Grinding device for preparing diffusion resistance test sample
By designing a follow-up connection structure and a multi-nozzle liquid distributor, the problems of uneven distribution and splashing of grinding slurry were solved, achieving uniform coverage of grinding slurry and improving the stability and efficiency of the grinding process.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- ZING SEMICON CORP
- Filing Date
- 2025-05-15
- Publication Date
- 2026-04-28
AI Technical Summary
Existing liquid distributors have difficulty achieving uniform coverage of the entire surface of the grinding disc during the grinding process, and are prone to splashing due to centrifugal force, resulting in uneven distribution and insufficient coverage of the grinding liquid.
A liquid distributor with a follow-up connection structure and multiple nozzles was designed. The nozzles are adjustable in angle and position to ensure uniform distribution of grinding fluid and are connected to a liquid storage tank through pipelines to achieve synchronous movement.
It achieves uniform distribution of the grinding slurry, avoids insufficient coverage and liquid splashing, and improves the stability and uniformity of the grinding effect.
Smart Images
Figure CN224169523U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of semiconductor processing, and more specifically, to a grinding apparatus for preparing samples for diffusion resistance testing. Background Technology
[0002] Sperm resistance method (SRP) is an important analytical method for semiconductor materials. Its basic principle is to obtain information about the doping distribution within the semiconductor by contacting a probe with the sample surface and measuring the diffusion resistance. Due to its high sensitivity and high resolution, SRP is widely used in the research and development and manufacturing processes of semiconductor devices. In the semiconductor industry, SRP technology can accurately detect the impurity distribution within semiconductor materials, providing crucial data support for performance optimization and quality control of semiconductor devices. In SRP testing, in addition to ensuring the smoothness and uniformity of the sample surface, it is also necessary to avoid uneven distribution of the polishing slurry or excessive damage to the material. The liquid distributor, as a key component of the polishing equipment, is responsible for accurately and uniformly distributing the polishing slurry or coolant onto the polishing disc surface; its performance directly affects the stability and reliability of the sample preparation process.
[0003] Currently, most liquid distributors use fixed nozzles or simple dispersers. These spray structures have limited liquid coverage and cannot ensure uniform liquid distribution across the entire surface of the grinding disc. Existing liquid distributors, due to their fixed nozzles and simple design, struggle to achieve uniform coverage of the entire grinding disc surface during spraying. Especially when the grinding disc rotates at high speed, the liquid is prone to splashing due to centrifugal force, leading to localized over- or under-supply. Furthermore, their flow rate regulation capability is insufficient and their accuracy is low. In addition, existing liquid distributors lack synchronization with the grinding disc's movement. Utility Model Content
[0004] In view of the problems existing in the prior art described above, this application provides a grinding device for preparing diffusion resistance test samples, which can achieve uniform distribution of grinding slurry and avoid problems such as insufficient coverage of grinding slurry or liquid splashing.
[0005] To achieve the above and other related objectives, this utility model provides a grinding apparatus for preparing samples for diffusion resistance testing, comprising:
[0006] The grinding disc has a central area for grinding the sample.
[0007] A follow-up connection structure is fixedly set on the edge of the grinding disk outside the sample grinding area;
[0008] A liquid dispenser, located on a grinding disc, includes a first end and a second end. The first end is rotatably connected to a follower connection structure. The second end is provided with multiple nozzles, which are directed toward the sample grinding area.
[0009] Liquid storage tank for storing grinding fluid;
[0010] The pipeline is connected to a liquid storage tank at one end and to multiple nozzles at the other end inside the liquid distributor.
[0011] Optionally, the grinding apparatus for preparing a sample for diffusion resistance testing further includes: a porous nozzle plate disposed on the side of the second end of the liquid dispenser facing the sample grinding area, and multiple nozzles disposed on the porous nozzle plate.
[0012] Optionally, multiple nozzles are evenly distributed at the second end of the liquid dispenser.
[0013] Optionally, the nozzle is detachably disposed at the second end of the liquid dispenser.
[0014] Optionally, the grinding apparatus for preparing samples for diffusion resistance testing further includes a spline shaft, with a nozzle connected by the spline shaft to a second end of a liquid dispenser to adjust the angle of the nozzle relative to the second end toward the sample grinding area.
[0015] Optionally, the angle adjustment range of the nozzle relative to the side of the second end facing the sample grinding area is -45° to 45°.
[0016] Optionally, the grinding apparatus for preparing samples for diffusion resistance testing further includes a flow regulating component disposed inside the nozzle.
[0017] Optionally, the rotation speed of the grinding disc is between 200 r / min and 1000 r / min.
[0018] Optionally, when grinding the sample, in the projection on the surface of the grinding disc, the geometric center of the follower connection structure and the geometric center of the grinding sample are connected by a first line, and the geometric center of the follower connection structure and the midpoint of the second end of the liquid distributor are connected by a second line, and the angle between the first line and the second line is between 15° and 25°.
[0019] Optionally, the grinding apparatus for preparing samples for diffusion resistance testing further includes:
[0020] A sealing ring is installed at the connection between the pipeline and the liquid storage tank, and at the connection between the pipeline and the nozzle.
[0021] As described above, the grinding apparatus for preparing diffusion resistance test samples provided by this utility model has at least the following beneficial technical effects:
[0022] This invention relates to a grinding device for preparing samples for diffusion resistance testing, comprising a grinding disc, a follower-connecting structure, a liquid storage tank, a liquid distributor, and tubing. The central area of the grinding disc is the sample grinding zone. The follower-connecting structure is fixedly mounted on the edge of the grinding disc surrounding the sample grinding zone. The liquid distributor is located above the grinding disc and includes a first end and a second end. The first end is rotatably connected to the follower-connecting structure; the second end has multiple nozzles facing the sample grinding zone. The liquid storage tank stores the grinding fluid. One end of the tubing is connected to the liquid storage tank, and the other end is located inside the liquid distributor and connected to the multiple nozzles. This design enables uniform distribution of the grinding fluid, avoiding insufficient coverage or liquid splashing. Attached Figure Description
[0023] Figure 1 The diagram shows the structure of the grinding apparatus for preparing samples for diffusion resistance testing provided by this invention.
[0024] Figure 2 The diagram shows a projection of the follower connection structure, liquid distributor, and grinding sample onto the surface of the grinding disc, as provided in an embodiment of this utility model.
[0025] Figure 3 The diagram shown is a schematic of the liquid dispenser and follower connection structure provided by this utility model.
[0026] Figure 4 The diagram shows a schematic of the second end of the liquid dispenser provided in an embodiment of the present invention, opposite to the grinding sample.
[0027] Figure Labels
[0028] 1. Grinding disc; 11. Sample grinding area; 2. Pressure regulating mechanism; 21. Pressure head; 22. Grinding rod; 221. Shock absorption assembly; 23. Grinding head; 3. Grinding sample; 41. Follow-up connection structure; 42. Liquid distributor; 421. First end; 422. Second end; 423. Multi-hole nozzle plate; 424. Nozzle; 5. Piping; 6. Liquid storage tank; 7. Sealing ring. Detailed Implementation
[0029] The following specific examples illustrate the implementation of this utility model. Those skilled in the art can easily understand other advantages and effects of this utility model from the content disclosed in this specification. This utility model can also be implemented or applied through other different specific embodiments, and various details in this specification can also be modified or changed based on different viewpoints and applications without departing from the spirit of this utility model.
[0030] It should be noted that the illustrations provided in this embodiment are only schematic representations of the basic concept of this utility model. Although the illustrations only show components related to this utility model and are not drawn according to the actual number, shape and size of the components, the shape, quantity, positional relationship and proportion of each component can be arbitrarily changed under the premise of realizing the technical solution of this utility model, and the layout of the components may also be more complex.
[0031] This embodiment provides a grinding apparatus for preparing samples for diffusion resistance testing, referring to... Figures 1 to 4 The grinding apparatus for preparing diffusion resistance test samples in this embodiment includes a grinding disc 1, a follower connection structure 41, a liquid storage tank 6, a liquid distributor 42, and a pipeline 5.
[0032] Reference Figure 1 and Figure 2 The grinding disc 1 is circular, and its surface is precision-machined to ensure flatness and reduce errors during the grinding process. The rotation speed of the grinding disc 1 is between 200 r / min and 1000 r / min. The central area of the grinding disc 1 is the sample grinding area 11, where the sample 3 is placed. A follower connection structure 41 is fixedly installed on the edge of the grinding disc 1 surrounding the sample grinding area 11. The liquid storage tank 6 is one of the core components of the grinding apparatus used for preparing samples for diffusion resistance testing, and it is used to store the grinding fluid. The liquid storage tank 6 can store various grinding fluids, such as water-based, oil-based, or solvent-based fluids, to meet the needs of different materials and grinding processes. The liquid storage tank 6 is made of corrosion-resistant materials, such as high-density polyethylene (HDPE), stainless steel, or polytetrafluoroethylene (PTFE). These materials have excellent corrosion resistance, preventing the grinding fluid from corroding the liquid storage tank 6 and avoiding contamination of the grinding fluid by impurities. To prevent the grinding fluid from evaporating, leaking, or being contaminated by the outside world during storage, the liquid storage tank 6 adopts a sealed design.
[0033] Reference Figures 1 to 4The liquid distributor 42 is located above the grinding disc 1 and includes a first end 421 and a second end 422. The first end 421 is rotatably connected to the follower connection structure 41. The second end 422 is provided with multiple nozzles 424, which face the sample grinding area 11, ensuring that the grinding liquid can be directly sprayed onto the key grinding area around the sample 3. The liquid distributor 42, through its rotatable connection to the follower connection structure 41, ensures that the nozzles 424 move synchronously with the rotation direction of the grinding disc 1, and adjusts the position and spray range of the nozzles 424 according to the diameter, rotation speed, and size of the grinding area of the grinding disc 1. Preferably, the multiple nozzles 424 are evenly distributed on the second end 422 of the liquid distributor 42, ensuring that the grinding liquid is evenly sprayed onto the grinding area from multiple directions. When the grinding disc 1 rotates, the liquid distributor 42 rotates synchronously with the grinding disc 1, so that the spray direction of the nozzles 424 on the liquid distributor 42 is always facing the surface of the sample 3, avoiding the problem of grinding liquid spray deviation. Furthermore, due to the presence of the follower connection structure 41, the liquid distributor 42 can rotate with the follower connection structure 41 as its endpoint. Specifically, when grinding the sample 3, in the projection on the surface of the grinding disk 1, the geometric center O of the follower connection structure 41 and the geometric center P of the sample 3 are connected by a first line, and the geometric center O of the follower connection structure 41 and the midpoint N of the second end 422 of the liquid distributor 42 are connected by a second line. The angle A between the first line and the second line is between 15° and 25°. The adjustable angle of the liquid distributor 42 ensures that the grinding liquid is directly sprayed onto the surface of the grinding disk 1 and the sample grinding area 11, and avoids unstable grinding effect due to uneven distribution of the grinding liquid.
[0034] Reference Figures 1 to 3 In an optional embodiment of this example, the nozzle 424 is directly located on the side of the second end 422 of the liquid distributor 42 opposite to the grinding sample 3. The nozzle 424 is connected to the liquid distributor 42 via a splined shaft (not shown in the figures) to adjust the angle of the nozzle 424 relative to the side of the second end 422 facing the sample grinding area 11. Specifically, the angle adjustment range of the nozzle 424 is -45° to 45°, which allows for a more concentrated spraying area of the grinding slurry. The nozzle 424 is detachably mounted on the second end 422 of the liquid distributor 42, allowing for the replacement of different nozzles 424 according to different grinding requirements. The nozzle 424 has a built-in flow regulation component (not shown in the figures) that can spray a fine stream, improving cooling and grinding effects. (Refer to...) Figures 1 to 4In another optional embodiment of this invention, the grinding apparatus for preparing diffusion resistance test samples further includes a porous nozzle plate 423, disposed on the side of the second end 422 of the liquid distributor 42 facing the sample grinding area 11. The porous nozzle plate 423 includes a plurality of nozzles 424. The nozzle plate 423 is connected to the liquid distributor 42 via a spline shaft (not shown in the figures) to adjust the angle of the nozzles 424 relative to the side of the second end 422 facing the sample grinding area 11. Specifically, the angle adjustment range of the nozzles 424 is -45° to 45°, which enables a more concentrated spraying area of the grinding liquid. The interior of the second end of the liquid distributor 42 is designed to fit with the porous nozzle plate 423, and the distribution and size of the nozzles 424 can be adjusted. At the same time, the nozzles 424 can be optimized according to the diameter of the grinding disk 1 to ensure that the grinding liquid can cover every part of the grinding area. Furthermore, a porous nozzle plate 423 is detachably mounted on the second end 422 of the liquid distributor 42. Different porous nozzle plates 423 can be replaced according to different grinding requirements. The porous nozzle plate 423 has a built-in flow adjustment component (not shown in the attached figure) that can spray a fine stream to improve cooling and grinding effects. Combining the porous structure with the adjustable nozzle 423 allows the grinding fluid to form a continuous and uniform friction layer on the surface of the grinding disk 1, avoiding frictional differences in the grinding area caused by uneven supply of grinding fluid.
[0035] Reference Figures 1 to 4 Pipeline 5 serves as a bridge for transporting the grinding fluid from the liquid storage tank 6 to the nozzles 424. Its design must ensure the purity and efficiency of the grinding fluid during transport. One end of pipeline 5 is connected to the liquid storage tank 6, and the other end is located inside the liquid distributor 42 and connected to multiple nozzles 424. It is used to transport the grinding fluid from the liquid storage tank 6 to the multiple nozzles 424 at the second end 422 of the liquid distributor 42. Preferably, pipeline 5 is made of a corrosion-resistant material, such as polytetrafluoroethylene (PTFE), to ensure that the grinding fluid is not contaminated or corroded during transport. The inner wall of pipeline 5 is mirror-polished to reduce frictional resistance during the flow of the grinding fluid, prevent deposits or particles from adhering, and ensure the cleanliness of the grinding fluid during transport. Sealing rings 7 are provided at the connection points between pipeline 5 and the liquid storage tank 6, and between pipeline 5 and the nozzles 424, to prevent leakage of the grinding fluid or external contamination. Depending on the spatial structure of the grinding device, pipeline 5 can be designed as a flexible or fixed layout to adapt to the installation requirements of different grinding devices.
[0036] Reference Figures 1 to 4The grinding apparatus for preparing samples for diffusion resistance testing also includes a pressure regulating mechanism 2. The pressure regulating mechanism 2 is vertically positioned above the grinding disk 1, and its projection onto the grinding disk 1 is located in the sample grinding area 11 of the grinding disk 1. The pressure regulating mechanism 2 includes multiple pressure heads 21 of different weights, a grinding rod 22, and a grinding head 23. The grinding rod 22 is vertically positioned directly above the sample grinding area 11 of the grinding disk 1, and the grinding head 23 is positioned at the end of the grinding rod 22 near the grinding disk 1. During sample grinding, a suitable pressure head 21 can be detachably installed at the end of the grinding rod 22 away from the grinding disk 1. The top of the pressure head 21 can be designed as a flat or curved surface to adapt to different shapes of the sample 3 being ground. For example, for samples with complex surface shapes, a curved pressure head can better conform to the sample surface, achieving uniform grinding. The contact surface at the bottom of the pressure head 21 can be designed as smooth and flat to ensure that pressure is uniformly transmitted to the surface of the sample 3 being ground, avoiding pressure concentration caused by uneven contact surfaces, thereby protecting the surface of the sample 3 from damage. For example, in an optional embodiment of this example, the pressure regulating mechanism 2 includes three pressure heads 21 of different weights: a lightweight pressure head, a medium-weight pressure head, and a heavyweight pressure head. The lightweight pressure head, weighing 50g to 500g, is suitable for fine grinding of thin-film or brittle material samples, such as silicon wafers or ceramic substrates. The lightweight pressure head prevents surface cracking or damage to the sample 3 due to excessive pressure. The medium-weight pressure head, weighing 500g to 2000g, is suitable for grinding semiconductor or metal materials of conventional thickness. The medium-weight pressure head ensures appropriate pressure and improves grinding efficiency. The heavyweight pressure head, weighing 2000g to 5000g, is suitable for grinding samples 3 with high hardness or rough surfaces, such as alloy substrate samples or thick-layer samples. The heavyweight pressure head improves material removal rate. The pressure head 21 of different weights can be adapted to different grinding scenarios. The adjustable pressure head 21 can apply precise force to the surface of the grinding sample 3. The pressure adjustment range of the pressure adjustment mechanism 2 is 0.5N to 50N, which can adapt to different grinding samples 3 and grinding process requirements.
[0037] Reference Figures 1 to 4The pressure regulating mechanism 2 also includes a vibration damping component 221, which is arranged around the grinding rod 22. The vibration damping component 221 is made of a high-performance elastic material and can effectively absorb and buffer vibrations and impacts during the grinding process. During grinding, the contact between the grinding head 23 and the grinding disc 1 generates vibrations, especially when grinding hard materials or samples with uneven surfaces. The vibration damping component 221 effectively absorbs vibrations and impacts during the grinding process, ensuring the stability of the applied pressure. This design avoids pressure fluctuations caused by vibration, further improving the uniformity and stability of the grinding effect. Furthermore, the design of the vibration damping component 221 not only considers vibration absorption but also structural stability and durability. For example, the internal structure of the vibration damping component 221 is a multi-layered composite design, containing alternating elastic and damping layers. The elastic layers provide an immediate elastic response, while the damping layers are responsible for further dissipating vibration energy. This design allows the vibration damping component 221 to maintain stable vibration damping performance during long-term grinding operations without failing due to material fatigue. By introducing a damping component 221 into the pressure regulating mechanism 2, pressure fluctuations caused by vibration can be effectively avoided. During the grinding process, even if the rotation of the grinding disc 1 or the contact of the grinding head 23 causes minor vibrations, the damping component 221 can quickly absorb them, thereby ensuring that the pressure applied to the surface of the grinding sample 3 remains stable.
[0038] Reference Figures 1 to 4 The grinding apparatus for preparing samples for diffusion resistance testing also includes a control module (not shown in the attached diagram). The control module is communicatively connected to the grinding disc 1 and the pressure regulating mechanism 2 to achieve fully automated control of the grinding process. Specifically, the control module employs an advanced embedded system that integrates multiple functions such as grinding disc 1 speed adjustment, pressure control, grinding time setting, and real-time monitoring of the grinding process. Through this integrated design, the operator can easily and precisely control and adjust the grinding process through a unified control interface. At the core of the control module is a high-performance microprocessor, which can automatically adjust the speed of the grinding disc 1 and the pressure of the pressure regulating mechanism 2 based on preset grinding process parameters and real-time feedback data. The speed of the grinding disc 1 can be precisely adjusted between 200 r / min and 1000 r / min according to the material of the sample 3 and the grinding requirements, while the pressure of the pressure regulating mechanism 2 can be finely adjusted within the range of 0.5 N to 50 N. Furthermore, the control module also has a grinding time setting function, allowing the operator to set the grinding time according to the sample thickness and grinding requirements, ensuring the accuracy and consistency of the grinding process. The system monitors grinding pressure and speed in real time, acquiring real-time data through high-precision pressure and speed sensors and feeding this data back to the control module. The control module automatically adjusts the grinding parameters based on the feedback data, ensuring the stability and efficiency of the grinding process.
[0039] The grinding apparatus for preparing samples for diffusion resistance testing disclosed in this application can solve the problems of uneven spraying and limited coverage of grinding slurry in the prior art, achieve uniform distribution of grinding slurry, and avoid insufficient coverage or liquid splashing.
[0040] The above embodiments are merely illustrative of the principles and effects of this utility model and are not intended to limit the scope of this utility model. Any person skilled in the art can modify or alter the above embodiments without departing from the spirit and scope of this utility model. Therefore, all equivalent modifications or alterations made by those skilled in the art without departing from the spirit and technical concept disclosed in this utility model should still be covered by the claims of this utility model.
Claims
1. A grinding apparatus for preparing samples for diffusion resistance testing, characterized in that, include: A grinding disc, wherein the central area of the grinding disc is the sample grinding area; A follow-up connection structure is fixedly disposed on the edge of the grinding disk surrounding the sample grinding area; A liquid dispenser, located above the grinding disc, includes a first end and a second end. The first end is rotatably connected to the follower connection structure. The second end is provided with a plurality of nozzles, which face the sample grinding area. Liquid storage tank for storing grinding fluid; The pipeline has one end connected to the liquid storage tank and the other end located inside the liquid distributor and connected to multiple nozzles.
2. The grinding apparatus for preparing samples for diffusion resistance testing according to claim 1, characterized in that, Also includes: A porous nozzle plate is disposed on the side of the second end of the liquid dispenser facing the sample grinding area, and a plurality of nozzles are disposed on the porous nozzle plate.
3. The grinding apparatus for preparing samples for diffusion resistance testing according to claim 1 or 2, characterized in that, The plurality of nozzles are evenly distributed at the second end of the liquid distributor.
4. The grinding apparatus for preparing samples for diffusion resistance testing according to claim 1, characterized in that, The nozzle is detachably disposed at the second end of the liquid dispenser.
5. The grinding apparatus for preparing samples for diffusion resistance testing according to claim 1, characterized in that, Also includes: A splined shaft is connected to the second end of the liquid dispenser via the splined shaft to adjust the angle of the nozzle relative to the second end toward the sample grinding area.
6. The grinding apparatus for preparing samples for diffusion resistance testing according to claim 5, characterized in that, The angle adjustment range of the nozzle relative to the side of the second end facing the sample grinding area is -45° to 45°.
7. The grinding apparatus for preparing samples for diffusion resistance testing according to claim 1, characterized in that, Also includes: A flow regulating component is disposed inside the nozzle.
8. The grinding apparatus for preparing samples for diffusion resistance testing according to claim 1, characterized in that, The rotation speed of the grinding disc is between 200 r / min and 1000 r / min.
9. The grinding apparatus for preparing samples for diffusion resistance testing according to claim 1, characterized in that, When grinding the sample, in the projection on the surface of the grinding disc, the geometric center of the follower connection structure and the geometric center of the grinding sample are connected by a first line, and the geometric center of the follower connection structure and the midpoint of the second end of the liquid dispenser are connected by a second line, and the angle between the first line and the second line is between 15° and 25°.
10. The grinding apparatus for preparing samples for diffusion resistance testing according to claim 1, characterized in that, Also includes: A sealing ring is provided at the connection between the pipeline and the liquid storage tank and at the connection between the pipeline and the nozzle.