.
[0005] Furthermore, the heater body is circular, and the boss is circular and coaxial with the heater body.
[0006] Furthermore, the height of the boss is 1-10mm.
[0007] Furthermore, the sidewall of the boss and the heater body are chamfered, and the slope of the chamfer is 100°-150°.
[0008] Furthermore, the sidewall of the boss and the heater body form an arc-shaped chamfer, the radius of which is 1-10mm.
[0009] Compared with the prior art, the beneficial effects of this utility model are:
[0010] The heater of this invention features a stepped structure to facilitate the handling of the robotic arm, achieving automated processing while significantly reducing the probability of wafer breakage. Furthermore, a chamfered structure is designed between the step and the heater body to prevent delamination caused by thermal stress concentration at the heater's protrusions, thus ensuring the heater's service life.
[0011] It should be understood that the description in this utility model description section is not intended to limit the key or essential features of the embodiments of this utility model, nor is it intended to restrict the scope of this utility model. Other features of this utility model will become readily apparent from the following description. Attached Figure Description
[0012] Other features, objects, and advantages of this invention will become more apparent from the following detailed description of non-limiting embodiments with reference to the accompanying drawings:
[0013] Figure 1 This is a schematic diagram of the heater.
[0014] The diagram is labeled as follows: 1. Heater body; 2. Boss. Detailed Implementation
[0015] The present invention will now be described in further detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the relevant invention and not intended to limit it. Furthermore, it should be noted that, for ease of description, only the parts relevant to the invention are shown in the accompanying drawings.
[0016] It should be noted that, where there is no conflict, the embodiments and features in the embodiments of this utility model can be combined with each other. The present utility model will now be described in detail with reference to the accompanying drawings and embodiments.
[0017] Please refer to Figure 1 The present invention provides a heater that is easy for a robotic arm to pick up and place, including a heater body 1; a boss 2 is provided on the top of the heater body 1; the side wall of the boss 2 and the heater body 1 form a chamfer or arc chamfer; the outer diameter of the boss 2 is smaller than the outer diameter of the object to be heated.
[0018] In this embodiment, a boss 2 structure is designed on the heater body 1. When heating the wafer, the wafer is placed on the boss 2 by a robotic arm. The edge of the wafer extends out of the boss 2. In order to ensure the heating effect of the wafer edge, electrodes are set on the heater body 1 and distributed on both sides of the boss 2. Heating patterns are arranged below the wafer edge, so that the edge of the wafer can be heated while ensuring the convenience of the robotic arm to pick up and put down the wafer.
[0019] The heater of this application allows for the automatic handling of wafers by a robotic arm, achieving automated processing while greatly reducing the probability of wafer breakage. Furthermore, a chamfered structure is designed between the step 2 and the heater body 1 to prevent delamination caused by thermal stress concentration at the heater protrusion 2, thus ensuring the service life of the heater.
[0020] In a preferred embodiment, such as Figure 1As shown, the heater body 1 is circular, and the boss 2 is circular and coaxial with the heater body 1, which is suitable for the heating needs of wafers.
[0021] In a preferred embodiment, the height of the boss is 1-10mm, which meets the requirements of the robotic arm for picking and placing, and will not cause structural instability due to excessive height.
[0022] In a preferred embodiment, the sidewall of the boss 2 and the heater body 1 are chamfered, with a slope of 100°-150°, to achieve a transition between the boss 2 and the heater body 1, ensure structural strength, and avoid delamination at the boss 2.
[0023] In a preferred embodiment, the sidewall of the boss 2 and the heater body 1 are chamfered with an arc shape, the radius of which is 1-10mm, so as to realize the transition between the boss 2 and the heater body 1, ensure structural strength, and avoid delamination at the boss 2.
[0024] In the description of this specification, the terms "connection," "installation," and "fixing," etc., should be interpreted broadly. For example, "connection" can be a fixed connection, a detachable connection, or an integral connection; it can be a direct connection or an indirect connection through an intermediate medium. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.
[0025] In the description of this specification, the terms "one embodiment," "some embodiments," etc., refer to specific features, structures, materials, or characteristics described in connection with that embodiment or example, which are included in at least one embodiment or example of this application. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.
[0026] The above are merely preferred embodiments of this application and are not intended to limit this application. Various modifications and variations can be made to this application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the protection scope of this application.
Claims
1. A heater that is easy for a robotic arm to pick up and place, characterized in that, It includes a heater body (1); the top of the heater body (1) is provided with a boss (2); the side wall of the boss (2) and the heater body (1) form a chamfer or arc chamfer; the outer diameter of the boss (2) is smaller than the outer diameter of the object being heated.
2. The heater that is easy for a robotic arm to pick up and place according to claim 1, characterized in that, The heater body (1) is circular, and the boss (2) is circular and coaxial with the heater body (1).
3. The heater that is easy for a robotic arm to pick up and place according to claim 2, characterized in that, The height of the boss (2) is 1-10mm.
4. The heater according to claim 1, which is convenient for a robotic arm to pick up and place, is characterized in that, The side wall of the boss (2) and the heater body (1) are chamfered, and the slope of the chamfer is 100°-150°.
5. The heater according to claim 4, which is convenient for a robotic arm to pick up and place, is characterized in that, The side wall of the boss (2) and the heater body (1) form an arc-shaped chamfer, the radius of which is 1-10mm.