Brush suitable for chuck type brushing machine

Abstract

The utility model provides a brush suitable for a chuck type brushing machine, and the brush comprises a brushing part with a circular truncated cone-shaped axial cross section; the scrubbing part comprises a first scrubbing part and a second scrubbing part, the first scrubbing part is cylindrical, and the second scrubbing part is in a circular truncated cone shape; the upper bottom surface of the second scrubbing part is connected with the lower bottom surface of the first scrubbing part; the axial section of the base is in a stepped cylinder shape; the base comprises a first cylinder and a second cylinder, the diameter of the bottom face of the first cylinder is larger than that of the bottom face of the second cylinder, the upper bottom face of the first cylinder is connected with the lower bottom face of the second cylinder, and the base is connected with the first scrubbing part of the scrubbing part through the lower bottom face of the first cylinder. The brushing part is of a unique circular truncated cone structure, blocking of a clamping device of the substrate to the brush body is avoided, the brushing part can make full contact with the edge of the substrate, the real contact area of the brushing part and the surface of the substrate is increased, and the cleaning quality is improved.

Description

Technical Field

[0001] This application relates to the field of semiconductor fabrication technology, and more particularly to a brush suitable for a chuck-type die brushing machine. Background Technology

[0002] In the semiconductor manufacturing industry, substrate cleaning (which can also be wafer cleaning) is a crucial step in ensuring chip performance and quality. Chuck-type brushing machines are widely used as common cleaning equipment. In actual cleaning operations, chuck-type brushing machines quickly and securely clamp the substrate using a mechanical clamping device, and then use a brush to scrub the substrate surface to remove adhering particulate impurities, meeting the stringent requirements for substrate cleanliness in high-precision manufacturing.

[0003] Currently, most chuck-type die-washing machines use brushes with an inverted triangular structure. This structure has significant drawbacks when cleaning substrates. Because the substrate edges are fixed by the clamping device, the shape of the inverted triangular brush makes it difficult for it to directly reach and clean the substrate edge surface. This results in poor cleaning of the substrate edges. The deformation of the brush reduces the actual contact area between the brush and the substrate surface, allowing particulate impurities to accumulate at the edges. This severely affects the particle size distribution of the substrate surface, reduces cleaning quality, and may adversely impact subsequent chip manufacturing processes.

[0004] Furthermore, during the cleaning process, the inverted triangular brush is prone to deformation due to the external force exerted by the clamping device. Once deformed, the actual contact area between the brush and the substrate surface decreases. Since the cleaning effect is closely related to the contact area between the brush and the substrate surface, a reduced contact area results in insufficient shear force applied by the brush to the substrate surface during washing, failing to effectively peel off and remove particulate impurities, thus significantly weakening the brush's cleaning ability. This not only increases the product defect rate and production costs but may also delay the production cycle due to substandard cleaning, posing numerous potential risks to the entire production process. Utility Model Content

[0005] This application provides a brush suitable for chuck-type wafer brushing machines, which solves the problem of inverted triangular brushes in chuck-type wafer brushing machines, namely, that inverted triangular brushes cannot fully contact the wafer edge and are prone to deformation, which reduces the actual contact area between the brush and the substrate surface, leading to the accumulation of edge particles.

[0006] This application provides a brush suitable for a chuck-type wafer brushing machine, used for cleaning substrates on the chuck-type wafer brushing machine, the brush comprising:

[0007] The brushing section has an axial cross-section that is frustum-shaped. The brushing section includes a first brushing section and a second brushing section. The first brushing section is cylindrical and the second brushing section is frustum-shaped. The upper bottom surface of the second brushing section is connected to the lower bottom surface of the first brushing section. The first brushing section and the second brushing section are integrally formed.

[0008] The base is used to connect the brush to the rotating head of the rotary motor. The axial cross-section of the base is a stepped cylinder. The base includes a first cylinder and a second cylinder. The bottom diameter of the first cylinder is larger than the bottom diameter of the second cylinder. The upper bottom surface of the first cylinder is connected to the lower bottom surface of the second cylinder. The base is connected to the first brushing part of the brushing section through the lower bottom surface of the first cylinder. The first cylinder and the second cylinder are integrally formed.

[0009] In some possible implementations, the sidewall of the second cylinder has a side cut surface, which is an annular inclined surface structure; the second cylinder is used to insert into the rotor sleeve of the rotary motor.

[0010] In some possible implementations, the generatrix of the side section forms an angle θ = 15 to 30° with the axis of the cylinder, and the distance between the centerline of the side section and the vertex of the upper bottom surface of the first cylinder near the side section is 5 to 8 mm.

[0011] In some possible implementations, the diameter ratio of the upper bottom surface to the lower bottom surface of the second brushing part is 1:1.1 to 1.5.

[0012] In some possible implementations, the diameter of the lower bottom surface of the first brushing part is the same as the diameter of the upper bottom surface of the second brushing part, and the diameter of the upper bottom surface of the second brushing part ranges from 20 to 25 mm.

[0013] In some possible implementations, the diameter of the lower surface of the second brushing part ranges from 22 to 30 mm.

[0014] In some possible implementations, the height of the first brushing section is 5-10 mm, and the height of the second brushing section is 3-5 mm.

[0015] In some possible implementations, the diameter of the first cylinder is 33-40 mm, and the height of the first cylinder is 5-10 mm.

[0016] In some possible implementations, the diameter of the second cylinder is 30-35 mm, and the height of the second cylinder is 10-15 mm.

[0017] In some possible implementations, the projected area of ​​the contact region between the lower bottom surface of the second brushing section and the edge of the substrate is π×14. 2 ~π×18 2 mm 2 The gap width between the bottom surface of the second brushing part and the clamping device is ≥3mm.

[0018] As described above, this application provides a brush suitable for a chuck-type brushing machine. The brush includes: a brushing section with an axial cross-section shaped like a frustum; the brushing section includes a first brushing section and a second brushing section, the first brushing section being cylindrical and the second brushing section being frustum-shaped; the upper bottom surface of the second brushing section is connected to the lower bottom surface of the first brushing section, and the first and second brushing sections are integrally formed; and a base with an axial cross-section shaped like a stepped cylinder; the base includes a first cylinder and a second cylinder, the bottom diameter of the first cylinder being larger than the bottom diameter of the second cylinder, the upper bottom surface of the first cylinder being connected to the lower bottom surface of the second cylinder, and the base being connected to the first brushing section of the brushing section through the lower bottom surface of the first cylinder, the first and second cylinders being integrally formed. The brushing section in this application adopts a unique frustum-shaped structure, avoiding obstruction of the brush body by the substrate clamping device, allowing the brushing section to fully contact the substrate edge, and increasing the actual contact area between the brushing section and the substrate surface. During the brushing process, it can better utilize its shear force to remove particles, thereby effectively improving the brushing effect at the substrate edge, avoiding particle aggregation at the edge, improving the surface particle size of the substrate, and enhancing the cleaning quality. Attached Figure Description

[0019] To more clearly illustrate the technical solution of this application, the drawings used in the embodiments will be briefly introduced below. Obviously, for those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0020] Figure 1 A schematic diagram of a brush suitable for a chuck-type brushing machine, provided for some embodiments of this application;

[0021] Figure 2 This is a front view of the scrubbing section provided in some embodiments of this application;

[0022] Figure 3 A scene diagram of a brush suitable for a chuck-type brushing machine, provided for some embodiments of this application.

[0023] Illustration: 1-Brushing section; 11-First brushing section; 12-Second brushing section; 2-Base; 21-First cylinder; 22-Second cylinder; 221-Side section; 3-Rotary motor; 4-Substrate; 5-Clamping device. Detailed Implementation

[0024] The embodiments will now be described in detail, examples of which are illustrated in the accompanying drawings. When the following description relates to the drawings, unless otherwise indicated, the same numbers in different drawings represent the same or similar elements. The embodiments described below do not represent all embodiments consistent with this application. They are merely examples of systems and methods consistent with some aspects of this application as detailed in the claims.

[0025] In the semiconductor manufacturing industry, substrate cleaning (which can also be wafer cleaning) is a crucial step in ensuring chip performance and quality. Chuck-type brushing machines are widely used as common cleaning equipment. In actual cleaning operations, chuck-type brushing machines quickly and securely clamp the substrate using a mechanical clamping device, and then use a brush to scrub the substrate surface to remove adhering particulate impurities, meeting the stringent requirements for substrate cleanliness in high-precision manufacturing.

[0026] Currently, most chuck-type die-washing machines use brushes with an inverted triangular structure. This structure has significant drawbacks when cleaning substrates. Because the substrate edges are fixed by the clamping device, the shape of the inverted triangular brush makes it difficult for it to directly reach and clean the substrate edge surface. This results in poor cleaning of the substrate edges. The deformation of the brush reduces the actual contact area between the brush and the substrate surface, allowing particulate impurities to accumulate at the edges. This severely affects the particle size distribution of the substrate surface, reduces cleaning quality, and may adversely impact subsequent chip manufacturing processes.

[0027] Furthermore, during the cleaning process, the inverted triangular brush is prone to deformation due to the external force exerted by the clamping device. Once deformed, the actual contact area between the brush and the substrate surface decreases. Since the cleaning effect is closely related to the contact area between the brush and the substrate surface, a reduced contact area results in insufficient shear force applied by the brush to the substrate surface during washing, failing to effectively peel off and remove particulate impurities, thus significantly weakening the brush's cleaning ability. This not only increases the product defect rate and production costs but may also delay the production cycle due to substandard cleaning, posing numerous potential risks to the entire production process.

[0028] Based on this, this application provides a brush suitable for a chuck-type wafer brushing machine. The brush includes a brushing section and a base. The brushing section adopts a frustum-shaped structure, allowing the brush to make full contact with the edge of the substrate. By increasing the actual contact area between the brush and the substrate surface, its shearing force is better utilized to remove particles. This also better avoids the problem of reduced cleaning ability caused by deformation of the brush due to the clamping device.

[0029] like Figures 1 to 2As shown, this application provides a brush suitable for a chuck-type wafer brushing machine, used for cleaning substrates on the chuck-type wafer brushing machine, the brush comprising:

[0030] The brushing part 1 has an axial cross-section that is frustum-shaped. The brushing part 1 includes a first brushing part 11 and a second brushing part 12. The first brushing part 11 is cylindrical and the second brushing part 12 is frustum-shaped. The upper bottom surface of the second brushing part 12 is connected to the lower bottom surface of the first brushing part 11. The first brushing part 11 and the second brushing part 12 are integrally formed.

[0031] The base 2 is used to connect the brush to the rotating head of the rotary motor. The axial cross-section of the base 2 is a stepped cylinder. The base 2 includes a first cylinder 21 and a second cylinder 22. The bottom diameter of the first cylinder 21 is larger than the bottom diameter of the second cylinder 22. The upper bottom surface of the first cylinder 21 is connected to the lower bottom surface of the second cylinder 22. The base 2 is connected to the first brushing part 11 of the brushing part 1 through the lower bottom surface of the first cylinder 21. The first cylinder 21 and the second cylinder 22 are integrally formed.

[0032] In this application, there is a certain gap between the brush and the clamping device to avoid collision or interference between the brush and the clamping device, thereby improving cleaning efficiency.

[0033] The brushing section 1 is made of PVA (polyvinyl alcohol), and the base 2 is made of PEEK (polyether ether ketone). This application describes the structure of a brush suitable for a chuck-type wafer brushing machine using a substrate as an example. In reality, this brush can also be applied to the cleaning of wafers or chips.

[0034] In some embodiments, the brushing part 1 and the base 2 are integrally formed, which makes the overall structure of the brush more stable, better able to withstand external forces during the brushing process, reduces the relative displacement between parts, and further improves the stability and efficiency of cleaning.

[0035] The brushing section 1 adopts a unique frustum-shaped structure, which effectively avoids the clamping device. The larger lower surface can penetrate deep into the gap between the clamping device and the substrate, preventing the substrate clamping device from obstructing the brush body. This allows the brushing section 1 to fully contact the substrate edge, increasing the actual contact area between the brushing section 1 and the substrate surface. This allows for better utilization of its shear force to remove particles during the brushing process, effectively improving the brushing effect on the substrate edge, preventing edge particle aggregation, improving substrate surface particle size, and enhancing cleaning quality. The base 2 adopts a stepped cylindrical design and is made of non-deformable PEEK material. On one hand, this structural design provides stable longitudinal support for the brushing section 1, ensuring its stability during the brushing process; on the other hand, its side cut surfaces provide lateral rotational force to the brushing section 1, driving it to rotate and complete the scrubbing action, ensuring smooth brushing and improving brushing efficiency.

[0036] The PVA material used in the brushing section 1 provides excellent hydrophilicity and adsorption properties. During substrate brushing, the brushing section 1 quickly absorbs water, ensuring thorough wetting of the substrate surface and aiding in the loosening and dissolution of particulate impurities. Simultaneously, its adsorption properties effectively adsorb detached particles, preventing them from re-adhering to the substrate surface during cleaning, thus improving cleaning thoroughness and ensuring the substrate surface particle size meets high-precision manufacturing requirements. Furthermore, the soft and elastic nature of PVA material allows it to closely conform to the substrate's micro-undulations upon contact, effectively brushing even tiny grooves or protrusions. Therefore, using PVA material in the brushing section 1 further enhances the cleaning effect.

[0037] In some embodiments, the side wall of the second cylinder 22 is provided with a side cut surface 221, which is an annular inclined surface structure; in the working state, the second cylinder 22 is inserted into the rotating head sleeve of the rotary motor.

[0038] Wherein, the generatrix of the side section 221 forms an angle θ with the axis of the cylinder of 15 to 30°, and the distance between the center line of the side section 221 and the vertex of the upper bottom surface of the first cylinder 21 near the side section 221 is 5 to 8 mm.

[0039] Compared to a regular cylindrical structure, the side cut surface 221 of the annular bevel can better fit the shape of the rotary motor, ensuring the fixation effect of the brush and improving the cleaning effect on the edge of the substrate.

[0040] The angle θ between the generatrix of the side section 221 and the cylindrical axis is between 15° and 30°. This angle range allows the brushing unit 1 to obtain a suitable tangential force during rotation. When the rotary motor drives the brush to rotate, this angle can effectively convert the driving force of the rotary motor into the rotational force of the brush, ensuring that the brushing unit 1 can maintain a stable speed and direction of rotation when brushing the substrate surface, thereby improving the uniformity and efficiency of brushing. If the angle is too small, the provided tangential force will be insufficient, which will affect the rotation effect of the brush; if the angle is too large, it may lead to a decrease in the structural stability of the brush.

[0041] The distance between the centerline of the side cut surface 221 and the vertex of the top surface of the first cylinder 21 near the side cut surface 221 is 5-8 mm. This distance ensures that after the brushing part 1 is installed at the front end of the rotary motor, the side cut surface 221 can be in the optimal working position with the rotary motor. This ensures that the rotational force can be stably transmitted when the side cut surface is in tangential contact with the rotary motor, and that the overall structural stability and working performance of the brush are not affected by the distance being too close or too far.

[0042] In some embodiments, the diameter ratio of the upper bottom surface to the lower bottom surface of the second brushing part 12 is 1:1.1 to 1.5.

[0043] Setting the diameter ratio of the upper and lower bottom surfaces of the second brushing section 12 to 1:1.1 to 1.5 allows the frustum shape to cleverly avoid the clamping device, preventing collisions or interference between the brush and the clamping device during brushing. This ensures smooth brushing, reduces brush damage and cleaning interruptions caused by collisions, and improves cleaning efficiency. During brushing, shearing force can be better utilized to remove particles, effectively preventing particle aggregation at the edges, improving substrate surface cleanliness and particle size indicators, and enhancing cleaning quality.

[0044] In some embodiments, the diameter of the lower bottom surface of the first brushing part 11 is the same as the diameter of the upper bottom surface of the second brushing part 12, and the diameter of the upper bottom surface of the second brushing part 12 ranges from 20 to 25 mm.

[0045] The difference in diameter between the upper and lower bottom surfaces of the brushing section 1 satisfies the need for deep cleaning of gaps without affecting the overall structural strength and balance of the brush due to excessive diameter variation. When the brushing section 1 is driven by the rotary motor, it maintains a stable rotation, reducing vibration and deformation caused by structural inconsistencies and extending the brush's lifespan.

[0046] In some embodiments, the diameter of the lower bottom surface of the second brushing part 12 ranges from 22 to 30 mm.

[0047] In some embodiments, the height of the first brushing part 11 is 5-10 mm, and the height of the second brushing part 12 is 3-5 mm.

[0048] In some embodiments, the diameter of the first cylinder 21 is 33-40 mm, and the height of the first cylinder 21 is 5-10 mm.

[0049] The height of the first brushing section 11 is set to 5-10mm, ensuring sufficient longitudinal length for stable brushing during the process. This height range ensures that the first brushing section 11 has enough material to withstand the cleaning pressure, while also allowing the second brushing section 12 to function effectively when driven by the rotary motor. The height of the second brushing section 12 is 3-5mm. This height allows the frustum-shaped second brushing section 12 to more precisely penetrate the gap between the clamping device and the substrate. Within this height range, the lower surface of the second brushing section can fully contact the substrate edge. Utilizing its larger lower surface area, the actual contact area with the substrate surface is increased, thereby better utilizing shear force to remove particulate impurities, effectively improving the brushing effect at the substrate edge, preventing edge particle aggregation, and enhancing the cleanliness of the substrate surface.

[0050] The first brushing section 11 is chosen at a relatively high height to provide a stable support base for the brush. This ensures that even if the second brushing section 12 penetrates into the gap and contacts the edge of the substrate during the brushing process, the entire brush will not wobble or tilt due to instability. The height of the second brushing section 12 is set so that it is neither too high, causing structural instability, nor too low, rendering brushing ineffective. This combination allows the brush to maintain balance when rotating under the drive of the rotary motor, reducing vibrations caused by structural instability and further improving the uniformity and stability of the brushing process.

[0051] The heights of the first brushing section 11 and the second brushing section 12 are set to ranges of 5–10 mm and 3–5 mm, respectively, providing better adaptability for the brushes in different cleaning scenarios. For substrates of different sizes and different types of particulate impurities, the brushing effect can be optimized by adjusting the specific heights of the first brushing section 11 and the second brushing section 12 within this range. For example, for substrates with many stubborn particulate impurities, the height of the first brushing section 11 can be appropriately increased to provide greater brushing pressure; for substrates with special edge shapes, the height of the second brushing section 12 can be adjusted to make it fit more closely to the substrate edge for brushing.

[0052] In some embodiments, the diameter of the second cylinder 22 is 30-35 mm, and the height of the second cylinder 22 is 10-15 mm.

[0053] In some embodiments, the projected area of ​​the contact region between the lower bottom surface of the second brushing section 12 and the edge of the substrate is π×14. 2 ~π×18 2 mm 2The gap width between the bottom surface of the second brushing part 12 and the clamping device is ≥3mm.

[0054] Larger projected area (π×14) 2 ~π×18 2 mm 2 This means that the bottom surface of the second brushing section 12 has a wider contact with the substrate edge, greatly increasing the actual contact area between the brush and the substrate surface. During the brushing process, the larger contact area can provide stronger shearing force, more effectively removing particulate impurities from the substrate edge, significantly improving the brushing effect at the substrate edge, and reducing the risk of edge particle aggregation.

[0055] The design of a gap width of ≥3mm between the bottom surface of the second brushing section 12 and the clamping device allows the brush to better adapt to different models and specifications of chuck-type brushing machines. In actual production, the size and position of the clamping devices vary among different devices. This gap width ensures that the brush can be smoothly installed and used on various devices, avoiding collisions or interference between the brush and the clamping device due to insufficient gap. This ensures the smooth progress of the cleaning work and improves the versatility of the brush and the compatibility of the equipment.

[0056] By setting an appropriate gap width and a larger projected contact area, the operational stability of the brush during the washing process can be enhanced. A larger projected area ensures more even force distribution when the brush contacts the substrate edge, reducing brush wobbling or displacement caused by uneven localized force. A gap width of ≥3mm prevents friction and collision between the brush and the clamping device, further reducing the possibility of brush vibration during operation, ensuring smooth and continuous washing action, and thus improving cleaning efficiency and quality.

[0057] like Figure 3 As shown, the clamping device 5 of the chuck-type brushing machine fixes the substrate 4. The brush is connected to the rotating head of the rotary motor 3 via the base 2. The rotary motor 3 drives the brush to rotate clockwise, making reciprocating motion on the surface of the substrate 4. During the brushing process, a gap is left between the lower surface of the second brushing part 12 and the clamping device 5 of the chuck-type brushing machine, allowing it to penetrate into the gap between the clamping device 5 and the substrate 4. Due to the frustum shape design, the lower surface area of ​​the second brushing part 12 is large, increasing the contact area with the edge of the substrate 4. During rotation, shearing force is used to remove particles from the surface of the substrate 4, effectively improving the brushing effect on the edge of the substrate 4. The first brushing part 11 provides stable support for the second brushing part 12, ensuring the stability of the brushing process.

[0058] Because the bottom diameter of the first cylinder 21 is relatively large, it provides a stable bottom support for the brush, and its bottom surface is connected to the first brushing part 11 of the brushing part 1, transmitting the rotational force of the rotary motor 3 to the brushing part 1. The side wall of the second cylinder 22 has a side cut surface 221 with an annular inclined structure. This design avoids collision and interference between the brush and the rotary motor 3 during rotation, and ensures the fixation of the brush. It converts the driving force of the rotary motor 3 into a force that makes the brush rotate stably, driving the brush to rotate and complete the wiping action on the surface of the substrate 4.

[0059] As can be seen from the above embodiments, this application provides a brush suitable for a chuck-type brushing machine. The brush includes: a brushing section, the axial cross-section of which is frustum-shaped; the brushing section includes a first brushing section and a second brushing section, the first brushing section being cylindrical and the second brushing section being frustum-shaped; the upper bottom surface of the second brushing section is connected to the lower bottom surface of the first brushing section, and the first brushing section and the second brushing section are integrally formed; a base, the axial cross-section of which is stepped cylindrical; the base includes a first cylinder and a second cylinder, the bottom diameter of the first cylinder being larger than the bottom diameter of the second cylinder, the upper bottom surface of the first cylinder being connected to the lower bottom surface of the second cylinder, and the base being connected to the first brushing section of the brushing section through the lower bottom surface of the first cylinder, the first cylinder and the second cylinder being integrally formed. The brushing section in this application employs a unique frustum-shaped structure, which avoids obstruction of the brush body by the substrate clamping device, allowing the brushing section to fully contact the substrate edge and increasing the actual contact area between the brushing section and the substrate surface. During the brushing process, it can better utilize its shear force to remove particles, thereby effectively improving the brushing effect at the substrate edge, preventing edge particle aggregation, improving substrate surface particle size, and enhancing cleaning quality.

[0060] Similar parts between the embodiments provided in this application can be referred to mutually. The specific implementation methods provided above are only a few examples under the overall concept of this application and do not constitute a limitation on the scope of protection of this application. For those skilled in the art, any other implementation methods extended from the solution of this application without creative effort shall fall within the scope of protection of this application.

Claims

1. A brush suitable for a chuck-type wafer brushing machine, used for cleaning substrates on a chuck-type wafer brushing machine, characterized in that, The brush includes: The brushing section (1) has an axial cross-section that is frustum-shaped. The brushing section (1) includes a first brushing section (11) and a second brushing section (12). The first brushing section (11) is cylindrical, and the second brushing section (12) is frustum-shaped. The upper bottom surface of the second brushing section (12) is connected to the lower bottom surface of the first brushing section (11). The first brushing section (11) and the second brushing section (12) are integrally formed. The base (2) is used to connect the brush to the rotating head of the rotary motor. The axial cross section of the base (2) is a stepped cylinder. The base (2) includes a first cylinder (21) and a second cylinder (22). The bottom diameter of the first cylinder (21) is larger than the bottom diameter of the second cylinder (22). The upper bottom surface of the first cylinder (21) is connected to the lower bottom surface of the second cylinder (22). The base (2) is connected to the first brushing part (11) of the brushing part (1) through the lower bottom surface of the first cylinder (21). The first cylinder (21) and the second cylinder (22) are integrally formed.

2. The brush for a chuck-type brushing machine according to claim 1, characterized in that, The second cylinder (22) has a side cut surface (221) on its side wall, and the side cut surface (221) is an annular inclined surface structure; the second cylinder (22) is used to insert into the rotating head sleeve of the rotary motor.

3. The brush for a chuck-type brushing machine according to claim 2, characterized in that, The generatrix of the side section (221) forms an angle θ with the axis of the cylinder of 15 to 30°, and the distance between the center line of the side section (221) and the vertex of the upper bottom surface of the first cylinder (21) near the side section (221) is 5 to 8 mm.

4. The brush for a chuck-type brushing machine according to claim 1, characterized in that, The diameter ratio of the upper bottom surface to the lower bottom surface of the second brushing part (12) is 1:1.1 to 1.

5.

5. The brush for a chuck-type brushing machine according to claim 4, characterized in that, The diameter of the lower bottom surface of the first brushing part (11) is the same as the diameter of the upper bottom surface of the second brushing part (12), and the diameter of the upper bottom surface of the second brushing part (12) ranges from 20 to 25 mm.

6. The brush for a chuck-type brushing machine according to claim 5, characterized in that, The diameter of the bottom surface of the second brushing part (12) ranges from 22 to 30 mm.

7. The brush for a chuck-type brushing machine according to claim 5, characterized in that, The height of the first brushing part (11) is 5-10 mm, and the height of the second brushing part (12) is 3-5 mm.

8. The brush for a chuck-type brushing machine according to claim 1, characterized in that, The diameter of the first cylinder (21) is 33-40 mm, and the height of the first cylinder (21) is 5-10 mm.

9. The brush for a chuck-type brushing machine according to claim 8, characterized in that, The diameter of the second cylinder (22) is 30-35 mm, and the height of the second cylinder (22) is 10-15 mm.

10. The brush for a chuck-type brushing machine according to claim 1, characterized in that, The projected area of ​​the contact area between the bottom surface of the second brushing section (12) and the edge of the substrate is π×14. 2 ~π×18 2 mm 2 The gap between the bottom surface of the second brushing part (12) and the clamping device is ≥3mm.

Images